CN105242460B - Array substrate and display panel and preparation method thereof, display device - Google Patents
Array substrate and display panel and preparation method thereof, display device Download PDFInfo
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- CN105242460B CN105242460B CN201510601329.8A CN201510601329A CN105242460B CN 105242460 B CN105242460 B CN 105242460B CN 201510601329 A CN201510601329 A CN 201510601329A CN 105242460 B CN105242460 B CN 105242460B
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- 238000000034 method Methods 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims description 38
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- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
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- 239000010408 film Substances 0.000 description 36
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
The present invention relates to field of display technology, a kind of array substrate and display panel and preparation method thereof, display device are disclosed.The array substrate includes being located at outermost transparent electrode, and the transparent electrode is pixel electrode or public electrode.Photosensitive layer is provided in the transparent electrode, and the transparent electrode and photosensitive layer are formed by same patterning processes, so that the transparent electrode is consistent with the pattern of photosensitive layer, and the groove for being orientated to liquid crystal molecule is formed on the surface of the photosensitive layer, certain pre-tilt angle is provided for liquid crystal molecule, to default alignment films in the prior art, manufacture craft is simplified, production cost is reduced.
Description
Technical field
The present invention relates to field of display technology, more particularly to a kind of array substrate and display panel and preparation method thereof,
Display device.
Background technique
As the production cost of thin film transistor liquid crystal display device (TFT-LCD) reduces, the day of manufacturing process
Benefit is perfect, becomes the mainstream technology of flat display field.The primary structure of liquid crystal display device is the film crystal to box
Pipe array substrate and colored filter are filled with liquid crystal between array substrate and colored filter.Wherein, array substrate includes
The grid line and data line of cross-distribution, for limiting pixel region.
It in LCD technology, needs to provide certain pre-tilt angle to liquid crystal, so that liquid crystal is by certain regularly arranged.It is existing
Have in technology, the pre-tilt angle is provided by the alignment films specially made, passes through friction process specifically, having in the alignment films
The groove of formation, the groove is for providing certain pre-tilt angle for liquid crystal.
Obviously, it in order to provide certain pre-tilt angle to liquid crystal, needs to increase the material and technique of production alignment films, increases
The production cost of liquid crystal display device.
Summary of the invention
The present invention provides a kind of array substrate and display panel and preparation method thereof, display device, makes work to simplify
Skill reduces manufacturing cost.
In order to solve the above technical problems, providing a kind of array substrate in the embodiment of the present invention, including it is arranged in underlay substrate
On transparent electrode, the transparent electrode is located at the outermost layer of the array substrate, is provided with photosensitive layer in the transparent electrode,
The photosensitive layer is consistent with the pattern of the transparent electrode, and the surface of the photosensitive layer is formed with for carrying out to liquid crystal molecule
The groove of orientation.
A kind of production method of array substrate is provided in the embodiment of the present invention, comprising:
Transparent electrode, the production method are formed on underlay substrate further include:
Photosensitive layer is formed in the transparent electrode, the photosensitive layer is consistent with the pattern of the transparent electrode；
The groove for being orientated to liquid crystal molecule is formed on the surface of the photosensitive layer.
A kind of display panel, including array substrate as described above are provided in the embodiment of the present invention.
A kind of display device, including display panel as described above are provided in the embodiment of the present invention.
A kind of production method of display panel is provided in the embodiment of the present invention, the display panel includes array substrate and coloured silk
Ilm substrate, the production method include that the array substrate is made using production method as described above.
The advantageous effects of the above technical solutions of the present invention are as follows:
In above-mentioned technical proposal, array substrate includes being located at outermost transparent electrode, and the transparent electrode is pixel electricity
Pole or public electrode.Be provided with photosensitive layer in the transparent electrode, and by same patterning processes formed the transparent electrode and
Photosensitive layer so that the transparent electrode is consistent with the pattern of photosensitive layer, and is formed on the surface of the photosensitive layer for liquid crystal
The groove that molecule is orientated provides certain pre-tilt angle for liquid crystal molecule, thus default alignment films in the prior art, letter
Change manufacture craft, reduces production cost.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention without any creative labor, may be used also for those of ordinary skill in the art
To obtain other drawings based on these drawings.
Fig. 1 shows the structural schematic diagrams of ADS type tft array substrate in the embodiment of the present invention；
Fig. 2 indicates the partial enlargement diagram of photosensitive layer in the embodiment of the present invention；
Fig. 3 indicates the structural schematic diagram of ADS type TFT display panel in the embodiment of the present invention.
Specific embodiment
The present invention provides a kind of array substrate, and the array substrate includes being located at outermost transparent electrode, described transparent
Electrode is pixel electrode or public electrode.It is provided with photosensitive layer in the transparent electrode, and forms institute by same patterning processes
Transparent electrode and photosensitive layer are stated, so that the transparent electrode is consistent with the pattern of photosensitive layer, and in the surface shape of the photosensitive layer
At the groove for being orientated to liquid crystal molecule, certain pre-tilt angle is provided for liquid crystal molecule, thus the default prior art
In alignment films, simplify manufacture craft, reduce production cost.
Specifically, being led first in production the transparent of transparent electrode in the patterning processes for making the transparent electrode
Photosensitive film is coated on conductive film, then the photosensitive film is exposed, and is developed, the photosensitive layer is formed, with the sense
Photosphere is to stop to etch the transparent conductive film, forms the transparent electrode, wherein the photosensitive layer and the transparent electrode
Pattern it is consistent.It is that the present invention does not remove thereon photosensitive finally in the patterning processes different from the prior art
Layer, but it is formed with the groove for being orientated to liquid crystal molecule on the surface of the photosensitive layer, replace in the prior art
Alignment films.
Below in conjunction with drawings and examples, specific embodiments of the present invention will be described in further detail.Following reality
Example is applied for illustrating the present invention, but is not intended to limit the scope of the invention.
Referring to figs. 1 and 2, a kind of array substrate is provided in the embodiment of the present invention, including is arranged in underlay substrate 100
On transparent electrode 1, transparent electrode 1 is pixel electrode or public electrode, positioned at the outermost layer of array substrate, is forming liquid to box
When LCD panel, transparent electrode 1 is located at the array substrate close to the side of liquid crystal molecule 10, as shown in Figure 3.
It is provided with photosensitive layer 2 in transparent electrode 1, specifically can be to stop to perform etching technique with photosensitive layer 2, be formed transparent
Electrode 1, so that the pattern of photosensitive layer 2 is consistent with the pattern of transparent electrode 1, and the surface of photosensitive layer 1 is formed with for liquid crystal
The micro-grooves 11 that molecule is orientated, groove 11 are used to provide certain pre-tilt angle for liquid crystal molecule 10.
Technical solution of the present invention by with public electrode or pixel electrode by photosensitive layer that same patterning processes are formed come
Replace orientation mould in the prior art, simplifies manufacture craft, reduce production cost.
Wherein, the material of photosensitive layer 2 is usually photosensitive resin, has sufficiently large light transmission rate, be will not influence normal
Display.The material of photosensitive layer 2 is specifically as follows positive photoresist or negative photoresist.
Preferably, in conjunction with shown in Fig. 2 and Fig. 3, it is provided with anchoring layer 12 in the groove 11 on 2 surface of photosensitive layer, for increasing
To the anchorage force that liquid crystal molecule 10 is orientated, improve since there are irregular electromagnetic fields to cause 10 irregular deviation of liquid crystal molecule
The problem of.
In the embodiment of the present invention, the material molecule structure of production anchoring layer 12 includes the main chain of liquid crystal state and the side of photopolymerization
Chain, anchoring layer 12 are located in the groove 11 on 2 surface of photosensitive layer, and groove 11 is used to provide certain pre-tilt angle for liquid crystal molecule 10,
Keep liquid crystal molecule 10 regularly arranged.The main chain of anchoring layer 12 is similar to the structure of liquid crystal molecule 10, can increase to liquid crystal molecule
10 anchorage force, reduces the pre-tilt angle of liquid crystal molecule 10, to reduce the influence that interference electromagnetic field deflects liquid crystal molecule 10, makes
The orientation effect for obtaining liquid crystal molecule 10 is good, promotes display quality.And the side chain of anchoring layer 12 has photopolymerization characteristic, can make
The material polymerizing curable of anchoring layer 12 must be made in groove 11, realize the anchoring to liquid crystal molecule 10 with the cooperation of groove 11, and
Increase the effect of anchorage force.
Material with above-mentioned molecular structure has mesomorphism, also referred to as liquid crystal state, the liquid crystal molecule with liquid crystal display
10 have similar main chain, different side chains.
Currently, Thin Film Transistor-LCD (TFT-LCD) can be divided into according to display pattern: twisted-nematic (TN,
Twisted Nematic) type, plane conversion (IPS, In Plane Switching) type and advanced super dimension field switch (ADS,
Advanced Super Dimension Switch) type.Wherein, ADS type TFT-LCD mainly passes through slit in same plane
The electric field that electric field caused by electrode edge and gap electrode layer and plate electrode interlayer generate forms multi-dimensional electric field, makes liquid crystal
All aligned liquid-crystal molecules can generate rotation between gap electrode, right above electrode in box, to improve liquid crystal work effect
Rate simultaneously increases light transmission efficiency.The picture quality of TFT-LCD product can be improved in ADS technology, has high-resolution, high transmission
The advantages that rate, low-power consumption, wide viewing angle, high aperture, low aberration, ripple without water of compaction (push Mura).
For ADS type TFT-LCD, public electrode and pixel electrode are both formed in array substrate, public electrode and picture
Plain electrode is made by transparent conductive material.Transparent electrode 1 in the embodiment of the present invention is located at the outermost of array substrate, is narrow
Electrode is stitched, there are multiple slits thereon.The transparent electrode 1 can be public electrode, or pixel electrode.
By using technical solution of the present invention, can default orientation mould in the prior art, simplify ADS type tft array
The manufacture craft of substrate reduces production cost.
As shown in Figure 1, the array substrate in the embodiment of the present invention specifically includes by taking ADS type tft array substrate as an example:
Underlay substrate 100 is transparent substrate, such as: glass substrate, quartz base plate, organic resin substrate；
A plurality of grid line on underlay substrate 100 and multiple data lines (not shown) are set, multiple pixel regions are limited
Domain；
Each pixel region includes:
Thin film transistor (TFT) 4 on first underlay substrate 100 is set, thin film transistor (TFT) 4 include gate electrode 5, active layer 6,
Source electrode 7 and drain electrode 8 are provided with gate insulation layer 101 between gate electrode 5 and active layer 6, and the material of gate insulation layer 101 can
It can be single, double or multi-layer structure to select oxide, nitride or nitrogen oxides.Specifically, gate insulation layer 101
Material can be SiNx, SiOx or Si (ON) x.Source electrode 4 and at least part of drain electrode 5 contact setting with active layer 3；
The drain electrode 8 of pixel electrode 3, pixel electrode 3 and thin film transistor (TFT) 4 is electrically connected；
The protective layer 102 of thin film transistor (TFT) 4 and pixel electrode 3 is covered, the material of protective layer 102 can equally select oxidation
Object, nitride or nitrogen oxides；
Public electrode 1 on protective layer 102 is set, it is corresponding with the position of pixel electrode 3, have on public electrode 1 more
A slit, for cooperatively forming driving electric field with pixel electrode 3；
Photosensitive layer 2 on public electrode 1, photosensitive layer 2 is consistent with the pattern of public electrode 1, the surface shape of photosensitive layer 2
At the groove 11 having for being orientated to liquid crystal molecule, as shown in Figure 2.
Wherein, thin film transistor (TFT) 4 can be bottom gate thin film transistor, or top gate type thin film transistor, coplanar
Configuration thin film transistor herein and is not construed as limiting.Only illustrated by taking bottom gate thin film transistor as an example in Figure of description.
It can not since the line width of grid line and data line is exposed the limitation of machine precision for ADS type tft array substrate
It is unlimited narrow.Therefore, do not have well-regulated electromagnetic field above grid line and data line, cause periphery liquid crystal molecule that can occur irregularly
Deflection.By the way that anchoring layer 12 is arranged in the orientation groove 11 on photosensitive layer 2 in technical solution of the present invention, can increase to liquid
The anchorage force of brilliant molecule is effectively improved the bad problem of liquid crystal molecular orientation effect caused by above-mentioned irregular electromagnetic field, is promoted
Show quality.
As shown in figure 3, also provide a kind of display panel in the embodiment of the present invention, including color membrane substrates 10 and as described above
Array substrate reduces production cost to simplify manufacture craft.
When the display panel applications are when in display device, the cost of manufacture of product can not only be reduced, additionally it is possible to mention
Rise display quality.
Based on the same inventive concept, a kind of production method of array substrate is additionally provided in the embodiment of the present invention, comprising:
Transparent electrode is formed on underlay substrate；
Photosensitive layer is formed in the transparent electrode, the photosensitive layer is consistent with the pattern of the transparent electrode；
The groove for being orientated to liquid crystal molecule is formed on the surface of the photosensitive layer.
In above-mentioned steps, the transparent electrode and photosensitive layer are formed especially by same patterning processes, and described photosensitive
Groove is formed on layer, replaces alignment films in the prior art, so that the default material and technique that orientation mould is fabricated separately, simplifies
Manufacture craft reduces production cost.
In the embodiment of the present invention, the step of forming the transparent electrode and photosensitive layer, is specifically included:
Form transparent conductive film；
Photosensitive film is formed on the transparent conductive film；
The photosensitive film is exposed using mask plate, is developed, is formed the photosensitive layer, have on the photosensitive layer
Multiple slits；
Technique is performed etching to the transparent conductive film using the photosensitive layer as exposure mask, forms transparent electrode.
Wherein, the material of transparent conductive film can be indium-zinc oxide or indium tin oxide.
Certainly, the transparent electrode and photosensitive layer can also be formed by following steps: sequentially form transparent conductive film
And photosensitive film.Photoresist is formed on the photosensitive film, the photoresist and photosensitive film are exposed, is developed, shape
At photosensitive layer.Then it is to stop to perform etching transparent conductive film with the photosensitive layer and photoresist, forms the transparent electricity
Pole, stripping photoresist.It should be noted that photoresist stripper used in stripping technology cannot corrode it is described photosensitive
Layer.
Preferably, the production method of array substrate further include:
Anchoring layer is formed in the groove, for increasing the anchorage force being orientated to liquid crystal molecule.
By the way that the anchoring layer is arranged, the anchorage force to liquid crystal molecule can be increased, it is small to be effectively improved original anchorage force, liquid
The bad problem of brilliant molecularly oriented promotes display quality.
As a specific embodiment, the step of formation anchoring layer is specifically included in the groove:
Anchoring layer film is formed on the photosensitive layer, the material of the anchoring layer film includes the first material and light-initiated
Agent, the molecular structure of first material include the main chain of liquid crystal state and the side chain of photopolymerization；
Using layer film is anchored described in ultraviolet light, make the first material solidification in the anchoring layer film in the ditch
In slot.
In the embodiment, the material for making anchoring layer includes first material with liquid crystal state main chain, the main chain with
The structure of liquid crystal molecule is similar, can increase the anchorage force to liquid crystal molecule, so that the orientation effect of liquid crystal molecule is good, is promoted
Display quality.The photopolymerization side chain of first material enables first material that polymerization reaction occurs, and is solidificated in described
In groove, the anchoring to liquid crystal molecule is realized with groove cooperation, and increase the effect of anchorage force.The photoinitiator is one
Kind catalyst can be catalyzed first material and polymerization reaction occurs under the irradiation of ultraviolet light.
By taking ADS type tft array substrate as an example, the manufacturing process of array substrate is specifically included in the embodiment of the present invention:
A plurality of grid line and multiple data lines (not shown) are formed on sinking to the bottom substrate, limit multiple pixel regions；
Thin film transistor (TFT) and pixel electrode, the electric leakage of pixel electrode and the thin film transistor (TFT) are formed in each pixel region
Pole is electrically connected, and the grid line and thin film transistor (TFT) gate electrode can be formed by the patterning processes to the same grid metal film,
The data line and thin film transistor (TFT) gate electrode can be formed by the patterning processes to same drain metallic film.Grid metal and
Source and drain metal can be Cu, Al, Ag, Mo, Cr, Nd, Ni, Mn, Ti, the alloy of the metals such as Ta, W and these metals.The grid
Metallic film and drain metallic film can be single layer structure or multilayered structure, multilayered structure such as Cu Mo, Ti Cu Ti,
Mo Al Mo etc.；
Formed covering thin film transistor (TFT) and pixel electrode protective layer, the material of the protective layer can select oxide,
Nitride or nitrogen oxides, protective layer can be single, double or multi-layer structure.Specifically, protective layer can be SiNx,
SiOx or Si (ON) x；
Transparent conductive film and photosensitive film are sequentially formed on the protective layer, using mask plate to the photosensitive film
It is exposed, develops, form the photosensitive layer, there are multiple slits on the photosensitive layer.It is exposure mask to institute using the photosensitive layer
It states transparent conductive film to perform etching, removes the transparent conductive film of the slit region on the photosensitive layer, formed public
Electrode.There are multiple slits, the public electrode is corresponding with the position of pixel electrode, for electric with pixel on the public electrode
Pole cooperatively forms driving electric field.
The micro-grooves for being orientated to liquid crystal molecule are formed on the surface of the photosensitive layer by friction process.
So far the production of ADS type tft array substrate is completed.
A kind of production method of display panel is also provided in the embodiment of the present invention, the display panel include array substrate and
Color membrane substrates, the production method of the display panel include that the array substrate is made using production method as described above, are used
To simplify the manufacture craft of display base plate, production cost is reduced.
The production method of the display panel further include:
Array substrate and color membrane substrates described in box form sealing space between the array substrate and color membrane substrates；
The filling liquid crystal in the sealing space, the photosensitive layer are located at the array substrate close to the one of the liquid crystal
Side keeps liquid crystal molecule regularly arranged for providing certain pre-tilt angle for liquid crystal molecule.
It is described described when the production method of the array substrate includes the steps that forming anchoring layer in the groove
The step of anchoring layer is formed in groove specifically:
First material and photoinitiator are added in the liquid crystal；
Specifically the liquid crystal added with first material and photoinitiator is filled between array substrate and color membrane substrates.
And ultraviolet light display panel is used, make the first material solidification in the liquid crystal in the groove.
Wherein, first material has the main chain of liquid crystal state and the side chain of photopolymerization, and the main chain plays increase to liquid
The effect of the anchorage force of brilliant molecule, the side chain enable first material that photopolymerization reaction occurs, are solidificated in the ditch
In slot, the anchoring to liquid crystal molecule is realized with groove cooperation, and increase the effect of anchorage force.
In actual application, in order to not influence display, in the liquid crystal, the matter of first material and photoinitiator
Measuring percentage is 1 ‰~5%.
The default material and technique that orientation mould is fabricated separately of technical solution of the present invention, need to only be formed by same technique
Then the pattern of transparent electrode and photosensitive layer is formed subtle for being orientated to liquid crystal molecule on the surface of the photosensitive layer
Groove can be realized the orientation to liquid crystal molecule, simplify manufacture craft, reduces production cost.Further, additionally it is possible to mention
Rise display quality.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvement and replacement can also be made, these are improved and replacement
Also it should be regarded as protection scope of the present invention.
Claims (14)
1. a kind of array substrate, including the transparent electrode being arranged on underlay substrate, the transparent electrode is located at the array base
The outermost layer of plate, which is characterized in that photosensitive layer is provided in the transparent electrode, the photosensitive layer is on the underlay substrate
Orthographic projection is overlapped with orthographic projection of the transparent electrode on the underlay substrate, and the surface of the photosensitive layer is formed with and is used for
The groove that liquid crystal molecule is orientated.
2. array substrate according to claim 1, which is characterized in that anchoring layer is provided in the groove, for increasing
The anchorage force that liquid crystal molecule is orientated.
3. array substrate according to claim 2, which is characterized in that the material molecule structure for making the anchoring layer includes
The main chain of liquid crystal state and the side chain of photopolymerization.
4. array substrate according to claim 1-3, which is characterized in that the material of the photosensitive layer is photosensitive tree
Rouge.
5. array substrate according to claim 1-3, which is characterized in that have in the transparent electrode multiple narrow
Seam is pixel electrode or public electrode.
6. a kind of production method of array substrate, comprising:
Transparent electrode is formed on underlay substrate, which is characterized in that the production method further include:
Photosensitive layer, orthographic projection of the photosensitive layer on the underlay substrate and the transparent electricity are formed in the transparent electrode
Orthographic projection of the pole on the underlay substrate is overlapped；
The groove for being orientated to liquid crystal molecule is formed on the surface of the photosensitive layer.
7. production method according to claim 6, which is characterized in that the production method further include:
Anchoring layer is formed in the groove, for increasing the anchorage force being orientated to liquid crystal molecule.
8. production method according to claim 6, which is characterized in that the step of forming the transparent electrode and photosensitive layer tool
Body includes:
Form transparent conductive film；
Photosensitive film is formed on the transparent conductive film；
The photosensitive film is exposed using mask plate, develops, forms the photosensitive layer；
Technique is performed etching to the transparent conductive film using the photosensitive layer as exposure mask, forms transparent electrode.
9. production method according to claim 7, which is characterized in that the step of forming anchoring layer in the groove is wrapped
It includes:
Anchoring layer film is formed on the photosensitive layer, the material of the anchoring layer film includes the first material and photoinitiator,
The molecular structure of first material includes the main chain of liquid crystal state and the side chain of photopolymerization；
Using layer film is anchored described in ultraviolet light, make the first material solidification in the anchoring layer film in the groove
It is interior.
10. a kind of display panel, which is characterized in that including the described in any item array substrates of claim 1-5.
11. a kind of display device, including display panel described in any one of claim 10.
12. a kind of production method of display panel, the display panel include array substrate and color membrane substrates, which is characterized in that
The production method includes that the array substrate is made using the described in any item production methods of claim 6-9.
13. production method according to claim 12, which is characterized in that the production method of the display panel further include:
Array substrate and color membrane substrates described in box form sealing space between the array substrate and color membrane substrates；
The filling liquid crystal in the sealing space；
It is described in the groove when the production method of the array substrate includes the steps that forming anchoring layer in the groove
The step of interior formation anchoring layer specifically:
The first material and photoinitiator are added in the liquid crystal, the molecular structure of first material includes the main chain of liquid crystal state
With the side chain of photopolymerization；
Using ultraviolet light display panel, make the first material solidification in the liquid crystal in the groove.
14. production method according to claim 13, which is characterized in that in the liquid crystal, first material and light draw
The mass percent for sending out agent is 1 ‰~5%.
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| CN201510601329.8A CN105242460B (en) | 2015-09-18 | 2015-09-18 | Array substrate and display panel and preparation method thereof, display device |
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| JP2005338484A (en) * | 2004-05-27 | 2005-12-08 | Alps Electric Co Ltd | Semi-transmission reflective type bistable nematic liquid crystal display |
| CN101165555B (en) * | 2006-10-18 | 2012-06-27 | 奇美电子股份有限公司 | Liquid crystal display panel |
| CN101551550B (en) * | 2008-04-03 | 2010-12-08 | 北京京东方光电科技有限公司 | Liquid crystal display device with transverse electric field mode |
| CN102109714B (en) * | 2009-12-25 | 2016-03-09 | 北京京东方光电科技有限公司 | Oriented layer and preparation method thereof, comprise the liquid crystal indicator of this oriented layer |
| CN102629012A (en) * | 2011-08-19 | 2012-08-08 | 京东方科技集团股份有限公司 | Manufacturing method for liquid crystal panel and liquid crystal panel |
| CN102929041B (en) * | 2012-11-05 | 2015-12-02 | 京东方科技集团股份有限公司 | For the method for making of the mould and alignment films that make alignment films |
| KR101987187B1 (en) * | 2012-11-29 | 2019-06-10 | 엘지디스플레이 주식회사 | Liquid Crystal Display Device Including Light Orientation Film And Method Of Fabricating The Same |
| CN103869540A (en) * | 2012-12-10 | 2014-06-18 | 京东方科技集团股份有限公司 | Orientation layer forming method |
| CN104898323B (en) * | 2014-12-30 | 2018-09-14 | 南京中电熊猫液晶显示科技有限公司 | Light alignment method and liquid crystal display panel |
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