CN105223974B - Technique processes the method and system of gas circuit flow control - Google Patents
Technique processes the method and system of gas circuit flow control Download PDFInfo
- Publication number
- CN105223974B CN105223974B CN201410309056.5A CN201410309056A CN105223974B CN 105223974 B CN105223974 B CN 105223974B CN 201410309056 A CN201410309056 A CN 201410309056A CN 105223974 B CN105223974 B CN 105223974B
- Authority
- CN
- China
- Prior art keywords
- flow
- temperature
- gas
- time
- technique
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Flow Control (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses the method and system that a kind of technique processes gas circuit flow control.Wherein method includes the following steps：According to the flow value of every road gas of current process step, setting temperature value, flow lifting time and gradient of temperature time in technique list, the flow slope and temperature regulations speed per road gas are calculated；The temperature of the processing chamber of current process step is controlled to adjust according to temperature regulations speed；The flow of each road gas of current process step is adjusted according to the flow slop control of every road gas.It adjusts the gas flow of every road gas and is gradually adjusted according to the flow slope of calculating, the relatively slow variation of temperature regulations speed that temperature passes through calculating, the adjusting of gas circuit flow and the adjusting control of temperature are all more flexible, while improving the stability of technique processing.
Description
Technical field
The method of gas circuit flow control is processed the present invention relates to technical field of semiconductors more particularly to a kind of technique and is
System.
Background technology
In semiconductor technology processing, during epitaxial growth, control major parameter is needed to have underlayer temperature, source gas
Flow and carrier gas flow etc..Thickness, doping concentration and component uniformity are one of important indicators of film preparation.Substrate
Crystal completing property and growth rate of the temperature to epitaxial layer；Source gas flow is to the speed of growth, carrier gas flow to epitaxial layer
The uniformity etc. of thickness, all has a great impact respectively.Thus to CVD (Chemical Vapor Deposition, chemical gas
Mutually deposit) equipment control accuracy requirement it is very high, also have higher requirement to accuracy, the controllability of sound field technique.
Currently, software is in process, according to gas circuit target flow set by user and target temperature, directly under
It is dealt into hardware, then technique timing, after the currently step time arrives, automatically switched in next step；Until all techniques step has executed
Finish.
But gas target flow is directly issued using software, if target flow is excessive, be easy to cause cavity indoor pressure change
Change, influences process results；Software is taken certain interval of time and is controlled into trip temperature to issue the mode of target temperature, this is resulted in
If time interval is too small, temperature heating is smoother, and software execution efficiency reduces, and time interval is too big, is easy to cause temperature
It fluctuates excessive, can equally influence process results.
In conclusion a kind of flexible temperature control method and gas circuit configuration mode how are provided, to improve semiconductor machining
The stability of technique is a urgent problem to be solved.
Invention content
Based on this, it is necessary to provide a kind of technique processing gas circuit flow control that can carry out flexible temperature control and gas circuit configuration
Method and system.
A kind of method for technique processing gas circuit flow control that purpose provides to realize the present invention, includes the following steps：
According to the flow value of every road gas of current process step, setting temperature value, flow lifting time in technique list
And the gradient of temperature time, calculate the flow slope and temperature regulations speed per road gas；
The temperature of the processing chamber of current process step is controlled to adjust according to the temperature regulations speed；
The flow of each road gas of current process step is adjusted according to the flow slop control per road gas.
The embodiment that the method for gas circuit flow control is processed as a kind of technique, it is current in the list according to technique
It flow value, setting temperature value, flow lifting time and the gradient of temperature time of every road gas of processing step, calculates per road gas
Flow slope and temperature regulations speed, include the following steps：
Read the flow value L of every road gas of current process step in the technique list1, setting temperature value T1, flow liter
Time Tl drops1And gradient of temperature time Tt1；
Read the flow value L of every road gas of previous processing step in the technique list0And setting temperature value T0；
According to formula, the flow slope=(gas flow of the previous processing step of gas flow values-of current process step
Value)/flow lifting time；
Obtain the flow slope of every road gas of current process step
According to formula, temperature regulations speed=(the setting temperature of the setting previous processing step of temperature value-of current process step
Angle value)/gradient of temperature the time；
Obtain the temperature regulations speed of current process step
Process the embodiment of the method for gas circuit flow control as a kind of technique, it is described according to described per road gas
Flow slop control adjusts the flow of each road gas of current process step, includes the following steps：
It is 0 that initial regulating time Time, which is arranged,；
The gas flow values for controlling every road gas of current process step are the regulating time and current process step
The product of the flow slope per road gas；
The regulating time is increased into preset time, and after waiting for the preset time, returns and execute control current process
The step of gas flow values of every road gas of step, until the regulating time reaches the flow liter of current process step
Time drops.
The embodiment of the method for gas circuit flow control is processed as a kind of technique, the preset time is 1 second.
The embodiment of the method for gas circuit flow control is processed as a kind of technique, it is further comprising the steps of：
After the flow lifting time of current process step reaches, carried out according to the technique process time in technique list
Technique is processed, and after completing the technique processing of current process step, returns to the stream for the every road gas for calculating next processing step
Measure slope and temperature regulations speed.
A kind of system of technique processing gas circuit flow control based on same design, including speed control computing module, temperature
Control module and flow-control module are spent, wherein：
The speed control computing module, for the flow according to every road gas of current process step in technique list
Value, setting temperature value, flow lifting time and gradient of temperature time calculate flow slope and temperature per road gas and adjust speed
Rate；
The temperature control modules, the process cavity for controlling to adjust current process step according to the temperature regulations speed
The temperature of room；
The flow-control module, for adjusting current process step according to the flow slop control per road gas
The flow of each road gas.
The embodiment of the system of gas circuit flow control, the speed control computing module packet are processed as a kind of technique
Include current procedures parameter reading submodule, previous step parameter reading submodule, flow slope computational submodule and temperature speed
Rate computational submodule, wherein：
The current procedures parameter reading submodule, every road gas for reading current process step in the technique list
The flow value L of body1, setting temperature value T1, flow lifting time Tl1And gradient of temperature time Tt1；
The previous step parameter reading submodule, every road gas for reading previous processing step in the technique list
The flow value L of body0And setting temperature value T0；
The flow slope computational submodule, for according to formula, the flow slope=(gas flow of current process step
The gas flow values of value-previous processing step)/flow lifting time；
Obtain the flow slope of every road gas of current process step
Temperature rate's computational submodule, for according to formula, the temperature regulations speed=(setting of current process step
The setting temperature value of the previous processing step of temperature value -)/gradient of temperature time；
Obtain the temperature regulations speed of current process step
The embodiment of the system of gas circuit flow control is processed as a kind of technique, the flow-control module includes just
Begin setting submodule, flow set submodule and time control submodule, wherein：
The initial setting up submodule is 0 for initial regulating time Time to be arranged；
The gas flow values of the flow set submodule, every road gas for controlling current process step are the tune
Save the product of time and the flow slope per road gas of current process step；
The time control submodule for the regulating time to be increased preset time, and waits for the preset time
Afterwards, the step of returning to the gas flow values for the every road gas for executing control current process step, until the regulating time reaches
The flow lifting time of current process step.
The embodiment of the system of gas circuit flow control is processed as a kind of technique, the preset time is 1 second.
The embodiment that the system of gas circuit flow control is processed as a kind of technique, further includes technique execution module, is used
After the flow lifting time of current process step reaches, technique is carried out according to the technique process time in technique list and is added
Work, and after completing the technique processing of current process step, return to the flow slope for the every road gas for calculating next processing step
And temperature regulations speed.
Beneficial effects of the present invention include：
The method and system of a kind of technique processing gas circuit flow control provided by the invention, per the gas flow tune of road gas
Section is gradually adjusted according to the flow slope of calculating, the relatively slow variation of temperature regulations speed that temperature passes through calculating.Phase
For flow controller directly to be reached to the gas flow of current process step requirement, and rapidly temperature control in traditional technology
System, the adjusting of gas circuit flow and the adjusting control of temperature are all more flexible, while the stability of technique processing can be improved.
Description of the drawings
Fig. 1 is the flow chart of a specific embodiment of the method that a kind of technique of the present invention processes gas circuit flow control；
Fig. 2 is the flow chart of the another specific embodiment for the method that a kind of technique of the present invention processes gas circuit flow control；
Fig. 3 is the system structure signal of a specific embodiment of the system that a kind of technique of the present invention processes gas circuit flow control
Figure.
Specific implementation mode
In order to make the purpose , technical scheme and advantage of the present invention be clearer, below in conjunction with attached drawing to the present invention's
The specific implementation mode of the method and system of technique processing gas circuit flow control illustrates.It should be appreciated that described herein
Specific embodiment is only used to explain the present invention, is not intended to limit the present invention.
The method of the technique processing gas circuit flow control of the embodiment of the present invention, as shown in Figure 1, including the following steps：
S100 is lifted according to the flow value of every road gas of current process step, setting temperature value, flow in technique list
Time and temperature lifting time calculates flow slope and temperature regulations speed per road gas.
S200 controls to adjust the temperature of the processing chamber of current process step according to the temperature regulations speed.
S300 adjusts the flow of each road gas of current process step according to the flow slop control per road gas.
In the embodiment of the present invention, changes and increase gradient of temperature time (TempRamp) and flow in traditional handicraft form templat
Lifting time (MFCRampTime) configures parameter.It is such as every to the traditional parameters in technique list in edit process list
While technique process time etc. is configured, the gradient of temperature time and flow liter is arranged in the gas flow of road gas
Time drops.Make, when carrying out the switching of technique procedure of processing, to control temperature by temperature controller in gradient of temperature time range
System is adjusted；On the roads flow lifting time Nei Shimei, the flow of gas is adjusted to current process step from the flow of a upper processing step
Gas flow.
The gas flow adjusting of the roads Zhong Mei of embodiment of the present invention gas is gradually adjusted according to the flow slope of calculating, temperature
The relatively slow variation of temperature regulations speed that degree passes through calculating.Work as relative to directly flow controller is reached in traditional technology
The gas flow that preceding processing step requires, and rapidly temperature control, the technique of the embodiment of the present invention process gas circuit flow control
Method gas circuit flow adjusting and temperature adjusting control it is all more flexible, while the stability of technique can be improved.
In the embodiment for the method that wherein a technique processes gas circuit flow control, step S100, according to technique list
It flow value, setting temperature value, flow lifting time and the gradient of temperature time of every road gas of middle current process step, calculates every
The flow slope and temperature regulations speed of road gas, include the following steps：
S110 reads the flow value L of every road gas of current process step in the technique list1, setting temperature value T1、
Flow lifting time Tl1And gradient of temperature time Tt1.When technique processes beginning, each parameter in technique list is read first
Value.In the embodiment of the present invention, each technique procedure of processing needs to use each parameter value of current process step and previous when starting
Each parameter value of processing step.
S120 reads the flow value L of every road gas of previous processing step in the technique list0And setting temperature value
T0。
S130, according to formula, the flow slope=(gas of the previous processing step of gas flow values-of current process step
Flow value)/flow lifting time, obtain the flow slope of every road gas of current process stepThe flow
Lifting time can process the changes in flow rate situation between situation and two technique procedure of processings in edit process according to actual process
It is configured when list, such as may be configured as 5S.The time controllable flow rate that flow control is adjusted is arranged such gradually to convert, keeps away
The unexpected increase for exempting from flow causes the excessive influence technique processing stability of the pressure change in processing chamber.
Herein it should be noted that when executing the first step process procedure of processing, corresponding previous technique procedure of processing
Each parameter value be defaulted as 0.
The method of the technique processing gas circuit flow control of the embodiment of the present invention, sets in conjunction with each parameter value of previous processing step
The flux change velocity and temperature changing speed for setting current process step make in processing chamber temperature and by gas changes in flow rate shadow
Loud chamber pressure steady change, improves the stability of technique.
In the embodiment for the method that wherein a technique processes gas circuit flow control, step S300, according to described per road
The flow slop control of gas adjusts the flow of each road gas of current process step, as shown in Fig. 2, including the following steps：
S310, it is 0 that initial regulating time Time, which is arranged,.
S320, the gas flow values for controlling every road gas of current process step are that the regulating time is walked with current process
The product of the rapid flow slope per road gas.Issuing road gas flow, to be regulating time every with current process step
The product of the flow slope of road gas is to corresponding flow controller.It is passed into processing chamber by flow controller control
The gas flow of the roads Zhong Ge gas.
The regulating time is increased preset time by S330, and after waiting for the preset time, returns to that execute control current
The step of gas flow values of every road gas of processing step, until the regulating time reaches the stream of current process step
Measure lifting time.
In the embodiment of the present invention, by recycle increase carry out gas flow adjusting regulating time, make flow-rate adjustment when
Between be spaced and clearly controlled, control is more accurate.The total time of flow control simultaneously is by parameter setting in technique list
The total time of limitation, flow adjustment is constant, such more flexible control gas circuit flow.
The method of a technique processing gas circuit flow control, the preset time are 1 second wherein.Per the flow of road gas
Interval 1S is once adjusted.It may be alternatively provided as 2 seconds in other embodiments, the adjustment interval of gas circuit flow becomes larger at this time.
It is further comprising the steps of in the embodiment for the method that wherein a technique processes gas circuit flow control：
S400, after the flow lifting time arrival of current process step, when being processed according to the technique in technique list
Between carry out technique processing, and after completing the technique processing of current process step, return to the every road gas for calculating next processing step
The flow slope and temperature regulations speed of body.
As shown in Fig. 2, after flow adjusts, technique processing is carried out, technique is after the completion by technique step number parameter StepNum
Increase 1 and carry out next processing step, until completing all technique procedure of processings in technique list, i.e. technique step number StepNum
More than technique total step number TotalNum.Technique total step number is the step summation that technique processing is carried out in technique list.Technique adds
Work is since the first processing step.
Based on same inventive concept, the embodiment of the present invention provides a kind of system of technique processing gas circuit flow control, due to
The principle that this system solves the problems, such as is similar to a kind of aforementioned technique processing method of gas circuit flow control, therefore, the reality of the system
Applying can realize that overlaps will not be repeated according to the specific steps of preceding method.
The system of the technique processing gas circuit flow control of the embodiment of the present invention, as shown in figure 3, calculating mould including speed control
Block 100, temperature control modules 200 and flow-control module 300.Wherein：The speed control computing module 100 is used for root
According to the flow value of every road gas of current process step, setting temperature value, flow lifting time and gradient of temperature in technique list
Time calculates flow slope and temperature regulations speed per road gas；The temperature control modules 200, for according to the temperature
Spend the temperature that regulations speed controls to adjust the processing chamber of current process step；The flow-control module 300, for according to institute
The flow slop control of the roads Shu Mei gas adjusts the flow of each road gas of current process step.
In the embodiment of the present invention, changes and increase gradient of temperature time (TempRamp) and flow in traditional handicraft form templat
Lifting time (MFCRampTime) configures parameter.It is such as every to the traditional parameters in technique list in edit process list
While technique process time etc. is configured, the gradient of temperature time and flow liter is arranged in the gas flow of road gas
Time drops.Make, when carrying out the switching of technique procedure of processing, to control temperature by temperature controller in gradient of temperature time range
System is adjusted；On the roads flow lifting time Nei Shimei, the flow of gas is adjusted to current process step from the flow of a upper processing step
Gas flow.
The gas flow adjusting of the roads Zhong Mei of embodiment of the present invention gas is gradually adjusted according to the flow slope of calculating, temperature
The relatively slow variation of temperature regulations speed that degree passes through calculating.Work as relative to directly flow controller is reached in traditional technology
The gas flow that preceding processing step requires, and rapidly temperature control, the technique of the embodiment of the present invention process gas circuit flow control
System gas circuit flow adjusting and temperature adjusting control it is all more flexible, while the stability of technique can be improved.
In the embodiment for the system that wherein a technique processes gas circuit flow control, the speed control computing module
100 include current procedures parameter reading submodule 110, previous step parameter reading submodule 120, flow slope computational submodule
130 and temperature rate's computational submodule 140.Wherein：The current procedures parameter reading submodule 110, it is described for reading
The flow value L of every road gas of current process step in technique list1, setting temperature value T1, flow lifting time Tl1And temperature
Lifting time Tt1；The previous step parameter reading submodule 120, for reading previous processing step in the technique list
Every road gas flow value L0And setting temperature value T0；The flow slope computational submodule 130, for according to formula, flow
Slope=(gas flow values of the previous processing step of gas flow values-of current process step)/flow lifting time, is worked as
The flow slope of every road gas of preceding processing stepTemperature rate's computational submodule 140, for according to public affairs
Formula, temperature regulations speed=(the setting temperature value of the setting previous processing step of temperature value-of current process step)/gradient of temperature
Time obtains the temperature regulations speed of current process step
The system of the technique processing gas circuit flow control of the embodiment of the present invention, sets in conjunction with each parameter value of previous processing step
The flux change velocity and temperature changing speed for setting current process step make in processing chamber temperature and by gas changes in flow rate shadow
Loud chamber pressure steady change, improves the stability of technique.
In the embodiment for the system that wherein a technique processes gas circuit flow control, the flow-control module 300 wraps
Include initial setting up submodule 310, flow set submodule 320 and time control submodule 330.Wherein：The initial setting up
Submodule 310 is 0 for initial regulating time Time to be arranged；The flow set submodule 320, for controlling current process
The gas flow values of every road gas of step are that the regulating time and the flow per road gas of current process step are oblique
The product of rate；The time control submodule 330 for the regulating time to be increased preset time, and waits for described default
After time, the step of returning to the gas flow values for every the road gas for executing control current process step, up to the regulating time
Reach the flow lifting time of current process step.
In the embodiment of the present invention, by recycle increase carry out gas flow adjusting regulating time, make flow-rate adjustment when
Between be spaced and clearly controlled, control is more accurate.The total time of flow control simultaneously is by parameter setting in technique list
The total time of limitation, flow adjustment is constant, such more flexible control gas circuit flow.
In the embodiment for the system that wherein a technique processes gas circuit flow control, the preset time is 1 second.
Further include technique execution module 400 in the embodiment for the system that wherein a technique processes gas circuit flow control,
After the flow lifting time for current process step reaches, technique is carried out according to the technique process time in technique list
Processing, and after completing the technique processing of current process step, the flow for returning to the every road gas for calculating next processing step is oblique
Rate and temperature regulations speed.
Several embodiments of the invention above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously
Cannot the limitation to the scope of the claims of the present invention therefore be interpreted as.It should be pointed out that for those of ordinary skill in the art
For, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the guarantor of the present invention
Protect range.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (8)
1. a kind of method of technique processing gas circuit flow control, which is characterized in that include the following steps：
According to the flow value of every road gas of current process step, setting temperature value, flow lifting time and temperature in technique list
Lifting time is spent, flow slope and temperature regulations speed per road gas are calculated；
The temperature of the processing chamber of current process step is controlled to adjust according to the temperature regulations speed；
The flow of each road gas of current process step is adjusted according to the flow slop control per road gas；
The flow value of every road gas of current process step, setting temperature value, flow lifting time in the list according to technique
And the gradient of temperature time, the flow slope and temperature regulations speed per road gas are calculated, is included the following steps：
Read the flow value L of every road gas of current process step in the technique list1, setting temperature value T1, flow lifting when
Between Tl1And gradient of temperature time Tt1；
Read the flow value L of every road gas of previous processing step in the technique list0And setting temperature value T0；
According to formula, flow slope=(gas flow values of the previous processing step of gas flow values-of current process step)/stream
Measure lifting time；
Obtain the flow slope of every road gas of current process step
According to formula, temperature regulations speed=(the setting temperature of the setting previous processing step of temperature value-of current process step
Value)/gradient of temperature the time；
Obtain the temperature regulations speed of current process step
2. the method for technique processing gas circuit flow control according to claim 1, which is characterized in that described according to described every
The flow slop control of road gas adjusts the flow of each road gas of current process step, includes the following steps：
It is 0 that initial regulating time Time, which is arranged,；
The gas flow values of every road gas of current process step are controlled as the described of the regulating time and current process step
Per the product of the flow slope of road gas；
The regulating time is increased into preset time, and after waiting for the preset time, returns and execute control current process step
Every road gas gas flow values the step of, until the regulating time reach current process step the flow lifting when
Between.
3. the method for technique according to claim 2 processing gas circuit flow control, which is characterized in that the preset time is
1 second.
4. the method for technique processing gas circuit flow control according to any one of claims 1 to 3, which is characterized in that also wrap
Include following steps：
After the flow lifting time of current process step reaches, technique is carried out according to the technique process time in technique list
Processing, and after completing the technique processing of current process step, the flow for returning to the every road gas for calculating next processing step is oblique
Rate and temperature regulations speed.
5. a kind of system of technique processing gas circuit flow control, which is characterized in that including speed control computing module, temperature control
Module and flow-control module, wherein：
The speed control computing module, for according to the flow value of every road gas of current process step in technique list, set
It sets temperature value, flow lifting time and gradient of temperature time, calculates the flow slope and temperature regulations speed per road gas；
The temperature control modules, the processing chamber for controlling to adjust current process step according to the temperature regulations speed
Temperature；
The flow-control module, each road for adjusting current process step according to the flow slop control per road gas
The flow of gas；
The speed control computing module includes current procedures parameter reading submodule, previous step parameter reading submodule, stream
Slope computational submodule and temperature rate's computational submodule are measured, wherein：
The current procedures parameter reading submodule, for reading every road gas of current process step in the technique list
Flow value L1, setting temperature value T1, flow lifting time Tl1And gradient of temperature time Tt1；
The previous step parameter reading submodule, for reading every road gas of previous processing step in the technique list
Flow value L0And setting temperature value T0；
The flow slope computational submodule, for according to formula, the flow slope=(gas flow values-of current process step
The gas flow values of previous processing step)/flow lifting time；
Obtain the flow slope of every road gas of current process step
Temperature rate's computational submodule, for according to formula, temperature regulations speed=(the setting temperature of current process step
The setting temperature value of value-previous processing step)/gradient of temperature the time；
Obtain the temperature regulations speed of current process step
6. the system of technique processing gas circuit flow control according to claim 5, which is characterized in that the flow control mould
Block includes initial setting up submodule, flow set submodule and time control submodule, wherein：
The initial setting up submodule is 0 for initial regulating time Time to be arranged；
The flow set submodule, for control current process step every road gas gas flow values be the adjusting when
Between product with the flow slope per road gas of current process step；
The time control submodule for the regulating time to be increased preset time, and after waiting for the preset time, returns
Receipt row controls the step of gas flow values of every road gas of current process step, until the regulating time reaches current work
The flow lifting time of skill step.
7. the system of technique according to claim 6 processing gas circuit flow control, which is characterized in that the preset time is
1 second.
8. the system for processing gas circuit flow control according to claim 6 to 7 any one of them technique, which is characterized in that also wrap
Technique execution module is included, after the flow lifting time for current process step reaches, according to the technique in technique list
Process time carries out technique processing, and after completing the technique processing of current process step, returns and calculate next processing step
Per the flow slope and temperature regulations speed of road gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410309056.5A CN105223974B (en) | 2014-07-01 | 2014-07-01 | Technique processes the method and system of gas circuit flow control |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410309056.5A CN105223974B (en) | 2014-07-01 | 2014-07-01 | Technique processes the method and system of gas circuit flow control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105223974A CN105223974A (en) | 2016-01-06 |
| CN105223974B true CN105223974B (en) | 2018-09-18 |
Family
ID=54993003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410309056.5A Active CN105223974B (en) | 2014-07-01 | 2014-07-01 | Technique processes the method and system of gas circuit flow control |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105223974B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110016657B (en) * | 2018-01-08 | 2020-06-19 | 北京北方华创微电子装备有限公司 | Flow control method and device and reaction chamber |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4602326A (en) * | 1983-12-12 | 1986-07-22 | The Foxboro Company | Pattern-recognizing self-tuning controller |
| DE4324157A1 (en) * | 1993-07-19 | 1995-01-26 | Steinecker Anton Entwicklung | Method and device for controlling the drainage of wort from a lauter tun |
| JP4864280B2 (en) * | 2001-04-24 | 2012-02-01 | ブルックス・インストルメント・エルエルシー | Mass flow controller system and method |
| CN101943888B (en) * | 2010-07-08 | 2012-08-29 | 珠海市长陆工业自动控制系统有限公司 | Method for controlling output of belt weigher system |
-
2014
- 2014-07-01 CN CN201410309056.5A patent/CN105223974B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105223974A (en) | 2016-01-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103828028A (en) | Plasma etching method | |
| US11180855B2 (en) | Semiconductor manufacturing component comprising deposition layer covering interlayer boundary and manufacturing method thereof | |
| JP2024520536A (en) | Mass flow controller and flow control method thereof | |
| CN107958838B (en) | Method for improving in-plane uniformity of integrated etching process according to radio frequency hours | |
| KR20150135082A (en) | Method for controlling film thickness by crystal oscillation type film thickness monitor | |
| CN115491761B (en) | Control device and control method for monolithic epitaxial growth device and epitaxial wafer manufacturing system | |
| CN105223974B (en) | Technique processes the method and system of gas circuit flow control | |
| CN111665877B (en) | Pressure control method and device and photovoltaic equipment | |
| CN106567044A (en) | Film preparation cavity and method | |
| TW201344784A (en) | Cavity pressure control method | |
| JPWO2007102454A1 (en) | Temperature adjustment method | |
| CN116469790A (en) | Determination method of process parameters and semiconductor process equipment | |
| JP2017043844A5 (en) | ||
| JP7230877B2 (en) | Epitaxial wafer manufacturing system and epitaxial wafer manufacturing method | |
| JP2002343726A (en) | Heat treatment device and film forming method | |
| JP5251243B2 (en) | Vapor growth apparatus and vapor growth method of silicon epitaxial film | |
| CN108140571A (en) | For the method and apparatus of the temperature of dynamic control wet etch process | |
| TW200727359A (en) | Method and apparatus for controlling temperature of a substrate | |
| CN102443786A (en) | Method for strengthening uniformity of chemical vapor deposition film by improved plasma | |
| CN103320855A (en) | Polysilicon thin layer deposition method | |
| CN105489478B (en) | The regulation and control method of heavily doped phosphorus Substrate lamina extension transition region | |
| CN104465352B (en) | The method for eliminating polycrystalline silicon residue in polycrystalline silicon etching process | |
| CN105316756A (en) | Method for optimizing process formula in pulse electrochemical polishing process | |
| CN102929213A (en) | Noncausal effective learning control system and method of precision motion control system | |
| CN109473339A (en) | Regulate and control the method for the film thickness of polycrystalline silicon membrane in silicon nitride film layer stripping process |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information | ||
| CB02 | Change of applicant information |
Address after: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Applicant after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Beijing, Wenchang Road, No. 8, No. Applicant before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
|
| GR01 | Patent grant | ||
| GR01 | Patent grant |