CN105219545A - A kind of clean-out system for electronic material and preparation method thereof - Google Patents
A kind of clean-out system for electronic material and preparation method thereof Download PDFInfo
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- CN105219545A CN105219545A CN201510680980.9A CN201510680980A CN105219545A CN 105219545 A CN105219545 A CN 105219545A CN 201510680980 A CN201510680980 A CN 201510680980A CN 105219545 A CN105219545 A CN 105219545A
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- out system
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Abstract
The invention discloses a kind of clean-out system for electronic material, it is characterized in that: be made up of following raw material by weight percentage: APG-alkyl polyglycoside 3 ~ 5%, SAS-Seconary Alkane Sulphonate Sodium 2 ~ 4%, aminopolycanboxylic acid 0.8 ~ 1.2%, hydroxycarboxylic acid 0.8 ~ 1.2%, 12 carbon di-carboxylic acid 0.3 ~ 0.7%, isomeric alcohol polyethenoxy ether 1 ~ 2%, nitrilotriacetic acid 0.5 ~ 0.8%, lipase 0.2 ~ 0.3%, surplus is water.Clean-out system prepared by the present invention is not only harmless to operator, and its clean-out system there will not be micronised particles to be attached on cleaning object, can not cause cleaning its degradation rear, and it increases greatly to the Corrosion Protection of cleaning materials.
Description
Technical field
The present invention relates to a kind of clean-out system, be specifically related to the clean-out system and preparation method thereof for electronic material.
Background technology
Along with the progress of science and technology, microelectronic industry achieves and develops rapidly, and unicircuit is core and the basis of information industry group.Be based upon the global IT application on integrated circuit technique progress basis, networking and kownledge economy tide, make the strategic position of IC industry more and more important, also increasing on the impact of national economy, national defense construction and people's lives.Therefore, development China IC industry is the important guarantee promoting IT application in the national economy, is the most important thing of the information industry development.It is flourish that the great development of IC market must drive as easy consumption material market requisite in integrated circuit production process, as the clean-out system of one of consumable material important in the microelectronic product course of processing, has huge market.
Traditional clean-out system is to metal ion, organic and inorganic impurity and the solids cleaning on the surfaces such as ULSI substrate, electronic glass and LCD screen; not only ozone-layer depleting substance; as Freon 113 (CFC-113) and 1; 1; 1-trichloroethane etc.; and certain harm is produced to operator's health, the micronized particle in its clean-out system can be attached to cleaning object can affect its use properties, and can cause corrosion to a certain degree to cleaning object.
Summary of the invention
Goal of the invention: in order to overcome the deficiencies in the prior art, the invention provides a kind of clean-out system for electronic material and preparation method thereof.
Technical scheme: for achieving the above object, a kind of clean-out system for electronic material provided by the invention, be made up of following raw material by weight percentage: APG-alkyl polyglycoside 3 ~ 5%, SAS-Seconary Alkane Sulphonate Sodium 2 ~ 4%, aminopolycanboxylic acid 0.8 ~ 1.2%, hydroxycarboxylic acid 0.8 ~ 1.2%, 12 carbon di-carboxylic acid 0.3 ~ 0.7%, isomeric alcohol polyethenoxy ether 1 ~ 2%, nitrilotriacetic acid 0.5 ~ 0.8%, lipase 0.2 ~ 0.3%, surplus is water.
Preferred weight percent meter: APG-alkyl polyglycoside 3.5 ~ 5%, SAS-Seconary Alkane Sulphonate Sodium 3 ~ 4%, aminopolycanboxylic acid 1 ~ 1.2%, hydroxycarboxylic acid 1 ~ 1.2%, 12 carbon di-carboxylic acid 0.5 ~ 0.7%, isomeric alcohol polyethenoxy ether 1.5 ~ 2%, nitrilotriacetic acid 0.6 ~ 0.8%, lipase 0.2 ~ 0.3%, surplus is water.
Preferred weight percent meter: APG-alkyl polyglycoside 4%, SAS-Seconary Alkane Sulphonate Sodium 3%, aminopolycanboxylic acid 1%, hydroxycarboxylic acid 1%, 12 carbon di-carboxylic acid 0.6%, isomeric alcohol polyethenoxy ether 1.7%, nitrilotriacetic acid 0.7%, lipase 0.2%, surplus is water.
The preparation method of the above-mentioned clean-out system for electronic material, after taking the mixing of corresponding feed composition, ultrasonic 10 ~ 20min under hyperacoustic effect.
Beneficial effect: clean-out system prepared by the present invention is not only harmless to operator, and its clean-out system there will not be micronised particles to be attached on cleaning object, can not cause cleaning its degradation rear, and it increases greatly to the Corrosion Protection of cleaning materials.
Embodiment
Below in conjunction with embodiment, the present invention is further described.
Embodiment 1:
A kind of clean-out system for electronic material, be made up of following raw material by weight percentage: APG-alkyl polyglycoside 3%, SAS-Seconary Alkane Sulphonate Sodium 4%, aminopolycanboxylic acid 1.2%, hydroxycarboxylic acid 1.2%, 12 carbon di-carboxylic acid 0.7%, isomeric alcohol polyethenoxy ether 2%, nitrilotriacetic acid 0.8%, lipase 0.2%, surplus is water.。
Embodiment 2:
A kind of clean-out system for electronic material, be made up of following raw material by weight percentage: APG-alkyl polyglycoside 5%, SAS-Seconary Alkane Sulphonate Sodium 2%, aminopolycanboxylic acid 0.8%, hydroxycarboxylic acid 0.8%, 12 carbon di-carboxylic acid 0.3%, isomeric alcohol polyethenoxy ether 1%, nitrilotriacetic acid 0.5%, lipase 0.3%, surplus is water.
Embodiment 3:
A kind of clean-out system for electronic material, be made up of following raw material by weight percentage: APG-alkyl polyglycoside 3.5%, SAS-Seconary Alkane Sulphonate Sodium 3%, aminopolycanboxylic acid 1%, hydroxycarboxylic acid 1%, 12 carbon di-carboxylic acid 0.5%, isomeric alcohol polyethenoxy ether 1.5%, nitrilotriacetic acid 0.6%, lipase 0.2%, surplus is water.
Embodiment 4:
A kind of clean-out system for electronic material, be made up of following raw material by weight percentage: APG-alkyl polyglycoside 4%, SAS-Seconary Alkane Sulphonate Sodium 3%, aminopolycanboxylic acid 1%, hydroxycarboxylic acid 1%, 12 carbon di-carboxylic acid 0.6%, isomeric alcohol polyethenoxy ether 1.7%, nitrilotriacetic acid 0.7%, lipase 0.2%, surplus is water.
Embodiment 5:
A kind of clean-out system for electronic material, be made up of following raw material by weight percentage: APG-alkyl polyglycoside 4%, SAS-Seconary Alkane Sulphonate Sodium 3.5%, aminopolycanboxylic acid 1.1%, hydroxycarboxylic acid 1.1%, 12 carbon di-carboxylic acid 0.6%, isomeric alcohol polyethenoxy ether 1.8%, nitrilotriacetic acid 0.7%, lipase 0.25%, surplus is water.
The performance test of embodiment 1 ~ 5 is as following table:
The above is only the preferred embodiment of the present invention; be noted that for those skilled in the art; under the premise without departing from the principles of the invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (4)
1. the clean-out system for electronic material, it is characterized in that: be made up of following raw material by weight percentage: APG-alkyl polyglycoside 3 ~ 5%, SAS-Seconary Alkane Sulphonate Sodium 2 ~ 4%, aminopolycanboxylic acid 0.8 ~ 1.2%, hydroxycarboxylic acid 0.8 ~ 1.2%, 12 carbon di-carboxylic acid 0.3 ~ 0.7%, isomeric alcohol polyethenoxy ether 1 ~ 2%, nitrilotriacetic acid 0.5 ~ 0.8%, lipase 0.2 ~ 0.3%, surplus is water.
2. a kind of clean-out system for electronic material according to claim 1, it is characterized in that: be made up of following raw material by weight percentage: APG-alkyl polyglycoside 3.5 ~ 5%, SAS-Seconary Alkane Sulphonate Sodium 3 ~ 4%, aminopolycanboxylic acid 1 ~ 1.2%, hydroxycarboxylic acid 1 ~ 1.2%, 12 carbon di-carboxylic acid 0.5 ~ 0.7%, isomeric alcohol polyethenoxy ether 1.5 ~ 2%, nitrilotriacetic acid 0.6 ~ 0.8%, lipase 0.2 ~ 0.3%, surplus is water.
3. a kind of clean-out system for electronic material according to claim 1, it is characterized in that: be made up of following raw material by weight percentage: APG-alkyl polyglycoside 4%, SAS-Seconary Alkane Sulphonate Sodium 3%, aminopolycanboxylic acid 1%, hydroxycarboxylic acid 1%, 12 carbon di-carboxylic acid 0.6%, isomeric alcohol polyethenoxy ether 1.7%, nitrilotriacetic acid 0.7%, lipase 0.2%, surplus is water.
4. a preparation method for the clean-out system for electronic material according to claim 1, is characterized in that:
After taking the mixing of corresponding feed composition, ultrasonic 10 ~ 20min under hyperacoustic effect.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510680980.9A CN105219545A (en) | 2015-10-19 | 2015-10-19 | A kind of clean-out system for electronic material and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510680980.9A CN105219545A (en) | 2015-10-19 | 2015-10-19 | A kind of clean-out system for electronic material and preparation method thereof |
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| CN105219545A true CN105219545A (en) | 2016-01-06 |
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| CN201510680980.9A Pending CN105219545A (en) | 2015-10-19 | 2015-10-19 | A kind of clean-out system for electronic material and preparation method thereof |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106753865A (en) * | 2016-11-29 | 2017-05-31 | 洛阳新巨能高热技术有限公司 | Washing agent for electronic materials |
| CN106800983A (en) * | 2016-11-29 | 2017-06-06 | 洛阳新巨能高热技术有限公司 | Electronic material novel detergent |
| CN106800982A (en) * | 2016-11-29 | 2017-06-06 | 洛阳新巨能高热技术有限公司 | A kind of cleaning agent for electronic materials |
| CN106811347A (en) * | 2016-11-29 | 2017-06-09 | 洛阳新巨能高热技术有限公司 | A kind of washing agent for electronic materials |
| CN111534383A (en) * | 2020-05-09 | 2020-08-14 | 深圳市大地康恩生物科技有限公司 | Biological environment-friendly water-based cleaning agent and use method thereof |
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| CN101818103A (en) * | 2010-05-17 | 2010-09-01 | 江西瑞思博化工有限公司 | Washing agent for electronic materials |
| CN102653707A (en) * | 2011-03-03 | 2012-09-05 | 宁波市鄞州声光电子有限公司 | Electronic component decontamination fluid |
| CN102653706A (en) * | 2011-03-03 | 2012-09-05 | 宁波市鄞州声光电子有限公司 | Nonmetallic element cleaner |
| CN103737200A (en) * | 2013-08-27 | 2014-04-23 | 工业和信息化部电子第五研究所华东分所 | Water-based environment-friendly scaling powder |
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- 2015-10-19 CN CN201510680980.9A patent/CN105219545A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101818103A (en) * | 2010-05-17 | 2010-09-01 | 江西瑞思博化工有限公司 | Washing agent for electronic materials |
| CN102653707A (en) * | 2011-03-03 | 2012-09-05 | 宁波市鄞州声光电子有限公司 | Electronic component decontamination fluid |
| CN102653706A (en) * | 2011-03-03 | 2012-09-05 | 宁波市鄞州声光电子有限公司 | Nonmetallic element cleaner |
| CN103737200A (en) * | 2013-08-27 | 2014-04-23 | 工业和信息化部电子第五研究所华东分所 | Water-based environment-friendly scaling powder |
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| 詹益兴: "《现代化工小商品制法大全 第3集》", 31 August 1999 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106753865A (en) * | 2016-11-29 | 2017-05-31 | 洛阳新巨能高热技术有限公司 | Washing agent for electronic materials |
| CN106800983A (en) * | 2016-11-29 | 2017-06-06 | 洛阳新巨能高热技术有限公司 | Electronic material novel detergent |
| CN106800982A (en) * | 2016-11-29 | 2017-06-06 | 洛阳新巨能高热技术有限公司 | A kind of cleaning agent for electronic materials |
| CN106811347A (en) * | 2016-11-29 | 2017-06-09 | 洛阳新巨能高热技术有限公司 | A kind of washing agent for electronic materials |
| CN111534383A (en) * | 2020-05-09 | 2020-08-14 | 深圳市大地康恩生物科技有限公司 | Biological environment-friendly water-based cleaning agent and use method thereof |
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Application publication date: 20160106 |
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