CN105159502A - Touch panel and manufacturing method therefor - Google Patents
Touch panel and manufacturing method therefor Download PDFInfo
- Publication number
- CN105159502A CN105159502A CN201510616127.0A CN201510616127A CN105159502A CN 105159502 A CN105159502 A CN 105159502A CN 201510616127 A CN201510616127 A CN 201510616127A CN 105159502 A CN105159502 A CN 105159502A
- Authority
- CN
- China
- Prior art keywords
- layer
- contact panel
- frame
- conducting film
- white
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Materials For Photolithography (AREA)
- Position Input By Displaying (AREA)
Abstract
The invention provides a touch panel. The touch panel comprises a transparent substrate, frame layers positioned on the substrate and formed by white or colorful printing ink, a visible region defined by the frame layers, and BM layers positioned on the frame layers and prepared from black photoresist materials, wherein the BM layers are wider than the frame layers by 0.08-2.0 mm in an extension direction from the frame layers on the periphery to the visible region in the middle. According to the invention, the coating performance of the touch panel can be improved, the short-circuit and open-circuit risks of the touch panel are completely eliminated, and the thicknesses of the frame layers formed by the white or colorful printing ink can be reduced; and the touch panel with novel appearance can be provided.
Description
Technical field
The invention belongs to electron device preparing technical field, be specifically related to a kind of contact panel and preparation method thereof.
Background technology
See Fig. 1, the frame layer 2 of monobasal formula capacitive touch screen is arranged on the surrounding of the visible area 3 of substrate 1, because the solid content particle of ink material is larger, can present on microcosmic in ink pellet surface after using the solidification of the frame layer of ink material uneven whole, this is uneven whole when causing utilizing magnetic control sputtering plating technology to carry out plated film (plating ITO layer) in subsequent step, because plated film rete is nanoscale, and ink thickness is micron order, thus film plating layer cannot fill the uneven whole place of ink completely, such meeting forms the risk causing short open circuit in the lithographic process etching process of electrode at subsequent conductive film.
Disclose the preparation method of white frame in a kind of white OGS touch screen in application for a patent for invention CN201510114819.5, comprise the following steps: a) cleaning touch-screen glass plate; B) at the frame region serigraphy first white ink layer of touch-screen glass plate; C) at the upper surface serigraphy second white ink layer of the first white ink layer; D) solidify; E) cleaning touch-screen glass plate; F) painting black photoresistance; G) precuring process is carried out to black photoresistance; H) expose; I) develop, form the black light resistance layer of frame shape; J) process is cured to black light resistance layer, completes the making of white frame; Adopt untouchable coating process spray black photoresistance, and form the black light resistance layer being positioned at the superiors eventually through exposure imaging, avoid impurity to be brought in product; Black photoresistance is not substantially exitted under high temperature plated film, greatly improves plated film film quality; In addition, black light antiplastering degree is low, can improve the smooth finish of product surface; Inkjet prints energy selective dump black photoresistance, saves production cost.In brief, above-mentioned patented claim is the black light resistance layer forming one deck and white frame ink layer commensurateiy wide at the coated thereon of frame layer, for the out-of-flatness problem that solution silk-screen black ink layer brings.
On white frame, form black light resistance layer to solve the out-of-flatness problem of ink for screen printing although relate in above-mentioned patented claim, the program is only reduction of the probability causing the short-and-medium open circuit risk of subsequent process, and cannot avoid this problem completely.
Summary of the invention
The application sends out inventor and finds in R&D process, although the contact panel that such scheme is formed can reduce the short-and-medium open circuit risk of subsequent manufacturing steps to a certain extent, still cannot avoid this risk completely.Thus, the structure of inventor to this contact panel is further furtherd investigate, and pinpointing the problems may be on the vertical side that the frame layer that still can adjoin with white ink frame layer is close with visible area.Therefore, the present inventor specially arranges a kind of BM layer larger than the width of white ink frame layer, to cover upper surface and the side of white ink frame layer completely.
Therefore, the invention provides a kind of contact panel, comprise transparency carrier, be positioned on substrate and the frame layer formed by white or colored ink, surrounded the visible area that formed by frame layer and be positioned at frame layer prepares BM layer by black photoresist, and at the frame layer from surrounding on the bearing of trend of the visible area of centre, all wide than the width of the described frame layer 0.08 ~ 2.0mm of width of described BM layer.
In a kind of concrete embodiment, insulation impedance>=10 of described black photoresist
12Ω, and described photoresist is one or more in polymethylmethacrylate, phenolics and polysilane.
In a kind of concrete embodiment, the thickness of described frame layer 2 is 12 ~ 40 μm, and be preferably 15 ~ 25 μm, the thickness of described BM layer 4 is 0.8 ~ 3 μm, is preferably 1.5 ~ 2.5 μm.
In a kind of concrete embodiment, described contact panel also comprises the conducting film wiring layer 5 be positioned on BM layer 4 and the conducting film trace layer 6 be positioned on conducting film wiring layer 5.
In a kind of concrete embodiment, described conducting film wiring layer 5 is integrally formed at rim area and the visible area of contact panel, and described conducting film wiring layer 5 comprises ITO1 layer, OC1 layer and ITO2 layer successively at thickness direction from being close to BM layer 4, wherein ITO1 layer and ITO2 layer are conductive layer, and OC1 layer is insulation course.
In a kind of concrete embodiment; described conducting film trace layer 6 is metallic circuit layer and it is positioned at the rim area of contact panel; the OC2 layer for conducting film trace layer 6 and conducting film wiring layer 5 described in covering protection is also comprised in described contact panel; described OC2 layer is integrally formed at rim area and the visible area of contact panel, and is insulating protective layer.
In a kind of concrete embodiment, at the frame layer 2 from surrounding on the bearing of trend of the visible area 3 of centre, all wide than the width of the described frame layer 2 0.3 ~ 1.5mm of width of described BM layer 4.
The present invention is the corresponding preparation method providing a kind of contact panel described above also, comprise white that first silk-screen is two-layer or more on the glass substrate or colored ink forms frame layer 2, then on frame layer 2 painting black photoresist adopt photoetching micro-shadow technology to form described BM layer 4.
In a kind of concrete embodiment, described method also comprises and on BM layer 4, directly arranges conducting film wiring layer 5 and conducting film trace layer 6 by magnetic control sputtering plating technology and the micro-shadow technology of photoetching.In a kind of concrete embodiment, form the coating of described BM layer 4 and photoetching micro-shadow technology and specifically comprise coating, pre-baked, exposure, development, solid roasting and high heat baking step.
Particularly, the invention provides a kind of method adopting BM (BlackMatrix black matrix") layer to prepare touch screen, comprise a, on plain glass substrate, utilize the white ink that half tone silk-screen technology silk-screen gross thickness is δ 1 to form frame pattern; B, employing clearance type coating technique white ink layer are coated with the BM coating that a layer thickness is δ 2 in step a; C, the micro-shadow technology of employing photoetching, be portrayed as the frame pattern of the protective cover sheet of setting, the frame large 0.08 ~ 2.0mm more monolateral than the white ink frame formed in step a that BM is formed by the BM coating in step b; D, on the glass substrate of completing steps c, magnetic control sputtering plating technology and the micro-shadow technology of photoetching is utilized to complete touch-control sensor structure (touch-control sensor structure is divided into ITO1 layer, OC1 layer, ITO2 layer, metallic circuit layer and OC2 layer).
Technical scheme provided by the invention is except promoting the coating performance also thorough problem solving above-mentioned short open circuit risk of contact panel.The present invention at least can also bring following several benefit.
1) in the present invention, the use of BM layer can make the thickness of the frame layer that white or colored ink are formed in the present invention less, such as, be reduced to 15 ~ 25 μm by 25 ~ 40 μm, even at 15 ~ 20 μm; Thickness because of BM layer is inevitable within 3 μm, but this makes to provide the overall thinner control panel meeting OD value needs completely of a kind of frame layer in the present invention, and scheme provided by the invention makes the optical characteristics of control panel be improved.
Particularly, frame layer of the prior art is mostly pure white or color border layer, because white and optical density (OD) OD (OpticalDensity) value of colored ink are at about 0.5-2.0; Optical density (OD) OD value is lower, white or color border layer printing opacity larger; And the optical characteristics of OD >=4 of product frame layer will be reached, then whole white and color border layer thickness must up to the thickness of 25-40 μm.For solving white and the too small easy printing opacity problem of colored ink optical density (OD) OD value; first above frame layer 2 and visible area 3, the BM layer 4 that one deck black photosensitive material shaped material forms whole protection is coated with in the present invention; to fill out burnishing surface region; again by the micro-shadow technology of photoetching, BM layer is portrayed as the frame pattern of the protective cover sheet of setting.
2) the invention provides the control panel (as shown in Figure 5 a) being close to a narrow limit dark border layer inside a kind of white or colored Wide frame layer, this is obviously different from pure white of the prior art or colored Wide frame layer control panel, for provides the art a kind of more attractive in appearance and control panel of practicality.
3) described contact panel also comprises when being integrally formed at conducting film wiring layer 5 on BM layer 4 and conducting film trace layer 6, and described contact panel is monobasal contact panel, and this can give as user bring lighter and thinner experience.
Accompanying drawing explanation
Fig. 1 is the thickness direction schematic diagram that prior art comprises the contact panel substrate of frame layer,
Fig. 2 is the front schematic view that prior art comprises the contact panel substrate of frame layer,
Fig. 3 is structural representation when being coated with BM layer in the present invention and not developing,
Fig. 4 is the thickness direction structural representation of a kind of contact panel product in the present invention,
Fig. 5 is the schematic diagram of the front and back of product in Fig. 4, and wherein a is front, and b is the back side,
Fig. 6 is the thickness direction structural representation of a kind of contact panel product containing touch-control structure in the present invention.
Wherein, 1, substrate, 2, frame layer, 3, visible area, 4, BM layer, 5, conducting film wiring layer, 6, conducting film trace layer.
Embodiment
Below in conjunction with accompanying drawing, further describe the specific embodiment of the present invention.
A kind of contact panel is provided in Fig. 4 and Fig. 5 of the present invention, comprise transparency carrier 1, be positioned on substrate 1 and the frame layer 2 formed by white or colored ink, surrounded the visible area 3 that formed by frame layer and be positioned at frame layer 2 prepares BM layer 4 by black photoresist, and at the frame layer 2 from surrounding on the bearing of trend of the visible area 3 of centre, all wide than the width of the described frame layer 2 0.08 ~ 2.0mm of width of described BM layer 4.
In the present invention, the ink that described white or colored ink refer to certain region on substrate is white or colored, is namely homogeneous white or colour in the color of the thickness direction curing ink of ink layer.It will be appreciated by those skilled in the art that ground, the ink of whole frame layer can comprise white and colour simultaneously, and the upper of such as frame layer is white below, and limit, left and right is red.Those skilled in the art can understand ground, in contact panel of the present invention, with in the plane of substrate-parallel, the periphery of the width of described frame layer 2 is concordant with the periphery of the width of described BM layer 4, and the inner side of the width of BM layer 4 is all wider than the inner side of the width of frame layer 2.
The situation of to be substrate the be rectangular slab shown in Fig. 5 of the present invention, above the frame layer on its four limit, wider all than described frame layer 2 of the width of described BM layer 4.Those skilled in the art can understand ground, and described substrate can be circular or other shape, and frame layer now and BM layer can be circular or other shape equally, and the width of BM layer is now also all wider than described frame layer towards side, center.
Generally directly touch-control sensor structure can not be completed on frame layer 2 by magnetic control sputtering plating technology and the micro-shadow technology of photoetching in prior art, but the touch-control structure containing conducting film wiring layer 5, conducting film trace layer 6 and second substrate is fastened on frame layer 2, interfix and form the contact panel being with touch controllable function.Similarly, also the touch-control structure containing conducting film wiring layer 5, conducting film trace layer 6 and second substrate can be fastened on BM layer 4 in the present invention.Altogether containing two plate bases in such contact panel, thus the reliability of this contact panel is higher, but product is thicker.In another kind of mode, the present invention directly can arrange conducting film wiring layer 5 and conducting film trace layer 6 on BM layer 4, in this fashion, because flatness is micron-sized frame layer 2 is that nano level BM layer 4 is coarse than flatness, when thus the width of BM layer 4 being arranged wider than the width of frame layer 2, namely frame layer covers and conducting film wiring layer 5 also can not contact with coarse frame layer 2 in the side of visible area by BM layer completely, and experiment finds obvious like this yield and the reliability being beneficial to contact panel.A kind ofly directly be arranged in the mode on BM layer 4 by conducting film wiring layer 5 and conducting film trace layer 6 rear, altogether containing a plate base in such contact panel, thus this contact panel is thinner, and Consumer's Experience is better.In the present invention, described BM layer width is set to can also bring another benefit than the wide 0.08 ~ 2.0mm of the width of frame layer 2, it can make to contain black surround effect around the visible area of final contact panel, as the BM layer 4 in Fig. 5 a demonstrates black surround effect in product front, such product is more attractive in appearance, can be subject to liking of user.
In the present invention, insulation impedance>=10 of described black photoresist
12Ω, such BM layer makes it possible to be wholely set the touch-control structure such as conducting film wiring layer 5 and conducting film trace layer 6 thereon easily.
The thickness of described frame layer is preferably 15 ~ 25 μm, and the thickness of described BM layer is preferably 1.5 ~ 2.5 μm.Those skilled in the art understand ground, and the silk-screen number of plies of silk-screen frame layer is generally more than 2 layers, and the thickness of every layer is such as 6 ~ 9 μm.Coating BM layer cross thin may cause cover bad, be coated with blocked up, may cause ill-exposed.The present invention, by arranging certain thickness BM layer, makes the white of silk-screen or color border layer can accomplish thinner compared to existing technology, and the OD value of the rim area of the contact panel so formed can meet the requirement being more than or equal to 4.
As shown in Figure 6, contact panel of the present invention also comprises the conducting film wiring layer 5 be positioned on BM layer 4 and the conducting film trace layer 6 be positioned on conducting film wiring layer 5.Particularly, described conducting film wiring layer 5 is integrally formed at rim area and the visible area of contact panel, and described conducting film wiring layer 5 comprises ITO1 layer, OC1 layer and ITO2 layer successively at thickness direction from being close to BM layer 4, wherein ITO1 layer and ITO2 layer are conductive layer, and OC1 layer is insulation course.Described conducting film trace layer 6 is metallic circuit layer and it is positioned at the rim area of contact panel; the OC2 layer for conducting film trace layer 6 and conducting film wiring layer 5 described in covering protection is also comprised in described contact panel; described OC2 layer is integrally formed at rim area and the visible area of contact panel, and is insulating protective layer.
A kind of preparation method of contact panel described above, comprise white that first silk-screen is two-layer or more on the glass substrate or colored ink forms frame layer 2 (as depicted in figs. 1 and 2), then on frame layer 2 painting black photoresist (as shown in Figure 3) adopt photoetching micro-shadow technology to form described BM layer 4.
In the present invention, described coating is such as clearance type coating, adopts coating machine to be coated with.Micron-sized ink material compared by photoresist in the present invention, and it is evenly fine and smooth, can reach nanoscale flatness like a cork.Described white or colored ink are such as photoresist well known to those skilled in the art.In the present invention, the character of described BM layer determines that it needs to use the mode of coating to be attached on frame layer, and silk-screen or alternate manner can not be adopted to complete.Described coating is formed in the process of BM layer, comprises and first uses coating machine on frame layer, be coated with the photoresist of one deck exact thickness, re-use the light shield of specific pattern, and make to be left by the position of illumination, the position be not irradiated by light is developed.Also can take contrary mode, be namely finally developed by the position of illumination, and the position be blocked leave formation target pattern.Particularly, the coating technique related in the present invention and photoetching micro-shadow technology all can use mode well known in the prior art.
In a kind of concrete embodiment, described method also comprises and on BM layer 4, directly arranges conducting film wiring layer 5 and conducting film trace layer 6 by magnetic control sputtering plating technology and the micro-shadow technology of photoetching.Particularly, form the coating of described BM layer 4 and photoetching micro-shadow technology and comprise coating, pre-baked, exposure, development, solid roasting and high heat baking step.
Particularly, described method comprises the steps:
Step one, utilize half tone silk-screen technology to use on plain glass substrate as depicted in figs. 1 and 2 white ink collocation half tone tension force is 20-26N, emulsion thickness 6-10 μm, order number are 140T screen painting, obtained ink total film thickness at 10-25 μm, optical density (OD) OD value >=2, adhesion grade are the window border of 5B.
Step 2, as shown in Fig. 3 ~ Fig. 5, clearance type coating technique is adopted in step one, viscosity to be by plain glass substrate 2.6CPS, insulation impedance > 10
12the BM black photoresist of Ω through coating, pre-baked, exposure, development, solid roasting, frame that high-temperature baking forms setting, the frame that BM is formed large 0.08-2.0mm more monolateral than the white ink frame formed in step one; BM frame covers white ink frame completely.Adhesion grade is the thickness of 5, BM coating is 1.0-2.0 μm.
Step 3, (touch-control sensor structure is divided into ITO1 layer, OC1 layer, ITO2 layer on the glass substrate of completing steps two, to utilize magnetic control sputtering plating technology and the micro-shadow technology of photoetching to complete touch-control sensor structure as shown in Figure 6, metallic circuit layer and OC2 layer) foundation, formed OGS.Also substrate step 2 can produced is as protective cover sheet, and extra increase external hanging type touch-control sensor (touch-control sensor containing conducting film wiring layer 5, conducting film trace layer 6 and second substrate), laminating assembling forms touch-screen with it.
The present invention arranges one deck BM protective seam with side coating on ink frame layer; covered the design of ink frame layer with BM protective seam by the application; can, former sags and crests planarization, make to cause causing in lithographic process etching process below the risk of short open circuit because ink pellet surface sags and crests affects coating effects when adopting magnetic control sputtering plating technology to carry out plated film.
And, in the present invention, the BM frame protective seam be on ink frame layer adopts the photosensitive material of black, the optical density (OD) OD value ratio of black-colored photosensitive material is white and colored ink is higher, the thickness of BM frame protective seam can reach the optical characteristics of OD=4 between 0.8 μm-3 μm, and the optical density (OD) OD value of white ink is very low, reach the optical characteristics of OD=4, then whole frame layer thickness must up to 25-40 μm, adopt BM frame layer can reduce the print thickness of white and colored ink while keeping product optical density (OD) OD value in standard specification.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. a contact panel, comprise transparency carrier (1), be positioned at the upper and frame layer (2) that is that formed by white or colored ink of substrate (1), surrounded the visible area (3) that formed by frame layer and be positioned at frame layer (2) prepares BM layer (4) by black photoresist, and at the frame layer (2) from surrounding on the bearing of trend of the visible area (3) of centre, all wide than the width of described frame layer (2) 0.08 ~ 2.0mm of width of described BM layer (4).
2. contact panel according to claim 1, is characterized in that, insulation impedance>=10 of described black photoresist
12Ω, and described photoresist is one or more in polymethylmethacrylate, phenolics and polysilane.
3. contact panel according to claim 1, it is characterized in that, the thickness of described frame layer (2) is 12 ~ 40 μm, and be preferably 15 ~ 25 μm, the thickness of described BM layer (4) is 0.8 ~ 3 μm, is preferably 1.5 ~ 2.5 μm.
4. contact panel according to claim 1, it is characterized in that, described contact panel also comprises the conducting film wiring layer (5) be positioned on BM layer (4) and the conducting film trace layer (6) be positioned on conducting film wiring layer (5).
5. contact panel according to claim 4, it is characterized in that, described conducting film wiring layer (5) is integrally formed at rim area and the visible area of contact panel, and described conducting film wiring layer (5) comprises ITO1 layer, OC1 layer and ITO2 layer successively at thickness direction from being close to BM layer (4), wherein ITO1 layer and ITO2 layer are conductive layer, and OC1 layer is insulation course.
6. contact panel according to claim 5; it is characterized in that; described conducting film trace layer (6) is for metallic circuit layer and it is positioned at the rim area of contact panel; the OC2 layer for conducting film trace layer (6) and conducting film wiring layer (5) described in covering protection is also comprised in described contact panel; described OC2 layer is integrally formed at rim area and the visible area of contact panel, and is insulating protective layer.
7. contact panel according to claim 1, it is characterized in that, at the frame layer (2) from surrounding on the bearing of trend of the visible area (3) of centre, all wide than the width of described frame layer (2) 0.3 ~ 1.5mm of width of described BM layer (4).
8. the preparation method as contact panel as described in any one in claim 1 ~ 7, comprise white that first silk-screen is two-layer or more on the glass substrate or colored ink forms frame layer (2), then adopt photoetching micro-shadow technology to form described BM layer (4) at the upper painting black photoresist of frame layer (2).
9. method according to claim 8, is characterized in that, described method also comprises and on BM layer (4), directly arranges conducting film wiring layer (5) and conducting film trace layer (6) by magnetic control sputtering plating technology and the micro-shadow technology of photoetching.
10. method according to claim 8, is characterized in that, forms the coating of described BM layer (4) and photoetching micro-shadow technology and specifically comprises coating, pre-baked, exposure, development, solid roasting and high heat baking step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510616127.0A CN105159502B (en) | 2015-09-24 | 2015-09-24 | A kind of contact panel and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510616127.0A CN105159502B (en) | 2015-09-24 | 2015-09-24 | A kind of contact panel and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105159502A true CN105159502A (en) | 2015-12-16 |
| CN105159502B CN105159502B (en) | 2018-05-15 |
Family
ID=54800380
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510616127.0A Active CN105159502B (en) | 2015-09-24 | 2015-09-24 | A kind of contact panel and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105159502B (en) |
Cited By (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106145642A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145644A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145649A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145625A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145650A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145627A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145645A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145630A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145646A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145648A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145643A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145633A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145629A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145631A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145651A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145632A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145628A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145652A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145647A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145641A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106167352A (en) * | 2016-06-24 | 2016-11-30 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106167348A (en) * | 2016-06-24 | 2016-11-30 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN107193413A (en) * | 2017-05-12 | 2017-09-22 | 京东方科技集团股份有限公司 | Touch-control display module and preparation method thereof, touch display unit |
| TWI602096B (en) * | 2016-06-29 | 2017-10-11 | Interface Optoelectronics (Shenzhen) Co Ltd | Touch panel and method of manufacturing the same |
| CN107686250A (en) * | 2016-08-05 | 2018-02-13 | 东莞市瑞立达玻璃盖板科技股份有限公司 | A kind of button glass printing technique |
| CN108383395A (en) * | 2016-12-26 | 2018-08-10 | 蓝思科技（长沙）有限公司 | A kind of technique and its application carrying out glass colouring using photosensitive coating |
| CN108565547A (en) * | 2016-12-22 | 2018-09-21 | 蓝思科技（长沙）有限公司 | Rear cover and preparation method thereof |
| CN108920004A (en) * | 2018-06-30 | 2018-11-30 | 云谷（固安）科技有限公司 | Preparation method, conductive laminate structure and the touch panel of conductive laminate structure |
| CN109843595A (en) * | 2016-12-09 | 2019-06-04 | 株式会社Lg化学 | Using the UV pattern forming method of ink jet printing, including its frame manufacturing method and according to its manufacture frame |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103294274A (en) * | 2013-06-03 | 2013-09-11 | 南昌欧菲光显示技术有限公司 | Panel |
| CN104635993A (en) * | 2015-03-17 | 2015-05-20 | 蚌埠玻璃工业设计研究院 | Method for preparing white frame in white OGS touch screen |
| CN104700721A (en) * | 2015-02-12 | 2015-06-10 | 京东方科技集团股份有限公司 | Display panel and manufacturing method thereof as well as display device |
| CN104808884A (en) * | 2015-05-08 | 2015-07-29 | 蓝思科技（长沙）有限公司 | Capacitive touch screen and terminal device containing capacitive touch screen |
-
2015
- 2015-09-24 CN CN201510616127.0A patent/CN105159502B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103294274A (en) * | 2013-06-03 | 2013-09-11 | 南昌欧菲光显示技术有限公司 | Panel |
| CN104700721A (en) * | 2015-02-12 | 2015-06-10 | 京东方科技集团股份有限公司 | Display panel and manufacturing method thereof as well as display device |
| CN104635993A (en) * | 2015-03-17 | 2015-05-20 | 蚌埠玻璃工业设计研究院 | Method for preparing white frame in white OGS touch screen |
| CN104808884A (en) * | 2015-05-08 | 2015-07-29 | 蓝思科技（长沙）有限公司 | Capacitive touch screen and terminal device containing capacitive touch screen |
Cited By (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106145651A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145633A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145642A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145625A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145650A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145627A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145645A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145630A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145646A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145648A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145643A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145632A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145629A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145631A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145649A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145628A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145644A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145652A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145647A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106145641A (en) * | 2016-06-24 | 2016-11-23 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106167352A (en) * | 2016-06-24 | 2016-11-30 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| CN106167348A (en) * | 2016-06-24 | 2016-11-30 | 维沃移动通信有限公司 | The manufacture method of a kind of glass cover-plate, glass cover-plate and mobile terminal |
| TWI602096B (en) * | 2016-06-29 | 2017-10-11 | Interface Optoelectronics (Shenzhen) Co Ltd | Touch panel and method of manufacturing the same |
| CN107686250A (en) * | 2016-08-05 | 2018-02-13 | 东莞市瑞立达玻璃盖板科技股份有限公司 | A kind of button glass printing technique |
| US11447647B2 (en) | 2016-12-09 | 2022-09-20 | Lg Chem, Ltd. | UV pattern forming method using inkjet printing, bezel manufacturing method including same, and bezel manufactured according thereto |
| CN109843595A (en) * | 2016-12-09 | 2019-06-04 | 株式会社Lg化学 | Using the UV pattern forming method of ink jet printing, including its frame manufacturing method and according to its manufacture frame |
| CN108565547A (en) * | 2016-12-22 | 2018-09-21 | 蓝思科技（长沙）有限公司 | Rear cover and preparation method thereof |
| CN108383395A (en) * | 2016-12-26 | 2018-08-10 | 蓝思科技（长沙）有限公司 | A kind of technique and its application carrying out glass colouring using photosensitive coating |
| CN107193413B (en) * | 2017-05-12 | 2020-12-04 | 京东方科技集团股份有限公司 | Touch display module, manufacturing method thereof and touch display device |
| CN107193413A (en) * | 2017-05-12 | 2017-09-22 | 京东方科技集团股份有限公司 | Touch-control display module and preparation method thereof, touch display unit |
| CN108920004A (en) * | 2018-06-30 | 2018-11-30 | 云谷（固安）科技有限公司 | Preparation method, conductive laminate structure and the touch panel of conductive laminate structure |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105159502B (en) | 2018-05-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105159502A (en) | Touch panel and manufacturing method therefor | |
| CN103547984B (en) | Electrically-conductive backing plate and the contact type panel including this electrically-conductive backing plate | |
| CN102636904B (en) | Color filter and production method thereof as well as liquid crystal panel | |
| JP4024172B2 (en) | Electrophoretic display device and manufacturing method | |
| WO2016074528A1 (en) | Uv film sensor and preparation method therefor, and touch control screen | |
| US20160342018A1 (en) | Manufacturing Method of a Color Filter Substrate | |
| WO2009147888A1 (en) | Charged particle movement-type display panel, method for producing charged particle movement-type display panel, and charged particle movement-type display device | |
| JP4107384B2 (en) | Method for manufacturing color filter substrate for liquid crystal display device | |
| CN203025672U (en) | Touch panel and cover plate structure thereof | |
| CN208207779U (en) | A kind of metal grill touch screen | |
| CN108363233A (en) | Colored filter substrate and preparation method thereof | |
| CN103926809A (en) | Preparation method of substrate | |
| CN106773251A (en) | A kind of color membrane substrates and preparation method thereof and display panel and display | |
| CN204965395U (en) | Touch panel | |
| WO2023071451A1 (en) | Metal grid conductive film and preparation method therefor | |
| CN106814535A (en) | A kind of method and product for preparing glass plate of the surface containing fine line pattern | |
| CN108017288B (en) | Glass plate containing dazzling printing ink layer and preparation method thereof | |
| CN113068347A (en) | Cover plate, electronic equipment and preparation method of cover plate | |
| CN211457614U (en) | Shell assembly and electronic equipment | |
| WO2019052216A1 (en) | Capacitive touch screen capable of reducing side light reflection | |
| TW201005395A (en) | Liquid crystal display panel and fabrication method thereof | |
| KR20060024939A (en) | Color filter substrate for lcd and fabricating methode thereof | |
| CN113759629A (en) | Multifunctional upper layer structure of electronic ink and manufacturing method | |
| CN109696756A (en) | The manufacturing method and display panel of display panel | |
| KR20050032836A (en) | Method for fabricating a color filter substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |