CN105137723B - A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing - Google Patents
A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing Download PDFInfo
- Publication number
- CN105137723B CN105137723B CN201510621673.3A CN201510621673A CN105137723B CN 105137723 B CN105137723 B CN 105137723B CN 201510621673 A CN201510621673 A CN 201510621673A CN 105137723 B CN105137723 B CN 105137723B
- Authority
- CN
- China
- Prior art keywords
- compound hinges
- screw
- workbench
- drive block
- piezoelectric stack
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000012545 processing Methods 0.000 title claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims description 74
- 238000006073 displacement reaction Methods 0.000 claims description 12
- 230000005611 electricity Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 description 9
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 5
- 230000003068 static effect Effects 0.000 description 3
- NMFHJNAPXOMSRX-PUPDPRJKSA-N [(1r)-3-(3,4-dimethoxyphenyl)-1-[3-(2-morpholin-4-ylethoxy)phenyl]propyl] (2s)-1-[(2s)-2-(3,4,5-trimethoxyphenyl)butanoyl]piperidine-2-carboxylate Chemical compound C([C@@H](OC(=O)[C@@H]1CCCCN1C(=O)[C@@H](CC)C=1C=C(OC)C(OC)=C(OC)C=1)C=1C=C(OCCN2CCOCC2)C=CC=1)CC1=CC=C(OC)C(OC)=C1 NMFHJNAPXOMSRX-PUPDPRJKSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Landscapes
- Micromachines (AREA)
- Details Of Measuring And Other Instruments (AREA)
Abstract
The present invention relates to a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing, belong to Ultra-precision Turning field.From X to, Y-direction, three workbench of the piezoelectric stacks driving with flexible hinge structure of Z-direction, the fine motion in tri- directions of X, Y, Z can be achieved, three piezoelectric stacks carry out pretension by pre-loading screw respectively, the all directions of workbench are driven by single piezoelectric stack, it is to avoid move the disturbance to the driving direction in other directions；The drive signal that frequency is identical and phase difference is not zero is passed to three piezoelectric stacks, two-dimensional elliptic motion or three-dimensional elliptical motion of the workbench in space can be realized, by controlling elliptic motion parameter, it can adjust oval orientation and size, workbench X is joined end to end using straight beam formula hinge to the flexible hinge of, Y-direction and combined；Workbench of the present invention processing is simple, small volume and has preferable load space, and high frequency, the motion of continuous three-dimensional elliptical can be achieved.
Description
Technical field
The invention belongs to Ultra-precision Turning field, more particularly to a kind of three-dimensional elliptical for two-photon polymerized processing is transported
Dynamic workbench.
Background technology
The application of micro-nano structure function element is not exclusively to information and mechanics of communication, the industry such as space, safety and defence
Field, and it is directed to the social development such as health, the energy, environment field.Two-photon polymerized (Two Photon
Polymerization, TPP) it is considered to obtain most promising one kind side of micro-nano structure function element by many scholars
Method.This is primarily due to：(1) TPP has very high spatial resolution, can generally obtain 100nm or smaller feature chi
It is very little；(2) polymerizable material needed for TPP is relatively broad, is also easy to by simple process such as chemical plating or chemical vapor depositions
Obtain specific metal surface；(3) TPP technique is simple, and required technological equipment is also uncomplicated, less demanding to processing environment；
(4) volume elements (Voxel) formed by TPP can construct arbitrarily complicated geometry.
In existing research, according to Exposure mode, mainly there are two kinds of scan methods：I.e. precise positioning is scanned
(Pinpoint Scanning) and continuous scanning (Continuous Scanning).Precise positioning scan method is in each essence
True position is exposed to polymeric material, and this method is relatively easy to control the parameter of influence exposure, can obtain very high shaping essence
Degree, but it is time-consuming oversize.Continuous scan method is continued in the translation relative to exemplar or exemplar relative to laser beam in laser beam
Exposure, this method has higher processing efficiency but is limited to matching between laser power and feed speed, obtained into
Shape precision is relatively low.
The content of the invention
The present invention provides a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing, to realize workpiece to be added
Relative to the plan static exposure of laser during fast feed, how to solve in the same of precise motion platform high speed feed
When, workpiece to be added is produced and feed speed is in opposite direction, size same speed, and then realize workpiece to be added in laser spot
This urgent problem to be solved of the plan static exposure at place.
The technical solution adopted by the present invention is：Side shield one is connected by screw three, screw four with bottom plate, side shield two-way
Cross screw five, screw six to be connected with bottom plate, the fixing end one of the workbench with hinge arrangement is installed by screw seven, screw eight
On side shield one；Fixing end two is arranged on side shield two by screw nine, screw ten, and X passes through to piezoelectric stack one
Pre-loading screw one and X is to drive block apical grafting, and Y-direction piezoelectric stack two passes through pre-loading screw two and Y-direction drive block apical grafting, Z-direction block
X is fixed on on drive block by fixing screws one, fixing screws two, and Z-direction piezoelectric stack three is arranged on Z-direction block, is led to
Cross bottom pre-loading screw three and objective table apical grafting；X is consistent to the direction of piezoelectric stack one with X to displacement transducer, installed in X to pressure
Electricity is stacked in side through hole one by one, is fixed by trip bolt three；Y-direction displacement transducer is consistent with the direction of Y-direction piezoelectric stack two, installs
In the side through hole of Y-direction piezoelectric stack 21, fixed by trip bolt four；Z-direction displacement transducer and the direction one of Z-direction piezoelectric stack three
Cause, on Z-direction block, in the side of Z-direction piezoelectric stack three, fixed by trip bolt five；
The workbench with hinge arrangement is from objective table, X to drive block, Y-direction drive block, fixing end one, fixing end
Two are formed by connecting by the flexible hinge between them, and the objective table passes through flexible hinge one, flexible hinge two, flexible hinge
3rd, flexible hinge four connects with X to drive block, and X is to drive block by compound hinges one, compound hinges two, compound hinges three, compound
Hinge four is connected with Y-direction drive block, and compound hinges one is symmetrical junction relative to main body Y-direction center with compound hinges two
Structure, compound hinges three is symmetrical structure relative to main body Y-direction center with compound hinges four；Compound hinges one and compound hinges
2nd, compound hinges three is symmetrically distributed in X to drive block two ends with compound hinges four, is connected with Y-direction drive block, compound hinges five
Relative to main body X it is symmetrical structure to center with compound hinges six, compound hinges seven and compound hinges eight are relative to main body X
It is symmetrical structure to center, compound hinges five is symmetrically distributed in Y with compound hinges six, compound hinges seven and compound hinges eight
To drive block two ends, both sides are connected with fixing end one, fixing end two respectively；
The compound hinges one, compound hinges two, compound hinges three or compound hinges four are respectively by four straight beam type hinges
Join end to end composition.
It is real by the active control to piezoelectric stack one, piezoelectric stack two, the amplitude of piezoelectric stack three, frequency and phase
Existing workbench does two-dimensional elliptic motion or three-dimensional elliptical motion in space.
The advantage of the invention is that：
(1) all directions drive by single piezoelectric stack, are respectively mutually in series to motion, respectively to not moved between motion
Coupling, while reducing the infringement that piezoelectric stack occurs lateral sliding in contact surface and produced to piezoelectric stack.
(2) joined end to end the compound hinges combined using even number straight beam type flexible hinge, range of movement is big, sensitive
Degree is high；It is symmetrical due to compound hinges, reduce piezoelectric stack and promote the Run-out error brought during flexible hinge；Using
Compound hinges can greatly reduce device volume.
(3) input signal of the piezoelectric stack in tri- directions of active control X, Y, Z is passed through, it is possible to achieve three-dimensional elliptical is transported
The active control of dynamic rail mark amplitude, frequency and phase, to adapt to the demand of various machining locus.
(4) the three-dimensional elliptical motion workbench is simple in construction and easy to process.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention；
Fig. 2 is that of the invention remove looks up axonometric drawing after bottom plate；
Fig. 3 is the axonometric drawing of workbench main body of the present invention with flexible hinge；
Fig. 4 is that the compound hinges constituted that joined end to end by even number straight beam type hinge in the present invention is symmetrically distributed in stress two
The schematic diagram of side；
Fig. 5 is the top view of workbench main body of the present invention with flexible hinge.
Embodiment
Side shield 1 is connected by screw 3 25, screw 4 27 with bottom plate 24, and side shield 2 14 passes through screw 5 12, spiral shell
Follow closely 6 15 to be connected with bottom plate 24, the fixing end 1 of the workbench 9 with hinge arrangement is installed by screw 72, screw 88
On side shield 1；Fixing end 2 911 is arranged on side shield 2 14 by screw 9 11, screw 10, and X is to piezoelectricity
1 are stacked by pre-loading screw 1 and X to the apical grafting of drive block 907, Y-direction piezoelectric stack 26 passes through pre-loading screw 25 and Y-direction
The apical grafting of drive block 906, Z-direction block 19 is fixed on X on drive block 907 by fixing screws 1, fixing screws 2 10, Z-direction pressure
Electricity stacks 3 17 and is arranged on Z-direction block 19, passes through bottom pre-loading screw 3 26 and the apical grafting of objective table 916；X is to displacement sensing
Device 20 is consistent to the direction of piezoelectric stack 1 with X, installed in X into the side through hole of piezoelectric stack 1, by trip bolt 3 21
It is fixed；Y-direction displacement transducer 3 is consistent with the direction of Y-direction piezoelectric stack 26, in the side through hole of Y-direction piezoelectric stack 261, by
Trip bolt 44 is fixed；Z-direction displacement transducer 18 is consistent with the direction of Z-direction piezoelectric stack 3 17, on Z-direction block 19,
In the side of Z-direction piezoelectric stack 3 17, fixed by trip bolt 5 16；
The workbench 9 with hinge arrangement is from objective table 916, X to drive block 907, Y-direction drive block 906, fixing end
One 903, fixing end 2 911 is formed by connecting by the flexible hinge between them, and the objective table 916 passes through flexible hinge one
902nd, flexible hinge 2 904, flexible hinge 3 912, flexible hinge 4 914 connect with X to drive block 907, and X is to drive block 907
It is connected by compound hinges 1, compound hinges 2 909, compound hinges 3 915, compound hinges 4 917 with Y-direction drive block 906
Connect, compound hinges 1 is symmetrical structure, compound hinges 3 915 relative to main body Y-direction center with compound hinges 2 909
With compound hinges 4 917 relative to main body Y-direction center be symmetrical structure；Compound hinges 1 and compound hinges 2 909,
Compound hinges 3 915 is symmetrically distributed in X to drive block two ends with compound hinges 4 917, is connected with Y-direction drive block, composite hinge
Chain 5 901 and compound hinges 6 905 relative to main body X to center be symmetrical structure, compound hinges 7 910 and compound hinges
8 913 relative to main body X to center be symmetrical structure, compound hinges 5 901 and compound hinges 6 905, compound hinges seven
910 are symmetrically distributed in Y-direction drive block two ends with compound hinges 8 913, both sides respectively with fixing end 1, the phase of fixing end 2 911
Connection；
The compound hinges one, compound hinges 2 909, compound hinges 3 915 or compound hinges four are respectively by four straight beams
Type hinge joins end to end composition.
Pass through the active control to piezoelectric stack 1, piezoelectric stack 26, the amplitude of piezoelectric stack 3 17, frequency and phase
System, realizes that workbench does two-dimensional elliptic motion or three-dimensional elliptical motion in space.
The drive signal of three piezoelectric stacks can be respectively：
In formula, ux(t)、uyAnd u (t)z(t) be respectively piezoelectric stack one, piezoelectric stack two, piezoelectric stack three input letter
Number, Vx、Vy、VzIt is input signal u respectivelyx(t)、uy(t)、uz(t) amplitude；It is input signal u respectivelyx(t)、
uy(t)、uz(t) initial phase.The voltage of piezoelectric stack input determines the collapsing length of piezoelectric stack, and then determines work
The displacement of platform.Under the driving of three piezoelectric stacks, the locus formula that objective table does three-dimensional elliptical motion in space is：
In formula, Ax、Ay、AzIt is amplitude of the workbench in tri- direction displacements of X, Y, Z, ψ respectivelyx、ψy、ψzIt is workbench respectively
In the phase of tri- direction displacements of X, Y, Z.ψx、ψy、ψzPhase difference between any two is represented by：
In formula, n1、n2、n3It is all integer, △ ψyxFor ψyWith ψxPhase difference, △ ψzyFor ψzWith ψyPhase difference, △ ψzxFor
ψzWith ψxPhase difference.Particularly work as satisfaction
When, the projection of the movement locus of three-dimensional elliptical motion workbench on coordinate plane XOZ and YOZ is respectively that standard is ellipse
The major axis of the elliptical orbit of Circular test, i.e., two is respectively parallel to reference axis OX and OY.
By formula (2) derivation can be obtained three-dimensional elliptical motion workbench X, Y, Z-direction velocity component, and substitute into formula (3),
Formula (4), can be obtained,
Three-dimensional elliptical motion workbench is arranged on precise motion axle, clamping workpiece to be added moves work in three-dimensional elliptical
Make on platform.When workpiece to be added is when at a time speed is level to the movement velocity component of XOZ and YOZ planes, pass through master
The parameter of dynamic control three-dimensional elliptical motion workbench, make XOZ and the velocity component in YOZ planes respectively with X, Y-direction kinematic axis
Feed speed is in opposite direction, equal in magnitude.Now, shutter is opened, laser is completed single exposure to machined part, and with this position
It is set to initial exposure position.When frequency of exposure and elliptic motion frequency of operation match, workpiece to be added is may be implemented in essence
Plan static exposure in close kinematic axis fast feed.
Claims (2)
1. a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing, it is characterised in that：Side shield one passes through screw
3rd, screw four is connected with bottom plate, and side shield two is connected by screw five, screw six with bottom plate, the workbench with hinge arrangement
Fixing end one by screw seven, screw eight be arranged on side shield one on；Fixing end two is arranged on by screw nine, screw ten
On side shield two, X to piezoelectric stack one by pre-loading screw one and X to drive block apical grafting, Y-direction piezoelectric stack two passes through pretension
Screw two and Y-direction drive block apical grafting, Z-direction block are fixed on X on drive block by fixing screws one, fixing screws two, Z-direction pressure
Electricity stacks three and is arranged on Z-direction block, passes through bottom pre-loading screw three and objective table apical grafting；X is to displacement transducer and X to pressure
Electricity stacks a direction unanimously, installed in X into piezoelectric stack one by one side through hole, is fixed by trip bolt three；Y-direction displacement transducer
It is consistent with the direction of Y-direction piezoelectric stack two, in the side through hole of Y-direction piezoelectric stack 21, fixed by trip bolt four；Z-direction position
Displacement sensor is consistent with the direction of Z-direction piezoelectric stack three, on Z-direction block, in the side of Z-direction piezoelectric stack three, by fastening
Screw five is fixed；The workbench with hinge arrangement is from objective table, X to drive block, Y-direction drive block, fixing end one, fixed
End two is formed by connecting by the flexible hinge between them, and the objective table passes through flexible hinge one, flexible hinge two, flexible hinge
Chain three, flexible hinge four connect with X to drive block, and X is to drive block by compound hinges one, compound hinges two, compound hinges three, multiple
Close hinge four with Y-direction drive block to be connected, compound hinges one is symmetrical junction relative to main body Y-direction center with compound hinges two
Structure, compound hinges three is symmetrical structure relative to main body Y-direction center with compound hinges four；Compound hinges one and compound hinges
2nd, compound hinges three is symmetrically distributed in X to drive block two ends with compound hinges four, is connected with Y-direction drive block, compound hinges five
Relative to main body X it is symmetrical structure to center with compound hinges six, compound hinges seven and compound hinges eight are relative to main body X
It is symmetrical structure to center, compound hinges five is symmetrically distributed in Y with compound hinges six, compound hinges seven and compound hinges eight
To drive block two ends, both sides are connected with fixing end one, fixing end two respectively.
2. a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing according to claim 1, its feature exists
In：The compound hinges one, compound hinges two, compound hinges three or compound hinges four are respectively by four straight beam type hinge head and the tail phases
Even constitute.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510621673.3A CN105137723B (en) | 2015-09-27 | 2015-09-27 | A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510621673.3A CN105137723B (en) | 2015-09-27 | 2015-09-27 | A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105137723A CN105137723A (en) | 2015-12-09 |
| CN105137723B true CN105137723B (en) | 2017-07-21 |
Family
ID=54723114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510621673.3A Active CN105137723B (en) | 2015-09-27 | 2015-09-27 | A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105137723B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105855699B (en) * | 2016-06-06 | 2017-05-31 | 吉林大学 | A kind of changeable parameters formula laser processing device |
| CN106312591A (en) * | 2016-11-09 | 2017-01-11 | 长春工业大学 | Three-dimensional oval micro displacement motion platform under three-piezoelectric perpendicular drive |
| CN106903517A (en) * | 2017-04-28 | 2017-06-30 | 哈尔滨理工大学 | A kind of vibration damping fixture and splicing mould milling intelligent vibration damping system |
| CN107240423B (en) * | 2017-07-13 | 2022-12-13 | 中国科学院苏州生物医学工程技术研究所 | Three-dimensional nanometer workstation based on flexible hinge |
| CN109521649A (en) * | 2018-10-22 | 2019-03-26 | 中国科学技术大学 | A kind of integral system pinpointing transfer and alignment photoetching for two-dimensional material |
| CN109545271B (en) * | 2019-01-09 | 2024-06-07 | 广东工业大学 | Precision motion compensator, XYZ three-dimensional precision motion compensator and compensation system |
| CN109686690B (en) * | 2019-02-01 | 2024-06-07 | 广东工业大学 | Inlay range upon range of formula XYZ three-dimensional developments micro-drive arrangement |
| CN111421228B (en) * | 2020-04-08 | 2021-05-18 | 华中科技大学 | Sample precision clamp for cross-scale two-photon polymerization processing and leveling method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100497729B1 (en) * | 2003-02-21 | 2005-06-28 | 한국과학기술원 | 3 axes linear motion stage using flexure mechanism |
| JP4435730B2 (en) * | 2005-11-22 | 2010-03-24 | アドバンスド・マスク・インスペクション・テクノロジー株式会社 | Board inspection equipment |
| CN101354537B (en) * | 2008-09-01 | 2010-07-21 | 上海微电子装备有限公司 | Workpiece platform for photolithography apparatus |
| CN101424879B (en) * | 2008-12-12 | 2010-10-13 | 厦门大学 | Resistance straining feedback type closed-loop two-dimension flexible hinge work bench |
| CN202317816U (en) * | 2011-11-08 | 2012-07-11 | 浙江师范大学 | Tool-rest driving platform of ultra-precision processing lathe based on bi-parallel flexible hinge |
-
2015
- 2015-09-27 CN CN201510621673.3A patent/CN105137723B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN105137723A (en) | 2015-12-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105137723B (en) | A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing | |
| WO2019007198A1 (en) | Linear transport system | |
| Chen et al. | Contouring control of smooth paths for multiaxis motion systems based on equivalent errors | |
| Wu et al. | A control strategy of a two degrees-of-freedom heavy duty parallel manipulator | |
| Deng et al. | Development of a nanopositioning platform with large travel range based on bionic quadruped piezoelectric actuator | |
| CN104117697B (en) | A kind of off-resonance elliptical vibration cutting device | |
| WO2019007202A1 (en) | Linear transmission system and control device thereof, and multi-mover cooperative control system | |
| CN103116314B (en) | Method of correction on amplitude attenuation and phase delay of fast tool servo system | |
| CN106195556B (en) | A kind of XY θ plane three-freedom precision positioning platforms | |
| WO2019007199A1 (en) | Linear motor and rotor movement positioning control device | |
| Kotlarski et al. | Experimental validation of the influence of kinematic redundancy on the pose accuracy of parallel kinematic machines | |
| WO2019007201A1 (en) | Linear motor and stator thereof | |
| WO2019007200A1 (en) | Linear motor and mover thereof | |
| CN104942377A (en) | Ellipse vibration cutting auxiliary device based on three-piezoelectric driving | |
| CN112859535A (en) | Bridge type differential flexible displacement reducing mechanism | |
| CN204989748U (en) | A three -dimensional elliptic motion workstation for two -photon polymerization processing | |
| CN101260967B (en) | XYY precision positioning platform calibration method | |
| CN106229012B (en) | A kind of big displacement high frequency sound Three Degree Of Freedom Piezoelectric Driving precisely locating platform | |
| Wang et al. | Workspace and singularity analysis of a 3-DOF planar parallel manipulator with actuation redundancy | |
| CN103309280B (en) | Dual feedforward control system used for heavy parallel machine tool | |
| CN203972886U (en) | A kind of off-resonance elliptical vibration cutting device | |
| Li et al. | Research trends in China for macro-micro motion platform for microelectronics manufacturing industry | |
| CN106838566A (en) | The two-dimensional parallel precision positioning mechanism that a kind of three-way piezoelectric drives | |
| US7994688B2 (en) | Mechanical design of laminar weak-link mechanisms with centimeter-level travel range and sub-nanometer positioning resolution | |
| CN104742099A (en) | Self-propelled planar three-degrees-of-freedom piezoelectric driving platform |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| OL01 | Intention to license declared | ||
| OL01 | Intention to license declared |