CN105110287B - A kind of femtosecond laser gridding ferroelectric ceramics method - Google Patents
A kind of femtosecond laser gridding ferroelectric ceramics method Download PDFInfo
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Abstract
The present invention relates to a kind of femtosecond laser gridding ferroelectric ceramics method, belong to Micrometer-Nanometer Processing Technology field.Femtosecond laser gridding ferroelectric ceramics method of the present invention, it is that the metal pattern of gridding is prepared on ferroelectric ceramics with the method for photoetching, metal deposit, etching, femtosecond laser etching carries out grid processing according to previously prepared gridding metal pattern, realizes high-precision grid array.The present invention does not control manufacturing tolerance by the stepping accuracy for controlling machine table to move, but be processed by previously prepared gridding pattern, eliminate the mechanical cumulative errors that machine table is produced, and solve the problem of ferroelectricity uncooled fpa detector component lateral heat diffusion, the spatial resolution of detector assembly is improved, the performance of detector is effectively increased.The present invention can not only be widely applied to the high-precision grid array of big array scale and prepare, and can also be generalized to the microfabrication of a variety of figures such as the big high-precision cylindrical-array of array scale, array of circular apertures.
Description
Technical field
The invention belongs to Micrometer-Nanometer Processing Technology field, and in particular to a kind of new femtosecond laser gridding ferroelectric ceramics side
Method.
Background technology
Hybrid uncooled fpa detector device wafer gridding technique is the important composition of detector assembly technique
Part.Lateral heat diffusion between detection member is to influence the main original of hybrid ferroelectricity non-brake method thermal imaging system thermal image spatial resolution
Therefore one, it is then the important means for eliminating this influence that technology, which is thermally isolated, in gridding.The gate of the quality monitoring of ferroelectric ceramics gridding technique
The height of chip yield, the line thickness of gridding can also influence the dutycycle of the photosensitive member of detector simultaneously, so as to influence
The final performance of detector.So, for the requirement to chip gridding technique, while the segmentation of ferroelectric ceramics is realized,
In addition to ensureing the centre-to-centre spacing and array scale of pixel and meeting requirement, damage of the reduction to material is also required.
Use laser chemistry auxiliary etch that the external TI companies by representative of the U.S. once reported in the nineties in last century or
Person is that the method for ion beam etching carries out ferroelectric ceramics gridding.At home, also have using the similar approach reported with foreign countries.
Using ion beam etching ferroelectric ceramics, shelter etching need to be carried out using masking layer.Due to ion beam etching ferroelectricity pottery
Porcelain speed is much smaller than the etch rate to masking layer, therefore solves to find suitable masking layer and ion beam etching parameter very
It is difficult.
With the development of laser assisted microprocessing, laser chemistry auxiliary etch is substituted by femtosecond laser parallel micromachining, femtosecond
Laser Micro-Machining is extremely noticeable forward position research direction in world today's laser, photovoltaic industry.Due to femtosecond laser
The big feature of ultrashort, superpower and high focusing power 3, has greater advantage than laser chemistry auxiliary etch.Femtosecond laser can be by its energy
Amount all, quickly and accurately concentrates on the zone of action of restriction, incomparable without hot melt area " cold " with other Laser Processings
The advantages such as processing, high-precision, high-quality, high-resolution.Ferroelectric ceramics gridding technique is carried out using femtosecond laser, is to realize height
Precision, big array, the inexorable trend of high-performance uncooled fpa detector component microfabrication.
The content of the invention
For high accuracy, big array, high-performance iron electricity non-refrigeration focal plane detection device assembly microfabrication problem, the present invention
A kind of new femtosecond laser gridding ferroelectric ceramics method is provided.On ferroelectric ceramics surface, handed in length and breadth using femtosecond laser
Prepared by wrong grid, realize large-scale equal-sized grid array, and the groove width of generation, depth and profile shape are equal
It is even consistent.
The technical solution adopted by the present invention is as follows：
A kind of femtosecond laser gridding ferroelectric ceramics method, comprises the following steps：
Step a, ferroelectric ceramics cleaning：
（1）With toluene soak ferroelectric ceramics 4-5 hours；
（2）Toluene is changed, ferroelectric ceramics, which is soaked in toluene, to be cleaned by ultrasonic 5-10 minutes；In triplicate；
（3）Solvent is changed to acetone, ferroelectric ceramics, which is soaked in acetone, to be cleaned by ultrasonic 5-10 minutes；In triplicate；
（4）Solvent is changed to ethanol, ferroelectric ceramics, which is soaked in ethanol, to be cleaned by ultrasonic 5-10 minutes；In triplicate；
（5）The residual liquid on ferroelectric ceramics surface is dried up with nitrogen；Ferroelectric ceramics is put into baking oven, and temperature setting is 80 DEG C,
Baking 2-3 hours；
Step b, deposition of metal：By the method for magnetron sputtering, in the ferroelectric ceramics surface sputtering handled through step a
1000-1500 titanium tungsten film layers or nickel chromium triangle film layer, obtain the ferroelectric ceramics for being coated with titanium tungsten film or nickel chromium triangle film；
Step c, photoetching：The gridding pattern processed the need for will be pre-designed, is made lithography mask version；Utilize photoetching
Technique, the ferroelectric ceramics table for being coated with titanium tungsten film or nickel chromium triangle film that step b is obtained is transferred to by pre-designed gridding pattern
Face, forms required gridding photoetching offset plate figure on the ferroelectric ceramics surface for being coated with titanium tungsten film or nickel chromium triangle film；
Step d, ion beam etching metal level：Using ion beam etching, the surface obtained to step c carries gridding photoetching
Glue pattern be coated with titanium tungsten film or the ferroelectric ceramics of nickel chromium triangle film is handled, the titanium tungsten film or nickel chromium triangle in exposed grid groove
Film etching is clean；
Step e, cleaning of removing photoresist：The ferroelectric ceramics obtained through step d processing soaks 1-2 hours in acetone, and by super
Sound cleaning cleans up photoresist, forms the ferroelectric ceramics with gridding metal pattern；
Step f, femtosecond laser etching：Gridding is carried out using femtosecond laser；Gridding metal is carried by what step e was obtained
The gridding metal pattern on the ferroelectric ceramics surface of pattern is collected in software, and laser facula is according to the gridding metal in software
Pattern is processed, and the grid groove without titanium tungsten film or the covering of nickel chromium triangle film is etched by femtosecond laser, obtains being etched by femtosecond laser
Ferroelectric ceramics；
Step g, removes metal level：Using the method for ion beam etching, the iron etched by femtosecond laser that step f is obtained
The titanium tungsten film or nickel chromium triangle film of electroceramics are removed, and complete the gridding of ferroelectric ceramics.
It is further preferred that the technological parameter of step f femtosecond lasers is：Femtosecond laser pulsewidth is less than 280fs, laser work(
Rate 50mW, optical maser wavelength 258nm, 5 microns of spot diameter.
It is further preferred that the ferroelectric ceramics is barium-strontium titanate ceramic, lead zirconate-titanate ceramic or tantalum scandium acid plumbum pottery
Porcelain.
Compared with prior art, its advantage is the present invention：
（1）Femtosecond laser gridding ferroelectric ceramics method of the present invention, not by control machine table move stepping accuracy come
The error of processing is controlled, but is processed by previously prepared gridding pattern, the machinery for eliminating machine table generation tires out
Error is counted, high-precision grid array is realized.
（2）By femtosecond laser gridding ferroelectric ceramics technology of the present invention, ferroelectricity uncooled fpa detector is solved
The problem of component lateral heat diffusion, improves the spatial resolution of detector assembly, effectively increases the performance of detector.
（3）The present invention can not only be widely applied to the high-precision grid array of big array scale and prepare, and the present invention can be with
It is generalized to the microfabrication of a variety of figures such as the big high-precision cylindrical-array of array scale, array of circular apertures.
Brief description of the drawings
Fig. 1 is the schematic diagram of the gridding array of the present invention；
Fig. 2 is the process chart of femtosecond laser gridding ferroelectric ceramics of the present invention；
Fig. 3 is the profile for the ferroelectric ceramics for being coated with titanium tungsten film or nickel chromium triangle film；
Fig. 4 is the profile of the ferroelectric ceramics that is coated with titanium tungsten film or nickel chromium triangle film of the surface with gridding photoetching offset plate figure；
Fig. 5 be ion beam etching metal level after ferroelectric ceramics profile；
Fig. 6 is the profile of the ferroelectric ceramics with gridding metal pattern；
Fig. 7 is the profile of the ferroelectric ceramics etched by femtosecond laser；
Fig. 8 is the profile of femtosecond laser gridding ferroelectric ceramics of the present invention；
Wherein, 1 is ferroelectric ceramics, and 2 be titanium tungsten film layer or nickel chromium triangle film layer, and 3 be photoresist layer.
Embodiment
With reference to embodiment, the present invention is described in further detail.
It will be understood to those of skill in the art that the following example is merely to illustrate the present invention, and it should not be regarded as limiting this hair
Bright scope.In the examples where no specific technique or condition is specified, according to the technology or condition described by document in the art
Or carried out according to product description.Agents useful for same or the unreceipted production firm person of instrument, are that can be obtained by buying
Conventional products.
Femtosecond laser etching software used of the present invention is SCA engineer V2.5.
Embodiment 1
The present embodiment will form large-scale equal-sized grid array as shown in Figure 1, and the processing step of realization is such as
Under：
Step a, as shown in Figures 2 and 3, ferroelectric ceramics 1 is cleaned, specifically included：
（1）With toluene soak ferroelectric ceramics 4 hours；
（2）Toluene is changed, ferroelectric ceramics, which is soaked in toluene, to be cleaned by ultrasonic 5 minutes；In triplicate；
（3）Solvent is changed to acetone, ferroelectric ceramics, which is soaked in acetone, to be cleaned by ultrasonic 5 minutes；In triplicate；
（4）Solvent is changed to ethanol, ferroelectric ceramics, which is soaked in ethanol, to be cleaned by ultrasonic 5 minutes；In triplicate；
（5）The residual liquid on ferroelectric ceramics surface is dried up with nitrogen；Ferroelectric ceramics is put into baking oven, and temperature setting is 80 DEG C,
Baking 2 hours；
Step b, deposition of metal：As shown in figure 3, by the method for magnetron sputtering, in the ferroelectric ceramics handled through step a
1 surface sputters 1000 titanium tungsten film layers 2, obtains being coated with the ferroelectric ceramics of titanium tungsten film.
Step c, photoetching：As shown in figure 4, the gridding pattern processed the need for will be pre-designed, is made photo etched mask
Version；Using photoetching process, pre-designed gridding pattern is transferred to the ferroelectric ceramics for being coated with titanium tungsten film that step b is obtained
There is photoresist layer 3 to protect on surface, the gridding photoetching offset plate figure needed for being formed, grid, grid groove is exposed.
Step d, ion beam etching metal level：As shown in figure 5, using ion beam etching, being carried to the obtained surfaces of step c
The ferroelectric ceramics for being coated with titanium tungsten film of gridding photoetching offset plate figure is handled, and the titanium tungsten film in exposed grid groove is etched
Totally；There is photoresist to protect titanium tungsten film to remain on grid.
Step e, cleaning of removing photoresist：Such as Fig. 6, the ferroelectric ceramics obtained through step d processing soaks 1 hour in acetone, and leads to
Cross ultrasonic cleaning to clean up photoresist, form the ferroelectric ceramics with gridding metal pattern；
Step f, femtosecond laser etching：As shown in fig. 7, carrying out gridding using femtosecond laser.Technological parameter is set：Femtosecond
Laser pulse width is less than 280fs, laser power 50mW, optical maser wavelength 258nm, 5 microns of spot diameter.By carrying that step e is obtained
The gridding metal pattern on the ferroelectric ceramics surface of gridding metal pattern is collected in software, and laser facula is according in software
Gridding metal pattern is processed, and will be etched without the grid groove that titanium tungsten film is covered by femtosecond laser, is obtained being carved by femtosecond laser
The ferroelectric ceramics of erosion；
Step g, removes metal level：As shown in figure 8, using the method for ion beam etching, being swashed what step f was obtained by femtosecond
The titanium tungsten film or nickel chromium triangle film of the ferroelectric ceramics of photoengraving are removed, and complete the gridding of ferroelectric ceramics.
Ferroelectric ceramics described in the present embodiment is barium-strontium titanate ceramic.
Embodiment 2
The present embodiment will form large-scale equal-sized grid array as shown in Figure 1, and the processing step of realization is such as
Under：
Step a, as shown in Figures 2 and 3, ferroelectric ceramics 1 is cleaned, specifically included：
（1）With toluene soak ferroelectric ceramics 5 hours；
（2）Toluene is changed, ferroelectric ceramics, which is soaked in toluene, to be cleaned by ultrasonic 10 minutes；In triplicate；
（3）Solvent is changed to acetone, ferroelectric ceramics, which is soaked in acetone, to be cleaned by ultrasonic 10 minutes；In triplicate；
（4）Solvent is changed to ethanol, ferroelectric ceramics, which is soaked in ethanol, to be cleaned by ultrasonic 01 minute；In triplicate；
（5）The residual liquid on ferroelectric ceramics surface is dried up with nitrogen；Ferroelectric ceramics is put into baking oven, and temperature setting is 80 DEG C,
Baking 3 hours；
Step b, deposition of metal：As shown in figure 3, by the method for magnetron sputtering, in the ferroelectric ceramics handled through step a
1 surface sputters 1500 nickel chromium triangle film layers 2, obtains being coated with the ferroelectric ceramics of nickel chromium triangle film.
Step c, photoetching：As shown in figure 4, the gridding pattern processed the need for will be pre-designed, is made photo etched mask
Version；Using photoetching process, pre-designed gridding pattern is transferred to the ferroelectric ceramics for being coated with nickel chromium triangle film that step b is obtained
There is photoresist layer 3 to protect on surface, the gridding photoetching offset plate figure needed for being formed, grid, grid groove is exposed.
Step d, ion beam etching metal level：As shown in figure 5, using ion beam etching, being carried to the obtained surfaces of step c
The ferroelectric ceramics for being coated with nickel chromium triangle film of gridding photoetching offset plate figure is handled, and the nickel chromium triangle film in exposed grid groove is etched
Totally；There is photoresist to protect nickel chromium triangle film to remain on grid.
Step e, cleaning of removing photoresist：Such as Fig. 6, the ferroelectric ceramics obtained through step d processing soaks 2 hours in acetone, and leads to
Cross ultrasonic cleaning to clean up photoresist, form the ferroelectric ceramics with gridding metal pattern；
Step f, femtosecond laser etching：As shown in fig. 7, carrying out gridding using femtosecond laser.Technological parameter is set：Femtosecond
Laser pulse width is less than 280fs, laser power 50mW, optical maser wavelength 258nm, 5 microns of spot diameter.By carrying that step e is obtained
The gridding metal pattern on the ferroelectric ceramics surface of gridding metal pattern is collected in software, and laser facula is according in software
Gridding metal pattern is processed, and will be etched without the grid groove that nickel chromium triangle film is covered by femtosecond laser, is obtained being carved by femtosecond laser
The ferroelectric ceramics of erosion；
Step g, removes metal level：As shown in figure 8, using the method for ion beam etching, being swashed what step f was obtained by femtosecond
The titanium tungsten film or nickel chromium triangle film of the ferroelectric ceramics of photoengraving are removed, and complete the gridding of ferroelectric ceramics.
Ferroelectric ceramics described in the present embodiment is lead zirconate-titanate ceramic.
Embodiment 3
The present embodiment will form large-scale equal-sized grid array as shown in Figure 1, and the processing step of realization is such as
Under：
Step a, as shown in Figures 2 and 3, ferroelectric ceramics 1 is cleaned, specifically included：
（1）With toluene soak ferroelectric ceramics 4.5 hours；
（2）Toluene is changed, ferroelectric ceramics, which is soaked in toluene, to be cleaned by ultrasonic 6 minutes；In triplicate；
（3）Solvent is changed to acetone, ferroelectric ceramics, which is soaked in acetone, to be cleaned by ultrasonic 7 minutes；In triplicate；
（4）Solvent is changed to ethanol, ferroelectric ceramics, which is soaked in ethanol, to be cleaned by ultrasonic 8 minutes；In triplicate；
（5）The residual liquid on ferroelectric ceramics surface is dried up with nitrogen；Ferroelectric ceramics is put into baking oven, and temperature setting is 80 DEG C,
Baking 2.3 hours；
Step b, deposition of metal：As shown in figure 3, by the method for magnetron sputtering, in the ferroelectric ceramics handled through step a
1 surface sputters 1300 titanium tungsten film layers 2 or nickel chromium triangle film layer 2, obtains the ferroelectric ceramics for being coated with titanium tungsten film or nickel chromium triangle film.
Step c, photoetching：As shown in figure 4, the gridding pattern processed the need for will be pre-designed, is made photo etched mask
Version；Using photoetching process, titanium tungsten film or nickel chromium triangle film are coated with by what pre-designed gridding pattern was transferred to that step b obtains
There is photoresist layer 3 to protect on ferroelectric ceramics surface, the gridding photoetching offset plate figure needed for being formed, grid, grid groove is exposed.
Step d, ion beam etching metal level：As shown in figure 5, using ion beam etching, being carried to the obtained surfaces of step c
Gridding photoetching offset plate figure be coated with titanium tungsten film or the ferroelectric ceramics of nickel chromium triangle film is handled, the titanium in exposed grid groove
Tungsten film or nickel chromium triangle film etching are clean；There is photoresist to protect titanium tungsten film or nickel chromium triangle film to remain on grid.
Step e, cleaning of removing photoresist：Such as Fig. 6, the ferroelectric ceramics obtained through step d processing soaks 1.5 hours in acetone, and
Photoresist is cleaned up by being cleaned by ultrasonic, the ferroelectric ceramics with gridding metal pattern is formed；
Step f, femtosecond laser etching：As shown in fig. 7, carrying out gridding using femtosecond laser.Technological parameter is set：Femtosecond
Laser pulse width is less than 280fs, laser power 50mW, optical maser wavelength 258nm, 5 microns of spot diameter.By carrying that step e is obtained
The gridding metal pattern on the ferroelectric ceramics surface of gridding metal pattern is collected in software, and laser facula is according in software
Gridding metal pattern is processed, and the grid groove without titanium tungsten film or the covering of nickel chromium triangle film is etched by femtosecond laser, obtains being flown
The ferroelectric ceramics of second laser ablation；
Step g, removes metal level：As shown in figure 8, using the method for ion beam etching, being swashed what step f was obtained by femtosecond
The titanium tungsten film or nickel chromium triangle film of the ferroelectric ceramics of photoengraving are removed, and complete the gridding of ferroelectric ceramics.
Ferroelectric ceramics described in the present embodiment is tantalum scandium acid plumbum ceramics.
General principle, principal character and the advantages of the present invention of the present invention has been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and the simply explanation described in above-described embodiment and specification is originally
The principle of invention, without departing from the spirit and scope of the present invention, various changes and modifications of the present invention are possible, these changes
Change and improvement all fall within the protetion scope of the claimed invention.The claimed scope of the invention by appended claims and its
Equivalent thereof.
Claims (2)
1. a kind of femtosecond laser gridding ferroelectric ceramics method, it is characterised in that comprise the following steps：
Step a, ferroelectric ceramics cleaning：
（1）With toluene soak ferroelectric ceramics 4-5 hours；
（2）Toluene is changed, ferroelectric ceramics, which is soaked in toluene, to be cleaned by ultrasonic 5-10 minutes；In triplicate；
（3）Solvent is changed to acetone, ferroelectric ceramics, which is soaked in acetone, to be cleaned by ultrasonic 5-10 minutes；In triplicate；
（4）Solvent is changed to ethanol, ferroelectric ceramics, which is soaked in ethanol, to be cleaned by ultrasonic 5-10 minutes；In triplicate；
（5）The residual liquid on ferroelectric ceramics surface is dried up with nitrogen；Ferroelectric ceramics is put into baking oven, and temperature setting is 80 DEG C, baking
2-3 hours；
Step b, deposition of metal：By the method for magnetron sputtering, the ferroelectric ceramics surface sputtering 1000 handled through step a-
1500 titanium tungsten film layers or nickel chromium triangle film layer, obtain the ferroelectric ceramics for being coated with titanium tungsten film or nickel chromium triangle film；
Step c, photoetching：The gridding pattern processed the need for will be pre-designed, is made lithography mask version；Utilize photoetching work
Skill, the ferroelectric ceramics surface for being coated with titanium tungsten film or nickel chromium triangle film that step b is obtained is transferred to by pre-designed gridding pattern,
Required gridding photoetching offset plate figure is formed on the ferroelectric ceramics surface for being coated with titanium tungsten film or nickel chromium triangle film；
Step d, ion beam etching metal level：Using ion beam etching, the surface obtained to step c carries gridding photoresist figure
Shape be coated with titanium tungsten film or the ferroelectric ceramics of nickel chromium triangle film is handled, the titanium tungsten film in exposed grid groove or nickel chromium triangle film are carved
Erosion is clean；
Step e, cleaning of removing photoresist：The ferroelectric ceramics obtained through step d processing soaks 1-2 hours in acetone, and by ultrasonic clear
Wash and clean up photoresist, form the ferroelectric ceramics with gridding metal pattern；
Step f, femtosecond laser etching：Gridding is carried out using femtosecond laser；Gridding metal pattern is carried by what step e was obtained
The gridding metal pattern on ferroelectric ceramics surface collect in software, laser facula is according to the gridding metal pattern in software
Processing, the grid groove without titanium tungsten film or the covering of nickel chromium triangle film is etched by femtosecond laser, the iron etched by femtosecond laser is obtained
Electroceramics；The technological parameter of femtosecond laser is：Femtosecond laser pulsewidth is less than 280fs, laser power 50mW, optical maser wavelength 258nm,
5 microns of spot diameter；
Step g, removes metal level：Using the method for ion beam etching, the ferroelectricity etched by femtosecond laser that step f is obtained is made pottery
The titanium tungsten film or nickel chromium triangle film of porcelain are removed, and complete the gridding of ferroelectric ceramics, after gridding, obtain large-scale equal-sized net
Lattice array, groove width, depth and the profile shape uniformity of generation.
2. femtosecond laser gridding ferroelectric ceramics method according to claim 1, it is characterised in that the ferroelectric ceramics is
Barium-strontium titanate ceramic, lead zirconate-titanate ceramic or tantalum scandium acid plumbum ceramics.
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