CN105097398A - Water cooling manner adopting annular hot cathode ion source neutralizer - Google Patents
Water cooling manner adopting annular hot cathode ion source neutralizer Download PDFInfo
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- CN105097398A CN105097398A CN201510529388.9A CN201510529388A CN105097398A CN 105097398 A CN105097398 A CN 105097398A CN 201510529388 A CN201510529388 A CN 201510529388A CN 105097398 A CN105097398 A CN 105097398A
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- tungsten filament
- main body
- ion source
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a water cooling manner adopting annular hot cathode ion source neutralizer which belongs to the technical field of optic-electrics. The neutralizer comprises a main body, a diaphragm, an electrode fixing plate, tungsten wire electrode rods, a front side electrode and a back side electrode. The electrode fixing plate is fixedly arranged on the main body; the diaphragm is fixedly arranged at the upper end of the main body; the tungsten wire electrode rods cross through the electrode fixing plate; the front side electrode and the back side electrode are fixedly arranged on the electrode fixing plate; the neutralizer further comprises a water cooling pipe and annular tungsten wires. The annular tungsten wires are fixed on the main body; the front side electrode and the back side electrode sleeve the lower ends of the tungsten wire electrode rods respectively; the water cooling pipe is fixedly arranged on a recessed shape half circle groove at the outer side of the main body. The neutralizer of the invention is simple in structure, cost-effective, convenient to use, and enjoys a long service time. With the introduction of a water cooling manner, the influence of rising temperature caused by the heat of a hot cathode onto the stability of a system can be reduced, thereby, making an ion source more stable and more reliable in applications.
Description
Technical field
The present invention relates to photoelectric technology, especially technology of ion source, belong to field of photoelectric technology.
Background technology
Ion beam polishing technology is most advanced, process technology that precision is the highest at present, because ion beam polishing has Flexible Manufacture, removes stability, precision high, is the promising approach of processing sub-nanometer precision lithographic objective.Therefore, ion source has boundless application prospect in advanced optics manufacture field.
Along with the development of modern industry, particularly along with the development of large scale integrated circuit, ion source is widely used in the fields such as the ion etching equipment of production of integrated circuits, the coating machine of depositing metal layers and metal lead wire and deielectric-coating, ULSI circuits manufacture craft intermediate ion bundle exposure machine, the sub-nanometer precision ion beam polisher making the photoetching machine lens of very lagre scale integrated circuit (VLSIC), high quality optical Assisted by Ion Beam and sputter coating machine.Current ion source mainly adopts positive ion source, namely by different ionization principles, gas ionization is become ion, then adopts and draws beam system cation is drawn, form the line with certain energy.In ion source application in these fields, it is desirable that the plasma line of neutrality, instead of the line of positively charged or negative electricity.Therefore, in ion source system, need increase averager, form the identical plasma line of positive and negative charge for electron emission with ion beam current, thus be applied to required etching, plated film or processing.
In ion source system, averager effect mainly contains three:
(1) positive charge of the accumulation in and on target, makes the course of processing and removes speed to remain stable;
(2) for reducing the impact of the space charge electrostatic repulsion in ion beam, making the space charge of averager be neutral beam, keeping the angle of divergence that line is less;
(3) required electronics can be provided for ion source build-up of luminance.
Averager can adopt the methods such as radio frequency electric generator, hollow cathode, hot cathode to realize.Hollow cathode consumptive material is very expensive, and useful life is not long yet, causes cost performance not high, is not widely used; Radio frequency electric generator then complex structure, simultaneously apparatus expensive, neither the first-selection of averager; Hot cathode averager comparison is simple, namely with the tungsten filament electron emission of heating, is convenient to dismounting.But traditional hot cathode averager adopts a tungsten filament electron emission, tungsten filament acts on due to the bombardment by ion beam current, cause the tungsten filament life-span short, affect the use of averager, and under the effect of intense beam stream, ion source internal material is sputtered, insulating ceramics is produced and pollutes, cause short circuit and affect use, reducing the stability of averager.
Summary of the invention
For the problems referred to above, the invention provides a kind of water-cooled annular hot-cathode ion source averager.
The technical solution adopted for the present invention to solve the technical problems is: water-cooled annular hot-cathode ion source averager, comprise main body, diaphragm, electrode fixed head, tungsten filament electrode post, front side electrode and back side electrodes, electrode fixed head is fixed in main body, diaphragm is fixed on main body upper end, tungsten filament electrode post is through electrode fixed head, and front side electrode, back side electrodes are fixed on electrode fixed head; Also comprise cooling water pipe and ring-type tungsten filament, ring-type tungsten filament is fixed in main body, and front side electrode, back side electrodes are enclosed within tungsten filament electrode post lower end respectively; Cooling water pipe is fixed on the spill half slot outside main body.
The invention has the beneficial effects as follows, structure is simple, economical and practical, easy to use, cost is low, the life-span is long, useful life reaches 150-200 hours, roughly the same with the hollow cathode life-span, and cost significantly reduces, and only needs to change tungsten filament at every turn and just can continue to use, use cost is the one thousandth of hollow cathode, even less; Adopt water-cooling pattern, reduce hot cathode heating and cause temperature to raise the impact of the stability of a system and processing being removed to stability, make ion source more stable and reliable in the application.
More traditional hot cathode structure improves the useful life of tungsten filament, is applicable to the processes such as ion beam polishing, ion beam etching, ion beam sputtering and uses.
The present invention's advantage is compared with prior art:
(1) annular tungsten filament is fixed on above electrode fixed head, diameter is slightly larger than the center bore of electrode fixed head, tungsten filament is not bombarded by line, more traditional hot cathode structure improves the useful life of tungsten filament, make averager more durable in use, reduce the time changing tungsten filament, promote ionogenic service efficiency and production efficiency;
(2) adopt T-shaped ceramic washer, column type ceramic washer and hat pad combine use method, object is that to reduce ceramic washer contaminated and produce conductivity, make averager short circuit and lose function, hat pad effectively can reduce ceramic washer by the pollution of impurity under ion beam bombardment effect on the one hand, promotes the useful life of ceramic washer and the stability of averager; On the other hand, T-shaped ceramic washer and column type ceramic washer are nested and are combined, and more can protect and reduce the strong pollution of T-shaped ceramic washer below electrode fixed head, promote the stability of averager;
(3) main body cover is designed with cooling water pipe, for cooling averager, reduces the temperature rise that hot cathode heat causes, thus promotes averager and ionogenic stability in use.
Accompanying drawing explanation
Fig. 1 is general structure schematic diagram (stereogram) of the present invention;
Fig. 2 is vertical view of the present invention;
Fig. 3 is upward view of the present invention;
Fig. 4 is the A-A profile (structural representation of the present invention) of Fig. 3;
Fig. 5 is the partial enlarged drawing of Fig. 4;
Fig. 6 is hat pad stereogram;
Fig. 7 is ring-type tungsten filament structural representation;
Parts and numbering in figure:
1-main body, 2-diaphragm, 3-electrode fixed head, 4-T-shaped ceramic washer, 5-column type ceramic washer,
6-hat pad, 7-tungsten filament electrode post, 8-flat shim, 9-clamp nut, 10-front side electrode,
11-back side electrodes, 12-cooling water pipe, 13-ring-type tungsten filament.
Embodiment
Below in conjunction with embodiment, the present invention is further described.
See Fig. 1-7, water-cooled annular hot-cathode ion source averager, comprise main body 1, diaphragm 2, electrode fixed head 3, tungsten filament electrode post 7, front side electrode 10 and back side electrodes 11, electrode fixed head 3 is fixing on the body 1, diaphragm 2 is fixed on main body 1 upper end, tungsten filament electrode post 7 is through electrode fixed head 3, and front side electrode 10, back side electrodes 11 are fixed on electrode fixed head 3; Also comprise cooling water pipe 12 and ring-type tungsten filament 13, ring-type tungsten filament 13 is fixing on the body 1, and front side electrode 10, back side electrodes 11 are enclosed within tungsten filament electrode post 7 lower end respectively; Cooling water pipe 12 is fixed on the spill half slot outside main body 1.
Overlap between tungsten filament electrode post 7 and electrode fixed head 3 and have T-shaped ceramic washer 4, T-shaped ceramic washer 4 upper end cover has hat pad 6.
The lower end cover of tungsten filament electrode post 7 has column type ceramic washer 5, and column type ceramic washer 5 lower end cover has hat pad 6.
Two semi-annular shape tungsten filaments 13 are symmetrical, form the round structure of a ring-type as hot cathode.
The diameter of ring-type tungsten filament 13 is greater than the center-hole diameter 1-2mm of electrode fixed head 3.
Ring-type tungsten filament 13 is fixed on above electrode fixed head 3, and available protecting tungsten filament is not bombarded by ion source line, extends tungsten filament useful life.
T-shaped ceramic washer 4, column type ceramic washer 5 and hat pad 6 is adopted to combine, column type ceramic washer 5 is enclosed within T-shaped ceramic washer 4, hat pad 6 is buckled in T-shaped ceramic washer 4 and column type ceramic washer 5 respectively, effectively reduces the pollution that packing ring is caused by ion beam sputtering.
Diaphragm 2 is fixed on above main body 1, according to the needs of processing different bundle spot bore, can change the diaphragm of different center bore.
Electrode fixed head 3 is the disk of a center drilling, is fixed by screws in averager main body 1 structure; Electrode fixed head 3 has four apertures at all directions four direction.Above averager main body 1, diaphragm 2 is fixed in the above by making a decision, and ensures diaphragm 2 centre bore and averager main body 1 concentric; Cooling water pipe 12 is fixed on the spill half slot outside averager main body 1, and the two ends of cooling water pipe 12 are connected with cooling water by metal ferrule interface, and one end taps into the mouth of a river, and the other end picks out the mouth of a river.By with upper type, ring-type tungsten filament 13 is fixed in averager main body 1, by connecting power line to front side electrode 10 and back side electrodes 11, ring-type tungsten filament 13 i.e. heatable electron emission, by the circulation of cooling water, reduce the temperature of averager main body 1, decrease the thermal radiation to workpiece.
T-shaped ceramic washer 4 is connected with electrode fixed head 3 through the aperture of electrode fixed head 3, and wherein T-shaped ceramic washer 4 is with cap one end upward; Tungsten filament electrode post 7 is through T-shaped ceramic washer 4 centre bore; Column type ceramic washer 5 is enclosed within tungsten filament electrode post 7 lower end, and is connected with electrode fixed head 3 lower surface; Hat pad 6 is enclosed within tungsten filament electrode post 7 lower end, and is connected with column type ceramic washer 5 lower surface; At east-west direction, tungsten filament electrode post 7 is fixed on the screw thread of tungsten filament electrode post 7 lower end by a clamp nut 9, and tungsten filament electrode post 7, T-shaped ceramic washer 4, hat pad 6, column type ceramic washer 5 and electrode fixed head 3 are fixed together; In tungsten filament electrode post 7 upper end, T-shaped ceramic washer 4 is connected with hat pad 6, and tungsten filament electrode post 7 upper end is through hat pad 6 centre bore, the external screw thread that tungsten filament electrode post 7 upper end is exposed installs a clamp nut 9, clamp nut 9 is connected with hat pad 6, and fastening hat pad 6, tungsten filament electrode post 7 and T-shaped ceramic washer 4.
See Fig. 3, 4, the tungsten filament electrode post 7 that ring-type tungsten filament 13 is housed is in former and later two positions (reality can arbitrarily diagonal position), in electrode fixed head 3 lower end, tungsten filament electrode post 7, T-shaped ceramic washer 4, hat pad 6, column type ceramic washer 5 is consistent with the east-west direction in Fig. 2 with electrode fixed head 3 connected mode, be connected with front side electrode 10 and back side electrodes 11 respectively unlike hat pad 6, as in forward position, tungsten filament electrode post 7 makes front side electrode 10 be socketed with the tungsten filament electrode post 7 of front side through the hole on the right side of front side electrode 10, and be connected with hat pad 6, the external screw thread that front side electrode 10 is exposed is by clamp nut 9, make tungsten filament electrode post 7, T-shaped ceramic washer 4, hat pad 6, column type ceramic washer 5, front side electrode 10 and electrode fixed head 3 are fixed together, in electrode fixed head 3 upper end, in both sides, front and back, hat pad 6 is connected with the T-shaped ceramic washer 4 of both sides respectively, and be enclosed within the tungsten filament electrode post 7 of both sides, two semi-annular shape tungsten filaments 13 as shown in Figure 3, two ends are inserted on the aperture on front side and rear side tungsten filament electrode post 7 respectively, and the aperture direction on tungsten filament electrode post 7 is adjusted to fore-and-aft direction, make two semi-annular shape tungsten filament 13 symmetrical formation circle, its structure as shown in Figure 7, above ring-type tungsten filament 13, two flat shims 8 are adopted to be enclosed within the tungsten filament electrode post 7 of both sides respectively, flat shim 8 is made to be pressed on tungsten filament 13, then by clamp nut 9, be fixed on the external screw thread of tungsten filament electrode post 7 of both sides, tungsten filament electrode post 7, flat shim 8, tungsten filament 13, hat pad 6 and T-shaped ceramic washer 4 are fixed together.
In the present embodiment, need T-shaped ceramic washer 4 four, column type ceramic washer 5 four, 6 eight, hat pad, 7 four, tungsten filament electrode post, flat shim 8 two, clamp nut 9 eight, 13 two, semi-annular shape tungsten filament, all the other each one.
Claims (5)
1. a water-cooled annular hot-cathode ion source averager, comprise main body (1), diaphragm (2), electrode fixed head (3), tungsten filament electrode post (7), front side electrode (10) and back side electrodes (11), electrode fixed head (3) is fixed in main body (1), diaphragm (2) is fixed on main body (1) upper end, tungsten filament electrode post (7) is through electrode fixed head (3), and front side electrode (10), back side electrodes (11) are fixed on electrode fixed head (3); It is characterized in that, also comprise cooling water pipe (12) and ring-type tungsten filament (13), ring-type tungsten filament (13) is fixed in main body (1), and front side electrode (10), back side electrodes (11) are enclosed within tungsten filament electrode post (7) lower end respectively; Cooling water pipe (12) is fixed on the spill half slot in main body (1) outside.
2. water-cooled annular hot-cathode ion source averager according to claim 1, it is characterized in that, overlap between described tungsten filament electrode post (7) and electrode fixed head (3) and have T-shaped ceramic washer (4), T-shaped ceramic washer (4) upper end cover has hat pad (6).
3. water-cooled annular hot-cathode ion source averager according to claim 1, it is characterized in that, the lower end cover of described tungsten filament electrode post (7) has column type ceramic washer (5), and column type ceramic washer (5) lower end cover has hat pad (6).
4. water-cooled annular hot-cathode ion source averager according to claim 1, it is characterized in that, two semi-annular shape tungsten filaments (13) are symmetrical, form the round structure of a ring-type as hot cathode.
5. water-cooled annular hot-cathode ion source averager according to claim 1, it is characterized in that, the diameter of ring-type tungsten filament (13) is greater than the center-hole diameter 1-2mm of electrode fixed head (3).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510529388.9A CN105097398A (en) | 2015-08-26 | 2015-08-26 | Water cooling manner adopting annular hot cathode ion source neutralizer |
| CN201610705234.5A CN106229248A (en) | 2015-08-26 | 2016-08-23 | Water-cooled annular hot-cathode ion source neutralizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510529388.9A CN105097398A (en) | 2015-08-26 | 2015-08-26 | Water cooling manner adopting annular hot cathode ion source neutralizer |
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| CN105097398A true CN105097398A (en) | 2015-11-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510529388.9A Pending CN105097398A (en) | 2015-08-26 | 2015-08-26 | Water cooling manner adopting annular hot cathode ion source neutralizer |
| CN201610705234.5A Pending CN106229248A (en) | 2015-08-26 | 2016-08-23 | Water-cooled annular hot-cathode ion source neutralizer |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610705234.5A Pending CN106229248A (en) | 2015-08-26 | 2016-08-23 | Water-cooled annular hot-cathode ion source neutralizer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106941066A (en) * | 2017-03-22 | 2017-07-11 | 中山市博顿光电科技有限公司 | A kind of radio-frequency ion source averager for ionizing effect stability |
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| JPS63274051A (en) * | 1987-04-30 | 1988-11-11 | Sumitomo Electric Ind Ltd | Ion beam neutralizing device |
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| CN101308754B (en) * | 2008-05-30 | 2010-12-08 | 合肥工业大学 | Kaufman ion source of novel magnetic circuit structure |
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2015
- 2015-08-26 CN CN201510529388.9A patent/CN105097398A/en active Pending
-
2016
- 2016-08-23 CN CN201610705234.5A patent/CN106229248A/en active Pending
Patent Citations (7)
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| JPS63274051A (en) * | 1987-04-30 | 1988-11-11 | Sumitomo Electric Ind Ltd | Ion beam neutralizing device |
| JPH01209644A (en) * | 1988-02-18 | 1989-08-23 | Nippon Telegr & Teleph Corp <Ntt> | Ion neutralizer |
| US6462331B1 (en) * | 1998-11-17 | 2002-10-08 | Samsung Electronics Co., Ltd. | Method for monitoring turbo pump operation in an ion implantation apparatus |
| US6515426B1 (en) * | 1998-12-15 | 2003-02-04 | Hitachi, Ltd. | Ion beam processing apparatus and method of operating ion source therefor |
| JP2001110344A (en) * | 1999-10-06 | 2001-04-20 | Hitachi Ltd | Ion beam processing device |
| CN101060060A (en) * | 2007-05-15 | 2007-10-24 | 西安交通大学 | An electrodeless RF induction coupled plasma dischargable atomic source |
| CN104362065A (en) * | 2014-10-23 | 2015-02-18 | 中国电子科技集团公司第四十八研究所 | Large-caliber parallel beam ion source used for ion beam etcher |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106941066A (en) * | 2017-03-22 | 2017-07-11 | 中山市博顿光电科技有限公司 | A kind of radio-frequency ion source averager for ionizing effect stability |
| CN106941066B (en) * | 2017-03-22 | 2018-07-06 | 中山市博顿光电科技有限公司 | The radio-frequency ion source averager that a kind of ionization effect is stablized |
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| CN106229248A (en) | 2016-12-14 |
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Application publication date: 20151125 |