CN106653557A - Focused anode layer ion source device - Google Patents

Focused anode layer ion source device Download PDF

Info

Publication number
CN106653557A
CN106653557A CN201611177539.XA CN201611177539A CN106653557A CN 106653557 A CN106653557 A CN 106653557A CN 201611177539 A CN201611177539 A CN 201611177539A CN 106653557 A CN106653557 A CN 106653557A
Authority
CN
China
Prior art keywords
water
ring
anode
ion source
source device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201611177539.XA
Other languages
Chinese (zh)
Inventor
肖更竭
周晖
赵栋才
马占吉
武生虎
郑军
徐嶺茂
桑瑞鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lanzhou Institute of Physics of Chinese Academy of Space Technology
Original Assignee
Lanzhou Institute of Physics of Chinese Academy of Space Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lanzhou Institute of Physics of Chinese Academy of Space Technology filed Critical Lanzhou Institute of Physics of Chinese Academy of Space Technology
Priority to CN201611177539.XA priority Critical patent/CN106653557A/en
Publication of CN106653557A publication Critical patent/CN106653557A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/06Electron- or ion-optical arrangements
    • H01J49/062Ion guides

Abstract

The invention discloses a focused anode layer ion source device, which comprises a shell, wherein an anode ring and a cathode ring are oppositely arranged in the shell at an interval; an intake pipe is also fixedly arranged on the shell; the surfaces of the anode ring and the cathode ring are circular conical surfaces; the cathode ring comprises an outer cathode ring and an inner cathode ring; the outer cathode ring and the inner cathode ring are arranged in the same circular conical surface; and the conical surface of the anode ring is parallel to that of the cathode ring. The focused anode layer ion source device is scientific and reasonable in structure design; the anode ring and the cathode ring are set to be parallel circular conical surfaces, generated ion beams are focused towards the axis direction and the ion beams of which the sections are solid circles are formed within a distance range far away from the focusing point; the ion beam density is concentrated and the section uniformity is good; through a design of multiple groups of water-cooling systems, the cooling effect on a magnetic path and the inner cathode ring is ensured; the service life of the inner cathode ring can be prolonged; and the continuous high-intensity working time of the ion source is prolonged and the reliability of the ion source is strengthened.

Description

A kind of focusing anode layer ion source device
Technical field
The present invention relates to technology of ion source field, and in particular to a kind of focusing anode layer ion source device.
Background technology
Linear ion source is earliest that Russian researchers succeed in developing, and the nineties in last century, AE PLC of the U.S. obtained The design principle of the technology, has made intensive studies and product development to it, not only makes linear ion source in service behaviour It is greatly improved, but also is proposed the innovative product of multiple series, such as basic model, multiple unit type and linear ion Source etc..Such ion gun is cleaned in the ion beam etching of substrate, in terms of assisted film deposition and direct thin film deposition, achieve huge Ten-strike.But the ion beam that such ion gun is produced is parallel, and when focused ion beam is needed, such ion gun incapability is Power, meanwhile, in prior art, ion source device is generally lowered the temperature only with the mode of single water-cooled to device, and cooling-down effect has Limit, extreme influence ion source life and validity.
The content of the invention
To solve problems of the prior art, the invention provides a kind of can realize the focusing of focused ion beam Anode layer ion source device.
The purpose of the present invention is by the following technical programs implementing:
A kind of focusing anode layer ion source device, including housing, interval is relatively set with anode ring with the moon in the housing Polar ring, is further fixedly arranged on the housing air inlet pipe, and the anode ring is taper seat with the negative electrode ring surface, described Cathode loop includes vulva polar ring and inner cathode ring, and the vulva polar ring is arranged in same taper seat with the inner cathode ring, institute State the anode ring surface conical surface to be parallel to each other with the negative electrode ring surface conical surface.
Further, annulus, the anode ring and institute are provided between the vulva polar ring and the inner cathode ring State annulus position relative.
Further, the cathode loop side is provided with magnet steel, also including water-cooling system, the water-cooling system is to shell Body, anode ring and magnet steel are cooled down.
Further, the water-cooling system includes the first water-cooling system, the second water-cooling system and the 3rd water-cooling system, described First water-cooling system is arranged on the hull outside, and second water-cooling system is connected with the anode ring, the 3rd water-cooled System is arranged on around the magnet steel.
Further, second water-cooling system includes anode water-cooled water inlet pipe and anode water-cooled outlet pipe, described Anode water-cooled water inlet pipe and the anode water-cooled outlet pipe are fixed on the housing by insulating sleeve, and with the anode ring It is fixedly connected.
Further, the 3rd water-cooling system includes that the magnet steel water-cooled water inlet pipe being fixed on housing goes out with magnet steel water-cooled Water pipe, around the magnet steel, is additionally provided with water-cooled space, the magnet steel water-cooled water inlet pipe, water-cooled space and magnet steel water-cooled Outlet pipe connects setting.
Further, also including yoke, the yoke is arranged between the inner cathode ring and the magnet steel.
Further, also including teabowl with a cover part, the teabowl with a cover part fixes the inner cathode ring on the housing, and with institute State inner cathode ring and form gas buffer space, the air inlet pipe connects setting with the gas buffer space.
A kind of focusing anode layer ion source device according to claim 1, it is characterised in that:Also include clip, The clip is fixed on the vulva polar ring on the shell.
A kind of focusing anode layer ion source device according to claim 1, it is characterised in that:The anode ring with The taper seat taper of the cathode loop is 150 °.
The invention has the beneficial effects as follows:
Focusing anode layer ion source device disclosed in this invention, scientific structure design is rationally, equal by anode ring and cathode loop The taper seat being provided parallel to, the ion beam for making generation is focused on to axis direction, is formed with remote distance range in focus point and is cut Face is the ion beam of filled circles, and beam current density is concentrated and sectional uniform is good.Can be effectively improved ion beam processing, heating, cleaning, The beam current density accuracy of the technical process such as etching, sputtering and ion implanting.Meanwhile, the design of multigroup water-cooling system, Neng Gouyou Effect avoids inner cathode ring from causing Jing often to be sputtered by serious etching because water-cooled is insufficient, palpus periodic replacement, the metal for sputtering out Powder contaminated ion source built-in electrical insulation, cause ion gun be short-circuited failure the problems such as generation, this device water-cooling system is to magnetic The cooling effect of road and inner cathode ring substantially, can extend the service life of inner cathode ring, increase the continuous intensive work of ion gun Time and reliability.
Description of the drawings
Fig. 1 is a kind of focusing anode layer ion source device main view profile disclosed in this invention;
Fig. 2 is a kind of focusing anode layer ion source device right view disclosed in this invention.
Specific embodiment
With reference to specific embodiment, specific embodiments of the present invention is described in detail.
As shown in figure 1, the invention discloses a kind of focusing anode layer ion source device, including housing 18, housing 18 is Hollow cylindrical, is made up of steel Q235-B materials, with magnetic conduction effect.On the inwall of housing 18, insulation sleeve 5 is provided with, is insulated Set 5 is made up of polytetrafluoroethylmaterial material, it is ensured that plasma keeps insulation with housing 18.On the outer wall of housing 18, along housing 18 Outer wall is circumferentially provided with the first water-cooling system 7.First water-cooling system includes inlet pipeline 27, outlet pipeline 28, and is arranged on Fixed water cooling tube 7 is surround with the spot welding of shell 18 between inlet pipeline 27 and outlet pipeline 28, the first water-cooling system can have Effect ensures the cooling of housing 18.
Interval is relatively set with anode ring 6 and cathode loop in the housing 18, and the anode ring 6 is equal with the cathode loop For the circulus that surface is taper seat, specifically, anode ring 6 is made up of stainless steel material, the water-cooled with the second water-cooling system Pipe 17 is integrally welded, and the second water-cooling system also includes anode water-cooled water inlet pipe 1 and anode water-cooled outlet pipe 21, and anode water-cooled is entered Water pipe 1 is connected with anode water-cooled outlet pipe 21 with water cooling tube 17, and is fixedly installed by housing 18.Specifically, anode water-cooled goes out Between water pipe 21 and anode water-cooled water inlet pipe 1 and housing 18, isolated pipe is additionally provided with, the insulative pipe sleeve is included in insulation tube Set 4 and insulation tube overcoat 20, are provided with sealing ring 19 between insulation tube inner sleeve 4 and insulation tube overcoat 20.Insulation tube can have Effect ensures that anode water-cooled water inlet pipe 1 keeps insulation with anode water-cooled outlet pipe 21 with housing 18.
The cathode loop includes vulva polar ring 10 and inner cathode ring 11, and the vulva polar ring 10 sets with the inner cathode ring 11 Put in same taper seat, the surface conical surface of the anode ring 6 is parallel to each other with the negative electrode ring surface conical surface, the anode ring 6 150 ° are with the taper seat taper of the cathode loop.Ring-type is provided between the vulva polar ring 10 and the inner cathode ring 11 Space 16, the anode ring 6 is relative with the position of the annulus 16.Vulva polar ring 10 is fixed on housing 18 by clip 9.
In housing 18, magnet steel 15 is additionally provided with, by SmCo or NdFeB material, magnetic potential and the magnetic line of force can be produced.Magnetic Steel 15 is arranged on cathode loop side, and is in the same side with anode ring 6, between magnet steel and inner cathode ring 11, is additionally provided with magnetic Yoke 13, is made up of steel Q235-B materials, plays magnetic conduction effect.
Wireway 23 is arranged on the axial location of housing 18, and through housing 18, magnet steel 15, yoke 13 and inner cathode ring 11, and the opposite side in inner cathode ring 11 is fixedly connected setting with teabowl with a cover part 12 by nuts and washers 14.Teabowl with a cover part 12 will be interior Cathode loop 11 is fixed on housing 18, meanwhile, a buffering for being passed through gas is formed between teabowl with a cover part 12 and inner cathode ring 11 Space, wireway 23 is connected with the cushion space of teabowl with a cover part 12, and cushion space more uniformly spreads the gas in ion gun.
3rd water-cooling system includes the magnet steel water-cooled water inlet pipe 22 being fixed on housing 18 and magnet steel water-cooled outlet pipe 25, Around the magnet steel 15, water-cooled space 24, the magnet steel water-cooled water inlet pipe 22, water-cooled space 24 and magnet steel water-cooled are additionally provided with Outlet pipe 25 connects setting.As illustrated, heat transfer distance of the water-cooled path of the 3rd water-cooling system apart from inner cathode ring 11 It is close, it is obvious to the cooling effect of magnetic circuit and inner cathode ring 11, the service life of inner cathode ring 11 can be extended, increase ion gun and connect Continuous intensive work time and reliability.
The process of focusing anode layer ion source device production focused ion beam disclosed in this invention is situated between below Continue:
(1) Chemical cleaning:Focused ion source device is disassembled first, acetone/ethanol is dipped in ion gun all parts using cotton Surface carries out multipass scouring, till silk color no longer occurs significant change, is then placed on ultrasonic cleaning equipment In, it is cleaned by ultrasonic with organic solvents such as acetone, ethanol, focusedion source is assembled after natural air drying.
(2) working environment prepares:Because the working environment of focusedion source must work under vacuum conditions, thus by its After being assemblied in vacuum chamber, prepare forevacuum.
(3) it is passed through working gas:According to the focused ion beam species of need of work, it is passed through accordingly by air inlet pipe 23 Gas, keeps gas pressure in vacuum to be advisable in 5.0 × 10-3Pa ~ 1.0 × 10-1Pa, adjusts with specific reference to actually used demand.
(4) it is passed through water-cooled:Before ion gun works, by the first water-cooling system, the second water-cooling system and the 3rd water Cooling system water flowing, it is ensured that ion gun low-temperature working.
(5) focused ion beam is produced:To anode ring 6 and vulva polar ring 10, inner cathode ring 11 pressurizes, then ion beam is from vulva Draw between polar ring 10 and inner cathode ring 11, form focused ion beam.
The anode ring 6 of this device, inner cathode ring 11 and vulva polar ring 10 are both designed as part pyramid like configuration, the end of these annulus Face is the taper seat for concaving, and about 150 degree of cone angle, the ion beam of generation is focused on to axis direction, in focus point with remote distance Scope Formation cross-section is the ion beam of filled circles, and beam current density is concentrated and sectional uniform is good.Ion beam processing can be improved, added The beam current density accuracy of the technical process such as heat, cleaning, etching, sputtering and ion implanting.
This device increased the water-cooled path design around the magnet steel of ion gun inside, it is to avoid common anode layer is ionogenic Inner cathode ring is insufficient due to cooling down, and Jing is often sputtered by serious etching, must periodic replacement, the metal-powder for sputtering out pollute from Component built-in electrical insulation, causes the ion gun many defects such as failure that are short-circuited to can effectively ensure that to the cold of magnetic circuit and inner cathode ring But effect, extends the service life of inner cathode ring 11, increases ion gun continuous intensive work time and reliability.
Finally it should be noted that:The preferred embodiments of the present invention are the foregoing is only, the present invention is not limited to, Although being described in detail to the present invention with reference to the foregoing embodiments, for a person skilled in the art, it still may be used To modify to the technical scheme described in foregoing embodiments, or equivalent is carried out to which part technical characteristic. All any modification, equivalent substitution and improvements within the spirit and principles in the present invention, made etc., should be included in the present invention's Within protection domain.

Claims (10)

1. a kind of focusing anode layer ion source device, including housing, in the housing interval be relatively set with anode ring with Cathode loop, is further fixedly arranged on the housing air inlet pipe, it is characterised in that:The anode ring is equal with the negative electrode ring surface For taper seat, the cathode loop includes vulva polar ring and inner cathode ring, and the vulva polar ring is arranged on together with the inner cathode ring In one taper seat, the anode ring surface conical surface is parallel to each other with the negative electrode ring surface conical surface.
2. a kind of focusing anode layer ion source device according to claim 1, it is characterised in that:The vulva polar ring with Annulus is provided between the inner cathode ring, the anode ring is relative with the annulus position.
3. a kind of focusing anode layer ion source device according to claim 1, it is characterised in that:In the cathode loop one Side is provided with magnet steel, and also including water-cooling system, the water-cooling system is cooled down to housing, anode ring and magnet steel.
4. a kind of focusing anode layer ion source device according to claim 3, it is characterised in that:The water-cooling system bag The first water-cooling system, the second water-cooling system and the 3rd water-cooling system are included, first water-cooling system is arranged on the hull outside, Second water-cooling system is connected with the anode ring, and the 3rd water-cooling system is arranged on around the magnet steel.
5. a kind of focusing anode layer ion source device according to claim 4, it is characterised in that:Second water Cooling system includes anode water-cooled water inlet pipe and anode water-cooled outlet pipe, the anode water-cooled water inlet pipe and the anode water-cooled water outlet Pipe is fixed on the housing by insulating sleeve, and is fixedly connected with the anode ring.
6. a kind of focusing anode layer ion source device according to claim 4, it is characterised in that:The 3rd water-cooled system System includes the magnet steel water-cooled water inlet pipe being fixed on housing and magnet steel water-cooled outlet pipe, around the magnet steel, is additionally provided with water Cold space, the magnet steel water-cooled water inlet pipe, water-cooled space and magnet steel water-cooled outlet pipe connect setting.
7. a kind of focusing anode layer ion source device according to claim 1, it is characterised in that:Also include yoke, institute State yoke to be arranged between the inner cathode ring and the magnet steel.
8. a kind of focusing anode layer ion source device according to claim 1, it is characterised in that:Also include teabowl with a cover part, The teabowl with a cover part fixes the inner cathode ring on the housing, and forms gas buffer space, institute with the inner cathode ring State air inlet pipe and connect setting with the gas buffer space.
9. a kind of focusing anode layer ion source device according to claim 1, it is characterised in that:Also include clip, institute State clip the vulva polar ring is fixed on the shell.
10. a kind of focusing anode layer ion source device according to claim 1, it is characterised in that:The anode ring with The taper seat taper of the cathode loop is 150 °.
CN201611177539.XA 2016-12-19 2016-12-19 Focused anode layer ion source device Pending CN106653557A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611177539.XA CN106653557A (en) 2016-12-19 2016-12-19 Focused anode layer ion source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611177539.XA CN106653557A (en) 2016-12-19 2016-12-19 Focused anode layer ion source device

Publications (1)

Publication Number Publication Date
CN106653557A true CN106653557A (en) 2017-05-10

Family

ID=58833768

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201611177539.XA Pending CN106653557A (en) 2016-12-19 2016-12-19 Focused anode layer ion source device

Country Status (1)

Country Link
CN (1) CN106653557A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108914091A (en) * 2018-08-10 2018-11-30 成都极星等离子科技有限公司 A kind of improved anode leafing component
CN109041402A (en) * 2018-07-31 2018-12-18 宜昌后皇真空科技有限公司 A kind of method and device for the method generating multiple-charged state ion beam
CN109536906A (en) * 2018-12-20 2019-03-29 兰州空间技术物理研究所 A kind of anode layer ion source for assembling cathodic sputtering ring
CN109599310A (en) * 2018-06-21 2019-04-09 新奥科技发展有限公司 A kind of ion source mounting bracket
CN110767522A (en) * 2019-11-04 2020-02-07 陈伟 Focusing type linear anode layer ion source
CN111586954A (en) * 2020-06-08 2020-08-25 江苏帕斯玛环境科技有限公司 Method for generating water vapor plasma

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007023489A1 (en) * 2005-08-21 2007-03-01 Zvi Porat A plasma emitter and methods utilizing the same
US20080136309A1 (en) * 2006-12-06 2008-06-12 Chu Paul K Ion source
US20090020415A1 (en) * 2007-07-16 2009-01-22 Michael Gutkin "Iontron" ion beam deposition source and a method for sputter deposition of different layers using this source
CN201409253Y (en) * 2009-05-05 2010-02-17 核工业西南物理研究院 Anode-layer-linear ion source
WO2013096519A1 (en) * 2011-12-20 2013-06-27 Muons, Inc. Method and apparatus for surface plasma source (sps) with anode layer plasma accelerator

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007023489A1 (en) * 2005-08-21 2007-03-01 Zvi Porat A plasma emitter and methods utilizing the same
US20080136309A1 (en) * 2006-12-06 2008-06-12 Chu Paul K Ion source
US20090020415A1 (en) * 2007-07-16 2009-01-22 Michael Gutkin "Iontron" ion beam deposition source and a method for sputter deposition of different layers using this source
CN201409253Y (en) * 2009-05-05 2010-02-17 核工业西南物理研究院 Anode-layer-linear ion source
WO2013096519A1 (en) * 2011-12-20 2013-06-27 Muons, Inc. Method and apparatus for surface plasma source (sps) with anode layer plasma accelerator

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
王军伟: "线性离子源的综合设计和性能研究", 《中国优秀硕士学位论文全文数据库》 *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109599310A (en) * 2018-06-21 2019-04-09 新奥科技发展有限公司 A kind of ion source mounting bracket
CN109599310B (en) * 2018-06-21 2021-01-05 新奥科技发展有限公司 Ion source mounting bracket
CN109041402A (en) * 2018-07-31 2018-12-18 宜昌后皇真空科技有限公司 A kind of method and device for the method generating multiple-charged state ion beam
CN108914091A (en) * 2018-08-10 2018-11-30 成都极星等离子科技有限公司 A kind of improved anode leafing component
CN109536906A (en) * 2018-12-20 2019-03-29 兰州空间技术物理研究所 A kind of anode layer ion source for assembling cathodic sputtering ring
CN110767522A (en) * 2019-11-04 2020-02-07 陈伟 Focusing type linear anode layer ion source
CN110767522B (en) * 2019-11-04 2022-03-18 无锡诚承电子科技有限公司 Focusing type linear anode layer ion source
CN111586954A (en) * 2020-06-08 2020-08-25 江苏帕斯玛环境科技有限公司 Method for generating water vapor plasma
CN111586954B (en) * 2020-06-08 2022-09-09 江苏帕斯玛环境科技有限公司 Method for generating water vapor plasma

Similar Documents

Publication Publication Date Title
CN106653557A (en) Focused anode layer ion source device
US7879203B2 (en) Method and apparatus for cathodic arc ion plasma deposition
CN102497721B (en) Plasma device with double-hollow cathode and double-hollow cathode and applications
CN205124106U (en) Compact D -D neutron generator
CN110067712B (en) Magnetic plasma thruster inducing axial magnetic field
CN105407621A (en) Compact type D-D neutron generator
CN207391539U (en) A kind of plated film protective cover and its coating apparatus with refrigerating function
CN109587926B (en) Miniaturized strong current neutron generator
JP2017133111A (en) Cooling ring for physical gas phase deposition chamber target
JPH03197670A (en) Cathodic sputtering device
US10204758B1 (en) Positive and negative ion source based on radio-frequency inductively coupled discharge
CN103596350A (en) Cathode structure of novel laminar plasma generator
CN103952677A (en) Method for coating inner wall of electron-enhanced plasma discharge tube
CN109041395B (en) A kind of air-cooling apparatus and plasma generator for plasma generator
CN103824741A (en) High-energy electronic gun
CN101182112B (en) Collapsar furnace for manufacturing fibre-optical prefabricated rod
CN104772305B (en) Direct current cascade arcs plasma torch cleans the device of the mirror of tokamak first
GB1402820A (en) Cathode-sputtering apparatus
CN208638772U (en) A kind of plasma generator
CN108428613B (en) Open ion source and method
JPH11257867A (en) Power supply system for vacuum furnace
CN103352222B (en) A kind of preparation method of the carbon-base tungsten coating for tokamak device
CN110797242B (en) Cold cathode electron gun device for coating film
US3449628A (en) Plasma arc electrodes with anode heat shield
US20150162159A1 (en) Bearing arrangement for rotatably mounting an electrode and electrode arrangement

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20170510

RJ01 Rejection of invention patent application after publication