CN105092583A - Silicon single crystal orientation deviation testing device with common light source - Google Patents

Silicon single crystal orientation deviation testing device with common light source Download PDF

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Publication number
CN105092583A
CN105092583A CN201510496335.1A CN201510496335A CN105092583A CN 105092583 A CN105092583 A CN 105092583A CN 201510496335 A CN201510496335 A CN 201510496335A CN 105092583 A CN105092583 A CN 105092583A
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CN
China
Prior art keywords
light source
crystal orientation
silicon single
single crystal
ordinary light
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Pending
Application number
CN201510496335.1A
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Chinese (zh)
Inventor
许秀群
杨辉
许云奕
张开云
包祯美
郭丽萍
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
China Zhenhua Group Wiko Electronics Co Ltd (state 873 Factory)
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China Zhenhua Group Wiko Electronics Co Ltd (state 873 Factory)
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Application filed by China Zhenhua Group Wiko Electronics Co Ltd (state 873 Factory) filed Critical China Zhenhua Group Wiko Electronics Co Ltd (state 873 Factory)
Priority to CN201510496335.1A priority Critical patent/CN105092583A/en
Publication of CN105092583A publication Critical patent/CN105092583A/en
Pending legal-status Critical Current

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Abstract

The invention provides a silicon single crystal orientation deviation testing device with a common light source. The silicon single crystal orientation deviation testing device comprises a common light source system, a light path system, a mirror surface and an adjustable angle gauge. The light outlet of the common light source system is connected with the light inlet of the light path system. The light path system outputs parallel light, and the parallel light penetrates through a small hole in the center of the mirror surface to be emitted on a tested object on a carrying table. The adjustable angle gauge tests the deviation degree of a crystal orientation graph reflected to the mirror surface. According to the silicon single crystal orientation deviation testing device with the common light source, the common light source system and the light path system are used for forming the proper parallel light, special diffuse reflection processing is conducted on the mirror surface so that a proper diffuse reflection effect is achieved, finally the purposes of achieving clear light images and facilitating angle adjustment are achieved, and the manufacturing steps of the adjustable common light source system and the mirror surface are simple. The silicon single crystal orientation deviation testing device is easy to manufacture, convenient to test, capable of achieving the purpose of testing the crystal orientation deviation of the tested material, and a testing loop is simple.

Description

Proving installation is departed from a kind of silicon single crystal crystal orientation of ordinary light source that uses
Technical field
The invention belongs to material crystal orientation technical field of measurement and test, be specifically related to a kind of silicon single crystal crystal orientation of ordinary light source that uses and depart from proving installation.
Background technology
Monocrystalline and orientation material all show superior performance in fields such as semiconductor, electromagnetics, optics and machineries.In the research process of new structure and functional material and device, can run into polycrystal, the monocrystalline of certain macro-size and a large amount of marginal orientation material, crystal orientation test and monocrystalline quality assessment are more and more subject to the attention of researchist.
Crystal orientation irrelevance is the axle of crystal and crystallographic direction when misfitting, and its angle departed from is called crystal orientation irrelevance.Crystal ingot end face and tested crystal orientation are departed from, and etch pit symmetry will depart from, and utilize this characteristic just can determine crystal orientation irrelevance.The common method that crystal orientation is detected has appearance observation, optical orientation method and X-ray diffraction method, and wherein optical orientation method and X-ray diffraction method are all methods conventional in commercial production.
Current domestic without ordinary light source, the crystal orientation irrelevance tester of mechanical type band simple optical path control system, the general X-ray diffraction mode test crystal that adopts is to change now both at home and abroad, and it is unshielded that domestic X-ray diffractometer belongs to open X-ray, and taking of import is higher.
Summary of the invention
For solving the problems of the technologies described above, the invention provides a kind of silicon single crystal crystal orientation of ordinary light source that uses and depart from proving installation, the silicon single crystal crystal orientation of this use ordinary light source is departed from proving installation and is realized the irrelevance test of silicon single crystal crystal orientation by utilizing ordinary light source system, light path system and mechanical angle instrument, the open X-ray solving X-ray diffractometer is unshielded, and import take higher problem.
The present invention is achieved by the following technical programs.
Proving installation is departed from a kind of silicon single crystal crystal orientation of ordinary light source that uses provided by the invention, comprises ordinary light source system, light path system, minute surface and angle adjustable instrument; The described light exit of ordinary light source system is connected with the light entrance of light path system, described light path system exports directional light, and directional light is beaten through the aperture of minute surface central authorities and is being placed on the measured object on objective table, described angle adjustable instrument test is reflected back the departure degree of the crystal orientation figure on minute surface.
Optically focused multiplying arrangement in described light path system, first by ordinary light source optically focused, after then forming grating by grating forming apparatus, then forms zero diopter by directional light forming apparatus, and the directional light scioptics of formation export.
Described objective table is adjustable objective table.
The bulb that described ordinary light source system is adjustable lamp socket and is arranged on adjustable lamp socket.
Described ordinary light source system is adjustable ordinary light source system.
Described lens are the compound lens forming standard parallel light.
Diffuse reflection process is carried out on the surface of described minute surface.
Beneficial effect of the present invention is: utilize ordinary light source system and light path system to form suitable directional light, and special diffuse reflection process is carried out to minute surface reach suitable diffuse effect, finally realize the object that light image is clear, be beneficial to angular adjustment, the making step of adjustable ordinary light source system and minute surface is simple, the present invention is easy to make and convenient test, can meet the test purpose of test material crystal orientation irrelevance, test loop is simple.
Accompanying drawing explanation
Fig. 1 is theory diagram of the present invention;
Fig. 2 is light path sketch of the present invention;
In figure: 1-ordinary light source system 1,2-light path system 2,3-minute surface 3,4-objective table 4,5-angle adjustable instrument 5.
Embodiment
Further describe technical scheme of the present invention below, but described in claimed scope is not limited to.
Proving installation is departed from a kind of silicon single crystal crystal orientation of ordinary light source that uses as depicted in figs. 1 and 2, comprises ordinary light source system 1, light path system 2, minute surface 3 and angle adjustable instrument 5; The light exit of described ordinary light source system 1 is connected with the light entrance of light path system 2, described light path system 2 exports directional light, and directional light is beaten through the aperture of minute surface 3 central authorities and is being placed on the measured object on objective table 4, described angle adjustable instrument 5 test is reflected back the departure degree of the crystal orientation figure on minute surface 3.
Optically focused multiplying arrangement in described light path system 2, first by ordinary light source optically focused, after then forming grating by grating forming apparatus, then forms zero diopter by directional light forming apparatus, and the directional light scioptics of formation export.
Described objective table 4 is adjustable objective table.
The bulb that described ordinary light source system 1 is adjustable lamp socket and is arranged on adjustable lamp socket; Ordinary light source system 1 is adjustable ordinary light source system, can realize the omnibearing adjustment of light source, and the directional light light intensity realized finally by aperture injection enough meets test needs, crystal orientation figure can normally highlightedly be realized on minute surface.Meanwhile, absorb optically focused and form certain light path by having in the position of reasonable adjusting ordinary light source system, light path system 2 with scioptics system, finally ensure that directional light is mapped to sample surfaces from the aperture of minute surface 3, the crystal orientation figure on sample reflexes on minute surface.
Described lens are the compound lens forming standard parallel light.
Diffuse reflection process is carried out on the surface of described minute surface 3, realizes light image clear.
The light exit of ordinary light source system 1 of the present invention receives light path system 2, directional light is formed by light path system 2, directional light to be beaten by the aperture on minute surface 3 and is being placed on the treated silicon single crystal flake sample on objective table 4 by the directional light formed, and utilizes angle adjustable instrument to regulate the departure degree testing out the crystal orientation figure being reflected back minute surface; Objective table 4 can all-around mobile.
Silicon single crystal crystal orientation of the present invention irrelevance tester is non-X-ray diffraction mode also non-He-Ne Lasers, and the simple volume of complete machine is little.
The present invention utilizes ordinary light source and a simple light path system to form suitable directional light, and special diffuse reflection process is carried out to minute surface, finally realize the object that light image is clear, be beneficial to angular adjustment, adjustable ordinary light source system and mirror process make simple, and convenient test, meet the test purpose of test material crystal orientation irrelevance, test loop is simple.
Test loop of the present invention is utilized to carry out crystal orientation irrelevance test to silicon single crystal material, according to the test result of reality, the test value of material, in specialized range, meets the test purpose of silicon single crystal material crystal orientation irrelevance, test loop is simple, is easy to make and convenient test.

Claims (7)

1. one kind uses the silicon single crystal crystal orientation of ordinary light source to depart from proving installation, comprise ordinary light source system (1), light path system (2), minute surface (3), objective table (4) and angle adjustable instrument (5), it is characterized in that: the light exit of described ordinary light source system (1) is connected with the light entrance of light path system (2), described light path system (2) exports directional light, and directional light is beaten be placed on the measured object on objective table (4) through the aperture of minute surface (3) central authorities, described angle adjustable instrument (5) test is reflected back the departure degree of the crystal orientation figure on minute surface (3).
2. proving installation is departed from the silicon single crystal crystal orientation of ordinary light source that uses as claimed in claim 1, it is characterized in that: the optically focused multiplying arrangement in described light path system (2) is first by ordinary light source optically focused, then after forming grating by grating forming apparatus, form zero diopter by directional light forming apparatus again, the directional light scioptics of formation export.
3. proving installation is departed from the silicon single crystal crystal orientation of ordinary light source that uses as claimed in claim 1, it is characterized in that: described objective table (4) is adjustable objective table.
4. proving installation is departed from the as claimed in claim 1 silicon single crystal crystal orientation of ordinary light source that uses, and it is characterized in that: described ordinary light source system (1) is adjustable lamp socket and the bulb that is arranged on adjustable lamp socket.
5. proving installation is departed from the silicon single crystal crystal orientation of ordinary light source that uses as claimed in claim 1, it is characterized in that: described ordinary light source system (1) is adjustable ordinary light source system.
6. proving installation is departed from the silicon single crystal crystal orientation of ordinary light source that uses as claimed in claim 2, it is characterized in that: described lens are the compound lens forming standard parallel light.
7. proving installation is departed from the silicon single crystal crystal orientation of ordinary light source that uses as claimed in claim 1, it is characterized in that: diffuse reflection process is carried out on the surface of described minute surface (3).
CN201510496335.1A 2015-08-13 2015-08-13 Silicon single crystal orientation deviation testing device with common light source Pending CN105092583A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510496335.1A CN105092583A (en) 2015-08-13 2015-08-13 Silicon single crystal orientation deviation testing device with common light source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510496335.1A CN105092583A (en) 2015-08-13 2015-08-13 Silicon single crystal orientation deviation testing device with common light source

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136150A (en) * 1981-02-18 1982-08-23 Rigaku Denki Kk Method for measuring deviation angle of cut plane of single crystal
JPH06167464A (en) * 1992-11-30 1994-06-14 Rigaku Corp Inspecting apparatus for cut surface of single crystal material
CN202563791U (en) * 2012-02-20 2012-11-28 华北电力大学(保定) Demonstration teaching instrument of laser-measurement silicon single crystal orientations
CN103928363A (en) * 2014-04-11 2014-07-16 常州天合光能有限公司 Method and device for detecting crystal direction of silicon slice
CN204924955U (en) * 2015-08-13 2015-12-30 中国振华集团永光电子有限公司(国营第八七三厂) Silicon single crystal crystal orientation irrelevance testing arrangement

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136150A (en) * 1981-02-18 1982-08-23 Rigaku Denki Kk Method for measuring deviation angle of cut plane of single crystal
JPH06167464A (en) * 1992-11-30 1994-06-14 Rigaku Corp Inspecting apparatus for cut surface of single crystal material
CN202563791U (en) * 2012-02-20 2012-11-28 华北电力大学(保定) Demonstration teaching instrument of laser-measurement silicon single crystal orientations
CN103928363A (en) * 2014-04-11 2014-07-16 常州天合光能有限公司 Method and device for detecting crystal direction of silicon slice
CN204924955U (en) * 2015-08-13 2015-12-30 中国振华集团永光电子有限公司(国营第八七三厂) Silicon single crystal crystal orientation irrelevance testing arrangement

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
《半导体器件制造技术丛书》编写组编: "《衬底制备》", 31 March 1972 *
康伟超等: "《硅材料检测技术》", 31 July 2009 *
黄汉尧等编: "《半导体器件工艺原理》", 30 June 1980 *

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