CN105092039B - method for obtaining correction value of multi-frequency spectrophotometer - Google Patents
method for obtaining correction value of multi-frequency spectrophotometer Download PDFInfo
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- CN105092039B CN105092039B CN201510470556.1A CN201510470556A CN105092039B CN 105092039 B CN105092039 B CN 105092039B CN 201510470556 A CN201510470556 A CN 201510470556A CN 105092039 B CN105092039 B CN 105092039B
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Abstract
The invention discloses a method for obtaining the correction value of a multi-frequency spectrophotometer. The method comprises that a database including mapping relation between different film thicknesses and corresponding spectra of a target color resistor is established; the film thickness DX of a color sheet to be measured of the target color resistor is accurately measured; a first film thickness D1 and a second film thickness D2 approximate to the film thickness DX of the color sheet to be measured and spectral T1 and T2 corresponding to the D1 and D2 are selected from the database, and the T1 and T2 serve as reference spectra; a first constant A and a second constant a of the target color resistor in certain wavelength are obtained by utilizing formulas T1=Aeat1 and T2=Aeat2; and according to the first constant A and the second constant a, a reference spectrum T corresponding to the film thickness DX of the color sheet to be measured is calculated by the formula T=Aeat, and the reference spectrum serves as the correction value of the multi-frequency spectrophotometer. According to the method, the reference spectrum T which is calculated by the Lambert's law formula directly serves as the correction value of the multi-frequency spectrophotometer, so that deviation of the correction value of the multi-frequency spectrophotometer can be reduced, and the test cost is effectively reduced.
Description
Technical field
The present invention relates to liquid crystal technology field, the acquisition side of the spectrophotometric correction value of more particularly to a kind of multifrequency
Method.
Background technology
The color quality significant portion of liquid crystal display depends on the colourity of its CF (colorful filter array substrate) side color blocking
Performance, therefore in product development and production phase, the accurate measurement to the colourity of color blocking is particularly important with control.Many frequency divisions
Visual plant of the light photometer (Multi Channel Photo Detector, MCPD) as the colourity for measuring color blocking, its survey
The accuracy of amount for color blocking colourity assessment with control play the role of it is important.Due to due to equipment cost, many producers
The equipment for often selecting price relatively cheap when MCPD is selected carries out purchase use, but such equipment often configure compared with
For low side, more using the spectrophotometer of single beam, and the spectrophotometer test result of single beam compared to dual-beam point
The photometric measured value of light has certain deviation.To make measurement result more accurate, survey crew is in the light splitting light using single beam
When degree meter is measured, need to be modified the frequency spectrum for measuring.
At present the frequency spectrum that the spectrophotometer of single beam carries out colour measurement is modified to enter essentially according to following methods
OK：The pure color piece consistent with the thickness of color chips to be measured is made, is measured and is obtained with the ultraviolet-uisible spectrophotometer of dual-beam
To frequency spectrum, using spectrophotometer of the frequency spectrum as correction value storage to single beam.But such correction value is often present
Problems with：When making consistent with the color blocking thickness of color chips to be measured pure color piece, because of the impact of processing technology so that making it is pure
The thickness of the thickness of color chips and color chips to be measured can not be completely the same, and the diversity of thickness causes correction value to have certain deviation；
In addition, if when the process conditions of colorful filter array substrate change so that the thickness of color chips to be measured occurs change, then conduct is repaiied
On the occasion of pure color piece be also required to remake, increase testing cost.
In sum, it is necessary to provide a kind of acquisition methods of the spectrophotometric correction value of multifrequency to solve above-mentioned asking
Topic.
The content of the invention
The invention mainly solves the technical problem of providing a kind of acquisition methods of the spectrophotometric correction value of multifrequency, energy
The deviation of the spectrophotometric correction value of multifrequency is enough reduced, testing cost is reduced.
To solve above-mentioned technical problem, one aspect of the present invention is：A kind of multifrequency spectrophotometer is provided
Correction value acquisition methods, the method includes：The mapping for setting up the corresponding frequency spectrum under different thickness of target color blocking is closed
The data base of system；The thickness D of the color chips to be measured of target color blocking is measured accuratelyX；The thickness D with color chips to be measured is chosen from data baseX
The first close thickness D1, the second thickness D2And its corresponding frequency spectrum T1、T2As reference spectrum；Using formula T1=Aeat1And T2
=Aeat2First constant A and second constant a of target color blocking under certain wavelength are obtained, wherein：The value of t1 is the first thickness D1,
T1For the first thickness D1Corresponding frequency spectrum；The value of t2 is the second thickness D2, T2For the second thickness D2Corresponding frequency spectrum, e are nature
The truth of a matter of logarithm；According to first constant A and second constant a, using formula T=AeatCalculate the thickness D of color chips to be measuredXCorrespondence
Reference spectrum T, wherein, the value of t is the thickness D of color chips to be measuredX, and by the thickness D of color chips to be measuredXCorresponding reference spectrum T
As the spectrophotometric correction value of multifrequency.
Wherein, multifrequency spectrophotometric is calculated as the ultraviolet-uisible spectrophotometer of single beam.
Wherein, the thickness D of color chips to be measuredXIn the first thickness D1With the second thickness D2Between.
Wherein, the step of data base of the mapping relations for setting up the corresponding frequency spectrum under different thickness of target color blocking, wraps
Include：Make the pure color piece of the target color blocking of different thickness；Difference is measured respectively using the ultraviolet-uisible spectrophotometer of dual-beam
The pure color piece of the target color blocking of thickness is obtaining the corresponding reference spectrum of each thickness；Set up and store the pure color piece of target color blocking
Thickness and reference spectrum mapping relations, it is corresponding with the pure color piece of the target color blocking by the different thickness of mapping relationship searching
Reference spectrum.
Wherein, the difference range of the thickness of the pure color piece of the target color blocking of different thickness is 0.5-1 microns.
Wherein, the area of the pure color piece of the target color blocking of different thickness is n*n square centimeters, wherein, n is more than dual-beam
The diameter of measurement of ultraviolet-visible spectrophotometer hot spot.
Wherein, the scope of n is 5-10 centimetre.
Wherein, target color blocking includes red resistance, blue resistance and green resistance.
The invention has the beneficial effects as follows：It is different from the situation of prior art, the spectrophotometric amendment of multifrequency of the present invention
The acquisition methods of value include：The data base for setting up the mapping relations of the corresponding frequency spectrum under different thickness of target color blocking；It is accurate
The thickness D of the color chips to be measured of target color blocking is measured reallyX；The thickness D with color chips to be measured is chosen from data baseXThe first close film
Thick D1, the second thickness D2And its corresponding frequency spectrum T1、T2As reference spectrum；Using formula T1=Aeat1And T2=Aeat2Obtain one
First constant A and second constant a of target color blocking under standing wave length, according to first constant A and second constant a, using formula T=
AeatCalculate the thickness D of color chips to be measuredXCorresponding reference spectrum T, and by the thickness D of color chips to be measuredXCorresponding reference spectrum T
As the spectrophotometric correction value of multifrequency.By the way, the present invention is by directly accurately measuring the to be measured of target color blocking
The thickness of color chips, is not required to make the pure color piece consistent with the thickness of color chips to be measured, it is to avoid the thickness of the pure color piece made from it is to be measured
The thickness of color chips can not on all four problem；Even if the process conditions of colorful filter array substrate change, also only accurately need to survey
Amount obtains its corresponding correction value by the method for the present invention by obtaining thickness after changing, it is not necessary to remake correction value
Pure color piece, improves the convenience of test, the testing cost for reducing；In addition, the present invention is directly calculated using Lambert's law formula
The reference spectrum T for going out can effectively reduce the spectrophotometric correction value of multifrequency as the spectrophotometric correction value of multifrequency
Deviation, further improves the accuracy that multifrequency spectrophotometer treats the colour measurement of colour examining resistance.
Description of the drawings
Fig. 1 is the schematic flow sheet of the acquisition methods of the spectrophotometric correction value of multifrequency of the present invention；
Fig. 2 is the sub-step schematic flow sheet of step S101 in Fig. 1.
Specific embodiment
The present invention discloses a kind of acquisition methods of the spectrophotometric correction value of multifrequency, as shown in figure 1, the method include with
Lower step：
Step S101：The data base for setting up the mapping relations of the corresponding frequency spectrum under different thickness of target color blocking.
In the present embodiment, target color blocking includes red resistance, blue resistance and green resistance.It should be understood that the aim colour of the present invention
Resistance is not limited to red resistance, blue resistance and green resistance, can also be other color blockings, depending on specifically needing according to practical situation.
As shown in Fig. 2 step S101 includes following sub-step：
Step S1011：Make the pure color piece of the target color blocking of different thickness.
In the present embodiment, the difference range of the thickness of the pure color piece of the target color blocking of different thickness is 0.5-1 microns.When
So, in certain embodiments, the difference range of the thickness of the pure color piece of the target color blocking of different thickness can also be other scopes
Value.Preferably, the area of the pure color piece of the target color blocking of different thickness is n*n square centimeters, wherein, purples of the n more than dual-beam
Outer visible spectrophotometer measures the diameter of hot spot, and the scope of n is 5-10 centimetre.In addition, in certain embodiments, different thickness
Target color blocking pure color piece area can be n*m square centimeters, m can be the natural number more than n, or m can also
It is the natural number less than n.
In certain embodiments, the thickness of the pure color piece of the target color blocking of different thickness forms arithmetic progression and is incremented by, and which is public
Difference d scopes are 0.5-1 microns.Thickness such as the pure color piece of target color blocking is D1、D2、D3、D4····、Da, wherein a be more than
3 natural number, D2And D1Tolerance be d, D3And D2Tolerance be d, D4And D3Tolerance be d, the scope of tolerance d is that 0.5-1 is micro-
Rice.
In certain embodiments, the thickness of the pure color piece of the target color blocking of different thickness forms Geometric Sequence and is incremented by, and which is public
It is 0.5-1 microns than q scope.Thickness such as the pure color piece of target color blocking is D1、D2、D3、D4····、Da, D2And D1Public affairs
Than for q, D3And D2Common ratio be q, D4And D3Common ratio be q, the scope of common ratio q is 0.5-1 microns.
Step S1012：Measure the target color blocking of different thickness using the ultraviolet-uisible spectrophotometer of dual-beam respectively
Pure color piece is obtaining the corresponding reference spectrum of each thickness.
In step S1012, the mesh of the measurement of ultraviolet-visible spectrophotometer difference thickness using dual-beam is not limited
Outside the pure color piece of mark color blocking, as long as other multifrequency spectrophotometers can accurately measure the pure color piece of the target color blocking of different thickness
One-to-one reference spectrum.
Step S1013：The mapping relations of the thickness and reference spectrum of the pure color piece of target color blocking are set up and store, to pass through
The corresponding reference spectrum of thickness of the pure color piece of the target color blocking of mapping relationship searching difference thickness.
In step S1013, the pure color piece of target color blocking and the mapping relations of reference spectrum are set up, and by the mapping relations
Store in data base, shown in table specific as follows：
Table one
In Table 1, the thickness D of the pure color piece of target color blocking1Corresponding reference spectrum is T1；The pure color piece of target color blocking
Thickness D2Corresponding reference spectrum is T2；The thickness D of the pure color piece of target color blocking3Corresponding reference spectrum is T3；Target color blocking
The thickness D of pure color pieceaCorresponding reference spectrum is Ta。
Step S102：The thickness D of the color chips to be measured of target color blocking is measured accuratelyX。
Step S103：The thickness D with color chips to be measured is chosen from data baseXThe first close thickness D1, the second thickness D2And
Its corresponding frequency spectrum T1、T2As reference spectrum.
In step s 103, data base's (such as form of above-mentioned table one) is inquired about, according to the thickness D of color chips to be measuredX, from mesh
The thickness D of the pure color piece of mark colour cellX1To DaMiddle selection and DXImmediate two the first thickness D1, the second thickness D2, the first thickness
D1Corresponding reference spectrum T1And the second thickness D2Corresponding reference spectrum T2.Preferably, the thickness D of color chips to be measuredXIn
One thickness D1With the second thickness D2Between.Certainly, in certain embodiments, the first thickness D1With the second thickness D2Can be all higher than
The thickness D of color chips to be measuredX, or the first thickness D1With the second thickness D2The thickness D of color chips to be measured can also be respectively less thanX。
Step S104：Using formula T1=Aeat1And T2=Aeat2Obtain under certain wavelength first constant A of target color blocking and
Second constant a.
In step S104, according to known first thickness D1, the second thickness D2, the first thickness D1Corresponding reference spectrum
T1, the second thickness D2Corresponding reference spectrum T2With truth of a matter e of natural logrithm, using Lambert's law formula T1=Aeat1And T2=
Aeat2First constant A and second constant a of Lambert's law formula are calculated, the value of t1 is the first thickness D1, the value of t2 is
Second thickness D2.Wherein, wave-length coverage is 380-780 nanometers.
Step S105：According to first constant A and second constant a, using formula T=AeatCalculate the thickness of color chips to be measured
DXCorresponding reference spectrum T, and by the thickness D of color chips to be measuredXCorresponding reference spectrum T is used as the spectrophotometric amendment of multifrequency
Value.
Wherein, the value of t is the thickness D of color chips to be measuredX, in step S105, according to known first constant A, second
Constant a, the thickness t of color chips to be measured and truth of a matter e of natural logrithm, by Lambert's law formula T=AeatCalculate color chips to be measured
Thickness DXCorresponding reference spectrum T.
In the present embodiment, multifrequency spectrophotometric is calculated as the ultraviolet-uisible spectrophotometer of single beam.In addition, in some realities
Apply in example, multifrequency spectrophotometer can also be the spectrophotometer of other single beams.
Film of the multifrequency spectrophotometer according to correction value to the color chips to be measured of the Spectrophotometric target color blocking of multifrequency
Thick corresponding frequency spectrum is modified.
In sum, the thickness of to be measured color chips of the present invention by directly accurately measuring target color blocking, is not required to make and treat
The consistent pure color piece of the thickness of colour examining piece, it is to avoid the thickness of the pure color piece of making can not be on all four with the thickness of color chips to be measured
Problem；Even if the process conditions of colorful filter array substrate change, pass through by obtaining thickness after also only needing accurately to measure change
The method of the present invention obtains its corresponding correction value, it is not necessary to remakes the pure color piece of correction value, improves the facility of test
Property, reduce testing cost；In addition, the direct reference spectrum T calculated by the use of Lambert's law formula of the present invention is used as many frequency divisions
The photometric correction value of light, can effectively reduce the deviation of the spectrophotometric correction value of multifrequency, further improve multifrequency light splitting
Photometer treats the accuracy of the colour measurement of colour examining resistance.
Embodiments of the invention are these are only, the scope of the claims of the present invention is not thereby limited, it is every to be said using the present invention
Equivalent structure or equivalent flow conversion that bright book and accompanying drawing content are made, or directly or indirectly it is used in other related technology necks
Domain, is included within the scope of the present invention.
Claims (8)
1. acquisition methods of the spectrophotometric correction value of a kind of multifrequency, it is characterised in that methods described includes：
The data base for setting up the mapping relations of the corresponding frequency spectrum under different thickness of target color blocking；
The thickness D of the color chips to be measured of the target color blocking is measured accuratelyX；
The thickness D with the color chips to be measured is chosen from the data baseXThe first close thickness D1, the second thickness D2And its it is right
The frequency spectrum T for answering1、T2As reference spectrum；
Using formula T1=Aeat1And T2=Aeat2Obtain first constant A and second constant of the target color blocking under certain wavelength
A, wherein：The value of t1 is the first thickness D1, T1For the first thickness D1Corresponding frequency spectrum；The value of t2 is described the
Two thickness D2, T2For the second thickness D2Corresponding frequency spectrum, the truth of a matter of the e for natural logrithm；
According to first constant A and second constant a, using formula T=AeatCalculate the thickness D of the color chips to be measuredX
Corresponding reference spectrum T, wherein, the value of t is the thickness D of the color chips to be measuredX, and by the thickness D of the color chips to be measuredXIt is right
The reference spectrum T for answering is used as the spectrophotometric correction value of the multifrequency.
2. method according to claim 1, it is characterised in that the multifrequency spectrophotometric is calculated as the UV, visible light of single beam
Spectrophotometer.
3. method according to claim 1, it is characterised in that the thickness D of the color chips to be measuredXIn first thickness
D1With the second thickness D2Between.
4. method according to claim 1, it is characterised in that described to set up target color blocking corresponding under different thickness
Frequency spectrum mapping relations data base the step of include：
Make the pure color piece of the target color blocking of different thickness；
Measure the pure color piece of the target color blocking of the different thickness using the ultraviolet-uisible spectrophotometer of dual-beam respectively
To obtain the corresponding reference spectrum of each thickness；
The mapping relations of thickness and the reference spectrum of the pure color piece of the target color blocking are set up and store, to reflect by described
Penetrate the corresponding reference spectrum of pure color piece that relation searches the target color blocking of the different thickness.
5. method according to claim 4, it is characterised in that the pure color piece of the target color blocking of the different thickness
The difference range of thickness is 0.5-1 microns.
6. method according to claim 4, it is characterised in that the pure color piece of the target color blocking of the different thickness
Area is n*n square centimeters, wherein, diameters of the n more than the measurement of ultraviolet-visible spectrophotometer hot spot of the dual-beam.
7. method according to claim 6, it is characterised in that the scope of the n is 5-10 centimetre.
8. method according to claim 1, it is characterised in that the target color blocking includes red resistance, blue resistance and green
Resistance.
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| CN108180846B (en) * | 2017-11-30 | 2020-11-17 | 广州兴森快捷电路科技有限公司 | Process control method and film thickness obtaining method of organic solderability preservative film |
| CN109239981B (en) * | 2018-08-24 | 2021-07-02 | Tcl华星光电技术有限公司 | Preparation method of liquid crystal display panel |
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| CN102753963A (en) * | 2009-12-09 | 2012-10-24 | 法国原子能与替代能委员会 | Method and device for recognizing a material using the transmission function thereof |
| CN102854151A (en) * | 2012-10-06 | 2013-01-02 | 桂林理工大学 | Chemometrics method for classifying sample sets in spectrum analysis |
| CN103018902A (en) * | 2013-01-21 | 2013-04-03 | 天津南玻节能玻璃有限公司 | Method for designing optical thin film systems |
| CN103198203A (en) * | 2011-12-27 | 2013-07-10 | 关西涂料株式会社 | Prediction method of chromatic aberration caused by variation in thickness of colorful decorative pattern film and prediction device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4820614B2 (en) * | 2005-09-27 | 2011-11-24 | 東洋インキＳｃホールディングス株式会社 | Coloring composition for correcting green color filter and color filter corrected using the composition |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101694466A (en) * | 2009-10-19 | 2010-04-14 | 浙江大学 | Correction method of etalon effect of back lighting type CCD array spectrometer |
| CN102753963A (en) * | 2009-12-09 | 2012-10-24 | 法国原子能与替代能委员会 | Method and device for recognizing a material using the transmission function thereof |
| CN103198203A (en) * | 2011-12-27 | 2013-07-10 | 关西涂料株式会社 | Prediction method of chromatic aberration caused by variation in thickness of colorful decorative pattern film and prediction device |
| CN102854151A (en) * | 2012-10-06 | 2013-01-02 | 桂林理工大学 | Chemometrics method for classifying sample sets in spectrum analysis |
| CN103018902A (en) * | 2013-01-21 | 2013-04-03 | 天津南玻节能玻璃有限公司 | Method for designing optical thin film systems |
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