CN104568765B - Miniature spectroscopic ellipsometer device and measuring method - Google Patents
Miniature spectroscopic ellipsometer device and measuring method Download PDFInfo
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Abstract
The invention discloses a miniature spectroscopic ellipsometer device used for measuring a nano-film sample. The miniature spectroscopic ellipsometer device comprises a light source and collimating lens integrated module, a spectroscope, a polarization modulation module and a polarization detection module, wherein the light source and the collimating lens integrated module are arranged on one side of the spectroscope; the polarization modulation module comprises a polarizer, a phase retarder, a diaphragm and a convergence lens; incident light beams sequentially pass through the polarizer, the phase retarder, the diaphragm and the convergence lens, are then incident on the surface of a to-be-detected sample piece on a sample stage and are reflected; the reflected light beams pass through the convergence lens and the diaphragm, then pass through the phase retarder again to be modulated, and are converged by the convergence lens to obtain a plurality of light spots after being subjected to polarization detecting by the polarizer, dispersion convergence is performed on the light spots by a micro lens grating module, so that lights with the same wavelengths are converged on the same point on a receiving plane of a detector, and optical intensity signals of a plurality of different polarization modulation passages can be obtained. The invention further discloses a measuring method based on the miniature spectroscopic ellipsometer device. A light path is more compact, the overall volume reaches the centimeter magnitude, and the sample detection time and the calculation time are remarkably shortened.
Description
Technical field
The invention belongs to detection with fields of measurement and in particular to a kind of that surface and film sample are carried out with fast spectrum is ellipse partially
The measuring method of analysis and miniaturized devices.
Background technology
Light wave is adjusted by the reflection of body structure surface to be measured or transmission, its polarization state (including amplitude ratio and phase contrast)
System is so that polarization state before and after body structure surface to be measured for the light changes.Ellipsometry method is exactly based on measurement, and this is inclined
Polarization state changes to obtain the information (as refractive index and thickness) of sample.From Drude first time in 1877 propose ellipse partially theoretical and
Rothen in 1945 proposes the concept of " Ellipsometer " (ellipsometer) for the first time, ellipsometer through the development of last 100 yearses,
Earliest on the basis of common ellipsometer, spectroscopic ellipsometers, broad sense ellipsometer, imaging ellipsometer and compact ellipsometer have been developed again
Deng, no matter in terms of principle advance, certainty of measurement, spectral measurement ranges etc. from the point of view of, ellipsometry technology has all developed into phase
When high Maturity.
Ellipsometer is used for detecting film thickness, optical constant and material microstructure characteristic, can measure including massive material,
The multiple structure of thin film and on a planar base growth or deposition is in interior sample.Due to its measuring environment without vacuum and
To the untouchable of sample and no destructiveness so that ellipsometer is more widely deployed for dielectric, quasiconductor, metal and Organic substance
Deng the optical characteristics of material, the quick test of architectural feature, growth course and quality and research.
Needs with the research of micro-, nano parts and development, need to micro-, the quick measurement of product of receiving or to micro-, receive manufacture
Technical process carries out on-line monitoring.Generally pass through multiple measurement using rotatable polarizer Binding change optical parametric at present to carry out,
But this system one-shot measurement can not obtain whole sample Muller matrix parameters, needs to optical element configuration parameter in system
Adjust and take multiple measurements, complete sample message could be obtained.This systematic survey speed is slowly it is impossible to be used for technical process
On-line monitoring, therefore developing quick Spectroscopic Ellipsometry e measurement technology becomes exigence.
In order to improve the measuring speed to sample, increase spectrum subject range width, reduce modulation error, satisfaction is integrated in
The demand of Wiring technology monitoring, occurs in that the scheme measuring using whirl compensator method.Its basic optical structure is to be polarized
Device whirl compensator rotary sample compensator analyzer (PCrSCrA), using Stokes vector Mueller matrix
Polarimetry analysis is carried out to system, the light intensity signal obtaining can be obtained on any pixel on image：
Above formula is with two compensator angular velocity of rotations than for 5:As a example 3, I0For the DC component of signal, wherein α2n, β2nFor light
The Fourier coefficient of strong harmonic signal 2n frequency multiplication, and be polarizer azimuth P, analyzer azimuth A, compensator Phase delay
The function of amount δ and sample parameters (ellipsometric parameter Ψ and Δ) etc..Fourier analyses are carried out to the light intensity signal of spectrometer collection
Obtain Fourier coefficient, then ellipsometric parameter (Ψ and Δ) is solved according to the relation of Fourier coefficient and ellipsometric parameter.This measurement
System can obtain tested sample normalized 4 × 4 rank Muller matrixes totally 15 parameters (with respect to M11), therefore can be than rotation
Polarization type ellipsometer obtains more rich metrical information, and the ellipsometer based on dual rotary compensator can be in one-shot measurement
The middle 15 normalized whole Muller matrix elements obtaining tested sample, without readjusting optical element in system
Configuration parameter, therefore measuring speed increase.But from the point of view of the integrated on-line checking application of ellipsometer, due to time of measuring and
Polarization Modulation module is limited by compensator rotating machinery cycle and preparation technology etc. respectively, and the time of measuring of existing ellipsometer is relatively
Grow and design volume is more huge, generally require technological reaction chamber or workbench are redesigned to adapt to ellipse inclined modulation device
Installation, this brings larger challenge to the integrated application of ellipsometer.Therefore, need optics including ellipsometer for the research badly to survey
The miniaturization of measuring appratus.
Micro-Opto-Electro-Mechanical Systems (MOEMS) is MEMS as the research field of emerging multi-crossed disciplines
(MEMS) combination with optical technology.MOEMS is various MEMS structure parts and micro-optic part, optical waveguide laser, Photoelectric Detection
Device etc. intactly integrates, and forms a kind of new functional part or system.It becomes the new direction of optics development
Mainly there is following feature：1st, the advantage in producing, due to employing the production technology of IC chip, MOEMS core
The encapsulation of piece itself has reached the integrated of height, and production cost is significantly relatively low.2nd, the advantage in structure, MOEMS's
Volume is very little, and size is from several microns to several millimeters；Response speed is in the range of 100ns～1s；Its structure can accomplish phase
Work as complexity, comprise component number and can reach 106Individual.3rd, the advantage in action, is driven and control by accurate, in MOEMS
Micro optical element can achieve to a certain degree or scope action, this dynamic operation include light wave wave amplitude or wavelength adjustment,
The delay of transient state, diffraction, reflection, refraction and the self-adjusting of simple space.Any of the above described two, the combination of three kind of operation, can
Incident illumination is formed with the operation of complexity, or even realizes optical operation and signal processing.
Based on MOMES technique, in the world Ye You research team carried out in terms of integrated ellipsometer development tentative
Research work, such as Sato T, paper " the Compact ellipsometer that Araki T, Sasaki Y et al. delivers
employing a static polarimeter module with arrayed polarizer and wave-plate
elements”(Applied Optics,2007,46(22):A kind of compact ellipsometer prototype system is disclosed in 4963-4967)
System, its using the Polarization Modulation array based on grating and the preparation of plural layers technique, upper ten by traditional ellipsometer reduction in bulk
Times while, obtain the measurement reproducibility precision suitable with transmission spectra ellipsometer.
But, with regard to above-mentioned compact ellipsometer although significant reduction is had on volume, Polarization Modulation device integrated
Degree there has also been larger raising, but it is substantially or traditional ellipsometer micro, inherently do not realize instrument be integrally miniaturized,
Integrated.Further, since the restriction of the polarizer being used, above compact ellipsometer can only realize the measurement of Single wavelength,
Limit the measurement analysis application of its multilamellar labyrinth.
Content of the invention
The volume existing for existing ellipsometer is big and the problems such as time of measuring is longer, and the present invention provides and a kind of light is miniaturized
Spectrum ellipsometer device and measuring method.This ellipsometer device makes volume to centimetres, and time of measuring is to millisecond magnitude, and fits
Answer Polarization Modulation Development of Module and the miniature MEMS spectrogrph of wide spectrum integrated, the spectrum being adapted to covering visible light wave band is surveyed
Amount, possesses the ability extending spectrum to ultraviolet band.
For achieving the above object, according to one aspect of the present invention, provide a kind of for measuring the micro- of nano thin-film sample
Type integrated form spectroscopic ellipsometers device, including light source and collimating mirror integration module, spectroscope, Polarization Modulation module and polarization inspection
Survey module, wherein,
Described light source and collimating mirror integration module are arranged at described spectroscope side, after it is used for producing collimated expanding
Light beam；Described spectroscope is used for above-mentioned light splitting and incides described Polarization Modulation module；Described Polarization Modulation module includes edge
Polariser, phase delay device and plus lens that optical axis sets gradually, incident light beam is polarized as linear polarization through polariser
Light, line polarized light incides tested sample table on sample stage after phase delay device modulation after described plus lens converges
Face simultaneously and then is reflected；Described Polarization Detection module includes plus lens, slit diaphragm, lenticular sheet module and detector, its
Middle slit light billows are located at the focal point of plus lens, and the reflected beams obtain collimated light beam after described plus lens, again by
Phase delay device is modulated, and is linearly polarized photon by polariser analyzing, and it is transmitted through saturating by above-mentioned convergence after described spectroscope
Mirror focuses on the object point forming light spectrum image-forming at slit grating, then converges through described lenticular sheet module dispersion, makes phase
Co-wavelength light converges to same point in the receiving plane of detector, thus obtaining the light intensity letter of multiple different polarization modulation channels
Number, you can realize multimetering.
In assembly of the invention, above three module (light source and collimating mirror integration module, Polarization Modulation module and polarization inspection
Survey module) it is individually integrated into spectroscopical three work surfaces, Polarization Modulation module and Polarization Detection module centered on spectroscope
Optical axis coincidence and perpendicular with light source collimating mirror module optical axis, the relatively spectroscopical integrated orientation of three module ensures through light splitting
Beam optical axis after mirror reflection and refraction and the optical axis coincidence of three module.
In said apparatus, produced by described light source, light need to cover certain spectral region, and the present embodiment can be selected for
Tungsten light source, halogen light source, deuterium lamp light source and xenon source etc..
In said apparatus, described collimating mirror and plus lens require achromatism in spectral region needed for measurement, that is,
Ensure that lens group has consistent focal length in spectral region.
In said apparatus, described spectroscope, transflection need to be ensured than for 1:1, do not change the polarization state by light beam.
In said apparatus, polariser can be selected for Glan Taylor (Glan-Taylor) prism, Glan-Foucault laser prism, Glan
Thomson (Glan-Thompson) prism and Lip river breast (Rochon) prism etc., polarizer material can be calcite, quartz, fluorine
Change magnesium, YVO4 and α-BBO etc..The polariser of dissimilar different materials has different preparation technologies and performance, therefore meets this
The polariser of system integration requirement and functional requirement can be applied in apparatus of the present invention.
In said apparatus, phase delay device can be selected for mica waveplate, quartz wave-plate, liquid crystal wave plate.
In said apparatus, lenticular sheet module adopts nano-imprint process to prepare reflecting grating in lenticule convex surface
On, this physical dimension is little, and veiling glare is low, and the design of the therefore integrated requirement of composite module and functional requirement can be applied to the present invention
In device.
In said apparatus, detector can be preferably photodiode array, charge-coupled image sensor (CCD) image sensing
Device and complementary metal oxide semiconductors (CMOS) (CMOS) imageing sensor, ccd image sensor quantum efficiency is high, dynamic range is high,
Noise is low.Different detectors have respective feature, therefore meet this system functional requirement and the detector of integrated requirement can be answered
Use in apparatus of the present invention.
It is another aspect of this invention to provide that providing a kind of method for measuring nano thin-film sample, comprise the steps：
(1) by light source produce measuring beam and collimated expand after incide on spectroscope；
(2) above-mentioned incident illumination is carried out light splitting by described spectroscope, produces multi beam refraction light；
(3) each described refracted light incident to polariser and is polarized as linearly polarized photon, and line polarized light is through phase delay device
Incide the tested sample surface on sample stage after modulation and and then reflect after plus lens convergence；
(4) described the reflected beams obtain collimated light beam after described plus lens, again by phase delay device modulation, and
It is linearly polarized photon by polariser analyzing, it is converged by above-mentioned plus lens after being transmitted through described spectroscope and obtains multiple light
Speckle, and converged through lenticular sheet module dispersion after slit grating respectively, make identical wavelength light converge to connecing of detector
It is closed flat same point on face, thus obtaining the light intensity signal of multiple different polarization modulation channels, you can realize multimetering.
The present invention is based on ellipsometer PcrSA design framework, obtains directional light after the light beam that light source sends collimated mirror collimation
Bundle, diaphragm is divided into array small diameter optical beam by collimating big light beam, by dichroic mirror, is then polarized as linearly inclined by polariser
Shake light, then carries out polarization state modulation through phase delay device, and array beams converge through plus lens, and oblique being mapped to is treated on sample stage
Survey sample surface, the reflected beams obtain collimated light beam through plus lens, be linearly polarized photon again by polariser analyzing, transmission
Through spectroscope, then converged by plus lens, converge the hot spot obtaining and pass through slit grating respectively, through lenticular sheet mould
Block dispersion is converged, and projects on detector.
Based on the present invention, disposably the light intensity signal of multiple different polarization modulation channels can be obtained, by asking by parallel measurement
Solution light intensity equation set, obtains the value of the Spectroscopic Ellipsometry parameter (ψ and Δ) of tested sample.
In general, by the contemplated above technical scheme of the present invention compared with prior art, there is following beneficial effect
Really：
(1) so that system light path is more compact from ellipsometer design of Optical System, by MOMEMS technical matters, real
Existing ellipsometer overall volume reduces hundreds times, and overall appearance volume to centimetres is so that equipment is more convenient for production-line technique
Online integration.
(2) integrated multi-channel measurement and simple optical system so that sample time of measuring and calculating time carry
Rise an order of magnitude, the spot measurement time is in millisecond magnitude, and then so that the on-line measurement of ellipsometer is possibly realized.
Brief description
Fig. 1 is a kind of structural representation of the miniaturization Spectroscopic Ellipsometry instrument apparatus according to the embodiment of the present invention；
Fig. 2 is a kind of structure design schematic diagram of the Polarization Detection module according to the embodiment of the present invention；
Fig. 3 is the flow chart of the miniaturization ellipsometer system parameter calibration according to the embodiment of the present invention.
Fig. 4 is the schematic diagram of a kind of wave plate according to the embodiment of the present invention and light-beam position distribution relation.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, below in conjunction with drawings and Examples, right
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only in order to explain the present invention, and
It is not used in the restriction present invention.As long as additionally, involved technical characteristic in each embodiment of invention described below
The conflict of not constituting each other just can be mutually combined.
A kind of miniaturization Spectroscopic Ellipsometry instrument apparatus providing as Fig. 1, the present embodiment, with reference to this device to measuring method
It is explained in detail.
This device centered on spectroscope 40, left side integrated optical source 10, collimating mirror 20 and diaphragm 30, light source 10 is used for producing
Cover the light of certain spectral region, collimating mirror 20 is used for the light that sends light source and carries out collimating, expands, diaphragm 30 is by collimated light
Bundle is divided into the beam array parallel to optical axis；Spectroscope 40 is used for auto-collimation mirror 20 in future and is divided into two through the light of sample reflection
Bundle, produces transmitted light and reflected light, and reflected light continues to propagate in light path system；
Polariser 50, phase delay device 60 and plus lens 70 is comprised in Polarization Modulation module.Polariser 50 be polarized and
The effect of analyzing, the polarization state of dichroic mirror light beam is changed into linear polarization by unpolarized state by the former, and the latter will be through phase
After delayer 60 modulation of position, the polarization state of light beam changes into linear polarization；Phase delay device 60 is used for inclined to the line from polariser
The polarization state of light of shaking is modulated, respectively before and after light beam is through sample reflection；Plus lens 70 is by polarization state through ovennodulation
Light beam is converged, and so that light beam is focused on sample a bit.It is integrated successively from top to bottom that these optics press said sequence.
Plus lens 90, slit grating 101, lenticular sheet module 102 and detector is comprised in Polarization Detection module
103.Light beam after sample is reflected by plus lens 90 focuses at slit grating 101；Slit grating 101 is used for forming spectrum
Object point as system；Lenticular sheet module 102 is imaged by light beam dispersion and to slit grating 101, so that detector 103
Acquisition to different wave length optical signal；Detector 103 is used for receiving slit grating 101 through formed by lenticular sheet module 102
Optics real image, and it is translated into the signal of telecommunication.
Light supply apparatuses 10 are integrated in focal point on the optical axis of collimating mirror 20 it is ensured that incident illumination is same with collimating mirror 20 and diaphragm 30
Optical axis；Polariser 50, phase delay device 60 and plus lens 70 are sequentially integrated successively from top to bottom, wherein polariser
50th, the axis of homology of compensator 60 and fast axle and the plane of incidence form an angle, and (this angle is set according to concrete systematic parameter configuration
Meter, in specific embodiment below, we can provide angle configurations), the optical axis of plus lens 70 with from beam splitter 40
Array beams geometry axial line coincide；Plus lens 90, slit diaphragm 101, lenticular sheet module 102 and detector
103 is sequentially integrated, and wherein slit grating device 101 is located at focal point on the optical axis of plus lens 90, and light beam is through micro-
Lenticulation module 102 scatters, and identical wavelength light converges in plane a bit, and light beam imaging plane and detector accept plane weight
Close, plus lens 90, slit diaphragm 101, lenticular sheet module 102 and detector 103 are according to the array being obtained by diaphragm 30
Number of light beams and position carry out corresponding to distribution.
In light source collimation integration module, light source 10 adopts tungsten light source, and this integration module is located at spectroscope left end work surface
Place；
In the Polarization Modulation module of the present embodiment, polariser 50 preferably employs wire grating polaroid, and phase delay device 60 is excellent
Choosing adopts true zero-th order waveplates.Array beams such as Fig. 4 of the position distribution on wave plate.Incident beam through wave plate 60, its position with
The axial distribution of wave plate fast axle, polarizer transmission such as Fig. 4, the reflected beams are without wave plate 60.
In the present embodiment, based on wire grating polaroid and true zero-th order waveplates optimization design and carry out Polarization Modulation module
Preparation, its detailed process can preferably be achieved by the steps of：
A () is with CaF2Glass is substrate deposition SiO2 protecting film；
(b) spin coating photoresist on SiO2 protecting film；
C () passes through nano impression or photoetching process forms nanometer line grating；
D () generates CaF with reactive ion etching process2Nano wire optical grating construction；
E () uses magnetron sputtering technique in substrate plating surface aluminum metal film, complete the preparation of wire grating polaroid；
F () obtains true zero-th order waveplates by grinding and cutting technique；
G true zero-th order waveplates are assemblied in wire grating polaroid along optical grating construction surface by (), make wave plate fast axle and polaroid
The axis of homology becomes 20 ° of angles, and it is integrated with diaphragm and plus lens, completes the preparation of Polarization Modulation module.
It should make optical element surface be parallel to each other and the geometrical central axis of each element are anti-with spectroscope in preparation process
Irradiating light beam light shaft coaxle, this integration module is located at the work surface of spectroscope lower end.
In Polarization Detection module in the present embodiment, detector 103 preferably employs charge-coupled image sensor (CCD) imageing sensor,
The compact design based on MEMS reflecting grating for the Polarization Detection module, is prepared reflecting grating micro- by nano-imprint process
On mirror convex surface.This integration module is located at the work surface of spectroscope upper end.On the basis of the preparation of each module, in spectroscope being
The heart, carries out to it integrated, this integrating process directly affects system light path error, therefore will guarantee in Polarization Modulation module through sample
Light beam before and after reflection overlaps, and the geometric center of the array beams optical axis through spectroscope transmission and array in Polarization Detection module
Overlap.
A kind of measuring method of miniaturization spectroscopic ellipsometers of the embodiment of the present invention, comprises the following steps：
A. open light source 10, preheated, to ensure the stability of certain spectral region light；
The stable light of light source activation needs under certain operating temperature, and light-source temperature needs from room temperature to operating temperature
Want the regular hour it is therefore necessary to be preheated to light source so as to be reached operating temperature.
B. testing sample is placed on sample stage 80；
C., after the light that light source 10 sends is stable, ccd image sensor 103 carries out spectroscopic acquisition；
Parallel measurement, ccd image sensor obtains the light intensity signal of two different Polarization Modulation passages.
D. the spectral signal of ccd image sensor 103 collection is carried out with computing and the process of view data.
According to the light intensity value of the corresponding two different Polarization Modulation passages of certain wavelength, and light intensity value is ellipse with measuring samples partially
The relation of parameter (ψ and Δ), the value of computation and measurement sample ellipsometric parameter (ψ and Δ).
In said process, the impact to light polarization for the different optical elements can use the form of Jones (Jones) matrix
Expression, according to the light channel structure in accompanying drawing 1, we construct optical system model：
Eout=JPR(-P)JSR(-C)JC(δ)R(C)R(-P)JPEin(2)
Wherein JP、JCAnd JSRepresent the Jones matrix of polariser 50, phase delay device 60 and testing sample 80 respectively；R(-P)
Represent the spin matrix of polariser 50 and phase delay device 60 with R (C) respectively；δ represents the phase-delay quantity of phase delay device 5,
Exact value is obtained by calibration；C, P represent phase delay device 60 and the azimuth of polariser 50 respectively, are obtained accurately by calibration
Value.The azimuth of above-mentioned optical element (polariser 50 and phase delay device 60) refers in the face of its fast axle of light source and plane of incidence
Angle (being just counterclockwise)；Ein、EoutRepresent light first time Jones through inclined device 50 and second Exit polarizer 50 respectively
Vector.EinIt is line polarized light, Ein=(I0,0)T, wherein I0For incident illumination intensity values, T representing matrix transposition.JSRepresent testing sample
Jones matrix：
The light that light source sends, through Polarization Modulation, is represented by by the light intensity value that detector detects：
Two groups of equations related to ellipsometric parameter can be set up by the light intensity value after corresponding two Polarization Modulation of different wave length, lead to
Cross solving equation group can obtain measuring samples Jones (Jones) matrix be sample ellipsometric parameter (Ψ and Δ) value.
The phase-delay quantity δ of azimuth P, C of above-mentioned polariser 50 and phase delay device 60 and phase delay device 60 is
Should be exact value, need to obtain by calibration, as follows for demarcating foundation, its concrete calibration process with standard thin film exemplar：
1) with the design system parameter of the embodiment of the present invention for systematic parameter initial value (P0、C0、δ0Deng)；
2) thin film transfer matrix model is set up with the embodiment of the present invention, calculate master body surface reflection theory oval thickness
Spectrum；
Based on thin film transfer matrix model, with parameters such as the optical constant of master body and thickness, solve standard sample
The ellipsometric parameter (Ψ and Δ) of part, and then to obtain the Jones matrix of master body be formula (3), by the embodiment of the present invention be
System light path model obtains master body surface reflection theory oval thickness spectrum.
3) standard thin film exemplar is measured, obtain two groups of light intensity signals and to calculate sample surface reflection measurement ellipse partially
Spectrum；
4) by calculated for thin film transfer matrix model sample surface reflection theory oval thickness spectrum and measurement oval thickness spectrum
Be fitted, initial value used by matching be 1) in systematic parameter initial value (P0、C0、δ0Deng), then use LM iterative algorithm, calibration meter
Calculation obtains accurate systematic parameter (P, C, δ etc.).
It is defined by exemplar reflection measurement oval thickness spectrum, sets up an evaluation function, change sample surface reflection theory ellipse partially
Systematic parameter (P, C, δ etc.) in spectrum, makes that evaluation function is minimum (to show the difference of theoretical oval thickness spectrum and measurement oval thickness spectrum
Little) then it is assumed that in theoretical oval thickness spectrum systematic parameter be the systematic parameter (P, C, δ etc.) in the embodiment of the present invention.
On the basis of system above parametric calibration, also need the preparation defect parameters of polariser and phase delay device are carried out
Characterize, thus being modified to system model.
As it will be easily appreciated by one skilled in the art that the foregoing is only presently preferred embodiments of the present invention, not in order to
Limit the present invention, all any modification, equivalent and improvement made within the spirit and principles in the present invention etc., all should comprise
Within protection scope of the present invention.
Claims (5)
1. a kind of miniaturization integrated form spectroscopic ellipsometers device for measuring nano thin-film sample, including light source and collimating mirror collection
Become module, spectroscope, Polarization Modulation module and Polarization Detection module, wherein,
Described light source and collimating mirror integration module are arranged at described spectroscope (40) side, after it is used for producing collimated expanding
Light beam；
Described spectroscope (40) is used for for above-mentioned light beam light splitting inciding described Polarization Modulation module；
Described Polarization Modulation module includes polariser (50), phase delay device (60) and the plus lens setting gradually along optical axis
(70), described polariser (50), phase delay device (60) and plus lens (70) are integrated to form described Polarization Modulation module successively,
Incident light beam is polarized as linearly polarized photon through polariser (50), and line polarized light passes through after phase delay device (60) modulation
Described plus lens (70) is incided the upper tested sample surface of sample stage (8) and and then is reflected after converging；
Described Polarization Detection module includes plus lens (90), slit diaphragm (101), lenticular sheet module (102) and detects
Device (103), described plus lens (90), slit diaphragm (101), lenticular sheet module (102) and detector (103) collect successively
Become, wherein slit light billows (101) are located at the focal point of plus lens (90), the reflected beams obtain after described plus lens (70)
Collimated light beam, again by phase delay device (60) modulation, and is linearly polarized photon by polariser (50) analyzing, it is transmitted through
After described spectroscope (40), the thing that slit grating (101) forms light spectrum image-forming is focused on by above-mentioned plus lens (90)
Point, then converge through described lenticular sheet module (102) dispersion, so that the reception that identical wavelength light converges to detector (103) is put down
Same point on face, thus obtain the light intensity signal of multiple different polarization modulation channels, you can realize multimetering；
Described light source and collimating mirror integration module, Polarization Modulation module and Polarization Detection module difference centered on spectroscope (40)
It is integrated into three work surfaces of spectroscope (40), the wherein optical axis coincidence of Polarization Modulation module and Polarization Detection module and and light source
Collimating mirror module optical axis is perpendicular.
2. a kind of miniaturization integrated form spectroscopic ellipsometers for measuring nano thin-film sample according to claim 1 fill
Put it is characterised in that described light source and collimating mirror integration module include light supply apparatuses (10), collimating mirror (20) and light billows (30),
Wherein, light supply apparatuses (10) are used for producing the light covering certain spectral region, and collimating mirror (20) is used for being carried out collimating expanding
Bundle, described diaphragm (30) is used for the light beam after collimator and extender is divided into the multiple light beams parallel to optical axis.
3. a kind of miniaturization integrated form spectroscopic ellipsometers for measuring nano thin-film sample according to claim 1 and 2
Device obtains array beams it is characterised in that inciding this Polarization Modulation module after described spectroscope (40) light splitting, each light beam
Parallel with the optical axis of described Polarization Modulation module.
4. a kind of miniaturization integrated form spectroscopic ellipsometers for measuring nano thin-film sample according to claim 1 and 2
Device is it is characterised in that the transflection of described spectroscope (40) is than for 1:1.
5. a kind of method for measuring nano thin-film sample, it utilizes the miniaturization collection any one of claim 1 to 4
Accepted way of doing sth Spectroscopic Ellipsometry instrument apparatus measure, and the method comprises the steps：
(1) by light source produce measuring beam and collimated expand after incide on spectroscope；
(2) above-mentioned incident illumination is carried out light splitting by described spectroscope (40), produces multi beam refraction light；
(3) each described refracted light incident to polariser (50) and is polarized as linearly polarized photon, and line polarized light is through phase delay device
(60) incide the tested sample surface on sample stage (80) after converging through plus lens (70) after modulating and and then reflect；
(4) described the reflected beams obtain collimated light beam after described plus lens (70), adjust again by phase delay device (60)
System, and be linearly polarized photon by polariser (50) analyzing, it is transmitted through after described spectroscope (40) by above-mentioned plus lens
(90) converge and obtain multiple hot spots, and pass through slit grating (101) respectively and converge by lenticular sheet module (102) dispersion,
Identical wavelength light is made to converge to same point in the receiving plane of detector (103), thus obtaining multiple different polarization modulation channels
Light intensity signal, you can realize multimetering；
Wherein, the beam optical axis after described spectroscope (40) transmission and refraction overlap, and all with the inciding point of light source generation
Measuring beam optical axis on light microscopic (40) is vertical, incides this Polarization Modulation module and obtain battle array after described spectroscope (40) light splitting
Row light beam is two bundles, and each light beam is parallel with the optical axis of described Polarization Modulation module, converges to sample by described plus lens (90)
On.
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| CN109883553B (en) * | 2019-03-14 | 2020-01-21 | 上海精测半导体技术有限公司 | Polarization measuring device and polarization measuring method |
| CN111122460B (en) * | 2019-12-31 | 2022-09-30 | 武汉颐光科技有限公司 | Single-rotation compensator type spectroscopic ellipsometer parameter calibration method and device |
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| CN113533351B (en) * | 2021-08-20 | 2023-12-22 | 合肥御微半导体技术有限公司 | Panel defect detection device and detection method |
| CN114384017A (en) * | 2021-12-03 | 2022-04-22 | 武汉颐光科技有限公司 | Spectroscopic matching calibration method based on ellipsometer |
| CN114427834A (en) * | 2021-12-21 | 2022-05-03 | 睿励科学仪器（上海）有限公司 | Ellipsometry measurement system based on synchronous reference light correction |
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