CN114384017A - Spectroscopic matching calibration method based on ellipsometer - Google Patents
Spectroscopic matching calibration method based on ellipsometer Download PDFInfo
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Abstract
The invention provides a spectrum matching calibration method based on an ellipsometer, which comprises the following steps: measuring optical characterization parameters of the calibration sample based on a reference detection system; acquiring light intensity harmonic signals of a calibration sample under measurement of a target detection system, and calculating corresponding measurement Fourier coefficients based on the light intensity harmonic signals; and correcting system parameters of the target detection system based on the measured Fourier coefficient and the theoretical Fourier coefficient of the target detection system. The invention enables the parameters of the detection system to be adjusted in a self-adaptive way by a spectrum matching calibration method under the condition of not changing the physical state of the instrument, realizes the measurement consistency of the target detection system and the reference detection system on the premise of ensuring high precision and stability, and meets the actual production requirements of the semiconductor industry.
Description
Technical Field
The invention relates to the field of instrument measurement, in particular to a spectrum matching calibration method based on an ellipsometer.
Background
Semiconductor devices, such as logic and memory devices, are typically fabricated through a series of processing steps applied to a substrate or silicon wafer. These processing steps form various features and multi-layer structures of semiconductor devices, for example, photolithography is a semiconductor fabrication process that involves creating patterns on a semiconductor wafer. Examples of other semiconductor manufacturing processes include, but are not limited to, chemical mechanical polishing, etching, deposition, ion implantation, etc., and multiple semiconductor devices may be fabricated on a single semiconductor wafer and then separated into individual units. In the quality inspection step of the semiconductor manufacturing process, an ellipsometer device is used for detecting whether defects exist on a manufactured semiconductor device or not so as to control the yield, and with the continuous reduction of design rules and a process window, a detection system needs to capture a wider silicon wafer surface and maintain high-efficiency yield.
Consistency of measurement of multiple inspection instruments or systems is also important during the manufacturing process. If the measurement consistency between inspection instruments or systems is poor, the consistency between processed semiconductor wafers is lost and the yield drops to an unacceptable level. In some sense, measurement consistency can be obtained by using a set of reference wafers for each inspection instrument or system. However, in order to obtain highly accurate results, measurement experiments must be conducted in a tightly controlled environment that must match the environmental conditions under which the reference wafer was originally characterized, which can be difficult to achieve in a manufacturing environment, and furthermore, there can be some variation in the production set-up between batches of material, resulting in possible loss of consistency between inspection systems. Therefore, it is desirable to develop improved calibration methods for a test instrument or system to ensure consistency of measurements from multiple test instruments or systems over a wide range of silicon wafers and a range of point locations.
Disclosure of Invention
Aiming at the technical problems in the prior art, the invention provides a spectrum matching calibration method based on an ellipsometer.
According to a first aspect of the present invention, there is provided an ellipsometer-based spectrum matching calibration method, comprising: step 1, measuring optical characterization parameters of a calibration sample based on a reference detection system; step 2, obtaining a light intensity harmonic signal of a calibration sample under the measurement of a target detection system, and calculating a corresponding measurement Fourier coefficient based on the light intensity harmonic signal, wherein the measurement point position of the calibration sample during the measurement of the target detection system is consistent with the measurement point position of the calibration sample during the measurement of a reference detection system; and 3, correcting system parameters of the target detection system based on a measured Fourier coefficient and a theoretical Fourier coefficient of the target detection system, wherein the theoretical Fourier coefficient is determined according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample.
According to a second aspect of the present invention, there is provided an ellipsometer-based spectrum matching calibration method, comprising: step 1', measuring an optical characterization parameter of each calibration sample in a plurality of calibration samples based on a reference detection system; step 2', obtaining a light intensity harmonic signal of each calibration sample under the measurement of the target detection system, and calculating a corresponding measurement Fourier coefficient based on the light intensity harmonic signal of each calibration sample, wherein a measurement point position of each calibration sample during the measurement of the target detection system is consistent with a measurement point position of each calibration sample during the measurement of the reference detection system; and 3', correcting system parameters of the target detection system based on the measured Fourier coefficient and the theoretical Fourier coefficient of each calibration sample piece under the target detection system, wherein the theoretical Fourier coefficient is determined according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample pieces.
According to the spectrum matching calibration method based on the ellipsometer, provided by the invention, the parameters of the detection system are adaptively adjusted through the spectrum matching calibration method under the condition that the physical state of the ellipsometer is not changed, the measurement consistency of the target detection system and the reference detection system is realized on the premise that the high precision and the stability are ensured, and the actual production requirements of the semiconductor industry are met.
Drawings
FIG. 1 is a flow chart of a calibration method for spectrum matching based on an ellipsometer according to the present invention;
FIG. 2 is a simplified schematic diagram of the ellipsometer measurement system;
fig. 3 is a flowchart of a spectrum matching calibration method based on an ellipsometer according to the present invention.
In the drawings, the names of the components represented by the respective reference numerals are as follows:
1. the device comprises a laser light source, 2, a polarizer, 3, a first servo motor, 4, a driving polarizing arm end compensator, 5, a sample detection table, 6, an analyzing arm end compensator, 7, a second servo motor, 8, an analyzer, 9 and a spectrometer.
Detailed Description
The following detailed description of embodiments of the present invention is provided in connection with the accompanying drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
Example one
An ellipsometer-based spectrum matching calibration method, referring to fig. 1, mainly includes the following steps:
step 1, measuring optical characterization parameters of a calibration sample based on a reference detection system.
Specifically, the optical characterization parameters of the sample are obtained by measuring through a reference detection system, and the measurement principle is as shown in formula (1):
[d,n]＝g2(ψ,Δ)＝g1(I,λ) (1)；
firstly, a reflected light beam of a calibration sample is obtained through measurement of a reference detection system, a corresponding Fourier coefficient is further obtained, an amplitude ratio and a phase difference of the calibration sample are calculated by combining system parameters of the reference detection system, and optical characteristic parameters of the sample are further represented by a physical model. Wherein d is the thickness of the calibration sample, n is the optical constant of the calibration sample, psi, delta are the amplitude ratio and phase difference of the calibration sample, I represents the light intensity of the harmonic signal reflected by the calibration sample, and lambda represents the system parameter of the reference detection system.
The light intensity I of the reflected harmonic signal of the calibration sample and the system parameter lambda of the reference detection system are known quantities, the amplitude ratio psi and the phase difference delta of the calibration sample can be calculated according to the formula (1), and the amplitude ratio psi and the phase difference delta of the calibration sample are optical characteristic parameters of the calibration sample.
And 2, acquiring a light intensity harmonic signal of the calibration sample under the measurement of the target detection system, and calculating a corresponding measurement Fourier coefficient based on the light intensity harmonic signal, wherein the measurement point position of the calibration sample during the measurement of the target detection system is consistent with the measurement point position of the calibration sample during the measurement of the reference detection system.
Specifically, before the target detection system measures the calibration sample, the image and the sensor are used for positioning to ensure that the measurement point position of the calibration sample during measurement of the target detection system is consistent with the measurement point position of the calibration sample during measurement of the reference detection system, then the target detection system is used for measuring the calibration sample to obtain the light intensity harmonic signal of the calibration sample obtained by the target detection system, and the corresponding measurement Fourier coefficient is obtained through further calculation.
In particular, in setting the integration time
And obtaining a light intensity harmonic signal S of the calibration sample according to the light intensity of the reflected harmonic signal of the jth measurement point measured by the target detection systemjExpressed as:
the reflected harmonic light intensity of the calibration sample measured by the target detection system is expressed as:
wherein I (t) is the light intensity of the reflected harmonic signal of the calibration sample, t is the rotation time of the rotation compensator of the target detection system,
the method includes the steps that a measurement Fourier coefficient for 2K frequency multiplication of a light intensity harmonic signal of a calibration sample is represented, wherein K is 1,21The number of frames that need to be acquired in one optical cycle. By using the formula (2) and the formula (3), the direct current component I of the light intensity harmonic signal of the calibration sample is solved0And measuring Fourier coefficients
Fig. 2 is a schematic structural diagram of an ellipsometer measurement system according to an embodiment of the present invention, in which when the ellipsometer normally works, the first servo motor 3 and the second servo motor 7 respectively drive the polarization arm end compensator 4 and the polarization arm end compensator 6 to synchronously rotate at a constant rotation ratio, the ellipsometer further includes an excitation light source 1, a polarizer 2, a sample detection platform 5, a polarization analyzer 8, and a spectrometer 9, and a wavelength range of the ellipsometer is 245nm to 1000 nm.
Before steps 1 and 2 are performed, first, the light source of the detection system is preheated for 30 minutes, and the polarizing arm and the polarization analyzing arm are adjusted to the set incident angle. Wherein, the incidence angle ranges from 0 to 90 degrees, and preferably, the incidence angle set by the embodiment is 65 degrees; the standard sample is then placed on the sample testing station 5. In this example, a set of calibration samples is selected
After the silicon substrate silicon dioxide thin film is sequentially placed on the sample detection table 5, an ellipsometer is used for measuring the entrance and exit of a given group of calibration samples at a set mechanical angle of 65 degrees, light beams reflected by the standard samples are collected by a spectrometer detector, and light intensity harmonic signals of each sample under different polarization states are obtained. Solving the direct current component I corresponding to the sample by using the formula (2) and the formula (3)0And Fourier coefficients
And 3, correcting system parameters of the target detection system based on a measured Fourier coefficient and a theoretical Fourier coefficient of the target detection system, wherein the theoretical Fourier coefficient is determined according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample.
Specifically, based on a measured fourier coefficient and a theoretical fourier coefficient of the target detection system, an error evaluation function is defined as the sum of squares of differences between the measured fourier coefficient and the theoretical fourier coefficient of the target detection system:
the error evaluation function E is a minimum square error function, which is the sum of squares of differences between actual measured fourier coefficients and theoretical fourier coefficients of the target detection system.
Wherein the content of the first and second substances,
for the measured fourier coefficients of the object detection system,
is a theoretical Fourier coefficient, λ1The system parameters of the target detection system are lambda, and the system parameters of the reference detection system are lambda; system parameter lambda for adjusting target detection system based on least square method1Minimizing the error evaluation function, and adjusting the system parameter lambda1And updating to the target detection system.
As an embodiment, the determining of the theoretical fourier coefficients according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample includes:
wherein f is1And f2For a particular physical model, D is an optical characteristic parameter of the calibration sample, toThe amplitude ratio psi, the phase difference delta, the thickness d and the refractive index n are reduced; and lambda represents the system parameters of the reference detection system, including the incident angle, the azimuth angle of the polarizer, the phase retardation amount and the optical rotation angle of the compensator, the illumination wavelength of the light source and the numerical aperture.
Defining an error evaluation function E, and adjusting a system parameter lambda of a target detection system by a least square method1The error evaluation function is minimized, and the measurement uniformity of the reference detection system and the target detection system is realized.
Example two
An ellipsometer-based spectrum matching calibration method, referring to fig. 3, includes: step 1', measuring an optical characterization parameter of each calibration sample in a plurality of calibration samples based on a reference detection system; step 2', obtaining a light intensity harmonic signal of each calibration sample under the measurement of the target detection system, and calculating a corresponding measurement Fourier coefficient based on the light intensity harmonic signal of each calibration sample, wherein a measurement point position of each calibration sample during the measurement of the target detection system is consistent with a measurement point position of each calibration sample during the measurement of the reference detection system; and 3', correcting system parameters of the target detection system based on the measured Fourier coefficient and the theoretical Fourier coefficient of each calibration sample piece under the target detection system, wherein the theoretical Fourier coefficient is determined according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample pieces.
It should be noted that the only difference between the second embodiment and the first embodiment is that the number of calibration samples in the embodiment is multiple, while the number of calibration samples in the first embodiment is one, the determination manner of the optical characteristic parameter of each calibration sample in the reference detection system and the determination manner of the measured fourier coefficient of each calibration sample and the theoretical fourier coefficient of each calibration sample in the target detection system are the same, the only difference is that, when defining the evaluation error function, the cumulative sum of the square sums of the differences between the measured fourier coefficient and the theoretical fourier coefficient of each calibration sample in the second embodiment is used as the evaluation error function, and the evaluation error function in the second embodiment is expressed as:
wherein the content of the first and second substances,
the measured Fourier coefficient of the mth calibration sample under the target detection system,
the theoretical Fourier coefficient of the mth calibration sample is defined, M is the serial number of the calibration sample, M is the total number of the calibration samples, and lambda1Is the system parameter of the target detection system and lambda is the system parameter of the reference detection system.
Adjusting system parameter lambda of target detection system based on least square method according to evaluation error function E1Minimizing the error evaluation function, and adjusting the system parameter lambda1And updating to the target detection system.
In this embodiment, referring to fig. 2, with #1 as a reference machine, when the machines # 2, #3 and #4 perform spectrum matching calibration, the calibration sample parameter is the measured value of # 1. The system parameters are then fitted using least squares regression to minimize the error evaluation function E. It should be emphasized that, when performing spectrum matching calibration, it is necessary to ensure that the reference machine and the machine to be calibrated measure the same measurement point of the sample by using image positioning or displacement sensor and other technical means.
Table 1 shows the comparison of the results of the spectrum matching calibration method of the present invention before and after the four ellipsometers pass through, wherein Table 1.1 shows the original film thickness of the same set of sample measured by the four ellipsometers
As a result, Table 1.2 shows the measurement of the film thickness of the same sample after calibration of four ellipsometers by spectrum matching
And (6) obtaining the result.
TABLE 11 four ellipsometers measuring original film thickness of the same set of sample
Results
TABLE 1.2 measurement of film thickness of the same set of samples after calibration of four ellipsometers by spectral matching
Results
According to tables 1.1 and 1.2, compared to the conventional calibration method, in this embodiment, with #1 as the reference machine, when the #2, #3 and #4 machines perform spectrum matching calibration, the measurement value of the sample parameter #1 is fixed, and the system parameter λ corresponding to each detection machine is obtained by minimizing the error evaluation function E2，λ3，λ4Compared with the existing calibration method, the method improves the consistency of machine measurement.
TABLE 2 correction of instrument performance change after long standing based on spectral matching calibration
Table 2 shows a comparison between two measurement data of an ellipsometer at a half-year interval, and for the situation that the physical properties of some optical devices may drift due to changes in environmental factors and stress release of the ellipsometer after the ellipsometer is used for a long time, the measurement data may further differ. By recalibrating the instrument using the spectrum matching calibration algorithm, instrument performance variations caused by environmental variations and the like can be compensated.
The spectrum matching calibration method based on the ellipsometer provided by the invention has the advantages that the spectrum difference is minimized by the least square method to obtain the system parameters of the instrument to be calibrated. The film thickness and the optical parameters of the samples are calibrated based on a group of known samples or through a reference detection system, and the purpose of measuring consistency of the target detection system and the reference detection system is achieved. In addition, considering that the physical characteristics of some optical devices may drift after the instrument is used for a long time, the performance of the detection system is further changed, the influence of factors such as stress release and environmental change on the instrument can be compensated by regularly using the system parameters of the spectrum matching calibration updating instrument, the high precision and the stability of the detection system are saved, and the production requirement of the actual semiconductor industry is met.
It should be noted that, in the foregoing embodiments, the descriptions of the respective embodiments have respective emphasis, and reference may be made to relevant descriptions of other embodiments for parts that are not described in detail in a certain embodiment.
While preferred embodiments of the present invention have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all such alterations and modifications as fall within the scope of the invention.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (8)
1. An ellipsometer-based spectrum matching calibration method is characterized by comprising the following steps:
step 1, measuring optical characterization parameters of a calibration sample based on a reference detection system;
step 2, obtaining a light intensity harmonic signal of a calibration sample under the measurement of a target detection system, and calculating a corresponding measurement Fourier coefficient based on the light intensity harmonic signal, wherein the measurement point position of the calibration sample during the measurement of the target detection system is consistent with the measurement point position of the calibration sample during the measurement of a reference detection system;
and 3, correcting system parameters of the target detection system based on a measured Fourier coefficient and a theoretical Fourier coefficient of the target detection system, wherein the theoretical Fourier coefficient is determined according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample.
2. The method for calibrating spectral matching according to claim 1, wherein said step 1 comprises:
the optical characterization parameters of the sample are obtained by measuring through a reference detection system, and the measurement principle is as shown in formula (1):
[d,n]＝g2(ψ,Δ)＝g1(I,λ) (1)；
wherein d is the thickness of the calibration sample, n is the optical constant of the calibration sample, psi and delta are the amplitude ratio and the phase difference of the calibration sample respectively, I is the light intensity of the reflected harmonic signal of the calibration sample, and lambda represents the system parameter of the reference detection system;
according to the light intensity I of the reflected harmonic signal and a system parameter lambda of a reference detection system, an amplitude ratio psi and a phase difference delta of the calibration sample are calculated through a formula (1), and the amplitude ratio psi and the phase difference delta of the calibration sample are optical characteristic parameters of the calibration sample.
3. The spectrum matching calibration method according to claim 1, wherein the measurement points of the calibration sample at the time of measurement by the target detection system and the measurement points of the calibration sample at the time of measurement by the reference detection system are kept consistent by means of image and sensor positioning.
4. The spectral matching calibration method according to claim 1, wherein said step 2 comprises:
at a set integration time
According to the reflection of the jth measuring point measured by the target detection systemObtaining light intensity harmonic signal S of calibration sample by harmonic signal light intensityjExpressed as:
the reflected harmonic light intensity of the calibration sample measured by the target detection system is expressed as:
wherein I (t) is the light intensity of the reflected harmonic signal of the calibration sample, t is the rotation time of the rotation compensator of the target detection system,
the method includes the steps that a measurement Fourier coefficient for 2K frequency multiplication of a light intensity harmonic signal of a calibration sample is represented, wherein K is 1,21The number of frames to be collected in one optical period;
by using the formula (2) and the formula (3), the direct current component I of the light intensity harmonic signal of the calibration sample is solved0And measuring Fourier coefficients
5. The spectral matching calibration method according to claim 1, wherein said step 3 comprises:
based on a measured Fourier coefficient and a theoretical Fourier coefficient of the target detection system, defining an error evaluation function as the sum of squares of differences between the measured Fourier coefficient and the theoretical Fourier coefficient of the target detection system:
wherein the content of the first and second substances,
for the measured fourier coefficients of the object detection system,
is a theoretical Fourier coefficient, λ1The system parameters of the target detection system are lambda, and the system parameters of the reference detection system are lambda;
system parameter lambda for adjusting target detection system based on least square method1Minimizing the error evaluation function, and adjusting the system parameter lambda1And updating to the target detection system.
6. The method for matching calibration according to claim 5, wherein the determining of the theoretical Fourier coefficients according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample comprises:
wherein f is1And f2D is an optical characterization parameter of the calibration sample piece, and at least comprises an amplitude ratio psi, a phase difference delta, a thickness D and a refractive index n; and lambda represents the system parameters of the reference detection system, including the incident angle, the azimuth angle of the polarizer, the phase retardation amount and the optical rotation angle of the compensator, the illumination wavelength of the light source and the numerical aperture.
7. An ellipsometer-based spectrum matching calibration method is characterized by comprising the following steps:
step 1', measuring an optical characterization parameter of each calibration sample in a plurality of calibration samples based on a reference detection system;
step 2', obtaining a light intensity harmonic signal of each calibration sample under the measurement of the target detection system, and calculating a corresponding measurement Fourier coefficient based on the light intensity harmonic signal of each calibration sample, wherein a measurement point position of each calibration sample during the measurement of the target detection system is consistent with a measurement point position of each calibration sample during the measurement of the reference detection system;
and 3', correcting system parameters of the target detection system based on the measured Fourier coefficient and the theoretical Fourier coefficient of each calibration sample piece under the target detection system, wherein the theoretical Fourier coefficient is determined according to the system parameters of the reference detection system and the optical characterization parameters of the calibration sample pieces.
8. The spectral matching calibration method according to claim 7, wherein said step 3 comprises:
based on the measured Fourier coefficient and the theoretical Fourier coefficient of each calibration sample under the target detection system, defining an error evaluation function as the accumulated sum of the square sum of the difference between the measured Fourier coefficient and the theoretical Fourier coefficient of each calibration sample under the target detection system:
wherein the content of the first and second substances,
the measured Fourier coefficient of the mth calibration sample under the target detection system,
the theoretical Fourier coefficient of the mth calibration sample is defined, M is the serial number of the calibration sample, M is the total number of the calibration samples, and lambda1The system parameters of the target detection system are lambda, and the system parameters of the reference detection system are lambda;
system parameter lambda for adjusting target detection system based on least square method1Minimizing the error evaluation function, and adjusting the system parameter lambda1And updating to the target detection system.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115728245A (en) * | 2022-10-10 | 2023-03-03 | 武汉颐光科技有限公司 | Ellipsometer global parameter calibration method and calibration system |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008143535A1 (en) * | 2007-05-24 | 2008-11-27 | Auckland Uniservices Limited | An interferometric ellipsometer |
| US20130132021A1 (en) * | 2011-11-21 | 2013-05-23 | Kla-Tencor Corporation | Spectral Matching Based Calibration |
| CN103163077A (en) * | 2013-01-31 | 2013-06-19 | 华中科技大学 | Calibration method for rotating device type spectrum ellipsometer system parameter |
| US20140340682A1 (en) * | 2013-05-16 | 2014-11-20 | Kla-Tencor Corporation | Metrology system calibration refinement |
| CN104568765A (en) * | 2014-12-25 | 2015-04-29 | 武汉颐光科技有限公司 | Miniature spectroscopic ellipsometer device and measuring method |
| CN109313393A (en) * | 2016-06-09 | 2019-02-05 | Asml荷兰有限公司 | Measuring equipment |
| KR102109540B1 (en) * | 2019-02-28 | 2020-05-12 | 한국생산기술연구원 | Data Analysis Method Of Ellipsometer |
| CN111413282A (en) * | 2020-04-11 | 2020-07-14 | 华中科技大学 | Photoelastic high-speed Mueller matrix ellipsometer and in-situ calibration and measurement method thereof |
| CN113281268A (en) * | 2021-05-31 | 2021-08-20 | 华中科技大学 | Data analysis method and system for rotating polarization device spectrum ellipsometer |
-
2021
- 2021-12-03 CN CN202111466890.1A patent/CN114384017A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008143535A1 (en) * | 2007-05-24 | 2008-11-27 | Auckland Uniservices Limited | An interferometric ellipsometer |
| US20130132021A1 (en) * | 2011-11-21 | 2013-05-23 | Kla-Tencor Corporation | Spectral Matching Based Calibration |
| CN103163077A (en) * | 2013-01-31 | 2013-06-19 | 华中科技大学 | Calibration method for rotating device type spectrum ellipsometer system parameter |
| US20140340682A1 (en) * | 2013-05-16 | 2014-11-20 | Kla-Tencor Corporation | Metrology system calibration refinement |
| CN104568765A (en) * | 2014-12-25 | 2015-04-29 | 武汉颐光科技有限公司 | Miniature spectroscopic ellipsometer device and measuring method |
| CN109313393A (en) * | 2016-06-09 | 2019-02-05 | Asml荷兰有限公司 | Measuring equipment |
| KR102109540B1 (en) * | 2019-02-28 | 2020-05-12 | 한국생산기술연구원 | Data Analysis Method Of Ellipsometer |
| CN111413282A (en) * | 2020-04-11 | 2020-07-14 | 华中科技大学 | Photoelastic high-speed Mueller matrix ellipsometer and in-situ calibration and measurement method thereof |
| CN113281268A (en) * | 2021-05-31 | 2021-08-20 | 华中科技大学 | Data analysis method and system for rotating polarization device spectrum ellipsometer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115728245A (en) * | 2022-10-10 | 2023-03-03 | 武汉颐光科技有限公司 | Ellipsometer global parameter calibration method and calibration system |
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