CN105080921A - Cover board glass washing process - Google Patents

Cover board glass washing process Download PDF

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Publication number
CN105080921A
CN105080921A CN201410216555.XA CN201410216555A CN105080921A CN 105080921 A CN105080921 A CN 105080921A CN 201410216555 A CN201410216555 A CN 201410216555A CN 105080921 A CN105080921 A CN 105080921A
Authority
CN
China
Prior art keywords
cover board
cover
glass
plate glass
machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410216555.XA
Other languages
Chinese (zh)
Inventor
陈昱成
胡书立
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SURTEC TECHNOLOGY (SUZHOU) Co Ltd
Original Assignee
SURTEC TECHNOLOGY (SUZHOU) Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SURTEC TECHNOLOGY (SUZHOU) Co Ltd filed Critical SURTEC TECHNOLOGY (SUZHOU) Co Ltd
Priority to CN201410216555.XA priority Critical patent/CN105080921A/en
Publication of CN105080921A publication Critical patent/CN105080921A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a cover board glass washing process. The cover board glass washing process includes the following steps that firstly, after being washed, a cover board is printed with ink and dried, a plasma machine is not used, glass of the printed and dried cover board is directly washed through an ultrasonic washing machine, and anionic surfactant liquid medicine in the ultrasonic washing machine is replaced with nonionic surfactant liquid medicine, wherein the temperature is set to be 60 DEG C, and the washing time is set to be 4 minutes; secondly, the HLB value of a nonionic surfactant is adjusted between 12 to 15, the surface of the glass of the cover board can be damped at the water temperature of 60 DEG C, grease is removed, and the water drop angle of the glass of the cover board can be reduced to within 30 degrees. The steps of the cover board glass washing process are simple, a chemical reaction mode is used for replacing a traditional process for reducing the water drop angle through the plasma machine, the bad phenomenon that the glass of the cover board is scratched in the transfer process can be avoided, the yield is increased, capacity is improved, and production cost is greatly reduced.

Description

A kind of cover-plate glass cleaning
Technical field
The present invention relates to a kind of cover-plate glass cleaning.
Background technology
Cover-plate glass element sheet (such as hand-set lid glass, panel computer glass, flat panel TV cover-plate glass, industrial business touch-screen cover-plate glass etc.) the dirty impurity of shaping rear Ultrasonic Cleaning, then printing-ink is carried out, according to customer requirement generally to carry out 5-9 time not isochrome sequence repeatedly print, often print an ink and all will carry out lower sequence printing of the same colour again after baking box is dried, ink grease of giving out of ink after the baking not wait for 5-9 time drops on glass surface, glass surface water droplet angle is made to have 20 ° to rise to 90 °, cause next processing procedure because water droplet angle too high (customer requirement < 60 °), cause bubble cannot to fit production, current use plasma (plasma machine) 800 ° of high-temperature process glass surfaces reduce water droplet angle with this, because plasma machine is the bottleneck produced, and day night shift also respectively needs 3 people just can complete the production of this operation, so plasma needs to carry out technological improvement.Plasma uses finished product supersonic wave cleaning machine to clean (finished product ultrasonic wave uses 18 megohm pure water and the cleaning of anion surfactant liquid) after reducing water droplet angle, test again, the non-defective unit of inspection carries out AF anti-fingerprint plated film, detect with the cleaned current of developing machine after plated film, non-defective unit carries out packaging shipment, this process is complicated, and production efficiency is low, and product fraction defective is high.
Summary of the invention
For solving the problems of the technologies described above, the invention provides a kind of cover-plate glass cleaning.
Cover-plate glass cleaning of the present invention, comprises the following steps:
1) printing-ink and baking is carried out after cover plate cleaning, do not use plasma machine, directly the cover-plate glass after printing baking is adopted supersonic wave cleaning machine cleaning, change the anion surfactant liquid inside supersonic wave cleaning machine into non-ionic surface active agent liquid, temperature is set to 60 DEG C, and scavenging period is 4 minutes, because non-ionic surface active agent has hydrophily, the grease on cover-plate glass surface can be removed, also can wash the greasy dirt inside supersonic wave cleaning machine;
2) between non-ionic surface active agent HLB value debugging 12-15, can soak cover-plate glass surface at water temperature 60 DEG C, remove grease, the water droplet angle of cover-plate glass can drop within 30 °.
Compared with prior art beneficial effect of the present invention is: cover-plate glass cleaning step of the present invention is simple, replacing tradition by chemical reaction mode uses plasma machine to reduce the technique at water droplet angle, can reduce cover-plate glass in circular flow there is scratch bad phenomenon, not only promote yield but also can promote production capacity, production cost reduces greatly.
Detailed description of the invention
Below in conjunction with embodiment, the specific embodiment of the present invention is described in further detail.Following examples for illustration of the present invention, but are not used for limiting the scope of the invention.
A kind of cover-plate glass cleaning, comprises the following steps:
1) printing-ink and baking is carried out after cover plate cleaning, do not use plasma machine, directly the cover-plate glass after printing baking is adopted supersonic wave cleaning machine cleaning, change the anion surfactant liquid inside supersonic wave cleaning machine into non-ionic surface active agent liquid, temperature is set to 60 DEG C, and scavenging period is 4 minutes, because non-ionic surface active agent has hydrophily, the grease on cover-plate glass surface can be removed, also can wash the greasy dirt inside supersonic wave cleaning machine;
2) between non-ionic surface active agent HLB value debugging 12-15, can soak cover-plate glass surface at water temperature 60 DEG C, remove grease, the water droplet angle of cover-plate glass can drop within 30 °.
Cover-plate glass cleaning step of the present invention is simple, replacing tradition by chemical reaction mode uses plasma machine to reduce the technique at water droplet angle, can reduce cover-plate glass in circular flow there is scratch bad phenomenon, not only promote yield but also can promote production capacity, production cost reduces greatly.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the prerequisite not departing from the technology of the present invention principle; can also make some improvement and modification, these improve and modification also should be considered as protection scope of the present invention.

Claims (1)

1. a cover-plate glass cleaning, is characterized in that, comprises the following steps:
1) printing-ink and baking is carried out after cover plate cleaning, do not use plasma machine, directly the cover-plate glass after printing baking is adopted supersonic wave cleaning machine cleaning, change the anion surfactant liquid inside supersonic wave cleaning machine into non-ionic surface active agent liquid, temperature is set to 60 DEG C, and scavenging period is 4 minutes, because non-ionic surface active agent has hydrophily, the grease on cover-plate glass surface can be removed, also can wash the greasy dirt inside supersonic wave cleaning machine;
2) between non-ionic surface active agent HLB value debugging 12-15, can soak cover-plate glass surface at water temperature 60 DEG C, remove grease, the water droplet angle of cover-plate glass can drop within 30 °.
CN201410216555.XA 2014-05-22 2014-05-22 Cover board glass washing process Pending CN105080921A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201410216555.XA CN105080921A (en) 2014-05-22 2014-05-22 Cover board glass washing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201410216555.XA CN105080921A (en) 2014-05-22 2014-05-22 Cover board glass washing process

Publications (1)

Publication Number Publication Date
CN105080921A true CN105080921A (en) 2015-11-25

Family

ID=54562777

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410216555.XA Pending CN105080921A (en) 2014-05-22 2014-05-22 Cover board glass washing process

Country Status (1)

Country Link
CN (1) CN105080921A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109270622A (en) * 2018-10-22 2019-01-25 东莞市银泰丰光学科技有限公司 A kind of processing method changing glass light guide plate surface tension and water droplet angle

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04291722A (en) * 1991-03-20 1992-10-15 Asahi Denka Kogyo Kk Polishing agent for silicon wafer
CN101235253A (en) * 2006-02-07 2008-08-06 福吉米株式会社 Polishing composition and polishing method
JP2011252160A (en) * 2011-08-01 2011-12-15 Adeka Corp Cip cleaning method
CN102489469A (en) * 2011-11-23 2012-06-13 由田信息技术(上海)有限公司 Method for cleaning substrate with ultrasonic oscillation liquid
CN102500570A (en) * 2011-11-01 2012-06-20 宁波市鑫友光伏有限公司 Method for cleaning solar cell silicon wafers

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04291722A (en) * 1991-03-20 1992-10-15 Asahi Denka Kogyo Kk Polishing agent for silicon wafer
CN101235253A (en) * 2006-02-07 2008-08-06 福吉米株式会社 Polishing composition and polishing method
JP2011252160A (en) * 2011-08-01 2011-12-15 Adeka Corp Cip cleaning method
CN102500570A (en) * 2011-11-01 2012-06-20 宁波市鑫友光伏有限公司 Method for cleaning solar cell silicon wafers
CN102489469A (en) * 2011-11-23 2012-06-13 由田信息技术(上海)有限公司 Method for cleaning substrate with ultrasonic oscillation liquid

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
李智新等: "非离子表面活性剂的HLB值", 《日用化学工业》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109270622A (en) * 2018-10-22 2019-01-25 东莞市银泰丰光学科技有限公司 A kind of processing method changing glass light guide plate surface tension and water droplet angle
CN109270622B (en) * 2018-10-22 2020-12-11 东莞市银泰丰光学科技有限公司 Processing method for changing surface tension and water drop angle of glass light guide plate

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Application publication date: 20151125