CN105070835A - Flexible base plate for organic electronic device - Google Patents
Flexible base plate for organic electronic device Download PDFInfo
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- CN105070835A CN105070835A CN201510455820.4A CN201510455820A CN105070835A CN 105070835 A CN105070835 A CN 105070835A CN 201510455820 A CN201510455820 A CN 201510455820A CN 105070835 A CN105070835 A CN 105070835A
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- ball
- powder
- electronic device
- flexible substrate
- starch
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Abstract
The present invention discloses a flexible base plate for an organic electronic device. The flexible base plate comprises a flexible substrate and a conductive layer above the flexible substrate. The flexible substrate is made of, by weight, 1.5-2.5% of high-strength denaturated starch, 1.5-4% of modified silica, 0.5-0.8% of electronic grade silicon powder, 5-10% of silica sol, 1.5-2% of antioxidants, 0.3-0.4% of glyceryl behenate, 0.6-1.5% of liquid paraffins, and allowance of shellac. Through adding the two inorganic non-metal materials which are the electronic grade silicon powder and the high-strength denaturated starch, the prepared substrate is susceptible to degradation, the environment is not polluted by the substrate, and the overall toughness is good.
Description
Technical field
The present invention relates to photoelectron technical field, be specifically related to a kind of organic electronic device flexible base, board.
Background technology
It is extensive that organic electronic device has material source, and rich color also can form the features such as flexible device.But at present, organic electronic device is mostly prepared in rigid substrate, such as glass, silicon chip etc., although they have excellent device performance, shock resistance resists, the ability of vibrations is more weak, weight is relatively heavier, carries inconvenience, is very limited in the application of some occasion.Replace the benefit of rigid substrate to be that product is lighter by flexible substrate, not easily broken, save space and be more convenient for carrying.But, from the development of current flexible electronic device, replace rigid substrate also to there is a lot of problem by flexible substrate.First, the surface smoothness of flexible substrate is far away from rigid substrate, and irregular surface causes electronic device easily to occur short circuit, the hydraulic performance declines such as the lost of life; Secondly, different application habits needs the flexible substrate of different degree of flexibility, such as, and shock resistance, the substrate that non-friable product needed modulus of elasticity is higher, and the substrate that completely curling wearable flexible device needs modulus of elasticity lower.Flexible substrate material intercepts water oxygen limited capacity, and the electrode material of organic electronic device is very easily oxidized under aerobic environment, thus causes device degradation.Therefore, flexible organic electric device substrate also will possess certain water and oxygen barrier property.But also there is many restrictions in the preparation of flexible device, still have many underlying issues and process difficulties urgently to be resolved hurrily.Such as, its surface smoothness is poor, not as good as glass substrate.Meanwhile, before to mention the water oxygen obstructing capacity of flexible substrate most important, otherwise the electrode material of device and organic material are easy to be etched, and cause device performance to reduce.
Summary of the invention
It is good that technical problem to be solved by this invention is to improve a kind of surface smoothness, the organic electronic device flexible base, board that water and oxygen barrier property is strong.
Technical problem to be solved by this invention realizes by the following technical solutions:
A kind of organic electronic device flexible base, board, comprise flexible substrate and conductive layer, described conductive layer is positioned at above flexible substrate; Described flexible substrate is made up of the component of following mass percent:
By adding electronic-grade silicon micro mist and these two kinds of Inorganic Non-metallic Materials of high intensity modified starch, make the substrate prepared be easy to degraded, environmentally safe, overall flexibility is good.
The preparation method of above-mentioned flexible base, board is as follows:
1) high intensity modified starch, improved silica, electronic-grade silicon micro mist, Ludox, antioxidant, Compritol 888 ATO and atoleine and lac are stirred and evenly mixed, obtain epoxy glue;
2) utilize spin coating method to coat epoxy glue on clean silicon chip, obtain the epoxy glue coating that one deck is smooth, thickness is 80 ~ 3000 μm;
3) by step 2) in scribble epoxy glue coating silicon chip be placed under uviol lamp and peel off after solidification, obtain flexible substrate;
4) adopt method of roll coating to prepare conductive layer on flexible substrates, then the flexible substrate scribbling conductive layer is carried out treatment with ultraviolet light, finally obtain flexible base, board.
The preparation method of above-mentioned improved silica is as follows:
1) ratio of 1-3:1-5 takes hum silicon dioxide Si powder and Neon SiC powder in mass ratio;
2) be decentralized medium to the silicon dioxide taken and sic powder with absolute ethyl alcohol, wherein the mass ratio of powder and alcohol is 1:30, ultrasonic disperse 1 hour on supersonic cleaning machine;
3) compound through ultrasonic disperse being put into nylon ball grinder, take agate ball as abrading-ball, and ball material mass ratio is 7:1, is under the condition of 150 revs/min at rotating speed, continuous ball milling 2 hours in planetary ball mill;
4) powder complete for ball milling is poured in powder dish together with agate abrading-ball, dry at 80 DEG C;
5) powder of drying is sieved, take out agate abrading-ball, then mixed powder is ground, until without till larger reunion, so far, obtain improved silica.
Above-mentioned high intensity modified starch is modified corn starch, obtains in the following manner:
1) neutralization reaction
Cornstarch is poured in reactor and injects steam while stirring, under the steam temperature in reactor reaches the condition of 140 DEG C, allow cornstarch fully be stirred in a kettle., make it be heated evenly, add thermal agitation 30-60 minute, to starch slaking;
2) feed intake
Aging starch is taken out from reactor, puts into retort injected clear water and be stirred to without particle, make liquid starch concentration 60%;
3) precipitate
Allow starch soak fully, evenly to be shifted out from retort by liquid starch, put into pond and precipitate, after the precipitation of 5-7 days, the starch solution topmost clarified in water intaking pond is produced for subsequent use; In pond the fecula of lower floor add water again, stirring of heating, the starch solution clarified above getting is for subsequent use, until can not till the liquid clear liquid of levigation;
4) be incubated hydrolysis to go out enzyme
Be drawn onto clarify starch solution in retort, water filling steam in retort, makes the starch liquor heating to 65 DEG C clarified, and plays to size mixing and high temperature goes out the effect of enzyme in constantly stirring, and heating mixing time is 20-40 minute; Then wooden carbon ash decolouring slagging-off is added; Eventually pass Filter Press, flow out the thorough clearly starch solution seen the bottom;
5) receive clear water to concentrate
By the starch solution after decolouring deslagging filtering, inject vacuum concentration pot, concentrated starch solution Baume degrees is at 32 degree;
6) prepare burden
Be drawn into from vacuum concentration pot in agitator tank be heated to 65 DEG C being concentrated to the starch solution of Baume degrees at 32 degree, be 50:1:0.5 by cornstarch and borax and sodium benzoate mass ratio, pour borax and sodium benzoate into, borax and sodium benzoate are being heated evenly without caking under stirring, and can fully be dissolved in starch fluid;
7) high temperature centrifugal spray
The starch solution self priming pump of preparing burden complete is injected in the tank on the centrifugal tower of high temperature stand-by, under guarantee starch solution 65 DEG C of temperature conditions, slowly to add in the centrifugal tower of high temperature in supercentrifuge with funnel, in the centrifugal tower of high temperature, steam temperature remains on more than 150 DEG C simultaneously, the starch solution concentrated is made to form atomization, efflorescence under the double action through High Rotation Speed centrifuge and high-temperature gas, finally drop at the bottom of tower inner in powdery, obtain high intensity modified starch finished product.
Described antioxidant is formed by the component system of mixing of following mass percent: DMKO 20%, peanut oil 25%, soybean protein isolate 4%, azelaic acid 2%, isoamyl acetate 4%, anthocyanidin 2%, silicone oil 10%, palm oil 4%, atoleine 3%, the tert-butyl alcohol 4%, surplus are distilled water.
The invention has the beneficial effects as follows:
(1) by adding electronic-grade silicon micro mist and these two kinds of Inorganic Non-metallic Materials of high intensity modified starch, make the substrate prepared be easy to degraded, environmentally safe, overall flexibility is good.
(2) in substrate, mix appropriate improved silica, thus improve the mechanical strength of flexible substrate.
(3) mix the antioxidant of formulated in substrate, effectively increase water and oxygen barrier property.
Embodiment
The technological means realized to make the present invention, creation characteristic, reaching object and effect is easy to understand, below in conjunction with specific embodiment, setting forth the present invention further.
Embodiment 1:
A kind of organic electronic device flexible base, board, comprise flexible substrate and conductive layer, described conductive layer is positioned at above flexible substrate; Described flexible substrate is made up of the component of following mass percent:
By adding electronic-grade silicon micro mist and these two kinds of Inorganic Non-metallic Materials of high intensity modified starch, make the substrate prepared be easy to degraded, environmentally safe, overall flexibility is good.
The preparation method of above-mentioned flexible base, board is as follows:
1) high intensity modified starch, improved silica, electronic-grade silicon micro mist, Ludox, antioxidant, Compritol 888 ATO and atoleine and lac are stirred and evenly mixed, obtain epoxy glue;
2) utilize spin coating method to coat epoxy glue on clean silicon chip, obtain the epoxy glue coating that one deck is smooth, thickness is 80 ~ 3000 μm;
3) by step 2) in scribble epoxy glue coating silicon chip be placed under uviol lamp and peel off after solidification, obtain flexible substrate;
4) adopt method of roll coating to prepare conductive layer on flexible substrates, then the flexible substrate scribbling conductive layer is carried out treatment with ultraviolet light, finally obtain flexible base, board.
The preparation method of above-mentioned improved silica is as follows:
1) ratio of 3:2 takes hum silicon dioxide Si powder and Neon SiC powder in mass ratio;
2) be decentralized medium to the silicon dioxide taken and sic powder with absolute ethyl alcohol, wherein the mass ratio of powder and alcohol is 1:30, ultrasonic disperse 1 hour on supersonic cleaning machine;
3) compound through ultrasonic disperse being put into nylon ball grinder, take agate ball as abrading-ball, and ball material mass ratio is 7:1, is under the condition of 150 revs/min at rotating speed, continuous ball milling 2 hours in planetary ball mill;
4) powder complete for ball milling is poured in powder dish together with agate abrading-ball, dry at 80 DEG C;
5) powder of drying is sieved, take out agate abrading-ball, then mixed powder is ground, until without till larger reunion, so far, obtain improved silica.
Above-mentioned high intensity modified starch is modified corn starch, obtains in the following manner:
1) neutralization reaction
Cornstarch is poured in reactor and injects steam while stirring, under the steam temperature in reactor reaches the condition of 140 DEG C, allow cornstarch fully be stirred in a kettle., make it be heated evenly, add thermal agitation 30-60 minute, to starch slaking;
2) feed intake
Aging starch is taken out from reactor, puts into retort injected clear water and be stirred to without particle, make liquid starch concentration 60%;
3) precipitate
Allow starch soak fully, evenly to be shifted out from retort by liquid starch, put into pond and precipitate, after the precipitation of 5-7 days, the starch solution topmost clarified in water intaking pond is produced for subsequent use; In pond the fecula of lower floor add water again, stirring of heating, the starch solution clarified above getting is for subsequent use, until can not till the liquid clear liquid of levigation;
4) be incubated hydrolysis to go out enzyme
Be drawn onto clarify starch solution in retort, water filling steam in retort, makes the starch liquor heating to 65 DEG C clarified, and plays to size mixing and high temperature goes out the effect of enzyme in constantly stirring, and heating mixing time is 20-40 minute; Then wooden carbon ash decolouring slagging-off is added; Eventually pass Filter Press, flow out the thorough clearly starch solution seen the bottom;
5) receive clear water to concentrate
By the starch solution after decolouring deslagging filtering, inject vacuum concentration pot, concentrated starch solution Baume degrees is at 32 degree;
6) prepare burden
Be drawn into from vacuum concentration pot in agitator tank be heated to 65 DEG C being concentrated to the starch solution of Baume degrees at 32 degree, be 50:1:0.5 by cornstarch and borax and sodium benzoate mass ratio, pour borax and sodium benzoate into, borax and sodium benzoate are being heated evenly without caking under stirring, and can fully be dissolved in starch fluid;
7) high temperature centrifugal spray
The starch solution self priming pump of preparing burden complete is injected in the tank on the centrifugal tower of high temperature stand-by, under guarantee starch solution 65 DEG C of temperature conditions, slowly to add in the centrifugal tower of high temperature in supercentrifuge with funnel, in the centrifugal tower of high temperature, steam temperature remains on more than 150 DEG C simultaneously, the starch solution concentrated is made to form atomization, efflorescence under the double action through High Rotation Speed centrifuge and high-temperature gas, finally drop at the bottom of tower inner in powdery, obtain high intensity modified starch finished product.
Embodiment 2:
A kind of organic electronic device flexible base, board, comprise flexible substrate and conductive layer, described conductive layer is positioned at above flexible substrate; Described flexible substrate is made up of the component of following mass percent:
By adding electronic-grade silicon micro mist and these two kinds of Inorganic Non-metallic Materials of high intensity modified starch, make the substrate prepared be easy to degraded, environmentally safe, overall flexibility is good.
The preparation method of above-mentioned flexible base, board is as follows:
1) high intensity modified starch, improved silica, electronic-grade silicon micro mist, Ludox, antioxidant, Compritol 888 ATO and atoleine and lac are stirred and evenly mixed, obtain epoxy glue;
2) utilize spin coating method to coat epoxy glue on clean silicon chip, obtain the epoxy glue coating that one deck is smooth, thickness is 80 ~ 3000 μm;
3) by step 2) in scribble epoxy glue coating silicon chip be placed under uviol lamp and peel off after solidification, obtain flexible substrate;
4) adopt method of roll coating to prepare conductive layer on flexible substrates, then the flexible substrate scribbling conductive layer is carried out treatment with ultraviolet light, finally obtain flexible base, board.
The preparation method of above-mentioned improved silica is as follows:
1) ratio of 1-3:1-5 takes hum silicon dioxide Si powder and Neon SiC powder in mass ratio;
2) be decentralized medium to the silicon dioxide taken and sic powder with absolute ethyl alcohol, wherein the mass ratio of powder and alcohol is 1:30, ultrasonic disperse 1 hour on supersonic cleaning machine;
3) compound through ultrasonic disperse being put into nylon ball grinder, take agate ball as abrading-ball, and ball material mass ratio is 7:1, is under the condition of 150 revs/min at rotating speed, continuous ball milling 2 hours in planetary ball mill;
4) powder complete for ball milling is poured in powder dish together with agate abrading-ball, dry at 80 DEG C;
5) powder of drying is sieved, take out agate abrading-ball, then mixed powder is ground, until without till larger reunion, so far, obtain improved silica.
Above-mentioned high intensity modified starch is modified corn starch, obtains in the following manner:
1) neutralization reaction
Cornstarch is poured in reactor and injects steam while stirring, under the steam temperature in reactor reaches the condition of 140 DEG C, allow cornstarch fully be stirred in a kettle., make it be heated evenly, add thermal agitation 30-60 minute, to starch slaking;
2) feed intake
Aging starch is taken out from reactor, puts into retort injected clear water and be stirred to without particle, make liquid starch concentration 60%;
3) precipitate
Allow starch soak fully, evenly to be shifted out from retort by liquid starch, put into pond and precipitate, after the precipitation of 5-7 days, the starch solution topmost clarified in water intaking pond is produced for subsequent use; In pond the fecula of lower floor add water again, stirring of heating, the starch solution clarified above getting is for subsequent use, until can not till the liquid clear liquid of levigation;
4) be incubated hydrolysis to go out enzyme
Be drawn onto clarify starch solution in retort, water filling steam in retort, makes the starch liquor heating to 65 DEG C clarified, and plays to size mixing and high temperature goes out the effect of enzyme in constantly stirring, and heating mixing time is 20-40 minute; Then wooden carbon ash decolouring slagging-off is added; Eventually pass Filter Press, flow out the thorough clearly starch solution seen the bottom;
5) receive clear water to concentrate
By the starch solution after decolouring deslagging filtering, inject vacuum concentration pot, concentrated starch solution Baume degrees is at 32 degree;
6) prepare burden
Be drawn into from vacuum concentration pot in agitator tank be heated to 65 DEG C being concentrated to the starch solution of Baume degrees at 32 degree, be 50:1:0.5 by cornstarch and borax and sodium benzoate mass ratio, pour borax and sodium benzoate into, borax and sodium benzoate are being heated evenly without caking under stirring, and can fully be dissolved in starch fluid;
7) high temperature centrifugal spray
The starch solution self priming pump of preparing burden complete is injected in the tank on the centrifugal tower of high temperature stand-by, under guarantee starch solution 65 DEG C of temperature conditions, slowly to add in the centrifugal tower of high temperature in supercentrifuge with funnel, in the centrifugal tower of high temperature, steam temperature remains on more than 150 DEG C simultaneously, the starch solution concentrated is made to form atomization, efflorescence under the double action through High Rotation Speed centrifuge and high-temperature gas, finally drop at the bottom of tower inner in powdery, obtain high intensity modified starch finished product.
Described antioxidant is formed by the component system of mixing of following mass percent: DMKO 20%, peanut oil 25%, soybean protein isolate 4%, azelaic acid 2%, isoamyl acetate 4%, anthocyanidin 2%, silicone oil 10%, palm oil 4%, atoleine 3%, the tert-butyl alcohol 4%, surplus are distilled water.
More than show and describe general principle of the present invention and principal character and advantage of the present invention.The technical staff of the industry should understand; the present invention is not restricted to the described embodiments; what describe in above-described embodiment and specification just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.Application claims protection range is defined by appending claims and equivalent thereof.
Claims (3)
1. an organic electronic device flexible base, board, comprises flexible substrate and conductive layer, and described conductive layer is positioned at above flexible substrate; It is characterized in that, described flexible substrate is made up of the component of following mass percent:
2. organic electronic device flexible base, board according to claim 1, is characterized in that, the preparation method of above-mentioned improved silica is as follows:
1) ratio of 1-3:1-5 takes hum silicon dioxide Si powder and Neon SiC powder in mass ratio;
2) be decentralized medium to the silicon dioxide taken and sic powder with absolute ethyl alcohol, wherein the mass ratio of powder and alcohol is 1:30, ultrasonic disperse 1 hour on supersonic cleaning machine;
3) compound through ultrasonic disperse being put into nylon ball grinder, take agate ball as abrading-ball, and ball material mass ratio is 7:1, is under the condition of 150 revs/min at rotating speed, continuous ball milling 2 hours in planetary ball mill;
4) powder complete for ball milling is poured in powder dish together with agate abrading-ball, dry at 80 DEG C;
5) powder of drying is sieved, take out agate abrading-ball, then mixed powder is ground, until without till larger reunion, so far, obtain improved silica.
3. organic electronic device flexible base, board according to claim 1, it is characterized in that, described antioxidant is formed by the component system of mixing of following mass percent: DMKO 20%, peanut oil 25%, soybean protein isolate 4%, azelaic acid 2%, isoamyl acetate 4%, anthocyanidin 2%, silicone oil 10%, palm oil 4%, atoleine 3%, the tert-butyl alcohol 4%, surplus are distilled water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510455820.4A CN105070835A (en) | 2015-07-27 | 2015-07-27 | Flexible base plate for organic electronic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510455820.4A CN105070835A (en) | 2015-07-27 | 2015-07-27 | Flexible base plate for organic electronic device |
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| CN105070835A true CN105070835A (en) | 2015-11-18 |
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| CN201510455820.4A Pending CN105070835A (en) | 2015-07-27 | 2015-07-27 | Flexible base plate for organic electronic device |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101544700A (en) * | 2009-05-05 | 2009-09-30 | 界首市东亚淀粉出品有限公司 | Method for producing high intensity modified starch |
| JP2009295358A (en) * | 2008-06-04 | 2009-12-17 | National Institute Of Advanced Industrial & Technology | Actuator element using carbon nanotube electrode with oriented liquid crystal compound |
| CN103029355A (en) * | 2012-11-30 | 2013-04-10 | 电子科技大学 | Photoinduced bending flexible electro-conductive baseplate and preparation method thereof |
| CN103302910A (en) * | 2013-06-25 | 2013-09-18 | 电子科技大学 | Biodegradable flexible conductive base plate and preparation method thereof |
| CN104030662A (en) * | 2014-05-20 | 2014-09-10 | 卢斌 | Preparation process of Al2O3-TiC multiphase ceramics |
-
2015
- 2015-07-27 CN CN201510455820.4A patent/CN105070835A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009295358A (en) * | 2008-06-04 | 2009-12-17 | National Institute Of Advanced Industrial & Technology | Actuator element using carbon nanotube electrode with oriented liquid crystal compound |
| CN101544700A (en) * | 2009-05-05 | 2009-09-30 | 界首市东亚淀粉出品有限公司 | Method for producing high intensity modified starch |
| CN103029355A (en) * | 2012-11-30 | 2013-04-10 | 电子科技大学 | Photoinduced bending flexible electro-conductive baseplate and preparation method thereof |
| CN103302910A (en) * | 2013-06-25 | 2013-09-18 | 电子科技大学 | Biodegradable flexible conductive base plate and preparation method thereof |
| CN104030662A (en) * | 2014-05-20 | 2014-09-10 | 卢斌 | Preparation process of Al2O3-TiC multiphase ceramics |
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Application publication date: 20151118 |