CN105047525A

CN105047525A - Manufacturing method of high aspect ratio flexible nanopillar array

Info

Publication number: CN105047525A
Application number: CN201510124275.0A
Authority: CN
Inventors: 马志波; 苑伟政; 姜澄宇; 乔大勇; 孟海莎
Original assignee: Northwestern Polytechnical University
Current assignee: Northwestern Polytechnical University
Priority date: 2015-03-20
Filing date: 2015-03-20
Publication date: 2015-11-11
Anticipated expiration: 2035-03-20
Also published as: CN105047525B

Abstract

The invention belongs to the field of integrated circuit and micro nano electronic mechanical system manufacturing, and specifically relates to a manufacturing method of a high aspect ratio flexible nanopillar array. The manufacturing method comprises preparing a soft template of a high aspect ratio flexible nanometer cilia structure, wherein the soft template takes PDMS as the casting material; and copying a template of a high aspect ratio flexible nanometer cilia array, wherein the imprinted PDMS is used as a template, and ultraviolet light polymerization adhesive OrmoStamp materials are imprinted to obtain a flexible structure which is identical to the flexible structure on the silicon die. For the difficulty in manufacturing a high aspect ratio flexible nanometer structure, the manufacturing method of a high aspect ratio flexible nanopillar array can realize flexible manufacturing of a high aspect ratio flexible nanometer cilia array through the method of imprinting twice and provide important technical support for manufacturing the high aspect ratio flexible nanometer structure, based on two flexible materials: PDMS and ultraviolet light polymerization adhesive OrmoStamp.

Description

A kind of manufacture method of high-aspect-ratio flexible nano post array

Affiliated field

The present invention belongs to integrated circuit and the manufacture of micro-nano electronic mechanical system field, particularly a kind of manufacture method of high-aspect-ratio nano-structure array.

Background technology

Although silicon of high aspect ratio base nano array successfully manufactures, but due to the modulus of elasticity very large (about 160GP) of silicon materials itself, want to realize low-frequency vibration detection, the absolute growth of silicon nanometer cilium array must be increased to hundreds of micron, and this to be current processing technology cannot realize.For addressing this problem, we consider the modulus of elasticity suitably reducing nanometer ciliary structures, and then reduce the height of nano-array, reduce etching difficulty, realize low-frequency acoustic signal high sensitivity detection, need the manufacturing technology studying high-aspect-ratio flexible nano array for this reason.

High-aspect-ratio flexible nanometer structure has got the attention in fields such as visual switch and bionic surfaces, the advantage such as flexible structure has that quality is light, durability is high, flexible, low cost batch production.But current research can't well solve simple efficient, done with high accuracy flexible during making.For the processing of high-aspect-ratio flexible structure, its manufacture that appears as of nanometer embossing provides reference.

Summary of the invention

The object of the invention is: in order to suitably reduce the modulus of elasticity of nanometer ciliary structures, reducing etching difficulty, the present invention proposes the Flexible Manufacturing Technology being realized high-aspect-ratio nanometer ciliary structures by the mode of impression.The method production efficiency is high, is convenient to realize producing in enormous quantities.

Technical scheme of the present invention is a kind of high-aspect-ratio flexible structure manufacture method, comprises the steps:

Step 1: first need the soft template preparing high-aspect-ratio flexible nano ciliary structures.Mantle version take PDMS as mould material, and the main technological steps based on PDMS nano impression is:

A first the silicon-based nano cilium array processed adopts passivation technology to carry out surface hydrophobic process by ().

B PDMS solvent and curing agent mix by (), put into vacuum drying oven and carry out process of bleeding at normal temperatures, thoroughly remove the bubble in mixture.Finally, PDMS prepolymer is poured into silicon-based nano cilium array surface to leave standstill.

C () thoroughly enters after cilium array until PDMS prepolymer, be pressed in above PDMS by slide level, is placed on hot plate and processes a period of time.Wherein the height of nanometer cilium determines PDMS time of repose length, and highly larger, time of repose is longer, otherwise, shorter.

D () is last, after PDMS thoroughly solidifies, it taken off from silicon-based nano cilium array mold, on PDMS mould, so just define advanced wide nanometer array of circular apertures.Concrete technology flow process as shown in Figure 1.

Step 2: the template copying high-aspect-ratio flexible nano cilium array.With the PDMS impressed for template, adopt ultraviolet cured adhesive OrmoStamp material to impress, so just obtain the flexible structure the same with on silicon mould, main technological steps comprises:

A first PDMS mould adopts the passivation technology effects on surface in high density plasma etch to carry out hydrophobicity process by ().

B OrmoStamp liquid syringe drips on the PDMS mould crossed through hydrophobic treatment on surface by (), observe the surface condition on PDMS, determine whether OrmoStamp liquid fills the nanohole array on PDMS completely under the effect of capillary attraction.

C () gets a slice slide fill the nanohole array on PDMS completely until OrmoStamp after, after adopting acetone cleaning, baking also cool to room temperature on hot plate, to increase the adhesiveness between OrmoStamp liquid and slide.Slide is lain in a horizontal plane on OrmoStamp liquid, expose under ultraviolet light, make OrmoStamp liquid thoroughly solidify under action of ultraviolet light like this.

D it is finally toasted a period of time by () on hot plate after, PDMS mould is removed, completes the manufacture of the high-aspect-ratio flexible nano cilium based on OrmoStamp.So just obtain the flexible structure identical with silicon mould, concrete technological process as shown in Figure 3.

The invention has the beneficial effects as follows: for the manufacture difficult point of high-aspect-ratio flexible nanometer structure, propose based on PDMS and ultraviolet cured adhesive OrmoStamp two kinds of flexible materials, by the method for twice impression, realize the flexible manufacturing of high-aspect-ratio nanometer cilium array, the manufacture for high-aspect-ratio flexible nanometer structure provides important technical support.

Accompanying drawing explanation

The schematic diagram of the Passivation Treatment of Fig. 1 silicon-based nano cilium 1

Fig. 2 PDMS prepolymer 2 applies the schematic diagram on silica-based Nanowire hair surface 1

The schematic diagram of Fig. 3 PDMS prepolymer 2 moulded section

The schematic diagram of Fig. 4 PDMS curing and demolding

The schematic diagram of the Passivation Treatment on Fig. 5 PDMS surface 2

Fig. 6 OrmoStamp liquid 4 applies the schematic diagram on PDMS surface 2

The schematic diagram of the shaping and ultraviolet light polymerization process of Fig. 7 OrmoStamp4 press mold

The schematic diagram that Fig. 8 OrmoStamp4 and PDMS mould 2 are peeled off

Specific implementation method

Give a kind of manufacture method of the high-aspect-ratio flexible nano array based on above-mentioned secondary nano impression in the present embodiment, specifically comprise the steps:

Step 1: the mantle version of high-aspect-ratio flexible nano ciliary structures adopts PDMS to be mould material, it is shaping that the template of silicon-based nano ciliary structures carries out first time press mold, and concrete technology flow process is as follows:

A the silicon-based nano cilium array processed adopts the passivation technology in high density plasma etch to carry out surface hydrophobic process by (), its concrete technology is as follows: C4F8 gas flow is 85sccm, bottom crown power is 600W, APC valve is 82%, after the passivation technology of 1 minute, the carbon depositing to silicon-based nano cilium array surface is fluoridized and is about 150nm with the thickness of thing.

B () is by PDMS solvent and curing agent (RTV615, GESilicones) ratio being 6:1 according to weight ratio mixes, and thoroughly stir, and put into vacuum drying oven and carry out process 20 minutes of bleeding at normal temperatures, thoroughly remove the bubble in mixture.Finally, PDMS prepolymer is poured into silicon-based nano cilium array surface, leave standstill 30 minutes.

C () has extraordinary gas permeability due to PDMS prepolymer, after treating that PDMS prepolymer thoroughly enters nanometer cilium array, be pressed in above PDMS prepolymer by slide level, and process 10 minutes on the hot plate being placed on 120 DEG C.Wherein the length of PDMS time of repose determines primarily of the height of nanometer cilium, and highly larger, time of repose is longer, otherwise, shorter.

D it, after PDMS thoroughly solidifies, carefully takes off from silicon-based nano cilium array mold by (), PDMS mould just defines high-aspect-ratio nanometer array of circular apertures, as shown in Figure 2.

Step 2: with the PDMS impressed for template, impress with ultraviolet curable agent OrmoStamp material, so just obtain the flexible material the same with on silicon mould, main technological steps comprises:

A the PDMS mould of acquisition adopts the passivation technology in high density plasma etch to carry out surface hydrophobic process by () equally, its concrete technology is as follows: C4F8 gas flow is 85sccm, bottom crown power is 600W, APC valve is 82%, after the passivation technology of 1 minute, the thickness depositing to the fluorocarbon of nanometer cilium array surface is about 150nm.

B () liquid adopts syringe to be dripped to by OrmoStamp on the PDMS mould of surface hydrophobic process, through after a period of time, by observing the surface condition on PDMS, determine whether OrmoStamp liquid fills the nanohole array on PDMS completely under the effect of capillary attraction.

C () treats the nanohole array that OrmoStamp liquid is filled on PDMS completely after, get the slide that a slice acetone is cleaned, the hot plate of 200 DEG C toasts 2 minutes, and be cooled to room temperature, or adopt oxygen plasma to carry out of short duration process to slide, object is the adhesiveness in order to increase between OrmoStamp liquid and slide.Slide level be placed on OrmoStamp liquid, be then the exposed under UV light 20 minutes of 365 nanometers at wavelength, such OrmoStamp liquid will thoroughly solidify under the action of uv light.

D () is last, it toasted 10 minutes on the hot plate of 130 DEG C, thoroughly removes the moisture in high-aspect-ratio flexible nano cilium array, the more important thing is and improve the thermal stability of material and the stability of environment.Finally, carefully PDMS mould is peeled off, complete the high-aspect-ratio flexible nano cilium manufacture based on OrmoStamp.

The flexible high depth-to-width ratio micro-nano composite structure array obtained after Figure 4 shows that employing twice nano impression and flexible high-aspect-ratio nanometer cilium array.Nanometer cilium array structure is entirely replicated out, and nanometer cilium array structure pattern is intact.

Claims

1. a high-aspect-ratio flexible structure manufacture method, comprises the steps:

Step 1: first need the soft template preparing high-aspect-ratio flexible nano ciliary structures; Mantle version take PDMS as mould material, and the main technological steps based on PDMS nano impression is:

A the silicon-based nano cilium array processed adopts passivation technology to carry out surface hydrophobic process by ().

B PDMS solvent and curing agent mix by (), put into vacuum drying oven and carry out process of bleeding at normal temperatures, thoroughly remove the bubble in mixture.Finally, PDMS prepolymer is poured into silicon-based nano cilium array surface to leave standstill;

C () thoroughly enters after cilium array until PDMS prepolymer, be pressed in above PDMS by slide level, is placed on hot plate and processes;

D it, after PDMS thoroughly solidifies, takes off from silicon-based nano cilium array mold by (), on PDMS mould, so just define advanced wide nanometer array of circular apertures;

Step 2: the template copying high-aspect-ratio flexible nano cilium array; With the PDMS impressed for template, adopt ultraviolet cured adhesive OrmoStamp material to impress, so just obtain the flexible structure the same with on silicon mould, main technological steps comprises:

A PDMS mould adopts the passivation technology effects on surface in high density plasma etch to carry out hydrophobicity process by ().

B OrmoStamp liquid drips on the PDMS mould crossed through hydrophobic treatment on surface by ();

C () gets a slice slide fill the nanohole array on PDMS completely until OrmoStamp after, after adopting acetone cleaning, baking also cool to room temperature on hot plate, to increase the adhesiveness between OrmoStamp liquid and slide; Slide is lain in a horizontal plane on OrmoStamp liquid, expose under ultraviolet light, make OrmoStamp liquid thoroughly solidify under action of ultraviolet light like this;

D it toasts by () on hot plate, removed by PDMS mould, complete the manufacture of the high-aspect-ratio flexible nano cilium based on OrmoStamp.So just obtain the flexible structure identical with silicon mould.