CN105047525B - A kind of manufacture method of high-aspect-ratio flexible nano post array - Google Patents
A kind of manufacture method of high-aspect-ratio flexible nano post array Download PDFInfo
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- CN105047525B CN105047525B CN201510124275.0A CN201510124275A CN105047525B CN 105047525 B CN105047525 B CN 105047525B CN 201510124275 A CN201510124275 A CN 201510124275A CN 105047525 B CN105047525 B CN 105047525B
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Abstract
The present invention is to belong to integrated circuit and micro-nano electronic mechanical system manufacturing field, particularly a kind of manufacture method of high-aspect-ratio nano-structure array.This method needs to prepare the soft template of high-aspect-ratio flexible nano ciliary structures, and mantle version is using PDMS as mould material；Replicate the template of high-aspect-ratio flexible nano cilium array.Using the PDMS imprinted as template, imprinted using ultraviolet cured adhesive OrmoStamp materials, thus obtained the flexible structure as on silicon mould.The beneficial effects of the invention are as follows：For the manufacture difficult point of high-aspect-ratio flexible nanometer structure, propose and be based on two kinds of flexible materials of PDMS and ultraviolet cured adhesive OrmoStamp, method by imprinting twice, the flexible manufacturing of high-aspect-ratio nanometer cilium array is realized, important technical support is provided for the manufacture of high-aspect-ratio flexible nanometer structure.
Description
Art
The present invention is to belong to integrated circuit and micro-nano electronic mechanical system manufacturing field, particularly a kind of high-aspect-ratio nanometer
The manufacture method of array of structures.
Background technology
Although silicon of high aspect ratio base nano array successfully manufactures, yet with the modulus of elasticity of silicon materials in itself very
(about 160GP) greatly, want to realize low-frequency vibration detection, it is necessary to increase the absolute growth of silicon nanometer cilium array to hundreds of microns,
And this to be current processing technology can not realize.To solve this problem, it is contemplated that suitably reducing nanometer ciliary structures
Modulus of elasticity, and then reduce nano-array height, reduce etching difficulty, realize low-frequency acoustic signal high sensitivity detection, be
This needs the manufacturing technology for studying high-aspect-ratio flexible nano array.
High-aspect-ratio flexible nanometer structure has been obtained for extensive concern in the field such as visual switch and bionic surface, soft
Property structure has the advantages that high, flexible, the inexpensive batch production of light weight, durability.But current research can't be very
The good simple making efficiently, during done with high accuracy flexibility of solution.For processing for high-aspect-ratio flexible structure, nanometer
The appearance of stamping technique provides reference for its manufacture.
The content of the invention
The purpose of the present invention is：In order to suitably reduce the modulus of elasticity of nanometer ciliary structures, etching difficulty, the present invention are reduced
Propose the Flexible Manufacturing Technology that high-aspect-ratio nanometer ciliary structures are realized by way of impressing.This method production efficiency is high,
It is easy to implement production in enormous quantities.
The technical scheme is that a kind of high-aspect-ratio flexible structure manufacture method, comprises the following steps：
Step 1：Firstly the need of the soft template for preparing high-aspect-ratio flexible nano ciliary structures.Mantle version is using PDMS as cast
Material, the main technological steps based on PDMS nano impressions are：
(a) the silicon-based nano cilium array processed is subjected to surface hydrophobic processing using passivation technology first.
(b) PDMS solvents and curing agent are well mixed, are put into vacuum drying oven and carry out pumping process at normal temperatures, thoroughly
Remove the bubble in mixture.Finally, PDMS prepolymers are poured into silicon-based nano cilium array surface to stand.
(c) after PDMS prepolymers are completely introduced into cilium array, it is pressed in above PDMS, is placed on hot plate with slide level
Processing a period of time.The height of wherein nanometer cilium determines PDMS time of repose length, and height is bigger, and time of repose is longer,
It is conversely, shorter.
(d) finally, after PDMS thoroughly solidification, it is removed from silicon-based nano cilium array mold, thus existed
Advanced wide nanometer array of circular apertures is formd on PDMS moulds.Concrete technology flow process is as shown in Figure 1.
Step 2：Replicate the template of high-aspect-ratio flexible nano cilium array.Using the PDMS imprinted as template, using purple
Outer optic-solidified adhesive OrmoStamp materials are imprinted, and have thus obtained the flexible structure as on silicon mould, main technique
Step includes：
(a) passivation technology in high density plasma etch is used to carry out at hydrophobicity surface on PDMS moulds first
Reason.
(b) OrmoStamp liquid is dripped on the PDMS moulds crossed through hydrophobic treatment on surface with syringe, observed on PDMS
Surface condition, determine the nanohole array whether OrmoStamp liquid is filled up completely with the presence of capillary attraction on PDMS.
(c) after OrmoStamp is filled up completely with the nanohole array on PDMS, a piece of slide is taken, is cleaned using acetone
Afterwards, toasted on hot plate and be cooled to room temperature, to increase the adhesiveness between OrmoStamp liquid and slide.By slide
Lie in a horizontal plane on OrmoStamp liquid, expose under ultraviolet light, so make OrmoStamp liquid thorough under action of ultraviolet light
Bottom solidifies.
(d) after it finally being toasted into a period of time on hot plate, PDMS moulds are removed, completed based on OrmoStamp's
The manufacture of high-aspect-ratio flexible nano cilium.Thus obtain and silicon mould identical flexible structure, specific technological process
As shown in Figure 3.
The beneficial effects of the invention are as follows：For the manufacture difficult point of high-aspect-ratio flexible nanometer structure, it is proposed that based on PDMS
With two kinds of flexible materials of ultraviolet cured adhesive OrmoStamp, the method by imprinting twice, high-aspect-ratio nanometer cilium battle array is realized
The flexible manufacturing of row, important technical support is provided for the manufacture of high-aspect-ratio flexible nanometer structure.
Brief description of the drawings
The schematic diagram of the Passivation Treatment of Fig. 1 silicon-based nanos cilium 1
Fig. 2 PDMS prepolymers 2 coat the schematic diagram of silicon-based nano cilium surface 1
The schematic diagram of the pressing mold of Fig. 3 PDMS prepolymers 2 shaping
The schematic diagram of Fig. 4 PDMS curing and demoldings
The schematic diagram of the Passivation Treatment on Fig. 5 PDMS surfaces 2
Fig. 6 OrmoStamp liquid 4 coats the schematic diagram on PDMS surfaces 2
The press molds of Fig. 7 OrmoStamp 4 are molded and the schematic diagram of ultraviolet light curing process
The schematic diagram that Fig. 8 OrmoStamp 4 peel off with PDMS moulds 2
Specific implementation method
A kind of making of the high-aspect-ratio flexible nano array based on above-mentioned secondary nano impression is given in the present embodiment
Method, specifically comprise the following steps：
Step 1：The mantle version of high-aspect-ratio flexible nano ciliary structures uses PDMS as mould material, fine in silicon-based nano
First time press mold shaping is carried out in the template of hair knot structure, concrete technology flow process is as follows：
(a) the silicon-based nano cilium array processed is used into the passivation technology carry out table in high density plasma etch
Face hydrophobicity processing, its concrete technology are as follows：C4F8Gas flow is 85sccm, and bottom crown power is 600W, and APC valves are
82%, after the passivation technology of 1 minute, deposit to the carbon fluorination of silicon-based nano cilium array surface and the thickness of thing is about
150nm。
(b) it is 6 according to weight ratio by PDMS solvents and curing agent (RTV615, GE Silicones):1 ratio mixing,
And thoroughly stir, and be put into vacuum drying oven and carry out pumping process at normal temperatures 20 minutes, thoroughly remove in mixture
Bubble.Finally, PDMS prepolymers are poured into silicon-based nano cilium array surface, stands 30 minutes.
(c) because PDMS prepolymers have extraordinary gas permeability, treat that PDMS prepolymers are completely introduced into a nanometer cilium array
After, it is pressed in slide level above PDMS prepolymers, and be placed on 120 DEG C of hot plate and handle 10 minutes.Wherein PDMS is quiet
The length for putting the time is mainly determined that height is bigger, and time of repose is longer, conversely, shorter by the height of nanometer cilium.
(d) after PDMS thoroughly solidification, carefully it is removed from silicon-based nano cilium array mold, on PDMS moulds
High-aspect-ratio nanometer array of circular apertures is formed, as shown in Figure 2.
Step 2：Using the PDMS imprinted as template, imprinted with ultraviolet curable agent OrmoStamp materials, so
The flexible material as on silicon mould is just obtained, main technological steps include：
(a) passivation technology in high density plasma etch is equally used to carry out surface hydrophobicity on the PDMS moulds of acquisition
Property processing, its concrete technology is as follows：C4F8Gas flow is 85sccm, and bottom crown power is 600W, and APC valves are 82%, are passed through
After the passivation technology of 1 minute, it is about 150nm to deposit to nanometer thickness of the fluorocarbon of cilium array surface.
(b) liquid is dripped to OrmoStamp on the PDMS moulds handled by surface hydrophobic using syringe, by one
After the section time, by observing the surface condition on PDMS, determine whether OrmoStamp liquid is complete in the presence of capillary attraction
Fill the nanohole array on PDMS.
(c) after OrmoStamp liquid is filled up completely with the nanohole array on PDMS, take and a piece of cleaned with acetone
Slide, toasted 2 minutes on 200 DEG C of hot plate, and be cooled to room temperature, or it is short to slide progress using oxygen plasma
Temporary processing, in order to increase the adhesiveness between OrmoStamp liquid and slide.Slide is placed horizontally in
On OrmoStamp liquid, then in the exposed under UV light 20 minutes that wavelength is 365 nanometers, such OrmoStamp liquid will
Thoroughly solidification under the action of uv light.
(d) finally, it is toasted 10 minutes on 130 DEG C of hot plate, thoroughly removes high-aspect-ratio flexible nano cilium battle array
Moisture in row, it is often more important that improve the heat endurance of material and the stability of environment.Finally, carefully by PDMS moulds
Peel off, complete the high-aspect-ratio flexible nano cilium manufacture based on OrmoStamp.
Fig. 4 is shown using the flexible high depth-to-width ratio micro-nano composite structure array that is obtained after nano impression twice and soft
Property high-aspect-ratio nanometer cilium array.Nanometer cilium array structure is entirely replicated out, and nanometer cilium array junctions
Configuration looks are intact.
Claims (1)
1. a kind of high-aspect-ratio flexible structure manufacture method, comprises the following steps：
Step 1：Firstly the need of the soft template for preparing high-aspect-ratio flexible nano ciliary structures；Mantle version is using PDMS as cast material
Material, the main technological steps based on PDMS nano impressions are：
(a) the silicon-based nano cilium array processed is used into C4F8Gas passivation technology carries out surface hydrophobic processing；
(b) PDMS solvents and curing agent are well mixed, are put into vacuum drying oven and carry out pumping process at normal temperatures, thoroughly removed
Bubble in mixture；Finally, PDMS prepolymers are poured into silicon-based nano cilium array surface to stand；
(c) after PDMS prepolymers are completely introduced into cilium array, it is pressed in slide level above PDMS, is placed on hot plate and locates
Reason；
(d) after PDMS thoroughly solidification, it is removed from silicon-based nano cilium array mold, thus the shape on PDMS moulds
Into advanced wide nanometer array of circular apertures；
Step 2：Replicate the template of high-aspect-ratio flexible nano cilium array；Using the PDMS imprinted as template, using ultraviolet light
Solidification glue OrmoStamp materials are imprinted, and have thus obtained the flexible structure as on silicon mould, main technological steps
Including：
(a) PDMS moulds are used and utilizes C4F8Gas passivation technology carries out hydrophobicity processing to surface；
(b) OrmoStamp liquid is dripped on the PDMS moulds crossed through hydrophobic treatment on surface；
(c) after OrmoStamp is filled up completely with the nanohole array on PDMS, a piece of slide is taken, after being cleaned using acetone,
Toasted on hot plate and be cooled to room temperature, to increase the adhesiveness between OrmoStamp liquid and slide；Slide level is put
Put on OrmoStamp liquid, expose under ultraviolet light, OrmoStamp liquid is thoroughly solidified under action of ultraviolet light；
(d) it is toasted on hot plate, PDMS moulds is removed, it is fine to complete the high-aspect-ratio flexible nano based on OrmoStamp
The manufacture of hair；Thus obtain and silicon mould identical flexible structure.
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| CN108535967A (en) * | 2018-03-26 | 2018-09-14 | 太原理工大学 | A kind of preparation method of polymer nanocomposite column array |
| CN114147892A (en) * | 2021-10-28 | 2022-03-08 | 吉林大学 | Preparation method of bionic high-length-diameter ratio cilium |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103197362B (en) * | 2013-03-01 | 2014-12-24 | 西安交通大学 | Electric field induction rheology forming method of paraboloid-like microlens array |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103197362B (en) * | 2013-03-01 | 2014-12-24 | 西安交通大学 | Electric field induction rheology forming method of paraboloid-like microlens array |
Non-Patent Citations (2)
| Title |
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| 《Biomimetic soft lithography on curved nanostructured surfaces》;V. Auzelyte et al.;《Microelectronic Engineering》;20120330;第97卷;269–271 * |
| 《Cells lying on a bed of microneedles: An approach to isolate mechanical force》;John L. Tan et al.;《Proceedings of the National Academy of Sciences•March 2003》;20030218;1484–1489 * |
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