CN1050007C - Layout method of integrated circuit - Google Patents

Layout method of integrated circuit Download PDF

Info

Publication number
CN1050007C
CN1050007C CN95103182A CN95103182A CN1050007C CN 1050007 C CN1050007 C CN 1050007C CN 95103182 A CN95103182 A CN 95103182A CN 95103182 A CN95103182 A CN 95103182A CN 1050007 C CN1050007 C CN 1050007C
Authority
CN
China
Prior art keywords
integrated circuit
gate
layout method
input
layout
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN95103182A
Other languages
Chinese (zh)
Other versions
CN1132938A (en
Inventor
曾信闵
王国会
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Holtek Semiconductor Inc
Original Assignee
Holtek Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Holtek Semiconductor Inc filed Critical Holtek Semiconductor Inc
Priority to CN95103182A priority Critical patent/CN1050007C/en
Publication of CN1132938A publication Critical patent/CN1132938A/en
Application granted granted Critical
Publication of CN1050007C publication Critical patent/CN1050007C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

The present invention relates to a layout method of an integrated circuit, wherein the output of a logic gate in a first direction is used as the layout of a circuit mode of the input of a logic gate. An integrated circuit comprises a plurality of logic gate structures in the first direction and a plurality of logic gate structures in a second direction. A plurality of polycrystal areas are arranged above each logic gate structure. The present invention comprises the following steps: P+ transplanted and n+ buried layers are made in the polycrystal areas above logic gate structures in the first direction and the second direction to form input ends of logic gates in the first and the second directions according to the required number of the input ends in the first direction and the second direction. The present invention makes the layout of the integrated circuit have extensibility.

Description

The layout method of integrated circuit
The present invention relates to a kind of layout method, relate in particular to layout (layout) method of a kind of integrated circuit (IC).
See also Fig. 1, NOT-AND gate (NANDgate) Y1 of Y direction that Fig. 1 has comprised a plurality of (is example with 4) ..., Y4, and the NAND door X1 of a plurality of directions Xs ..., X4, and Y1 ..., Y4 output YO1 ..., YO4 can be used as directions X NAND door X1 ..., X4 input, and Y direction NAND door Y1 ..., Y4 can have the input of different numbers, this sentences Y1 and has 2 (YI1, YI2), Y2 has 2 (YI1, YI2), Y3 has 3 (YI1, YI2, YI3), and Y4 has 4 inputs (YI1, YI2, YI3, YI4) and is example; X1 ..., also can the have nothing in common with each other input of number of X4, this sentences X1 and has 2 (YO1, YO2), X2 has 2 (YO1, YO2), X3 has 3 (YO1, YO2, YO3), X4 has 4 inputs (YO1, YO2, YO3, YO4) and is example; With the output of Y direction gate as in the most normal circuit that is applied to encoder (encoder) and decoder (decoder) of the logical construction of directions X gate input.
With each 4 NAND door of Fig. 1 X, Y direction is that example illustrates usually the layout method to Fig. 1 logic gates: common layout method is to get 2 unit (cell) with 2 inputs (Fig. 2 a), unit (Fig. 2 b) with 3 inputs, unit (Fig. 2 c) with 4 inputs, as Y1 ..., Y4; Directions X is as the same, those unit is coupled together thereafter again.
By above description as can be known, common layout method is to get a plurality of unit those unit to be coupled together again.Common layout method has following shortcoming, after the layout of entire I C has been finished, if want to change Y1 ..., Y4, X1 ..., any one input number among the X4, unit taking-up that then must be original is changed another unit again and is entered, for example, desire changes the Y1 of original 2 inputs into 4 inputs, then the unit shown in Fig. 2 a must be taken out, and replaces with the unit shown in Fig. 2 c again; But the layout of entire I C is finished, if change the unit again, must destroy the layout of entire I C, for example increase to 4 inputs by 2 inputs, can't find on the IC circuit that layout is finished probably can be for the arrangement space that holds 4 inputs, or must change the original layout of entire I C, just can increase the input number of gate again.That is to say that common layout method lacks flexibility and extendibility.
Main purpose of the present invention is to provide a kind of layout method of integrated circuit, makes layout have elasticity and extendibility.
The present invention is a kind of layout method of integrated circuit, this method is used for the layout of first direction gate output as the circuit-mode of second direction gate input, this integrated circuit comprises that a plurality of first direction gate structures are connected in a plurality of second direction gate structures, and each gate superstructure has a plurality of polycrystalline zone; This method comprises: according to the required input number of first and second direction gate, be p in the polycrystalline zone of first and second direction gate superstructure +Inject and n +Buried regions forms the input of first and second direction gate.
The first direction gate is connected with the polycrystal layer of its metal level with the second direction gate; Here, first direction is meant the Y direction, and second direction is meant directions X; X, Y direction gate structure is formed with PMOS and NMOS.
Wherein, p is in the polycrystalline zone of PMOS in zone that can become input of each polycrystalline domain representation of gate top +Inject, represent that this polycrystalline zone is an effective input, is n in the polycrystalline zone of NMOS +Buried regions represents that this polycrystalline zone is an invalid input.The PMOS of each gate is identical with effective input number of NMOS.This gate can be the NAND door.
Following accompanying drawing of mat and detailed description can be understood the present invention in depth.
Fig. 1 is the logical circuit schematic diagram that is used to decipher coding.
Fig. 2 is that several of common IC layout have the schematic diagram of the unit of different number inputs.
Fig. 3 is the schematic diagram of the IC layout preferred embodiment that obtains of layout method of the present invention.
See also Fig. 3, it is the layout of the inventive method, be the structure of NAND door below metal level, and each NAND door is made up of PMOS and NMOS, and aspect PMOS, if wish to get an input, then p is in the polycrystalline zone above metal level +Inject, and aspect NMOS, be n in the polycrystalline zone for non-input +Buried regions, all the other are not n +The polycrystalline zone of buried regions is input, and wherein, the input number of the PMOS of each NAND door must be identical with the input number of NMOS.
In the Y direction, be benchmark with the maximum fan-in that gate was had of fan-in, the polycrystalline number of regions that decides each gate to have, in the present embodiment, the fan-in of Y4 is maximum, has 4, so each gate all has 4 polycrystalline zones that can become input for you to choose; Directions X is as the same.
With the logical circuit of Fig. 1, Y1 has 4 polycrystalline zones that can become input, but only uses 2 input Y11, Y12 herein, so p is in the 1st, 2 polycrystalline zone above the PMOS metal level of NAND door Y1 +Inject, obtain input YI1, YI2, and aspect NMOS, then be n in the 3rd, 4 the polycrystalline zone right by a left side +Buried regions lost efficacy the 3rd, 4 input of NMOS, and staying Y11, Y12 is input; In like manner, p is in the YI1 above the PMOS metal level of NAND door Y2, YI2 polycrystalline zone +Inject, be n in YI3, the YI4 zone of NMOS +Buried regions lost efficacy YI3, YI4, stayed 2 inputs of YI1, YI2; YI1, YI2, YI3 at PMOS are p +Inject, be n at the YI4 of NMOS +Buried regions, 3 inputs of formation NAND door Y3; YI1-YI4 at PMOS is p +Inject, then be not n at the YI1-YI4 of NMOS +Buried regions obtains 4 inputs of Y4.At directions X, X1 has YO1 and 2 inputs of YO2, so be n in the NMOS of X1 part for the polycrystalline zone that connects YO3, YO4 +Buried regions makes YO3, YO4 invalid, and in the PMOS of X1 part, is p for the polycrystalline zone that connects YO1, YO2 +Inject, make YO1, YO2 become effective input of X1; In like manner, X2 has YO1 and 2 inputs of YO2, so be n in the NMOS of X2 part for the polycrystalline zone that connects YO3, YO4 +Buried regions makes YO3, YO4 invalid, and is p in the PMOS of X2 part for the polycrystalline zone that connects YO1, YO2 +Inject, make YO1, YO2 become effective input of X2; X3 has YO1, YO2 and 3 inputs of YO3, so be n in the NMOS of X3 part for the polycrystalline zone that connects YO4 +Buried regions makes YO4 invalid, and is p in the PMOS of X3 part for the polycrystalline zone that connects YO1, YO2, YO3 +Inject, make YO1, YO2, YO3 become effective input of X3; X4 has YO1 is arranged, YO2, YO3,4 inputs of YO4, so be not n in the polycrystalline zone of the NMOS of X4 part +Buried regions, and be p for the polycrystalline zone that connects YO1, YO2, YO3, YO4 in the PMOS of X4 part +Inject, make YO1, YO2, YO3, YO4 become effective input of X4.
By the above embodiments as can be known, integrated circuit layout method provided by the invention is a kind of method with systematicness and extendibility, with regard to above-mentioned example, supposes after the layout of entire I C is finished, if desire to make Y1, Y2, Y3, Y4, X1, X2, X3, X4 increase or reduce input again, then only need to insert/remove p at original polycrystalline +Inject or n +Buried regions gets final product, do not influence the whole IC circuit distributing position of having finished layout fully, the expandability that has fully shown the IC layout, and, the layout of overall logic is an overall zone, rather than the irregular area as getting up with the unit pocket usually, so in the application of spatial area, also can come efficiently than common layout type.
Though those skilled in the art that scholar can do various modifications to above-mentioned specific practice with the principle that the present invention discloses, they are all among the scope of appended claims desire protection.

Claims (9)

1. the layout method of an integrated circuit, this method is used for the layout of first direction gate output as the circuit-mode of second direction gate input, it is characterized in that, described integrated circuit comprises that a plurality of first direction gate structures are connected in a plurality of second direction gate structures, and each described gate superstructure has a plurality of polycrystalline zone; Described layout method comprises:
According to the required input number of described first and second direction gate, be p in the polycrystalline zone of described first and second direction gate superstructure +Inject and n +Buried regions forms the input of described first and second direction gate.
2. the layout method of integrated circuit as claimed in claim 1 is characterized in that, described first direction gate is connected with the polycrystal layer of its metal level with described second direction gate.
3. the layout method of integrated circuit as claimed in claim 1 is characterized in that, described first direction is meant the Y direction, and described second direction is meant directions X.
4. the layout method of integrated circuit as claimed in claim 3 is characterized in that, described X, and Y direction gate structure is formed with PMOS and NMOS.
5. the layout method of integrated circuit as claimed in claim 4 is characterized in that, each zone that can become input of described polycrystalline domain representation of described gate top.
6. the layout method of integrated circuit as claimed in claim 5 is characterized in that, is p in the polycrystalline zone of described PMOS +Inject, represent that described polycrystalline zone is an effective input.
7. the layout method of integrated circuit as claimed in claim 6 is characterized in that, is n in the polycrystalline zone of described NMOS +Buried regions represents that described polycrystalline zone is an invalid input.
8. the layout method of integrated circuit as claimed in claim 7 is characterized in that, the described PMOS of described each gate is identical with effective input number of NMOS.
9. the layout method of integrated circuit as claimed in claim 1 is characterized in that, described gate is the NAND door.
CN95103182A 1995-04-05 1995-04-05 Layout method of integrated circuit Expired - Fee Related CN1050007C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN95103182A CN1050007C (en) 1995-04-05 1995-04-05 Layout method of integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN95103182A CN1050007C (en) 1995-04-05 1995-04-05 Layout method of integrated circuit

Publications (2)

Publication Number Publication Date
CN1132938A CN1132938A (en) 1996-10-09
CN1050007C true CN1050007C (en) 2000-03-01

Family

ID=5074634

Family Applications (1)

Application Number Title Priority Date Filing Date
CN95103182A Expired - Fee Related CN1050007C (en) 1995-04-05 1995-04-05 Layout method of integrated circuit

Country Status (1)

Country Link
CN (1) CN1050007C (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9098668B2 (en) * 2013-11-27 2015-08-04 Taiwan Semiconductor Manufacturing Company, Ltd. Layout of an integrated circuit

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833425A (en) * 1988-03-25 1989-05-23 International Business Machines Corporation Analog macro embedded in a digital gate array

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833425A (en) * 1988-03-25 1989-05-23 International Business Machines Corporation Analog macro embedded in a digital gate array

Also Published As

Publication number Publication date
CN1132938A (en) 1996-10-09

Similar Documents

Publication Publication Date Title
EP0997948A3 (en) Semiconductor memory device
JPS6124250A (en) Semiconductor integrated circuit device
JP2008546168A (en) Integrated circuit having a signal bus formed by cell neighbors of logic cells
US6675361B1 (en) Method of constructing an integrated circuit comprising an embedded macro
CN1050007C (en) Layout method of integrated circuit
US5229629A (en) Semiconductor integrated circuit having improved cell layout
EP1187191A3 (en) SOI substrate with semiconductor circuit therein and method of manufacturing same
TW377494B (en) Semiconductor integrated circuit and the manufacturing method for adjacent regions with different interconnecting layers
US20030034571A1 (en) Semiconductor memory device
US6362497B1 (en) Semiconductor integrated circuit having ESD/EOS protection
JP3057975B2 (en) Integrated circuit wiring
US5063430A (en) Semiconductor integrated circuit device having standard cells including internal wiring region
US4218747A (en) Arithmetic and logic unit using basic cells
US5543651A (en) Semiconductor integrated circuit device
US6720636B2 (en) Semiconductor device with a staggered pad arrangement
US4880754A (en) Method for providing engineering changes to LSI PLAs
JPH10189743A (en) Semiconductor integrated circuit and its wiring layout method
US5741730A (en) Flexible IC layout method
JPS63108746A (en) Programmable logic array
JPH023279A (en) Standard cell of complementary mis master slice lsi
JP4494537B2 (en) Wiring design method for standard cell type semiconductor integrated circuit
JPH0513732A (en) Composite type semiconductor integrated circuit device
JPH08213577A (en) Semiconductor integrated circuit device
JPH02130831A (en) Semiconductor integrated circuit
JP2671883B2 (en) Semiconductor integrated circuit device

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C06 Publication
PB01 Publication
C53 Correction of patent for invention or patent application
COR Change of bibliographic data

Free format text: CORRECT: APPLICANT; FROM: HETAI SEMICONDUCTOR CO., LTD. TO: SHENGQUN SEMICONDUCTOR CO., LTD.

CP03 Change of name, title or address

Address after: No. 5, No. two, research road, Hsinchu Science Industrial Park, Taiwan

Applicant after: Shengqun Semiconductor Co., Ltd.

Address before: No. 3, No. two, research road, Hsinchu Science Industrial Park, Taiwan

Applicant before: Hetai Semiconductor Co., Ltd.

C14 Grant of patent or utility model
GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee