CN104932211A - Aluminum film water system photoresistance stripping liquid in liquid crystal panel manufacture technology and preparation method thereof - Google Patents
Aluminum film water system photoresistance stripping liquid in liquid crystal panel manufacture technology and preparation method thereof Download PDFInfo
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Abstract
The invention discloses aluminum film water system photoresistance stripping liquid in a liquid crystal panel manufacture technology and a preparation method thereof. The aluminum film water system photoresistance stripping liquid comprises the following compositions in percentage by weight: 11-16% of N-methylpyrrolidone, 20-25% ofisopropylamide, 0.2-2.5% of dimethoxy phenethylamine, 12-17% of N-butyl vinyl ether, 5-9% of isopropyl dipropyl sulfide, 7-13% of ethylene glycol monoisopropyl ether and the balance of water. The aluminum film water system photoresistance stripping liquid and the preparation method of the aluminum film water system photoresistance stripping liquid can improve the photoresistance stripping performance of a liquid crystal panel product, lowers technological condition temperature and avoids damage on human bodies and the environment by positive photoresist stripping liquid which is originally used.
Description
Technical field
The present invention relates to aluminium film water system photoresistance stripper in a kind of liquid crystal panel manufacturing process and preparation method thereof.
Background technology
At present, the positive glue stripper of low temperature water system, transparent effumability liquid, inflammable, density (25 DEG C) is about 1.0g/ml.Aluminium film water system photoresistance stripper is mainly used in the photoresistance stripping that FPD (Flat Panel Display, flat-panel monitor) panel is produced, and its operation temperature is about 80 DEG C; Positive glue stripper is primarily of monoethanolamine (MEA), dimethyl sulfoxide (DMSO) (DMSO) and ultrapure water composition at present, and this product mainly exists some shortcoming following:
1) carry out easily producing the metal level of photoresistance protection when photoresistance is peeled off attacking with the positive glue stripper of this low temperature water system, cause product yield to reduce;
2) the operation temperature requirement of this low temperature water system positive glue stripper is higher, need be heated to about 80 DEG C, energy consumption
Larger;
3) monoethanolamine (MEA) and dimethyl sulfoxide (DMSO) (DMSO) big for environment pollution and have comparatively major injury to health.
Therefore aluminium film water system photoresistance stripper that a kind of improvement is provided and preparation method thereof is necessary, improve the photoresistance stripping performance in liquid crystal panel manufacturing process, reduce process conditions temperature, and the infringement that human body and environment are caused that the positive glue stripper avoiding original use causes.
Summary of the invention
The defect that the present invention seeks to exist for prior art provides aluminium film water system photoresistance stripper in a kind of liquid crystal panel manufacturing process and preparation method thereof.
The present invention for achieving the above object, adopts following technical scheme: the aluminium film water system photoresistance stripper in a kind of liquid crystal panel manufacturing process, comprises the composition of following percentage by weight:
All the other are water.
Further, the concentration of described 1-METHYLPYRROLIDONE is 98% (percentage by weight); The concentration of described Isopropamide is 75% (percentage by weight); The concentration of described dimethoxy-phenylethylamine is 99.5% (percentage by weight); The concentration of the rare base n-butyl ether of described second is 85% (percentage by weight); The concentration of described isopropyl Dipropyl sulfide is 99.5% (percentage by weight); The concentration of described ethylene glycol monoisopropyl ether is 89.5% (percentage by weight).
In liquid crystal panel manufacturing process, a preparation method for aluminium film water system photoresistance stripper, comprises the steps:
First the 1-METHYLPYRROLIDONE of predetermined quality and water are joined in reactor by automatical feeding system, and fully stir under normal temperature, normal pressure, mixing time is: 15 ~ 25 minutes, and the speed of stirring is 65-85 rev/min;
Then continue through automatical feeding system and add Isopropamide in proper order, dimethoxy-phenylethylamine, the rare base n-butyl ether of second, isopropyl Dipropyl sulfide, ethylene glycol monoisopropyl ether and water, the weight percentage of 1-METHYLPYRROLIDONE is made to be 11% ~ 16%, the weight percentage of Isopropamide is 20% ~ 25%, the weight percentage of dimethoxy-phenylethylamine is 0.2% ~ 2.5%, the weight percentage of the rare base n-butyl ether of second is 12% ~ 17%, the weight percentage 5% ~ 9% of isopropyl Dipropyl sulfide, material loading is stopped when the weight percentage of ethylene glycol monoisopropyl ether is 7% ~ 13%, again stir 15 ~ 25 minutes, the speed stirred is 70-90 rev/min,
Finally start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 2 ~ 4 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, obtain aluminium film water system photoresistance stripper.
Beneficial effect of the present invention: aluminium film water system provided by the invention photoresistance stripper and preparation method thereof, the photoresistance stripping performance of liquid crystal panel product can be improved, reduce process conditions temperature, and the infringement that human body and environment are caused that the positive glue stripper avoiding original use causes.
Embodiment
The invention is further illustrated by the following examples, but be not limited to lifted embodiment.
The present invention relates to the aluminium film water system photoresistance stripper in a kind of liquid crystal panel manufacturing process, comprise the composition of following percentage by weight:
All the other are water.
Wherein, select concentration to be the 1-METHYLPYRROLIDONE of 98% (percentage by weight), concentration is the Isopropamide of 75% (percentage by weight), and concentration is the dimethoxy-phenylethylamine of 99.5% (percentage by weight); Concentration is the rare base n-butyl ether of second of 85% (percentage by weight), and concentration is the isopropyl Dipropyl sulfide of 99.5% (percentage by weight), and concentration is the ethylene glycol monoisopropyl ether of 89.5% (percentage by weight).
Embodiment 1, take 1-METHYLPYRROLIDONE 11kg, under agitation joined by automatic charging machine in the reactor that 5kg water is housed, fully stir under normal temperature, normal pressure, mixing time is: 15 minutes, and the speed of stirring is 65 revs/min; Add Isopropamide 20kg in proper order, dimethoxy-phenylethylamine 0.2kg, second rare base n-butyl ether 12kg, isopropyl Dipropyl sulfide 5kg, ethylene glycol monoisopropyl ether 7kg, then adds water to 100kg, and again stir after 15 minutes, the speed of stirring is 70 revs/min; Start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 2 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, i.e. obtained aluminium film water system photoresistance stripper.
Embodiment 2, take 1-METHYLPYRROLIDONE 12kg, under agitation joined by automatic charging machine in the reactor that 8kg water is housed, fully stir under normal temperature, normal pressure, mixing time is: 18 minutes, and the speed of stirring is 65 revs/min; Add Isopropamide 21kg in proper order, dimethoxy-phenylethylamine 0.5kg, second rare base n-butyl ether 13kg, isopropyl Dipropyl sulfide 6kg, ethylene glycol monoisopropyl ether 8kg, then adds water to 100kg, and again stir after 18 minutes, the speed of stirring is 70 revs/min; Start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 2 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, i.e. obtained aluminium film water system photoresistance stripper.
Embodiment 3, take 1-METHYLPYRROLIDONE 13kg, under agitation joined by automatic charging machine in the reactor that 10kg water is housed, fully stir under normal temperature, normal pressure, mixing time is: 20 minutes, and the speed of stirring is 70 revs/min; Add Isopropamide 22kg in proper order, dimethoxy-phenylethylamine 0.8kg, second rare base n-butyl ether 14kg, isopropyl Dipropyl sulfide 7kg, ethylene glycol monoisopropyl ether 10kg, then adds water to 100kg, and again stir after 20 minutes, the speed of stirring is 75 revs/min; Start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 3 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, i.e. obtained aluminium film water system photoresistance stripper.
Embodiment 4, take 1-METHYLPYRROLIDONE 14kg, under agitation joined by automatic charging machine in the reactor that 12kg water is housed, fully stir under normal temperature, normal pressure, mixing time is: 20 minutes, and the speed of stirring is 75 revs/min; Add Isopropamide 22kg in proper order, dimethoxy-phenylethylamine 1.6kg, second rare base n-butyl ether 15kg, isopropyl Dipropyl sulfide 7kg, ethylene glycol monoisopropyl ether 11kg, then adds water to 100kg, and again stir after 20 minutes, the speed of stirring is 80 revs/min; Start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 3 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, obtain aluminium film water system photoresistance stripper.
Embodiment 5, take 1-METHYLPYRROLIDONE 15kg, under agitation joined by automatic charging machine in the reactor that 15kg water is housed, fully stir under normal temperature, normal pressure, mixing time is: 25 minutes, and the speed of stirring is 70 revs/min; Add Isopropamide 23kg in proper order, dimethoxy-phenylethylamine 2.0kg, second rare base n-butyl ether 15kg, isopropyl Dipropyl sulfide 8kg, ethylene glycol monoisopropyl ether 12kg, then adds water to 100kg, and again stir after 25 minutes, the speed of stirring is 80 revs/min; Start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 4 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, obtain aluminium film water system photoresistance stripper.
Embodiment 6, take 1-METHYLPYRROLIDONE 16kg, under agitation joined by automatic charging machine in the reactor that 15kg water is housed, fully stir under normal temperature, normal pressure, mixing time is: 25 minutes, and the speed of stirring is 85 revs/min; Add Isopropamide 25kg in proper order, dimethoxy-phenylethylamine 2.5kg, second rare base n-butyl ether 17kg, isopropyl Dipropyl sulfide 9kg, ethylene glycol monoisopropyl ether 13kg, then adds water to 100kg, and again stir after 25 minutes, the speed of stirring is 90 revs/min; Start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 4 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, obtain aluminium film water system photoresistance stripper.
In sum, aluminium film water system provided by the invention photoresistance stripper and preparation method thereof, under not changing the prerequisite of client's result of use, by the change of formula, improve the photoresistance stripping performance of product, reduce process conditions temperature, and the infringement that human body and environment are caused that the positive glue stripper avoiding original use causes, this method can be applicable to large-scale production.Concrete advantage is as follows: 1) aluminium film water system of the present invention photoresistance stripper can not attack metal level when carrying out photoresistance and peeling off; 2) low temperature type aqueous positive glue stripper technological temperature condition of the present invention is 60 DEG C, and lower than original technological temperature 80 DEG C, energy consumption reduces; 3) component in aluminium film water system of the present invention photoresistance stripper to human health damage and environmental pollution little; 4) adopt microemulsion technology: adopt micro-emulsion technology, add special additive, product defines isotropy and good dispersiveness after emulsification, makes product in use effectively can remove photoresistance.Adopt new formula as substituted monoethanolamine with Isopropamide, dimethoxy-phenylethylamine replaces dimethyl sulfoxide (DMSO), makes this product reach low toxicity, environmental protection, eco-friendly object simultaneously.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (3)
1. the aluminium film water system photoresistance stripper in liquid crystal panel manufacturing process, is characterized in that, comprise the composition of following percentage by weight:
2. the aluminium film water system photoresistance stripper in liquid crystal panel manufacturing process as claimed in claim 1, it is characterized in that, the concentration of described 1-METHYLPYRROLIDONE is 98% (percentage by weight); The concentration of described Isopropamide is 75% (percentage by weight); The concentration of described dimethoxy-phenylethylamine is 99.5% (percentage by weight); The concentration of the rare base n-butyl ether of described second is 85% (percentage by weight); The concentration of described isopropyl Dipropyl sulfide is 99.5% (percentage by weight); The concentration of described ethylene glycol monoisopropyl ether is 89.5% (percentage by weight).
3. a preparation method for the aluminium film water system photoresistance stripper in liquid crystal panel manufacturing process as claimed in claim 1 or 2, is characterized in that, comprise the steps:
First the 1-METHYLPYRROLIDONE of predetermined quality and water are joined in reactor by automatical feeding system, and fully stir under normal temperature, normal pressure, mixing time is: 15 ~ 25 minutes, and the speed of stirring is 65-85 rev/min;
Then continue through automatical feeding system and add Isopropamide in proper order, dimethoxy-phenylethylamine, the rare base n-butyl ether of second, isopropyl Dipropyl sulfide, ethylene glycol monoisopropyl ether and water, the weight percentage of 1-METHYLPYRROLIDONE is made to be 11% ~ 16%, the weight percentage of Isopropamide is 20% ~ 25%, the weight percentage of dimethoxy-phenylethylamine is 0.2% ~ 2.5%, the weight percentage of the rare base n-butyl ether of second is 12% ~ 17%, the weight percentage 5% ~ 9% of isopropyl Dipropyl sulfide, material loading is stopped when the weight percentage of ethylene glycol monoisopropyl ether is 7% ~ 13%, again stir 15 ~ 25 minutes, the speed stirred is 70-90 rev/min,
Finally start membrane pump, by obtained potpourri first through 0.3um filtrator circulating filtration 2 ~ 4 hours, then through the metre filter of 0.15 μm, to remove the unwanted particles that particle diameter in potpourri is greater than 0.15 μm, obtain aluminium film water system photoresistance stripper.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105388713A (en) * | 2015-12-16 | 2016-03-09 | 无锡吉进环保科技有限公司 | Aluminum film drainage photoresist stripper in thin-film liquid crystal display |
| CN105573070A (en) * | 2015-12-16 | 2016-05-11 | 无锡吉进环保科技有限公司 | Preparation method of aluminum film water-based light-resistant stripping liquid in thin film liquid crystal display |
| CN107885049A (en) * | 2017-11-24 | 2018-04-06 | 无锡南理工新能源电动车科技发展有限公司 | A kind of preparation method of copper film stripper in liquid crystal display |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101799639A (en) * | 2010-04-01 | 2010-08-11 | 江阴市江化微电子材料有限公司 | Low temperature type aqueous stripper for positive photoresist |
| CN102566333A (en) * | 2011-12-30 | 2012-07-11 | 江阴江化微电子材料股份有限公司 | Low-temperature aqueous positive-photoresist stripping solution and preparation method thereof |
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2015
- 2015-06-02 CN CN201510296596.9A patent/CN104932211A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101799639A (en) * | 2010-04-01 | 2010-08-11 | 江阴市江化微电子材料有限公司 | Low temperature type aqueous stripper for positive photoresist |
| CN102566333A (en) * | 2011-12-30 | 2012-07-11 | 江阴江化微电子材料股份有限公司 | Low-temperature aqueous positive-photoresist stripping solution and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105388713A (en) * | 2015-12-16 | 2016-03-09 | 无锡吉进环保科技有限公司 | Aluminum film drainage photoresist stripper in thin-film liquid crystal display |
| CN105573070A (en) * | 2015-12-16 | 2016-05-11 | 无锡吉进环保科技有限公司 | Preparation method of aluminum film water-based light-resistant stripping liquid in thin film liquid crystal display |
| CN107885049A (en) * | 2017-11-24 | 2018-04-06 | 无锡南理工新能源电动车科技发展有限公司 | A kind of preparation method of copper film stripper in liquid crystal display |
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Application publication date: 20150923 |