CN104931546A - Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode - Google Patents

Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode Download PDF

Info

Publication number
CN104931546A
CN104931546A CN201510329286.2A CN201510329286A CN104931546A CN 104931546 A CN104931546 A CN 104931546A CN 201510329286 A CN201510329286 A CN 201510329286A CN 104931546 A CN104931546 A CN 104931546A
Authority
CN
China
Prior art keywords
humidity
electrode
top electrode
sensitive element
upper electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510329286.2A
Other languages
Chinese (zh)
Inventor
周文和
王良璧
李耀亮
许凤
李建霞
王良成
何炫
成红娟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lanzhou Jiaotong University
Original Assignee
Lanzhou Jiaotong University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lanzhou Jiaotong University filed Critical Lanzhou Jiaotong University
Priority to CN201510329286.2A priority Critical patent/CN104931546A/en
Publication of CN104931546A publication Critical patent/CN104931546A/en
Pending legal-status Critical Current

Links

Abstract

The invention discloses a rapid responding miniature capacitance type humidity-sensitive element with a porous upper electrode and a parallel board electrode. The porous upper electrode, a PI humidity sensing film, the board lower electrode, an SiO2 insulation layer and an Si substrate are arranged from top to bottom, wherein the upper electrode is provided with a plurality of upper electrode pores formed neatly, and a lower electrode lead hole is formed in the PI humidity sensing film. During manufacturing, a wafer is cleaned first, the wafer is oxidized to form the insulation layer, vapor deposition is carried out on the lower electrode, the lower electrode is coated with polyimide acid and subjected to imidization, vapor deposition is carried out on the upper electrode, porous patterns of the upper electrode are etched through phosphoric acid, the phosphoric acid is used to etch the electrode, plasma is used to etch the humidity sensing film to form wafer sliding channels, the plasma is used to etch the humidity sensing film to form the lower electrode lead hole, and slicing, argon welding and packaging are carried out finally. The rapid responding miniature capacitance type humidity-sensitive element with the porous upper electrode and the parallel board electrode has the advantages that the responding time of the humidity-sensitive element with the porous upper electrode can be improved to the largest extent compared with a grid-shaped upper electrode under the same condition.

Description

A kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element
Technical field
The invention belongs to moisture measurement and control technology field, relate to a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element.
Background technology
Moisture measurement and control closely correlate to social life, industrial and agricultural production etc.Some field, as respiratory disease diagnosis and treatment, fuel cell car etc., not only needs humidity-sensitive element to have the static characteristicss such as accurate, reliable, also requires that humidity-sensitive element can the transient changing of response measurement ambient humidity fast.The static characteristics of existing humidity-sensitive element is relatively better, but the dynamic perfromance of its marketable product unsatisfactory (usual tens seconds).
Now widely used palisade top electrode parallel plate capacitor formula humidity-sensitive element is many based on Si substrate and polyimide humidity-sensitive film (PI), polyimide (PI) macromolecule humidity-sensitive film is porous medium, can adsorbed gas, and specific inductive capacity is less, and the specific inductive capacity of aqueous vapor molecule is larger, when after aqueous vapor molecule in humidity-sensitive film absorption soft air, humidity-sensitive film DIELECTRIC CONSTANT ε sremarkable linear change, and correspond to the different concentration of humidity-sensitive film absorption aqueous vapor molecule.When ambient humidity becomes large suddenly, due to the reason of aqueous vapor molecular conecentration difference in environment and humidity-sensitive film, in environmental gas, aqueous vapor molecule enters humidity-sensitive film surface from the grid backlash of palisade top electrode, then the humidity-sensitive film region that top electrode grid tooth covers longitudinally is diffused to downwards with horizontal left and right, spread faster, the humidity-sensitive element response time is shorter.Can find out, under the same terms, palisade top electrode grid tooth narrower (overlay area is narrower) and humidity-sensitive film thinner, water vapor diffusion distance is shorter, then water vapor diffusion is faster, and the humidity-sensitive element response time is shorter; Vice versa.
In order to strengthen structure and the even charge distribution of palisade top electrode, palisade top electrode must arrange current-sharing bar, and current-sharing bar width is much larger than palisade top electrode grid facewidth degree, and area accounts for palisade top electrode total area 30%-40%.The existence of current-sharing bar adds the distance of water vapor diffusion, makes the effect improving humidity-sensitive element dynamic response time by pursuing too small palisade top electrode grid facewidth degree can not be obvious.So, the existence of palisade top electrode current-sharing bar constrains the further improvement of humidity-sensitive element dynamic response time.
Summary of the invention
The object of the present invention is to provide a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element, without the need to current-sharing bar, solve existing palisade top electrode parallel plate capacitor formula humidity-sensitive element must arrange account for top electrode total area significant proportion, wider top electrode current-sharing bar causes water vapor diffusion path long, making to improve the effect of humidity-sensitive element response time by reducing palisade top electrode grid tooth width method can not obvious problem.
The technical solution adopted in the present invention is respectively poroid top electrode, PI humidity-sensitive film, dull and stereotyped bottom electrode, SiO from top to bottom 2insulation course and Si substrate, wherein, top electrode is provided with the top electrode hole of some marshallings, and PI humidity-sensitive film is provided with 2 bottom electrode fairleads.
Further, silicon chip is selected in described Si substrate, and described top electrode and bottom electrode are Mo-Al electrode.
Further, the aperture in described top electrode hole is 2 μm, and top electrode Kong Jian center minimum spacing is 4 μm.
Further, PI humidity-sensitive film is applied through sol evenning machine silicon chip by the acid of pre-configured polyimide, then is formed through imidization, and its thickness is 0.54 μm.
The manufacture craft of a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element, first cleaning silicon chip, silicon chip forms insulation course, evaporation bottom electrode, the acid of bottom electrode coating polyimide, imidization, evaporation top electrode, the poroid figure phosphoric acid etching of top electrode, use phosphoric acid etching electrode, plasma etching humidity-sensitive film formation dicing lane, plasma etching PI humidity-sensitive film forms bottom electrode fairlead, finally section, argon welding, encapsulation.
The invention has the beneficial effects as follows and adopt poroid top electrode to substitute existing humidity-sensitive element palisade top electrode, without the need to upper electrode arrangement strengthening and the current-sharing bar of even charge distribution effect, make the diffusion path approximately equal of the aqueous vapor molecule being entered humidity-sensitive film by each hole of top electrode, and can reduce with the minimizing of pitch of holes, under the same terms, poroid top electrode humidity-sensitive element is compared with palisade top electrode humidity-sensitive element, and the response time can farthest be improved.
Accompanying drawing explanation
Fig. 1 poroid top electrode parallel plate capacitor formula humidity-sensitive element planimetric map;
Fig. 2 poroid top electrode parallel plate capacitor formula humidity-sensitive element structural representation;
Fig. 3 poroid top electrode parallel plate capacitor formula humidity-sensitive element fabrication processing figure;
Fig. 4 poroid top electrode parallel plate capacitor formula humidity-sensitive element top electrode pitch-row schematic diagram;
The poroid top electrode of Fig. 5 and palisade top electrode humidity-sensitive element dynamic perfromance comparison diagram.
Embodiment
Below in conjunction with embodiment, the present invention is described in detail.
The present invention's poroid top electrode parallel plate capacitor formula humidity-sensitive element as depicted in figs. 1 and 2, is respectively poroid top electrode 2, PI humidity-sensitive film 4, dull and stereotyped bottom electrode 6, SiO from top to bottom 2insulation course 7 and Si substrate 8, Si substrate 8 can select silicon chip, top electrode 2 and bottom electrode 6 are Mo-Al electrode, wherein, poroid top electrode 2 is provided with the top electrode hole 3 of some marshallings, and the aperture in top electrode hole 3 is preferably 2 μm, and 3, top electrode hole center minimum spacing is preferably 4 μm, by the bottom electrode fairlead 5 that etching PI humidity-sensitive film 4 is formed, go between for argon welding bottom electrode.In the present invention, PI humidity-sensitive film 4 is applied through sol evenning machine silicon chip by the acid of pre-configured polyimide, then is formed through imidization, and its thickness obtains by controlling polyimide acid concentration, coating consumption and sol evenning machine rotations per minute, and preferred thickness is 0.54 μm.Adopt Mo-Al combination electrode to be the weldability being strengthened contact conductor by the molybdenum (Mo) that adhesiveness is stronger in the present invention, the use of aluminium electrode reduces humidity-sensitive element cost, and adds its life-span.When ambient humidity raises, aqueous vapor molecule 1 diffuses into PI humidity-sensitive film 4 through top electrode hole 3, and when ambient humidity reduces, aqueous vapor molecule 1 diffuses into environment from PI humidity-sensitive film 4 through top electrode hole 3.
The manufacture craft of parallel plate capacitor formula humidity-sensitive element of the present invention as shown in Figure 3, first cleaning silicon chip, silicon chip forms insulation course, evaporation bottom electrode, the acid of bottom electrode coating polyimide, imidization, evaporation top electrode, the poroid figure phosphoric acid etching of top electrode, etch electrode by phosphoric acid, plasma etching humidity-sensitive film forms dicing lane, plasma etching PI humidity-sensitive film forms bottom electrode fairlead, finally section, argon welding, encapsulation.
The poroid top electrode of the present invention avoids palisade top electrode and considers the current-sharing bar that area ratio is large, width is wide that the narrow easy fracture of grid tooth and even charge distribute and arrange, each hole is made to enter the water diffusion path of humidity-sensitive film equal, under the prerequisite not increasing cost and process complexity, effectively can improve the response time of humidity-sensitive element.
A kind of poroid top electrode parallel plate capacitor formula humidity-sensitive element of the present invention, area 3mm × 3mm, top electrode active region area 2mm × 2mm, pitch-row as shown in Figure 4, its median pore diameter 2 μm, hole center distance S1=S2=4 μm, top electrode area 2.5mm 2; Through verification experimental verification, under all the other the same terms, the dynamic response time of the present invention's poroid top electrode parallel plate capacitor formula humidity-sensitive element improves at least 30% than existing palisade top electrode parallel plate capacitor formula humidity-sensitive element.
Fig. 5 shows existing palisade top electrode humidity-sensitive element (area 3mm × 3mm, top electrode active region area 2mm × 2mm, wherein grid facewidth degree 2 μm, grid backlash width 2 μm, top electrode area 2.5mm 2, current-sharing bar width 50 μm, accounts for top electrode area ratio 40%) and humidity-sensitive element dynamic perfromance of the present invention compare, wherein, it is 33.2%RH (MgCl that the dynamic Characteristic Data of palisade top electrode humidity-sensitive element derives from 25 DEG C from relative humidity 2saturated salt solution) to wet response test result to the relative humidity liter that is 75.8%RH (NaCl saturated salt solution), dynamic characteristic test is based on saturated salt solution method, equilibration time is 5s, test duration is less than 10s, the dynamic Characteristic Data of poroid top electrode humidity-sensitive element derives from numerical simulation, in figure, ordinate is dimensionless capacitance, and horizontal ordinate is the time.
As seen from Figure 5, the response time of poroid top electrode humidity-sensitive element is obviously better than palisade top electrode humidity-sensitive element, especially later stage.
The above is only to better embodiment of the present invention, not any pro forma restriction is done to the present invention, every any simple modification done above embodiment according to technical spirit of the present invention, equivalent variations and modification, all belong in the scope of technical solution of the present invention.

Claims (5)

1. a miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element, is characterized in that: be respectively poroid top electrode, PI humidity-sensitive film, dull and stereotyped bottom electrode, SiO from top to bottom 2insulation course and Si substrate, wherein, top electrode is provided with the top electrode hole of some marshallings, and PI humidity-sensitive film is provided with 2 bottom electrode fairleads.
2., according to a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element described in claim 1, it is characterized in that: silicon chip is selected in described Si substrate, described top electrode and bottom electrode are Mo-Al electrode.
3., according to a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element described in claim 1, it is characterized in that: the aperture in described top electrode hole is 2 μm, top electrode Kong Jian center minimum spacing is 4 μm.
4., according to a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element described in claim 1, it is characterized in that: PI humidity-sensitive film is applied through sol evenning machine silicon chip by the acid of pre-configured polyimide, then is formed through imidization, and its thickness is 0.54 μm.
5. according to the manufacture craft of a kind of miniature quick response poroid top electrode parallel plate capacitor formula humidity-sensitive element described in claim 1, it is characterized in that: first cleaning silicon chip, silicon chip forms insulation course, evaporation bottom electrode, the acid of bottom electrode coating polyimide, imidization, evaporation top electrode, the poroid figure phosphoric acid etching of top electrode, etch electrode by phosphoric acid, plasma etching humidity-sensitive film forms dicing lane, plasma etching PI humidity-sensitive film forms bottom electrode fairlead, finally section, argon welding, encapsulation.
CN201510329286.2A 2015-06-15 2015-06-15 Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode Pending CN104931546A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510329286.2A CN104931546A (en) 2015-06-15 2015-06-15 Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510329286.2A CN104931546A (en) 2015-06-15 2015-06-15 Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode

Publications (1)

Publication Number Publication Date
CN104931546A true CN104931546A (en) 2015-09-23

Family

ID=54118815

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510329286.2A Pending CN104931546A (en) 2015-06-15 2015-06-15 Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode

Country Status (1)

Country Link
CN (1) CN104931546A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110494744A (en) * 2017-03-31 2019-11-22 三美电机株式会社 Humidity sensor
CN112710706A (en) * 2020-12-08 2021-04-27 北京智芯微电子科技有限公司 Humidity sensor
CN113390931A (en) * 2021-05-28 2021-09-14 苏州锐光科技有限公司 Upper electrode material for capacitive humidity sensor and preparation method thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101629927A (en) * 2009-08-13 2010-01-20 上海交通大学 Porous aluminum oxide film humidity-dependent sensor preparation method
CN101949878A (en) * 2010-09-03 2011-01-19 兰州交通大学 Polyimide film miniature quick-response humidity sensing element and manufacturing method thereof
CN102890106A (en) * 2012-10-31 2013-01-23 中国电子科技集团公司第四十九研究所 Capacitive high polymer humidity sensor with micron gridded porous electrode and manufacturing method thereof
CN103134837A (en) * 2011-12-02 2013-06-05 意法半导体亚太私人有限公司 Tunable humidity sensor with integrated heater
CN205067412U (en) * 2015-06-15 2016-03-02 兰州交通大学 Poroid electrode parallel -plate capacitive moisture sensor of going up of miniature quick response

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101629927A (en) * 2009-08-13 2010-01-20 上海交通大学 Porous aluminum oxide film humidity-dependent sensor preparation method
CN101949878A (en) * 2010-09-03 2011-01-19 兰州交通大学 Polyimide film miniature quick-response humidity sensing element and manufacturing method thereof
CN103134837A (en) * 2011-12-02 2013-06-05 意法半导体亚太私人有限公司 Tunable humidity sensor with integrated heater
CN102890106A (en) * 2012-10-31 2013-01-23 中国电子科技集团公司第四十九研究所 Capacitive high polymer humidity sensor with micron gridded porous electrode and manufacturing method thereof
CN205067412U (en) * 2015-06-15 2016-03-02 兰州交通大学 Poroid electrode parallel -plate capacitive moisture sensor of going up of miniature quick response

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
杨子键 等: "基于CMOS工艺的硅基PI湿度传感器的研制", 《集成电路与开发》 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110494744A (en) * 2017-03-31 2019-11-22 三美电机株式会社 Humidity sensor
CN112710706A (en) * 2020-12-08 2021-04-27 北京智芯微电子科技有限公司 Humidity sensor
CN113390931A (en) * 2021-05-28 2021-09-14 苏州锐光科技有限公司 Upper electrode material for capacitive humidity sensor and preparation method thereof

Similar Documents

Publication Publication Date Title
CN104181203B (en) A kind of MEMS gas sensors and preparation method thereof
CN104931546A (en) Rapid responding miniature capacitance type humidity-sensitive element with porous upper electrode and parallel board electrode
CN205067413U (en) Poroid electrode and humidity -sensitive film parallel -plate capacitive moisture sensor gone up of quick response
CN105510404A (en) Rapidly-responsive humidity sensor and manufacturing method thereof
CN105502282B (en) A kind of manufacture method of MEMS humidity sensors
US20180224416A1 (en) Gas sensor and method of manufacturing the same
CN104634833B (en) MEMS capacitive relative humidity sensor and preparation method thereof
CN104634832B (en) CMOS MEMS capacitive humidity sensors and preparation method thereof
JP2015077652A (en) Nano-gap electrode and method for manufacturing same
CN205067412U (en) Poroid electrode parallel -plate capacitive moisture sensor of going up of miniature quick response
TW201704745A (en) Humidity sensor
CN104681630A (en) Thin film transistor and manufacturing method thereof as well as array substrate and display panel
CN103630582A (en) Micro-electromechanical system (MEMS) humidity sensor and preparation method thereof
CN205636360U (en) From type paper production humidification device
JP2010171072A5 (en)
CN104914139A (en) Porous upper electrode and humidity sensing parallel-plate capacitance type humidity sensing element capable of performing rapid response
JP2004535589A5 (en)
US10006881B2 (en) Microelectrodes for electrochemical gas detectors
US11087927B2 (en) Substrates employing surface-area amplification, for use in fabricating capacitive elements and other devices
CN103774120B (en) A kind of even device of air for PECVD system
CN103681899A (en) Photosensor with photosensitive density improved and manufacturing method thereof
CN105366626B (en) MEMS capacitive humidity sensor and preparation method thereof
JP2015023293A5 (en)
CN102779729B (en) A kind of process route forming multilayer steps structure
KR101484822B1 (en) Device for cell counting and method for manufacturing the same

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20150923

RJ01 Rejection of invention patent application after publication