CN104914683B - 一种三自由度光刻机双工件台框架气浮补偿方法 - Google Patents
一种三自由度光刻机双工件台框架气浮补偿方法 Download PDFInfo
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US4057347A (en) * | 1975-03-26 | 1977-11-08 | Hitachi, Ltd. | Optical exposure apparatus |
US6260282B1 (en) * | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
CN101529211A (zh) * | 2006-08-21 | 2009-09-09 | Gsi集团公司 | 采用具有公共刻线基板的多个子编码器的旋转光学编码器 |
CN102033438A (zh) * | 2009-09-29 | 2011-04-27 | 上海微电子装备有限公司 | 一种测量范围可扩展的调焦调平装置及调焦调平方法 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4057347A (en) * | 1975-03-26 | 1977-11-08 | Hitachi, Ltd. | Optical exposure apparatus |
US6260282B1 (en) * | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
CN101529211A (zh) * | 2006-08-21 | 2009-09-09 | Gsi集团公司 | 采用具有公共刻线基板的多个子编码器的旋转光学编码器 |
CN102033438A (zh) * | 2009-09-29 | 2011-04-27 | 上海微电子装备有限公司 | 一种测量范围可扩展的调焦调平装置及调焦调平方法 |
Non-Patent Citations (1)
Title |
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三自由度精密定位工作台的设计与运动分析;贾晓辉等;《天津大学学报》;20100531;第43卷(第5期);第457-460页 * |
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