CN104903207A - Photosensitive resin laminate roll - Google Patents
Photosensitive resin laminate roll Download PDFInfo
- Publication number
- CN104903207A CN104903207A CN201380068564.2A CN201380068564A CN104903207A CN 104903207 A CN104903207 A CN 104903207A CN 201380068564 A CN201380068564 A CN 201380068564A CN 104903207 A CN104903207 A CN 104903207A
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- China
- Prior art keywords
- photoresist
- stacked body
- type sheet
- sheet material
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920005989 resin Polymers 0.000 title claims abstract description 54
- 239000011347 resin Substances 0.000 title claims abstract description 54
- 239000000853 adhesive Substances 0.000 claims abstract description 42
- 230000001070 adhesive effect Effects 0.000 claims abstract description 42
- 239000000203 mixture Substances 0.000 claims abstract description 40
- 238000004804 winding Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 189
- 229920002120 photoresistant polymer Polymers 0.000 claims description 168
- 229920000642 polymer Polymers 0.000 claims description 66
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 27
- 239000000178 monomer Substances 0.000 claims description 26
- 239000002245 particle Substances 0.000 claims description 25
- 150000002148 esters Chemical class 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 20
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical class COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 claims description 19
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 18
- 238000012644 addition polymerization Methods 0.000 claims description 17
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 8
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- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
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- CSCGRSSBEBRMOA-UHFFFAOYSA-N ClOC1=C(C=CC=C1)C=1NC(=C(N1)C1=CC=CC=C1)C1=CC=CC=C1 Chemical class ClOC1=C(C=CC=C1)C=1NC(=C(N1)C1=CC=CC=C1)C1=CC=CC=C1 CSCGRSSBEBRMOA-UHFFFAOYSA-N 0.000 description 3
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
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- 150000001251 acridines Chemical class 0.000 description 3
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- 239000012964 benzotriazole Substances 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- VLNBQUAHERCLKT-UHFFFAOYSA-N dimethylamino benzoate Chemical compound CN(C)OC(=O)C1=CC=CC=C1 VLNBQUAHERCLKT-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 239000004800 polyvinyl chloride Substances 0.000 description 3
- 229920000915 polyvinyl chloride Polymers 0.000 description 3
- 150000003219 pyrazolines Chemical class 0.000 description 3
- 238000010526 radical polymerization reaction Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
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- 238000003860 storage Methods 0.000 description 3
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- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 2
- RWBSUKLDWBBECA-UHFFFAOYSA-N 3-(aminomethyl)-N,N,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C(CN)=C1 RWBSUKLDWBBECA-UHFFFAOYSA-N 0.000 description 2
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical class CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- MTRFEWTWIPAXLG-UHFFFAOYSA-N 9-phenylacridine Chemical compound C1=CC=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 MTRFEWTWIPAXLG-UHFFFAOYSA-N 0.000 description 2
- QZCLKYGREBVARF-UHFFFAOYSA-N Acetyl tributyl citrate Chemical compound CCCCOC(=O)CC(C(=O)OCCCC)(OC(C)=O)CC(=O)OCCCC QZCLKYGREBVARF-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
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- 239000004677 Nylon Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid group Chemical group C(C1=CC=CC=C1)(=O)O WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
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- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- FWQHNLCNFPYBCA-UHFFFAOYSA-N fluoran Chemical compound C12=CC=CC=C2OC2=CC=CC=C2C11OC(=O)C2=CC=CC=C21 FWQHNLCNFPYBCA-UHFFFAOYSA-N 0.000 description 2
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- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
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- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
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- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- NHOWDZOIZKMVAI-UHFFFAOYSA-N (2-chlorophenyl)(4-chlorophenyl)pyrimidin-5-ylmethanol Chemical compound C=1N=CN=CC=1C(C=1C(=CC=CC=1)Cl)(O)C1=CC=C(Cl)C=C1 NHOWDZOIZKMVAI-UHFFFAOYSA-N 0.000 description 1
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- QUDQABVGMBRGEA-UHFFFAOYSA-N 1,2,3,4,5,6,7,8-octaethylanthracene-9,10-dione Chemical compound CCC1=C(CC)C(CC)=C2C(=O)C3=C(CC)C(CC)=C(CC)C(CC)=C3C(=O)C2=C1CC QUDQABVGMBRGEA-UHFFFAOYSA-N 0.000 description 1
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 1
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- YWUGWLNBQIOMHO-UHFFFAOYSA-N 1-(3-acridin-9-ylphenyl)ethanone Chemical compound CC(=O)C1=CC=CC(C=2C3=CC=CC=C3N=C3C=CC=CC3=2)=C1 YWUGWLNBQIOMHO-UHFFFAOYSA-N 0.000 description 1
- LEHKKZRCBHDAEI-UHFFFAOYSA-N 1-(4-acridin-9-ylphenyl)ethanone Chemical compound C1=CC(C(=O)C)=CC=C1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 LEHKKZRCBHDAEI-UHFFFAOYSA-N 0.000 description 1
- YXZFFTJAHVMMLF-UHFFFAOYSA-N 1-bromo-3-methylbutane Chemical compound CC(C)CCBr YXZFFTJAHVMMLF-UHFFFAOYSA-N 0.000 description 1
- YZWKKMVJZFACSU-UHFFFAOYSA-N 1-bromopentane Chemical compound CCCCCBr YZWKKMVJZFACSU-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
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- FEWDXGMBVQULLN-UHFFFAOYSA-N 1-hydroxy-2-phenyl-1,5,6,7-tetrahydro-4H-benzimidazol-4-one Chemical compound ON1C=2CCCC(=O)C=2N=C1C1=CC=CC=C1 FEWDXGMBVQULLN-UHFFFAOYSA-N 0.000 description 1
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- NREFJJBCYMZUEK-UHFFFAOYSA-N 2-[2-[4-[2-[4-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]phenyl]propan-2-yl]phenoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound C1=CC(OCCOCCOC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCCOCCOC(=O)C(C)=C)C=C1 NREFJJBCYMZUEK-UHFFFAOYSA-N 0.000 description 1
- PUAQLLVFLMYYJJ-UHFFFAOYSA-N 2-aminopropiophenone Chemical compound CC(N)C(=O)C1=CC=CC=C1 PUAQLLVFLMYYJJ-UHFFFAOYSA-N 0.000 description 1
- ACQPFKIKEDMWOH-UHFFFAOYSA-N 2-butan-2-yl-2-(hydroxymethyl)propane-1,3-diol prop-2-enoic acid Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(C)C(C(CO)(CO)CO)C ACQPFKIKEDMWOH-UHFFFAOYSA-N 0.000 description 1
- YQZHOBBQNFBTJE-UHFFFAOYSA-N 2-chloro-3-methylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=C(C)C(Cl)=C2 YQZHOBBQNFBTJE-UHFFFAOYSA-N 0.000 description 1
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- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
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- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920003053 polystyrene-divinylbenzene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000003918 potentiometric titration Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229950006451 sorbitan laurate Drugs 0.000 description 1
- 235000011067 sorbitan monolaureate Nutrition 0.000 description 1
- 229950004959 sorbitan oleate Drugs 0.000 description 1
- 235000019337 sorbitan trioleate Nutrition 0.000 description 1
- 229960000391 sorbitan trioleate Drugs 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- BAZVSMNPJJMILC-UHFFFAOYSA-N triadimenol Chemical compound C1=NC=NN1C(C(O)C(C)(C)C)OC1=CC=C(Cl)C=C1 BAZVSMNPJJMILC-UHFFFAOYSA-N 0.000 description 1
- ZBZJXHCVGLJWFG-UHFFFAOYSA-N trichloromethyl(.) Chemical compound Cl[C](Cl)Cl ZBZJXHCVGLJWFG-UHFFFAOYSA-N 0.000 description 1
- 239000001069 triethyl citrate Substances 0.000 description 1
- VMYFZRTXGLUXMZ-UHFFFAOYSA-N triethyl citrate Natural products CCOC(=O)C(O)(C(=O)OCC)C(=O)OCC VMYFZRTXGLUXMZ-UHFFFAOYSA-N 0.000 description 1
- 235000013769 triethyl citrate Nutrition 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- JEVGKYBUANQAKG-UHFFFAOYSA-N victoria blue R Chemical compound [Cl-].C12=CC=CC=C2C(=[NH+]CC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JEVGKYBUANQAKG-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/67—Containers, packaging elements or packages, specially adapted for particular articles or materials for web or tape-like material
- B65D85/671—Containers, packaging elements or packages, specially adapted for particular articles or materials for web or tape-like material wound in flat spiral form
- B65D85/672—Containers, packaging elements or packages, specially adapted for particular articles or materials for web or tape-like material wound in flat spiral form on cores
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B1/00—Layered products having a non-planar shape
- B32B1/08—Tubular products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/10—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of paper or cardboard
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/302—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising aromatic vinyl (co)polymers, e.g. styrenic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D59/00—Plugs, sleeves, caps, or like rigid or semi-rigid elements for protecting parts of articles or for bundling articles, e.g. protectors for screw-threads, end caps for tubes or for bundling rod-shaped articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
- B65D81/24—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants
- B65D81/30—Adaptations for preventing deterioration or decay of contents; Applications to the container or packaging material of food preservatives, fungicides, pesticides or animal repellants by excluding light or other outside radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H75/00—Storing webs, tapes, or filamentary material, e.g. on reels
- B65H75/02—Cores, formers, supports, or holders for coiled, wound, or folded material, e.g. reels, spindles, bobbins, cop tubes, cans, mandrels or chucks
- B65H75/18—Constructional details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H75/00—Storing webs, tapes, or filamentary material, e.g. on reels
- B65H75/02—Cores, formers, supports, or holders for coiled, wound, or folded material, e.g. reels, spindles, bobbins, cop tubes, cans, mandrels or chucks
- B65H75/18—Constructional details
- B65H75/28—Arrangements for positively securing ends of material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0012—Processes making use of the tackiness of the photolithographic materials, e.g. for mounting; Packaging for photolithographic material; Packages obtained by processing photolithographic materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Food Science & Technology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Packaging Of Machine Parts And Wound Products (AREA)
- Storage Of Web-Like Or Filamentary Materials (AREA)
- Packages (AREA)
Abstract
The invention provides a photosensitive resin laminate roll which enables foreign bodies to be easily eliminated from the end surfaces of the photosensitive resin laminate roll when said roll is being unpacked. This photosensitive resin laminate roll comprises: a photosensitive resin laminate wound into a roll shape onto a winding core; and roll end surface protective members disposed so as to be in contact with the end surfaces of the wound photosensitive resin laminate. The roll end surface protective members each have an adhesive composition on the side that is in contact with the roll end surface. The photosensitive resin laminate includes at least a support layer, and a photosensitive resin layer laminated on the support layer.
Description
Technical field
The present invention relates to the stacked body volume of photoresist.
Background technology
In the past, the packaging as photosensitive element discloses several mode.Such as disclose the packaging (patent documentation 1) in order to protect volume end face to arrange end face guard block.
Prior art document
Patent documentation
Patent documentation 1: Japanese Unexamined Patent Publication 2005-41537 publication
Summary of the invention
the problem that invention will solve
The problem that the present invention will solve is, can be rolled up by the stacked body of photoresist that foreign matter is removed from photoresist stacked body volume end face simply when being provided in unpacking.
for the scheme of dealing with problems
Above-mentioned problem can be solved by following technical scheme of the present invention.Namely the present invention is as follows:
[1]
The stacked body volume of photoresist, wherein, by stacked for photoresist body wound into rolls in core, volume end face guard block configures according to the mode of the end contact with the stacked body of the photoresist wound up,
Described volume end face guard block for volume end contact side there is adhesive composition,
The stacked body of described photoresist at least comprises supporting layer and is laminated in the photo-sensitive resin of this supporting layer.
[2]
The stacked body volume of photoresist according to [1] item, it is characterized in that, it is covered by shading sheet material.
[3]
According to the stacked body volume of the photoresist of [2] Xiang Shu, it is characterized in that, described shading sheet material is tubular.
[4]
The stacked body volume of photoresist according to any one of [1] ~ [3] item, wherein,
The length of described core is longer than the width of the stacked body of described photoresist,
Described volume end face guard block is the ring-type sheet material of the end face be configured at the stacked body of the photoresist of wound into rolls, and this ring-type sheet material configures in the mode of the extension running through described core.
[5]
The stacked body volume of photoresist according to [4] item, it is characterized in that, the internal diameter of described ring-type sheet material is 1 ~ 1.1 times of core external diameter.
[6]
The stacked body volume of photoresist according to [4] or [5] item, is characterized in that,
Described ring-type sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by described ring-type sheet material be present in aerial part from the front end of flat board described ring-type sheet material farthest and flat board and distance between the face of described ring-type sheet material contact side is set to deflection distance H (mm), the half of described ring-type sheet material external diameter is set to R (mm) time, H/R is 0.06 ~ 0.59.
[7]
The stacked body volume of photoresist according to any one of [1] ~ [6] item, it is characterized in that, the bonding force of described end face guard block and low-density polyethylene film is 5gf/inch ~ 250gf/inch.
[8]
Photoresist according to any one of [1] ~ [7] item stacked body volume, it is characterized in that, the base material of described volume end face guard block is dust-free paper, low dirt paper, synthetic paper or, paper and the resin base material material of fitting.
[9]
The stacked body volume of photoresist according to any one of [1] ~ [8] item, it is characterized in that, described photo-sensitive resin is the layer comprising photosensitive polymer combination, and described photosensitive polymer combination comprises alkali-soluble Polymer, addition polymerization monomer, Photoepolymerizationinitiater initiater containing carboxyl.
[10]
The stacked body volume of photoresist according to [9] item, it is characterized in that, the described alkali-soluble Polymer containing carboxyl is the material of styrene or derivatives thereof copolymerization.
[11]
The stacked body volume of photoresist according to [9] or [10] item, it is characterized in that, described addition polymerization monomer comprises bisphenol-A system (methyl) acrylate compounds.
[12]
The stacked body volume of photoresist according to any one of [9] ~ [11] item, it is characterized in that, described Photoepolymerizationinitiater initiater comprises six aryl bisglyoxaline or derivatives thereofs.
[13]
The stacked body volume of photoresist according to any one of [1] ~ [12] item, it is characterized in that, it is resin that described adhesive composition comprises acrylic acid (ester).
[14]
The stacked body volume of photoresist according to any one of [1] ~ [13] item, it is characterized in that, described adhesive composition contains adhesives and particle, more than the 50 quality % of this particle have the diameter of 80 ~ 120% of the coating thickness of this adhesive composition, and the content of this particle is 5 weight portion to 30 weight portions relative to 100 parts by weight of binder.
[15]
A manufacture method for the stacked body volume of photoresist, is characterized in that,
The stacked body of the photoresist of wound into rolls in core, with the end contact mode configure volumes end face guard block with the stacked body of the photoresist wound up, wherein,
The length of this core is longer than the width of the stacked body of this photoresist,
The stacked body of this photoresist at least comprises supporting layer and is laminated in the photo-sensitive resin of this supporting layer,
This volume end face guard block has adhesive composition in the side with volume end contact,
This volume end face guard block is following ring-type sheet material: with one or be divided into the state of multiple part to configure at the end face of the stacked body of the photoresist of wound into rolls, after on the end face of the stacked body of the photoresist being configured at wound into rolls, the internal diameter of this ring-type sheet material is 1 ~ 1.1 times of core external diameter.
[16]
The manufacture method of the stacked body volume of the photoresist according to [15] item, it is characterized in that, the internal diameter of described ring-type sheet material is 1.001 ~ 1.1 times of the external diameter of described core, configures described ring-type sheet material in the mode of the extension running through described core.
[17]
The manufacture method of the stacked body volume of the photoresist according to [15] or [16] item, is characterized in that,
Described ring-type sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by described ring-type sheet material be present in aerial part from the front end of flat board described ring-type sheet material farthest and flat board and distance between the face of described ring-type sheet material contact side is set to deflection distance H (mm), the half of described ring-type sheet material external diameter is set to R (mm) time, H/R is 0.06 ~ 0.59.
[18]
The manufacture method of the stacked body volume of the photoresist according to any one of [15] ~ [17] item, it is characterized in that, the bonding force of described ring-type sheet material and low-density polyethylene film is 5gf/inch ~ 250gf/inch.
[19]
A packing method for the stacked body volume of photoresist, is characterized in that, uses the method according to any one of claim 15 ~ 18 to manufacture the stacked body volume of photoresist, covers the stacked body of described photoresist further roll up by the shading sheet material of tubular.
[20]
A kind of ring-type sheet material, it is the ring-type sheet material of the film roll of film wound into rolls in core, wherein,
The length of described core is longer than the width of described film,
The internal diameter of described ring-type sheet material is 1 ~ 1.1 times of core external diameter, and
The end contact of the film of described ring-type sheet material and described winding, has adhesive composition at described ring-type sheet material with the side of this end contact, is configured on film roll in the mode of the extension running through described core.
[21]
Ring-type sheet material according to [20] item, wherein, described film is the stacked body of photoresist.
[22]
Ring-type sheet material according to [20] or [21] item, is characterized in that,
Described ring-type sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by described ring-type sheet material be present in aerial part from the front end of flat board described ring-type sheet material farthest and flat board and distance between the face of described ring-type sheet material contact side is set to deflection distance H (mm), the half of described ring-type sheet material external diameter is set to R (mm) time, H/R is 0.06 ~ 0.59.
[23]
According to the ring-type sheet material according to any one of [20] ~ [22] item, it is characterized in that, the bonding force of itself and low-density polyethylene film is 5gf/inch ~ 250gf/inch.
[24]
According to the ring-type sheet material according to any one of [20] ~ [23] item, it is characterized in that, its base material had be dust-free paper, low dirt paper, synthetic paper or, paper and the resin base material material of fitting.
[25]
According to the ring-type sheet material according to any one of [21] ~ [24] item, it is characterized in that, described photo-sensitive resin is the layer comprising photosensitive polymer combination, and described photosensitive polymer combination comprises alkali-soluble Polymer, addition polymerization monomer, Photoepolymerizationinitiater initiater containing carboxyl.
[26]
Ring-type sheet material according to [25] item, is characterized in that, the described alkali-soluble Polymer containing carboxyl is the material of styrene or derivatives thereof copolymerization.
[27]
Ring-type sheet material according to [25] or [26] item, is characterized in that, described addition polymerization monomer comprises bisphenol-A system (methyl) acrylate compounds.
[28]
According to the ring-type sheet material according to any one of [25] ~ [27] item, it is characterized in that, described Photoepolymerizationinitiater initiater comprises six aryl bisglyoxaline or derivatives thereofs.
[29]
According to the ring-type sheet material according to any one of [20] ~ [28] item, it is characterized in that, it is resin that described adhesive composition comprises acrylic acid (ester).
[30]
According to the ring-type sheet material according to any one of [20] ~ [29] item, it is characterized in that, described adhesive composition contains adhesives and particle, more than the 50 quality % of this particle have the diameter of 80 ~ 120% of the coating thickness of this adhesive composition, and the content of this particle is 5 weight portion to 30 weight portions relative to 100 parts by weight of binder.
[31]
A kind of film roll, it possess covered by shading sheet material, the ring-type sheet material described in [20] ~ [30].
the effect of invention
If use the stacked body volume of photoresist of the present invention, then can simply foreign matter be removed from photoresist stacked body volume end face when breaking seal.
Accompanying drawing explanation
Fig. 1 is by stacked for photoresist body wound into rolls in core, and rolls up the schematic diagram of the embodiment that end face guard block is rolled up according to the stacked body of photoresist that the mode of the end contact with the stacked body of reeled photoresist configures.
Fig. 2 is the figure of the half R of the external diameter representing deflection distance H and ring-type sheet material.
Fig. 3 is the schematic diagram of the embodiment representing the stacked body volume of the photoresist covered by the shading sheet material of tubular.
Detailed description of the invention
Below, describe in detail for implementing best mode of the present invention (hereinafter referred to as " embodiment ").It should be noted that, the invention is not restricted to following embodiment, various distortion can be carried out implement in the scope of its main idea.
Photoresist stacked body volume is reeled in core along its length by the stacked body of photoresist of strip (band shape), and roll up the stacked body of photoresist that end face guard block configures according to the mode contacted with the end face (the Width end side of the stacked body of photoresist of described band shape) of the stacked body of reeled photoresist and roll up.
Fig. 1 represents the schematic diagram of an embodiment of the stacked body volume 10 of this photoresist.At this, the stacked body 1 of photoresist comprises supporting layer 4, is laminated in the photo-sensitive resin 5 of this supporting layer and arbitrary protective cover 6, and this duplexer 1 is wound in core 2.And, with two end contacts of the stacked body of the photoresist of this winding arrange and roll up end face guard block 3.At this, volume end face guard block 3 represents as ring-type sheet material.
(the stacked body of photoresist)
The stacked body of photoresist at least comprises supporting layer and the photo-sensitive resin be laminated on this supporting layer, preferably comprises the protective cover be laminated on photo-sensitive resin further.The photosensitive film being called as dry film photoresist, dry film photoresist is also comprised in the stacked body of photoresist.
As long as supporting layer supports the structure of photo-sensitive resin.As operable supporting layer, preferably through the transparent layer of the light launched from exposure light source.As such supporting layer, pet film, polyvinyl alcohol film, polyvinyl chloride film, vinyl chloride copolymer film, polyvinylidene chloride film, vinylidene chloride copolymerization film, polymethyl methacrylate copolymer film, plasticon, polyacrylinitrile film, styrol copolymer film, polyamide film, cellulose derivative film etc. can be listed.Can use after these film stretchings as required.From the view point of resolution, preferred mist degree is the film of less than 5.More preferably mist degree is less than 3, and preferably mist degree is less than 2.5 further, and further preferably mist degree is less than 1.About the thickness of supporting layer, thinner layer is favourable in image formative and economy, but from the thermal contraction etc. needed when maintaining photosensitive resin coating composition layer, preferably uses the thickness of 10 μm ~ 30 μm.Include, for example out GR19, GR16, Mitsubishi Plastics that Supreme Being people's DuPont Film (strain) manufactures, FB40 (16 μm of thickness), FB60 (16 μm of thickness) etc. that R310-16, R340G16, East レ Port リ エ ス テ Le Off ィ Le system (strain) that Inc. manufactures manufactures.
With regard to protective cover, the closing force of protective cover and photo-sensitive resin is less than supporting layer fully, therefore, it is possible to easily peel off.Such as, as protective cover, can preferably use polyethylene foil, polypropylene film and stretched polypropene film etc.In addition, the film of fissility excellence disclosed in Japanese Laid-Open Patent Publication 59-202457 publication can be used.The thickness of protective cover is preferably 10 ~ 100 μm, is more preferably 10 ~ 50 μm.Such as, GF-18, GF-818, GF-858 etc. that Tamapoly Co., Ltd. manufactures can be listed.
For photo-sensitive resin, photosensitive polymer combination can be coated supporting layer and dry thus carry out stacked.The thickness of photo-sensitive resin is preferably 5 ~ 100 μm, and the preferred upper limit is 50 μm.Because the thickness of photo-sensitive resin is more close to 5 μm, resolution more improves, and more close to 100 μm, film strength more improves, and therefore suitably can select according to purposes.
As the method manufacturing the stacked body of photoresist, known method can be adopted.Such as, prepare in advance and the photosensitive polymer combination being used for photo-sensitive resin is mixed as photosensitive polymer combination blending liquid with solvent, use bar coater or roll coater to be applied to supporting layer and make it dry, at the photo-sensitive resin of supporting layer upper strata stacked package containing this photosensitive polymer combination.It is 500 ~ 4000mPA second that photosensitive polymer combination blending liquid preferably adds at solvent is blended into 25 DEG C.From the view point of photosensitive polymer combination blending liquid viscosity, drying property, residual solvent amount, coating, foaming property, in solvent, suitably can selectively use MEK, acetone, ethanol, methyl alcohol, propyl alcohol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, toluene etc.Then, by protective cover stacked on this photo-sensitive resin, the stacked body of photoresist can be made.
For the stacked body of photoresist, reel in core with strip and become web-like and use.Spooling length is not particularly limited, and from the view point of weight and the process easness of volume, is preferably below 320m.If efficiency is higher more at most for the base material of 1 photoresist stacked body volume energy lamination, therefore from the view point of capacity rating, spooling length is preferably more than 100m.
(core)
Core is also sometimes referred to as core body.Its shape is not particularly limited, and can be cylindric, also can be cylindric.Because the stacked body of photoresist for electronic material, therefore preferably implements the core of dustless process, the core of preferred plastic resin as etching or plating resist layer and permanent pattern.Material preferably light, excellent strength, the dustless material of plastic resin.Polypropylene (PP) resin, acrylonitrile-butadiene-styrene (ABS) resin, nylon resin, Vinyl chloride resin etc. can be used, preferred ABS resin.The diameter of core is not particularly limited, and when stacked for photoresist body volume is installed on laminater, in order to be installed on device, core is preferably 2 ~ 5inch, is more preferably the diameter of 3inch.The length (being its axial length when using cylindric or columned core) of core is compared with the width of the stacked body of photoresist, can be identical or shorter, but when the stacked body of the photoresist that reels, in order to guarantee suitable extension in both sides, the length being preferably core is greater than the length of the width of the stacked body of photoresist.Ring-type sheet material can be installed according to the mode running through this extension, therefore preferably.In addition, also the bearing being called as core body support can be embedded in this extension and roll up with the mode stacked body of keeping photoresist under vacant state making the stacked body of photoresist roll up not movement.
(volume end face guard block)
For volume end face guard block, configure according to the mode of the end contact with the stacked body of reeled photoresist.Be not particularly limited as its shape; as long as the shape of rolling up the covering protection at least partially of end face is not just affected with certain area and end contact; wherein, preferably according to the ring-type sheet material that the mode of the end contact of the stacked body of photoresist with winding configures with running through the extension of core.Further preferably there is the ring-type of the width of the roughly overall size that can cover in fact photoresist stacked body volume end face.Volume end face guard block only for one end of the stacked body of reeled photoresist, but can be preferred for two ends.
When volume end face guard block is ring-type sheet material, for its ring internal diameter, use, preferably slightly larger than the external diameter of core in order to core can be run through.In addition, departed from slightly by the center at the center and core that make ring-type sheet material, the periphery of ring-type sheet material is slightly exposed from the periphery of the stacked body of the photoresist of wound into rolls thus.Like this, become easily from the dismounting of ring-type sheet material, ring internal diameter is preferably slightly larger than the external diameter of core.Specifically, when ring internal diameter be more than 1.001 times of core external diameter install time core is not blocked (Japanese: Zhang り pay I), thus preferably.Be more preferably more than 1.005 times, more preferably more than 1.01 times.Roll up end face entirety from the view point of protection and remove foreign matter, preferred ring internal diameter is less than 1.1 times of the external diameter of core, is more preferably less than 1.05 times, more preferably less than 1.03 times.
For ring external diameter, in order to cover the end face of photoresist stacked body volume, preferably more than 0.99 times of external diameter of the stacked body of the photoresist of wound into rolls, is more preferably more than 1 times.In addition, from the view point of the attachment suppressed packing such as the cylindrical pipe covering the light-proofness that the stacked body of photoresist is rolled up, ring external diameter is preferably less than 1.1 times of the external diameter of the stacked body volume of photoresist, is more preferably less than 1.05 times, more preferably less than 1.03 times.
For the base material of volume end face guard block, can list the paper of the plastic resins such as polyester, polyethylene terephthalate, polyphenylene sulfide, polypropylene, nylon, respectively tensionless winkler foundation, stretching, biaxial stretch-formed material and Low Density Polyethylene, high density polyethylene (HDPE), rigid polyvinyl chloride, soft PVC, glass paper, acetate, Triafol T, polystyrene, polycarbonate, polyimide and dust-proof process, the good quality paper of dust-proof process, clean-keeping paper and, paper and foregoing plastics the resin material, synthetic paper etc. of fitting.Because the stacked body of photoresist for electronic material, therefore preferably implements the material of dustless process as resist layer or plating resist layer and permanent pattern.From the view point of the generation of electrostatic less, foreign matter good to the tracing ability of end face removes that property is excellent and installation is also excellent, preferred substrates is the paper of dust-proof process, the good quality paper of dust-proof process, clean-keeping paper and, paper and foregoing plastics resin fit material, synthetic paper is as material.Synthetic paper preferably using polypropylene as main material.
When base material be the paper of dust-proof process, the good quality paper of dust-proof process, clean-keeping paper and, paper and foregoing plastics resin fit material time, the thickness of base material is preferably 50 ~ 500 μm.From the view point of installation, be preferably more than 50 μm, from the view point of the tracing ability to end face, the foreign matter property removed, be preferably less than 500 μm, be more preferably 60 ~ 200 μm, more preferably 60 ~ 150 μm.
For volume end face guard block, from the view point of release property, anti-fouling, also embossing processing can be carried out by effects on surface.For volume end face guard block, in the side of the end contact rolled up with the stacked body of photoresist, there is adhesive composition.Volume end face guard block preferably overlooks circular ring-type sheet material.
For aforementioned cyclic sheet material, aforementioned cyclic sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by aforementioned cyclic sheet material be present in aerial part from the top of flat board aforementioned cyclic sheet material farthest and flat board and distance between the face of aforementioned cyclic sheet material contact side is set to deflection distance H (mm), the half of aforementioned cyclic sheet material external diameter is set to R (mm) time, H/R is preferably 0.06 ~ 0.59.From the view point of the volume end face installation of ring-type sheet material, H/R is preferably less than 0.59.Be more preferably less than 0.5, more preferably less than 0.45.From the view point of to tracing ability and the foreign matter property removed of rolling up end face, be preferably more than 0.06.Be more preferably more than 0.1, more preferably more than 0.15.
The measuring method of deflection distance H is as follows.First, as shown in Figure 2, ring-type sheet material 3 is set on stretch out along horizontal direction (direction orthogonal with vertical direction) in fact substantial dull and stereotyped 7.Now, facing up of adhesives will be possessed, according to not arranging with dull and stereotyped 7 modes of fitting.Be present in the air according to the half of ring-type sheet material 3, namely according to the mode stationary ring sheet material being essentially the edge of linearity be centrally located at existing for dull and stereotyped end of ring-type sheet material 3.Time fixing, as shown in Figure 2, fixed parts 8 also can be used to be fixed.Now, ring-type sheet material 3 can not be subject to the impact beyond gravity and bend or bending.Vertical direction distance between the imaginary plane that be present in the aerial part (part from end is exposed) of ring-type sheet material by L font scale mensuration, that distance the is dull and stereotyped top of edge ring-type sheet material farthest and the face contacted with ring-type sheet material of flat board are formed.Measure place and be set to Fushi City, Shizuoka,Japan County.
(adhesive composition)
For adhesive composition; cull can be there is no when having peeled off volume end face guard block on photopolymer film end face by choice for use, on volume end face guard block, there is no the known adhesive composition of the attachment of photoresist when having peeled off volume end face guard block.
Wherein, from the view point of the foreign matter property removed and release property, the composite that acrylic acid (ester) is resin is preferably comprised.Photosensitive polymer combination is the photosensitive polymer combination comprising alkali-soluble Polymer containing carboxyl, addition polymerization monomer, Photoepolymerizationinitiater initiater, adhesive composition comprises acrylic acid (ester) when being resin, from can have concurrently to heavens further foreign matter remove property and release property viewpoint and preferably.
For adhesive composition preferably containing particle, more than the 50 quality % of this particle preferably have the diameter of 80 ~ 120% of the coating thickness of this adhesive composition, and the content of this particle is 5 weight portion to 30 weight portions relative to 100 parts by weight of binder.It should be noted that, the diameter of particle uses microscopic examination, for arbitrary 100 particles, observes out its maximum gauge, and calculates its aviation value.
From the view point of release property, the diameter of particle is preferably more than 80%, from the view point of viscosity, is preferably less than 120%.Be more preferably 90 ~ 110%, more preferably 100%.
For particle, even if can be the particle of Monosized powder usually in theory, but be difficult in fact more situation obtain.Preferably have particle size distribution narrow as far as possible, the particle of namely sharp-pointed grading curve.
More than the 50 quality % of preferred adhesive total amount are the diameter of 80 ~ 120% of the coating thickness of this adhesives.From the view point of the balance of release property and viscosity, be more preferably more than 70 quality %, more preferably more than 80 quality %.
It is 5 weight portion to 30 weight portions that the content of particle is preferably relative to 100 parts by weight of binder.When attaching, from the view point of the de-bubbled of air, being preferably more than 5 weight portions, from the view point of gleyness, being preferably less than 30.Be more preferably 10 weight portion to 25 weight portions.When the material of particle is glass, 15 ~ 30 weight portions are suitable, are preferably 5 ~ 25 weight portions in plastic situation.
The material of particle is preferably plastics, inorganic material.As plastics, polymethyl methacrylate system can be listed, polymethyl methacrylate system, polystyrene, polystyrene acrylic acid (ester) are, polyethylene-based, polypropylene-based, polystyrenebutadienes system, polystyrene divinylbenzene system, polyurethane series, polyphenyl substituted melamine system, melamine series.As inorganic material, glass, silicon dioxide (silicate mineral), calcium carbonate can be listed.
The bonding force of adhesives can be improved by the polarity of the sinter point of reduction composition in its entirety, raising resinous principle.
As the bonding force of end face guard block and low-density polyethylene film, remove property and installation from the view point of foreign matter, preferably 5gf/inch ~ 250gf/inch, is more preferably 50gf/inch ~ 240gf/inch.
It should be noted that, this bonding force measures in such a way.That is, on the face being formed with the layer of adhesive composition of end face guard block, low-density polyethylene film (LDPE) sheet material is attached with hand roller.Low-density polyethylene film uses TAMAPOLY Co., the GF-858 that Ltd manufactures.Be cut into the rectangular strip of wide 1inch, length 15cm, regulate humidity 11 hours in relative humidity 50%, under 23 degree Celsius.Use Orientec Co., the Tensilon RTM-500 that Ltd manufactures, carry out tensile test with load sensor 1kg, draw speed 100mm/ minute.Now, with the bottom of Tensilon, the end face guard block of sample is blocked (fixing), low-density polyethylene film is blocked (fixing) with extension section, carry out tensile test.Get the integral mean of load in tensile test in the interval of stretching 10mm to 50mm, and get the average of test number 2 times, it can be used as the value of gleyness.
(manufacture method of the stacked body volume of photoresist)
Photoresist stacked body volume, from the view point of suppressing the attachment of foreign matter and to suppress when transport photosensitive, preferably uses the covering of shading sheet material.Shading sheet material also can be called light-proofness film.Shading sheet material can cover the stacked body volume of photoresist according to the mode being wound in photoresist stacked body volume.As shown in Figure 3, when shading sheet material 9 is tubular, cover photoresist volume 1 owing to photoresist can be rolled up in 1 insertion cylinder, therefore preferably.In addition, when the length of cylinder is longer than the core 2 of photoresist stacked body volume 1, as shown in Figure 3, can be inner by the part longer than core 2 is folded into core, suppress the attachment of foreign matter and photosensitive further, therefore preferably.
Shading sheet material from the view point of can protect photoresist stacked body volume with from the contact of the falling object of such as weigh light, the gentle touchdown of packing container, preferably polyethylene.Thickness, from the view point of maintaining suitable intensity and suppressing pin hole, is preferably more than 10 μm, from the view point of treatability, is preferably less than 300 μm.Be more preferably 20 ~ 200 μm, more preferably 30 ~ 130 μm.In order to improve light-proofness and preferred black.
Photoresist stacked body volume is preferably by being formed with a pair parts being called as core body support of such protuberance chimeric with aforementioned core and unsettled fixing.By unsettled fixing, the contact of the ground wall of the stacked body of photoresist and packing container when can prevent from transporting.As core body support, include, for example out the core body support recorded in Japanese Unexamined Patent Publication 2004-42952 and Japanese Unexamined Patent Publication 2003-89477.
When utilizing shading sheet material to cover photoresist stacked body volume, if part long for the ratio core of shading sheet material to be folded in core and according to the further mounting core body support frame of mode of this invagination part of clamping, then can suppress the attachment of foreign matter and photosensitive, therefore preferably.
(photosensitive polymer combination)
Photosensitive polymer combination preferably comprises (a) alkali-soluble Polymer containing carboxyl; (b) addition polymerization monomer; (c) Photoepolymerizationinitiater initiater.
, photosensitive polymer combination few from the view point of the cull of volume end face when being peeled off from volume end face by ring-type sheet material also tails off to the attachment of ring-type sheet material, and preferred photosensitive polymer combination comprises above-mentioned (a) ~ (c).
(a) alkali-soluble Polymer containing carboxyl
(a) alkali-soluble Polymer containing carboxyl preferably by the monomer containing α, β-unsaturated carboxyl as polymeric composition, the high molecular acid equivalent of alkali-soluble is 100 ~ 600, and weight average molecular weight is 5,000 ~ 500,000.In order to make photosensitive polymer combination have developability or fissility relative to containing the developer solution of aqueous alkali or stripper, the carboxyl in the alkali-soluble Polymer containing carboxyl is necessary.Acid equivalent refers to the high molecular quality of the alkali-soluble of the carboxyl wherein with 1 equivalent.The preferred lower limit of acid equivalent is 250, and the preferred upper limit is 450.Improve from the view point of resistance to developability, viewpoint that resolution and adaptation improve and from guarantee with other compositions solvent or photosensitive polymer combination, particularly with the compatibility of following (b) addition polymerization monomer, a the high molecular acid equivalent of () alkali-soluble containing carboxyl is preferably more than 100, improve from the view point of developability and fissility, be preferably less than 600.Flat natural pond automatic titration device (COM-555) that the mensuration of acid equivalent uses flat natural pond industry (strain) to manufacture also uses the sodium hydroxide of 0.1mol/L to carry out according to potentiometric titration.
A the high molecular weight average molecular weight of () alkali-soluble containing carboxyl is preferably 5,000 ~ 500,000.From the view point of the thickness maintaining photoresist stacked body evenly and obtain to the viewpoint of the patience of developer solution and from suppression edge-melting, weight average molecular weight is preferably 5, and more than 000, in addition, from the view point of maintenance developability, be preferably 500, less than 000.Ooze out the phenomenon of photosensitive polymer combination from volume end face when edge-melting refers to photoresist stacked body wound into rolls.The photosensitive polymer combination oozed out sometimes can across supporting layer protective cover and the photosensitive polymer combination adhesion of oozing out from the photo-sensitive resin of another adjacent layer under volume state.Photosensitive polymer combination after photosensitive polymer combination after adhesion, i.e. edge-melting leaves the stacked body of photoresist of web-like sometimes, peels off from end face when lamination, becomes resist bits and disperses.If resist bits are attached to the substrate after lamination, then this resist bits are by being attached to the mask of next exposure, are exposed solidification, cover exposure when negative resist, become the defect of pattern.
It is further preferred that the lower limit of the high molecular weight average molecular weight of (a) alkali-soluble containing carboxyl is 20,000, the upper limit of the high molecular weight average molecular weight of (a) alkali-soluble containing carboxyl is 250,000.Weight average molecular weight in this specification sheets refers to the weight average molecular weight using the standard curve determination of polystyrene (the Shodex STANDARD SM-105 that Showa Denko K.K. manufactures) to obtain by gel permeation chromatography (GPC).
A gel permeation chromatography that the high molecular weight average molecular weight of () alkali-soluble containing carboxyl can use JASCO Corporation to manufacture measures under the following conditions:
Differential refraction detector: RI-1530
Pump: PU-1580
Degasser: DG-980-50
Post controlled-temperature cabinet: CO-1560
Post: be followed successively by KF-8025, KF-806M × 2, KF-807
Eluent: THF.
A () alkali-soluble Polymer containing carboxyl preferably comprises and is selected from (being total to) poly-mer as composition of the monomer of more than a kind in aftermentioned first monomer or second comonomer.
First monomer is carboxylic acid or the acid anhydrides in molecule with a polymerizability unsaturated group.Include, for example out (methyl) acrylic acid, fumaric acid, cinnamic acid, crotonic acid, itaconic acid, maleic anhydride and acid half ester.Wherein, particularly preferably (methyl) acrylic acid.
Second comonomer is nonacid and has the monomer of at least one polymerizability unsaturated group in molecule.Such as (methyl) methyl acrylate can be listed, (methyl) ethyl acrylate, (methyl) n-propyl, (methyl) isopropyl acrylate, (methyl) n-butyl acrylate, (methyl) isobutyl acrylate, (methyl) tert-butyl acrylate, (methyl) acrylic acid 2-hydroxyl ethyl ester, (methyl) acrylic acid 2-hydroxypropyl acrylate, (methyl) cyclohexyl acrylate, (methyl) 2-EHA, (methyl) benzyl acrylate, the ester class of the vinyl alcohols such as vinyl acetate, (methyl) acrylonitrile, styrene and the styrene derivative etc. that can be polymerized.Wherein, preferably (methyl) methyl acrylate, (methyl) n-butyl acrylate, styrene and (methyl) benzyl acrylate, from the view point of resolution, particularly preferably use styrene.
A () alkali-soluble Polymer containing carboxyl is preferably by the solution by above-mentioned monomer mixing and by solvent such as acetone, MEK or isopropanol, appropriate interpolation radical polymerization initiator such as benzoyl peroxide, azo isobutyronitrile carry out adding thermal agitation, thus synthesis.Sometimes a part of limit that limit drips compound in reactant liquor is synthesized.Also sometimes after reaction terminates, add solvent again, be adjusted to desired concentration.As synthetic method, except solution polymerization, polymerisation in bulk, suspension polymerization or emulsion polymerization can also be used.
For particularly preferred (a) the alkali-soluble Polymer containing carboxyl, the copolymerization ratios of the first monomer and second comonomer is the first monomer is 10 ~ 60 quality %, and second comonomer is 40 ~ 90 quality %, more preferably the first monomer is 15 ~ 35 quality % further, and second comonomer is 65 ~ 85 quality %.
As the high molecular example more specifically of (a) alkali-soluble containing carboxyl, include, for example out containing methyl methacrylate, methyl acrylic acid and the styrene poly-mer as copolymer composition, containing methyl methacrylate, methyl acrylic acid and the n-butyl acrylate poly-mer as copolymer composition, and containing benzyl methacrylate, methyl methacrylate and the 2-EHA poly-mer etc. as copolymer composition.
The high molecular content of (a) in photosensitive polymer combination alkali-soluble containing carboxyl is the scope of 20 ~ 90 quality % using the solid constituent total amount of photosensitive polymer combination as benchmark, is preferably 40 ~ 60 quality %.The high molecular content of (a) alkali-soluble containing carboxyl from the view point of maintain photosensitive polymer combination alkali-developable, by exposure, development and formed corrosion-resisting pattern as resist layer characteristic such as indentation, etching and various electroplating work procedure in there is sufficient patience, be preferably more than 20 quality %, from the view point of the corrosion-resisting pattern after the photosensitive polymer combination before solidification, solidification, there is sufficient flexibility, be preferably below 90 quality %.
(b) addition polymerization monomer
B () addition polymerization monomer is the compound in molecule with the ethylenic unsaturated bond that at least one can be polymerized.Ethylenic unsaturated bond is preferably terminal ethylenic unsaturated group.And then, from the view point of fine resolution, edge-melting and pitting, as (b) addition polymerization monomer, preferably use bisphenol-A system (methyl) acrylate compounds of at least one.
In this specification sheets, bisphenol-A system (methyl) acrylate compounds refers to the-C being derived from bisphenol-A
6h
4-C (CH
3)
2-C
6h
4-group and there is (methyl) acryloyl group or be derived from (methyl) acryloyl group carbon-to-carbon unsaturated double-bond and compound.As object lesson, the dimethylacrylate (the NK ester BPE-500 that Xin Zhong village chemical frbre industry (strain) manufactures) of the carbowax of two (methyl acrylic acid) ester two (methyl acrylic acid) ester (the NK ester BPE-200 that Xin Zhong village chemical frbre industry (strain) manufactures) that can list the carbowax of the epoxyethane distinguishing the average Unit 2 of addition at the two ends of bisphenol-A or the epoxyethane distinguishing the average Unit 5 of addition at the two ends of bisphenol-A, two (methyl acrylic acid) ester of the PAG of the addition epoxyethane of average Unit 6 and the epoxypropane of average Unit 2 is distinguished at the two ends of bisphenol-A, two (methyl acrylic acid) ester of the PAG of the addition epoxyethane of average Unit 15 and the epoxypropane of average Unit 2 is distinguished at the two ends of bisphenol-A.
As (b) addition polymerization monomer, except above-mentioned compound, the known compound with at least one ethylenically unsaturated group can be used.Such as 4-nonyl phenyl seven glycol DPG acrylate can be listed, acrylic acid 2-hydroxyl-3-phenoxy propyl ester, the own glycol acrylate of phenoxy group, (Japanese catalyst chemistry manufactures for the half ester compound of phthalic anhydride and acrylic acid 2-hydroxypropyl acrylate and the reactant of epoxypropane, trade name OE-A 200), 4-n-octyl phenoxy group five trimethylene glycol acrylate, 1,6-hexandiol (methyl) acrylate, Isosorbide-5-Nitrae-cyclohexanediol two (methyl) acrylate, polypropylene glycol two (methyl) acrylate, polyether polyols two (methyl) acrylate such as carbowax two (methyl) acrylate, 2-bis-(p-hydroxybenzene) propane two (methyl) acrylate, glycerine three (methyl) acrylate, pentaerythrite five (methyl) acrylate, trihydroxymethylpropanyltri diglycidyl ether three (methyl) acrylate, two (the 4-methacryloxy five ethoxyl phenenyl) propane of 2,2-, hexamethylene diisocyanate and the ninth of the ten Heavenly Stems trimethylene glycol monomethacrylates multifunctional (methyl) acrylate containing carbamate groups of carbamate compound etc., multifunctional (methyl) acrylate etc. of isocyanurate compound.They can be used alone, and also can be used in combination of two or more, and also can combinationally use with bisphenol-A system (methyl) acrylate compounds.
The content of (b) addition polymerization monomer in photosensitive polymer combination is the scope of 5 ~ 75 quality % using the solid constituent total amount of photosensitive polymer combination as benchmark, is more preferably 15 ~ 70 quality %.From the view point of the formative of resolution, adaptation and copper cash, the content of (b) addition polymerization monomer is more than 5 quality %, from the view point of the flexibility of cured film, is below 75 quality %.
(c) Photoepolymerizationinitiater initiater
As (c) Photoepolymerizationinitiater initiater, can suitably use the material such as used usually used as the Photoepolymerizationinitiater initiater of photoresist, particularly preferably use six aryl bisglyoxalines (hereinafter also referred to triarylimidazoles dimer).
As triarylimidazoles dimer, include, for example out: 2-(Chloro-O-Phenyl)-4,5-diphenyl-imidazole dimer (hereinafter also referred to " 2; 2 '-bis-(2-chlorphenyl)-4; 4 '; 5; 5 '-tetraphenyl-1,1 '-bisglyoxaline "), 2,2 ', 5-tri--(Chloro-O-Phenyl)-4-(3,4-Dimethoxyphenyl)-4 ', 5 '-diphenyl-imidazole dimer, 2,4-two-(Chloro-O-Phenyl)-5-(3,4-Dimethoxyphenyl)-diphenyl-imidazole dimer
2,4,5-, tri--(Chloro-O-Phenyl)-diphenyl-imidazole dimer, 2-(Chloro-O-Phenyl)-bis--4,5-(3,4-Dimethoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2-fluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,3-difluoromethyl phenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,4-difluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer
2,2 '-bis--(2,5-difluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,6-difluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,3,4-trifluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,3,5-trifluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer
2,2 '-bis--(2,3,6-trifluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,4,5-trifluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,4,6-trifluorophenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer
2,2 '-bis--(2,3,4,5-tetrafluoro phenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer, 2,2 '-bis--(2,3,4,6-tetrafluoro phenyl)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer and 2,2 '-bis--(2,3,4,5,6-pentafluorophenyl group)-4,4 ', 5,5 '-four-(3-methoxyphenyl)-imidazoles dimer etc.
Preferably can use 2-(Chloro-O-Phenyl)-4,5-diphenyl-imidazole dimer especially, it is for resolution or solidifies the Photoepolymerizationinitiater initiater that film strength against corrosion has high effect.These Photoepolymerizationinitiater initiaters can be used alone, or can be used in combination of two or more.In addition, also can combinationally use with following acridine compounds, pyrazoline compounds etc.
In a preferred embodiment, as (c) Photoepolymerizationinitiater initiater, acridine compounds or pyrazoline compounds can be used.As acridine compounds, acridine, 9-phenylacridine, 9-(4-cresyl)-acridine, 9-(4-methoxyphenyl) acridine, 9-(4-hydroxyphenyl) acridine, 9-ethyl acridine, 9-chloroethyl acridine, 9-methoxyacridine, 9-ethyoxyl acridine can be listed
9-(4-aminomethyl phenyl) acridine, 9-(4-ethylphenyl) acridine, 9-(4-n-pro-pyl phenyl) acridine, 9-(4-n-butylphenyl) acridine, 9-(4-tert-butyl-phenyl) acridine, 9-(4-ethoxyl phenenyl) acridine, 9-(4-acetylphenyl) acridine, 9-(4-dimethylaminophenyl) acridine, 9-(4-chlorphenyl) acridine
9-(4-bromophenyl) acridine, 9-(3-aminomethyl phenyl) acridine, 9-(3-tert-butyl-phenyl) acridine, 9-(3-acetylphenyl) acridine, 9-(3-dimethylaminophenyl) acridine, 9-(3-diethylamino phenyl) acridine, 9-(3-chlorphenyl) acridine, 9-(3-bromophenyl) acridine, 9-(2-pyridine radicals) acridine, 9-(3-pyridine radicals) acridine, 9-(4-pyridine radicals) acridine.Wherein, preferred 9-phenylacridine.
As pyrazoline compounds, preferred 1-phenyl-3-(4-tert-butyl-styrene base)-5-(4-tbutyl-phenyl)-pyrazoline, 1-(4-(benzoxazole-2-base) phenyl)-3-(4-tert-butyl-styrene base)-5-(4-tbutyl-phenyl)-pyrazoline, 1-phenyl-3-(4-biphenyl)-5-(4-tbutyl-phenyl)-pyrazoline, 1-phenyl-3-(4-biphenyl)-5-(the tertiary Octyl-phenyl of 4-)-pyrazoline.
As Photoepolymerizationinitiater initiater in addition to the foregoing, include, for example out 2-EAQ, octaethyl anthraquinone, 1,2-benzo anthraquinone, 2,3-benzo anthraquinone, 2-phenyl anthraquinone, 2,3-diphenyl anthraquinones, 1-chloroanthraquinone, 1,4-naphthoquinone, 9,10-phenanthrenequione, 2-methyl isophthalic acid, the quinones such as 4-naphthoquinones, 2,3-dimethyl anthraquinones and 3-chloro-2-methyl anthraquinone
Benzophenone, Michler's keton [4,4 '-bis-(dimethylamino) benzophenone] and 4, the aromatic ketones such as 4 '-bis-(diethylamino) benzophenone, the benzoin ethers such as benzoin, benzoin ethyl ether, benzoin phenylate, methylbenzoin and ethyl benzoin
The oxime ester classes such as benzil dimethyl ketal, benzil diethyl ketal, thioxanthene ketone and the benzoic combination of alkyl amino, 1-phenyl-1,2-propanedione-2-O-cupron, 1-phenyl-1,2-propanedione-2-(O-ethoxy carbonyl) oxime.
It should be noted that, as above-mentioned thioxanthene ketone and the benzoic combination of alkyl amino, include, for example out the combination of ethyl thioxanthones and dimethyl amino benzoate, CTX and the combination of dimethyl amino benzoate and the combination of isopropyl thioxanthone and dimethyl amino benzoate.In addition, also N-aryl amino acid can be used.As the example of N-aryl amino acid, N-phenylglycine, N-Methyl-N-phenyl amino acetic acid, N-ethyl, N-phenyl amino acetic acid etc. can be listed.Wherein, particularly preferably N-phenylglycine.
The content of (c) Photoepolymerizationinitiater initiater in photosensitive polymer combination is the scope of 0.01 ~ 30 quality % using the solid constituent total amount of photosensitive polymer combination as benchmark, preferred lower limit is 0.05% quality %, preferred lower limit is 0.1 quality % further, the preferred upper limit is 15 quality %, and the preferred upper limit is 10 quality % further.Abundant actinism is obtained from the view point of utilizing during the photopolymerization exposing and carry out, c the content of () Photoepolymerizationinitiater initiater is more than 0.01 quality %, from the view point of make during photopolymerization light be transmitted to fully photosensitive polymer combination bottom surface (part away from light source), obtain fine resolution and adaptation, be below 30 quality %.
(e) other additives
In photosensitive polymer combination except the composition of above-mentioned (a) ~ (c), various additive can be contained.Specifically, the such as coloring material such as dyestuff, pigment.As such coloring material, include, for example out phthalocyanine green, crystal violet, methyl orange, Nile blue 2B, Victoria blue, Peacock Green, alkali blue 20, diamond green etc.
When containing above-mentioned coloring material, the addition of coloring material, using the solid constituent total amount of photosensitive polymer combination as benchmark, is preferably 0.001 ~ 1 quality %.When the addition of coloring material is more than 0.001 quality %, there is the effect improving treatability; When being below 1 quality %, there is the effect maintaining storage stability.
In addition, in order to visual image can be given by exposure, also developer can be contained in photosensitive polymer combination.As such color appearance system dyestuff, the combination of leuco dye or fluoran dyes and halogen compounds can be listed.
Such as, as leuco dye, three (4-dimethylamino-2-aminomethyl phenyl) methane [leuco crystal violet], three (4-dimethylamino-2-aminomethyl phenyl) methane [leucomalachite green] and fluoran dyes can be listed.Wherein, when using leuco crystal violet, contrast ratio is good, is preferred.
As aforementioned halogen compound, n-amyl bromide, isoamyl bromide, brominated isobutylene, ethylene bromide, diphenyl methyl bromine, dibromomethylbenzene (benzal bromide), methylene bromide, trisbromomethyl phenyl sulfone, carbon tetrabromide, tricresyl phosphate (2 can be listed, 3-dibromopropyl) ester, trichloroacetamide, n-amyl iodide, isobutyl iodide, 1,1,1-tri-chloro-2,2-two (rubigan) ethane, carbon trichloride, chloro triaizine compounds etc.
When containing these dyestuffs, the content of the dyestuff in photosensitive polymer combination, using the solid constituent total amount of photosensitive polymer combination as benchmark, is preferably respectively 0.1 ~ 10 quality %.
In addition, in order to improve heat stability and the storage stability of photosensitive polymer combination, the compound of more than at least a kind in the group be preferably made up of benzotriazole and carboxyl benzotriazole class containing radical polymerization inhibitor or be selected from photosensitive polymer combination.
As such radical polymerization inhibitor, include, for example out p methoxy phenol, quinhydrones, pyrogallol, naphthylamines, tert-butyl catechol, stannous chloride, 2,6-di-t-butyl-paracresol, 2,2 '-di-2-ethylhexylphosphine oxide (4-methyl-6-tert-butylphenol), 2,2 '-methylene-bis(4-ethyl-6-t-butyl phenol), nitrosophenylhydroxylamine aluminium salt, diphenyl nitrosamine.
As benzotriazole, include, for example out 1,2,3-benzotriazole, 1-chloro-1,2,3-benzotriazole, two (N-2-ethylhexyl) aminomethylene-1,2,3-benzotriazole, two (N-2-ethylhexyl) aminomethylene-1,2,3-tolytriazole, two (N-2-ethylol) aminomethylene-1,2,3-benzotriazole.
As carboxyl benzotriazole class, include, for example out 4-carboxyl-1,2,3-benzotriazole, 5-carboxyl-1,2,3-benzotriazole, (N, N-dibutylamino) carboxyl benzotriazole, N-(N, N-bis--2-ethylhexyl) aminomethylene carboxyl benzotriazole, N-(N, N-bis--2-ethylol) aminomethylene carboxyl benzotriazole, N-(N, N-bis--2-ethylhexyl) aminoethylene carboxyl benzotriazole.
The total addition of radical polymerization inhibitor, benzotriazole and/or carboxyl benzotriazole class is using the solid constituent total amount of photosensitive polymer combination as benchmark, be preferably 0.001 ~ 3 quality %, preferred lower limit is 0.05 quality %, and the preferred upper limit is 1 quality %.Give storage stability from the view point of to photosensitive polymer combination, this total addition is preferably more than 0.001 quality %, from the view point of maintenance actinism, is preferably below 3 quality %.
In photosensitive polymer combination, other plasticizer can be contained as required.As such plasticizer, include, for example out and bisphenol-A is carried out the modified compound of polyoxy alkylidene.
In addition, the sorbitan derivatives such as polyoxyethylene sorbitan laurate, polyoxyethylene sorbitan oleate can such as be used; The polyalkylene glycols such as carbowax, polypropylene glycol; The phthalates such as diethyl phthalate; The plasticizer of orthotoluene sulfonamide, para toluene sulfonamide, ATBC, triethyl citrate, CitroflexA-2, acetyl citrate three n-propyl and acetyl tributyl citrate etc.Particularly preferably use sorbitan derivatives and polyalkylene glycols.
The content of the plasticizer in photosensitive polymer combination is using the solid constituent total amount of photosensitive polymer combination as benchmark, and be preferably 1 quality % ~ 50 quality %, preferred lower limit is 3 quality %, and the preferred upper limit is 30 quality %.From the view point of suppressing the delay of development time, giving flexibility to cured film, be preferably more than 1 quality %, or cold flow not enough from the view point of suppression solidification, is preferably below 50 quality % in addition.
Embodiment
Below, be specifically described further in an embodiment, but be not limited to this.
First, the method for making of the sample for evaluation of embodiment and comparative example is described, secondly, represents the evaluation method about gained sample and evaluation result.At this, employ ring-type sheet material as volume end face guard block.
(embodiment 1 ~ 12, comparative example 1)
1. the making of sample for evaluation
Sample for evaluation in embodiment and comparative example makes as follows.
The making > of the stacked body of < photoresist
By the composite 1 shown in following table 1, (wherein, the numeral of each composition is as the compounding amount (mass parts) of solid constituent.Abbreviation in table 1 is consistent with table 2.) and solvent stir fully, mix, make photosensitive polymer combination blending liquid, prepare 16 μm of thick pet film (Mitsubishi Plastics, Inc. the R310 manufactured) as supporter, use mould to be coated with machine photosensitive polymer combination blending liquid is coated the surface of this pet film equably and carries out drying, then form photo-sensitive resin.The thickness of photo-sensitive resin is 15 μm.Then; photo-sensitive resin, do not have on the surface of stacked pet film; fit as 33 μm of protective cover thick polyethylene foils (GF-858 that TAMAPOLY CO., LTD. manufacture), obtain the stacked body 1 of photoresist.
In addition, in the stacked body 1 of above-mentioned photoresist, except composite 1 is set to except composite 2 ~ 6, make in the same manner as the stacked body 1 of photoresist, obtain the stacked body 2 ~ 6 of photoresist.In the stacked body 1 of above-mentioned photoresist, except composite 1 is set to composite 7 ~ 10, the thickness of photo-sensitive resin is set to beyond 10 μm, makes in the same manner as the stacked body 1 of photoresist, obtain the stacked body 7 ~ 10 of photoresist.
The making > of the stacked body volume of < photoresist
Ring-type sheet material uses the sheet material shown in table 3 ~ table 5.For the adhesive composition containing acrylic acid (ester) resin of ring-type sheet material, in case of no particular description, Elleair TackNS80/SBG85S/ will be directly used to peel off the adhesive composition of (manufacture of Elleair Texel Co., Ltd.) again.
For sample F and G, adhesive composition adjusts as follows.That is, compared for the mode of 45:55 and 40:60 is carried out compounding with solid constituent by B-1 and M-8 shown in table 2, coating base material and carry out drying, adjustment, is 15 μm to make dried thickness.
Be wide 495mm by stacked for photoresist body 1 otch, the ABS resin core (core body) of internal diameter 77mm, external diameter 88mm, length 530mm reels 300m.The external diameter of the stacked body of photoresist of wound into rolls is 180mm.
Make to be wound in core body and the stacked body of photoresist becoming web-like remains on bar-shaped stainless steel support, on the stainless steel support that this stainless steel support can keep the patten's design of level bar-shaped according to the fixing other end.
Use periphery 500mm, long 800mm, the cylindrical shape light-proofness polyethylene pipe of thick 80 μm covers and become the stacked body of photoresist of web-like.
The stacked body of photoresist of the aforementioned web-like covered by light-proofness polyethylene pipe is dismantled from support, according to wide 330mm, high 100mm and upper bend be concavity and can fix in the buffer part of the patten's design of volume to arrange volume.
To turn back one end of light-proofness polyethylene pipe, the end face of the stacked body of web-like photoresist is exposed, ring-type sheet material is installed.The other end installs ring-type sheet material similarly, has made the stacked body volume 1 of photoresist.
Folded in core body by light-proofness polyethylene pipe, installing according to central part is the core body support of convex, the patten's design chimeric with core body, rolls up 1 pack photoresist.
2. metewand
By following assessment item and metewand, row is involved in the stacked body of photoresist and evaluates and mark grade.Evaluation result is shown in table 3 ~ 5.
(1) the foreign matter property removed
From photoresist stacked body volume, ring-type sheet material is peeled off, be confirmed whether that foreign matter is attached to ring-type sheet material.Carry out mark grade as follows.
Zero: foreign matter is attached to ring-type sheet material.Volume end face attach other adhesive strips and peels off, can not confirm have foreign matter to adhere to.
△: foreign matter is attached to ring-type sheet material, but when attaching other adhesive strips and peel off on volume end face, confirm attachment adhesive strip also having foreign matter.
×: foreign matter is not attached to ring-type sheet material.If attach other adhesive strips and peel off on volume end face, then confirm the attachment of foreign matter.
(2) ring-type sheet material installation
The content production volume recorded in making > by the stacked body volume of above-mentioned < photoresist, is installed on installation during volume end face, carries out mark grade as follows by annular membrane.
Zero: ring-type sheet material can be installed simply.When being attached at volume end face, do not attach while fold can be had.
△: the aspect that ring-type sheet material attaches, be installed on support or core is needed the time.When being attached at volume end face, a part produces fold or enters air.
×: the attaching of ring-type sheet material, the aspect be installed in support or core are needed the time.When peel off do not wish ring-type sheet material that position attaches and again attach time, ring-type sheet material is stretched distortion or fracture, and makes to be attached at volume end face and become difficulty.
(3) the packing attaching property of ring-type sheet material
After the content production volume recorded in making > by the stacked body volume of above-mentioned < photoresist, broken seal.After unpacking, in the same manner as also in time installing, whether end face is installed on to ring-type sheet material and observes, carry out mark grade as follows.
Zero: be installed with in the same manner as in time installing.
△: during unpacking, ring-type sheet material is attached at light-proofness cylindrical shape polyethylene sheets, has the position of peeling off from a part of end face.
×: during unpacking, ring-type sheet material is attached at light-proofness cylindrical shape polyethylene sheets, together peels off with light-proofness cylindrical shape polyethylene sheets.
(4) removal of ring-type sheet material
After the content production volume recorded in making > by the stacked body volume of above-mentioned < photoresist, broken seal, peeled off ring-type sheet material with the hand wearing resin-made gloves.As follows mark grade is carried out to operability when peeling off.
Zero: can easily peel off ring-type sheet material in 5 seconds.
△: the stripping of ring-type sheet material needs the time of more than 5 seconds.
(5) foreign matter number
The stacked body of photoresist of content production 14 web-likes recorded in the making > by above-mentioned < photoresist stacked body volume.Remove foreign matter from the end face all rolled up, from these 14, make total four positions attachment foreign matters of volume end face randomly.Afterwards, whole volumes installed and peels off ring-type sheet material, calculating the foreign matter being attached to volume end face.
[table 1]
[table 2]
| B-1 | The terpolymer (weight average molecular weight 50000, acid equivalent 344) of methyl acrylic acid 25 quality %, methyl methacrylate 50 quality %, styrene 25 quality % |
| B-2 | The terpolymer (weight average molecular weight 70000, acid equivalent 344) of methyl acrylic acid 25 quality %, methyl methacrylate 65 quality %, butyl acrylate 10 quality % |
| B-3 | The terpolymer (weight average molecular weight 120000, acid equivalent 344) of methyl acrylic acid 25 quality %, methyl methacrylate 65 quality %, butyl acrylate 10 quality % |
| M-1 | Trimethylolpropane triacrylate |
| M-2 | The carbamate compound of hexamethylene diisocyanate and five trimethylene glycol monomethacrylates |
| M-3 | Three oxygen base ethyl trimethylolpropane triacrylate |
| M-4 | Two (methyl acrylic acid) ester of the PAG of the addition epoxypropane of average Unit 2 and the epoxyethane of average Unit 6 is distinguished at the two ends of bisphenol-A |
| M-5 | Two (methyl acrylic acid) ester of the carbowax of the epoxyethane of each average Unit 2 of addition is distinguished at the two ends of bisphenol-A |
| M-6 | At two (methyl acrylic acid) ester of the PAG of the epoxyethane of each average Unit 3 of two ends addition of the epoxypropane of average Unit 12 |
| M-7 | The diacrylate of the carbowax obtained by the epoxyethane of average Unit 9 |
| M-8 | Two (methyl acrylic acid) ester of the carbowax of the epoxyethane of each average Unit 5 of addition is distinguished at the two ends of bisphenol-A |
| I-1 | 2-(Chloro-O-Phenyl)-4,5-diphenyl-imidazole dimer |
| I-2 | 4,4 '-bis-(diethylamino) benzophenone |
| D-1 | Peacock Green |
| D-2 | Leuco crystal violet |
| P-1 | Para toluene sulfonamide |
| P-2 | The polypropylene glycol of weight average molecular weight 2000 |
| P-3 | The polyoxyethylene [three (1-phenethyl) phenyl ether] of the epoxyethane of average 18 moles of addition |
| P-4 | Polyoxyethylene sorbitan trioleate (Japanese emulsifying agent Co., Ltd. manufactures, Newcol 3-85) |
| X-1 | (N, N-dibutylamino) carboxyl benzotriazole |
| X-2 | Two [3-(the 3-the tert-butyl group)-5-methyl-4-hydroxy phenyl] propionic ester of triethylene glycol |
| X-3 | Nitrosophenylhydroxylamine aluminium salt |
| X-4 | Amino-4, the 5-disulfide groups-s-triazine of 2-di-n-butyl |
| X-5 | 3-glycidoxy-propyltrimethoxy silane |
[table 3]
[table 4]
[table 5]
Except stacked for photoresist body 1 being made the stacked body 2 ~ 6 of photoresist, using on ring-type sheet material except sample B, make the stacked body of photoresist in the same manner as rolling up 1 with the stacked body of photoresist and roll up, it can be used as the stacked body volume 2 ~ 6 of photoresist.Use photoresist volume 2 ~ 6 when carrying out the evaluation of (1) ~ (5), obtain folding with use sense photosensitive resin layer result same when body rolls up 1.
Except stacked for photoresist body 1 being made the stacked body 7 ~ 10 of photoresist, ring-type sheet material uses sample B, external diameter 180mm being set to except external diameter 176mm, make the stacked body of photoresist in the same manner as rolling up 1 with the stacked body of photoresist to roll up, it can be used as the stacked body volume 7 ~ 10 of photoresist.The external diameter of the stacked body of photoresist of wound into rolls is 176mm.Use photoresist volume 7 ~ 10 when carrying out the evaluation of (1) ~ (5), obtain folding with use sense photosensitive resin layer result same when body rolls up 1.
utilizability in industry
For the stacked body volume of above-mentioned photoresist, owing to can easily foreign matter be removed when breaking seal, therefore useful in the processing of precision equipment, electronic material, also useful as the permanent pattern loaded in precision equipment, electronic material.
description of reference numerals
The stacked body of 1 photoresist
2 core
3 volume end face guard blocks (ring-type sheet material)
4 supporting layers
5 photo-sensitive resins
6 protective coveres
7 is dull and stereotyped
8 fixed partss
9 shading sheet materials
The stacked body volume of 10 photoresist
Claims (31)
1. the stacked body volume of photoresist, wherein, by stacked for photoresist body wound into rolls in core, volume end face guard block configures according to the mode of the end contact with the stacked body of the photoresist wound up,
Described volume end face guard block for volume end contact side there is adhesive composition,
The stacked body of described photoresist at least comprises supporting layer and is laminated in the photo-sensitive resin of this supporting layer.
2. the stacked body volume of photoresist according to claim 1, it is characterized in that, it is covered by shading sheet material.
3. the stacked body volume of photoresist according to claim 2, it is characterized in that, described shading sheet material is tubular.
4. the stacked body volume of the photoresist according to any one of claims 1 to 3, wherein,
The length of described core is longer than the width of the stacked body of described photoresist,
Described volume end face guard block is the ring-type sheet material of the end face be configured at the stacked body of the photoresist of wound into rolls, and this ring-type sheet material configures in the mode of the extension running through described core.
5. the stacked body volume of photoresist according to claim 4, it is characterized in that, the internal diameter of described ring-type sheet material is 1 ~ 1.1 times of core external diameter.
6. the stacked body volume of the photoresist according to claim 4 or 5, is characterized in that,
Described ring-type sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by described ring-type sheet material be present in aerial part from the front end of flat board described ring-type sheet material farthest and flat board and distance between the face of described ring-type sheet material contact side is set to deflection distance H (mm), the half of described ring-type sheet material external diameter is set to R (mm) time, H/R is 0.06 ~ 0.59.
7. the stacked body volume of the photoresist according to any one of claim 1 ~ 6, it is characterized in that, the bonding force of described end face guard block and low-density polyethylene film is 5gf/inch ~ 250gf/inch.
8. the stacked body of the photoresist according to any one of claim 1 ~ 7 volume, it is characterized in that, the base material of described volume end face guard block is dust-free paper, low dirt paper, synthetic paper or, paper and the resin base material material of fitting.
9. the stacked body volume of the photoresist according to any one of claim 1 ~ 8, it is characterized in that, described photo-sensitive resin is the layer comprising photosensitive polymer combination, and described photosensitive polymer combination comprises alkali-soluble Polymer, addition polymerization monomer, Photoepolymerizationinitiater initiater containing carboxyl.
10. the stacked body volume of photoresist according to claim 9, it is characterized in that, the described alkali-soluble Polymer containing carboxyl is the material of styrene or derivatives thereof copolymerization.
The stacked body volume of 11. photoresist according to claim 9 or 10, it is characterized in that, described addition polymerization monomer comprises bisphenol-A system (methyl) acrylate compounds.
The stacked body volume of 12. photoresist according to any one of claim 9 ~ 11, it is characterized in that, described Photoepolymerizationinitiater initiater comprises six aryl bisglyoxaline or derivatives thereofs.
The stacked body volume of 13. photoresist according to any one of claim 1 ~ 12, it is characterized in that, it is resin that described adhesive composition comprises acrylic acid (ester).
The stacked body volume of 14. photoresist according to any one of claim 1 ~ 13, it is characterized in that, described adhesive composition contains adhesives and particle, more than the 50 quality % of this particle have the diameter of 80 ~ 120% of the coating thickness of this adhesive composition, and the content of this particle is 5 weight portion to 30 weight portions relative to 100 parts by weight of binder.
The manufacture method of 15. 1 kinds of stacked body volumes of photoresist, is characterized in that,
The stacked body of the photoresist of wound into rolls in core, with the end contact mode configure volumes end face guard block with the stacked body of the photoresist wound up, wherein,
The length of this core is longer than the width of the stacked body of this photoresist,
The stacked body of this photoresist at least comprises supporting layer and is laminated in the photo-sensitive resin of this supporting layer,
This volume end face guard block has adhesive composition in the side with volume end contact,
This volume end face guard block is following ring-type sheet material: with one or be divided into the state of multiple part to configure at the end face of the stacked body of the photoresist of wound into rolls, after on the end face of the stacked body of the photoresist being configured at wound into rolls, the internal diameter of this ring-type sheet material is 1 ~ 1.1 times of core external diameter.
The manufacture method of the stacked body volume of 16. photoresist according to claim 15, it is characterized in that, the internal diameter of described ring-type sheet material is 1.001 ~ 1.1 times of the external diameter of described core, configures described ring-type sheet material in the mode of the extension running through described core.
The manufacture method of the stacked body volume of 17. photoresist according to claim 15 or 16, is characterized in that,
Described ring-type sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by described ring-type sheet material be present in aerial part from the front end of flat board described ring-type sheet material farthest and flat board and distance between the face of described ring-type sheet material contact side is set to deflection distance H (mm), the half of described ring-type sheet material external diameter is set to R (mm) time, H/R is 0.06 ~ 0.59.
The manufacture method of the stacked body volume of 18. photoresist according to any one of claim 15 ~ 17, it is characterized in that, the bonding force of described ring-type sheet material and low-density polyethylene film is 5gf/inch ~ 250gf/inch.
The packing method of 19. 1 kinds of stacked body volumes of photoresist, is characterized in that, uses the method according to any one of claim 15 ~ 18 to manufacture the stacked body volume of photoresist, covers the stacked body of described photoresist further roll up by the shading sheet material of tubular.
20. 1 kinds of ring-type sheet materials, it is the ring-type sheet material of the film roll of film wound into rolls in core, wherein,
The length of described core is longer than the width of described film,
The internal diameter of described ring-type sheet material is 1 ~ 1.1 times of core external diameter, and
The end contact of the film of described ring-type sheet material and described winding, has adhesive composition at described ring-type sheet material with the side of this end contact, is configured on film roll in the mode of the extension running through described core.
21. ring-type sheet materials according to claim 20, wherein, described film is the stacked body of photoresist.
22. ring-type sheet materials according to claim 20 or 21, is characterized in that,
Described ring-type sheet material is present in aerial mode according to its half and is arranged on the flat board that level stretches out, by described ring-type sheet material be present in aerial part from the front end of flat board described ring-type sheet material farthest and flat board and distance between the face of described ring-type sheet material contact side is set to deflection distance H (mm), the half of described ring-type sheet material external diameter is set to R (mm) time, H/R is 0.06 ~ 0.59.
23. ring-type sheet materials according to any one of claim 20 ~ 22, is characterized in that, the bonding force of itself and low-density polyethylene film is 5gf/inch ~ 250gf/inch.
24. ring-type sheet materials according to any one of claim 20 ~ 23, it is characterized in that, its base material had is dust-free paper, low dirt paper, synthetic paper or, paper and the resin base material material of fitting.
25. ring-type sheet materials according to any one of claim 21 ~ 24, it is characterized in that, described photo-sensitive resin is the layer comprising photosensitive polymer combination, and described photosensitive polymer combination comprises alkali-soluble Polymer, addition polymerization monomer, Photoepolymerizationinitiater initiater containing carboxyl.
26. ring-type sheet materials according to claim 25, is characterized in that, the described alkali-soluble Polymer containing carboxyl is the material of styrene or derivatives thereof copolymerization.
27. ring-type sheet materials according to claim 25 or 26, it is characterized in that, described addition polymerization monomer comprises bisphenol-A system (methyl) acrylate compounds.
28. ring-type sheet materials according to any one of claim 25 ~ 27, it is characterized in that, described Photoepolymerizationinitiater initiater comprises six aryl bisglyoxaline or derivatives thereofs.
29. ring-type sheet materials according to any one of claim 20 ~ 28, it is characterized in that, it is resin that described adhesive composition comprises acrylic acid (ester).
30. ring-type sheet materials according to any one of claim 20 ~ 29, it is characterized in that, described adhesive composition contains adhesives and particle, more than the 50 quality % of this particle have the diameter of 80 ~ 120% of the coating thickness of this adhesive composition, and the content of this particle is 5 weight portion to 30 weight portions relative to 100 parts by weight of binder.
31. 1 kinds of film rolls, it possesses that covered by shading sheet material, described in claim 20 ~ 30 ring-type sheet material.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710224203.2A CN106966074B (en) | 2012-12-27 | 2013-12-26 | Photosensitive resin laminate roll |
| CN201610799124.XA CN106393838B (en) | 2012-12-27 | 2013-12-26 | Photoresist laminated body is rolled up |
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| JP2012285697 | 2012-12-27 | ||
| JP2012-285697 | 2012-12-27 | ||
| PCT/JP2013/084946 WO2014104217A1 (en) | 2012-12-27 | 2013-12-26 | Photosensitive resin laminate roll |
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| CN201610799124.XA Division CN106393838B (en) | 2012-12-27 | 2013-12-26 | Photoresist laminated body is rolled up |
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| CN201380068564.2A Active CN104903207B (en) | 2012-12-27 | 2013-12-26 | Photoresist duplexer is rolled up |
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| KR (2) | KR102191080B1 (en) |
| CN (3) | CN106966074B (en) |
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| CN111319871A (en) * | 2018-12-13 | 2020-06-23 | 住友化学株式会社 | Packaging body |
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| CN105151562B (en) * | 2015-08-11 | 2018-07-20 | 中国乐凯集团有限公司 | A kind of packing method of optical fiber cellulose ester film |
| JP6979265B2 (en) * | 2015-10-27 | 2021-12-08 | 住友金属鉱山株式会社 | A method and a winding device for winding a long substrate, and a surface treatment device for a long substrate provided with the winding device. |
| JP6985291B2 (en) * | 2016-12-07 | 2021-12-22 | 旭化成株式会社 | Photosensitive resin composition and photosensitive resin laminate |
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| CN106966074A (en) | 2017-07-21 |
| MY176080A (en) | 2020-07-24 |
| JP2017071445A (en) | 2017-04-13 |
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| CN104903207B (en) | 2017-04-05 |
| TW201431769A (en) | 2014-08-16 |
| JP6315724B2 (en) | 2018-04-25 |
| CN106966074B (en) | 2020-05-05 |
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