CN104854710B - 具有motft的像素化成像器和工艺 - Google Patents

具有motft的像素化成像器和工艺 Download PDF

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Publication number
CN104854710B
CN104854710B CN201380065558.1A CN201380065558A CN104854710B CN 104854710 B CN104854710 B CN 104854710B CN 201380065558 A CN201380065558 A CN 201380065558A CN 104854710 B CN104854710 B CN 104854710B
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CN
China
Prior art keywords
layer
sensing element
array
metal oxide
oxide semiconductor
Prior art date
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Expired - Fee Related
Application number
CN201380065558.1A
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English (en)
Chinese (zh)
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CN104854710A (zh
Inventor
谢泉隆
俞钢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Abc Service Co
Fantasy Shine Co ltd
ABC Services Group Inc
Original Assignee
CBRITE Inc
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Publication of CN104854710A publication Critical patent/CN104854710A/zh
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Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • H10D86/423—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer comprising semiconductor materials not belonging to the Group IV, e.g. InGaZnO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/016—Manufacture or treatment of image sensors covered by group H10F39/12 of thin-film-based image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • H10F39/026—Wafer-level processing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
    • H10F39/189—X-ray, gamma-ray or corpuscular radiation imagers
    • H10F39/1898—Indirect radiation image sensors, e.g. using luminescent members
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/807—Pixel isolation structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/164—Polycrystalline semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/166—Amorphous semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thin Film Transistor (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
CN201380065558.1A 2012-12-13 2013-12-09 具有motft的像素化成像器和工艺 Expired - Fee Related CN104854710B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/713,744 US8962377B2 (en) 2012-12-13 2012-12-13 Pixelated imager with motfet and process
US13/713,744 2012-12-13
PCT/US2013/073920 WO2014093244A1 (en) 2012-12-13 2013-12-09 Pixelated imager with motfet and process

Publications (2)

Publication Number Publication Date
CN104854710A CN104854710A (zh) 2015-08-19
CN104854710B true CN104854710B (zh) 2017-06-20

Family

ID=50929894

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380065558.1A Expired - Fee Related CN104854710B (zh) 2012-12-13 2013-12-09 具有motft的像素化成像器和工艺

Country Status (6)

Country Link
US (1) US8962377B2 (cg-RX-API-DMAC10.html)
EP (1) EP2932534B8 (cg-RX-API-DMAC10.html)
JP (1) JP6290245B2 (cg-RX-API-DMAC10.html)
KR (1) KR20150095838A (cg-RX-API-DMAC10.html)
CN (1) CN104854710B (cg-RX-API-DMAC10.html)
WO (1) WO2014093244A1 (cg-RX-API-DMAC10.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9362413B2 (en) * 2013-11-15 2016-06-07 Cbrite Inc. MOTFT with un-patterned etch-stop
WO2015143011A1 (en) 2014-03-19 2015-09-24 Bidirectional Display Inc. Image sensor panel and method for capturing graphical information using same
US9520437B2 (en) * 2014-08-14 2016-12-13 Cbrite Inc. Flexible APS X-ray imager with MOTFT pixel readout and a pin diode sensing element
US9793252B2 (en) 2015-03-30 2017-10-17 Emagin Corporation Method of integrating inorganic light emitting diode with oxide thin film transistor for display applications
WO2016176216A1 (en) * 2015-04-27 2016-11-03 Cbrite Inc. Motft and array circuit for chemical/biochemical applications
US9871067B2 (en) * 2015-11-17 2018-01-16 Taiwan Semiconductor Manufacturing Co., Ltd. Infrared image sensor component
US10444378B1 (en) * 2018-04-27 2019-10-15 Varian Medical Systems, Inc. Imaging devices
US11016202B2 (en) * 2018-04-26 2021-05-25 Varian Medical Systems, Inc. Imaging devices

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6124606A (en) * 1995-06-06 2000-09-26 Ois Optical Imaging Systems, Inc. Method of making a large area imager with improved signal-to-noise ratio
CN1769990A (zh) * 2004-11-04 2006-05-10 三星电子株式会社 薄膜晶体管阵列板
US8318529B1 (en) * 2010-04-27 2012-11-27 Omnivision Technologies, Inc. Laser anneal for image sensors

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5435608A (en) * 1994-06-17 1995-07-25 General Electric Company Radiation imager with common passivation dielectric for gate electrode and photosensor
US6060714A (en) * 1998-01-23 2000-05-09 Ois Optical Imaging Systems, Inc. Large area imager with photo-imageable interface barrier layer
US9543356B2 (en) * 2009-03-10 2017-01-10 Globalfoundries Inc. Pixel sensor cell including light shield
TWI424574B (zh) * 2009-07-28 2014-01-21 元太科技工業股份有限公司 數位ｘ光探測面板及其製作方法
KR101605984B1 (ko) * 2009-11-06 2016-03-23 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
US8507962B2 (en) * 2010-10-04 2013-08-13 International Business Machines Corporation Isolation structures for global shutter imager pixel, methods of manufacture and design structures
US8791419B2 (en) * 2010-12-15 2014-07-29 Carestream Health, Inc. High charge capacity pixel architecture, photoelectric conversion apparatus, radiation image pickup system and methods for same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6124606A (en) * 1995-06-06 2000-09-26 Ois Optical Imaging Systems, Inc. Method of making a large area imager with improved signal-to-noise ratio
CN1769990A (zh) * 2004-11-04 2006-05-10 三星电子株式会社 薄膜晶体管阵列板
US8318529B1 (en) * 2010-04-27 2012-11-27 Omnivision Technologies, Inc. Laser anneal for image sensors

Also Published As

Publication number Publication date
EP2932534A1 (en) 2015-10-21
EP2932534B1 (en) 2017-08-30
EP2932534B8 (en) 2018-01-10
WO2014093244A1 (en) 2014-06-19
KR20150095838A (ko) 2015-08-21
EP2932534A4 (en) 2016-08-10
JP2016506620A (ja) 2016-03-03
US8962377B2 (en) 2015-02-24
US20140167046A1 (en) 2014-06-19
JP6290245B2 (ja) 2018-03-07
CN104854710A (zh) 2015-08-19

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