CN104810230B - 相关光学和带电粒子显微镜 - Google Patents

相关光学和带电粒子显微镜 Download PDF

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Publication number
CN104810230B
CN104810230B CN201510040069.1A CN201510040069A CN104810230B CN 104810230 B CN104810230 B CN 104810230B CN 201510040069 A CN201510040069 A CN 201510040069A CN 104810230 B CN104810230 B CN 104810230B
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CN
China
Prior art keywords
image
sample
lens
optical microscope
charged particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201510040069.1A
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English (en)
Chinese (zh)
Other versions
CN104810230A (zh
Inventor
B.布伊斯塞
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FEI Co
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FEI Co
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Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of CN104810230A publication Critical patent/CN104810230A/zh
Application granted granted Critical
Publication of CN104810230B publication Critical patent/CN104810230B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H01J37/228Optical arrangements for illuminating the object; optical arrangements for collecting light from the object whereby illumination or light collection take place in the same area of the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10Lenses
    • H01J2237/14Lenses magnetic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20207Tilt
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20214Rotation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22Treatment of data
    • H01J2237/221Image processing
    • H01J2237/223Fourier techniques
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/2602Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Microscoopes, Condenser (AREA)
CN201510040069.1A 2014-01-27 2015-01-27 相关光学和带电粒子显微镜 Expired - Fee Related CN104810230B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14152582.4A EP2899743B1 (en) 2014-01-27 2014-01-27 Correlative optical and charged particle microscope
EP14152582.4 2014-01-27

Publications (2)

Publication Number Publication Date
CN104810230A CN104810230A (zh) 2015-07-29
CN104810230B true CN104810230B (zh) 2017-03-08

Family

ID=49998160

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510040069.1A Expired - Fee Related CN104810230B (zh) 2014-01-27 2015-01-27 相关光学和带电粒子显微镜

Country Status (4)

Country Link
US (1) US9293297B2 (enExample)
EP (1) EP2899743B1 (enExample)
JP (1) JP6047592B2 (enExample)
CN (1) CN104810230B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9564291B1 (en) * 2014-01-27 2017-02-07 Mochii, Inc. Hybrid charged-particle beam and light beam microscopy
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
US10176567B2 (en) * 2015-12-21 2019-01-08 Canon Kabushiki Kaisha Physical registration of images acquired by Fourier Ptychography
WO2017216941A1 (ja) 2016-06-17 2017-12-21 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
US10176963B2 (en) 2016-12-09 2019-01-08 Waviks, Inc. Method and apparatus for alignment of optical and charged-particle beams in an electron microscope
EP3616162B1 (en) * 2017-04-27 2023-08-09 King Abdullah University Of Science And Technology Image series alignment system and method
JP6775003B2 (ja) * 2018-12-26 2020-10-28 株式会社日立ハイテク 荷電粒子線装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1724809A1 (en) * 2005-05-18 2006-11-22 FEI Company Particle-optical apparatus for the irradiation of a sample

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6373070B1 (en) 1999-10-12 2002-04-16 Fei Company Method apparatus for a coaxial optical microscope with focused ion beam
TW200703409A (en) * 2005-03-03 2007-01-16 Ebara Corp Mapping projection type electron beam apparatus and defects inspection system using such apparatus
EP1953791A1 (en) 2007-02-05 2008-08-06 FEI Company Apparatus for observing a sample with a particle beam and an optical microscope
US7781733B2 (en) * 2007-05-16 2010-08-24 International Business Machines Corporation In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques
JP2008300354A (ja) 2007-05-31 2008-12-11 Fei Co 荷電粒子装置内での試料キャリアの使用、当該試料キャリアの使用方法、及び当該試料キャリアを用いるように備えられた装置
JP5276860B2 (ja) * 2008-03-13 2013-08-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US9310596B2 (en) * 2010-04-06 2016-04-12 Inter-University Research Institute Corporation National Institute Of Natural Sciences Compound microscope device
US8698098B2 (en) * 2010-07-30 2014-04-15 E.A. Fischione Instruments, Inc. In situ holder assembly
JP5814741B2 (ja) * 2011-10-20 2015-11-17 株式会社日立ハイテクノロジーズ 走査電子顕微鏡

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1724809A1 (en) * 2005-05-18 2006-11-22 FEI Company Particle-optical apparatus for the irradiation of a sample

Also Published As

Publication number Publication date
CN104810230A (zh) 2015-07-29
US9293297B2 (en) 2016-03-22
JP6047592B2 (ja) 2016-12-21
EP2899743A1 (en) 2015-07-29
JP2015141899A (ja) 2015-08-03
EP2899743B1 (en) 2016-09-21
US20150214001A1 (en) 2015-07-30

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