CN104807416B - A kind of micro structure array optical strain Sensor Design and its manufacture method - Google Patents
A kind of micro structure array optical strain Sensor Design and its manufacture method Download PDFInfo
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- CN104807416B CN104807416B CN201510236182.7A CN201510236182A CN104807416B CN 104807416 B CN104807416 B CN 104807416B CN 201510236182 A CN201510236182 A CN 201510236182A CN 104807416 B CN104807416 B CN 104807416B
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Abstract
The invention discloses a kind of optical strain Sensor Design and manufacture method based on micro structure array, plated film is carried out on elastomer base material surface first, the micro structure array with spectral signature peak is prepared on base material using micro-nano manufacturing method；The device prepared is fixed on sample surface, using spectrum of the spectrometer measurement sample before and after deformation and in deformation process, the final change using spectral signature peak calculates the deformation quantity of sample.The micro structure array optical strain sensor of the present invention can measure deformation quantity in tiny area, and with the advantage that measurement sensitivity is high, detection speed is fast.
Description
Technical field
The invention belongs to field of measuring technique, the detection of miniature deformation is particularly belonged to, is related to a kind of micro structure array optics
Strain transducer is designed and its manufacture method, and it is applied to the miniature deformation produced by detection object surface.
Background technology
Traditional strain transducer is that the dependent variable of material is converted into electric signal.Such as Chinese patent application
A kind of condenser type super large strain transducer is disclosed in No. 2012103802359, belongs to electronic component field, including positioned at top
The shell in portion, the trailing frame positioned at sidepiece, the circuit unit positioned at middle part, the electric capacity movable plate electrode positioned at bottom, positioned at bottom
Capacitor fixed plate, slideway and lead plate on shell, positioned at the circuit unit plate of super large strain transducer medium position,
It is fixed on lead plate, then is fixed on glue sticking on the inwall of shell with welding manner；Electric capacity positioned at lower position moves pole
Plate is fixed with trailing frame with glue, and trailing frame is slidably connected with the slideway formation of shell again；Electricity between two chip capacitor movable plate electrodes
Hold fixed plate, be fixed on lead plate, finally fix lead plate with cage connection using welding manner.Using electric capacity variable area
Mode realizes super large strain measurement, realizes that curved surface measured object is measured with drawing and pulling type perceptual structure, is realized with double electric capacity enhanced sensitivities narrow and small
Structure design in space.
But the sensor is when in use, is easily influenceed by environment, such as ambient humidity is big, meeting when high temperature
The problems such as causing component failure.
The content of the invention
In order to solve the above-mentioned technical problem, the present invention provides a kind of micro structure array optical strain Sensor Design and its system
Make method.
According to technical scheme, a kind of optical strain Sensor Design and manufacturer based on micro structure array
Method, it is realized by following steps：
(1) suitable base material is selected, and coating film treatment is carried out to base material；
(2) microstructure graph to be processed is designed, and the substrate material surface after plated film is processed through row micro-structural；
(3) Microstructure Sensor after processing is fixed on testee surface；
(4) spectrum before and after measurement sensor deformation and in deformation process, obtains the indicatrix of spectrum；
(5) deformation quantity of testee is calculated using the indicatrix change of spectrum.
Wherein, the base material described in step (1) needs to ensure that surface is smooth and flexible.Step (1) is to substrate material
The material that material carries out plated film can produce the material of optical effect including gold, silver, aluminium etc..The technique of step (1) plated film includes heat
It is deposited, the film plating process, thickness 10nm~100nm of plated film such as magnetron sputtering.
Further, step (2) design processing structure graph includes rectangle, square, circular and various polygons etc.
The micro-structural of characteristic spectrum can be produced, micro-structural cycle 100nm~10um, structure overall dimension is more than 5um.In step (2)
Micro-nano structure processing mode include that Laser Processing, energetic particle beam processing, electrical discharge machining, machining etc. is traditional and special type
Processing method.
Closer, the measuring apparatus used in step (4) is spectrometer, and wavelength is more than 400nm.
Compared to traditional strain transducer based on strain-electricity, Microstructure Optics strain transducer has reaction spirit
Sensitivity is high, simple in construction, the advantage of measurable a small range dependent variable, can be widely applied to civil engineering structure, Aero-Space,
The industries such as medical science, nuclear industry.It is an object of the present invention to provide a kind of method of accurate detection object surface miniature deformation.This
The detection method that invention is proposed can significantly improve the detection sensitivity and precision strained under small size.
Brief description of the drawings
Fig. 1 is material film plating structural representation；
Fig. 2 is the first micro-structural schematic diagram according to the present invention；
Fig. 3 is structure change schematic diagram after the first micro-structural stress according to the present invention；
Fig. 4 is Analysis of test results schematic diagram；
Fig. 5 is material film plating structural representation；
Fig. 6 is the second micro-structural schematic diagram according to the present invention；
Fig. 7 is structure change schematic diagram after the second micro-structural stress according to the present invention；
Fig. 8 is Analysis of test results schematic diagram.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the present invention, rather than whole embodiments.Base
Embodiment in the present invention, those of ordinary skill in the art obtained under the premise of creative work is not made it is all its
His embodiment, belongs to the scope of protection of the invention.Additionally, protection scope of the present invention should not be only limited to following
Concrete structure or part or design parameter.
Research finds that, when the micro-structural on metallic film material surface changes, the position at its spectral signature peak can be sent out
It is raw to change, the change of the position by determining spectral signature peak, you can to retrodict out the strain variation of material, so as to constitute
A kind of new Microstructure Optics strain transducer.
Based on the studies above, the invention discloses a kind of optical strain Sensor Design based on micro structure array and manufacture
Method, carries out plated film, being prepared using micro-nano manufacturing method on base material is had on elastomer base material surface first
The micro structure array at spectral signature peak；The device prepared is fixed on sample surface, existed using spectrometer measurement sample
Spectrum before and after deformation and in deformation process, the final change using spectral signature peak calculates the deformation quantity of sample.The present invention's
Micro structure array optical strain sensor can measure deformation quantity in tiny area, and with measurement sensitivity height, detection speed
Fast advantage.
According to the optical strain Sensor Design and manufacture method based on micro structure array of the present invention, it passes through following step
It is rapid to realize：
(1) suitable base material is selected, and coating film treatment is carried out to base material；
(2) microstructure graph to be processed is designed, and the substrate material surface after plated film is processed through row micro-structural；
(3) Microstructure Sensor after processing is fixed on testee surface；
(4) spectrum before and after measurement sensor deformation and in deformation process, obtains the indicatrix of spectrum；
(5) deformation quantity of testee is calculated using the indicatrix change of spectrum.
Wherein, the base material described in step (1) needs to ensure that surface is smooth and flexible；Base material is plated
The material of film, which includes gold, silver, aluminium etc., can produce the material of optical effect；The technique of plated film includes hot evaporation, magnetron sputtering etc.
Film plating process, thickness 10nm~100nm of plated film.Step (2) design processing structure graph include rectangle, square, it is circular with
And various polygons etc. can produce the micro-structural of characteristic spectrum, micro-structural cycle 100nm~10um, structure overall dimension is more than
5um；Micro-nano structure processing mode includes the tradition such as Laser Processing, energetic particle beam processing, electrical discharge machining, machining and special
Plant processing method.Measuring apparatus used in step (4) is spectrometer, and wavelength is more than 400nm.
Closer, micro structure array optical strain Sensor Design and its manufacture method provided by the present invention also may be used
To comprise the following steps：Step (1), prepares the base material for processing micro structure；Step (2), makes on base material
Standby micro structure array；Step (3), is fixed on sample surface by the base material processed and is answered using spectrometer detection
Variable；
Wherein, step (1) includes：
Step 11, the base material for being adapted to process is selected, Choice of substrate materials has the smooth material of certain elasticity,
Including PDMS, LDPE etc.；It is prepared into square or rectangle that the length of side is more than 1mm；
Step 12, plated film is carried out to material, the target of plated film, which includes gold, silver, aluminium etc., can produce the material of optical effect,
The technique of plated film includes hot evaporation, the film plating process such as magnetron sputtering, thickness 10nm~100nm of plated film, as shown in Figure 1；
Step (2) includes：
Step 21, design processing structure graph includes rectangle, square, the structure such as circular and various polygons, such as attached
Shown in Fig. 2, cycle 100nm~10um, structure overall dimension is more than 5um (meeting measurement accuracy)；
Step 22, material after plated film is positioned in micro-nano structure process equipment and it is processed, processing mode includes
Laser Processing, energetic particle beam processing, electrical discharge machining, machining tradition and special process mode etc.；
Step (3) includes：
Step 31, testee surface will be fixed on plus rear sample；
Step 32, spectrum respectively before and after measurement object deformation and in deformation process, obtains the indicatrix of spectrum；
Step 33, the deformation quantity of the mobile reckoning material of spectral signature peak position is passed through.
Below in conjunction with the accompanying drawings, the present invention is described further.Fig. 1 is material film plating structural representation, and it includes plating
Layer 1 and base material 2.Fig. 2 is the first micro-structural schematic diagram according to the present invention, and L represents feature structure initial length.Fig. 3 is
According to structure change schematic diagram after the first micro-structural stress of the present invention, L ' is characterized length after malformation.Fig. 4 ties for detection
Fruit analysis schematic diagram, 1 is the curve of spectrum before deformation, and 2 be the curve of spectrum after deformation.Fig. 5 is material film plating structural representation, and it is wrapped
Include coating 1 and base material SiO2, the thickness 50nm (gold) of coating 1.Fig. 6 is the second micro-structural schematic diagram according to the present invention, its
Middle g=25nm, w=25nm, T1=180nm, T2=230nm；T=230nm.Fig. 7 is the second micro-structural stress according to the present invention
Structure change schematic diagram afterwards, g is changed into g ', and w is changed into w ', T1It is changed into T1', T2It is changed into T2', T is changed into T '.Fig. 8 is Analysis of test results
Schematic diagram, 1 is the curve of spectrum before deformation, and 2 be the curve of spectrum after deformation.
More specifically, Fig. 1 is material film plating structural representation.Its thickness of wherein 1 coating 10nm~100nm, 2 be substrate material
Material, is referred mainly to the smooth material with certain elasticity, including PDMS, LDPE etc..Fig. 2 is micro-structural schematic diagram.Lx, Ly are special
Structure original dimension is levied, Lx, Ly scope 10nm~1000nm, cycle T 100nm~10um, structure overall dimension are more than 5um.Figure
3 be structure change schematic diagram after micro-structural stress.Length after Lx ' feature deformations, T ' is the cycle after change.Fig. 4 is inspection
Survey interpretation of result schematic diagram.1 is the curve of spectrum before deformation, and 2 be the curve of spectrum after deformation.
In micro structure array optical strain Sensor Design provided by the present invention and its manufacture method, typically make first
The standby base material for being adapted to processing, thickness is 0.5mm LDPE materials, and is prepared into the square that the length of side is 9.2mm；
Magnetron sputtering plating is carried out to material, the target of plated film is from the golden material that purity is 99.999%, coating film thickness
For 50nm, as shown in Figure 5.Design processing structure graph, structure as shown in fig. 6, g=25nm, w=25nm in cellular construction,
T1=180nm, T2=230nm；T=230nm；Overall processing structure is 46um length of sides square；Material after plated film is placed in focusing
In ion beam nanoprocessing equipment, according to design requirement graphics processing.Material after processing is fixed on testee surface, object
Micro-structural produces micro change in deformation process or before and after change, as shown in Figure 7, and spectral measurement acquisition feature is carried out to it
Spectrum；
As shown in Figure 8, deformation quantity is calculated by characteristic spectrum change, 815nm is moved to from 850nm for characteristic peak,
Its corresponding construction unit deflection is Δ w=w '-w=12nm, and tested region is length of side 30um rectangle sample periodicity N=
130, then it is Δ=12 × 130=1560nm that can estimate material deformation amount in the range of this under a proportional relationship.
The foregoing is only a preferred embodiment of the present invention, but protection scope of the present invention be not limited thereto,
Any one skilled in the art the invention discloses technical scope in, the change or replacement that can be readily occurred in,
It should all be included within the scope of the present invention.Those skilled in the art is appreciated that without departing substantially from appended right
It is required that in the case of the spirit and scope of the present invention of definition, various modifications can be made in form and details.
Claims (1)
1. a kind of optical strain Sensor Design and manufacture method based on micro structure array, are realized by following steps：
(1) suitable base material is selected, and coating film treatment is carried out to base material；
(2) microstructure graph to be processed, and the substrate material surface progress micro-structural processing after plated film are designed；
(3) Microstructure Sensor after processing is fixed on testee surface；
(4) spectrum before and after measurement sensor deformation and in deformation process, obtains the indicatrix of spectrum；
(5) deformation quantity of testee is calculated using the indicatrix change of spectrum；
Wherein, the base material described in step (1) needs to ensure that surface is smooth and flexible；Plated film is carried out to base material
What material included in gold, silver or aluminium any can produce the material of optical effect；The technique of plated film includes hot evaporation, and magnetic control splashes
Any film plating process hit, thickness 10nm~100nm of plated film；
What step (2) design processing structure graph included in various polygons and circle any can produce characteristic spectrum
Micro-structural, the micro-structural cycle 100nm~10 μm, structure overall dimension be more than 5 μm；Micro-structural processing mode is Laser Processing, height
Any processing method in the processing of the energy particle beams, electrical discharge machining, machining；
Step (4) measuring apparatus is spectrometer, and wavelength is more than 400nm；Sample after processing is wherein fixed on testee surface,
The spectrum before and after measurement object deformation and in deformation process obtains the indicatrix of spectrum respectively, passes through spectral signature peak position
Mobile reckoning material deformation quantity.
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| US20170176269A1 (en) * | 2015-12-17 | 2017-06-22 | General Electric Company | Components with array-based strain sensors and methods for monitoring the same |
| US10183862B2 (en) * | 2016-09-14 | 2019-01-22 | GM Global Technology Operations LLC | Method of strain gauge fabrication using a transfer substrate |
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| CN101467022A (en) * | 2005-10-27 | 2009-06-24 | 伊克西乔尼克斯股份有限公司 | Method of phot0-reflectance characterization of strain and active dopant in semiconductor structures |
| EP2454560A1 (en) * | 2009-07-16 | 2012-05-23 | Hamidreza Alemohammad | Optical fibre sensor and methods of manufacture |
| CN102205671B (en) * | 2011-03-15 | 2013-08-28 | 中国科学技术大学 | Simple paste for measuring surface deformation of material and production method thereof |
| CN102519379B (en) * | 2011-12-08 | 2014-10-08 | 北京遥测技术研究所 | Strain-temperature change two-parameter measuring method based on chirped grating |
| JP5862433B2 (en) * | 2012-04-09 | 2016-02-16 | 株式会社島津製作所 | Surface treatment status monitoring device |
| CN103567634A (en) * | 2012-08-09 | 2014-02-12 | 卢晓敏 | Method of producing strain sensor by utilizing laser micro-melting technology |
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