CN104781307B - Polyvalent phenylene ether novolac resin, epoxy resin composition, and cured product thereof - Google Patents
Polyvalent phenylene ether novolac resin, epoxy resin composition, and cured product thereof Download PDFInfo
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- CN104781307B CN104781307B CN201380058014.2A CN201380058014A CN104781307B CN 104781307 B CN104781307 B CN 104781307B CN 201380058014 A CN201380058014 A CN 201380058014A CN 104781307 B CN104781307 B CN 104781307B
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- China
- Prior art keywords
- resin
- phenylene ether
- epoxy resin
- polynary
- phenol
- Prior art date
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- 229920003986 novolac Polymers 0.000 title claims abstract description 57
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 48
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 48
- 239000000203 mixture Substances 0.000 title claims abstract description 42
- OMIHGPLIXGGMJB-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2OC2=C1 OMIHGPLIXGGMJB-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229920005989 resin Polymers 0.000 claims abstract description 81
- 239000011347 resin Substances 0.000 claims abstract description 81
- 125000000962 organic group Chemical group 0.000 claims abstract description 5
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 36
- 229920006380 polyphenylene oxide Polymers 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 32
- 150000002989 phenols Chemical class 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 125000005647 linker group Chemical group 0.000 claims description 7
- 229920006389 polyphenyl polymer Polymers 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- JRQJLSWAMYZFGP-UHFFFAOYSA-N 1,1'-biphenyl;phenol Chemical class OC1=CC=CC=C1.C1=CC=CC=C1C1=CC=CC=C1 JRQJLSWAMYZFGP-UHFFFAOYSA-N 0.000 claims description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- -1 poly(phenylene ether) Polymers 0.000 abstract description 49
- 239000004793 Polystyrene Substances 0.000 abstract description 2
- 229920002223 polystyrene Polymers 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 description 34
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 31
- 239000011342 resin composition Substances 0.000 description 25
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 150000001875 compounds Chemical class 0.000 description 24
- 239000002904 solvent Substances 0.000 description 24
- 238000006243 chemical reaction Methods 0.000 description 23
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 20
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 20
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 20
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 20
- 229960003742 phenol Drugs 0.000 description 19
- 150000002148 esters Chemical class 0.000 description 17
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 15
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 235000010290 biphenyl Nutrition 0.000 description 13
- 239000004305 biphenyl Substances 0.000 description 13
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000002994 raw material Substances 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 239000000853 adhesive Substances 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 239000003963 antioxidant agent Substances 0.000 description 10
- 239000003153 chemical reaction reagent Substances 0.000 description 10
- 239000004567 concrete Substances 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 230000003078 antioxidant effect Effects 0.000 description 9
- 239000003054 catalyst Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 239000002966 varnish Substances 0.000 description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 8
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 8
- 229930185605 Bisphenol Natural products 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 238000005227 gel permeation chromatography Methods 0.000 description 7
- 229910052698 phosphorus Inorganic materials 0.000 description 7
- 239000011574 phosphorus Substances 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000003814 drug Substances 0.000 description 6
- HYBBIBNJHNGZAN-UHFFFAOYSA-N furfural Chemical compound O=CC1=CC=CO1 HYBBIBNJHNGZAN-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 5
- IYJMFNNRVITCDG-UHFFFAOYSA-N biphenylene;phenol Chemical group OC1=CC=CC=C1.C1=CC=C2C3=CC=CC=C3C2=C1 IYJMFNNRVITCDG-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000009833 condensation Methods 0.000 description 5
- 230000005494 condensation Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 5
- JECYUBVRTQDVAT-UHFFFAOYSA-N 2-acetylphenol Chemical compound CC(=O)C1=CC=CC=C1O JECYUBVRTQDVAT-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 229940106691 bisphenol a Drugs 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 150000004780 naphthols Chemical class 0.000 description 4
- CRSOQBOWXPBRES-UHFFFAOYSA-N neopentane Chemical compound CC(C)(C)C CRSOQBOWXPBRES-UHFFFAOYSA-N 0.000 description 4
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 4
- 239000005011 phenolic resin Substances 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 4
- 238000001721 transfer moulding Methods 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 229920000305 Nylon 6,10 Polymers 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000012776 electronic material Substances 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000004611 light stabiliser Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- RDOXTESZEPMUJZ-UHFFFAOYSA-N methyl phenyl ether Natural products COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 3
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 150000003505 terpenes Chemical class 0.000 description 3
- 235000007586 terpenes Nutrition 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- CMZYGFLOKOQMKF-UHFFFAOYSA-N 1-(3,5-dimethylphenyl)-3,5-dimethylbenzene Chemical compound CC1=CC(C)=CC(C=2C=C(C)C=C(C)C=2)=C1 CMZYGFLOKOQMKF-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- 150000000345 2,6-xylenols Chemical class 0.000 description 2
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 2
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 2
- HDPBBNNDDQOWPJ-UHFFFAOYSA-N 4-[1,2,2-tris(4-hydroxyphenyl)ethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 HDPBBNNDDQOWPJ-UHFFFAOYSA-N 0.000 description 2
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XMUZQOKACOLCSS-UHFFFAOYSA-N [2-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=CC=C1CO XMUZQOKACOLCSS-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 239000004918 carbon fiber reinforced polymer Substances 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229940125904 compound 1 Drugs 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical group O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 230000006837 decompression Effects 0.000 description 2
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 2
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 239000011120 plywood Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- 230000003252 repetitive effect Effects 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- DUXYWXYOBMKGIN-UHFFFAOYSA-N trimyristin Chemical compound CCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCC DUXYWXYOBMKGIN-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- 125000006839 xylylene group Chemical group 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- CFZAEHZKTCVBOQ-UHFFFAOYSA-N (2,3-dimethylphenyl) dihydrogen phosphate Chemical compound CC1=CC=CC(OP(O)(O)=O)=C1C CFZAEHZKTCVBOQ-UHFFFAOYSA-N 0.000 description 1
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- XOJWBPXKYGHCLN-UHFFFAOYSA-N 1,1'-biphenyl;methanol Chemical compound OC.OC.C1=CC=CC=C1C1=CC=CC=C1 XOJWBPXKYGHCLN-UHFFFAOYSA-N 0.000 description 1
- KCZIUKYAJJEIQG-UHFFFAOYSA-N 1,3,5-triazin-2-amine Chemical compound NC1=NC=NC=N1 KCZIUKYAJJEIQG-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JWMKUKRBNODZFA-UHFFFAOYSA-N 1-ethoxy-2-methylbenzene Chemical compound CCOC1=CC=CC=C1C JWMKUKRBNODZFA-UHFFFAOYSA-N 0.000 description 1
- ALLIZEAXNXSFGD-UHFFFAOYSA-N 1-methyl-2-phenylbenzene Chemical group CC1=CC=CC=C1C1=CC=CC=C1 ALLIZEAXNXSFGD-UHFFFAOYSA-N 0.000 description 1
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 1
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 1
- METWAQRCMRWDAW-UHFFFAOYSA-N 2,6-diethylphenol Chemical class CCC1=CC=CC(CC)=C1O METWAQRCMRWDAW-UHFFFAOYSA-N 0.000 description 1
- ATGFTMUSEPZNJD-UHFFFAOYSA-N 2,6-diphenylphenol Chemical compound OC1=C(C=2C=CC=CC=2)C=CC=C1C1=CC=CC=C1 ATGFTMUSEPZNJD-UHFFFAOYSA-N 0.000 description 1
- GJDRKHHGPHLVNI-UHFFFAOYSA-N 2,6-ditert-butyl-4-(diethoxyphosphorylmethyl)phenol Chemical compound CCOP(=O)(OCC)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 GJDRKHHGPHLVNI-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- BLDLRWQLBOJPEB-UHFFFAOYSA-N 2-(2-hydroxyphenyl)sulfanylphenol Chemical compound OC1=CC=CC=C1SC1=CC=CC=C1O BLDLRWQLBOJPEB-UHFFFAOYSA-N 0.000 description 1
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- KTIRRDOBTNZKNL-UHFFFAOYSA-N 2-bromo-6-ethylphenol Chemical compound CCC1=CC=CC(Br)=C1O KTIRRDOBTNZKNL-UHFFFAOYSA-N 0.000 description 1
- YXZPTVOCJLCMRO-UHFFFAOYSA-N 2-bromo-6-methylphenol Chemical class CC1=CC=CC(Br)=C1O YXZPTVOCJLCMRO-UHFFFAOYSA-N 0.000 description 1
- KUNNUNBSGQSGDY-UHFFFAOYSA-N 2-butyl-6-methylphenol Chemical compound CCCCC1=CC=CC(C)=C1O KUNNUNBSGQSGDY-UHFFFAOYSA-N 0.000 description 1
- MCRZWYDXIGCFKO-UHFFFAOYSA-N 2-butylpropanedioic acid Chemical compound CCCCC(C(O)=O)C(O)=O MCRZWYDXIGCFKO-UHFFFAOYSA-N 0.000 description 1
- XNJCFOQHSHYSLG-UHFFFAOYSA-N 2-chloro-6-ethylphenol Chemical class CCC1=CC=CC(Cl)=C1O XNJCFOQHSHYSLG-UHFFFAOYSA-N 0.000 description 1
- CSDSSGBPEUDDEE-UHFFFAOYSA-N 2-formylpyridine Chemical compound O=CC1=CC=CC=N1 CSDSSGBPEUDDEE-UHFFFAOYSA-N 0.000 description 1
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical compound OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 description 1
- GYQKCIFUWFVFPT-UHFFFAOYSA-N 2-methyl-1-phenoxy-3-phenylbenzene Chemical group C1=CC=C(C=2C=CC=CC=2)C(C)=C1OC1=CC=CC=C1 GYQKCIFUWFVFPT-UHFFFAOYSA-N 0.000 description 1
- FEAUPVYXIGDOPU-UHFFFAOYSA-N 2-methyl-1-phenyl-3-propoxybenzene Chemical group C(CC)OC=1C(=C(C=CC=1)C1=CC=CC=C1)C FEAUPVYXIGDOPU-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- TVOICAOPKRBXDY-UHFFFAOYSA-N 2-methyl-6-(2-methylphenyl)phenol Chemical compound CC1=CC=CC(C=2C(=CC=CC=2)C)=C1O TVOICAOPKRBXDY-UHFFFAOYSA-N 0.000 description 1
- KFETUQFRWIVAMU-UHFFFAOYSA-N 2-methyl-6-propan-2-ylphenol Chemical class CC(C)C1=CC=CC(C)=C1O KFETUQFRWIVAMU-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 150000005351 2-phenylphenols Chemical class 0.000 description 1
- LCHYEKKJCUJAKN-UHFFFAOYSA-N 2-propylphenol Chemical compound CCCC1=CC=CC=C1O LCHYEKKJCUJAKN-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- XOUQAVYLRNOXDO-UHFFFAOYSA-N 2-tert-butyl-5-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(O)=C1 XOUQAVYLRNOXDO-UHFFFAOYSA-N 0.000 description 1
- GPNYZBKIGXGYNU-UHFFFAOYSA-N 2-tert-butyl-6-[(3-tert-butyl-5-ethyl-2-hydroxyphenyl)methyl]-4-ethylphenol Chemical compound CC(C)(C)C1=CC(CC)=CC(CC=2C(=C(C=C(CC)C=2)C(C)(C)C)O)=C1O GPNYZBKIGXGYNU-UHFFFAOYSA-N 0.000 description 1
- KHMMKULJQXMDPR-UHFFFAOYSA-N 3-(1-carboxyicosan-2-ylsulfanyl)henicosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCC(CC(O)=O)SC(CC(O)=O)CCCCCCCCCCCCCCCCCC KHMMKULJQXMDPR-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- AORTZIIKTZPIQU-UHFFFAOYSA-N 3-butyl-4-methyloxolane-2,5-dione Chemical class CCCCC1C(C)C(=O)OC1=O AORTZIIKTZPIQU-UHFFFAOYSA-N 0.000 description 1
- YGHRJJRRZDOVPD-UHFFFAOYSA-N 3-methylbutanal Chemical compound CC(C)CC=O YGHRJJRRZDOVPD-UHFFFAOYSA-N 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical class CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- CIRRFAQIWQFQSS-UHFFFAOYSA-N 6-ethyl-o-cresol Chemical class CCC1=CC=CC(C)=C1O CIRRFAQIWQFQSS-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- BEJAPDMURHOPJR-UHFFFAOYSA-N C(C)C(=O)CC.C1(=CC=CC=C1)O Chemical compound C(C)C(=O)CC.C1(=CC=CC=C1)O BEJAPDMURHOPJR-UHFFFAOYSA-N 0.000 description 1
- DUFZRXDFQJLTES-UHFFFAOYSA-N CC(C=CC=C1)=C1C1=CC=CC=C1.Cl.Cl Chemical group CC(C=CC=C1)=C1C1=CC=CC=C1.Cl.Cl DUFZRXDFQJLTES-UHFFFAOYSA-N 0.000 description 1
- XNTMJPMCVPXLTL-UHFFFAOYSA-N CC=1C(=C(C=CC1)[P])C Chemical compound CC=1C(=C(C=CC1)[P])C XNTMJPMCVPXLTL-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical class NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000003508 Dilauryl thiodipropionate Substances 0.000 description 1
- MUXOBHXGJLMRAB-UHFFFAOYSA-N Dimethyl succinate Chemical compound COC(=O)CCC(=O)OC MUXOBHXGJLMRAB-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004836 Glue Stick Substances 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- 101000823778 Homo sapiens Y-box-binding protein 2 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical class NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- JQVDAXLFBXTEQA-UHFFFAOYSA-N N-butyl-butylamine Natural products CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- RZJRJXONCZWCBN-UHFFFAOYSA-N alpha-octadecene Natural products CCCCCCCCCCCCCCCCCC RZJRJXONCZWCBN-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- XUBGOZKPKZIZSD-UHFFFAOYSA-N azane decyl(trimethyl)azanium Chemical compound N.CCCCCCCCCC[N+](C)(C)C XUBGOZKPKZIZSD-UHFFFAOYSA-N 0.000 description 1
- 229940125717 barbiturate Drugs 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- YKGYQYOQRGPFTO-UHFFFAOYSA-N bis(8-methylnonyl) hexanedioate Chemical compound CC(C)CCCCCCCOC(=O)CCCCC(=O)OCCCCCCCC(C)C YKGYQYOQRGPFTO-UHFFFAOYSA-N 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000012241 calcium silicate Nutrition 0.000 description 1
- CJZGTCYPCWQAJB-UHFFFAOYSA-L calcium stearate Chemical compound [Ca+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O CJZGTCYPCWQAJB-UHFFFAOYSA-L 0.000 description 1
- 235000013539 calcium stearate Nutrition 0.000 description 1
- 239000008116 calcium stearate Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- RLGQACBPNDBWTB-UHFFFAOYSA-N cetyltrimethylammonium ion Chemical class CCCCCCCCCCCCCCCC[N+](C)(C)C RLGQACBPNDBWTB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000006071 cream Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- GVJHHUAWPYXKBD-UHFFFAOYSA-N d-alpha-tocopherol Natural products OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000002305 electric material Substances 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 150000002357 guanidines Chemical class 0.000 description 1
- 229940083094 guanine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000005204 hydroxybenzenes Chemical class 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- WFKAJVHLWXSISD-UHFFFAOYSA-N isobutyramide Chemical compound CC(C)C(N)=O WFKAJVHLWXSISD-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 208000037805 labour Diseases 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229940038384 octadecane Drugs 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- YTXCAJNHPVBVDJ-UHFFFAOYSA-N octadecyl propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CC YTXCAJNHPVBVDJ-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000010412 perfusion Effects 0.000 description 1
- BOTNYLSAWDQNEX-UHFFFAOYSA-N phenoxymethylbenzene Chemical compound C=1C=CC=CC=1COC1=CC=CC=C1 BOTNYLSAWDQNEX-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical class OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- CFZWRTOYIGDZEL-UHFFFAOYSA-N propoxymethylbenzene Chemical compound [CH2]CCOCC1=CC=CC=C1 CFZWRTOYIGDZEL-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellityc acid Natural products OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 230000001225 therapeutic effect Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229960001295 tocopherol Drugs 0.000 description 1
- 229930003799 tocopherol Natural products 0.000 description 1
- 235000010384 tocopherol Nutrition 0.000 description 1
- 239000011732 tocopherol Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- GVJHHUAWPYXKBD-IEOSBIPESA-N α-tocopherol Chemical compound OC1=C(C)C(C)=C2O[C@@](CCC[C@H](C)CCC[C@H](C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-IEOSBIPESA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C08L71/12—Polyphenylene oxides
- C08L71/126—Polyphenylene oxides modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyethers (AREA)
Abstract
The objective of the present invention is to provide: a polyvalent phenylene ether novolac resin that provides a cured product having high heat resistance and superior dielectric properties; and an epoxy resin composition containing same. In the polyvalent phenylene ether novolac resin, a poly(phenylene ether) resin having a molecular weight of 400-8000 (weight average molecular weight; in terms of polystyrene) is bonded by means of an organic group.
Description
Technical field
The present invention relates to be suitable for requirement thermostability, the phenol of the electric and electronic material applications of electrical characteristic (dielectric property etc.)
Novolac resin, composition epoxy resin and its solidfied material.
Background technology
Composition epoxy resin is due to the excellent electrical characteristic of operability and its solidfied material, thermostability, adhesivity, moisture-proof
Property (resistance to water) etc. and be widely used in the fields such as electrical and electronic parts, structure material material, adhesive, coating.
But, in recent years, in electric and electronic field, with the development in the field, it is desirable to further improve with resin group
Moisture-proof, adaptation, dielectric property headed by the high purity of compound, for making filler (inorganic or organic filler) highly fill out
The lowering viscousity that fills, for shortening each characteristic such as the raising reactivity of molding cycle.In addition, as structural material, navigating in aviation
The material of light weight and good mechanical performance is required in its material, outdoor activity apparatus purposes etc..
Prior art literature
Patent documentation
Patent documentation 1:Japanese Unexamined Patent Publication 2003-12796 publications
Patent documentation 2:Japanese Unexamined Patent Publication 2006-291178 publications
The content of the invention
Invent problem to be solved
In encapsulating semiconductor field, with the transition of the quasiconductor, substrate (substrate itself or its periphery material) is gradually thin
Stratification, stacked, systematization, three dimensional stress and complicate, it is desirable to the desirable characteristics such as very high-caliber thermostability, high fluidity.
Additionally, in order to realize high-speed communication, requiring excellent dielectric property to quasiconductor periphery material.During the dielectric property difference, due to
Produce delay, the noise of the signal of telecommunication, it is difficult to realize the high speed of the signal of telecommunication.
In such field, especially for the network substrate of server etc. for, it is desirable to dielectric in high frequency is special
Property.For the network environment of constant evolution year by year, low-dielectric loss angle tangent in dielectric property, is the particularly important is.At this
Polyphenylene oxide resin is in most cases mainly used in planting purposes, various researchs have been carried out.
Polyphenylene oxide resin is characterised by its very excellent dielectric property, but in order to embody its dielectric property, functional group
Seldom, its thermostability is low becomes problem.
According to report in recent years, for such problem, the methods (a) such as introducing functional group carried out, or be set to double officials
Can the research such as (b), (a) in be difficult to introduce functional group, thus almost do not obtain practical, though have some to change in (b)
It is kind, but still be inadequate level.
In the face of such problem, we complete the present invention.
That is, it is an object of the invention to provide polynary phenylene ether novolac resin, containing the polynary phenylene ether phenol
The composition epoxy resin and its solidfied material of Novolac resin, the polynary phenylene ether novolac resin can be provided in holding
The solidfied material of excellent heat resistance while excellent dielectric property.
Means for solving the problem
As a result the present inventor completes the present invention in view of above-mentioned present situation, has made intensive studies.
That is, the present invention is provided:
[1] a kind of polynary phenylene ether novolac resin, which passes through (weight average molecular weight, to press molecular weight 400~8000
Polystyrene conversion) polyphenylene oxide resin by organic group connect and obtain;
[2] the polynary phenylene ether novolac resin as described in [1], wherein, organic group by following formula (1) extremely
A kind of few expression;
(in formula, * parts are bonded with the benzene skeleton of polyphenylene oxide resin.)
[3] the polynary phenylene ether novolac resin as described in [1] or [2], wherein, the polyphenylene oxide described in [1] or [2]
Resin is the oxypolymer of biphenyl phenols or bisphenols and Phenol compounds;
[4] a kind of composition epoxy resin, which contains polynary any one of at least one above-mentioned item [1]~[3]
Phenylene ether novolac resin;
[5] a kind of solidfied material, which is obtained by making the epoxy resin composition described in above-mentioned item [4].
Invention effect
Not only had using the solidfied material of the composition epoxy resin of the polynary phenylene ether novolac resin of the present invention
High dielectric property, and excellent thermostability is shown, with electrical and electronic parts insulant and plywood (printed wiring
Plate, increasing layer substrate etc.), it is the various composites headed by CFRP, adhesive, useful in coating etc..Especially as protection quasiconductor
The semiconductor-encapsulating material of element is extremely useful.
Specific embodiment
The polynary phenylene ether novolac resin of the present invention has the resin of polyphenyl ether structure organic by alkylidene etc.
The structure that group (also referred to as binding groups or linking group below) is bonded.That is, polynary phenylene ether novolaks of the invention
Resin is the resin of the structure of the resin with polyphenyl ether structure and novolac resin.
The resin of polyphenyl ether structure specifically refers to the resin described in above-mentioned patent documentation 1, patent documentation 2, usually diformazan
The oxypolymer of base phenol or pseudocuminol, but it is also possible to enumerate xenol the resin as described in patent documentation 2
Oxypolymer of Phenol compounds such as class or bisphenols and 2,6- xylenols etc..
Here, as bisphenols, it is possible to use such as bisphenols such as bisphenol-A, Bisphenol F, bisphenol S, bis-phenol I.As commercially available
Product, can enumerate the PPO (registered trade mark) of SABIC, especially consider from the scope of molecular weight, preferred SA120, SA90-100
Deng.In addition, especially considering from multiple functionalized degree, difunctional material as SA90-100 is preferably used.As biphenyl
Phenols, can enumerate the compound of such as following formula.
(in formula, R1Each independent substituent group is represented, is hydrogen atom, halogen atom, the alkyl of carbon number 1~3, virtue
Alkyl, aryl, alkoxyl, t represent 1~4 integer.)
As Phenol compounds, orthoresol, 2,6- xylenols, 2,3,6-TMP, 2- ethyls can be enumerated
Phenol, 2- methyl -6- ethyl -phenols, 2,6- diethyl phenols, 2- n-pro-pyl phenol, 2- ethyl -6- n-pro-pyl phenol, 2- first
Base -6- chlorophenols, 2- methyl -6- bromophenols, 2- methyl -6- isopropyl-phenols, 2- methyl -6- n-pro-pyl phenol, 2- ethyl -6-
Bromophenol, 2- methyl -6- normal-butyl phenol, 2,6- diη-propyl phenol, 2- ethyl -6- chlorophenols, 2- methyl -6- phenyl benzene
Phenol, 2- phenylphenols, 2,6- diphenyl phenol, 2,6- double (4- fluorophenyls) phenol, 2- methyl -6- tolyl phenol, 2,6- bis-
The unitary phenolic compounds such as tolyl phenol.
The molecular weight of the polyphenylene oxide resin for using be 400~8000 (weight average molecular weight, gel permeation chromatography, by polyphenyl second
Alkene convert), be preferably 500~4000.
When the molecular weight of the resin for using is too high, to the compatibility in a solvent and the compatibility of other resins in terms of make
Into obstacle, occur to separate when including solidfied material, cause to solidify the skewness of bad, characteristic, thus it is not preferred.In addition, point
Son amount hour, when especially about 200, does not show the difference of larger dielectric property compared with conventional novolac resin,
Therefore it is not preferred.
As the control of these molecular weight, not only connected by merely making molecule, it is also possible to which enumerating can be by being based on
The depolymerization of free radical is controlling the example of molecular weight.
In the polynary phenylene ether novolac resin of the present invention, connect phenylene structure by binding groups, be consequently formed
The form (for convenience's sake, being all expressed as novolaks) of novolaks or similar novolaks.
Used as binding groups, preferred carbon number is 1~20 alkyl.Methylene, ethylidene, Asia third can specifically be enumerated
Base, hexamethylene diyl, phenylmethylene, phenylene dimethylene, ethenylidene dimethylene, phenylene acetylene, sub- benzene
Double propylidene of base etc..
As the binding groups in the present invention, the structure shown in particularly preferred following formula (1).
(in formula, * parts are bonded with the benzene skeleton of polyphenylene oxide resin.)
As the bonding method of these linking groups, it is possible to use raw material polyphenylene oxide resin and various aldehydes, ketone, benzyl
Methylene compound, the compound with vinyl benzene structure etc. into key compound, in the presence of solvent in acid or alkaline bar
Heat to synthesize under part.
Here, as the concrete example into key compound, formaldehyde, acetaldehyde, Biformyl, propionic aldehyde, isovaleral, pungent can be enumerated
The aldehydes such as aldehyde, furfural, benzaldehyde, pyridine carboxaldehyde;The ketones such as acetone, butanone, Ketocyclopentane, Ketohexamethylene;Benzene dimethanol, dihalo
Dimethylbenzene (halogen:Chlorine, bromine etc. can be enumerated), bis-alkoxy methylbenzene (xylylene double alkyl ether, be specially bi-methoxy
Methylbenzene, double ethoxyl methyl benzene, double propoxy methyl benzene, Ramulus Uncariae Cum Uncis epoxide methylbenzene, double phenoxymethyl benzene, diene propoxyl group
Alkoxy methyl benzene of the carbon numbers such as methylbenzene 1~6 etc..Particularly preferred benzene dimethanol in this synthetic reaction, xylene dichloride,
Bi-methoxy methylbenzene.It should be noted that the configuration of substituent group can be it is o-, m-, centering any one, from thermostability, machine
The balance of tool characteristic considers, particularly preferably to formula.) etc. xylylene compounds;Biphenyl dimethanol, double halogenated methyl biphenyl
(halogen:Chlorine, bromine etc. can be enumerated), bis-alkoxy methyl biphenyl (specially bi-methoxy methyl biphenyl, double ethoxyl methyls connection
The carbon such as benzene, double propoxy methyl biphenyl, Ramulus Uncariae Cum Uncis epoxide methyl biphenyl, double phenoxymethyl biphenyl, bisallyloxylmethyl biphenyl
Alkoxy methyl biphenyl of atomic number 1~6 etc.) etc. benzyl methylene compound, the divinyl such as biphenyl bismethylene compound class
The compound with vinyl benzene structure such as base benzene.
In this synthetic reaction, particularly preferred biphenyl dimethanol, dichloride methyl biphenyl, bi-methoxy methyl biphenyl.
The polynary phenylene ether novolac resin of the present invention can be by by raw material polyphenylene oxide resin and into key compound
Heated after catalyst being added as needed in the mixed liquor of solvent and obtained.
Alternatively, it is also possible to be slowly added into in the solution of raw material polyphenylene oxide resin and catalyst as needed is dissolved with
Key compound.Response time is usually 3~150 hours, usually 40~150 DEG C of reaction temperature.So obtained polynary sub- benzene
Base ether novolac resin can also be used in the case of unpurified according to purposes, but generally after the completion of reaction as needed
Reactant mixture is neutralized etc. and to be processed, then by crystallization or solvent is removed under heating decompression and carried out after purification
For various uses.Further, since the mean molecule quantity of the polynary phenylene ether novolac resin obtained by reacting and making increases
Greatly, therefore the softening point of resin becomes very high, it is difficult to take out from reaction vessel, thus can utilize following (a)~(d's)
Method.
A () is by using water-soluble solvent dilution after, mixes with water.
B () is diluted by using the alcohols (methanol, ethanol, propanol, butanol etc.) that carbon number is 1~4, and carry out
Method obtained from reprecipitation.
C water (heating decompression etc.) that () is contained in only removing the solvent after reaction purification terminates, then with solvent cut
The method that the form of the varnish of (molten drug カ ッ ト) is taken out from reaction vessel.(as resin concentration, preferably 10~90 weights
Amount %, more preferably 10~80 weight %, particularly preferably 30~80 weight %).In most cases especially pay attention to viscosity, from which
From the aspect of mobility, the viscosity at 25 DEG C is preferably below 1000Pas, more preferably below 100Pas.Viscosity is too high
When, no mobility when in use, thus be difficult to sometimes take out or be difficult to and other mixed with resin.It should be noted that closing
Be described below in the solvent that can be used (be hardening resin composition varnish item described in solvent).
D () is mixed with other resins (resin described in the item of hardening resin composition firming agent described later), with
The method that the form of curing agent composition is taken out from reaction vessel.(mixed proportion is with other resins and the resin of the present invention
Weight ratio meter is preferably 90:10~30:70th, more preferably 80:20~30:70.When the use level of the resin of the present invention is few, dielectric
Characteristic is not greatly improved.)
In addition, raw material polyphenylene oxide resin is preferably 1.2 with the reaction mol ratio (hydroxyl equivalent ratio) into key compound:1~
20:1st, more preferably 1.5:1~15:1st, particularly preferably 1.5:1~10:1.Reaction mol ratio is less than 1.2:When 1, i.e., relative to
Into key compound 1, when raw material polyphenylene oxide resin is less than 1.2, the molecule quantitative change of the polynary phenylene ether novolac resin of generation
It is too much, therefore dissolubility in a solvent and be deteriorated with the compatibility of other resins sometimes.In addition, being more than 20:When 1,
I.e. relative to into key compound 1, when raw material polyphenylene oxide resin is more than 20, thermostability is deteriorated sometimes.
As can the present invention polynary phenylene ether novolac resin synthesis used in solvent, can enumerate
Toluene, dimethylbenzene, methyl iso-butyl ketone (MIBK), Ketohexamethylene, Ketocyclopentane, butanone etc., but not limited to this, can be used alone can also
And with two or more.As the solvent that can be used together, in addition to above-mentioned each solvent, methanol, ethanol, isopropyl can also be enumerated
The alcohols such as alcohol, butanol;The ketones such as acetone;Ethyl acetate, butyl acetate, carbitol acetate, propylene glycol methyl ether acetate etc.
Esters;The ethers such as tetrahydrofuran, dioxane;N-Methyl pyrrolidone, N,N-dimethylformamide, N, N- dimethyl second
Nitrogen-containing solvents such as amide etc..Relative to raw material polyphenylene oxide resin and 100 weight portion of total amount into key compound, the use of solvent
Amount is usually 5~500 weight portions, is preferably the scope of 10~400 weight portions.
As catalyst, acidic catalyst is substantially preferably used.When being benzyl halide into key compound, even if without urging
Agent successfully can also be reacted, and from from the viewpoint of easy purification afterwards, preferably use without catalyst or hardly.Using urging
During agent, as the concrete example of acidic catalyst, the inorganic acids such as hydrochloric acid, sulphuric acid, phosphoric acid can be enumerated;Oxalic acid, toluenesulfonic acid,
The organic acids such as acetic acid;The heteropoly acids such as wolframic acid;Other displays such as active hargil, mineral acid, stannic chloride, zinc chloride, iron chloride are sour
Property organic and inorganic Barbiturates etc. be generally used for acidic catalyst of novolac resin manufacture etc..These catalyst are not limited to
The above-mentioned material enumerated, can be used alone and and can also use two or more.The usage amount of catalyst is relative to raw material polyphenylene oxide tree
Fat is usually 0.005~2.0 times mole, is preferably 0.01~1.1 times mole of scope, or relative to raw material polyphenylene oxide resin
100g is preferably 0.1~50g, more preferably 0.3~20g.Reaction when catalytic amount is few carries out slack-off.Additionally, produce needing height
Reaction, reaction under temperature can not proceed to the problem such as last, thus not preferred.In addition, when catalytic amount is excessive, in neutralization, pure
Sometimes a large amount of labours are expended in the post processings such as change.
It should be noted that when corrosive gas is generated due to reaction, preferably by suction, or send into the inertia such as nitrogen
Gas and from system discharge.
So obtained polynary phenylene ether novolac resin by the formula represented with following formula (A), below
Illustrate the concrete example of its representative structure formula.
In resulting polynary phenylene ether novolac resin, by the polyphenylene oxide resin of the exemplary record in following B
Benzene skeleton connected by the linking group of exemplary record in following A, above-mentioned linking group is by the same of polyphenylene oxide resin
Benzene skeleton in one molecule is connected to each other, or will connect between the benzene skeleton of plural polyphenylene oxide resin molecule.
And, the part-structure around linking group for example forms structure as following formula (A).It should be noted that
Following benzene skeletons represent the benzene skeleton in polyphenylene oxide resin molecule.
(in above-mentioned formula, P represents the residue of polyphenylene oxide resin, and X represents the linking group represented by following formula (1), and R is represented
Hydrogen atom or carbon number are 1~3 alkyl, and * represents that hydrogen atom or above-mentioned X, n represent 1~2 integer.)
Here, the residue of above-mentioned polyphenylene oxide resin can be further via X at another benzene skeleton and polyphenylene oxide resin
Benzene skeleton connection in molecule.
A:
(in formula, * parts are bonded with the benzene skeleton of polyphenylene oxide resin.)
B:
(n represents repetitives, represents 0~50 integer.)
(n represents repetitives, represents 0~50 integer.)
Resin-like (or powder body), solvable of the polynary phenylene ether novolac resin of the so obtained present invention for brown
In organic solvent and it is also used as the resin operated by varnish.
The hydroxyl equivalent of the polynary phenylene ether novolac resin of the so obtained present invention preferably 400~6000,
Particularly preferably 500~5000.
As weight average molecular weight, preferably 600~50000, particularly preferably 700~25000.
The present invention polynary phenylene ether novolac resin can be directly used as thermoplastic (or its raw material) or
Mix to improve characteristic or the raw material as epoxy resin or its firming agent with thermoplastic.
Hereinafter, the composition epoxy resin to the present invention containing polynary phenylene ether novolac resin of the invention
(being also referred to as hardening resin composition below) is described.In the hardening resin composition of the present invention, epoxy resin is made
Use for neccessary composition.
For the hardening resin composition of the present invention, it is the group using epoxy resin-firming agent as neccessary composition
Compound, it is necessary to containing polynary phenylene ether novolac resin as epoxy resin firming agent.In addition, as needed containing solid
Change accelerator.
As the concrete example of the epoxy resin that can be used in the hardening resin composition of the present invention, phenol can be enumerated
Novolac type epoxy resin, bisphenol A type epoxy resin, biphenyl type epoxy resin, tritan. type epoxy resin, phenol aralkyl
Type epoxy resin etc..Specifically, can enumerate bisphenol-A, bisphenol S, thiodiphenol, bisphenol fluorene, terpene diphenol, 4,4 '-biphenyl
Phenol, 2,2 '-xenol, 3,3 ', 5,5 '-tetramethyl-[1,1 '-biphenyl] -4,4 '-glycol, hydroquinone, resorcinol, naphthalene glycol, three
(phenol, alkyl substituted phenol, naphthols, alkyl replace for (4- hydroxyphenyl) methane, 1,1,2,2- tetra- (4- hydroxyphenyl) ethane, phenols
Naphthols, dihydroxy benzenes, dihydroxy naphthlene etc.) with formaldehyde, acetaldehyde, benzaldehyde, hydroxy benzaldehyde, salicylaldhyde, to hydroxyl
1-Phenylethanone., o-hydroxyacetophenone, dicyclopentadiene, furfural, 4,4 '-bis- (chloromethyls) -1,1 '-biphenyl, 4,4 '-bis- (methoxies
Ylmethyl) -1,1 '-biphenyl, double (chloromethyl) benzene of 1,4-, double (methoxy) benzene of 1,4- etc. condensation polymer and theirs is modified
Thing;The halogenated bisphenol class such as tetrabromobisphenol A, by derived from alcohols glycidyl ether compound, alicyclic epoxy resin, glycidyl
Amine epoxy resin, glycidyl esters based epoxy resin etc.;Silsesquioxane based epoxy resin (chain, ring-type, scalariform or
There is in the siloxane structure of wherein at least mixed structure of more than two kinds the ring of glycidyl and/or 7-oxa-bicyclo[4.1.0 structure
Oxygen tree fat) etc. solid-state or liquid-state epoxy resin, but not limited to this.
As the firming agent that the hardening resin composition of the present invention contains, except the polynary phenylene ether of the above-mentioned present invention
Other firming agent are can be used together beyond novolac resin.And with the case of, can be with the polynary sub- benzene of the invention described above
Base ether novolac resin is used with the mode of the curing agent composition of other firming agent.And with the case of, it is of the invention
More than the shared ratio in whole composition epoxy resins of polynary polyphenylene oxide novolac resin preferably 30 weight %, especially
It is more than preferably 40 weight %.
As the firming agent that can be used together, such as phenol resin, phenolic compound, aminated compoundss, anhydrides can be enumerated
Compound, amides compound, carboxylic acid compound etc..
It is as the concrete example of the firming agent that can be used, as described below.
Phenol resin, phenolic compounds can be enumerated:Bisphenol-A, Bisphenol F, bisphenol S, bisphenol fluorene, terpene diphenol, 4,4 '-xenol,
2,2 '-xenol, 3,3 ', 5,5 '-tetramethyl-[1,1 '-biphenyl] -4,4 '-glycol, hydroquinone, resorcinol, naphthalene glycol, three (4-
Hydroxyphenyl) methane, 1,1,2,2- tetra- (4- hydroxyphenyl) ethane, phenols (phenol, alkyl substituted phenol, naphthols, alkyl-substituted naphthaline
Phenol, dihydroxy benzenes, dihydroxy naphthlene etc.) and formaldehyde, acetaldehyde, benzaldehyde, hydroxy benzaldehyde, salicylaldhyde, para hydroxybenzene
Ethyl ketone, o-hydroxyacetophenone, dicyclopentadiene, furfural, 4,4 '-bis- (chloromethyls) -1,1 '-biphenyl, 4,4 '-bis- (methoxyl groups
Methyl) -1,1 '-biphenyl, 1,4 '-bis- (chloromethyl) benzene, 1,4 '-bis- (methoxy) benzene etc. condensation polymer and theirs is modified
Thing;The halogenated bisphenol class such as tetrabromobisphenol A;The condensation substance of terpenes and phenols;Deng polyatomic phenol, but not limited to this.They can be single
Solely use can also use two or more.
As preferred phenol resin, from from the aspect of dielectric constant, phenol aralkyl resin can be enumerated and (there are aromatic series
The resin of alkylen structures), at least one structure being particularly preferably characterized by phenol, naphthols, cresol and
It is that at least one resin in benzene structure, biphenyl structural, naphthalene structure (specifically can be with as the alkylene base portion of its connecting portion
Enumerate xylok, naphthols xylok, phenol biphenylene novolac resin, cresol-biphenylene novolac resin, phenol-
Naphthol novolak varnish gum etc.).
Aminated compoundss, amides compound can be enumerated:Diaminodiphenyl-methane, diethylenetriamines, Sanya second
Urotropine, DADPS, isophorone diamine, dicyandiamide, the polyamide synthesized by linolenic dimer and ethylenediamine
The nitrogen-containing compounds such as resin, but not limited to this.These can be used alone can also use it is two or more.
Anhydrides compound, carboxylic acid compound can be enumerated:Phthalic anhydride, trimellitic anhydride, Pyromellitic Acid
Acid anhydride, maleic anhydride, tetrabydrophthalic anhydride, methyl tetrahydrophthalic anhydride, methylnadic anhydride, carbic anhydride,
Hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, ethylene-dimalonic acid acid anhydride, bicyclic [2.2.1] heptane -2,3- dioctyl phthalate
The anhydride such as acid anhydride, methyl bicycle [2.2.1] heptane -2,3- dicarboxylic acid anhydrides, hexamethylene -1,3,4- tricarboxylic acid -3,4- acid anhydrides;By various
The carboxylic acid resin that the additive reaction of alcohol, carbinol-modified polysiloxanes and above-mentioned anhydride is obtained, but not limited to this.These can be independent
It is two or more using using.
As the firming agent that other can be used together, imidazoles, trifluoroboranes-amine complex, the change of guanidine derivatives can be enumerated
Compound etc., but not limited to this.These can be used alone can also use it is two or more.
In the hardening resin composition of the present invention, the usage amount of firming agent is with the epoxy radicals relative to whole epoxy resin
Its functional group (hydroxyl) of 1 equivalent is preferably 0.7~1.2 equivalent when gauge.Relative to 1 equivalent of epoxy radicals be less than 0.7 equivalent when,
Or during more than 1.2 equivalent, solidify not exclusively sometimes and cannot get good solidification physical property.
In the hardening resin composition of the present invention, together with firming agent and curing accelerator can be used.As can make
The concrete example of curing accelerator, can enumerate the imidazoles such as 2-methylimidazole, 2- ethyl imidazol(e)s, 2-ethyl-4-methylimidazole
Class;The tertiary amines such as 2- (dimethylamino methyl) phenol, 1,8- diazabicyclos (5.4.0) hendecene -7;The phosphines such as triphenylphosphine;
The quaternary ammonium salts such as 4-butyl ammonium, triisopropyl methyl ammonium salt, trimethyldecylammonium ammonium salt, cetyltrimethyl ammonium salt;Triphenyl
BenzylSalt, triphenyl ethylSalt, the tetrabutylThe seasons such as saltSalt.(counter ion counterionsl gegenions of quaternary salt be halogen, organic acid from
Son, hydroxide ion etc., although do not specify, but particularly preferably organic acid ion, hydroxide ion.) can enumerate it is pungent
Metallic compounds such as sour stannum etc..In the case of using curing accelerator, relative to 100 weight portion of epoxy resin, make as needed
With 0.01~5.0 weight portion.
Composition can also be given as anti-flammability containing phosphorus-containing compound in the hardening resin composition of the present invention.As
Phosphorus-containing compound, can both be response type phosphorus-containing compound can also be addition type phosphorus-containing compound.As phosphorous chemical combination
The concrete example of thing, can enumerate trimethyl phosphate, triethyl phosphate, tricresyl phosphate, tricresyl phosphate (dimethylbenzene) ester, phosphoric acid first
Double (two (xylyl) phosphoric acid of phenylester diphenyl, tricresyl phosphate base ester -2,6- two (xylyl) ester, 1,3- phenylenes
Ester), the phosphoric acid ester such as 1,4- phenylenes double (two (xylyl) phosphate ester), 4,4 '-biphenyl (two (xylyl) phosphate ester);
Miscellaneous -10- phospho hetero phenanthrenes -10- the oxides of 9,10- dihydro-9-oxies, 10- (2,5- dihydroxy phenyls) -10H-9- oxa- -10- phosphas
The phosphines such as phenanthrene -10- oxides;Make epoxy resin and phosphorous epoxide obtained from the reactive with active hydrogen of above-mentioned phosphine, red
Phosphorus etc., but preferably phosphoric acid esters, phosphine or phosphorous epoxide, double (two (xylyl) phosphorus of particularly preferred 1,3- phenylenes
Acid esters), 1,4- phenylenes double (two (xylyl) phosphate ester), 4,4'- biphenyl (two (xylyl) phosphate ester) or phosphorous ring
Oxygen compound.The content of phosphorus-containing compound is preferably phosphorus-containing compound/whole epoxy resin=0.1~0.6 (weight ratio).0.1
When following, anti-flammability is not enough sometimes, and when more than 0.6, the hygroscopicity of solidfied material, dielectric property decline sometimes.
Additionally, antioxidant can be added as needed in the hardening resin composition of the present invention.As can use
Antioxidant, phenols, sulfur-bearing, phosphorous antioxidant can be enumerated.Antioxidant can be used alone or be applied in combination two kinds
More than.The usage amount of antioxidant is usual relative to 100 weight portion of resinous principle in the hardening resin composition of the present invention
For 0.008~1 weight portion, it is preferably 0.01~0.5 weight portion.
As the concrete example of phenol antioxidant, can illustrate:DBPC 2,6 ditertiary butyl p cresol, Butylated hydroxy benzene first
Ether, 2,6- di-t-butyl paraethyl phenols, β-(3,5- di-tert-butyl-hydroxy phenyls) propanoic acid stearyl ester, 3- (bis- uncles of 3,5-
Butyl -4- hydroxy phenyls) the different monooctyl ester of propanoic acid, double (just pungent the sulfenyl) -6- (4- hydroxyl -3,5- di-tert-butyl amidos) -1 of 2,4-,
The unitary phenols such as double [(pungent sulfenyl) the methyl]-orthoresols of 3,5- triazines, 2,4-;2,2 '-di-2-ethylhexylphosphine oxide (4- methyl-6-tert butyl
Phenol), 2,2 '-methylene-bis(4-ethyl-6-t-butyl phenol), 4,4 '-thiobiss (3 methy 6 tert butyl phenol), 4,
Double [the 3- (the 3- tert-butyl group -5- methyl -4- hydroxy phenyls) third of 4 '-butylidene-bis(3-methyl-6-t-butyl phenol), triethylene glycol
Acid esters], 1,6-HD-bis- [3- (3,5- di-tert-butyl-hydroxy phenyls) propionic ester], N, N '-hexamethylene bis (3,5- bis-
Tertiary butyl-4-hydroxy hydrocinnamamide), 2,2- thiodiethylenes double [3- (3,5- di-tert-butyl-hydroxy phenyls) propionic ester],
Double [1,1- dimethyl -2- { the β-(3- tertiary butyl-4-hydroxy -5- of diethyl 3,5-di-t-butyl-4-hydroxybenzyl phosphonate, 3,9-
Aminomethyl phenyl) propionyloxy ethyl] 2,4,8,10- tetra- oxaspiros [5.5] hendecanes, double (3,5- di-t-butyl -4- hydroxyl benzyls
Base sulfonic acid) bisphenols such as calcium;1,1,3- tri- (2- methyl -4- hydroxyl -5- tert-butyl-phenyls) butane, 1,3,5- trimethyls -
2,4,6- tri- (3,5- di-tert-butyl-4-hydroxyl benzyls) benzene, four-[methylene -3- (3 ', 5 '-di-t-butyl -4 '-hydroxyphenyl) third
Acid esters] methane, double [3,3 '-bis--(4 '-hydroxyl -3 '-tert-butyl-phenyl) butanoic acid] diol esters, three (3,5- di-t-butyl -4- hydroxyls
Base benzyl) isocyanuric acid ester, 1,3,5- tri- (3 ', 5 '-di-t-butyl -4 '-hydroxybenzyl) guanamine, 4,6- (1H, 3H, 5H)
The polymer electrolyte phenols such as triketone, tocopherol.
As the concrete example of sulphur-containing antioxidant, can illustrate:3,3 '-dilauryl thiodipropionate, 3,3 '-thio two
Two myristin of propanoic acid, 3,3 '-distearylthiodi-propionate etc..
As the concrete example of phosphorous antioxidant, can illustrate:Triphenyl phosphite, diphenyl phosphite isodecyl
Ester, phenyl ester diiso decyl ester, phosphorous acid three (nonyl phenyl) ester, phosphorous acid diiso decyl ester pentaerythritol ester, Asia
Tricresyl phosphate (2,4- di-tert-butyl-phenyls) ester, four base of phosphorous acid ring-type neopentane double (octadecyl) ester, phosphorous acid ring-types new penta
Double (2,4- di-tert-butyl-phenyls) esters of four base of alkane, four base of phosphorous acid ring-type neopentane are double (2,4- di-t-butyl -4- aminomethyl phenyls)
The phosphorous acid esters such as ester, double [the 2- tert-butyl group -6- methyl -4- { 2- (octadecane epoxide carbonyl) ethyl } phenyl] H-Phosphonates;
Miscellaneous -10- phospho hetero phenanthrenes -10- the oxides of 9,10- dihydro-9-oxies, 10- (3,5- di-tert-butyl-4-hydroxyl benzyls) -9,10- dihydros -
The oxygen such as 9- oxa- -10- phospho hetero phenanthrene -10- oxides, the miscellaneous -10- phospho hetero phenanthrenes -10- oxides of 10- decyloxy -9,10- dihydro-9-oxies
Miscellaneous phospho hetero phenanthrene is oxide-based etc..
These antioxidants individually can be used, it is also possible to combine two or more being used in combination.Particularly, it is excellent in the present invention
Select phosphorous antioxidant.
Additionally, light stabilizer can be added as needed in the hardening resin composition of the present invention.
As light stabilizer, preferred hindered amine light stabilizer, especially HALS etc..It is not particularly limited as HALS,
As typical case, can enumerate:Dibutyl amine 1,3,5- triazines N, N '-bis- (2,2,6,6- tetramethyl -4- piperidyl -1,6-
The condensation polymer of hexamethylene diamine and N- (2,2,6,6- tetramethyl -4- piperidyls) butylamine, dimethyl succinate -1- (2- ethoxys) -4-
Hydroxyl -2,2,6,6- tetramethyl piperidine condensation polymers, poly- [{ 6- (1,1,3,3- tetramethyl butyls) amino -1,3,5- triazine -2,4-
Diyl } { (2,2,6,6- tetramethyl -4- piperidyls) imino group } hexa-methylene { (2,2,6,6- tetramethyl -4- piperidyls) imido
Base }], [[3,5- double (1,1- dimethyl ethyls) -4- hydroxy phenyls] methyl] butylmalonic acid it is double (1,2,2,6,6- pentamethyls -
4- piperidyls) ester, double (2,2,6,6- tetramethyl -4- piperidyls) ester of decanedioic acid, the double (1,2,2,6,6- pentamethyl -4- of decanedioic acid
Piperidyl) ester, decanedioic acid double (1- octyloxy -2,2,6,6- tetramethyl -4- piperidyls) ester, 2- (3,5- di-t-butyl -4- hydroxyls
Benzyl) double (1,2,2,6,6- pentamethyl -4- piperidyls) esters of -2- n-butylmalonic acids etc..HALS only using one kind also can may be used
With and with two or more.
Additionally, resin glue can also be coordinated in the hardening resin composition of the present invention as needed.As bonding
Agent resin, can enumerate:Butyral resinoid, acetal-based resin, acrylic resin, epoxy-nylon-based resin, NBR- phenols
Resin, epoxy-NBR resinoids, polyamide-based resin, polyimide based resin, polysiloxanes resinoid etc., but not limited to this.
The use level of resin glue does not preferably damage the anti-flammability of solidfied material, the scope of thermostability, relative to 100 weight of resinous principle
Amount part generally according to need using 0.05~50 weight portion, be preferably 0.05~20 weight portion.
Inorganic filler can be added as needed in the hardening resin composition of the present invention.As inorganic filler,
Can enumerate:Crystalline silica, fused silica, aluminium oxide, zircon, calcium silicates, Calcium Carbonate, carborundum, silicon nitride, nitrogen
Change the powder body of boron, zirconium oxide, forsterite, steatite, spinelle, titanium dioxide, Talcum etc. or their spheroidizations are obtained
Pearl etc., but not limited to this.They can be used alone can also use it is two or more.The content of these inorganic fillers can be with
Using the amount that 0~95 weight % is accounted in the hardening resin composition of the present invention.Additionally, the curable resin combination of the present invention
The releasing agents such as silane coupler, stearic acid, Palmic acid, zinc stearate, calcium stearate can be added in thing;Surfactant, dye
The various compounding ingredients such as material, pigment, UV absorbent, various thermosetting resins.
The hardening resin composition of the present invention can be by each composition be obtained by uniformly mixingg.The curable of the present invention
Resin combination can be readily derived its solidfied material by the method same with previously known method.For example make as needed
With the solidification by the polyphenylene oxide novolac resin and epoxy resin of the present invention and as needed such as extruder, kneader, roller
Accelerator, phosphorus-containing compound, resin glue, inorganic filling material and compounding ingredient are fully mixed to uniformly, so as to be solidified
Property resin combination, will hardening resin composition perfusion, (need not melt during liquid) after melting carry out cast molding or
Person carries out molding using transfer molding machine etc., then heats 2~10 hours at 80~200 DEG C, it is hereby achieved that the present invention
Solidfied material.
In addition, by the present invention hardening resin composition be dissolved in as needed toluene, dimethylbenzene, acetone, butanone,
Methyl iso-butyl ketone (MIBK), dimethylformamide, dimethyl acetylamide, N-Methyl pyrrolidone equal solvent and obtain curable resin group
Compound varnish so as to be infiltrated up in the base materials such as glass fibre, carbon fiber, polyester fiber, Fypro, alumina fibre, paper,
And be thermally dried, resulting prepreg is carried out it is hot-forming, it is hereby achieved that the curable resin group of the present invention
The solidfied material of compound A.Solvent now is using usual in the hardening resin composition of the present invention with the mixture of the solvent
Account for 10~70 weight %, be preferably the amount of 15~70 weight %.In addition, if being fluid composition, then directly can also utilize
For example RTM modes obtain the epoxy resin cured product containing carbon fiber.
Alternatively, it is also possible to the hardening resin composition of the present invention to be used as the modifying agent of membranous type compositionss.Specifically,
Can be used for improving the situation of the flexibility of (B) in the stage etc..The resin combination of this membranous type can be obtained as follows:By the present invention
Hardening resin composition make above-mentioned hardening resin composition varnish and coat on stripping film, remove under heating molten
Agent, then carry out (B) it is staged, thus obtain the adhesive of lamellar.The Web-form adhesive is can serve as in multilager base plate etc.
Interlayer insulating film.
The hardening resin composition of the present invention can enumerate the normal usage using epoxy resin, can enumerate such as glue
Stick, coating, smearss, moulding material (including sheet material, film, FRP etc.), insulant (include printed base plate, coating electric wire
Deng), sealant and to additive of addition etc. in other resins etc..As adhesive, can enumerate building use, it is for building,
The adhesive of automobile use, routine office work use, therapeutic medical adhesive and electronic material.Among these, as electronic material
Adhesive, can enumerate the quasiconductors such as the interlaminated adhesive of the multilager base plates such as increasing layer substrate, chip cement, bottom filling
With installation glue such as adhesive, BGA enhancing bottom fillings, anisotropic conductive film (ACF), anisotropic conductive cream (ACP)
Stick etc..
As sealant, substrate, capacitor, transistor, diode, light emitting diode, IC, LSI etc. can be enumerated
Embedding, dipping, transmission die sealing;The embedding sealing of COB, COF, TAB of IC, LSI class etc.;The bottom of flip-chip etc.
Filler;Sealing (including enhancing bottom filling) and base plate for packaging when the IC package body such as QFP, BGA, CSP class is installed etc..Separately
Outward, network substrate, module substrate etc. are also suitable for and require functional substrate purposes.
Embodiment
Then, more specific description is carried out to the present invention by embodiment, hereinafter unless otherwise specified, part refers to
Weight portion.It should be noted that the invention is not restricted to these embodiments.
Hereinafter, to embodiment used in various analysis methods be described.
Epoxide equivalent:According to JIS K 7236 (ISO3001)
ICI melt viscosities:According to JIS K 7117-2 (ISO3219)
Softening point:According to JIS K 7234
Total chlorine:According to JIS K 7243-3 (ISO21672-3)
GPC:
Post (Shodex KF-603, KF-602.5, KF-602, KF-601 × 2)
Connection eluent is tetrahydrofuran
Flow velocity is 0.5ml/ minutes
Column temperature is 40 DEG C
Detection:RI (differential refraction detector)
Hereinafter, the present invention is specifically described by embodiment, comparative example.
(embodiment 1)
In possessing blender, reflux cooling pipe, the flask of agitating device, implementing to add polyphenyl while nitrogen is purged
175 parts of ether resin (Mn=2066, Mw=3553, Mz=5951 in SABIC MX90-100, GPC figures), terephthalyl alcohol (east
Capital is melted into reagent processed) 9.6 parts, 300 parts of toluene (pure chemistry processed reagent), (Tokyo is melted into make and tries p-methyl benzenesulfonic acid monohydrate
Agent) 2 parts, react 2 hours at 100 DEG C, afterwards, become reflux state at 110~120 DEG C, and keep the state to carry out 7 hours
Reaction.
After reaction terminates, 200 parts of methyl iso-butyl ketone (MIBK) is added, washing is repeated, after confirming that water layer becomes neutrality, used
Rotary evaporator is distilled off solvent from oil reservoir under reduced pressure, resulting in the polynary phenylene ether novolaks of the present invention
179 parts of resin (P-1).(it should be noted that as Mn=2091 in the GPC figures of the polyphenylene oxide resin of raw material, Mw=4215,
Mz=7774.)
(embodiment 2)
In possessing blender, reflux cooling pipe, the flask of agitating device, implementing to add polyphenyl while nitrogen is purged
75 parts of ether resin (SABIC MX90-100), 5 parts of terephthalyl alcohol (Tokyo is melted into reagent processed), toluene (pure chemistry system examination
Agent) 130 parts, 1 part of p-methyl benzenesulfonic acid monohydrate (Tokyo is melted into reagent processed), in 100 DEG C of reactions 2 hours, afterwards, 110~
Become reflux state at 120 DEG C, and keep the state to carry out 10 hours reacting.
After reaction terminates, 100 parts of methyl iso-butyl ketone (MIBK) is added, washing is repeated, after confirming that water layer becomes neutrality, used
Rotary evaporator slowly removes solvent from oil reservoir under reduced pressure, confirms no longer outflow water, adds methyl iso-butyl ketone (MIBK), is adjusted to
Resin concentration 50%.Resulting in 143 parts of the polynary phenylene ether novolac resin varnish (V-1) of the present invention.The figure of GPC
Middle Mn=2111, Mw=4345, Mz=7932.
(embodiment 3)
In possessing blender, reflux cooling pipe, the flask of agitating device, implementing to add polyphenyl while nitrogen is purged
87.5 parts of ether resin (SABIC MX90-100), 4.8 parts of terephthalyl alcohol (Tokyo is melted into reagent processed), methyl iso-butyl ketone (MIBK) are (pure
Positizing length of schooling reagent) 138 parts, 1 part of p-methyl benzenesulfonic acid monohydrate (Tokyo is melted into reagent processed), in 100 DEG C of reactions 2 hours, it
Afterwards, become reflux state at 110~120 DEG C, and keep the state to carry out 7 hours reacting.
After reaction terminates, methyl iso-butyl ketone (MIBK) 100 is added, washing is repeated, after confirming that water layer becomes neutrality, used
Rotary evaporator slowly removes solvent from oil reservoir under reduced pressure, confirms no longer outflow water, adds methyl iso-butyl ketone (MIBK), is adjusted to
Resin concentration 60%.
50 parts of the polynary phenylene ether novolac resin varnish (V-2) of the present invention obtained by adding, phenol Asia biphenyl
70 parts of base novolaks (Japanese chemical medicine KAYAHARD GPH-65), after dissolving, are distilled using rotary evaporator under reduced pressure and are removed
Solvent is gone, so as to obtain the curing agent composition of the polynary phenylene ether novolac resin containing 30% present invention
(H-1).Softening point is 121 DEG C.
(embodiment 4)
Except in embodiment 3 by 70 parts of phenol biphenylene novolaks (Japanese chemical medicine KAYAHARD GPH-65)
Become 30 parts in addition, similarly operated, obtain the curing agent composition (H-2) of the present invention.
(embodiment 5)
Except in embodiment 3 by 70 parts of phenol biphenylene novolaks (Japanese chemical medicine KAYAHARD GPH-65)
Become 20 parts in addition, similarly operated, obtain the polynary phenylene ether novolac resin containing 60% present invention
Curing agent composition (H-3).Softening point is 130 DEG C.
(embodiment 6)
In possessing blender, reflux cooling pipe, the flask of agitating device, implementing to add polyphenyl while nitrogen is purged
100 parts of ether resin (Mn=2960, Mw=6863, Mz=11851 in SABIC SA120-100, GPC measure), terephthalyl alcohol
140 parts of 10 parts of (Tokyo be melted into processed reagent), toluene (pure chemistry processed reagent), (Tokyo is melted into and makes p-methyl benzenesulfonic acid monohydrate
Reagent) 2.0 parts, react 2 hours at 100 DEG C, afterwards, become reflux state at 110~120 DEG C, and keep the state response 7
Hour.
After reaction terminates, butanone 100 is added, slowly instill in the container equipped with 1000 parts of methanol, carry out reprecipitation.
After resulting toner is filtered, with 100 parts of methanol:Water=1:After 1 is cleaned, 5 times are carried out with 100 parts of water clearly
Wash.Thus, 89 parts of the polynary phenylene ether novolac resin (P-3) of the present invention has been obtained.Mn=3683, Mw=in GPC figures
7356th, Mz=11860.In addition, relative to 30 parts of resulting (P-3), using 50 parts of KAYAHARD GPH-6520 parts, toluene,
After being mixed, solvent is distilled off under reduced pressure using rotary evaporator, so as to obtain curing agent composition (H-4).
(comparative example 1)
Add 30 parts of polyphenylene oxide resin (SABIC MX90-100), phenol biphenylene novolaks (Japanese chemical medicine system
KAYAHARD GPH-65) 70 parts, after being dissolved in methyl iso-butyl ketone (MIBK), solvent is distilled off under reduced pressure using rotary evaporator
Class, so as to obtain the curing agent composition for comparing (H ' -1).
(comparative example 2)
Add 30 parts of polyphenylene oxide resin (SABIC MX90-100), phenol biphenylene novolaks (Japanese chemical medicine system
KAYAHARD GPH-65) 20 parts, after being dissolved in methyl iso-butyl ketone (MIBK), solvent is distilled off under reduced pressure using rotary evaporator
Class, so as to obtain the curing agent composition for comparing (H ' -2).
Embodiment 7~8 and comparative example 3
< K dielectric loss tangent test >
Ratio (weight portion) with table 1 coordinates curing agent composition and epoxy resin for above obtaining etc., using mixing
Roller is uniformly mixed and is kneaded, and has obtained encapsulating epoxy resin composition.Using blender by the composition epoxy resin
Crush, then pelletize is carried out using comminutor.Transfer molding (175 DEG C × 60 is carried out to the composition epoxy resin after the pelletize
Second), then solidified under conditions of+180 DEG C × 6 hours 160 DEG C × 2 hours after demoulding, used so as to obtain evaluating
Test film.
It should be noted that the physical property of solidfied material is measured according to following main points.
K dielectric loss angle tangent:Cavity resonator method
Cavity resonator 1GHz is developed using equipment Northeast electrical applications
Reference Teflon (registered trade mark)
[table 1]
EP-1:Biphenyl phenol aralkyl type epoxy resin (NC3000)
GPH-65:Biphenyl phenol aralkyl type phenol resin
TPP:Triphenylphosphine
Embodiment 9 and comparative example 4
< Dielectric Property Testing heat-resistance test >
Ratio (weight portion) with table 2 coordinates curing agent composition and epoxy resin for above obtaining etc., using mixing
Roller is uniformly mixed and is kneaded, and has obtained encapsulating epoxy resin composition.Using blender by the composition epoxy resin
Crush, then pelletize is carried out using comminutor.Transfer molding (175 DEG C × 60 is carried out to the composition epoxy resin after the pelletize
Second), then solidified under conditions of+180 DEG C × 6 hours 160 DEG C × 2 hours after demoulding, used so as to obtain evaluating
Test film.
It should be noted that the physical property of solidfied material is measured according to following main points.
K dielectric loss angle tangent:Cavity resonator method
Cavity resonator 1GHz is developed using equipment Northeast electrical applications
Reference Teflon (registered trade mark)
Thermostability (TMA):It is measured according to JIS K 7244.
[table 2]
Embodiment 10 and comparative example 5
< heat-resistance test Dielectric Property Testings >
Ratio (weight portion) with table 3 coordinates curing agent composition and epoxy resin for above obtaining etc., using mixing
Roller is uniformly mixed and is kneaded, and has obtained encapsulating epoxy resin composition.Using blender by the composition epoxy resin
Crush, then pelletize is carried out using comminutor.Transfer molding (175 DEG C × 60 is carried out to the composition epoxy resin after the pelletize
Second), then solidified under conditions of+180 DEG C × 6 hours 160 DEG C × 2 hours after demoulding, used so as to obtain evaluating
Test film.
It should be noted that the physical property of solidfied material is measured according to following main points.
K dielectric loss angle tangent:Cavity resonator method
Cavity resonator 1GHz is developed using equipment Northeast electrical applications
Reference Teflon (registered trade mark)
Thermostability (DMA)
Measurement of Dynamic Viscoelasticity device:TA-instruments、DMA-2980
Temperature of the measurement scope:- 30~280 DEG C
Cooling rate:2 DEG C/min
Test chip size:(about 800 μm of thickness) is used after cutting into 5mm × 50mm
Tg:Using the summit of Tan- δ as Tg
Thermostability (TMA):It is measured according to JIS K 7244.
[table 3]
By result above it has been confirmed that the hardening resin composition of the present invention is used as firming agent (compositionss), with use
Have a case that the H ' -1 of similar structures, H ' -2 are compared, hence it is evident that more excellent in terms of thermostability, and with using other firming agent
Situation compare, dielectric constant, dielectric loss angle tangent are also better, with excellent dielectric property.
The present invention is described in detail with reference to ad hoc fashion, but in the situation without departing from the spirit and scope of the present invention
Under can carry out various change and amendment, this is obvious to those skilled in the art.
It should be noted that the application is based in Japanese patent application (Japanese Patent Application filed in 6 days November in 2012
2012-244309), and by quoting entire contents are incorporated herein.In addition, cited herein all with reference to as whole
Body is incorporated herein.
Industrial applicability
The polyphenylene oxide novolac resin of the present invention is useful as the firming agent etc. of epoxy resin, containing the polyphenylene oxide phenolic aldehyde
Varnish gum as firming agent composition epoxy resin with electrical and electronic parts insulant and plywood (printed wiring
Plate, increasing layer substrate etc.), it is the various composites headed by CFRP, adhesive, useful in coating etc..
Claims (4)
1. a kind of polynary phenylene ether novolac resin, its pass through by molecular weight 400~8000 (weight average molecular weight, by polyphenyl
Ethylene converts) polyphenylene oxide resin connected by organic group and obtained, and represented with following formula (A),
In above-mentioned formula, P represents the residue of polyphenylene oxide resin, X be organic group and in representing by following formula (1) at least any one
The linking group of expression, R represent the alkyl that hydrogen atom or carbon number are 1~3, and * represents that hydrogen atom or above-mentioned X, n represent 1~2
Integer,
Formula(1)In, * parts are bonded with the benzene skeleton of polyphenylene oxide resin.
2. polynary phenylene ether novolac resin as claimed in claim 1, wherein, polyphenylene oxide resin is biphenyl phenols or double
The oxypolymer of phenols and Phenol compounds.
3. a kind of composition epoxy resin, which contains the polynary phenylene ether novolaks described at least one claim 1 or 2
Resin.
4. a kind of solidfied material, which is obtained by making the epoxy resin composition described in claim 3.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012244309 | 2012-11-06 | ||
JP2012-244309 | 2012-11-06 | ||
PCT/JP2013/079920 WO2014073536A1 (en) | 2012-11-06 | 2013-11-05 | Polyvalent phenylene ether novolac resin, epoxy resin composition, and cured product thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104781307A CN104781307A (en) | 2015-07-15 |
CN104781307B true CN104781307B (en) | 2017-04-12 |
Family
ID=50684639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201380058014.2A Expired - Fee Related CN104781307B (en) | 2012-11-06 | 2013-11-05 | Polyvalent phenylene ether novolac resin, epoxy resin composition, and cured product thereof |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6240613B2 (en) |
KR (1) | KR102047681B1 (en) |
CN (1) | CN104781307B (en) |
TW (1) | TW201431901A (en) |
WO (1) | WO2014073536A1 (en) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04183707A (en) * | 1990-11-19 | 1992-06-30 | Mitsubishi Petrochem Co Ltd | Production of polyphenylene ether crosslinked molded product |
JP2006274241A (en) * | 2005-03-25 | 2006-10-12 | Korea Research Inst Of Chemical Technology | Aromatic polyether resin crosslinked with amic acid or imide side chain group |
CN1914239A (en) * | 2004-01-30 | 2007-02-14 | 新日铁化学株式会社 | Curable resin composition |
CN101389691A (en) * | 2006-02-21 | 2009-03-18 | 旭化成化学株式会社 | Process for producing low-molecular polyphenylene ether |
CN101668806A (en) * | 2007-04-26 | 2010-03-10 | 日立化成工业株式会社 | Process for producing resin varnish containing semi-ipn composite thermosetting resin and, provided using the same, resin varnish for printed wiring board, prepreg and metal-clad laminate |
JP2011074123A (en) * | 2009-09-29 | 2011-04-14 | Panasonic Electric Works Co Ltd | Resin composition, resin varnish, prepreg, metal-clad laminate, and printed wiring board |
JP2011084626A (en) * | 2009-10-14 | 2011-04-28 | Jsr Corp | Resin composition and its application |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4736254B2 (en) | 2001-06-28 | 2011-07-27 | 三菱瓦斯化学株式会社 | Bifunctional phenylene ether oligomer and its production method |
JP5311717B2 (en) | 2005-03-14 | 2013-10-09 | 旭化成ケミカルズ株式会社 | Process for producing polyfunctional polyphenylene ether |
-
2013
- 2013-11-05 CN CN201380058014.2A patent/CN104781307B/en not_active Expired - Fee Related
- 2013-11-05 WO PCT/JP2013/079920 patent/WO2014073536A1/en active Application Filing
- 2013-11-05 JP JP2014545711A patent/JP6240613B2/en not_active Expired - Fee Related
- 2013-11-05 KR KR1020157007946A patent/KR102047681B1/en active IP Right Grant
- 2013-11-06 TW TW102140254A patent/TW201431901A/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04183707A (en) * | 1990-11-19 | 1992-06-30 | Mitsubishi Petrochem Co Ltd | Production of polyphenylene ether crosslinked molded product |
CN1914239A (en) * | 2004-01-30 | 2007-02-14 | 新日铁化学株式会社 | Curable resin composition |
JP2006274241A (en) * | 2005-03-25 | 2006-10-12 | Korea Research Inst Of Chemical Technology | Aromatic polyether resin crosslinked with amic acid or imide side chain group |
CN101389691A (en) * | 2006-02-21 | 2009-03-18 | 旭化成化学株式会社 | Process for producing low-molecular polyphenylene ether |
CN101668806A (en) * | 2007-04-26 | 2010-03-10 | 日立化成工业株式会社 | Process for producing resin varnish containing semi-ipn composite thermosetting resin and, provided using the same, resin varnish for printed wiring board, prepreg and metal-clad laminate |
JP2011074123A (en) * | 2009-09-29 | 2011-04-14 | Panasonic Electric Works Co Ltd | Resin composition, resin varnish, prepreg, metal-clad laminate, and printed wiring board |
JP2011084626A (en) * | 2009-10-14 | 2011-04-28 | Jsr Corp | Resin composition and its application |
Also Published As
Publication number | Publication date |
---|---|
TW201431901A (en) | 2014-08-16 |
CN104781307A (en) | 2015-07-15 |
JP6240613B2 (en) | 2017-11-29 |
WO2014073536A1 (en) | 2014-05-15 |
KR102047681B1 (en) | 2019-11-22 |
JPWO2014073536A1 (en) | 2016-09-08 |
KR20150082181A (en) | 2015-07-15 |
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