CN104755483B - 噻吩并[2,3‑c]吡咯‑二酮衍生物及其在有机半导体中的用途 - Google Patents
噻吩并[2,3‑c]吡咯‑二酮衍生物及其在有机半导体中的用途 Download PDFInfo
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- CN104755483B CN104755483B CN201380055670.7A CN201380055670A CN104755483B CN 104755483 B CN104755483 B CN 104755483B CN 201380055670 A CN201380055670 A CN 201380055670A CN 104755483 B CN104755483 B CN 104755483B
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 31
- VFFSVQFVDZYSPH-UHFFFAOYSA-N 5H-thieno[2,3-c]pyrrole 1,1-dioxide Chemical class S1(C=CC=2C1=CNC2)(=O)=O VFFSVQFVDZYSPH-UHFFFAOYSA-N 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims abstract description 54
- 125000000217 alkyl group Chemical group 0.000 claims description 35
- 125000002769 thiazolinyl group Chemical group 0.000 claims description 22
- 125000000304 alkynyl group Chemical group 0.000 claims description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 3
- 229910052711 selenium Inorganic materials 0.000 claims description 3
- 150000001345 alkine derivatives Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 24
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 29
- HEDRZPFGACZZDS-MICDWDOJSA-N deuterated chloroform Substances [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 16
- 229930192474 thiophene Natural products 0.000 description 15
- 239000010410 layer Substances 0.000 description 14
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 11
- -1 imide compound Chemical class 0.000 description 11
- 239000002904 solvent Substances 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 10
- 150000003949 imides Chemical group 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 229920000642 polymer Polymers 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 125000005277 alkyl imino group Chemical group 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 125000000753 cycloalkyl group Chemical group 0.000 description 7
- 125000004415 heterocyclylalkyl group Chemical group 0.000 description 7
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 238000005160 1H NMR spectroscopy Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 125000005157 alkyl carboxy group Chemical group 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 150000003233 pyrroles Chemical class 0.000 description 6
- 0 CCCN(CC)C(*(CC)=CC(**C)=C(C)C)=C Chemical compound CCCN(CC)C(*(CC)=CC(**C)=C(C)C)=C 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229940125904 compound 1 Drugs 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 239000000539 dimer Substances 0.000 description 5
- 238000002451 electron ionisation mass spectrometry Methods 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
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- 239000000047 product Substances 0.000 description 4
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- 239000000523 sample Substances 0.000 description 4
- BPLUKJNHPBNVQL-UHFFFAOYSA-N triphenylarsine Chemical compound C1=CC=CC=C1[As](C=1C=CC=CC=1)C1=CC=CC=C1 BPLUKJNHPBNVQL-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- GUMHIQSZHCYMSN-UHFFFAOYSA-N 1-hydroxypyrrol-2-ol Chemical compound OC1=CC=CN1O GUMHIQSZHCYMSN-UHFFFAOYSA-N 0.000 description 3
- 239000007832 Na2SO4 Substances 0.000 description 3
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
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- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- WHLUQAYNVOGZST-UHFFFAOYSA-N tifenamil Chemical group C=1C=CC=CC=1C(C(=O)SCCN(CC)CC)C1=CC=CC=C1 WHLUQAYNVOGZST-UHFFFAOYSA-N 0.000 description 3
- TUCRZHGAIRVWTI-UHFFFAOYSA-N 2-bromothiophene Chemical compound BrC1=CC=CS1 TUCRZHGAIRVWTI-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- NOTFZGFABLVTIG-UHFFFAOYSA-N Cyclohexylethyl acetate Chemical compound CC(=O)OCCC1CCCCC1 NOTFZGFABLVTIG-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 2
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000006880 cross-coupling reaction Methods 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
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- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 238000004770 highest occupied molecular orbital Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
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- 239000002356 single layer Substances 0.000 description 2
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- 239000000758 substrate Substances 0.000 description 2
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- 239000013638 trimer Substances 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
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- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- 125000004641 (C1-C12) haloalkyl group Chemical group 0.000 description 1
- 125000006711 (C2-C12) alkynyl group Chemical group 0.000 description 1
- AKAIWNDBVZJOAJ-UHFFFAOYSA-N 1,4-dithiine Chemical group S1C=CSC=C1 AKAIWNDBVZJOAJ-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- PWENYEXRVGBXJI-UHFFFAOYSA-N 2,3-dicarbamoylpyrene-1,10-dicarboxylic acid Chemical compound C1(=C(C(=C2C(=CC3=CC=CC4=CC=C1C2=C34)C(=O)O)C(=O)O)C(O)=N)C(O)=N PWENYEXRVGBXJI-UHFFFAOYSA-N 0.000 description 1
- QUTGXAIWZAMYEM-UHFFFAOYSA-N 2-cyclopentyloxyethanamine Chemical compound NCCOC1CCCC1 QUTGXAIWZAMYEM-UHFFFAOYSA-N 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- 125000000175 2-thienyl group Chemical group S1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- RWRXDIMAXLSQMK-UHFFFAOYSA-N 3h-1,2,3-benzodithiazole Chemical compound C1=CC=C2NSSC2=C1 RWRXDIMAXLSQMK-UHFFFAOYSA-N 0.000 description 1
- SDTOGOPOUVOYDT-UHFFFAOYSA-N 5-hexyl-2,4-dihydrothieno[2,3-c]pyrrole Chemical class C(CCCCC)N1C=C2C(C1)=CCS2 SDTOGOPOUVOYDT-UHFFFAOYSA-N 0.000 description 1
- SHZBQOWKRGTTIT-UHFFFAOYSA-N 5h-thieno[2,3-c]pyrrole Chemical class N1C=C2SC=CC2=C1 SHZBQOWKRGTTIT-UHFFFAOYSA-N 0.000 description 1
- 229920003026 Acene Polymers 0.000 description 1
- 241001614291 Anoplistes Species 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 125000004649 C2-C8 alkynyl group Chemical group 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- XVGRJXONVNATJD-MCIGGMRASA-N CC1[C@]2(CS=C)C1(CC(CNC)=C)C2 Chemical compound CC1[C@]2(CS=C)C1(CC(CNC)=C)C2 XVGRJXONVNATJD-MCIGGMRASA-N 0.000 description 1
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- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
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- 150000008065 acid anhydrides Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
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- 150000001491 aromatic compounds Chemical class 0.000 description 1
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- HKNRNTYTYUWGLN-UHFFFAOYSA-N dithieno[3,2-a:2',3'-d]thiophene Chemical compound C1=CSC2=C1SC1=C2C=CS1 HKNRNTYTYUWGLN-UHFFFAOYSA-N 0.000 description 1
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- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 1
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- 229910052763 palladium Inorganic materials 0.000 description 1
- FVDOBFPYBSDRKH-UHFFFAOYSA-N perylene-3,4,9,10-tetracarboxylic acid Chemical compound C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=O)C2=C1C3=CC=C2C(=O)O FVDOBFPYBSDRKH-UHFFFAOYSA-N 0.000 description 1
- 239000008194 pharmaceutical composition Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003220 pyrenes Chemical class 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N sulfur dioxide Inorganic materials O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- 238000001757 thermogravimetry curve Methods 0.000 description 1
- DBDCNCCRPKTRSD-UHFFFAOYSA-N thieno[3,2-b]pyridine Chemical compound C1=CC=C2SC=CC2=N1 DBDCNCCRPKTRSD-UHFFFAOYSA-N 0.000 description 1
- VJYJJHQEVLEOFL-UHFFFAOYSA-N thieno[3,2-b]thiophene Chemical compound S1C=CC2=C1C=CS2 VJYJJHQEVLEOFL-UHFFFAOYSA-N 0.000 description 1
- 229940125670 thienopyridine Drugs 0.000 description 1
- 239000002175 thienopyridine Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 150000003577 thiophenes Chemical group 0.000 description 1
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 1
- 238000002061 vacuum sublimation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Abstract
本发明涉及可用作有机半导体材料的式(I)和(II)的新型化合物,和含有所述有机半导体材料的半导体器件。
Description
本发明涉及新型n-型有机半导体材料,和含有所述n-型有机半导体材料的半导体器件。
已知有机半导体是通过施加电磁能或化学掺杂剂,电荷可以可逆地引入其内的材料。这些材料的导电性位于金属和绝缘体之间,横跨10-9至103Ω-1cm-1的宽范围。与常规的无机半导体一样,有机材料可充当或者p-型或者n-型。在p-型半导体中,大多数载流子是空穴,而在n-型中,大多数载流子是电子。
绝大多数现有技术集中在p-型有机半导体材料的设计,合成和结构-性能的关系上,其中包括低聚并苯,稠合的低聚噻吩,蒽二噻吩,咔唑,低聚苯和低聚芴,它们中的一些导致性能优于无定形硅的场效应晶体管。相反,n-型低聚物和聚合物半导体的开发落在了p-型材料之后。事实上,与p-型半导体相比,n-型半导体仍然没有被充分地开发,且性能不令人满意。
然而,还要求具有高的电子亲和性的有机半导体,因为对于有效的逻辑电路和有机太阳能电池来说,要求p-和n-沟道材料二者。确实,n-型有机场效应晶体管被预见作为有机p-n结,双极性晶体管和互补集成电路的关键组件,从而导致挠性、大面积和低成本的电子应用。
在本领域中各种有机半导体被视为n-型有机半导体材料。
在第一n-沟道材料当中,报道了芳族四羧酸酐及其二酰亚胺衍生物。在这一组材料当中,具有氟化侧链的芘四羧酸二酰亚胺显示出最多0.72cm2V-1s-1的迁移率,一旦暴露于空气下,它仅仅略微下降。可通过改变侧链长度,插入氧化基团和氟化程度,从而改变空气稳定性,填充粒度和沉积的薄膜的形貌以及电性能。然而,大多数芘的结构单元由于结构刚性和适中的溶解性导致不能容易地结构变化,从而限制 可接近的材料体积。
描述了其他组的n-型有机材料,例如氰基乙烯基低聚物,富勒烯。
J.Am.Chem.Soc.2009,131,16616-16617描述了二酮基吡咯并吡咯共聚物的双极性电荷传输性能。
在Mater.2010,22,47,5409-5413中描述的苯并噻二唑-二酮基吡咯并吡咯共聚物分别显示出0.35cm2V-1s-1和0.40cm2V-1s-1的高且平衡的空穴-和电子迁移率。对于在错列的顶浇口(top gate)结构内,称为聚{[N,N9-双(2-辛基十二烷基)-萘-l,4,5,8-双(二羧酰亚胺)-2,6-二基]-交替-5,59-(2,29-联噻吩)},(Polyera Activ Ink N2200)的仅仅电子传输n-型聚合物来说,在空气中实现最多0.85cm2V-1s-1的较大的电子迁移率值。
在J.Am.Chem.Soc.2005,127,1348和Angew.Chem.Int.Ed.2003,42,3900中还描述了由带有氟化侧基的低聚噻吩组成的n-型半导体材料。这些低聚物显示出最多0.43cm2V- 1s-1的迁移率。然而,基于大多数这些全氟芳基和全氟烷芳基取代材料的OFETs在空气中不稳定或者具有高阈电压的缺点。还描述了氟代羰基-官能化的低聚物,它显示出改进的空气稳定性,但相对于氟化低聚物,具有较低的电子迁移率。
还描述了含有联噻吩-酰亚胺单元作为内部芯的低聚物和聚合物。
例如,J.Am.Chem.Soc.2008,130,9679-9694描述了N-烷基-2,2'-联噻吩-3,3'-二羧酰亚胺-基均聚物和共聚物,取决于聚合物结构,它们显示出p-型或n-型半导体行为。然而,采用这些材料,不可能实现空气稳定的器件。另外,起始的二卤化联噻吩-酰亚胺化合物的反应性差限制了这一组材料的可接近性(accessibility)。
J.Am.Chem.Soc.1998,120,5355-5362,Tetrahedron Letters44(2003)1653-1565公开了含贫电子的3,4-酰亚胺基-噻吩基嵌段交替富电子的氨基取代的噻吩基嵌段的共聚物。关于这些共聚物的电性能,没有进行研究。
在Organic Letters 2004,6,19,3381-3384中描述了N-烷化聚(二氧吡咯并噻吩)。然而,没有报道在OFET器件中有效的n-型行为 的证据。
每一种前面提及的材料组具有差的电性能。
WO2008/127029涉及具有稠合到噻吩环的3,4-位上的吡咯部分的二氧吡咯并-杂环化合物,和使用上述二氧吡咯并-杂环化合物的有机电子器件。
Wei Hong等人,"Linear fused dithieno[2,3-b:3'2'-d]thiophene diimides"Organic Letters,第13卷,第6期,2011年3月18日,第1420-1413页公开了一组线性的充分稠合的二噻吩并噻吩二酰亚胺。
文献:DE1954550;Ronova Iga A等人:“The effect of conformationalrigidity on the initial decompos ition temperature of some heterocyclicpolyimides(一些杂环聚酰亚胺的构象刚性对起始分解温度的影响)”,High PerformancePolymers,Institute of Physics Publishing,Bristol GB,第14卷,第2期,2002年1月1日,第195-208页;和Gaina C.等人,"Polyimides containing1,4-dithiine units andtheir corresponding thiophene2,3,4,5tetracarboxylimide units(含1,4-dithiine单元和它们相应的噻吩2,3,4,5四羧基酰亚胺单元的聚酰亚胺)"High PerformancePolymers,Institute of physics publishing,Bristol GB,第11卷,第2期,1999年6月1日,第185-195页公开了聚合的二酰亚胺化合物,其中连接聚合物重复单元的组元是N-酰亚胺取代基。三篇最后引证的文献没有提及此处公开的化合物的任何半导体性能。
WO2006/094292公开了能调制缺氧诱导因子的稳定性和/或活性的噻吩并吡啶化合物,含所述化合物的药物组合物,和可用于制备所述化合物的化学中间体。在所述化学中间体当中,公开了具有4,6-二氧杂-噻吩并[2,3-c]吡咯核的特定化合物。
EP0467206公开了具有4,6-二氧杂-噻吩并[2,3-c]吡咯核的特定 化合物及其作为除草剂的用途。
然而,WO2006/094292和EP0467206没有教导所述化合物的半导体性能。
因此,仍需要拥有较高电子迁移率性能的n-型有机半导体材料或化合物。
在本说明书和在权利要求中,术语“n-型有机半导体”是指在具有源电极、漏电极和门对照电极的场效应器件结构内作为活性层插入的材料显示出高于10-7cm2V-1s-1的电子迁移率。
本发明的目的是提供适合于用作半导体材料的新型有机材料,它不具有所述缺点。采用其主要特征在权利要求1中公开的化合物,其主要特征在权利要求10中公开的所述化合物的用途,和其主要特征在权利要求12中公开的电子器件,从而实现所述目的。在权利要求2-9中公开了所述化合物的其他特征。
有利地,本发明的化合物可用作p-型,n-型或双极性有机半导体材料。
特别地,本发明的化合物拥有高的电子迁移率性能,在大气条件下优良的稳定性,且通过容易的合成方法可获得。
根据本发明一个方面的下述详细和非限定性说明,并参考附图,本发明的化合物,材料和器件的进一步的优点与特征对于本领域的技术人员来说是明显的,其中:
-图1是根据本发明的化合物的UV-vis和发射光谱;
-图2a)和b)是图1中化合物的DCS热谱图;
-图3a)和b)是采用图1的化合物获得的薄膜晶体管的lucous曲线和输出曲线;
-图4是采用图1的化合物获得的薄膜晶体管的转化饱和曲线N型;
-图5a)和b)是采用图1的化合物获得的薄膜晶体管的转化饱和曲线P型。
根据本发明的一个方面,提供式(I)或(II)的化合物:
其中:
R1,R2,R3彼此独立地选自氢,C1-C40直链或支链烷基,C2-C40直链或支链烯基,C2-C40直链或支链炔基,C1-C40直链或支链杂烷基,C2-C40直链或支链杂烯基,C2-C40直链或支链杂炔基,C3-C40直链或支链环烷基,C2-C40直链或支链杂环烷基,C2-C40直链或支链烷基羧基,C2-C40直链或支链烷基甲酰胺基,C2-C40直链或支链烷基亚氨基,C1-C40直链或支链烷基磺酸基,C1-C40直链或支链烷基腈基,C6-C50未取代和取代的单环芳基,C10-C50多环芳基,C10-C50取代的多环芳基,C1-C50未取代和取代的单环杂芳基,C6-C50多环杂芳基,C6-C50取代的多环杂芳基;
R4和R5彼此独立地选自氢,卤素,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,C3-C20直链或支链环烷基,C2-C20直链或支链杂环烷基,C2-C20直链或支链烷基羧基,C2-C20直链或支链烷基甲酰胺基,C2-C20直链或支链烷基亚氨基,C1-C20直链或支链烷基磺酸基,C1-C20直链或支链烷基腈基;
Ar,Ar1,Ar2,Ar3和Ar4彼此独立地为选自下述中的部分:C6-C50未取代和取代的单环芳基,C10-C50多环芳基,C10-C50取代的多环芳基,C1-C50未取代和取代的单环杂芳基,C6-C50多环杂芳基,C6-C50取代的多环杂芳基及其组合作为二聚体,三聚体和四聚体;
Z和Z'彼此独立地选自下述中的二价基团:式(III),(IV),(V),(VI),(VII),(VIII),(IX),(X):
其中G选自氢,卤素,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,C3-C20直链或支链环烷基,C2-C20直链或支链杂环烷基,C2-C20直链或支链烷基羧基,C2-C20直链或支链烷基甲酰胺基,C2-C20直链或支链烷基亚氨基,C1-C20直链或支链烷基磺酸基,C1-C20直链或支链腈基,C6-C50未取代和取代的单环芳基,C10-C50多环芳基,C10-C50取代的多环芳基,C1-C50未取代和取代的单环杂芳基,C6-C50多环杂芳基,C6-C50取代的多环杂芳基及其组合;
T和T'选自C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,C3-C20直链或支链环烷基,C2-C20直链或支链杂环烷基,C2-C20直链或支链烷基羧基,C2-C20直链或支链烷基甲酰胺基,C2-C20直链或支链烷基亚氨基,C6-C50未取代和取代的单环芳基,C10-C50多环芳基,C10-C50取代的多环芳基,C1-C50未取代和取代的单环杂芳基,C6-C50多环杂芳基,C6-C50取代的多环杂芳基及其组合;
s为0或1;
n,m,r和t,彼此独立地为1至50的整数;
q和f彼此独立地为1至10的整数;和
p为1至5的整数.
在本说明书和权利要求书中:
-“杂烷基”拟包括例如卤代烷基,羟基烷基,烷氧基烷基;
-“杂烯基”拟包括例如卤代烯基,羟基烯基,烷氧基烯基;
-“杂炔基”拟包括例如卤代炔基,羟基炔基,烷氧基炔基。
在式(VII);(VIII);(IX)和(X)是,P是磷和N是氮。
p的数值优选0,1或2。
q和f的数值彼此独立地优选1至5;更优选q和f是l或2;甚至更优选q和f是l。
n,m,r和t的数值优选包括2至50,更优选2至30,甚至更优选2至10。
当p的数值为0时,则n尤其优选包括2至50,更优选2至30,甚至更优选2至10。
根据本发明的一个实施方案,s是0和p是1或2。
根据本发明的另一实施方案,s是0,p是1或2,和n,q,f,m是1。
优选地,G选自氢,溴,氯,碘,甲基,乙基,乙烯基,丙基,异丙基,烯丙基,丙烯基,己基,甲氧基,乙氧基,己氧基,乙基胺,丁基胺,己基胺。
在式(V)和(VIII)中,也可选择两个G基和/或G基与T/T'基之一,与双键一起形成环,例如下式(Va),(Vb),(Vc)(它们是式(V)的具体实施方案)和式(VIIIa)(它们是式(VIII)的具体实施方案)中所示的环己烯,环戊烯,二氢吡咯,phosphranylidene:
在本发明的一个实施方案中,基团Z和Z'选自亚乙炔基,顺式亚乙烯基和反式亚乙烯基。
优选地,R4和R5是氢。
优选地,根据本发明,R1,R2和R3选自C1-C8烷基,C2-C8烯基,C2-C8炔基,苯基,取代苯基,苄基,取代苄基。
优选地,根据本发明,Ar,Ar1,Ar2,Ar3和Ar4彼此独立地选自C6-C20未取代和取代的单环芳基,C10-C20多环芳基,C10-C50取代的多环芳基,C1-C20未取代和取代的单环杂芳基,C6-C20多环杂芳基,C6-C20取代的多环杂芳基及其组合作为二聚体,三聚体和四聚体。
Ar,Ar1,Ar2,Ar3和Ar4中的所述单环芳基,多环芳基,单环杂芳基,多环杂芳基的优选取代基选自卤素,烷基,烯基,炔基,或杂烷基。更优选,所述取代基选自直链或支链C1-C12烷基,直链或支链C2-C12烯基,直链或支链C2-C12炔基,C1-C12全氟烷基,C1-C12氧基烷基,C1-C12氨基烷基,C1-C12硫代烷基,C1-C12卤代烷基,C2-C12羧基烷基,C1-C12硅烷基。
根据本发明的一个方面,提供下式(Ia)和(IIa)的化合物,它们对应于式(I)和(II)的那些,其中p等于0:
其中R1,R2,R4,R5,Ar,Ar1,Ar4,Z,f,n,m如上定义。
在本说明书和权利要求书中,在式(I),(Ia)中连接Ar部分到噻吩并(双)酰亚胺单元上的曲线表示所述Ar部分与所述噻吩并(双)酰亚胺单元形成稠合的环体系。
另外,与在化学绘图实践中常见的一样,在本说明书和在权利要求书中,在式(II),(IIa)中与噻吩双键交叉的键线表示(Ar1)n和(Ar4)m部分可键合到噻吩环内的任何2或3个位置上,且没有稠合到其上。优选地,(Ar1)n和(Ar4)m部分键合到噻吩环的两个位置上。
在式(I)和(Ia)中,(Ar1)n和(Ar4)m部分可键合到与噻吩并(双)酰亚胺单元稠合的Ar部分的任何位置上。
在式(Ia)和(IIa)中,整数n和m优选包括1至30,更优选2至30,甚至更优选2至10。
优选地,在式(Ia)和(IIa)中,R4和R5是氢,和f是1或2。其中n为2的本发明化合物的特征在于在许多溶剂,例如二氯甲烷,二甲亚砜,四氢呋喃中有利地高的溶解度,从而便于高水平的纯化和容易溶液加工。
优选地,Ar1,Ar2,Ar3,Ar4彼此独立地为选自下述基团中的单元(a),(b),(c),(d),(e),(f),(g),(h),(i),(1),(m),(n),(o),(p),(q),(r):
其中A选自S,O,Se原子和SO,SO2,R14-P=0,P-R14,N-R15,Si(R15)2基;
D选自C,S,O,Se原子和SO,SO2,R14-P=O,P7R14,BR14,N-R15,Si(R15)2基;
B,C,彼此独立地选自C,N原子;
E选自C(R15)2,S,O和NR15基;
R8,R9,R10,R11,R12和R13,彼此独立地选自氢,卤素,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,C3-C20直链或支链环烷基,C2-C20直链或支链杂环烷基,C2-C20直链或支链烷基羧基,C2-C20直链或支链烷基甲酰胺基,C2-C20直链或支链 烷基亚氨基,C1-C20直链或支链烷基磺酸基,C1-C20直链或支链烷基腈基,C5-C40芳基,C6-C40烷芳基;
R14,R15彼此独立地选自氢,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,C3-C20直链或支链环烷基,C2-C20直链或支链杂环烷基,C2-C20直链或支链烷基羧基,C2-C20直链或支链烷基甲酰胺基,C2-C20直链或支链烷基亚氨基,C1-C20直链或支链烷基磺酸基,C1-C20直链或支链烷基腈基,C5-C40芳基,C6-C40烷芳基。
在式(h),(i),(1),(m),(n),(o),(p),(q),(r)中,意味着取代基可键合到形成离域体系的任何环的任何位置上。
式(a)-(r)中以上所述的基团的实例例如是下述:
在本发明的其他优选实施方案中,Ar1,Ar2,Ar3,Ar4基可以是含连接到另一芳基单元,例如以上表示的(a)-(r)基团上的噻吩,噻唑,呋喃,苯并二噻唑,噻吩并噻吩或苯基单元的二聚体,就好像在下述化学式(s)和(t)中一样:
其中W是选自以上所示基团(a)-(r)中的部分,和R16选自与R8-R13中的相同基团的部分。
更优选,Ar1,Ar2,Ar3,Ar4基可以是含α-连接到例如在化学式(u),(v),(w),(x)和(y)中的下述基团内的多环或低聚单元上的噻吩单元的二聚体:
其中R8,R9和n具有以上所述的含义。
在本发明的一个实施方案中,Ar1,Ar2,Ar3,Ar4是噻吩单元或取代噻吩单元
稠合到本发明的化学式(I)和(Ia)的化合物中的噻吩并酰亚胺单元上的Ar部分可以有利地由1,2或3个芳环形成。
优选地,在式(I),(Ia)中,Ar选自下述环:(α),(β),(γ),(δ),(ε),(ζ),(η),(θ),(ι):
其中X选自S,SO,SO2,O,Si,Se,NR17,
Y选自C和N;
R17选自氢,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,C3-C20直链或支链环烷基,C2-C20直链或支链杂环烷基,C2-C20直链或支链烷基羧基,C2-C20直链或支链烷基甲酰胺基,C2-C20直链或支链烷基亚氨基,C1-C20直链或支链烷基磺酸基,C1-C20直链或支链烷基腈基,C5-C40芳基,C6-C40烷芳基。
本发明的式(I)和(II)的化合物的具体实例例如是下述合成的化合物:
在不希望限制本发明到任何理论的情况下,认为噻吩酰亚胺部分因其强烈的吸电子效应导致可增加p-共轭材料的总体电子亲和性,从而有助于电荷传输能力。在噻吩并酰亚胺p-共轭嵌段之间存在不饱和键作为连接基可有助于高溶解度,可便于微细地调节HOMOLUMO能级,可促进如此改进的自-组装和结晶形貌的高分子平面性,从而最终提高电性能和器件的应答。
另一方面,可利用相对的端基来微调偶极矩,HOMO LUMO能级和轨道分布和包装形态,这最终会影响所得材料的功能性能。
在相对于其他组n-型材料,这种化合物的主要优点当中,要提及容易的可获得性和结构多样性。
在如下所述的常规或微波辅助的方法下,可通过交叉耦合,将噻吩并酰亚胺部分连接到选择的π-共轭核上。
本发明化合物的容易获得还允许容易改性低聚物的尺寸,和分子官能化的程度与类型,这反过来又允许针对目标应用,采用精细性能-特异的设计。
可通过层析,结晶和升华,获得具有电子水平纯度的本发明化合物,且通过经典的分析方法测定明确的分子结构。
与根据现有技术的噻吩-3,4-酰亚胺聚合物,联噻吩-酰亚胺聚合物和苝四羧酸二酰亚胺体系相反,可制备不同批次具有高度可再现性 的这一组材料,这对于实现具有可再现应答的器件来说是关键的。
根据本发明的再一方面,提供生产本发明化合物的方法,其中该方法包括反复卤化芳族化合物和交叉耦合反应。噻吩并(双)酰亚胺结构单元可被卤化或金属化,以经历与芳族(Ar2或Ar3)和/或不饱和的(Z)基对应物的交叉-耦合反应成Ar和Z部分的二聚体(即Ar2-Z)。本发明的方法优选通过钯催化。
流程图示1中概述了生产根据式(Ia)的化合物的方法,而流程图示2示出了式(IIa)的可能的生产方法:
流程图示1
流程图示2
在流程图示1和2中,X是卤素原子,例如Br,I;M是有机基金属化合物,例如B(OR')2和SnR"3,其中R'是氢或烷基部分,和R"是烷基部分。
在本发明的另一方面中,本发明涉及半导体材料,它包括根据化 学式(I)和/或(II)的至少一种化合物。优选地,所述半导体材料包括根据化学式(Ia)和/或(IIa)的至少一种化合物。
在本发明的一个实施方案中,所述半导体材料包括化合物1。
根据另一方面,本发明涉及一种电子器件,它包括与许多电极接触的半导体层,其中半导体层包括根据化学式(I)和/或(II)的至少一种化合物。优选地,所述半导体层包括根据化学式(Ia)和/或(IIa)的至少一种化合物。更优选,所述半导体层包括选自化合物1。
优选地,在光学器件,光电器件,场效应晶体管,集成电路,薄膜晶体管,有机发光器件和有机太阳能电池当中选择包括含本发明化合物的半导体层的所述电子器件。
特别地,根据本发明的噻吩并酰亚胺基材料的薄膜可在OFETs和OLET器件中用作有源层,这通过下述实施例证明。它们可在单层OFET中,用作电子或空穴传输层或者双极性半导体,在单层OLET中,用作多功能电子和空穴传输与发光层,和在多层OLET中,用作空穴或电子传输层。
最后,可预见根据本发明的化合物和材料在有机光伏电池中的应用。
在下述实施例中,在室温下,在400MHz(1H)和100.6MHz(13C)下操作的VarianMercury 400分光计上记录所有1H,13C光谱图。使用内部CDCl3共振,以TMS作为参考,校正化学位移。
在电子冲击(EI)电离模式下操作的离子阱Finningan Mat GCQ分光计上收集质谱图。借助直接暴露探针(DEP),引入每一样品到GCQ的离子源区域中。
在“热-段”装置上测定熔点,其中在显微镜辅助下,观察熔融过程。
使用Perkin Elmer Lambda 20分光计,记录UV-Vis光谱图。采用Perkin ElmerLS50B spectrofuorometer,使用对应于最大吸收λ的激发波长,获得光致发光的谱图。
通过在大气条件下,使用Thass DSC-XP-10仪器,进行差示扫描 量热法(DSC)分析。
使用Perkin Elmer Lambda 20分光计,记录UV-Vis光谱图。在Perkin Elmer LS50分光光度计上收集高脂肪的谱图。
实施例1:合成(E)-2,2'-(5,5'-乙烯-l,2-二基)双(噻吩-5,2-二基))双(5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮,化合物1:
步骤(a):
遵照在M.Melucci,M.Zambianchi,L.Favaretto,M.Gazzano,A.Zanelli,M.Monari,R.Capelli,S.Troisi,S.Toffanin,M.Muccini,Chem.Commun.2011,47,11840中描述的工序,通过使用正己基胺替代正丁基胺,以相同的摩尔比,由可商购的噻吩-2,3-二羧酸,制备2-(5-溴噻吩-2-基)-5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮。
步骤(b):
流程图示3.化合物1的合成路线
向2-(5-溴噻吩-2-基)-5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮(175mg,0.44mmol)和在N2氛围下,就地制备的催化剂Pd(AsPh3)4(10mol%,即11mg Pd2dba3和26mgAsPh3)的回流甲苯溶液(8ml)中逐滴添加在甲苯(3ml)内的可商购的反式-1,2-双(三丁基甲锡烷基)乙烯(153mg,0.20mmol)。回流该溶液24小时,然后真空除去溶剂,并用戊烷洗涤该粗产物。通过在自动化体系上进行的快速色谱法(200,Teledyne-Isco,Lincoln,NE,USA),使用4g氧化硅RediSep柱和环己烷-乙酸乙酯溶剂梯度,纯化该残渣。合并含有该产物的部分,蒸发溶剂,并从热甲苯中结晶残渣,得到暗红色固体(81mg,58%)。M.p.255℃,MS(70eV,EI):m/z 662(M·_1),最大吸收,465nm,最大发射,588nm在DCM中;1H NMR(CDC13,TMS/ppm)δ7.31(s,2H),7.24(d,3J=4.0Hz,2H),7.04(d,3J=4.0Hz,2H),7.02(s,2H),3.60(t,4H),1.64(m,4H),1.31(m,12H),0.88(m, 6H);13C NMR(CDC13,TMS/ppm)δ163.9,162.7,149.8,145.2,143.6,137.3,134.3,128.0,126.6,122.0,116.4,38.6,31.4,28.8,26.5,22.5,14.0。针对C34H34N2O4S4(662.90)的分析计算:C,61.60;H,5.17。发现C,61.54;H,5.22。
图1示出了在CH2Cl2中化合物1的UV-vis和发射谱图。
在图3(a)和(b)中示出了在空气中,化合物1的DSC热谱图(第二轮次,25℃/min)。
加热曲线(图2a)示出了位于约220℃下的第一转变,这对应于结晶相熔融成液晶相,和在约240℃处对应于清亮点的第二转变。一旦冷却熔体(图2b),则在约190℃处观察到转变,且它对应于熔体的重结晶。
在偏转显微图像中,在240℃至242℃处观察到液晶中间相,当加热化合物1的粉末样品时。
实施例2:薄膜晶体管(OTFT)的制造和光电测量
制造底栅-顶部接触几何形状(bottom gate-top contact geometry)的有机薄膜晶体管。借助两个超声循环,第一在丙酮中,然后2-异丙醇,清洁ITO基底,各自10分钟。然后,通过在清洁的ITO基底顶部上旋涂,使PMMA的450nm厚的介电层生长。在100Hz下,相对电容率ε=3.6。然后在手套箱内,在惰性氛围下,在120℃下(比PMMA的玻璃化转变温度高约10℃)热退火PMMA层15小时。(CPMMA=7.08nF/cm2)。
然后,在真空腔室内,采用0.03埃/秒的沉积速率,在10-6mbar的基础压力下,通过真空升华,在所述介电层的顶部上生长由化合物1组成的有机薄膜层。在薄膜沉积过程中基底的温度保持在室温(RT)下。
然后,在有机薄膜的顶部上,通过经荫罩板(shadow mask)蒸发,制造金源电极和漏电极。所述金漏电极和源电极的厚度为50nm,而沟道的长度(L)和沟道的宽度(W)分别为40μm和12mm。
然后测量这一晶体管的电特性。在MBraun氮气手套箱内,使用标 准SUSS ProbeStation,进行所有光电测量。
使用标准方程式,由轨迹曲线,计算饱和时的迁移率值:
[方程式1]μ=L/(w*c)A^2
其中A是拟合漏电流的平方根vs施加的电压的直线的角系数,L是沟道长度,W是沟道宽度,和C是晶体管的电容率。
图3(a)示出了轨迹曲线N,和图3(b)是含由化合物1组成的有机层的这种晶体管的典型输出曲线。
图4示出了含由化合物1组成的有机层的这种晶体管的N型的转化饱和曲线,其中μN=210-3cm2/Vs,VT N≈60V.
图5示出了含由化合物1组成的有机层的这种晶体管的P型的转化饱和曲线,其中μΡ=110-7cm2/Vs,VT P≈70V。
实施例3:合成2,2'-(5,5'-(乙炔-l,2-二基)双(噻吩-5,2-二基)双(5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮),化合物7
步骤a):合成2,2'-联噻吩基乙炔
向干燥的圆底烧瓶中引入PdCl2(PPh3)2(210mg,6mol%),CuI(190mg,10mol%),和2-碘噻吩(1.02ml,0.01mol)。在搅拌下添加干燥甲苯(50ml)。通过注射器,添加氩气-喷射的DBU(8.97ml,0.06mol),并用氩气喷射该反应烧瓶。通过注射器,添加冰-骤冷的三甲基甲硅烷基乙炔(0.69ml,5mmol),立即接着添加蒸馏水(73μL,4mmol)。在不存在光的情况下,在室温下进行反应18小时。然后在乙醚和蒸馏水(各自200ml)中分配该反应混合物。用含水HCl(10%w/w,3x 250ml)和盐水(1x 250ml)洗涤有机层,在Na2SO4上干燥,并减压浓缩。通过快速色谱法,在硅胶(用正己烷洗脱)上纯化粗产物,得到 白色晶体固体形式的纯的产物2,2'-联噻吩乙炔。产率=72%(984mg)。M.p.101℃(lit.96℃)。EI-MS m/z 190(M+)。1H NMR(CDCl3,TMS/ppm)δ7.31(dd,3J=5.2Hz,4J=1.2Hz,2H),7.28(dd,3J=3.6Hz, 4J=1.2Hz,2H),7.02(dd,3J=5.2Hz,3J=3.6Hz,2H);13C NMR(CDC13,TMS/ppm)δ132.1,127.6,127.1,122.9,86.2。
步骤b):合成5,5'-双(三丁基甲锡烷基)-2,2'-联噻吩乙炔:
在室温下,向2,2'-联噻吩乙炔(190mg,1.00mmol)在干乙醚(12mL)内的溶液中添加t-BuLi(2.5M在己烷内,0.92ml,2.30mmol)。1小时之后,逐滴添加三丁基氯化锂(0.57ml,2.10mmol)。在室温下,在搅拌下保持该反应混合物4小时,然后在AcOEt和蒸馏水中分配(各自50ml)。用盐水(2x 50ml)洗涤有机层,在Na2SO4上干燥并浓缩。以定量的产率,以黄-琥珀色油状物形式获得标题化合物且在没有进一步纯化的情况下用于最终的合成步骤。EI-MSm/z 768(M+)。1H NMR(CDC13,TMS/ppm)δ7.36(d,3J=3.2Hz,2H),7.05(d,3J=3.2Hz,2H),1.55(m,12H),1.33(m,12H),1.12(m,12H),0.91(m,18H)。
步骤c):合成2,2'-(5,5'-(乙炔-l,2-二基)双(噻吩-5,2-二基))双(5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮),化合物7
向2-溴-5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮,4(348mg,1.10mmol)和在N2氛围下就地制备的催化剂Pd(AsPh3)4(10mol%,即52mg Pd2dba3和122mg AsPh3)的回流的甲苯溶液(15ml)中逐滴添加化合物3(384mg,0.50mmol)。回流该溶液24小时,然后真空除去溶剂,并用戊烷洗涤粗产物。通过在具有24g氧化硅RediSep柱和环己烷-乙酸乙酯溶剂梯度的自动化体系上进行的快速色谱法(200,Teledyne-Isco,Lincoln,NE,USA),纯化残渣。
由于它在硅胶上强烈地保留,因此最终用热甲苯洗脱标题化合物。合并含有该产物的部分,蒸发溶剂,和从甲苯中结晶的残渣得到225mg橙色固体(68%产率)。M.p.228℃。EI-MS m/z 660(M+)。λmax(CH2C12), 433nm,λem(CH2C12),547nm。1H NMR(CDC13,TMS/ppm)δ7.34(s,2H),7.25(d,3J=4.0Hz,2H),7.24(d,3J=4.0Hz,2H),3.60(t,4H),1.62(m,4H),1.31(m,12H),0.88(m,6H)。13C NMR(CDCl3,TMS/ppm)δ163.8,162.6,148.9,145.2,138.1,137.1,133.5,125.9,124.0,117.1,88.1,38.7,31.4,28.7,26.5,22.5,14.0。针对C34H32N2O4S4(660.89)的分析计算:C,61.79;H,4.88。发现:C,61.72;H,4.95。
实施例4:合成(E)-2,2'-(5',5"'-(乙烯-l,2-二基)双([2,2'-联噻吩]-5',5-二基))双(5-己基-4H-噻吩并[2,3-c]吡咯-4,6(5H)-二酮),化合物8
步骤a):合成(E)-l,2-双(5-(三丁基甲锡烷基)噻吩-2-基)乙烷
在-50℃下,向在氮气氛围下,(E)-l,2-双(2-噻吩基)乙烷ref1(0,900g,0,00469mol)在25ml THF内的无水溶液中添加TMEDA(四甲基乙二胺)(0,0103mol)。然后,在-78℃下制冷该溶液,并逐滴添加BuLi(2,5M,在己烷内)(4,3ml,0,01078mol)。搅拌该混合物30分钟,然后回流1小时,并在-78℃下制冷。在这一温度下,逐滴添加Bu3SnCl(3,2g,0,0098mol),并在室温下搅拌该反应过夜。真空除去溶剂,然后将该混合物溶解在CH2Cl2内,并用水猝灭。在萃取之后,在Na2SO4上干燥有机相并蒸发溶剂,从而获得棕色油状物的所需化合物(3,5g,产率98%)。
EI-MS m/z 770(M·+)。
1H NMR(CDCl3,TMS/ppm)δ7.12(d,3J=3.6Hz,2H),7.10(s,2H),7.04(d,3J=3.2Hz,2H),1.56(m,6H),1.32(m,6H),1.10(m,6H),0.91(t,9H)。
13C NMR(CDCl3,TMS/ppm)δ148.2,136.7,136.0,126.9,121.1,28.9,27.3,13.7,10.8。
Ref.l:Heteroatom Chemistry,第14卷,第3期,2003,218。
步骤b):合成(E)-2,2'-(5',5"'-(乙烯-l,2-二基)双([2,2'-联噻吩]-5',5-二基))双(5-己基-4H-噻吩并[2,3-c]吡咯-4.6(5H)-二酮),化合物8:
向步骤a)中获得的化合物(163mg,0.41mmol)和在氮气氛围下,就地制备的催化剂Pd(AsPh3)4(10mol%,即21mg Pd2dba3和49mg AsPh3,在12ml甲苯中)的回流的甲苯溶液(5ml)中添加逐滴添加在甲苯(1.5ml)内的2(145mg,0.188mmol)。在室温下回流该溶液7小时,添加戊烷。通过快速色谱法,在硅胶上(用戊烷:CH2Cl2:AcOEt/40:30:30→戊烷:CH2Cl2/70:30→CH2Cl2洗脱)纯化通过除去溶剂获得的固体。合并含该产物的部分,蒸发溶剂,并从热甲苯中结晶残渣,得到暗红色的固体(65mg,产率42%)。
M.p.286℃。EI-MS m/z 826(M·+)。λmax(CH2C12),487nm,λ em(CH2Cl2),626nm。1H NMR(CDCl3,TMS/ppm)δ7.31(s,2H),7.25(d, 3J=3.6Hz,2H),7.14(d,3J=4.0Hz,2H),7.13(d,3J=3.6Hz,2H),6.99(d,3J=4.0Hz,2H),6.98(s,2H),3.60(t,4H),1.64(m,4H),1.31(m,12H),0.88(t,6H)。
Claims (8)
1.具有式(IIa)的化合物:
其中R1,R2,彼此独立地选自C1-C40直链或支链烷基,
R4,R5,彼此独立地选自氢,卤素,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,
Ar1,Ar4,彼此独立地为C1-C50未取代和取代的单环杂芳基,
Z,是
G选自氢,卤素,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基,
f是整数1至10,
n,m彼此独立地为1至10的整数。
2.权利要求1的化合物,其中f为1或2,n、m为2至10。
3.权利要求2的化合物,其中Z为反式-亚乙烯基。
4.权利要求3的化合物,其中Ar1,Ar4彼此独立地为单元(a):
其中A选自S,O,Se原子;
R8,R9彼此独立地选自氢,卤素,C1-C20直链或支链烷基,C2-C20直链或支链烯基,C2-C20直链或支链炔基,C1-C20直链或支链杂烷基,C2-C20直链或支链杂烯基,C2-C20直链或支链杂炔基。
5.具有下式的化合物:
6.权利要求1至5任何一项的化合物在电子器件中作为有机半导体材料的用途。
7.权利要求6的用途,在电子器件中作为n-型有机半导体材料。
8.一种电子器件,它包括与许多电极接触的半导体层,其中该半导体层包括权利要求1至7任何一项的至少一种化合物。
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