CN104751931A - 辐照电子束下小车装置 - Google Patents
辐照电子束下小车装置 Download PDFInfo
- Publication number
- CN104751931A CN104751931A CN201310749895.4A CN201310749895A CN104751931A CN 104751931 A CN104751931 A CN 104751931A CN 201310749895 A CN201310749895 A CN 201310749895A CN 104751931 A CN104751931 A CN 104751931A
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- CN
- China
- Prior art keywords
- device under
- support
- irradiation
- trolley device
- electronic beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201310749895.4A CN104751931A (zh) | 2013-12-31 | 2013-12-31 | 辐照电子束下小车装置 |
Applications Claiming Priority (1)
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CN201310749895.4A CN104751931A (zh) | 2013-12-31 | 2013-12-31 | 辐照电子束下小车装置 |
Publications (1)
Publication Number | Publication Date |
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CN104751931A true CN104751931A (zh) | 2015-07-01 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201310749895.4A Pending CN104751931A (zh) | 2013-12-31 | 2013-12-31 | 辐照电子束下小车装置 |
Country Status (1)
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CN (1) | CN104751931A (zh) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6617596B1 (en) * | 2000-11-17 | 2003-09-09 | Steris Inc. | On-line measurement of absorbed electron beam dosage in irradiated product |
US20040041101A1 (en) * | 2002-08-30 | 2004-03-04 | Canon Kabushiki Kaisha | Exposure apparatus |
US20050205809A1 (en) * | 2004-03-16 | 2005-09-22 | Canon Kabushiki Kaisha | Electron beam exposure apparatus |
CN2857162Y (zh) * | 2005-12-16 | 2007-01-10 | 北京核二院比尼新技术有限公司 | 新型伽玛辐照装置 |
CN201323067Y (zh) * | 2008-09-28 | 2009-10-07 | 天津滨海北方辐照技术有限公司 | 一种辐照电子束下无间隙小车装置 |
CN201497883U (zh) * | 2009-07-29 | 2010-06-02 | 江苏达胜加速器制造有限公司 | 加速器辐照控制系统 |
CN201514782U (zh) * | 2009-09-18 | 2010-06-23 | 黄石众力辐照工程技术有限公司 | 旋转辐照小车 |
CN201694625U (zh) * | 2010-04-22 | 2011-01-05 | 滁州市中诺设备模具制造有限公司 | 一种同步带式双向运载系统 |
CN202383090U (zh) * | 2011-12-12 | 2012-08-15 | 上海工业自动化仪表研究院 | 变剂量率辐照试验装置 |
CN203733485U (zh) * | 2013-12-31 | 2014-07-23 | 上海长园电子材料有限公司 | 辐照电子束下小车装置 |
-
2013
- 2013-12-31 CN CN201310749895.4A patent/CN104751931A/zh active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6617596B1 (en) * | 2000-11-17 | 2003-09-09 | Steris Inc. | On-line measurement of absorbed electron beam dosage in irradiated product |
US20040041101A1 (en) * | 2002-08-30 | 2004-03-04 | Canon Kabushiki Kaisha | Exposure apparatus |
US20050205809A1 (en) * | 2004-03-16 | 2005-09-22 | Canon Kabushiki Kaisha | Electron beam exposure apparatus |
CN2857162Y (zh) * | 2005-12-16 | 2007-01-10 | 北京核二院比尼新技术有限公司 | 新型伽玛辐照装置 |
CN201323067Y (zh) * | 2008-09-28 | 2009-10-07 | 天津滨海北方辐照技术有限公司 | 一种辐照电子束下无间隙小车装置 |
CN201497883U (zh) * | 2009-07-29 | 2010-06-02 | 江苏达胜加速器制造有限公司 | 加速器辐照控制系统 |
CN201514782U (zh) * | 2009-09-18 | 2010-06-23 | 黄石众力辐照工程技术有限公司 | 旋转辐照小车 |
CN201694625U (zh) * | 2010-04-22 | 2011-01-05 | 滁州市中诺设备模具制造有限公司 | 一种同步带式双向运载系统 |
CN202383090U (zh) * | 2011-12-12 | 2012-08-15 | 上海工业自动化仪表研究院 | 变剂量率辐照试验装置 |
CN203733485U (zh) * | 2013-12-31 | 2014-07-23 | 上海长园电子材料有限公司 | 辐照电子束下小车装置 |
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C06 | Publication | ||
PB01 | Publication | ||
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CB02 | Change of applicant information |
Address after: 201802 Shanghai City, Jiading District Nanxiang Town Jiahao Road No. 1690 Applicant after: Shanghai Changyuan Electronic Material Co., Ltd. Applicant after: Changyuan electronic (Group) Co., Ltd. Address before: 201802 Shanghai City, Jiading District Nanxiang Town Jiahao Road No. 1690 Applicant before: Shanghai Changyuan Electronic Material Co., Ltd. Applicant before: Shenzhen Changyuan Electronic Material Co., Ltd. |
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COR | Change of bibliographic data | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150701 |
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RJ01 | Rejection of invention patent application after publication |