CN104741780A - Method and apparatus for compensating laser pulses - Google Patents
Method and apparatus for compensating laser pulses Download PDFInfo
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- CN104741780A CN104741780A CN201410830679.7A CN201410830679A CN104741780A CN 104741780 A CN104741780 A CN 104741780A CN 201410830679 A CN201410830679 A CN 201410830679A CN 104741780 A CN104741780 A CN 104741780A
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- laser pulse
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- light source
- indivedual
- attenuator
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2383—Parallel arrangements
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- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
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- Mechanical Engineering (AREA)
- Lasers (AREA)
- Laser Beam Processing (AREA)
Abstract
A method and an apparatus for compensating laser pulses are provided. The method includes following steps: measuring an individual laser pulse, including measuring a peak value of individual laser pulse emitted from a plurality of laser sources and subjected to intensity adjustment by each individual attenuator; controlling the angle of incidence of each attenuator, wherein the angle of incidence of the attenuator assigned to a laser source outside an error range is adjusted when the peak value of the individual laser pulse is outside an individual error range set in advance; and repeating the step of measuring an individual laser pulse and the step of controlling the angle of incidence of an individual attenuator until the peak value of the individual laser pulse is in an individual error range set in advance. By compensating changes of wave forms of pulses of each laser source, defects in a process can be prevented.
Description
Technical field
The present invention relates to the method and apparatus for calibration of laser pulse, and more particularly, relate to the method and apparatus for the energy intensity of calibration of laser pulse when laser pulse being radiated substrate.
Background technology
Because be difficult to guarantee uniformity due to the increase of substrate size when performing annealing after deposit film, so there is many replacement schemes, one of them is the method for annealing using laser pulse.
Three principal elements can affect laser annealing.Three factors comprise: wire harness profile, and it represents line length and the uniformity of the laser beam of institute's radiation; Laser energy, it represents the energy intensity of laser pulse; And pulse shape, it represents the pulse shape of laser beam.These three factors can increase and the value of change with the number of times of laser pulse.When these factors have the value exceeding term of reference, the defect in annealing process increases, and the operating time of large-scale production reduces, and therefore existence is limited in, and production efficiency reduces.
The laser pulse penetrated from multiple LASER Light Source is radiated substrate via attenuator and optical system.But, when use utilizes two or more LASER Light Source with the facility of complementary energies between described LASER Light Source, along with the time goes over, the change of scattering is there is between LASER Light Source, and therefore existence is limited in, be difficult to the shape maintaining the pulse produced by the combination of initial laser light source.
In order to solve this restriction, identical high voltage is fed to each in LASER Light Source, this has and is limited in, the change of the scattering between LASER Light Source occurs according to the characteristic of LASER Light Source, and the scattering of output energy between LASER Light Source is also depended on the increase of used laser pulse amount and changes.
[patent document]
(patent document 0001) 10-2011-0070265 Korean Patent is open.
Summary of the invention
The invention provides to correct and launch and the apparatus and method of the change of the impulse waveform of the laser pulse of output from two or more LASER Light Sources.And the present invention carrys out the change of calibration of laser pulse by controlling other peripheral unit instead of LASER Light Source self.
According to an one exemplary embodiment, the method of calibration of laser pulse comprises following process: measure a respective laser pulse, wherein measures from multiple LASER Light Source injection (transmitting) and is carried out the peak value of the described respective laser pulse of intensity adjustment by each indivedual attenuator; Control the incidence angle of each attenuator, wherein regulate the described incidence angle being assigned to indivedual attenuators of the LASER Light Source be in outside error range when the described peak value of measured respective laser pulse is in outside the discrete error scope that pre-sets; And repeat the process of the process of described measurement described respective laser pulse and the described incidence angle of the indivedual attenuator of described control, until the described peak value of measured respective laser pulse is within the scope of the discrete error that pre-sets.
The process of the described incidence angle of the described indivedual attenuator of described control can comprise: when the described peak value of described measured respective laser pulse is less than the individual peak pre-set, regulate be assigned to be less than described in the described incidence angle of indivedual attenuators of the LASER Light Source of individual peak that pre-sets with the lower limit causing the described peak value of respective laser pulse to reach described error range.
The process of the described incidence angle of the described indivedual attenuator of described control can comprise: when the described peak value of described measured respective laser pulse exceedes the individual peak pre-set, regulate be assigned to exceed described in the described incidence angle of described indivedual attenuator of the LASER Light Source of individual peak that pre-sets with the upper limit causing the described peak value of respective laser pulse to reach described error range.
According to another one exemplary embodiment, a kind of method of calibration of laser pulse comprises following process: measure the synchronous of respective laser pulse and penetrating from multiple LASER Light Source to check and undertaken whether there is synchronization delay between the laser pulse of intensity adjustment by each indivedual attenuator; And control the incidence angle of indivedual attenuator, wherein when there is described synchronization delay, be assigned to the described incidence angle of indivedual attenuators of LASER Light Source through regulating with the intensity changing laser pulse.
In the described synchronous process of described measurement described respective laser pulse, can check whether and detect that the peak value of each laser pulse is to check described synchronization delay simultaneously.
Can be depending on time span through synchronization delay to determine the intensity of the incidence angle of the LASER Light Source of synchronization delay.
The energy intensity of the laser pulse of LASER Light Source can increase along with the described time span through synchronization delay and increase.
According to another one exemplary embodiment, a kind of device for calibration of laser pulse comprises: multiple respective laser light source, injection (transmitting) laser pulse; Indivedual attenuator, is assigned to each LASER Light Source to control the incidence angle of laser pulse to regulate the intensity of laser pulse; Respective laser impulsive measurement unit, measures the waveform of the respective laser pulse exported from described indivedual attenuator; And feedback compensation unit, depend on the change of measured respective laser pulse and regulate the incidence angle of the indivedual attenuators being assigned to each LASER Light Source, being in error range to cause the waveform of respective laser pulse.
Described respective laser impulsive measurement unit can be measured from described multiple LASER Light Source injection and pass the peak value of the respective laser pulse of each indivedual attenuator.
Described feedback compensation unit progressively can regulate the incidence angle of the indivedual attenuators being assigned to the LASER Light Source be in outside error range, with within the scope of the discrete error causing the described peak value of measured respective laser pulse to be in pre-set.
Described respective laser impulsive measurement unit can check from described multiple LASER Light Source injection and through each indivedual attenuator laser pulse whether there is synchronization delay.
Described feedback compensation unit can regulate the incidence angle of the indivedual attenuators being assigned to the LASER Light Source with described synchronization delay to change the intensity of laser pulse when there is synchronization delay.
According to the present invention, by correcting the change of the impulse waveform of the laser pulse exported from two or more LASER Light Source, the laser pulse being radiated substrate can be maintained consistently.Therefore, by correcting the change of the impulse waveform of each LASER Light Source, the defect in technique can be prevented.
Accompanying drawing explanation
One exemplary embodiment can be understood in more detail by reference to the accompanying drawings from following description.
Fig. 1 is the block diagram of laser-adjusting device according to an embodiment of the invention.
Between the first laser pulse with the second laser pulse, synchronous curve map is there is in Fig. 2 (a) for depending on.
Between the first laser pulse with the second laser pulse, synchronous curve map is there is not in Fig. 2 (b) for depending on.
Fig. 3 is the flow chart according to an embodiment of the invention by using the peak value of laser pulse to carry out the process of calibration of laser intensity.
Fig. 4 is according to an embodiment of the invention by using the flow chart of the process of the synchronously calibration of laser intensity of laser pulse.
Fig. 5 (a) and Fig. 5 (b) shows the waveform obtained by being added with the second laser pulse by the first laser pulse.
Fig. 6 (a), Fig. 6 (b), Fig. 6 (c), Fig. 6 (d) show the process of the intensity increasing laser pulse according to an embodiment of the invention when there is synchronization delay.
[main element label declaration]
10: laser pulse
11: the first laser pulses
12: the second laser pulses
100: LASER Light Source
100a: the first LASER Light Source
100b: the second LASER Light Source
100c: LASER Light Source
100n: LASER Light Source
200: attenuator
200a: the first attenuator
200b: the second attenuator
200c: attenuator
200n: attenuator
300: optical system
400: respective laser impulsive measurement unit
500: feedback compensation unit
S310, S320, S330, S410, S420: process
Detailed description of the invention
Hereafter referring to accompanying drawing, one exemplary embodiment of the present invention is described in more detail.But the present invention is by multi-form embodiment and should not be considered as being limited to embodiment described in this paper.But, provide these embodiments to be detailed and complete to make the present invention, and pass on scope of the present invention all sidedly to those skilled in the art.Same-sign on graphic represents same components.
Hereinafter, although describe embodiments of the invention by using laser-adjusting device, but it is evident that, described embodiment also can be applicable to apply all lining processors of laser-adjusting device, laser machining device, laser anneal device and laser heat treatment equipment.
Fig. 1 is the block diagram of laser-adjusting device according to an embodiment of the invention.
Laser-adjusting device may be implemented in and laser pulse is radiated substrate with by the device of substrate annealing according to an embodiment of the invention.The present invention is not limited thereto, and can be applicable to various laser-adjusting device, such as, from the laser lift-off device of substrate removal film.
Laser-adjusting device comprises multiple LASER Light Source 100, is assigned to the attenuator 200 of each LASER Light Source 100, measures the respective laser impulsive measurement unit 400 of the laser pulse exported from attenuator 200, optical system 300 and feedback compensation unit 500.
LASER Light Source 100 penetrates laser pulse.The laser pulse penetrated from LASER Light Source 100 can reflect from speculum (not shown), and the surface of substrate in radiation direction process chamber.LASER Light Source 100 has the known configurations producing laser beam, and depends on the wavelength of the laser pulse used, and can use various types of device, such as, and KrF excimer laser apparatus and ArF excimer laser apparatus.For example, LASER Light Source 100 can comprise following one or more in each: the gas laser pulses such as such as Ar laser instrument, Kr laser instrument or excimer laser beam; Have by adding one or more in Nd, Yb, Cr, Ti, Ho, Er, Tm and Ta to monocrystalline YAG, YVO as adulterant
4, forsterite (Mg
2siO
4), YAlO
3or GdVO
4or polycrystalline (pottery) YAG, Y
2o
3, YVO
4, YAlO
3or GdVO
4and the laser pulse of the medium obtained; Glass laser bundle; Ruby laser bundle; Alexandrite laser bundle; Ti: sapphire laser bundle; Copper vapor laser pulse; Or golden vapor laser bundle.LASER Light Source 100 is in single or multiple, and each (100a, 100b, 100c or the 100n) in LASER Light Source 100 is controlled by LASER Light Source control module (not shown) individually to penetrate laser pulse.
The injection that LASER Light Source control module (not shown) controls each LASER Light Source 100 is with can with wanted laser intensity radiation substrate.
Indivedual attenuator 200 is arranged on the laser line inbound path of each LASER Light Source 100, regulates the intensity inciding the laser pulse of attenuator 200, and exports the laser pulse through regulating.
Usually, the incidence angle by controlling the laser pulse penetrated from light source 100 regulates the intensity of the laser pulse of incident optical system.Because the control of the incidence angle of attenuator is known, describe in detail so do not provide relevant.Indivedual attenuator 200 (200a, 200b, 200c or 200n) is assigned to each LASER Light Source 100, in this case, for example, first attenuator 200a is arranged on the travel path of the laser pulse penetrated from the first LASER Light Source 100a, and the second attenuator 200b is arranged on the travel path of the laser pulse penetrated from the second LASER Light Source 100b.For reference, although Fig. 1 shows that multiple attenuator is assigned to LASER Light Source respectively, another embodiment can implement single attenuator but not multiple attenuator.When implementing single indivedual attenuator, implement corresponding indivedual attenuators individually to receive laser pulse from each LASER Light Source to perform unit control.
Optical system 300 is arranged on the travel path of the laser beam addition exported from indivedual attenuator 200, and process exports and the shape of the laser pulse be added and Energy distribution from attenuator 200.That is, shape and Energy distribution treated with make from LASER Light Source 100 penetrate laser pulse become linear laser beam via optical system 300.Laser pulse can be treated to wire beam, and its surperficial shape beam with wide region according to the whole surface penetrating substrate is easily assembled.For this reason, optical system 300 can comprise the beam expanding telescope of the shape of process laser beam and make the uniform beam homogenizer of the Energy distribution of handled laser beam.
Respective laser impulsive measurement unit 400 measures the waveform of the respective laser pulse exported from indivedual attenuator 200.For example, by using two kinds of methods to measure the waveform of laser pulse.A kind of method is that measurement is penetrated from multiple LASER Light Source 100 and passes the peak value of the respective laser pulse of each indivedual attenuator 200.Regulate from the intensity of the laser pulse of each LASER Light Source 100 injection via indivedual attenuator 200, in this case, the peak value of laser pulse is measured.Another kind method be check from multiple LASER Light Source 100 penetrate and through each indivedual attenuator 200 laser pulse whether there is synchronization delay.There is the method for many inspection synchronization delays.For example, by checking the peak value that when occurs each laser pulse and then checking whether detect that the peak value of target laser pulse is to check synchronization delay while there is the peak value of each laser pulse.Each LASER Light Source 100 is synchronous by LASER Light Source control module (not shown), and when not yet performing synchronous, the peak value of detection laser pulse time different.For reference, Fig. 2 (a) displaying detects peak value (maximum) simultaneously, this is because the first laser pulse and the second laser pulse synchronization, and Fig. 2 (b) is illustrated in the peak value that different time detects the first laser pulse and the second laser pulse, this is because not yet perform synchronous.
Need the peak value of measurement laser pulse and check whether executed is synchronous between laser pulses, to carry out feedback compensation.
Feedback compensation unit 500 depends on the change of measured respective laser pulse and regulates the incidence angle of the indivedual attenuators 200 being assigned to each LASER Light Source 100, is not in outside error range to make the waveform of respective laser pulse.
For example, in order to the peak value of the waveform making laser pulse is within the scope of the discrete error pre-set, the incidence angle being assigned to indivedual attenuators 200 of the LASER Light Source 100 be in outside error range is regulated, with adjusting strength.Or, when there is synchronization delay, regulate the incidence angle being assigned to indivedual attenuators 200 of the LASER Light Source 100 with synchronization delay, to change the intensity of laser pulse not to be in outside error range.
Hereinafter, two examples of feedback compensation are described referring to Fig. 3 and Fig. 4.
Fig. 3 is the flow chart according to an embodiment of the invention by using the peak value of laser pulse to carry out the process of calibration of laser intensity.
Referring to Fig. 1 and Fig. 3, perform the process S310 measuring respective laser pulse, wherein measure and to penetrate from multiple LASER Light Source 100 and to carry out the peak value of the respective laser pulse of intensity adjustment via indivedual attenuator 200.When LASER Light Source 100 comprises two LASER Light Sources 100 (that is, the first LASER Light Source 100a and the second LASER Light Source 100b), it has different laser pulse intensity.For example, when the peak value being finally radiated the final laser pulse of substrate by the first LASER Light Source 100a and the second LASER Light Source 100b needs to be 100 MJs/square centimeter, if when being 70 MJs/square centimeter from the peak value of the first laser pulse of the first attenuator 200a output of the first LASER Light Source 100a, the peak value of the second laser pulse so exported by the second attenuator 200b from the second LASER Light Source 100b is defined as 30 MJs/square centimeter.
For reference, the energy intensity of laser pulse can use various unit, but embodiments of the invention can represent intensity by the energy density (MJ/square centimeter) of the energy (MJ) representing per unit area (square centimeter).
When using laser pulse, there is the change of energy intensity between laser pulses, and be therefore difficult to the shape maintaining the pulse produced by the combination of primary laser pulse.For example, because in the starting stage such as shown in Fig. 5 (a), the peak value of first laser pulse 11 of the first LASER Light Source 100a is 70 MJs/square centimeter and the peak value of second laser pulse 12 of the second LASER Light Source 100b is 30 MJs/square centimeter, so the peak value being radiated the laser pulse 10 of the addition of substrate is 100 MJs/square centimeter, and therefore represent normal output.
But, as shown in Fig. 5 (b), when second laser pulse of the second LASER Light Source 100b peak value along with time variations be just 25 MJs of/square centimeter of time, the peak value being radiated the final laser pulse 10 of substrate is just 95 MJs/square centimeter.Therefore, correction is needed to be radiated the summation of the peak value of the final laser pulse of substrate to become 100 MJs/square centimeter (it is for initial values).
In order to solve this restriction, the present invention has the process S320 progressively regulating the incidence angle of the indivedual attenuators 200 being assigned to the LASER Light Source 100 be in outside error range when the peak value of respective laser pulse is in outside the discrete error scope that pre-sets.
For example, as shown in Fig. 5 (b), when error range is ± 1%, be assigned to the incidence angle of the second attenuator 200b of the second LASER Light Source 100b through progressively regulating to make the peak value of the pulse of the second LASER Light Source 100b be in 30 MJs/square centimeter ± 1% (that is, the scope of 29 MJs/square centimeter to 31 MJs/square centimeter).
When the peak value of measured respective laser pulse is less than the individual peak pre-set, be assigned to the incidence angle of indivedual attenuators 200 of the LASER Light Source 100 had compared with small leak through regulating with the lower limit making the peak value of respective laser pulse reach error range.For example, when the peak value of the pulse of the second LASER Light Source 100b shown in such as Fig. 5 (b) is 25 MJs/square centimeter, the incidence angle of first other attenuator 200 through progressively regulating the lower limit reaching error range, that is, 29 MJs/square centimeter.
By contrast, when the peak value of measured respective laser pulse exceedes the individual peak pre-set, be assigned to the incidence angle of indivedual attenuators 200 of the LASER Light Source 100 with the peak value exceeded through regulating with the upper limit making the peak value of respective laser pulse reach error range.For example, when the peak value of the pulse of the second LASER Light Source 100b is 33 MJs/square centimeter, the incidence angle of first other attenuator 200 through progressively regulating the upper limit reaching error range, that is, 31 MJs/square centimeter.
Repeatedly perform and progressively control the process S310 of attenuator 200 and S320, until in process S330, till the peak value of measured respective laser pulse is within the scope of the discrete error that pre-sets.
Fig. 4 is according to an embodiment of the invention by using the flow chart of the process of the synchronously calibration of laser intensity of laser pulse.
Perform the synchronous process S410 measuring respective laser pulse, it checks and is penetrating from multiple LASER Light Source 100 and whether there is synchronization delay between the laser pulse being carried out intensity adjustment by each indivedual attenuator 200.
When using multiple LASER Light Source 100, need synchronous between the respective laser pulse penetrated from each LASER Light Source 100.From the synchronous examples show between the laser pulse that two LASER Light Sources 100 penetrate among Fig. 6 (a).The final laser pulse obtained by the summation through the first synchronous laser pulse and the second laser pulse is radiated substrate.
But, when using laser pulse, there is the change of energy intensity between laser pulses, and be therefore difficult to the shape maintaining the pulse produced by the combination of primary laser pulse.In this case, as shown in Fig. 6 (b), the second laser pulse 12 postpones, and therefore not synchronous with the first laser pulse 11.In this case, first laser pulse 11 in each time zone and the summation of the second laser pulse 12 reduce, and result is the laser energy intensity that laser energy intensity is less than through synchronous pulse.
For reference, in the synchronous process measuring respective laser pulse, synchronously whether postpone by using various method to check.For example, the peak value each laser pulse simultaneously being detected can be checked whether, there is synchronization delay to check whether.Referring to Fig. 6 (b), the time of the peak value of visible appearance the first laser pulse 11 is different from the time of the peak value of appearance second laser pulse 12.When the time occurring peak value is mutually different, determine to there is synchronization delay.
When there is synchronization delay, the present invention regulates the incidence angle being assigned to indivedual attenuators 200 of LASER Light Source 100 to change the intensity of laser pulse.For example, as shown in Fig. 6 (c), the incidence angle being assigned to the first attenuator 200a of the first LASER Light Source 100a by control and the incidence angle two of the second attenuator 200b being assigned to the second LASER Light Source 100b, can increase 10% respectively by the intensity of the intensity of the first laser pulse 11 and the second laser pulse 12.In this case, because the summation of two laser pulses as shown in Fig. 6 (d) increases, so can have wanted energy intensity.
Increasing the energy intensity of the laser pulse of LASER Light Source 100 by increasing along with the time span through synchronization delay, performing the adjustment of the incidence angle of each indivedual attenuator 200.Because laser pulse tends to diminish from peak value, so increase the energy intensity of laser pulse by increasing along with the time span through synchronization delay, control the incidence angle of attenuator 200.
According to embodiments of the invention, by correcting the change of the impulse waveform of the laser pulse exported from two or more LASER Light Source, the laser pulse being radiated substrate can be maintained consistently.Therefore, by correcting the change of the impulse waveform of each LASER Light Source, the defect in technique can be prevented.
Although the applicant describes the present invention with reference to accompanying drawing and one exemplary embodiment, the present invention is not limited thereto and be defined by claim of enclosing.Therefore, those skilled in the art can implement variations and modifications and not depart from the technical spirit of claim of enclosing.
Claims (12)
1. a method for calibration of laser pulse, is characterized in that, the method for described calibration of laser pulse comprises following process:
Measure respective laser pulse, wherein measure from multiple LASER Light Source injection and carried out the peak value of the described respective laser pulse of intensity adjustment by each indivedual attenuator;
Control the incidence angle of each attenuator, wherein regulate the described incidence angle being assigned to indivedual attenuators of the LASER Light Source be in outside error range when the described peak value of measured respective laser pulse is in outside the discrete error scope that pre-sets; And
Repeat the process of the process of described measurement described respective laser pulse and the described incidence angle of the indivedual attenuator of described control, until the described peak value of measured respective laser pulse is within the scope of the discrete error that pre-sets.
2. the method for calibration of laser pulse according to claim 1, the process of the described incidence angle of the described indivedual attenuator of wherein said control comprises: when the described peak value of described measured respective laser pulse is less than the individual peak pre-set, regulate be assigned to be less than described in the described incidence angle of indivedual attenuators of the LASER Light Source of individual peak that pre-sets with the lower limit causing the described peak value of respective laser pulse to reach described error range.
3. the method for calibration of laser pulse according to claim 1, the process of the described incidence angle of the described indivedual attenuator of wherein said control comprises: when the described peak value of described measured respective laser pulse exceedes the individual peak pre-set, regulate be assigned to exceed described in the described incidence angle of described indivedual attenuator of the LASER Light Source of individual peak that pre-sets with the upper limit causing the described peak value of respective laser pulse to reach described error range.
4. a method for calibration of laser pulse, is characterized in that, the method for described calibration of laser pulse comprises following process:
Measure the synchronous of respective laser pulse penetrating from multiple LASER Light Source to check and undertaken whether there is synchronization delay between the laser pulse of intensity adjustment by each indivedual attenuator; And
Controlling the incidence angle of indivedual attenuator, wherein when there is described synchronization delay, being assigned to the described incidence angle of indivedual attenuators of LASER Light Source through regulating with the intensity changing laser pulse.
5. the method for calibration of laser pulse according to claim 4, wherein in the described synchronous process of described measurement described respective laser pulse, checks whether and detects that the peak value of each laser pulse is to check described synchronization delay simultaneously.
6. the method for calibration of laser pulse according to claim 4, the time span wherein depending on through synchronization delay determines the intensity of the incidence angle of the LASER Light Source with described synchronization delay.
7. the method for calibration of laser pulse according to claim 6, wherein the energy intensity of the laser pulse of LASER Light Source increases along with the described time span through synchronization delay and increases.
8. for a device for calibration of laser pulse, it is characterized in that, the described device for calibration of laser pulse comprises:
Multiple respective laser light source, injection laser pulse;
Indivedual attenuator, is assigned to each LASER Light Source to control the incidence angle of laser pulse to regulate the intensity of laser pulse;
Respective laser impulsive measurement unit, measures the waveform of the respective laser pulse exported from described indivedual attenuator; And
Feedback compensation unit, depends on the change of measured respective laser pulse and regulates the incidence angle of the indivedual attenuators being assigned to each LASER Light Source, being in error range to cause the waveform of respective laser pulse.
9. the device for calibration of laser pulse according to claim 8, wherein said respective laser impulsive measurement unit is measured from described multiple LASER Light Source injection and is passed the peak value of the respective laser pulse of each indivedual attenuator.
10. the device for calibration of laser pulse according to claim 9, wherein said feedback compensation unit progressively regulates the incidence angle of the indivedual attenuators being assigned to the LASER Light Source be in outside error range, with within the scope of the discrete error causing the described peak value of measured respective laser pulse to be in pre-set.
11. devices for calibration of laser pulse according to claim 8, the inspection of wherein said respective laser impulsive measurement unit from described multiple LASER Light Source injection and through each indivedual attenuator laser pulse whether there is synchronization delay.
12. devices for calibration of laser pulse according to claim 11, wherein said feedback compensation unit regulates the incidence angle of the indivedual attenuators being assigned to the LASER Light Source with described synchronization delay to change the intensity of laser pulse when there is synchronization delay.
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| KR10-2013-0165587 | 2013-12-27 | ||
| KR1020130165587A KR101591490B1 (en) | 2013-12-27 | 2013-12-27 | Method for compensating laser and apparatus for operating the same |
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| CN104741780B CN104741780B (en) | 2017-09-08 |
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| CN102508634A (en) * | 2011-09-21 | 2012-06-20 | 电子科技大学 | Light quantum random number generator based on Y-branch waveguide |
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2013
- 2013-12-27 KR KR1020130165587A patent/KR101591490B1/en active IP Right Grant
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1069600A (en) * | 1991-08-12 | 1993-03-03 | 凤凰激光系统有限公司 | Control outside the dynamic chamber of laser energy output |
| JPH1096610A (en) * | 1996-02-16 | 1998-04-14 | Imra America Inc | Comparison method for laser pulse, scanning method for high speed laser, high speed scanning laser device, short pulse laser device, distance measuring device, electric optical sampling/oscilloscope, short pulse laser stable control method |
| JP2005313480A (en) * | 2004-04-28 | 2005-11-10 | Dainippon Screen Mfg Co Ltd | Image recorder and method of correcting intensity of light beam |
| CN102137732A (en) * | 2008-08-29 | 2011-07-27 | 威孚莱有限公司 | Method for calibrating the pulse energy of a laser device using a coherence-optical interferometric measuring apparatus |
Also Published As
| Publication number | Publication date |
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| CN104741780B (en) | 2017-09-08 |
| KR20150076895A (en) | 2015-07-07 |
| KR101591490B1 (en) | 2016-02-03 |
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