CN104700891B - Resistive memory device and its wiring method - Google Patents

Resistive memory device and its wiring method Download PDF

Info

Publication number
CN104700891B
CN104700891B CN201310665231.XA CN201310665231A CN104700891B CN 104700891 B CN104700891 B CN 104700891B CN 201310665231 A CN201310665231 A CN 201310665231A CN 104700891 B CN104700891 B CN 104700891B
Authority
CN
China
Prior art keywords
memory cell
voltage
resistive memory
bit line
line voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201310665231.XA
Other languages
Chinese (zh)
Other versions
CN104700891A (en
Inventor
侯拓宏
徐崇威
陈玫瑾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Winbond Electronics Corp
Original Assignee
Winbond Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Winbond Electronics Corp filed Critical Winbond Electronics Corp
Priority to CN201310665231.XA priority Critical patent/CN104700891B/en
Publication of CN104700891A publication Critical patent/CN104700891A/en
Application granted granted Critical
Publication of CN104700891B publication Critical patent/CN104700891B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Static Random-Access Memory (AREA)

Abstract

The invention discloses a kind of resistive memory device and its wiring methods, wherein resistive memory device includes memory cell array and Memory Controller.One of the Memory Controller during setting and during resetting provides the first word line voltage of unselected bit line the first bit line voltage and unselected word line for being not connected to choose resistive memory cell, wherein the first bit line voltage is equal to write-in voltage VWMultiplied by (n-1)/n, the first word line voltage is equal to VW×1/n.Another offer of the Memory Controller during setting and during resetting is not connected to choose the unselected bit line second bit line voltage of resistive memory cell, and it provides and is not connected to second word line voltage of the unselected word line for choosing resistive memory cell, wherein, second bit line voltage is equal to VW× 1/n, the second word line voltage are equal to VW×(n‑1)/n。

Description

Resistive memory device and its wiring method
Technical field
The invention relates to a kind of resistive memory device and its wiring methods, and interlock in particular to one kind Formula (cross bar) resistance-type memory and its wiring method.
Background technique
Based on the demand for secondary generation non-volatility memorizer, a kind of resistance-type memory is suggested.This resistance-type Memory can be into row stochastic access action, and is substituted for NAND-flash memory.In order to promote the density of memory, A kind of three-dimensional resistance formula memory of highdensity vertical arrangement is also suggested.
In alternating expression resistance-type memory, the main subject under discussion being concerned about is, stores for alternating expression resistance-type When storage unit in device carries out data write activity, same memory line again is arranged with the storage unit chosen and storage arranges, and Not selected storage unit can cause it because of voltage difference caused by the voltage value transmitted in bit line and wordline Resistance value is adjusted in the region being reset, and causes the mistake of storage data.
Above-mentioned situation is that a kind of resistive memory cell without asymmetric characteristic is particularly acute.Such resistance The current-voltage correlation characteristic that current-voltage correlation characteristic and its of the Reset Status of formula storage unit set state is not symmetrical. Therefore, for resistive memory cell, to be reset and set all be directed to using the practice of identical voltage by existing Resistive memory cell with asymmetric characteristic carries out data write-in, it is clear that is more inappropriate.
Summary of the invention
The purpose of the present invention is to provide a kind of resistive memory device and the wiring methods of resistance-type memory, can Effectivelying prevent its resistive memory cell, there is a phenomenon where write errors, effectively maintain the correctness of data.
Resistive memory device of the invention includes memory cell array and Memory Controller.Memory cell array Including most memory cells, each memory list includes the majority resistive memory cell being stacked with.Resistance-type storage Unit is respectively coupled to most wordline, and memory cell is simultaneously respectively coupled to most bit lines.Memory Controller coupling To memory cell array, wherein Memory Controller during setting and resetting during one of provide be not connected to select Unselected the first bit of the bit line line voltage of most items of middle resistive memory cell, and provide and be not connected to that resistance-type is chosen to deposit The first word line voltage of most unselected word lines of storage unit, wherein the first bit line voltage is equal to write-in voltage VWMultiplied by (n- 1)/n, the first word line voltage are equal to VW× 1/n, and n is greater than 3.Memory Controller is another during setting and during resetting The unselected bit line second bit line voltage for being not connected to choose resistive memory cell is provided, and provides and is not connected to the choosing The second word line voltage of unselected word line of middle resistive memory cell, wherein second bit line voltage is equal to VW× 1/n, second Word line voltage is equal to VW×(n-1)/n。
The wiring method of resistance-type memory of the invention, step include: to provide to be not connected to one during a setting The unselected one first bit line voltage of bit line of most items of resistive memory cell is chosen, and offer is not connected to this and chooses electricity One first word line voltage of most unselected word lines of resistive memory cell, wherein the first bit line voltage is equal to a write-in electricity Press VWMultiplied by (n-1)/n, the first word line voltage is equal to VW× 1/n, n are greater than 3;And it is provided during a resetting and is not connected to select The one second bit line voltage of unselected bit line of middle resistive memory cell, and provide and be not connected to choose resistance-type storage single The second word line voltage of unselected word line of member, wherein second bit line voltage is equal to VW× 1/n, the second word line voltage are equal to VW× (n-1)/n。
Based on above-mentioned, the present invention provides different wordline by resetting and setting for resistive memory cell Voltage and bit line voltage, so that the resistance value of unselected resistive memory cell can not be by the word line voltage received And bit line voltage is influenced, and change its original stored data, keep the correctness of data.
To make the foregoing features and advantages of the present invention clearer and more comprehensible, special embodiment below, and cooperate institute's accompanying drawings It is described in detail below.
Detailed description of the invention
Figure 1A is painted the structural schematic diagram of the memory cell array of the resistance-type of one embodiment of the invention.
Figure 1B is painted the enlarged diagram of the memory cell of the embodiment of the present invention.
Fig. 2 is painted the schematic diagram of the resistive memory device of one embodiment of the invention.
Fig. 3 A is painted the schematic diagram of the setting means of the resistive memory cell of the embodiment of the present invention.
Fig. 3 B is painted the schematic diagram of the reset mode of the resistive memory cell of the embodiment of the present invention.
The current-voltage correlation curve graph of the resistive memory cell for the embodiment of the present invention that Fig. 4 is painted.
Fig. 5 A and Fig. 5 B be painted respectively the resistive memory cell of the embodiment of the present invention setting and resetting movement it is another Embodiment schematic diagram.
Fig. 6 is painted the flow chart of the wiring method of the resistance-type memory of one embodiment of the invention.
Wherein, the reference numerals are as follows:
100,210: memory cell array
110: memory cell
BL1~BL3: bit line
WLA1~WLA3: word line group
WL1~WL3: wordline
111,112,113,114: insulating layer
RC1, RC2, RC3: resistive memory cell
RSL: resistive layer
BL1~BL3: bit line BL1
200: resistive memory device
220: Memory Controller
SRC: resistive memory cell is chosen
410~430: curve
RP: conductor resistance
UNRC1~UNRC4, HSRC1~HSRC4: unselected resistive memory cell
VW: write-in voltage
RESET, SET: arrow
S610~S620: write step
Specific embodiment
Figure 1A is please referred to, Figure 1A is painted the structural schematic diagram of the memory cell array of the resistance-type of one embodiment of the invention. Memory cell array 100 includes the memory cell 110 of most column structures, and memory cell 110 is arranged in array fashion Column, and it is respectively coupled to majority bit line BL1~BL3.Memory cell 110 is simultaneously coupled with word line group WLA1~WLA respectively, It include three wordline in each word line group WLA1~WLA3 in Fig. 1, and with memory cell 110 for example, it is coupled Word line group WLA3 include wordline WL1~WL3.
Below and referring to Figure 1A and Figure 1B, wherein Figure 1B is painted the memory cell 110 of the embodiment of the present invention Enlarged diagram.In fig. ib, the intersection of insulating layer 111,112,113 and 114 be stacked on as wordline WL1, WL2 and The conductive interlayer of WL3, resistive layer RSL cover insulating layer 111,112,113 and 114 and wordline WL1, WL2 and WL3, position First line BL1 then covers resistive layer RSL.In fig. ib, shape is then distinguished in the region between bit line BL1 and wordline WL1, WL2 and WL3 At resistive memory cell RC1, RC2 and RC3.
Referring to figure 2., Fig. 2 is painted the schematic diagram of the resistive memory device of one embodiment of the invention.Resistance-type storage Device device 200 includes memory cell array 210 and Memory Controller 220.Memory cell array 210 can be such as Figure 1A institute The memory cell array 100 being painted.Memory Controller 220 is coupled to memory cell array 210, and to provide bit line electricity Pressure and word line voltage are to memory cell array 210.
In embodiments of the present invention, Memory Controller 220 can provide word of the word line voltage into memory cell array 210 Line, and transmit by the bit line in memory cell array 210 bit line voltage or by the position in memory cell array 210 First line receives the data information of reading.It is worth noting that, about for the resistance-type storage in memory cell array 210 When unit carries out the movement of data write-in, it can be divided into and the resetting (reset) of resistance value is carried out to resistive memory cell and is set Fixed (set) two ways.
Below referring to Fig. 2 and Fig. 3 A, wherein Fig. 3 A is painted the resistive memory cell of the embodiment of the present invention The schematic diagram of setting means.In figure 3 a, using 3 × 3 memory cell array as example, choose resistance-type storage single when to be directed to When first SRC carries out the setting of resistance value, Memory Controller 220 can provide during setting and choose resistive memory cell SRC Reference ground voltage of the selected word line WL3 connected for example equal to 0 volt, and provide and choose resistive memory cell SRC institute Connection chooses bit line BL3 that voltage V is writtenW.In addition, Memory Controller 220 and providing unselected word line WL1 and WL2 etc. Voltage V is written in 1/4WWord line voltage, and unselected bit line BL1 and BL2 is provided and is equal to 3/4 write-in voltage VWBit line Voltage.Wherein, unselected bit line BL1 and BL2 and unselected word line WL1 and WL2 and resistive memory cell SRC is chosen not It is connected.
It is noted that there are many conductor resistance RP on wordline WL1~WL3 and bit line BL1~BL3.Staggeredly Under the structure of formula (cross bar) resistance-type memory, these conductor resistances RP is distributed between each resistive memory cell.
The current-voltage correlation curve of the resistive memory cell referring to Fig. 4 embodiment of the present invention being painted please be synchronize herein Figure.Wherein, curve 410~430 is painted reset voltage required for resistive memory cell equal to -4V, -5V and -6V respectively Different relation curves, arrow RESET and SET be then respectively the resistive memory cell electric current that is reset and set with Voltage relationship variation tendency.The current-voltage correlation characteristic and resistance-type of the Reset Status for the resistive memory cell that Fig. 4 is painted The current-voltage correlation characteristic of the setting state of storage unit is not symmetrical.
Under the conditions described above, the curve graph that is painted of cooperation Fig. 4, unselected resistive memory cell UNRC1~UNRC4 its Voltage difference between the bit line and wordline that are born is equal to 1/2 write-in voltage VW.And to be set to resistive memory cell Required write-in voltage is about that 5V is example, 1/2 write-in voltage VWIt is approximately equal to 2.5V, and does not enter the area effectively set Domain.Therefore, the resistance value of unselected resistive memory cell UNRC1~UNRC4 can't be set.Opposite, choose resistance What formula storage unit SRC was born chooses the voltage difference between bit line BL3 and selected word line WL3 to be equal to write-in voltage VWAnd it can Effectively to set its resistance value.
It is especially noted that the unselected electricity for one of being connected to selected word line WL3 and choosing bit line BL3 Resistive memory cell HSRC1~HSRC4.Wherein, using unselected resistive memory cell HSRC4 as example, unselected resistance-type Storage unit HSRC4 is equal to write-in voltage V by choosing bit line BL3 to receiveWBit line voltage, and pass through unselected word line WL1, which is received, is equal to 1/4 write-in voltage VWWord line voltage.In this way, the bit line of resistive memory cell HSRC4 connection and Voltage difference between wordline is equal to 3/4 write-in voltage VW, it is equal to 3.75V.The curve that foundation Fig. 4 is painted is it is known that unselected electricity The resistance value of resistive memory cell HSRC4 will not be set.Remaining unselected resistive memory cell HSRC1~HSRC3 with The case where unselected resistive memory cell HSRC4, is similar, and resistance value will not be set and generate data write error Phenomenon.
Below and referring to Fig. 2 and Fig. 3 B, wherein Fig. 3 B is painted the resistive memory cell of the embodiment of the present invention Reset mode schematic diagram.In figure 3b, using 3 × 3 memory cell array as example, resistance-type is chosen to store when to be directed to When cell S RC carries out the resetting of resistance value, Memory Controller 220 can provide during resetting and choose resistive memory cell Reference ground voltage of the selected word line WL3 that SRC is connected for example equal to 0 volt, and provide and choose resistive memory cell SRC What is connected chooses bit line BL3 that voltage V is writtenW.In addition, Memory Controller 220 and providing unselected word line WL1 and WL2 Equal to 3/4 write-in voltage VWWord line voltage, and unselected bit line BL1 and BL2 is provided and is equal to 1/4 write-in voltage VWBit Line voltage.
The curve graph that is painted of cooperation Fig. 4, its bit line for being born of unselected resistive memory cell UNRC1~UNRC4 And the voltage difference between wordline is equal to -1/2 write-in voltage VW.And electricity to be written required for being reset to resistive memory cell Pressure is about that -6V is example, -1/2 write-in voltage VWEqual to -3.0V, and the region effectively set is not entered.Therefore, unselected The resistance value of resistive memory cell UNRC1~UNRC4 can't be reset.Opposite, choose resistive memory cell SRC institute The voltage difference chosen between bit line BL3 and selected word line WL3 born is equal to negative write-in voltage VW(- 6V) and can be effective Resetting its resistance value.
And it is especially noted that is one of be connected to selected word line WL3 and choose bit line BL3 is unselected Resistive memory cell HSRC1~HSRC4.Wherein, using unselected resistive memory cell HSRC4 as example, unselected resistance Formula storage unit HSRC4 is equal to write-in voltage V by choosing bit line BL3 to receiveWBit line voltage, and pass through unselected word Line WL1, which is received, is equal to 3/4 write-in voltage VWWord line voltage.In this way, the bit line of resistive memory cell HSRC4 connection And the voltage difference between wordline is equal to -1/4 write-in voltage VW, it is approximately equal to -1.5V.The curve that foundation Fig. 4 is painted is it is known that unselected The resistance value of middle resistive memory cell HSRC4 will not be reset.Remaining unselected resistive memory cell HSRC1~ The case where HSRC3 is with unselected resistive memory cell HSRC4 is similar, and resistance value will not be reset and generate data write-in The phenomenon of mistake.
Subsidiary one mentions, when carrying out the resetting and setting of resistance value to resistive memory cell pair of the embodiment of the present invention It is not connected to that the voltage of the unselected bit line of resistive memory cell and unselected word line is chosen to can be interchanged in offer.Example Such as, when to be directed to the resetting for choosing resistive memory cell SRC to carry out resistance value, unselected word line WL1 and WL2 also be can provide Equal to 1/4 write-in voltage VWWord line voltage, and unselected bit line BL1 and BL2 is provided and is equal to 3/4 write-in voltage VWBit Line voltage.And when to be directed to the setting for choosing resistive memory cell SRC to carry out resistance value, it also can provide unselected word Line WL1 and WL2 are equal to 3/4 write-in voltage VWWord line voltage, and unselected bit line BL1 and BL2 is provided and is equal to 1/4 write-in electricity Press VWBit line voltage.
A and Fig. 5 B, Fig. 5 A and Fig. 5 B are painted the resistive memory cell of the embodiment of the present invention respectively referring to figure 5. below Setting and resetting movement another embodiment schematic diagram.In fig. 5, dynamic when to carry out setting to resistive memory cell When making, it can provide and choose the selected word line WL3 of resistive memory cell SRC connection to be equal to 0 volt of reference during setting Ground voltage, and provide and choose what resistive memory cell SRC connect to choose bit line BL3 write-in voltage VW.Meanwhile for The unselected word line WL1 and WL2 for being not connected to resistive memory cell SRC, which are then provided, is equal to 1/n write-in voltage VWWordline electricity Pressure, and (n-1)/n write-in voltage V is provided for the unselected bit line BL1 and BL2 for being not connected to resistive memory cell SRCW Bit line voltage, so as to choose other unselected resistive memory cells outside resistive memory cell SRC can be shielded (inhibited).Wherein, n is the real number greater than 3.
In figure 5B, when to carry out resetting movement to resistive memory cell, electricity can be provided and chosen during resetting The selected word line WL3 of resistive memory cell SRC connection is equal to 0 volt of reference ground voltage, and provides and deposit with resistance-type is chosen Storage unit SRC connection chooses bit line BL3 that voltage V is writtenW.Meanwhile for being not connected to resistive memory cell SRC not Selected word line WL1 and WL2, which are then provided, is equal to (n-1)/n write-in voltage VWWord line voltage, and deposit for being not connected to resistance-type The unselected bit line BL1 and BL2 of storage unit SRC provides 1/n and voltage V is writtenWBit line voltage, so as to which resistance-type is chosen to deposit Other unselected resistive memory cells outside storage unit SRC can be shielded (inhibited).
Certainly, above-mentioned Fig. 5 A can be applied to carry out resetting movement to resistive memory cell, and Fig. 5 B then can be applied to Set action is carried out to resistive memory cell.
Subsidiary one mentions, and the array for utilizing 3 × 3 resistive memory cells to be constituted in previous embodiment is merely model Example, not to limit scope of the invention.The resistive memory cell array of any dimension can apply technology of the invention Feature carries out write activity.
Fig. 6 is please referred to below, and Fig. 6 is painted the flow chart of the wiring method of the resistance-type memory of one embodiment of the invention. Wherein, it in step S610, by providing during setting and one of during resetting is not connected to that resistance-type is chosen to deposit Unselected the first bit of the bit line line voltage of most items of storage unit, and provide and be not connected to choose the more of resistive memory cell Several first word line voltages of unselected word line, wherein the first bit line voltage is equal to write-in voltage VWMultiplied by (n-1)/n, first Bit line voltage is equal to VW× 1/n, n are the real number greater than 3.Also, in step S620, by during setting and resetting the phase Between another offer therein be not connected to choose the unselected bit line second bit line voltage of resistive memory cell, and mention For being not connected to choose the second word line voltage of unselected word line of resistive memory cell, wherein second bit line voltage is equal to VW× 1/n, second bit line voltage are equal to VW×(n-1)/n。
About the implementation detail of above-mentioned steps, embodiment has detailed explanation immediately for the implementation stated before this invention, Below without repeating more.
In conclusion the present invention resets and sets the different wordline of offer using for resistive memory cell Voltage and bit line voltage, so that the resistance value for the resistive memory cell chosen correctly can be set or be reset, And unchecked resistive memory cell is effectively interdicted, without being set or being reset.In this way, number According to can be effectively correctly written in resistive memory cell, also, the data originally stored are in the feelings for not needing to update Under condition, also it is unlikely to be written over because of the write activity of other resistive memory cells, maintains the correctness of data.

Claims (5)

1. a kind of resistive memory device, comprising:
One memory cell array, including most memory cells, respectively the memory cell includes the majority electricity being stacked with Resistive memory cell, multiple resistive memory cell are respectively coupled to most wordline, multiple memory cell and difference It is coupled to most bit lines;And
One Memory Controller couples the memory cell array, wherein
The Memory Controller is during a setting and provides one of during a resetting and is not connected to one and chooses resistance-type The unselected one first bit line voltage of bit line of most items of storage unit, and offer is not connected to this and chooses resistance-type storage single One first word line voltage of most unselected word lines of member, wherein the first bit line voltage is equal to a write-in voltage VWMultiplied by (n-1)/n, first word line voltage are equal to VW× 1/n, n are the real number greater than 3,
Another offer of the Memory Controller during the setting and during the resetting is not connected to this and resistance-type is chosen to store Multiple unselected one second bit line voltage of bit line of unit, and offer is not connected to this and chooses resistive memory cell Multiple one second word line voltage of unselected word line, wherein the second bit line voltage is equal to VW× 1/n, second wordline electricity Pressure is equal to VW× (n-1)/n,
The wherein respectively current-voltage correlation characteristic of the Reset Status of the resistive memory cell and setting for the resistive memory cell The current-voltage correlation characteristic for determining state is not symmetrical.
2. resistive memory device as described in claim 1, wherein the Memory Controller during the setting and is somebody's turn to do The selected word line one for choosing resistive memory cell to connect is provided during resetting with reference to ground voltage, and this is provided and chooses electricity The one of resistive memory cell connection chooses the bit line write-in voltage.
3. resistive memory device as described in claim 1, wherein multiple storage unit is arranged with array manner.
4. a kind of wiring method of resistance-type memory, comprising:
It provides during a setting and one of during a resetting and is not connected to a majority for choosing resistive memory cell The unselected one first bit line voltage of bit line of item, and offer is not connected to this and chooses most items of resistive memory cell unselected Middle one first word line voltage of wordline, wherein the first bit line voltage is equal to a write-in voltage VWMultiplied by (n-1)/n, this first Word line voltage is equal to VW× 1/n, n are greater than 3;And
Another offer during the setting and during the resetting be not connected to this choose resistive memory cell it is multiple not One second bit line voltage of bit line is chosen, and provides and is not connected to the multiple unselected word for choosing resistive memory cell One second word line voltage of line, wherein the second bit line voltage is equal to VW× 1/n, second word line voltage are equal to VW×(n-1)/ N,
Wherein the resistance-type memory includes most resistive memory cells, respectively the Reset Status of the resistive memory cell Current-voltage correlation characteristic and the current-voltage correlation characteristic of the setting state of the resistive memory cell be not symmetrical.
5. the wiring method of resistance-type memory as claimed in claim 4, wherein further include:
The selected word line one for choosing resistive memory cell the to connect reference is provided during the setting and during the resetting Ground voltage, and this is provided and chooses the one of resistive memory cell connection to choose the bit line write-in voltage.
CN201310665231.XA 2013-12-09 2013-12-09 Resistive memory device and its wiring method Active CN104700891B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201310665231.XA CN104700891B (en) 2013-12-09 2013-12-09 Resistive memory device and its wiring method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201310665231.XA CN104700891B (en) 2013-12-09 2013-12-09 Resistive memory device and its wiring method

Publications (2)

Publication Number Publication Date
CN104700891A CN104700891A (en) 2015-06-10
CN104700891B true CN104700891B (en) 2019-01-08

Family

ID=53347930

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310665231.XA Active CN104700891B (en) 2013-12-09 2013-12-09 Resistive memory device and its wiring method

Country Status (1)

Country Link
CN (1) CN104700891B (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1507631A (en) * 2001-03-21 2004-06-23 ����뵼��ɷ����޹�˾ Method and apparatus for biasing selected and unselected array lines when writing a memory array
CN1527321A (en) * 2003-03-07 2004-09-08 三洋电机株式会社 Memory
CN1574077A (en) * 2003-06-17 2005-02-02 夏普株式会社 Nonvolatile semiconductor memory device, and programming method and erasing method thereof
US20120069626A1 (en) * 2010-09-17 2012-03-22 Takashi Nakano Semiconductor memory device
US20130223126A1 (en) * 2012-02-27 2013-08-29 Samsung Electronics Co., Ltd. Resistive memory device and memory system including the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1507631A (en) * 2001-03-21 2004-06-23 ����뵼��ɷ����޹�˾ Method and apparatus for biasing selected and unselected array lines when writing a memory array
CN1527321A (en) * 2003-03-07 2004-09-08 三洋电机株式会社 Memory
CN1574077A (en) * 2003-06-17 2005-02-02 夏普株式会社 Nonvolatile semiconductor memory device, and programming method and erasing method thereof
US20120069626A1 (en) * 2010-09-17 2012-03-22 Takashi Nakano Semiconductor memory device
US20130223126A1 (en) * 2012-02-27 2013-08-29 Samsung Electronics Co., Ltd. Resistive memory device and memory system including the same

Also Published As

Publication number Publication date
CN104700891A (en) 2015-06-10

Similar Documents

Publication Publication Date Title
CN103403807B (en) Non-volatile semiconductor memory device including variable resistor element
US20190043580A1 (en) Reset refresh techniques for self-selecting memory
US7701791B2 (en) Low read current architecture for memory
CN103366816A (en) Non-volatile semiconductor memory device
KR20160071755A (en) Semiconductor memory device having separate sensing type of sensing circuit and therefore sensing method
CN105556608A (en) Semiconductor storage device
CN105304669A (en) Non-volatile resistance-variable storage circuit and control method thereof
EP2715731B1 (en) Semiconductor memory device
US8824189B2 (en) Semiconductor device
JP5744164B2 (en) Resistor-based random access memory and method of operating the same
US9378816B2 (en) Variable resistance memory devices and erase verifying methods thereof
CN104700891B (en) Resistive memory device and its wiring method
US11302391B2 (en) System and method for reading memory cells
CN104599705B (en) Memory device
TWI509614B (en) Resistive memory apparatus and write-in method thereof
US10199099B2 (en) Semiconductor memory device
US11133056B2 (en) Two-stage signaling for voltage driver coordination in integrated circuit memory devices
US9251894B2 (en) Accessing a resistive memory storage device
CN110956993A (en) Resistance change type memory cell based on resistance voltage division reading
CN104751890A (en) Control method of non-volatile memory used in vertical array structure
CN105788643B (en) ROM cell and its read method and device, memory
US9552869B1 (en) Random access memory with pseudo-differential sensing
US9460779B2 (en) Memory sensing method using one-time sensing table and associated memory device
WO2023221597A1 (en) Storage array and working method for storage array
Adeyemo et al. Analytic models for crossbar read operation

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant