WO2023221597A1 - Storage array and working method for storage array - Google Patents

Storage array and working method for storage array Download PDF

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Publication number
WO2023221597A1
WO2023221597A1 PCT/CN2023/078656 CN2023078656W WO2023221597A1 WO 2023221597 A1 WO2023221597 A1 WO 2023221597A1 CN 2023078656 W CN2023078656 W CN 2023078656W WO 2023221597 A1 WO2023221597 A1 WO 2023221597A1
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Prior art keywords
memory
memory cells
transistor
column
lines
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PCT/CN2023/078656
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French (fr)
Chinese (zh)
Inventor
赵杰
刘少鹏
李�昊
杨汝辉
贾秀峰
张敏
张恒
吕杭炳
许俊豪
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华为技术有限公司
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Publication of WO2023221597A1 publication Critical patent/WO2023221597A1/en

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/225Auxiliary circuits
    • G11C11/2253Address circuits or decoders
    • G11C11/2255Bit-line or column circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/225Auxiliary circuits
    • G11C11/2253Address circuits or decoders
    • G11C11/2257Word-line or row circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/225Auxiliary circuits
    • G11C11/2273Reading or sensing circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements
    • G11C11/225Auxiliary circuits
    • G11C11/2275Writing or programming circuits or methods

Definitions

  • the present application relates to the field of semiconductor devices, and in particular, to a memory array and a working method of the memory array.
  • Ferroelectric random access memory is a device that utilizes the properties of ferroelectric materials for storage.
  • FeRAM includes a storage array composed of multiple memory cells, and write and read operations adopt full-row writing and full-row reading.
  • the ferroelectric capacitors in all memory cells in the same row need to withstand the high voltage when reading data and the high voltage when writing data back. Even if there is no need to read data in all memory cells in the row, the ferroelectric capacitors in all memory cells in the row still need to experience high voltage when reading data and high voltage when writing data back. This will cause the ferroelectric capacitor to experience too many voltage cycles, affecting the performance of the ferroelectric capacitor and thus affecting the service life of FeRAM.
  • This application provides a storage array and a working method of the storage array, which can prevent the storage unit from being subjected to unnecessary high voltage during the reading process, reduce the number of times that the ferroelectric capacitor in the storage unit is subjected to high voltage, and is conducive to improving the service life of the storage array. .
  • a memory array including: a plurality of memory cells, a plurality of word lines extending along a row direction, a plurality of bit lines extending along a column direction, and a plurality of plate lines extending along a column direction, a plurality of Each memory cell in the memory cells includes a first transistor and a first ferroelectric capacitor, a first terminal of the first transistor is connected to a second terminal of the first ferroelectric capacitor, wherein the i-th row of the plurality of memory cells stores The gate terminal of the first transistor of each memory unit in the unit is connected to the i-th word line among the plurality of word lines, i is a positive integer, and the j-th column memory unit among the plurality of memory units The first end of a ferroelectric capacitor is connected to the j-th bit line among the plurality of bit lines, j is a positive integer, and the second end of the first transistor of each memory cell in the j-th column memory unit is connected to the plurality of plate
  • the extending direction of the plate line and the extending direction of the word line are perpendicular to each other.
  • the memory cells sharing the plate line and the memory cells sharing the word line are not exactly the same. This structure can only be used for those who need to read information.
  • the memory cells read information without reading the entire row of memory cells.
  • only the ferroelectric capacitors of the memory cells that need to read information can withstand high voltages.
  • the ferroelectric capacitors of other memory cells do not withstand high voltages. , avoiding the entire row of stored single
  • the element needs to withstand high voltage during the reading process, which reduces the number of times the ferroelectric capacitor has to withstand high voltage, which is beneficial to ensuring the service life of the storage array.
  • a column of memory cells can share a board line, which is beneficial to reducing the number of board lines and reducing the area occupied by the connection between the board line and the memory unit, thereby increasing the effective storage area and improving storage density.
  • the high-potential signal sources required by the board lines can be deployed in peripheral circuits, avoiding the deployment of power supplies between memory cells, which in turn helps increase the effective storage area and improve storage density.
  • the i-th row of storage units may be any row of storage units among multiple storage units.
  • the jth column storage unit may be any column storage unit among multiple storage units.
  • the i-th word line can be any word line among the plurality of word lines, and the j-th bit line can be any bit line among the plurality of bit lines.
  • the second end of the first transistor of each memory cell in the j-th column of memory cells is connected to the j-th plate line among the plurality of plate lines.
  • the storage array may include K strip lines. I is an integer greater than 1, J is an integer greater than 1, and K is an integer greater than 1. For example, J is equal to K.
  • the first transistor of each memory unit in the J column memory unit among the plurality of memory cells is connected to the plate line corresponding to the J column memory unit. That is, there is a one-to-one correspondence between J columns of storage cells and J plate lines.
  • J is greater than K.
  • multiple columns of memory cells among the plurality of memory cells share one of the K plate lines.
  • multiple columns of memory cells can share a board line, further reducing the number of board lines, further increasing the effective storage area and improving storage density.
  • the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory units is connected to each memory unit in the j-th column memory unit.
  • the second terminal of the first transistor of the unit shares one of the plurality of plate lines, k is a positive integer, and j is not equal to k.
  • multiple columns of memory cells can share a board line, further reducing the number of board lines, further increasing the effective storage area and improving storage density.
  • the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the multiple shared board lines as an axis.
  • multiple bit lines are respectively connected to multiple amplifiers.
  • the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to at least one of the plurality of plate lines.
  • the number of columns of connected storage cells are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to at least one of the plurality of plate lines.
  • multiple column bit lines correspond to one SA, which reduces the number of SAs and can increase the effective storage area, that is, increase the density of memory cells.
  • a second aspect provides a memory, including a storage array and a storage controller of the first aspect or any possible implementation of the first aspect, and the storage controller and the storage array are electrically connected.
  • a third aspect provides an electronic device, including the memory of the second aspect and a circuit board.
  • the memory is disposed on the circuit board and is electrically connected to the circuit board.
  • a working method of a storage array includes: multiple storage units, along the row direction A plurality of extended word lines, a plurality of bit lines extending along the column direction, and a plurality of plate lines extending along the column direction, each memory unit in the plurality of memory cells includes a first transistor and a first ferroelectric capacitor, the first The first end of the transistor is connected to the second end of the first ferroelectric capacitor, wherein the gate end of the first transistor of each memory cell in the i-th row of memory cells in the plurality of memory cells is connected to the first transistor in the plurality of word lines.
  • i word lines are connected, i is a positive integer, and the first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit among the plurality of memory cells is connected to the j-th bit line among the plurality of bit lines.
  • j is a positive integer
  • the second end of the first transistor of each memory unit in the jth column memory unit is connected to one of the plurality of plate lines, the first end of the first transistor is the source end, and the first transistor The second end of the first transistor is the drain end, or the first end of the first transistor is the drain end, and the second end of the first transistor is the source end.
  • the method includes: applying a first voltage signal to the i-th word line to cause the The first transistor of each memory cell in the i-row memory cell is turned on; a second voltage signal is applied to one of the plurality of plate lines, and a third voltage signal is applied to the bit line connected to the target memory cell to read Taking the information stored in the target storage unit, the potential of the second voltage signal is higher than the potential of the third voltage signal, and the target storage unit is the intersection of the storage unit connected to one of the plurality of plate lines and the i-th row of storage cells. Centralized storage unit.
  • the second end of the first transistor of each memory unit in the j-th column memory unit is connected to the j-th plate line among the plurality of plate lines, and the method includes : Apply a second voltage signal on the j-th plate line to read the information stored in the target storage unit.
  • the target storage unit is a storage unit at the intersection with the j-th column storage unit and the i-th row storage unit.
  • the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory units is connected to each memory unit in the j-th column memory unit.
  • the second terminal of the first transistor of the unit shares one of the multiple plate lines, k is a positive integer, and j is not equal to k.
  • the method includes: applying a second voltage to one of the shared multiple plate lines. signal to read the information stored in the target storage unit.
  • the target storage unit is the storage unit at the intersection with the j-th column storage unit, the k-th column storage unit and the i-th row storage unit.
  • the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the multiple shared board lines as an axis.
  • multiple bit lines are respectively connected to multiple amplifiers.
  • the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to at least one of the plurality of plate lines. The number of columns of connected storage cells.
  • Figure 1 is a schematic diagram of the storage principle of FeRAM
  • Figure 2 is a schematic diagram of a memory cell in the FeRAM memory array
  • Figure 3 is a schematic diagram of a write operation of FeRAM
  • Figure 4 is a schematic diagram of a FeRAM read operation
  • Figure 5 is a schematic structural diagram of a storage array
  • Figure 6 is a schematic structural diagram of another storage array
  • Figure 7 is a schematic structural diagram of yet another storage array
  • Figure 8 is a schematic diagram of a write operation of a storage array
  • Figure 9 is a schematic diagram of a read operation of a storage array
  • Figure 10 is a schematic structural diagram of yet another storage array
  • Figure 11 is a schematic structural diagram of yet another storage array
  • Figure 12 is a schematic flow chart of a working method of a storage array.
  • Ferroelectric materials can undergo spontaneous polarization under an electric field, and the polarization direction can be adjusted with the action of an external electric field. The polarization state is retained after the electric field disappears. FeRAM utilizes this property of ferroelectric materials to store data.
  • Figure 1 shows a schematic diagram of the memory principle of FeRAM.
  • the abscissa in Figure 1 is the voltage V or the electric field intensity E, the ordinate can be the polarization intensity P or the polarization charge Q, Pr is the residual polarization intensity, and Vc is the coercive field of the ferroelectric capacitor.
  • the polarization intensity also increases until saturation.
  • the polarization direction will also change.
  • Different polarization directions can be used to represent information "0" and information "1". For example, as shown in Figure 1, when the potential of the upper plate of the ferroelectric capacitor is lower than the potential of the lower plate, the polarization direction of the ferroelectric capacitor is downward.
  • the stored information can be considered to be "1"; ferroelectric capacitor When the potential of the upper plate of the capacitor is higher than the potential of the lower plate, the polarization direction of the ferroelectric capacitor is upward. At this time, the stored information can be considered to be "0".
  • the circuit structure of FeRAM is the basis for ensuring that FeRAM achieves correct read and write functions.
  • the memory cells in FeRAM memory arrays are usually one transistor one capacitor (1T1C) structure or two transistor two capacitor (2T2C) structure.
  • FIG. 2 is a schematic diagram of a memory cell in a FeRAM memory array.
  • the 1T1C structure includes a transistor and a ferroelectric capacitor.
  • the gate terminal of the transistor is connected to the word line (WL)
  • the drain terminal of the transistor is connected to the bit line (BL)
  • one end of the ferroelectric capacitor is connected to the source terminal of the transistor
  • the other end of the ferroelectric capacitor is connected to the plate line (plate line, PL).
  • WL is used to control the gating and turning off of the transistor. Applying corresponding potentials to BL and PL can write information in the ferroelectric capacitor or read information from the ferroelectric capacitor.
  • the 2T2C structure includes two transistors and two ferroelectric capacitors.
  • the 2T2C structure can be viewed as two adjacent 1T1C structures, sharing the same word lines and plate lines, but storing opposite data.
  • one ferroelectric capacitor stores information "1"
  • the other ferroelectric capacitor stores information "0".
  • the gate terminals of the two transistors are connected to the same word line WL.
  • the drain terminal of one of the transistors is connected to the bit line BL, and the source terminal of the transistor is connected to one terminal of one of the ferroelectric capacitors.
  • the drain terminal of the other transistor is connected to the bit line BL', and the source terminal of the transistor is connected to one terminal of another ferroelectric capacitor.
  • Two ferroelectric capacitors are connected to the same plate line PL.
  • the memory cells of the 2T2C structure are connected to WL, BL, BL’ and PL.
  • WL is used to control the gating and turning off of transistors.
  • FeRAM includes multiple memory cells, multiple word lines, multiple bit lines, and multiple plate lines.
  • the word lines and plate lines extend in the lateral direction
  • the bit lines extend in the longitudinal direction.
  • Memory cells in the same row share word lines, memory cells in the same row share plate lines, and memory cells in the same column share bit lines.
  • the gate terminals of the transistors of all memory cells in the same row are connected to the same word line
  • the ferroelectric capacitors of all memory cells in the same row are connected to the same plate.
  • the drain ends of the transistors of all memory cells in the same column are connected to the same bit line.
  • Memory cells sharing the same word line share the same plate line.
  • the memory array shown in Figures 3 and 4 includes three rows and four columns of memory cells, three rows of word lines WL0, WL1, and WL2, four columns of bit lines BL0, BL1, BL2, and BL3, and three rows of plate lines PL0 and PL1. and PL2.
  • the three rows of memory cells are respectively connected to three rows of word lines, the three rows of memory cells are respectively connected to three rows of plate lines, and the four columns of memory cells are respectively connected to four columns of bit lines.
  • the word line connected to the unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the unit to be written is connected to a high potential, and the transistor in the unit to be written is connected to a high potential.
  • the bit line connected to the unit to be written is connected to high potential
  • the plate line connected to the unit to be written is connected to low potential
  • the ferroelectric capacitor in the unit to be written is forward polarized
  • the information "1" is written to the unit to be written. written into the unit.
  • Figure 3 shows a schematic diagram of a write operation.
  • the cells to be written include the first row of memory cells.
  • WL0 is connected to the high potential VDD, and the transistors in the memory cells of this row are turned on.
  • BL0, BL1, BL2 and BL3 are connected to high potential VDD, PL0 is connected to low potential VSS, for example, 0V, the ferroelectric capacitor in the first row of memory cells is forward polarized, and information "1" is written into the first row of memory cells. .
  • the word line connected to the unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the unit to be written is connected to a high potential, and the transistor in the unit to be written is connected to a high potential.
  • the bit line connected to the unit to be written is connected to a low potential
  • the plate line connected to the unit to be written is connected to a high potential
  • the ferroelectric capacitor in the unit to be written is reversely polarized
  • the information "0" is written to the unit to be written. written into the unit.
  • the memory cells in the same row share a word line
  • the transistor in the memory unit in the same row as the unit to be written is turned on, and the memory unit in the row
  • the ferroelectric capacitors withstand the potential of their respective bit lines and plate lines. Since the memory cells in the same row share a board line, when the board line connected to the unit to be written is connected to a high potential, the ferroelectric capacitors in the memory cells in the same row as the unit to be written need to withstand the high voltage on the board line. Potential. If the bit line connected to the memory cell in this row is low, information "0" is written into the memory cell in this row. In order to prevent the information of a memory cell that has stored information "1" from being rewritten as information "0", the bit lines connected to other memory cells in the same row as the cell to be written are connected to a high potential.
  • the units to be written are the second storage unit and the third storage unit in the first row.
  • WL0 is connected to the high potential VDD, and the transistors in the memory cells of this row are turned on.
  • BL1 and BL2 are connected to low potential VSS, for example, 0V, PL0 is connected to high potential VDD, the ferroelectric capacitors in the second and third memory cells in the first row are reversely polarized, and the information "0" is written into these two storage units.
  • BL0 and BL3 need to be connected to the high potential VDD.
  • the bit line connected to the unit to be read is connected to 0V for pre-discharge, and then the word line connected to the unit to be read is connected to high potential.
  • a high potential pulse is applied to the connected board wires. If the information stored in the unit to be read is "0", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read will not change and the charge Q0 will be released. The released charge Q0 is distributed between the ferroelectric capacitor of the unit to be read and the bit line connected to the unit to be read, and the voltage of the bit line increases. The voltage of the bit line at this time is V0.
  • the polarization direction of the ferroelectric capacitor in the unit to be read is changed by the external electric field, from forward polarization to reverse polarization.
  • the released charge Q1 contains polarization flip charge, Q1>Q0.
  • the voltage on the bit line increases. At this time, the voltage of the bit line is V1, V1>V0.
  • the sense amplifier (SA) connected to the bit line detects the voltage of the bit line, compares the voltage of the bit line with the reference potential Vref, and based on the comparison As a result, it can be determined that the information stored in the unit to be read is information "0" or information "1".
  • the information stored in the unit to be read is information "1"; if the voltage of the bit line connected to the unit to be read does not exceed Vref, the information stored in the unit to be read is "1". Take the information stored in the unit as information "0".
  • the reading operation may change the information originally stored in the unit to be read. For example, if the information stored in the unit to be read is information "1", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read will be changed, and the information stored in the unit to be read will be rewritten. is information "0". After the read operation is completed, the information originally stored in the unit to be read, that is, the information stored in the unit to be read when the read operation starts, needs to be written back to the unit to be read according to the above process of the write operation.
  • FIG 4 shows a schematic diagram of a read operation.
  • each column BL is connected to one SA.
  • the entire row of memory cells needs to be read simultaneously each time.
  • FIG 4 when you need to read the information stored in the first row of memory cells, connect BL0, BL1, BL2 and BL3 to 0V for pre-discharge, then connect WL0 to high potential, and apply a high potential pulse to PL0.
  • the voltages of BL0, BL1, BL2 and BL3 are read out through the four SAs and compared with the reference voltage to obtain the information stored in the first row of memory cells.
  • multiple columns of BL are connected to one SA, that is, four columns of BL are connected to one SA through a data selector (multiplexer, MUX).
  • the information of one storage unit can be read in the 4 columns.
  • the unit to be read is the first memory cell in the first row.
  • connect BL0 to 0V for pre-discharge then connect WL0 to high potential, and apply a high potential pulse to PL0.
  • the whole row reading method shown in Figure 4 will affect the service life of FeRAM.
  • Durability refers to the ability of ferroelectric materials to maintain polarization strength after experiencing multiple voltage cycles. Durability is a key parameter in assessing the reliability of ferroelectric materials.
  • the endurance of FeRAM is about 10 12-14 voltage cycles.
  • the durability of FeRAM refers to the durability of the ferroelectric capacitors in FeRAM. That is, the ferroelectric capacitor in FeRAM cannot maintain the polarization intensity after experiencing 10 12-14 voltage cycles, resulting in the inability to store information.
  • each column BL is connected to a SA structure. Even if the information in the entire row of storage cells does not need to be read, all the storage units in the row will still be read. unit information.
  • the ferroelectric capacitors of the memory cells in the row that do not need to be read will also experience high voltages during the reading process and high voltages during the write-back process. As a result, the number of times the ferroelectric capacitors actually experience high voltages is much higher than the number of times the ferroelectric capacitors need to be read. The number of times it is taken affects the reliability of ferroelectric capacitors.
  • multiple columns of BL are connected to one SA.
  • the ferroelectric capacitance of the unread memory cells in this row will still experience high voltage during the read process and high voltage during the write-back process.
  • High voltage causes the number of times the ferroelectric capacitor actually experiences high voltage to be much higher than the number of times the ferroelectric capacitor is read, which also affects the reliability of the ferroelectric capacitor.
  • the method of reading the entire row will cause the ferroelectric capacitors in the entire row of memory cells to experience high voltage during the reading process and high voltage during the write-back process, affecting the service life of FeRAM.
  • the durability cycle of ferroelectric capacitors is about 10 12-14 voltage cycles, which cannot meet this life requirement.
  • Embodiments of the present application provide a storage array that can avoid reading the entire row, which is beneficial to ensuring the service life of the storage array.
  • the memory array includes a plurality of memory cells, a plurality of word lines extending in the row direction, a plurality of bit lines extending in the column direction, and a plurality of plate lines extending in the column direction.
  • the plurality of memory cells are arranged along rows and columns.
  • Each of the plurality of storage units stores The unit includes a first transistor and a first ferroelectric capacitor. The first terminal of the first transistor is connected to the second terminal of the first ferroelectric capacitor.
  • the gate terminal of the first transistor of each memory cell in the first part of the memory cells is connected to one of the plurality of word lines.
  • the first part of the memory cells includes a plurality of memory cells in the same row in the memory array.
  • the first end of the first ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines.
  • the second part of the memory cells includes a plurality of memory cells in the same column in the memory array.
  • the second terminal of the first transistor of each memory cell in the second portion of memory cells is connected to one of the plurality of plate lines.
  • the row direction and the column direction are relative concepts and are only used to define two mutually perpendicular directions.
  • Row direction may also be called landscape orientation.
  • Column direction may also be called portrait orientation. That is to say, the plurality of signal lines extending in the row direction are parallel to each other, and the plurality of signal lines extending in the column direction are parallel to each other.
  • the signal lines extending in the row direction and the signal lines extending in the column direction are perpendicular to each other.
  • the plurality of memory cells in the memory array are distributed in rows and columns, that is, the plurality of memory cells are distributed in a direction parallel to the extension direction of the signal line and perpendicular to the extension direction of the signal line.
  • Different signal lines in the embodiments of this application refer to mutually independent signal lines.
  • Each memory cell in the memory array includes a first transistor and a first ferroelectric capacitor.
  • a memory cell is connected to at least three signal lines, namely word lines, bit lines and plate lines. Specifically, in a memory cell, the gate terminal of the first transistor is connected to the word line, the first terminal of the first ferroelectric capacitor is connected to the bit line, and the second terminal of the first ferroelectric capacitor is connected to the first terminal of the first transistor. terminals are connected, and the second terminal of the first transistor is connected to the board line.
  • Word lines are used to control the on and off of transistors.
  • the plate lines and bit lines work together on the ferroelectric capacitor to complete read and write operations.
  • Bit lines are used to transmit electrical signals. For detailed description, please refer to the previous article and will not be repeated here.
  • first end and second end of the first ferroelectric capacitor are only used to distinguish the two ends of the first ferroelectric capacitor and have no other limiting effect.
  • the “first terminal” and “second terminal” of the first transistor are only used to distinguish the source terminal and the drain terminal of the first transistor and have no other limiting role.
  • the first terminal of the first transistor is the source terminal
  • the second terminal of the first transistor is the drain terminal.
  • the second terminal of the first ferroelectric capacitor is connected to the source terminal of the first transistor, and the drain terminal of the first transistor is connected to the plate line.
  • the first terminal of the first transistor is the drain terminal
  • the second terminal of the first transistor is the source terminal.
  • the second terminal of the first ferroelectric capacitor is connected to the drain terminal of the first transistor, and the source terminal of the first transistor is connected to the plate line.
  • Each of the plurality of word lines is connected to a memory cell, each of the plurality of bit lines is connected to a memory cell, and each of the plurality of plate lines is connected to a memory cell. connect.
  • each word line is connected to different memory cells, each bit line is connected to different memory cells, and each plate line is connected to different memory cells.
  • the second end of the first ferroelectric capacitor is connected to the drain end of the first transistor, and the source end of the first transistor is connected to the plate line as an example to illustrate the solution of the embodiment of the present application. , does not limit the solutions of the embodiments of this application.
  • the gate terminal of the first transistor of each memory cell in the first part of the memory cells is connected to one of the plurality of word lines, which refers to the gate terminal of the first transistor of each memory cell in the first part of the memory cells.
  • the connected word lines are the same.
  • the first end of the first ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines, which means that the first end of the first ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines.
  • the first terminal of a ferroelectric capacitor is connected to the same bit line.
  • the second end of the first transistor of each memory cell in the second part of the memory cells is connected to one of the plurality of plate lines, which means that the first transistor of each memory cell in the second part of the memory cells
  • the second end of the board is connected to The lines are the same.
  • the first portion of memory cells may include all or part of the memory cells in the same row.
  • the second portion of memory cells may include all or part of the memory cells in the same column.
  • the first part of the storage units may include the i-th row of storage units, and the second part of the storage units may include the j-th column of storage units.
  • the gate end of the first transistor of each memory cell in the i-th row of memory cells in the memory array is connected to the i-th word line among the plurality of word lines, where i is a positive integer;
  • the first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit is connected to the j-th bit line among the plurality of bit lines, j is a positive integer;
  • the first ferroelectric capacitor of each memory unit in the j-th column memory unit is connected to The second end of a transistor is connected to one of the plurality of plate lines, the first end of the first transistor is the source end, the second end of the first transistor is the drain end, or the first end of the first transistor is The drain terminal and the second terminal of the first transistor are the source terminal.
  • the i-th row of storage cells can be any row of storage cells in the storage array.
  • the jth column storage unit can be any column storage unit in the storage array.
  • the i-th word line can be any word line among the plurality of word lines, and the j-th bit line can be any bit line among the plurality of bit lines.
  • the first transistor of each memory cell in the i-th row of memory cells is connected to the i-th word line, which can also be understood as the word line to which the gate terminals of the first transistors of all memory cells in the same row in the memory array are connected. They may be the same, and the word lines connected to the gate terminals of the first transistors in memory cells in different rows are different.
  • the first end of the first ferroelectric capacitor of each memory cell in the j-th column is connected to the j-th bit line among the plurality of bit lines, which can also be understood as the first ferroelectric capacitor of all memory cells in the same column.
  • the bit lines connected to the electric capacitors may be the same, and the bit lines connected to the first ferroelectric capacitors of memory cells in different columns are different.
  • the second end of the first transistor of each memory cell in the j-th column is connected to one of the plurality of plate lines, which can be understood as the plate line to which the first transistors of all memory cells in the same column are connected. can be the same.
  • the i in the i-th word line takes different values, it represents different word lines. That is, the i in the i-th word line with different values is only used to define different word lines and does not determine the arrangement of the word lines. The order does not constitute a limitation.
  • j in the j-th bit line takes different values, it represents different bit lines. That is, different values of j in the j-th word line are only used to define different bit lines, but do not limit the arrangement order of the bit lines.
  • the first transistors in each memory unit in the first part of the memory units are connected to different board lines.
  • the first transistors in the memory cells sharing the same word line are respectively connected to different plate lines.
  • Multiple storage units in the storage array are arranged in rows I and columns J.
  • the plurality of storage units are I*J storage units.
  • the storage array may include K strip lines. I is an integer greater than 1, J is an integer greater than 1, and K is an integer greater than 1.
  • the second end of the first transistor of each memory cell in the j-th column memory cell is connected to the j-th plate line among the K plate lines.
  • J is equal to K.
  • the first transistor of each memory unit in the J column memory unit in the memory array is connected to the plate line corresponding to the J column memory unit. That is, there is a one-to-one correspondence between J columns of storage cells and J plate lines.
  • a memory unit includes a transistor and a ferroelectric capacitor (ie, a first transistor and a first ferroelectric capacitor).
  • a memory cell is connected to a word line, a bit line and a plate line respectively.
  • Each row of memory cells is connected to the word line corresponding to the row of memory cells, each column of memory cells is connected to the corresponding bit line of the column of memory cells, and each column of memory cells is connected to the corresponding plate line of the column of memory cells.
  • Memory cells in different rows correspond to different word lines. storage units in different columns The corresponding bit lines are different. Memory cells in different columns correspond to different board lines.
  • each column plate line corresponds to each column bit line on a one-to-one basis.
  • FIG. 5 shows a schematic structural diagram of a storage array 500 provided by an embodiment of the present application.
  • the memory array 500 includes 16 4 ⁇ 4 memory cells, 4 word lines, 4 bit lines, and 4 plate lines.
  • the four word lines are WL0, WL1, WL2 and WL3 respectively.
  • the four bit lines are BL0, BL1, BL2 and BL3 respectively.
  • the four plate lines are PL0, PL1, PL2 and PL3 respectively.
  • the word line is a horizontal trace
  • the bit line is a vertical trace
  • the board line is a vertical trace.
  • a memory cell includes a transistor (ie, a first transistor) and a ferroelectric capacitor (ie, a first ferroelectric capacitor).
  • the word lines connected to the gate terminals of the transistors in the same row of memory cells are the same word line, that is, the memory cells in the same row are connected to the same word line.
  • the source ends of the transistors in the same column of memory cells are connected to the same plate line, that is, the memory cells of the same column are connected to the same plate line.
  • the ferroelectric capacitors in the same column of memory cells are connected to the same bit line, that is, the memory cells of the same column are connected to the same bit line.
  • Memory cells in different columns are connected to different plate lines, memory cells in different columns are connected to different bit lines, and memory cells in different rows are connected to different word lines.
  • the memory array shown in Figure 5 is only a schematic diagram of a memory array provided by the embodiment of the present application.
  • the number of devices shown in the figure does not limit the solution of the embodiment of the present application.
  • the memory array in Figure 5 The array includes 16 4 ⁇ 4 memory cells.
  • the memory array can include memory cells of other sizes.
  • the number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited.
  • the first transistors of some of the first memory cells are connected to the same board lines.
  • this structure may also be called a structure in which the PL is shared by segments.
  • J is greater than K.
  • multiple columns of memory cells in the memory array share one of the K plate lines.
  • the first transistors in the multiple columns of memory cells are connected to the same board lines.
  • a memory unit includes a transistor and a ferroelectric capacitor (ie, a first transistor and a first ferroelectric capacitor).
  • Each row of memory cells is connected to the word line corresponding to the row of memory cells, each column of memory cells is connected to the corresponding bit line of the column of memory cells, and each column of memory cells is connected to the corresponding plate line of the column of memory cells.
  • Memory cells in different rows correspond to different word lines.
  • Memory cells in different columns correspond to different bit lines.
  • the board lines corresponding to the memory cells in different columns may be the same.
  • the memory cells in different rows are connected to different word lines
  • the memory cells in different columns are connected to different bit lines
  • the memory cells in different columns are connected to the same plate lines.
  • multiple columns of bit lines correspond to one column of plate lines.
  • the second end of the first transistor of each memory cell in the kth column of memory cells in the memory array shares a plurality of plate lines with the second end of the first transistor of each memory cell in the jth column of memory cells.
  • k is a positive integer
  • j is not equal to k.
  • the first transistor in the k-th column memory cell and the first transistor in the j-th column memory cell are connected to the same plate line.
  • J is equal to 2 t K
  • t is a positive integer
  • the first transistors of every 2 t columns of memory cells share one plate line.
  • t is 1, that is, the first transistors of every two columns of memory cells share one plate line.
  • the bit lines connected to the first ferroelectric capacitors of every two columns of memory cells may be two bit lines.
  • one board line corresponds to two bit lines.
  • t is 2, that is, the first transistors of every four columns of memory cells share one plate line.
  • the bit lines connected to the first ferroelectric capacitors of every four columns of memory cells may be four bit lines. In this case, one board line corresponds to 4 bit lines.
  • the gate end of the first transistor of some of the first partial memory cells is connected to one of the plurality of plate lines, and the partial memory cells are symmetrically distributed with the plate line as the axis.
  • a first transistor in a plurality of columns of memory cells in a memory array is connected to a plate line.
  • the multi-column memory cells may be symmetrically distributed with the plate line as an axis. That is, multiple columns of memory cells sharing a board line can be symmetrically distributed with the board line as the axis.
  • J is equal to 2 t K
  • t is a positive integer
  • every 2 t columns of memory cells are symmetrically distributed with a shared plate line as the axis.
  • each two columns of memory cells are symmetrically distributed with a shared board line as the axis.
  • the memory cells in the jth column and the memory cells in the kth column are symmetrically distributed with the shared board line as the axis.
  • the memory array 600 includes 16 4 ⁇ 4 memory cells, 4 word lines, 4 bit lines, and 2 plate lines.
  • the four word lines are WL0, WL1, WL2 and WL3 respectively.
  • the four bit lines are BL0, BL1, BL2 and BL3 respectively.
  • the two plate lines are PL0 and PL1 respectively.
  • the word line is a horizontal trace
  • the bit line is a vertical trace
  • the board line is a vertical trace.
  • the memory cells in the same row are connected to the same word line
  • the memory cells in the same column are connected to the same bit line
  • every two columns of memory cells are connected to the same plate line.
  • the memory cells in every two columns are connected to the same plate lines, the memory cells in different columns are connected to different bit lines, and the memory cells in different rows are connected to different word lines.
  • the memory cells in the first to fourth rows are connected to WL0, WL1, WL2, and WL3 respectively, and the memory cells in the first to fourth columns are connected to BL0, BL1, BL2, and BL3 respectively.
  • the memory cells in the column and the second column are connected to the plate line PL0, and the memory cells in the third column and the memory cells in the fourth column are connected to the plate line PL1. That is, BL0 and BL1 correspond to PL0, and BL2 and BL3 correspond to PL1.
  • the memory cells in the first column and the memory cells in the second column are symmetrically distributed with PL0 as the axis, and the memory cells in the third column and the memory cells in the fourth column are symmetrically distributed with PL1 as the axis.
  • the memory array shown in Figure 6 is only a schematic diagram of a memory array provided by the embodiment of the present application.
  • the number of devices shown in the figure does not limit the solution of the embodiment of the present application.
  • the memory array in Figure 6 The array includes 16 4 ⁇ 4 memory cells.
  • the memory array can include memory cells of other sizes.
  • the number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited.
  • the memory array 700 includes 4 ⁇ 4N 16N memory cells, 4 word lines, 4N bit lines, and 2 plate lines.
  • N is an integer greater than 1.
  • the 4 word lines are WL0, WL1, WL2 and WL3 respectively.
  • the 4N bit lines are BL0 to BL4N-1 respectively.
  • the 2 plate lines are PL0 and PL1 respectively.
  • the word lines are routed horizontally, and the bit lines are routed vertically.
  • the board lines are routed vertically.
  • N is a positive integer.
  • memory cells in the same row are connected to the same word line
  • memory cells in the same column are connected to the same bit line
  • every 2N bit lines correspond to one plate line, or in other words, every 2N columns
  • Storage units share 1 board line.
  • the 2N columns of memory cells sharing board lines are symmetrically distributed. Specifically, the memory cells in the 1st to 2N columns share the plate line PL0, and the memory cells in the 2N column are axially symmetrically distributed with the plate line PL0 as the axis.
  • the memory cells in the 2N+1th column to the 4Nth column share the plate line PL1, and the memory cells in the 2N column are axially symmetrically distributed with the plate line PL1 as the axis.
  • the memory array shown in Figure 7 is only a schematic diagram of a memory array provided by the embodiment of the present application.
  • the number of devices shown in the figure does not limit the solution of the embodiment of the present application.
  • the memory array in Figure 7 The array includes 16N memory cells of 4 ⁇ 4N.
  • the memory array can include memory cells of other sizes.
  • the number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited.
  • the writing process of the memory unit in the embodiment of the present application is similar to the writing process of the conventional memory unit.
  • the information writing process is similar to the information writing process of the memory unit with a 1T1C structure.
  • the information writing process is illustrated below by taking the memory unit including a transistor and a ferroelectric capacitor as an example.
  • the word line connected to the first unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the first unit to be written is connected to a high potential.
  • a transistor in the cell to be written is turned on.
  • the bit line connected to the first unit to be written is connected to a high potential
  • the plate line connected to the first unit to be written is connected to a low potential
  • the ferroelectric capacitor in the first unit to be written is forward polarized
  • the information is "1" is written into the first unit to be written.
  • the bit lines connected to other memory cells sharing the word line with the first unit to be written can be connected to a low potential
  • the plate lines connected to other memory cells can be connected to a low potential.
  • the high potential connected to the word line can be understood as the potential that causes the transistor to turn on.
  • the low potential connected to the word line can be understood as the potential that turns off the transistor.
  • the high potential and low potential connected to the bit line and the plate line are relative concepts. For example, if the potential on the bit line is higher than the potential on the plate line, it can be considered that the bit line is connected to a high potential.
  • the board wire is connected to low potential.
  • the high potential and low potential connected to each signal line can be set values.
  • the high potential connected to the bit line and the plate line can be the power supply voltage VDD, and the low potential connected to the bit line or the plate line can be 0V.
  • the first unit to be written in the embodiment of the present application may include one storage unit or may include multiple storage units, which is not limited in the embodiment of the present application.
  • the "first” in “the first unit to be written” is only used to limit that the unit to be written currently needs to be written with information "1", and has no other limiting effect.
  • the storage unit that currently needs to be written with information “1” can be called the “first unit to be written”.
  • the word line connected to the second unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the second unit to be written is connected to a high potential.
  • the transistor in the second unit to be written is turned on.
  • the bit line connected to the second unit to be written is connected to a low potential
  • the plate line connected to the second unit to be written is connected to a high potential
  • the ferroelectric capacitor in the second unit to be written is reverse polarized, and the information is "0" is written into the second unit to be written.
  • the word line connected to the second cell to be written is connected to a high potential
  • the transistors in other memory cells sharing the same word line with the second cell to be written are turned on, and the ferroelectric capacitances of other memory cells bear the The potentials on the corresponding bit lines and plate lines. If the second cell to be written shares the same plate line with some of the other memory cells sharing the same word line, the bit lines connected to the memory cells sharing the same plate line are connected to a high potential. This can prevent the information of the storage unit that has stored information "1" from being overwritten with information "0". For memory cells that share the same word line and do not share the same plate line as the second cell to be written, the connected bit line can be connected to a low potential, and the connected plate line can be connected to a low potential.
  • the second unit to be written in the embodiment of the present application may include one storage unit or may include multiple storage units, which is not limited in the embodiment of the present application.
  • the "second” in the “second unit to be written” is only used to limit that the unit to be written currently needs to be written with information "0", and has no other limiting effect.
  • the memory unit that currently needs to be written with information "0” can be called the "second unit to be written.”
  • the second unit to be written and the first unit to be written may be the same or different.
  • writing information into a storage unit means writing information into the ferroelectric capacitor of the storage unit.
  • the information stored in the memory unit is the information stored in the ferroelectric capacitor of the memory unit.
  • Figure 8 shows a schematic diagram of a write operation. The writing operation of the storage array in the embodiment of the present application will be described below with reference to FIG. 8 .
  • information "1" needs to be written to the first memory unit and the second memory unit of the second row.
  • the first storage unit and the second storage unit in the second row are the first units to be written.
  • the bit line BL0 connected to the first memory cell in the second row is connected to VDD, and the bit line BL1 connected to the second memory cell in the second row is connected to VDD.
  • the first memory unit and the second memory unit in the second row share the same board line PL0, and PL0 is connected to 0V.
  • the ferroelectric capacitors in these two memory cells are forward polarized.
  • Information "1" is written into the first memory cell and the second memory cell in the second row.
  • the connected bit lines, namely BL2 and BL3 are connected to 0V
  • the connected plate line, namely PL1 is connected to 0V.
  • information "0" is written to the second memory cell in the second row.
  • the bit line BL1 connected to the second memory cell in the second row is connected to 0V.
  • the plate line PL0 connected to the second memory cell in the second row is connected to VDD.
  • the ferroelectric capacitor in this memory cell is reversely polarized, and information "0" is written into the second memory cell in the second row.
  • the first memory cell in the second row and the second memory cell in the second row share plate line PL0.
  • the bit line BL0 connected to the first memory cell of the second row is connected to VDD.
  • the connected bit lines, namely BL2 and BL3 are connected to 0V
  • the connected plate line, namely PL1 is connected to 0V.
  • the storage array also includes at least one sense amplifier.
  • the at least one sense amplifier is used to determine the information stored in the unit to be read during the process of reading information.
  • SA is used to read the electrical signal on the bit line connected to the unit to be read, and determine the information stored in the unit to be read based on the electrical signal.
  • the electrical signal may be a voltage signal.
  • the unit to be read may include one storage unit or multiple storage units, which is not limited in this embodiment of the present application.
  • a plurality of sense amplifiers correspond to the plurality of bit lines one-to-one, and the plurality of sense amplifiers are respectively connected to the corresponding bit lines.
  • the number of sense amplifiers is the same as the number of bit lines.
  • the width of SA is larger than the width of the memory cell.
  • the way each BL corresponds to an SA will affect the effective storage area in the storage array.
  • multiple BLs may correspond to one SA.
  • the storage array further includes at least one sense amplifier, and the plurality of bit lines are connected to the at least one sense amplifier through a multiplexer.
  • the at least one sense amplifier is respectively connected to the output terminal of at least one multiplexer, and the plurality of bit lines are respectively connected to the input terminal of the at least one multiplexer.
  • the number of at least one sense amplifier is greater than or equal to the number of columns of memory cells connected to at least one board line.
  • the at least one multiplexer controls the connection relationship between the at least one sense amplifier and the plurality of bit lines.
  • a multiplexer can be called a data selector.
  • the number of SAs may be equal to the number of columns in which the units to be read are located during the reading process.
  • the cells to be read may include the intersection of memory cells connected to plate lines to which high potential pulses are applied and memory cells connected to word lines to which high potential is applied.
  • multiple column bit lines correspond to one SA, which reduces the number of SAs and can increase the effective storage area, that is, increase the density of memory cells.
  • the reading process of the memory unit in the embodiment of the present application is similar to the reading process of the conventional memory unit.
  • the information reading process is similar to the information reading process of the memory unit with a 1T1C structure.
  • the following takes the memory unit including a transistor and a ferroelectric capacitor as an example to illustrate the information reading process.
  • the bit line connected to the unit to be read is connected to 0V for pre-discharge, and then the word line connected to the unit to be read is connected to high potential, that is, the bit line connected to the unit to be read is connected to high potential.
  • the gate terminal of the transistor is connected to a high potential, and the transistor in the unit to be read is turned on.
  • a high potential pulse is applied to the board line to which the unit to be read is connected.
  • the sense amplifier can determine the information stored in the unit to be read based on the voltage on the bit line to which the unit to be read is connected.
  • the unit to be read as including a storage unit as an example. If the information stored in the unit to be read is "0", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read will not change and the charge Q0 will be released. The released charge Q0 is distributed between the ferroelectric capacitor of the unit to be read and the bit line connected to the unit to be read, and the voltage of the bit line increases. At this time, the voltage of the bit line connected to the unit to be read is V0. If the information stored in the unit to be read is "1", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read is changed by the external electric field, from forward polarization to reverse polarization.
  • the SA connected to the bit line detects the voltage of the bit line, and compares the voltage of the bit line with the reference potential Vref. Based on the comparison result, it can be determined whether the information stored in the unit to be read is information "0" or information "1".
  • the information stored in the unit to be read is information "1"; if the voltage of the bit line connected to the unit to be read does not exceed Vref, the information stored in the unit to be read is "1". Take the information stored in the unit as information "0".
  • the bit lines connected to other memory cells other than the unit to be read can be connected to a low potential, and the plate lines connected to other memory cells other than the unit to be read can be connected to a low potential.
  • the original information is written back to the unit to be read.
  • the ferroelectric capacitor does not need to withstand the high voltage on the board line. Using the solution of the embodiment of the present application, only the ferroelectric capacitor in the unit to be read needs to withstand the high voltage during the reading and writing back processes, and the ferroelectric capacitors in other memory units do not need to experience unnecessary high voltage.
  • bit lines can be connected to four SAs respectively, but (a) of FIG. 9 does not show all SAs.
  • the first storage unit and the second storage unit in the second row are the units to be read.
  • the bit line BL0 connected to the first memory cell in the second row is precharged to 0V
  • the bit line BL1 connected to the second memory cell in the second row is precharged to 0V.
  • the word line WL1 connected to the memory cell is connected to VDD, and the transistor in the second row of memory cells is turned on.
  • the first memory unit and the second memory unit in the second row share the same plate line PL0, and PL0 is connected to a high potential pulse.
  • SA connected to BL0 compares the detected voltage V1 on BL0 with the reference voltage, and determines that the information stored in the first memory cell of the second row is information "1".
  • SA connected to BL1 compares the detected voltage V0 on BL1 with the reference voltage and determines that the information stored in the second memory cell of the second row is information "0".
  • the first and second memory cells in the second row are read, and only the ferroelectric capacitors in the first and second memory cells in the second row need to withstand the read High voltage on the plate line during the process.
  • the ferroelectric capacitors in other memory cells do not need to experience unnecessary high voltages.
  • a memory cell may also include two transistors and two ferroelectric capacitors.
  • a memory cell may include two transistors and a ferroelectric capacitor.
  • the following is an example of a memory cell including two transistors and two ferroelectric capacitors.
  • a memory cell includes a first transistor, a second transistor, a first ferroelectric capacitor and a second ferroelectric capacitor.
  • the gate terminal of the second transistor of each memory cell in the first part of the memory cells is connected to one of the plurality of word lines.
  • the first part of the memory cells includes a plurality of memory cells in the same row in the memory array.
  • the first end of the second ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines.
  • the second part of the memory cells includes a plurality of memory cells in the same column in the memory array. .
  • the second end of the second ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of plate lines through the second transistor.
  • One memory cell is connected to at least four signal lines, namely at least one word line, at least one plate line and two bit lines.
  • the gate terminal of the first transistor and the gate terminal of the second transistor may be connected to the same word line, or may be connected to different word lines.
  • a first terminal of the first ferroelectric capacitor is connected to a bit line, and a first terminal of the second ferroelectric capacitor is connected to another bit line.
  • the second end of the first ferroelectric capacitor is connected to a plate line through the first transistor, and the second end of the second ferroelectric capacitor is connected to the same plate line through the second transistor, or may be connected to different plate lines.
  • the word lines connected to the gate terminals of the first transistors of all memory cells in the same row in the memory array may be the same.
  • the word lines connected to the gate terminals of the second transistors of all memory cells in the same row may be the same.
  • the bit lines connected to the first ends of the first ferroelectric capacitors of all memory cells in the same column may be the same.
  • the bit lines connected to the first ends of the second ferroelectric capacitors of all memory cells in the same column may be the same.
  • the plate lines to which the first ferroelectric capacitors of all memory cells in the same column are connected through the first transistors may be the same.
  • the plate lines connected by the first transistors to the second ferroelectric capacitors of all memory cells in the same column may be the same.
  • the first transistors in each memory unit in the first part of the memory units are connected to different board lines.
  • the second transistors in each memory cell in the first part of the memory cells are connected to different board lines.
  • the first transistors sharing the same word line are respectively connected to different plate lines.
  • the second transistors sharing the same word line are respectively connected to different plate lines.
  • the word lines connected to each row of memory cells in the memory array are different.
  • the bit lines connected to each column of memory cells different.
  • the memory cells in each column are connected to different board lines.
  • the second end of the first ferroelectric capacitor in each column memory unit in the memory array is connected to the plate line corresponding to the first ferroelectric capacitor in each column memory unit through the first transistor in each column memory unit.
  • the plate lines corresponding to the first ferroelectric capacitors in each column of memory cells are different.
  • the second end of the second ferroelectric capacitor in each column memory unit in the memory array is connected to the plate line corresponding to the second ferroelectric capacitor in each column memory unit through the second transistor in each column memory unit.
  • the plate lines corresponding to the second ferroelectric capacitors in each column of memory cells are different.
  • the first transistors in each column of memory cells in the memory array are connected to different board lines.
  • the second transistors in each column of memory cells in the memory array are connected to different board lines.
  • Figure 10 shows a schematic structural diagram of a storage array 1000 provided by an embodiment of the present application.
  • the memory array 1000 includes 16 4 ⁇ 4 memory cells, 4 word lines, 8 bit lines, and 4 plate lines.
  • the four word lines are WL0, WL1, WL2 and WL3 respectively.
  • the eight bit lines are BL0, BL0’, BL1, BL1’, BL2, BL2’, BL3 and BL3’ respectively.
  • the four plate lines are PL0, PL1, PL2 and PL3.
  • the word line is a horizontal trace
  • the bit line is a vertical trace
  • the board line is a vertical trace.
  • one memory cell includes two transistors (ie, a first transistor and a second transistor) and two ferroelectric capacitors (ie, a first ferroelectric capacitor and a second ferroelectric capacitor).
  • the word lines connected to the gate terminals of the transistors in the same row of memory cells are the same word line, that is, the memory cells in the same row are connected to the same word line.
  • the source ends of the transistors in the same column of memory cells are connected to the same plate line, that is, the memory cells of the same column are connected to the same plate line.
  • the bit line connected to the first ferroelectric capacitor in the same column of memory cells is the same bit line, and the bit line connected to the second ferroelectric capacitor in the same column of memory cells is the same bit line.
  • Memory cells in different columns are connected to different plate lines, memory cells in different columns are connected to different bit lines, and memory cells in different rows are connected to different word lines.
  • the memory array shown in Figure 10 is only a schematic diagram of a memory array provided by an embodiment of the present application.
  • the number of devices shown in the figure does not limit the solution of the embodiment of the present application.
  • the memory array in Figure 10 The array includes 4 ⁇ 4 memory cells.
  • the memory array can include memory cells of other sizes.
  • the number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. This is not the case in the embodiments of the present application. Make limitations.
  • the first transistors of some of the first memory cells are connected to the same board lines.
  • the second transistors of some of the first memory cells are connected to the same board lines.
  • the word lines connected to each row of memory cells in the memory array are different.
  • the bit lines connected to each column of memory cells are different.
  • the board lines connected to memory cells in different columns can be the same.
  • the second ends of the first ferroelectric capacitors in the multiple columns of memory cells in the memory array are respectively connected to a plate line through the first transistors in the multiple columns of memory cells.
  • the second ends of the second ferroelectric capacitors in the multiple columns of memory cells in the memory array are respectively connected to a plate line through the second transistors in the multiple columns of memory cells.
  • the first transistors in the multiple columns of memory cells are connected to the same board lines.
  • the second transistors in the multi-column memory cells are connected to the same plate lines.
  • the number of columns of the multi-column memory cells is less than the number of columns of memory cells in the memory array.
  • the memory array 1100 includes 16 4 ⁇ 4 memory cells, 4 word lines, 4 bit lines, and 2 plate lines.
  • the four word lines are WL0, WL1, WL2 and WL3 respectively.
  • the eight bit lines are BL0, BL0', BL1, BL1', BL2, BL2', BL3 and BL3' respectively.
  • the two plate lines are PL0 and PL1 respectively.
  • the word lines are horizontal traces and the bit lines are Longitudinal wiring, board wiring is vertical wiring.
  • the memory cells in the same row are connected to the same word line
  • the first ferroelectric capacitor in the memory cells in the same column is connected to the same bit line
  • the second ferroelectric capacitor in the memory cells in the same column is connected to the same bit line
  • every two columns
  • the storage units are connected to the same board line.
  • the memory cells in every two columns are connected to the same plate lines
  • the memory cells in different columns are connected to different bit lines
  • the memory cells in different rows are connected to different word lines.
  • the first to fourth rows of memory cells are connected to WL0, WL1, WL2 and WL3 respectively.
  • the first ferroelectric capacitors in the memory cells in the first to fourth columns are connected to BL0, BL1, BL2 and BL3 respectively, and the second ferroelectric capacitors in the memory cells in the first to fourth columns are connected to BL0' and BL1' respectively. , BL2' and BL3' are connected.
  • the memory cells in the first and second columns are connected to the plate line PL0, and the memory cells in the third and fourth columns are connected to the plate line PL1.
  • the memory cells in the first column and the memory cells in the second column are symmetrically distributed with PL0 as the axis, and the memory cells in the third column and the memory cells in the fourth column are symmetrically distributed with PL1 as the axis.
  • Figure 11 every two columns of memory cells share a board line, while in Figure 10 each column of memory cells are connected to different board lines.
  • Figure 11 please refer to the relevant descriptions of Figure 10. To avoid duplication, they will not be described again here.
  • the memory array shown in Figure 11 is only a schematic diagram of a memory array provided by the embodiment of the present application.
  • the number of devices shown in the figure does not limit the solution of the embodiment of the present application.
  • the memory array in Figure 11 The array includes 16 4 ⁇ 4 memory cells.
  • the memory array can include memory cells of other sizes.
  • the number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells.
  • the embodiments of this application This is not limited.
  • every two columns of memory cells share a board line. In practical applications, more columns of memory cells may share a board line. This is not limited in the embodiment of the present application.
  • the information writing and reading process is similar to the information writing and reading process of the memory unit with a 2T2C structure. To avoid duplication, they will not be described again here.
  • the extending direction of the plate line and the extending direction of the word line are perpendicular to each other.
  • the memory cells sharing the plate line and the memory cells sharing the word line are not exactly the same. This structure can only be used for those who need to read information.
  • the memory cells read information without reading the entire row of memory cells.
  • only the ferroelectric capacitors of the memory cells that need to read information can withstand high voltages.
  • the ferroelectric capacitors of other memory cells do not withstand high voltages. , avoids the situation where the entire row of memory cells needs to withstand high voltage during the reading process, reduces the number of times the ferroelectric capacitor withstands high voltage, and is beneficial to ensuring the service life of the storage array.
  • the word line connected to the memory unit that needs to read information is connected to a high potential
  • the transistor in the memory unit that needs to read information is turned on
  • the board line connected to the memory unit that needs to read information can be connected to a high voltage pulse.
  • the word lines connected to other memory cells sharing the board line with the memory cell that needs to read information are not connected to high potential, that is, the transistors in other memory cells are not turned on, and the ferroelectric capacitors in other memory cells will not withstand High voltage on the board line. In this way, it is avoided that the entire row of memory cells needs to withstand high voltage during the reading process, and the number of times the ferroelectric capacitor is subjected to high voltage is reduced, which is beneficial to ensuring the service life of the memory array.
  • a column of memory cells can share a board line, which is beneficial to reducing the number of board lines and reducing the area occupied by the connection between the board line and the memory unit, thereby increasing the effective storage area and improving storage density.
  • the high-potential signal sources required by the board lines can be deployed in peripheral circuits, avoiding the deployment of power supplies between memory cells, which in turn helps increase the effective storage area and improve storage density.
  • multiple columns of memory cells can share a board line, further reducing the number of board lines, further increasing the effective storage area and improving storage density.
  • the storage arrays in Figures 5 to 11 are only examples. During specific implementation, those skilled in the art It should be understood by the operator that the memory arrays in Figures 5 to 11 may also include other devices necessary for normal operation. At the same time, based on specific needs, those skilled in the art should understand that the storage arrays in Figures 5 to 11 may also include hardware devices that implement other additional functions.
  • Figure 12 shows a working method of a storage array provided by an embodiment of the present application.
  • the method 1200 can be applied to the previous storage arrays, for example, the storage arrays in Figures 5 to 11.
  • the previous Description please refer to the previous Description: In order to avoid duplication, when describing the method 1200, part of the description is appropriately omitted.
  • the memory array includes a plurality of memory cells, a plurality of word lines extending in the row direction, a plurality of bit lines extending in the column direction, and a plurality of plate lines extending in the column direction.
  • Each memory unit in the plurality of memory cells includes a third A transistor and a first ferroelectric capacitor, the first terminal of the first transistor is connected to the second terminal of the first ferroelectric capacitor, wherein the first transistor of each memory unit in the i-th row memory unit in the plurality of memory units The gate end of is connected to the i-th word line among the plurality of word lines, i is a positive integer, and the first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit among the plurality of memory cells is connected to the plurality of word lines.
  • the jth bit line among the bit lines is connected, j is a positive integer, the second end of the first transistor of each memory cell in the jth column memory unit is connected to one of the plurality of plate lines, and the first transistor
  • the first terminal of the first transistor is the source terminal and the second terminal of the first transistor is the drain terminal.
  • the first terminal of the first transistor is the drain terminal and the second terminal of the first transistor is the source terminal.
  • Method 1200 includes steps 1210 to 1220.
  • the target storage unit may be the unit to be read mentioned above.
  • the first voltage signal can be understood as a voltage signal that causes the first transistor to turn on.
  • the first voltage signal may be the high potential signal connected to the word line mentioned above.
  • the second voltage signal and the third voltage signal are voltage signals used for reading stored information.
  • the second voltage signal may be the high-potential pulse signal connected to the board line mentioned above.
  • the third voltage signal may be the low-potential signal connected to the bit line mentioned above.
  • the second end of the first transistor of each memory cell in the j-th column memory cell is connected to the j-th plate line among the plurality of plate lines, and the method includes: applying a second voltage to the j-th plate line signal to read the information stored in the target storage unit, which is the storage unit at the intersection with the j-th column storage unit and the i-th row storage unit.
  • the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory units shares multiple lines with the second end of the first transistor of each memory unit in the j-th column memory unit.
  • One of the plate lines, k is a positive integer, and j is not equal to k.
  • the method includes: applying a second voltage signal to one of the shared multiple plate lines to read the information stored in the target storage unit.
  • the target storage unit is the storage unit in the intersection with the j-th column storage unit, the k-th column storage unit and the i-th row storage unit.
  • the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the multiple shared plate lines as an axis.
  • multiple bit lines are respectively connected to multiple amplifiers.
  • the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of at least one amplifier It is greater than or equal to the number of columns of memory cells connected to at least one of the plurality of plate lines.
  • An embodiment of the present application also provides a memory, including the aforementioned storage array and a storage controller, and the storage controller and the storage array are electrically connected.
  • the storage array may be any of the storage arrays in FIG. 5 to FIG. 11 .
  • An embodiment of the present application also provides an electronic device, including the aforementioned memory and a circuit board.
  • the memory is disposed on the circuit board and is electrically connected to the circuit board.
  • At least one refers to one or more, and “plurality” refers to two or more.
  • At least one of the following” or similar expressions thereof refers to any combination of these items, including any combination of a single item (items) or a plurality of items (items).
  • at least one of a, b, or c can mean: a, b, c, a-b, a-c, b-c, or a-b-c, where a, b, c can be single or multiple .
  • the size of the sequence numbers of the above-mentioned processes does not mean the order of execution.
  • the execution order of each process should be determined by its functions and internal logic, and should not be used in the embodiments of the present application.
  • the implementation process constitutes any limitation.
  • the disclosed systems, devices and methods can be implemented in other ways.
  • the device embodiments described above are only illustrative.
  • the division of the units is only a logical function division. In actual implementation, there may be other division methods.
  • multiple units or components may be combined or can be integrated into another system, or some features can be ignored, or not implemented.
  • the coupling or direct coupling or communication connection between each other shown or discussed may be through some interfaces, and the indirect coupling or communication connection of the devices or units may be in electrical, mechanical or other forms.
  • the units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place, or they may be distributed to multiple network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of this embodiment.
  • each functional unit in each embodiment of the present application can be integrated into one processing unit, each unit can exist physically alone, or two or more units can be integrated into one unit.

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Abstract

The present application discloses a storage array and a working method for the storage array. The storage array comprises a plurality of memory cells, a plurality of word lines extending in a row direction, a plurality of bit lines extending in a column direction, and a plurality of plate lines extending in the column direction. A first end of a first ferroelectric capacitor of each memory cell in an j-th column of memory cells is connected to a j-th bit line, and a second end of a first transistor of each memory cell in the j-th column of memory cells is connected to one of the plurality of plate lines. The solution of the present application can prevent the memory cells from bearing an unnecessary high voltage during reading, reduce the number of times that the ferroelectric capacitors in the memory cells bear a high voltage, and facilitate prolonging of the service life of the storage array.

Description

存储阵列以及存储阵列的工作方法Storage arrays and how storage arrays work
本申请要求于2022年5月16日提交中国专利局、申请号为202210530995.7、申请名称为“存储阵列以及存储阵列的工作方法”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to the Chinese patent application filed with the China Patent Office on May 16, 2022, with application number 202210530995.7 and the application name "Storage Array and Working Method of Storage Array", the entire content of which is incorporated into this application by reference. middle.
技术领域Technical field
本申请涉及半导体器件领域,尤其涉及一种存储阵列以及存储阵列的工作方法。The present application relates to the field of semiconductor devices, and in particular, to a memory array and a working method of the memory array.
背景技术Background technique
铁电随机存储器(ferroelectric random access memory,FeRAM)是利用铁电材料的性质进行存储的器件。Ferroelectric random access memory (FeRAM) is a device that utilizes the properties of ferroelectric materials for storage.
FeRAM中包括由多个存储单元组成的存储阵列,写入和读取操作采用整行写入和整行读取的方式。在读取过程中,同一行的所有存储单元中的铁电电容均需要承受读取数据时的高压和回写数据时的高压。即使在不需要读取该行中的所有存储单元中的数据的情况下,该行中的所有存储单元中的铁电电容仍然需要经历读取数据时的高压和回写数据时的高压。这样会导致铁电电容经历过多的电压周期,影响铁电电容的性能,进而影响FeRAM的使用寿命。FeRAM includes a storage array composed of multiple memory cells, and write and read operations adopt full-row writing and full-row reading. During the read process, the ferroelectric capacitors in all memory cells in the same row need to withstand the high voltage when reading data and the high voltage when writing data back. Even if there is no need to read data in all memory cells in the row, the ferroelectric capacitors in all memory cells in the row still need to experience high voltage when reading data and high voltage when writing data back. This will cause the ferroelectric capacitor to experience too many voltage cycles, affecting the performance of the ferroelectric capacitor and thus affecting the service life of FeRAM.
发明内容Contents of the invention
本申请提供一种存储阵列以及存储阵列的工作方法,能够避免读取过程中存储单元承受不必要的高电压,减少存储单元中的铁电电容承受高压的次数,有利于提高存储阵列的使用寿命。This application provides a storage array and a working method of the storage array, which can prevent the storage unit from being subjected to unnecessary high voltage during the reading process, reduce the number of times that the ferroelectric capacitor in the storage unit is subjected to high voltage, and is conducive to improving the service life of the storage array. .
第一方面,提供了一种存储阵列,包括:多个存储单元、沿行方向延伸的多条字线、沿列方向延伸的多条位线和沿列方向延伸的多条板线,多个存储单元中的每个存储单元包括第一晶体管和第一铁电电容,第一晶体管的第一端与第一铁电电容的第二端相连,其中,多个存储单元中的第i行存储单元中每个存储单元的第一晶体管的栅端与多条字线中的第i条字线连接,i为正整数,多个存储单元中的第j列存储单元中每个存储单元的第一铁电电容的第一端与多条位线中的第j条位线连接,j为正整数,第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的一条板线连接,第一晶体管的第一端为源端,第一晶体管的第二端为漏端,或者,第一晶体管的第一端为漏端,第一晶体管的第二端为源端。In a first aspect, a memory array is provided, including: a plurality of memory cells, a plurality of word lines extending along a row direction, a plurality of bit lines extending along a column direction, and a plurality of plate lines extending along a column direction, a plurality of Each memory cell in the memory cells includes a first transistor and a first ferroelectric capacitor, a first terminal of the first transistor is connected to a second terminal of the first ferroelectric capacitor, wherein the i-th row of the plurality of memory cells stores The gate terminal of the first transistor of each memory unit in the unit is connected to the i-th word line among the plurality of word lines, i is a positive integer, and the j-th column memory unit among the plurality of memory units The first end of a ferroelectric capacitor is connected to the j-th bit line among the plurality of bit lines, j is a positive integer, and the second end of the first transistor of each memory cell in the j-th column memory unit is connected to the plurality of plate lines. One of the board lines is connected, the first terminal of the first transistor is the source terminal, and the second terminal of the first transistor is the drain terminal, or the first terminal of the first transistor is the drain terminal, and the second terminal of the first transistor is source.
根据本申请实施例的方案,板线的延伸方向和字线的延伸方向相互垂直,共享板线的存储单元和共享字线的存储单元并不完全相同,该结构可以仅对需要读取信息的存储单元进行信息读取,而无需对整行存储单元进行读取,在信息读取过程中仅需要读取信息的存储单元的铁电电容的承受高压,其他存储单元的铁电电容不承受高压,避免了整行存储单 元在读取过程中均需要承受高压的情况,降低了铁电电容承受高压的次数,有利于保证存储阵列的使用寿命。According to the solution of the embodiment of the present application, the extending direction of the plate line and the extending direction of the word line are perpendicular to each other. The memory cells sharing the plate line and the memory cells sharing the word line are not exactly the same. This structure can only be used for those who need to read information. The memory cells read information without reading the entire row of memory cells. During the information reading process, only the ferroelectric capacitors of the memory cells that need to read information can withstand high voltages. The ferroelectric capacitors of other memory cells do not withstand high voltages. , avoiding the entire row of stored single The element needs to withstand high voltage during the reading process, which reduces the number of times the ferroelectric capacitor has to withstand high voltage, which is beneficial to ensuring the service life of the storage array.
此外,一列存储单元可以共用一条板线,有利于减少板线的数量,同时减少板线与存储单元之间的连线所占用的面积,进而增加有效存储面积,提高存储密度。而且,板线所需要的高电位信号源可以部署于外围电路,避免将电源部署于存储单元之间,进而有利于增加有效存储面积,提高存储密度。In addition, a column of memory cells can share a board line, which is beneficial to reducing the number of board lines and reducing the area occupied by the connection between the board line and the memory unit, thereby increasing the effective storage area and improving storage density. Moreover, the high-potential signal sources required by the board lines can be deployed in peripheral circuits, avoiding the deployment of power supplies between memory cells, which in turn helps increase the effective storage area and improve storage density.
其中,第i行存储单元可以为多个存储单元中的任一行存储单元。第j列存储单元可以为多个存储单元中的任一列存储单元。第i字线可以为多条字线中的任一条字线,第j位线可以为多条位线中的任一条位线。The i-th row of storage units may be any row of storage units among multiple storage units. The jth column storage unit may be any column storage unit among multiple storage units. The i-th word line can be any word line among the plurality of word lines, and the j-th bit line can be any bit line among the plurality of bit lines.
结合第一方面,在第一方面的某些实现方式中,第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的第j条板线连接。In connection with the first aspect, in some implementations of the first aspect, the second end of the first transistor of each memory cell in the j-th column of memory cells is connected to the j-th plate line among the plurality of plate lines.
示例性地,多个存储单元按照I行和J列设置。存储阵列可以包括K条板线。I为大于1的整数,J为大于1的整数,K为大于1的整数。例如,J等于K,在该情况下,多个存储单元中的J列存储单元中每个存储单元的第一晶体管与J列存储单元对应的板线相连。即J列存储单元与J条板线一一对应。For example, multiple storage units are arranged in rows I and columns J. The storage array may include K strip lines. I is an integer greater than 1, J is an integer greater than 1, and K is an integer greater than 1. For example, J is equal to K. In this case, the first transistor of each memory unit in the J column memory unit among the plurality of memory cells is connected to the plate line corresponding to the J column memory unit. That is, there is a one-to-one correspondence between J columns of storage cells and J plate lines.
结合第一方面,在第一方面的某些实现方式中,J大于K。在该情况下,多个存储单元中的多列存储单元共享该K条板线中的一条板线。Combined with the first aspect, in some implementations of the first aspect, J is greater than K. In this case, multiple columns of memory cells among the plurality of memory cells share one of the K plate lines.
在本申请实施例中,多列存储单元可以共享一条板线,进一步减少了板线的数量,能够进一步增加有效存储面积,提高存储密度。In the embodiment of the present application, multiple columns of memory cells can share a board line, further reducing the number of board lines, further increasing the effective storage area and improving storage density.
结合第一方面,在第一方面的某些实现方式中,多个存储单元中的第k列存储单元中每个存储单元的第一晶体管的第二端与第j列存储单元中每个存储单元的第一晶体管的第二端共享多条板线中的一条板线,k为正整数,j不等于k。In conjunction with the first aspect, in some implementations of the first aspect, the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory units is connected to each memory unit in the j-th column memory unit. The second terminal of the first transistor of the unit shares one of the plurality of plate lines, k is a positive integer, and j is not equal to k.
在本申请实施例中,多列存储单元可以共享一条板线,进一步减少了板线的数量,能够进一步增加有效存储面积,提高存储密度。In the embodiment of the present application, multiple columns of memory cells can share a board line, further reducing the number of board lines, further increasing the effective storage area and improving storage density.
结合第一方面,在第一方面的某些实现方式中,第j列存储单元和第k列存储单元以共享的多条板线中的一条板线为轴线呈对称分布。In conjunction with the first aspect, in some implementations of the first aspect, the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the multiple shared board lines as an axis.
这样,能够减少存储单元中存储单元与板线之间的走线所需要的面积,能够进一步提高有效存储面积。In this way, the area required for wiring between the memory unit and the board line in the memory unit can be reduced, and the effective storage area can be further increased.
结合第一方面,在第一方面的某些实现方式中,多条位线分别与多个放大器相连接。In conjunction with the first aspect, in some implementations of the first aspect, multiple bit lines are respectively connected to multiple amplifiers.
结合第一方面,在第一方面的某些实现方式中,多条位线通过多路选择器与至少一个放大器相连接,至少一个放大器的数量大于或等于多条板线中的至少一条板线所连接的存储单元的列数。In connection with the first aspect, in some implementations of the first aspect, the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to at least one of the plurality of plate lines. The number of columns of connected storage cells.
这样,多列位线对应一个SA,减少了SA的数量,能够提高有效存储面积,即提高存储单元密度。In this way, multiple column bit lines correspond to one SA, which reduces the number of SAs and can increase the effective storage area, that is, increase the density of memory cells.
第二方面,提供一种存储器,包括第一方面或第一方面中任一种可能的实现方式的存储阵列和存储控制器,存储控制器和存储阵列电连接。A second aspect provides a memory, including a storage array and a storage controller of the first aspect or any possible implementation of the first aspect, and the storage controller and the storage array are electrically connected.
第三方面,提供一种电子设备,包括第二方面的存储器和电路板,存储器设置于电路板上且与电路板电连接。A third aspect provides an electronic device, including the memory of the second aspect and a circuit board. The memory is disposed on the circuit board and is electrically connected to the circuit board.
第四方面,提供一种存储阵列的工作方法,存储阵列包括:多个存储单元、沿行方向 延伸的多条字线、沿列方向延伸的多条位线、沿列方向延伸的多条板线,多个存储单元中的每个存储单元包括第一晶体管和第一铁电电容,第一晶体管的第一端与第一铁电电容的第二端相连,其中,多个存储单元中的第i行存储单元中每个存储单元的第一晶体管的栅端与多条字线中的第i条字线连接,i为正整数,多个存储单元中的第j列存储单元中每个存储单元的第一铁电电容的第一端与多条位线中的第j条位线连接,j为正整数,第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的一条板线连接,第一晶体管的第一端为源端,第一晶体管的第二端为漏端,或者,第一晶体管的第一端为漏端,第一晶体管的第二端为源端,方法包括:在第i条字线上施加第一电压信号以使第i行存储单元中每个存储单元的第一晶体管导通;在多条板线中的一条板线上施加第二电压信号,目标存储单元所连接的位线上施加第三电压信号,以读取目标存储单元中存储的信息,第二电压信号的电位高于第三电压信号的电位,目标存储单元为与多条板线中的一条板线相连的存储单元和第i行存储单元的交集中的存储单元。In the fourth aspect, a working method of a storage array is provided. The storage array includes: multiple storage units, along the row direction A plurality of extended word lines, a plurality of bit lines extending along the column direction, and a plurality of plate lines extending along the column direction, each memory unit in the plurality of memory cells includes a first transistor and a first ferroelectric capacitor, the first The first end of the transistor is connected to the second end of the first ferroelectric capacitor, wherein the gate end of the first transistor of each memory cell in the i-th row of memory cells in the plurality of memory cells is connected to the first transistor in the plurality of word lines. i word lines are connected, i is a positive integer, and the first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit among the plurality of memory cells is connected to the j-th bit line among the plurality of bit lines. , j is a positive integer, the second end of the first transistor of each memory unit in the jth column memory unit is connected to one of the plurality of plate lines, the first end of the first transistor is the source end, and the first transistor The second end of the first transistor is the drain end, or the first end of the first transistor is the drain end, and the second end of the first transistor is the source end. The method includes: applying a first voltage signal to the i-th word line to cause the The first transistor of each memory cell in the i-row memory cell is turned on; a second voltage signal is applied to one of the plurality of plate lines, and a third voltage signal is applied to the bit line connected to the target memory cell to read Taking the information stored in the target storage unit, the potential of the second voltage signal is higher than the potential of the third voltage signal, and the target storage unit is the intersection of the storage unit connected to one of the plurality of plate lines and the i-th row of storage cells. Centralized storage unit.
结合第四方面,在第四方面的某些实现方式中,第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的第j条板线连接,方法包括:在第j条板线上施加第二电压信号,以读取目标存储单元中存储的信息,目标存储单元为与第j列存储单元和第i行存储单元的交集中的存储单元。In conjunction with the fourth aspect, in some implementations of the fourth aspect, the second end of the first transistor of each memory unit in the j-th column memory unit is connected to the j-th plate line among the plurality of plate lines, and the method includes : Apply a second voltage signal on the j-th plate line to read the information stored in the target storage unit. The target storage unit is a storage unit at the intersection with the j-th column storage unit and the i-th row storage unit.
结合第四方面,在第四方面的某些实现方式中,多个存储单元中的第k列存储单元中每个存储单元的第一晶体管的第二端与第j列存储单元中每个存储单元的第一晶体管的第二端共享多条板线中的一条板线,k为正整数,j不等于k,方法包括:在共享的多条板线中的一条板线上施加第二电压信号,以读取目标存储单元中存储的信息,目标存储单元为与第j列存储单元、第k列存储单元和第i行存储单元的交集中的存储单元。In conjunction with the fourth aspect, in some implementations of the fourth aspect, the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory units is connected to each memory unit in the j-th column memory unit. The second terminal of the first transistor of the unit shares one of the multiple plate lines, k is a positive integer, and j is not equal to k. The method includes: applying a second voltage to one of the shared multiple plate lines. signal to read the information stored in the target storage unit. The target storage unit is the storage unit at the intersection with the j-th column storage unit, the k-th column storage unit and the i-th row storage unit.
结合第四方面,在第四方面的某些实现方式中,第j列存储单元和第k列存储单元以共享的多条板线中的一条板线为轴线呈对称分布。Combined with the fourth aspect, in some implementations of the fourth aspect, the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the multiple shared board lines as an axis.
结合第四方面,在第四方面的某些实现方式中,多条位线分别与多个放大器相连接。Combined with the fourth aspect, in some implementations of the fourth aspect, multiple bit lines are respectively connected to multiple amplifiers.
结合第四方面,在第四方面的某些实现方式中,多条位线通过多路选择器与至少一个放大器相连接,至少一个放大器的数量大于或等于多条板线中的至少一条板线所连接的存储单元的列数。In conjunction with the fourth aspect, in some implementations of the fourth aspect, the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to at least one of the plurality of plate lines. The number of columns of connected storage cells.
上述第二方面至第四方面中任一方面中的任一可能实现方式可以达到的技术效果,可以相应参照上述第一方面中任一方面中的任一可能实现方式可以达到的技术效果描述,重复之处不予论述。The technical effects that can be achieved by any possible implementation method in any one of the above-mentioned second to fourth aspects can be described with reference to the technical effects that can be achieved by any possible implementation method in any one of the above-mentioned first aspects. Duplication will not be discussed.
附图说明Description of the drawings
图1是一种FeRAM的存储原理的示意图;Figure 1 is a schematic diagram of the storage principle of FeRAM;
图2是FeRAM存储阵列中的一个存储单元的示意图;Figure 2 is a schematic diagram of a memory cell in the FeRAM memory array;
图3是一种FeRAM的写入操作的示意图;Figure 3 is a schematic diagram of a write operation of FeRAM;
图4是一种FeRAM的读取操作的示意图;Figure 4 is a schematic diagram of a FeRAM read operation;
图5是一种存储阵列的示意性结构图;Figure 5 is a schematic structural diagram of a storage array;
图6是另一种存储阵列的示意性结构图;Figure 6 is a schematic structural diagram of another storage array;
图7是又一种存储阵列的示意性结构图; Figure 7 is a schematic structural diagram of yet another storage array;
图8是一种存储阵列的写入操作的示意图;Figure 8 is a schematic diagram of a write operation of a storage array;
图9是一种存储阵列的读取操作的示意图;Figure 9 is a schematic diagram of a read operation of a storage array;
图10是又一种存储阵列的示意性结构图;Figure 10 is a schematic structural diagram of yet another storage array;
图11是又一种存储阵列的示意性结构图;Figure 11 is a schematic structural diagram of yet another storage array;
图12是一种存储阵列的工作方法的示意性流程图。Figure 12 is a schematic flow chart of a working method of a storage array.
具体实施方式Detailed ways
下面将结合附图,对本申请中的技术方案进行描述。The technical solutions in this application will be described below with reference to the accompanying drawings.
铁电材料可以在电场下发生自发极化,极化方向能够随着外电场作用进行调整,电场消失后极化状态保留。FeRAM利用铁电材料的该性质对数据进行存储。Ferroelectric materials can undergo spontaneous polarization under an electric field, and the polarization direction can be adjusted with the action of an external electric field. The polarization state is retained after the electric field disappears. FeRAM utilizes this property of ferroelectric materials to store data.
图1示出了FeRAM的存储原理的示意图。图1中的横坐标为电压V或电场强度E,纵坐标可以为极化强度P或极化电荷Q,Pr为剩余极化强度,Vc为铁电电容的矫顽场。随着电场强度的增加,极化强度也会增加直至饱和。当外电场的方向发生变化时,极化方向也会随之改变。不同的极化方向可以用于表示信息“0”和信息“1”。例如,如图1所示,铁电电容的上极板的电位低于下极板的电位时,铁电电容的极化方向向下,此时可以认为存储的信息为“1”;铁电电容的上极板的电位高于下极板的电位时,铁电电容的极化方向向上,此时可以认为存储的信息为“0”。Figure 1 shows a schematic diagram of the memory principle of FeRAM. The abscissa in Figure 1 is the voltage V or the electric field intensity E, the ordinate can be the polarization intensity P or the polarization charge Q, Pr is the residual polarization intensity, and Vc is the coercive field of the ferroelectric capacitor. As the electric field strength increases, the polarization intensity also increases until saturation. When the direction of the external electric field changes, the polarization direction will also change. Different polarization directions can be used to represent information "0" and information "1". For example, as shown in Figure 1, when the potential of the upper plate of the ferroelectric capacitor is lower than the potential of the lower plate, the polarization direction of the ferroelectric capacitor is downward. At this time, the stored information can be considered to be "1"; ferroelectric capacitor When the potential of the upper plate of the capacitor is higher than the potential of the lower plate, the polarization direction of the ferroelectric capacitor is upward. At this time, the stored information can be considered to be "0".
FeRAM的电路结构是保证FeRAM实现正确读写功能的基础。FeRAM存储阵列中的的存储单元通常为一个晶体管一个电容(one transistor one capacitor,1T1C)结构或两个晶体管两个电容(twotransistor twocapacitor,2T2C)结构。The circuit structure of FeRAM is the basis for ensuring that FeRAM achieves correct read and write functions. The memory cells in FeRAM memory arrays are usually one transistor one capacitor (1T1C) structure or two transistor two capacitor (2T2C) structure.
图2为FeRAM存储阵列中的一个存储单元的示意图。如图2的(a)所示,1T1C结构包括一个晶体管和一个铁电电容。晶体管的栅端连接字线(word line,WL),晶体管的漏端连接位线(bit line,BL),铁电电容的一端连接晶体管的源端,铁电电容的另一端连接板线(plate line,PL)。WL用于控制晶体管的选通和关断,在BL和PL施加相应的电位即可在铁电电容中写入信息或从铁电电容中读取信息。Figure 2 is a schematic diagram of a memory cell in a FeRAM memory array. As shown in Figure 2(a), the 1T1C structure includes a transistor and a ferroelectric capacitor. The gate terminal of the transistor is connected to the word line (WL), the drain terminal of the transistor is connected to the bit line (BL), one end of the ferroelectric capacitor is connected to the source terminal of the transistor, and the other end of the ferroelectric capacitor is connected to the plate line (plate line, PL). WL is used to control the gating and turning off of the transistor. Applying corresponding potentials to BL and PL can write information in the ferroelectric capacitor or read information from the ferroelectric capacitor.
如图2的(b)所示,2T2C结构包括两个晶体管和两个铁电电容。2T2C结构可以视为两个相邻的1T1C结构,共享相同的字线和板线,但存储相反的数据。例如,其中一个铁电电容存储信息“1”,则另一个铁电电容存储信息“0”。具体地,该两个晶体管的栅端连接同一条字线WL。其中一个晶体管的漏端连接位线BL,该晶体管的源端连接其中一个铁电电容的一端。另一个晶体管的漏端连接位线BL’,该晶体管的源端连接另一个铁电电容的一端。两个铁电电容连接同一条板线PL。也就是说,2T2C结构的存储单元与WL、BL、BL’和PL相连。WL用于控制晶体管的选通和关断,在BL、BL’和PL施加相应的电位即可在铁电电容中写入信息或从铁电电容中读取信息。As shown in (b) of Figure 2, the 2T2C structure includes two transistors and two ferroelectric capacitors. The 2T2C structure can be viewed as two adjacent 1T1C structures, sharing the same word lines and plate lines, but storing opposite data. For example, one ferroelectric capacitor stores information "1", and the other ferroelectric capacitor stores information "0". Specifically, the gate terminals of the two transistors are connected to the same word line WL. The drain terminal of one of the transistors is connected to the bit line BL, and the source terminal of the transistor is connected to one terminal of one of the ferroelectric capacitors. The drain terminal of the other transistor is connected to the bit line BL', and the source terminal of the transistor is connected to one terminal of another ferroelectric capacitor. Two ferroelectric capacitors are connected to the same plate line PL. In other words, the memory cells of the 2T2C structure are connected to WL, BL, BL’ and PL. WL is used to control the gating and turning off of transistors. By applying corresponding potentials to BL, BL’ and PL, information can be written in or read from the ferroelectric capacitor.
为了便于理解和描述,后文中以存储单元为1T1C结构为例进行说明,不对本申请实施例的方案构成限定。In order to facilitate understanding and description, the following description takes the memory unit having a 1T1C structure as an example, which does not limit the solution of the embodiment of the present application.
FeRAM包括多个存储单元、多条字线、多条位线和多条板线。其中,字线和板线沿横向方向延伸,位线沿纵向方向延伸。处于同一行上的存储单元共享字线,处于同一行上的存储单元共享板线,处于同一列上的存储单元共享位线。换言之,同一行上的所有存储单元的晶体管的栅端与同一条字线相连,同一行上的所有存储单元的铁电电容与同一条板 线相连,同一列上的所有存储单元的晶体管的漏端与同一条位线相连。共享同一条字线的存储单元共享同一条板线。FeRAM includes multiple memory cells, multiple word lines, multiple bit lines, and multiple plate lines. Among them, the word lines and plate lines extend in the lateral direction, and the bit lines extend in the longitudinal direction. Memory cells in the same row share word lines, memory cells in the same row share plate lines, and memory cells in the same column share bit lines. In other words, the gate terminals of the transistors of all memory cells in the same row are connected to the same word line, and the ferroelectric capacitors of all memory cells in the same row are connected to the same plate. The drain ends of the transistors of all memory cells in the same column are connected to the same bit line. Memory cells sharing the same word line share the same plate line.
例如,在图3和图4所示的存储阵列包括三行四列存储单元,三行字线WL0、WL1和WL2,4列位线BL0、BL1、BL2和BL3,3行板线PL0、PL1和PL2。该三行存储单元分别与三行字线相连,三行存储单元分别与三行板线相连接,四列存储单元分别与四列位线相连。For example, the memory array shown in Figures 3 and 4 includes three rows and four columns of memory cells, three rows of word lines WL0, WL1, and WL2, four columns of bit lines BL0, BL1, BL2, and BL3, and three rows of plate lines PL0 and PL1. and PL2. The three rows of memory cells are respectively connected to three rows of word lines, the three rows of memory cells are respectively connected to three rows of plate lines, and the four columns of memory cells are respectively connected to four columns of bit lines.
在需要对待写入单元写入信息“1”时,待写入单元所连接的字线接高电位,即待写入单元中的晶体管的栅端接高电位,待写入单元中的晶体管导通,待写入单元所连接的位线接高电位,待写入单元所连接的板线接低电位,待写入单元中的铁电电容正向极化,信息“1”被写入待写入单元中。When it is necessary to write information "1" to the unit to be written, the word line connected to the unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the unit to be written is connected to a high potential, and the transistor in the unit to be written is connected to a high potential. The bit line connected to the unit to be written is connected to high potential, the plate line connected to the unit to be written is connected to low potential, the ferroelectric capacitor in the unit to be written is forward polarized, and the information "1" is written to the unit to be written. written into the unit.
图3示出了一种写入操作的示意图。例如,如图3的(a)所示,待写入单元包括第一行存储单元。需要对第一行存储单元写入信息“1”时,WL0接高电位VDD,该行存储单元中的晶体管导通。BL0、BL1、BL2和BL3接高电位VDD,PL0连接低电位VSS,比如,0V,第一行存储单元中的铁电电容正向极化,信息“1”被写入第一行存储单元中。Figure 3 shows a schematic diagram of a write operation. For example, as shown in (a) of FIG. 3 , the cells to be written include the first row of memory cells. When it is necessary to write information "1" to the first row of memory cells, WL0 is connected to the high potential VDD, and the transistors in the memory cells of this row are turned on. BL0, BL1, BL2 and BL3 are connected to high potential VDD, PL0 is connected to low potential VSS, for example, 0V, the ferroelectric capacitor in the first row of memory cells is forward polarized, and information "1" is written into the first row of memory cells. .
在需要对待写入单元写入信息“0”时,待写入单元所连接的字线接高电位,即待写入单元中的晶体管的栅端接高电位,待写入单元中的晶体管导通,待写入单元所连接的位线接低电位,待写入单元所连接的板线接高电位,待写入单元中的铁电电容反向极化,信息“0”被写入待写入单元中。此外,由于同一行存储单元共享一条字线,待写入单元所连接的字线接高电位的情况下,与待写入单元处于同一行的存储单元中的晶体管导通,该行存储单元中的铁电电容承受各自对应的位线和板线上的电位。由于同一行存储单元共享一条板线,待写入单元所连接的板线接高电位的情况下,与待写入单元处于同一行的存储单元中的铁电电容均需要承受板线上的高电位。若该行存储单元所连接的位线为低电位,则信息“0”被写入该行存储单元中。为了避免已经存储信息“1”的存储单元的信息被改写为信息“0”,与待写入单元处于同一行的其他存储单元所连接的位线接高电位。When it is necessary to write information "0" into the unit to be written, the word line connected to the unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the unit to be written is connected to a high potential, and the transistor in the unit to be written is connected to a high potential. The bit line connected to the unit to be written is connected to a low potential, the plate line connected to the unit to be written is connected to a high potential, the ferroelectric capacitor in the unit to be written is reversely polarized, and the information "0" is written to the unit to be written. written into the unit. In addition, since the memory cells in the same row share a word line, when the word line connected to the unit to be written is connected to a high potential, the transistor in the memory unit in the same row as the unit to be written is turned on, and the memory unit in the row The ferroelectric capacitors withstand the potential of their respective bit lines and plate lines. Since the memory cells in the same row share a board line, when the board line connected to the unit to be written is connected to a high potential, the ferroelectric capacitors in the memory cells in the same row as the unit to be written need to withstand the high voltage on the board line. Potential. If the bit line connected to the memory cell in this row is low, information "0" is written into the memory cell in this row. In order to prevent the information of a memory cell that has stored information "1" from being rewritten as information "0", the bit lines connected to other memory cells in the same row as the cell to be written are connected to a high potential.
例如,如图3的(b)所示,待写入单元为第一行第二个存储单元和第三个存储单元。对待写入单元写入信息“0”时,WL0连接高电位VDD,该行存储单元中的晶体管导通。BL1和BL2连接低电位VSS,比如,0V,PL0连接高电位VDD,第一行中的第二个存储单元和第三个存储单元中的铁电电容反向极化,信息“0”被写入这两个存储单元中。此外,为了避免已经存储信息“1”的存储单元的信息被改写为信息“0”,BL0和BL3需连接高电位VDD。For example, as shown in (b) of FIG. 3 , the units to be written are the second storage unit and the third storage unit in the first row. When writing information "0" to the cell to be written, WL0 is connected to the high potential VDD, and the transistors in the memory cells of this row are turned on. BL1 and BL2 are connected to low potential VSS, for example, 0V, PL0 is connected to high potential VDD, the ferroelectric capacitors in the second and third memory cells in the first row are reversely polarized, and the information "0" is written into these two storage units. In addition, in order to prevent the information of the memory cells that have stored information "1" from being rewritten as information "0", BL0 and BL3 need to be connected to the high potential VDD.
在需要从待读取单元中读取信息时,将待读取单元所连接的位线接0V进行预放电,然后将待读取单元所连接的字线接高电位,在待读取单元所连接的板线上施加高电位脉冲。如果待读取单元中存储的信息为“0”,在读取信息时,待读取单元中的铁电电容的极化方向不会发生改变,释放电荷Q0。释放的电荷Q0被分配在待读取单元的铁电电容和待读取单元所连接的位线上,位线的电压升高。此时的位线的电压为V0。如果待读取单元中存储的信息为“1”,在读取信息时,待读取单元中的铁电电容的极化方向被外电场改变,由正向极化变为反向极化,释放电荷Q1。释放的电荷Q1中包含极化翻转电荷,Q1>Q0。位线上的电压升高,此时的位线的电压为V1,V1>V0。连接位线的灵敏放大器(sense amplifier,SA)检测到位线的电压,将位线的电压与参考电位Vref进行对比,根据对比 结果即可确定待读取单元存储的信息为信息“0”或是信息“1”。例如,若待读取单元所连接的位线的电压超过Vref,则待读取单元存储的信息为信息“1”;若待读取单元所连接的位线的电压没有超过Vref,则待读取单元存储的信息为信息“0”。When it is necessary to read information from the unit to be read, the bit line connected to the unit to be read is connected to 0V for pre-discharge, and then the word line connected to the unit to be read is connected to high potential. A high potential pulse is applied to the connected board wires. If the information stored in the unit to be read is "0", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read will not change and the charge Q0 will be released. The released charge Q0 is distributed between the ferroelectric capacitor of the unit to be read and the bit line connected to the unit to be read, and the voltage of the bit line increases. The voltage of the bit line at this time is V0. If the information stored in the unit to be read is "1", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read is changed by the external electric field, from forward polarization to reverse polarization. Release charge Q1. The released charge Q1 contains polarization flip charge, Q1>Q0. The voltage on the bit line increases. At this time, the voltage of the bit line is V1, V1>V0. The sense amplifier (SA) connected to the bit line detects the voltage of the bit line, compares the voltage of the bit line with the reference potential Vref, and based on the comparison As a result, it can be determined that the information stored in the unit to be read is information "0" or information "1". For example, if the voltage of the bit line connected to the unit to be read exceeds Vref, the information stored in the unit to be read is information "1"; if the voltage of the bit line connected to the unit to be read does not exceed Vref, the information stored in the unit to be read is "1". Take the information stored in the unit as information "0".
由于读取过程为“破坏性读取”,即读取操作可能会改变待读取单元中原本存储的信息。例如,若待读取单元中存储的信息为信息“1”,在读取信息时,待读取单元中的铁电电容的极化方向会被改变,待读取单元中存储的信息被改写为信息“0”。读取操作结束后,需要按照上述写入操作的过程将待读取单元中原本存储的信息,即读取操作开始时待读取单元中存储的信息,写回待读取单元中。Since the reading process is a "destructive reading", that is, the reading operation may change the information originally stored in the unit to be read. For example, if the information stored in the unit to be read is information "1", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read will be changed, and the information stored in the unit to be read will be rewritten. is information "0". After the read operation is completed, the information originally stored in the unit to be read, that is, the information stored in the unit to be read when the read operation starts, needs to be written back to the unit to be read according to the above process of the write operation.
图4示出了读取操作的示意图。在图4的(a)中,每列BL分别连接一个SA。在读取过程中,每次均需要对整行存储单元同时读取。例如,如图4所示,需要读取第一行存储单元存储的信息时,将BL0、BL1、BL2和BL3接0V进行预放电,然后将WL0接高电位,在PL0上施加高电位脉冲,通过该4个SA读出BL0、BL1、BL2和BL3的电压,并与参考电压进行比较,以得到第一行存储单元中存储的信息。Figure 4 shows a schematic diagram of a read operation. In (a) of Figure 4, each column BL is connected to one SA. During the reading process, the entire row of memory cells needs to be read simultaneously each time. For example, as shown in Figure 4, when you need to read the information stored in the first row of memory cells, connect BL0, BL1, BL2 and BL3 to 0V for pre-discharge, then connect WL0 to high potential, and apply a high potential pulse to PL0. The voltages of BL0, BL1, BL2 and BL3 are read out through the four SAs and compared with the reference voltage to obtain the information stored in the first row of memory cells.
在图4的(b)中,多列BL连接一个SA,即4列BL通过数据选择器(multiplexer,MUX)连接一个SA。在读取过程中,可以在该4列中读取一个存储单元的信息。例如,待读取单元为第一行第一个存储单元,需要读取待读取单元存储的信息时,将BL0接0V进行预放电,然后将WL0接高电位,在PL0上施加高电位脉冲,通过SA读出BL0上的电压,并与参考电压进行比较,以得到第一行第一个存储单元中存储的信息。In (b) of Figure 4, multiple columns of BL are connected to one SA, that is, four columns of BL are connected to one SA through a data selector (multiplexer, MUX). During the reading process, the information of one storage unit can be read in the 4 columns. For example, the unit to be read is the first memory cell in the first row. When it is necessary to read the information stored in the unit to be read, connect BL0 to 0V for pre-discharge, then connect WL0 to high potential, and apply a high potential pulse to PL0. , read the voltage on BL0 through SA and compare it with the reference voltage to obtain the information stored in the first memory cell of the first row.
受铁电电容的耐久性(endurance)周期的限制,如图4所示的整行读取的方式会影响FeRAM的使用寿命。耐久性指的是铁电材料在经历多个电压周期后,极化强度的保持能力。耐久性是评估铁电材料可靠性的关键参数。FeRAM的耐久性约为1012-14个电压周期。FeRAM的耐久性指的是FeRAM中的铁电电容的耐久性。即FeRAM中的铁电电容在经历1012-14个电压周期后,无法保持极化强度,进而导致信息无法存储。Limited by the endurance cycle of the ferroelectric capacitor, the whole row reading method shown in Figure 4 will affect the service life of FeRAM. Durability refers to the ability of ferroelectric materials to maintain polarization strength after experiencing multiple voltage cycles. Durability is a key parameter in assessing the reliability of ferroelectric materials. The endurance of FeRAM is about 10 12-14 voltage cycles. The durability of FeRAM refers to the durability of the ferroelectric capacitors in FeRAM. That is, the ferroelectric capacitor in FeRAM cannot maintain the polarization intensity after experiencing 10 12-14 voltage cycles, resulting in the inability to store information.
具体地,在图4的(a)所示的结构中,每列BL分别连接一个SA的结构,即使并不需要读出整行存储单元中的信息,也仍然会读取出该行所有存储单元的信息。该行中不需要被读取的存储单元的铁电电容也会经历读取过程中的高压以及回写过程中的高压,导致铁电电容实际经历高压的次数远高于铁电电容需要被读取的次数,影响铁电电容的可靠性。在图4的(b)所示的结构中,多列BL连接一个SA的结构,该行中未被读取的存储单元的铁电电容仍然会经历读取过程的高压以及回写过程中的高压,导致铁电电容实际经历高压的次数远高于铁电电容被读取的次数,同样影响铁电电容的可靠性。Specifically, in the structure shown in (a) of Figure 4, each column BL is connected to a SA structure. Even if the information in the entire row of storage cells does not need to be read, all the storage units in the row will still be read. unit information. The ferroelectric capacitors of the memory cells in the row that do not need to be read will also experience high voltages during the reading process and high voltages during the write-back process. As a result, the number of times the ferroelectric capacitors actually experience high voltages is much higher than the number of times the ferroelectric capacitors need to be read. The number of times it is taken affects the reliability of ferroelectric capacitors. In the structure shown in Figure 4(b), multiple columns of BL are connected to one SA. The ferroelectric capacitance of the unread memory cells in this row will still experience high voltage during the read process and high voltage during the write-back process. High voltage causes the number of times the ferroelectric capacitor actually experiences high voltage to be much higher than the number of times the ferroelectric capacitor is read, which also affects the reliability of the ferroelectric capacitor.
也就是说,整行读取的方式会使得整行存储单元中的铁电电容经历读取过程的高压以及回写过程中的高压,影响FeRAM的使用寿命。In other words, the method of reading the entire row will cause the ferroelectric capacitors in the entire row of memory cells to experience high voltage during the reading process and high voltage during the write-back process, affecting the service life of FeRAM.
假设FeRAM的读写周期为50ns,对于一个256×1024规模的存储阵列,整行读取的方式若要满足存储器的10年的寿命要求,则耐久性需要大于1016个电压周期。而实际上铁电电容的耐久性周期约为1012-14个电压周期,无法满足该寿命要求。Assuming that the read and write cycle of FeRAM is 50ns, for a 256×1024-scale storage array, if the entire row reading method is to meet the 10-year life requirement of the memory, the durability needs to be greater than 10 16 voltage cycles. In fact, the durability cycle of ferroelectric capacitors is about 10 12-14 voltage cycles, which cannot meet this life requirement.
本申请实施例提供了一种存储阵列,能够避免整行读取的方式,有利于保证存储阵列的使用寿命。Embodiments of the present application provide a storage array that can avoid reading the entire row, which is beneficial to ensuring the service life of the storage array.
存储阵列包括多个存储单元、沿行方向延伸的多条字线、沿列方向延伸的多条位线和沿列方向延伸的多条板线。该多个存储单元沿行和列设置。该多个存储单元中的每个存储 单元包括第一晶体管和第一铁电电容。第一晶体管的第一端与第一铁电电容的第二端相连。The memory array includes a plurality of memory cells, a plurality of word lines extending in the row direction, a plurality of bit lines extending in the column direction, and a plurality of plate lines extending in the column direction. The plurality of memory cells are arranged along rows and columns. Each of the plurality of storage units stores The unit includes a first transistor and a first ferroelectric capacitor. The first terminal of the first transistor is connected to the second terminal of the first ferroelectric capacitor.
第一部分存储单元中的每个存储单元的第一晶体管的栅端与多条字线之一相连,第一部分存储单元包括存储阵列中处于同一行的多个存储单元。The gate terminal of the first transistor of each memory cell in the first part of the memory cells is connected to one of the plurality of word lines. The first part of the memory cells includes a plurality of memory cells in the same row in the memory array.
第二部分存储单元中的每个存储单元的第一铁电电容的第一端与多条位线之一相连,第二部分存储单元包括存储阵列中处于同一列的多个存储单元。The first end of the first ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines. The second part of the memory cells includes a plurality of memory cells in the same column in the memory array.
第二部分存储单元中的每个存储单元的第一晶体管的第二端与多条板线之一相连。The second terminal of the first transistor of each memory cell in the second portion of memory cells is connected to one of the plurality of plate lines.
需要说明的是,在本申请实施例中行方向和列方向是相对概念,仅用于限定两个互相垂直的方向。行方向也可以称为横向。列方向也可以称为纵向。也就是说,沿行方向延伸的多条信号线是互相平行的,沿列方向延伸的多条信号线是互相平行的。沿行方向延伸的信号线和沿列方向延伸的信号线是相互垂直的。存储阵列中的多个存储单元是按照行和列分布的,即该多个存储单元是按照平行于信号线的延伸方向和垂直于信号线的延伸方向分布的。It should be noted that in the embodiment of the present application, the row direction and the column direction are relative concepts and are only used to define two mutually perpendicular directions. Row direction may also be called landscape orientation. Column direction may also be called portrait orientation. That is to say, the plurality of signal lines extending in the row direction are parallel to each other, and the plurality of signal lines extending in the column direction are parallel to each other. The signal lines extending in the row direction and the signal lines extending in the column direction are perpendicular to each other. The plurality of memory cells in the memory array are distributed in rows and columns, that is, the plurality of memory cells are distributed in a direction parallel to the extension direction of the signal line and perpendicular to the extension direction of the signal line.
本申请实施例中的不同信号线指的是相互独立的信号线。Different signal lines in the embodiments of this application refer to mutually independent signal lines.
存储阵列中的各个存储单元均包括第一晶体管和第一铁电电容。一个存储单元至少与三条信号线,即字线、位线和板线,分别连接。具体地,在一个存储单元中,第一晶体管的栅端与字线相连,第一铁电电容的第一端与位线相连,第一铁电电容的第二端与第一晶体管的第一端相连,第一晶体管的第二端与板线相连。Each memory cell in the memory array includes a first transistor and a first ferroelectric capacitor. A memory cell is connected to at least three signal lines, namely word lines, bit lines and plate lines. Specifically, in a memory cell, the gate terminal of the first transistor is connected to the word line, the first terminal of the first ferroelectric capacitor is connected to the bit line, and the second terminal of the first ferroelectric capacitor is connected to the first terminal of the first transistor. terminals are connected, and the second terminal of the first transistor is connected to the board line.
字线用于控制晶体管的导通和关断。板线和位线共同作用于铁电电容以完成读写操作。位线用于传输电信号。具体描述可以参考前文,此处不再赘述。Word lines are used to control the on and off of transistors. The plate lines and bit lines work together on the ferroelectric capacitor to complete read and write operations. Bit lines are used to transmit electrical signals. For detailed description, please refer to the previous article and will not be repeated here.
应理解,第一铁电电容的“第一端”和“第二端”仅用于区分第一铁电电容的两个端,不具有其他限定作用。第一晶体管的“第一端”和“第二端”仅用于区分第一晶体管的源端和漏端,不具有其他限定作用。例如,第一晶体管的第一端为源端,第一晶体管的第二端为漏端。在该情况下,第一铁电电容的第二端与第一晶体管的源端相连,第一晶体管的漏端与板线相连。再如,第一晶体管的第一端为漏端,第一晶体管的第二端为源端。在该情况下,第一铁电电容的第二端与第一晶体管的漏端相连,第一晶体管的源端与板线相连。It should be understood that the “first end” and “second end” of the first ferroelectric capacitor are only used to distinguish the two ends of the first ferroelectric capacitor and have no other limiting effect. The “first terminal” and “second terminal” of the first transistor are only used to distinguish the source terminal and the drain terminal of the first transistor and have no other limiting role. For example, the first terminal of the first transistor is the source terminal, and the second terminal of the first transistor is the drain terminal. In this case, the second terminal of the first ferroelectric capacitor is connected to the source terminal of the first transistor, and the drain terminal of the first transistor is connected to the plate line. For another example, the first terminal of the first transistor is the drain terminal, and the second terminal of the first transistor is the source terminal. In this case, the second terminal of the first ferroelectric capacitor is connected to the drain terminal of the first transistor, and the source terminal of the first transistor is connected to the plate line.
该多条字线中的每条字线均与存储单元相连接,多条位线中的每条位线均与存储单元相连接,多条板线中的每条板线均与存储单元相连接。在一种实现方式中,各字线所连接的存储单元不同,各位线所连接的存储单元不同,各板线所连接的存储单元不同。Each of the plurality of word lines is connected to a memory cell, each of the plurality of bit lines is connected to a memory cell, and each of the plurality of plate lines is connected to a memory cell. connect. In one implementation, each word line is connected to different memory cells, each bit line is connected to different memory cells, and each plate line is connected to different memory cells.
为了便于理解和描述,本申请实施例中以第一铁电电容的第二端与第一晶体管的漏端相连,第一晶体管的源端与板线相连为例对本申请实施例的方案进行说明,不对本申请实施例的方案构成限定。In order to facilitate understanding and description, in the embodiment of the present application, the second end of the first ferroelectric capacitor is connected to the drain end of the first transistor, and the source end of the first transistor is connected to the plate line as an example to illustrate the solution of the embodiment of the present application. , does not limit the solutions of the embodiments of this application.
第一部分存储单元中的每个存储单元的第一晶体管的栅端与多条字线中的一条字线相连,指的是,第一部分存储单元中的每个存储单元的第一晶体管的栅端所连接的字线相同。The gate terminal of the first transistor of each memory cell in the first part of the memory cells is connected to one of the plurality of word lines, which refers to the gate terminal of the first transistor of each memory cell in the first part of the memory cells. The connected word lines are the same.
第二部分存储单元中的每个存储单元的第一铁电电容的第一端与多条位线中的一条位线相连,指的是,第二部分存储单元中的每个存储单元的第一铁电电容的第一端所连接的位线相同。The first end of the first ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines, which means that the first end of the first ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines. The first terminal of a ferroelectric capacitor is connected to the same bit line.
第二部分存储单元中的每个存储单元的第一晶体管的第二端与多条板线中的一条板线相连,指的是,第二部分存储单元中的每个存储单元的第一晶体管的第二端所连接的板 线相同。The second end of the first transistor of each memory cell in the second part of the memory cells is connected to one of the plurality of plate lines, which means that the first transistor of each memory cell in the second part of the memory cells The second end of the board is connected to The lines are the same.
第一部分存储单元可以包括处于同一行的全部或部分存储单元。第二部分存储单元可以包括处于同一列的全部或部分存储单元。The first portion of memory cells may include all or part of the memory cells in the same row. The second portion of memory cells may include all or part of the memory cells in the same column.
示例性地,第一部分存储单元可以包括第i行存储单元,第二部分存储单元可以包括第j列存储单元。For example, the first part of the storage units may include the i-th row of storage units, and the second part of the storage units may include the j-th column of storage units.
在该情况下,存储阵列中的第i行存储单元中每个存储单元的第一晶体管的栅端与多条字线中的第i条字线连接,i为正整数;存储阵列中的第j列存储单元中每个存储单元的第一铁电电容的第一端与多条位线中的第j条位线连接,j为正整数;第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的一条板线连接,第一晶体管的第一端为源端,第一晶体管的第二端为漏端,或者,第一晶体管的第一端为漏端,第一晶体管的第二端为源端。In this case, the gate end of the first transistor of each memory cell in the i-th row of memory cells in the memory array is connected to the i-th word line among the plurality of word lines, where i is a positive integer; The first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit is connected to the j-th bit line among the plurality of bit lines, j is a positive integer; the first ferroelectric capacitor of each memory unit in the j-th column memory unit is connected to The second end of a transistor is connected to one of the plurality of plate lines, the first end of the first transistor is the source end, the second end of the first transistor is the drain end, or the first end of the first transistor is The drain terminal and the second terminal of the first transistor are the source terminal.
第i行存储单元可以为存储阵列中的任一行存储单元。第j列存储单元可以为存储阵列中的任一列存储单元。第i字线可以为多条字线中的任一条字线,第j位线可以为多条位线中的任一条位线。The i-th row of storage cells can be any row of storage cells in the storage array. The jth column storage unit can be any column storage unit in the storage array. The i-th word line can be any word line among the plurality of word lines, and the j-th bit line can be any bit line among the plurality of bit lines.
第i行存储单元中的每个存储单元的第一晶体管与第i条字线连接,也可以理解为,存储阵列中处于同一行的所有存储单元的第一晶体管的栅端所连接的字线可以是相同的,处于不同行的存储单元中的第一晶体管的栅端所连接的字线是不同的。第j列存储单元中每个存储单元的第一铁电电容的第一端与多条位线中的第j条位线连接,也可以理解为,处于同一列的所有存储单元的第一铁电电容所连接的位线可以是相同的,处于不同列的存储单元的第一铁电电容所连接的位线是不同的。第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的一条板线连接,可以理解为,处于同一列的所有存储单元的第一晶体管所连接的板线可以是相同的。需要说明的是,第i字线中的i取不同值时,代表不同的字线,即第i字线中的不同取值的i仅用于限定不同的字线,而对字线的排列顺序不构成限定。第j位线中的j取不同值时,代表不同的位线,即第j字线中的不同取值的j仅用于限定不同的位线,而对位线的排列顺序不构成限定。The first transistor of each memory cell in the i-th row of memory cells is connected to the i-th word line, which can also be understood as the word line to which the gate terminals of the first transistors of all memory cells in the same row in the memory array are connected. They may be the same, and the word lines connected to the gate terminals of the first transistors in memory cells in different rows are different. The first end of the first ferroelectric capacitor of each memory cell in the j-th column is connected to the j-th bit line among the plurality of bit lines, which can also be understood as the first ferroelectric capacitor of all memory cells in the same column. The bit lines connected to the electric capacitors may be the same, and the bit lines connected to the first ferroelectric capacitors of memory cells in different columns are different. The second end of the first transistor of each memory cell in the j-th column is connected to one of the plurality of plate lines, which can be understood as the plate line to which the first transistors of all memory cells in the same column are connected. can be the same. It should be noted that when the i in the i-th word line takes different values, it represents different word lines. That is, the i in the i-th word line with different values is only used to define different word lines and does not determine the arrangement of the word lines. The order does not constitute a limitation. When j in the j-th bit line takes different values, it represents different bit lines. That is, different values of j in the j-th word line are only used to define different bit lines, but do not limit the arrangement order of the bit lines.
在一种可能的实现方式中,第一部分存储单元中的各存储单元中的第一晶体管所连接的板线均不相同。In a possible implementation, the first transistors in each memory unit in the first part of the memory units are connected to different board lines.
换言之,共享同一条字线的存储单元中的第一晶体管分别与不同板线连接。In other words, the first transistors in the memory cells sharing the same word line are respectively connected to different plate lines.
存储阵列中的多个存储单元按照I行和J列设置。该多个存储单元即为I*J个存储单元。存储阵列可以包括K条板线。I为大于1的整数,J为大于1的整数,K为大于1的整数。Multiple storage units in the storage array are arranged in rows I and columns J. The plurality of storage units are I*J storage units. The storage array may include K strip lines. I is an integer greater than 1, J is an integer greater than 1, and K is an integer greater than 1.
可选地,第j列存储单元中每个存储单元的第一晶体管的第二端与K条板线中的第j条板线连接。Optionally, the second end of the first transistor of each memory cell in the j-th column memory cell is connected to the j-th plate line among the K plate lines.
例如,J等于K,在该情况下,存储阵列中的J列存储单元中每个存储单元的第一晶体管与J列存储单元对应的板线相连。即J列存储单元与J条板线一一对应。For example, J is equal to K. In this case, the first transistor of each memory unit in the J column memory unit in the memory array is connected to the plate line corresponding to the J column memory unit. That is, there is a one-to-one correspondence between J columns of storage cells and J plate lines.
以一个存储单元包括一个晶体管和一个铁电电容(即第一晶体管和第一铁电电容)为例。一个存储单元与一条字线、一条位线和一条板线分别相连。每行存储单元与该行存储单元对应的字线相连,每列存储单元与该列存储单元对应的位线相连,每列存储单元与该列存储单元对应的板线相连。不同行的存储单元所对应的字线不同。不同列的存储单元所 对应的位线不同。不同列的存储单元所对应的板线不同。As an example, a memory unit includes a transistor and a ferroelectric capacitor (ie, a first transistor and a first ferroelectric capacitor). A memory cell is connected to a word line, a bit line and a plate line respectively. Each row of memory cells is connected to the word line corresponding to the row of memory cells, each column of memory cells is connected to the corresponding bit line of the column of memory cells, and each column of memory cells is connected to the corresponding plate line of the column of memory cells. Memory cells in different rows correspond to different word lines. storage units in different columns The corresponding bit lines are different. Memory cells in different columns correspond to different board lines.
也就是说,不同行的存储单元所连接的字线不同,不同列的存储单元所连接的板线不同,不同列的存储单元所连接的位线不同。在该情况下,各列板线与各列位线一一对应。That is to say, memory cells in different rows are connected to different word lines, memory cells in different columns are connected to different plate lines, and memory cells in different columns are connected to different bit lines. In this case, each column plate line corresponds to each column bit line on a one-to-one basis.
图5示出了本申请实施例提供的一种存储阵列500的示意性结构图。如图5所示,存储阵列500包括4×4的16个存储单元、4条字线、4条位线和4条板线。4条字线分别为WL0、WL1、WL2和WL3。4条位线分别为BL0、BL1、BL2和BL3。4条板线分别为PL0、PL1、PL2和PL3。字线为横向走线,位线为纵向走线,板线为纵向走线。在图5所示的存储阵列中,一个存储单元包括一个晶体管(即第一晶体管)和一个铁电电容(即第一铁电电容)。FIG. 5 shows a schematic structural diagram of a storage array 500 provided by an embodiment of the present application. As shown in FIG. 5 , the memory array 500 includes 16 4×4 memory cells, 4 word lines, 4 bit lines, and 4 plate lines. The four word lines are WL0, WL1, WL2 and WL3 respectively. The four bit lines are BL0, BL1, BL2 and BL3 respectively. The four plate lines are PL0, PL1, PL2 and PL3 respectively. The word line is a horizontal trace, the bit line is a vertical trace, and the board line is a vertical trace. In the memory array shown in FIG. 5, a memory cell includes a transistor (ie, a first transistor) and a ferroelectric capacitor (ie, a first ferroelectric capacitor).
在图5所示的存储阵列中,同一行存储单元中的晶体管的栅端所连接的字线为同一条字线,即同一行存储单元与同一条字线相连。同一列存储单元中的晶体管的源端所连接的板线为同一条板线,即同一列存储单元与同一条板线相连。同一列存储单元中的铁电电容所连接的位线为同一条位线,即同一列存储单元与同一条位线相连。不同列的存储单元所连接的板线不同,不同列的存储单元所连接的位线不同,不同行的存储单元所连接的字线不同。In the memory array shown in FIG. 5 , the word lines connected to the gate terminals of the transistors in the same row of memory cells are the same word line, that is, the memory cells in the same row are connected to the same word line. The source ends of the transistors in the same column of memory cells are connected to the same plate line, that is, the memory cells of the same column are connected to the same plate line. The ferroelectric capacitors in the same column of memory cells are connected to the same bit line, that is, the memory cells of the same column are connected to the same bit line. Memory cells in different columns are connected to different plate lines, memory cells in different columns are connected to different bit lines, and memory cells in different rows are connected to different word lines.
应理解,图5所示的存储阵列仅是本申请实施例提供的一种存储阵列的示意图,图中所示器件的数量不对本申请实施例的方案构成限定,例如,在图5中的存储阵列包括4×4的16个存储单元,在实际应用中,存储阵列可以包括其他规模的存储单元,字线、位线和板线的数量可以根据存储单元的规模进行调整,本申请实施例对此不做限定。It should be understood that the memory array shown in Figure 5 is only a schematic diagram of a memory array provided by the embodiment of the present application. The number of devices shown in the figure does not limit the solution of the embodiment of the present application. For example, the memory array in Figure 5 The array includes 16 4×4 memory cells. In practical applications, the memory array can include memory cells of other sizes. The number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited.
在另一种可能的实现方式中,第一部分存储单元中的部分存储单元的第一晶体管所连接的板线相同。In another possible implementation, the first transistors of some of the first memory cells are connected to the same board lines.
也就是说,共享同一条字线的多个存储单元中的部分存储单元共享同一条板线。或者说,共享同一条字线的多个存储单元中至少存在部分存储单元所连接的板线不同。该结构也可以称为分段共用PL的结构。That is to say, some of the memory cells among the multiple memory cells sharing the same word line share the same plate line. In other words, among multiple memory cells sharing the same word line, at least some of the memory cells are connected to different board lines. This structure may also be called a structure in which the PL is shared by segments.
可选地,J大于K。在该情况下,存储阵列中的多列存储单元共享该K条板线中的一条板线。Optionally, J is greater than K. In this case, multiple columns of memory cells in the memory array share one of the K plate lines.
或者说,该多列存储单元中的第一晶体管所连接的板线相同。In other words, the first transistors in the multiple columns of memory cells are connected to the same board lines.
以一个存储单元包括一个晶体管和一个铁电电容(即第一晶体管和第一铁电电容)为例。每行存储单元与该行存储单元对应的字线相连,每列存储单元与该列存储单元对应的位线相连,每列存储单元与该列存储单元对应的板线相连。不同行的存储单元所对应的字线不同。不同列的存储单元所对应的位线不同。不同列的存储单元所对应的板线可以是相同的。As an example, a memory unit includes a transistor and a ferroelectric capacitor (ie, a first transistor and a first ferroelectric capacitor). Each row of memory cells is connected to the word line corresponding to the row of memory cells, each column of memory cells is connected to the corresponding bit line of the column of memory cells, and each column of memory cells is connected to the corresponding plate line of the column of memory cells. Memory cells in different rows correspond to different word lines. Memory cells in different columns correspond to different bit lines. The board lines corresponding to the memory cells in different columns may be the same.
也就是说,不同行的存储单元所连接的字线不同,不同列的存储单元所连接的位线不同,不同列的存储单元所连接的板线可以是相同的。在该情况下,可以理解为多列位线对应一列板线。That is to say, the memory cells in different rows are connected to different word lines, the memory cells in different columns are connected to different bit lines, and the memory cells in different columns are connected to the same plate lines. In this case, it can be understood that multiple columns of bit lines correspond to one column of plate lines.
这样,能够减少板线的数量,有利于提高有效存储面积。In this way, the number of board lines can be reduced and the effective storage area can be increased.
可选地,存储阵列中的第k列存储单元中每个存储单元的第一晶体管的第二端与第j列存储单元中每个存储单元的第一晶体管的第二端共享多条板线中的一条板线,k为正整数,j不等于k。 Optionally, the second end of the first transistor of each memory cell in the kth column of memory cells in the memory array shares a plurality of plate lines with the second end of the first transistor of each memory cell in the jth column of memory cells. For a plate line in , k is a positive integer, and j is not equal to k.
也就是说,第k列存储单元中的第一晶体管和第j列存储单元中的第一晶体管所连接的板线相同。That is to say, the first transistor in the k-th column memory cell and the first transistor in the j-th column memory cell are connected to the same plate line.
示例性地,J等于2tK,t为正整数,每2t列存储单元的第一晶体管共享一条板线。例如,t为1,即每两列存储单元的第一晶体管共享一条板线。每两列存储单元的第一铁电电容所连接的位线可以为两条位线。在该情况下,一条板线对应两条位线。再如,t为2,即每4列存储单元的第一晶体管共享一条板线。每4列存储单元的第一铁电电容所连接的位线可以为4条位线。在该情况下,一条板线对应4条位线。应理解,以上仅为示例,不对本申请实施例的方案构成限定。For example, J is equal to 2 t K, t is a positive integer, and the first transistors of every 2 t columns of memory cells share one plate line. For example, t is 1, that is, the first transistors of every two columns of memory cells share one plate line. The bit lines connected to the first ferroelectric capacitors of every two columns of memory cells may be two bit lines. In this case, one board line corresponds to two bit lines. For another example, t is 2, that is, the first transistors of every four columns of memory cells share one plate line. The bit lines connected to the first ferroelectric capacitors of every four columns of memory cells may be four bit lines. In this case, one board line corresponds to 4 bit lines. It should be understood that the above are only examples and do not limit the solutions of the embodiments of the present application.
可选地,第一部分存储单元中的部分存储单元的第一晶体管的栅端与多条板线中的一条板线相连,该部分存储单元以该板线为轴线呈对称分布。Optionally, the gate end of the first transistor of some of the first partial memory cells is connected to one of the plurality of plate lines, and the partial memory cells are symmetrically distributed with the plate line as the axis.
示例性地,存储阵列中的多列存储单元中的第一晶体管与一条板线相连。该多列存储单元可以以该板线为轴线呈对称分布。即共享一条板线的多列存储单元可以以该板线为轴线呈对称分布。Exemplarily, a first transistor in a plurality of columns of memory cells in a memory array is connected to a plate line. The multi-column memory cells may be symmetrically distributed with the plate line as an axis. That is, multiple columns of memory cells sharing a board line can be symmetrically distributed with the board line as the axis.
例如,J等于2tK,t为正整数,每2t列存储单元以共享一条板线为轴线呈对称分布。For example, J is equal to 2 t K, t is a positive integer, and every 2 t columns of memory cells are symmetrically distributed with a shared plate line as the axis.
以t等于1为例,每两列存储单元以共享的一条板线为轴线呈对称分布。Taking t equal to 1 as an example, each two columns of memory cells are symmetrically distributed with a shared board line as the axis.
例如,第j列存储单元和第k列存储单元以共享的板线为轴线呈对称分布。For example, the memory cells in the jth column and the memory cells in the kth column are symmetrically distributed with the shared board line as the axis.
这样,能够减少存储单元中存储单元与板线之间的走线所需要的面积,能够进一步提高有效存储面积。In this way, the area required for wiring between the memory unit and the board line in the memory unit can be reduced, and the effective storage area can be further increased.
如图6所示,存储阵列600包括4×4的16个存储单元、4条字线、4条位线和2条板线。4条字线分别为WL0、WL1、WL2和WL3。4条位线分别为BL0、BL1、BL2和BL3。2条板线分别为PL0和PL1。字线为横向走线,位线为纵向走线,板线为纵向走线。同一行存储单元与同一条字线相连,同一列存储单元与同一条位线相连,每两列存储单元与同一条板线相连。每两列存储单元所连接的板线相同,不同列的存储单元所连接的位线不同,不同行的存储单元所连接的字线不同。具体地,在图6中,第一行至第四行存储单元分别与WL0、WL1、WL2和WL3相连,第一列至第四列存储单元分别与BL0、BL1、BL2和BL3相连,第一列和第二列存储单元与板线PL0相连,第三列存储单元和第四列存储单元与板线PL1相连。即BL0和BL1对应PL0,BL2和BL3对应PL1。第一列存储单元和第二列存储单元以PL0为轴线呈对称分布,第三列存储单元和第四列存储单元以PL1为轴线呈对称分布。As shown in FIG. 6 , the memory array 600 includes 16 4×4 memory cells, 4 word lines, 4 bit lines, and 2 plate lines. The four word lines are WL0, WL1, WL2 and WL3 respectively. The four bit lines are BL0, BL1, BL2 and BL3 respectively. The two plate lines are PL0 and PL1 respectively. The word line is a horizontal trace, the bit line is a vertical trace, and the board line is a vertical trace. The memory cells in the same row are connected to the same word line, the memory cells in the same column are connected to the same bit line, and every two columns of memory cells are connected to the same plate line. The memory cells in every two columns are connected to the same plate lines, the memory cells in different columns are connected to different bit lines, and the memory cells in different rows are connected to different word lines. Specifically, in Figure 6, the memory cells in the first to fourth rows are connected to WL0, WL1, WL2, and WL3 respectively, and the memory cells in the first to fourth columns are connected to BL0, BL1, BL2, and BL3 respectively. The memory cells in the column and the second column are connected to the plate line PL0, and the memory cells in the third column and the memory cells in the fourth column are connected to the plate line PL1. That is, BL0 and BL1 correspond to PL0, and BL2 and BL3 correspond to PL1. The memory cells in the first column and the memory cells in the second column are symmetrically distributed with PL0 as the axis, and the memory cells in the third column and the memory cells in the fourth column are symmetrically distributed with PL1 as the axis.
图5和图6的区别主要在于,图6中每两列存储单元共享一条板线,图5中各列存储单元分别连接不同的板线,图6的其他描述可以参考图5的相关描述,为了避免重复,此处不再赘述。The main difference between Figure 5 and Figure 6 is that in Figure 6, every two columns of memory cells share a board line, while in Figure 5, each column of memory cells is connected to a different board line. For other descriptions of Figure 6, please refer to the relevant description of Figure 5. To avoid duplication, they will not be described again here.
应理解,图6所示的存储阵列仅是本申请实施例提供的一种存储阵列的示意图,图中所示器件的数量不对本申请实施例的方案构成限定,例如,在图6中的存储阵列包括4×4的16个存储单元,在实际应用中,存储阵列可以包括其他规模的存储单元,字线、位线和板线的数量可以根据存储单元的规模进行调整,本申请实施例对此不做限定。It should be understood that the memory array shown in Figure 6 is only a schematic diagram of a memory array provided by the embodiment of the present application. The number of devices shown in the figure does not limit the solution of the embodiment of the present application. For example, the memory array in Figure 6 The array includes 16 4×4 memory cells. In practical applications, the memory array can include memory cells of other sizes. The number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited.
如图7所示,存储阵列700包括4×4N的16N个存储单元、4条字线、4N条位线和2条板线。N为大于1的整数。4条字线分别为WL0、WL1、WL2和WL3。4N条位线分别为BL0至BL4N-1。2条板线分别为PL0和PL1。字线为横向走线,位线为纵向走线, 板线为纵向走线。N为正整数。As shown in FIG. 7 , the memory array 700 includes 4×4N 16N memory cells, 4 word lines, 4N bit lines, and 2 plate lines. N is an integer greater than 1. The 4 word lines are WL0, WL1, WL2 and WL3 respectively. The 4N bit lines are BL0 to BL4N-1 respectively. The 2 plate lines are PL0 and PL1 respectively. The word lines are routed horizontally, and the bit lines are routed vertically. The board lines are routed vertically. N is a positive integer.
在图7所示的存储阵列700中,同一行存储单元与同一条字线相连,同一列存储单元与同一条位线相连,每2N条位线对应1条板线,或者说,每2N列存储单元共享1条板线。共享板线的2N列存储单元呈对称分布。具体地,第1列至第2N列存储单元共享板线PL0,该2N列存储单元以板线PL0为轴线呈轴对称分布。第2N+1列至第4N列存储单元共享板线PL1,该2N列存储单元以板线PL1为轴线呈轴对称分布。In the memory array 700 shown in Figure 7, memory cells in the same row are connected to the same word line, memory cells in the same column are connected to the same bit line, and every 2N bit lines correspond to one plate line, or in other words, every 2N columns Storage units share 1 board line. The 2N columns of memory cells sharing board lines are symmetrically distributed. Specifically, the memory cells in the 1st to 2N columns share the plate line PL0, and the memory cells in the 2N column are axially symmetrically distributed with the plate line PL0 as the axis. The memory cells in the 2N+1th column to the 4Nth column share the plate line PL1, and the memory cells in the 2N column are axially symmetrically distributed with the plate line PL1 as the axis.
应理解,图7所示的存储阵列仅是本申请实施例提供的一种存储阵列的示意图,图中所示器件的数量不对本申请实施例的方案构成限定,例如,在图7中的存储阵列包括4×4N的16N个存储单元,在实际应用中,存储阵列可以包括其他规模的存储单元,字线、位线和板线的数量可以根据存储单元的规模进行调整,本申请实施例对此不做限定。It should be understood that the memory array shown in Figure 7 is only a schematic diagram of a memory array provided by the embodiment of the present application. The number of devices shown in the figure does not limit the solution of the embodiment of the present application. For example, the memory array in Figure 7 The array includes 16N memory cells of 4×4N. In practical applications, the memory array can include memory cells of other sizes. The number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited.
本申请实施例中的存储单元的写入过程与常规存储单元的写入过程类似。示例性地,在本申请实施例的存储阵列中的存储单元包括一个晶体管和一个铁电电容的情况下,信息写入过程与1T1C结构的存储单元的信息写入过程类似。为了便于理解和描述,下面以存储单元包括一个晶体管和一个铁电电容为例,对信息的写入过程进行示例性说明。The writing process of the memory unit in the embodiment of the present application is similar to the writing process of the conventional memory unit. For example, in the case where the memory unit in the memory array of the embodiment of the present application includes a transistor and a ferroelectric capacitor, the information writing process is similar to the information writing process of the memory unit with a 1T1C structure. For ease of understanding and description, the information writing process is illustrated below by taking the memory unit including a transistor and a ferroelectric capacitor as an example.
在需要对第一待写入单元写入信息“1”时,第一待写入单元所连接的字线接高电位,即第一待写入单元中的晶体管的栅端接高电位,第一待写入单元中的晶体管导通。第一待写入单元所连接的位线接高电位,第一待写入单元所连接的板线接低电位,第一待写入单元中的铁电电容正向极化,信息“1”被写入第一待写入单元中。与第一待写入单元共享字线的其他存储单元所连接的位线可以接低电位,其他存储单元所连接的板线可以接低电位。When it is necessary to write information "1" to the first unit to be written, the word line connected to the first unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the first unit to be written is connected to a high potential. A transistor in the cell to be written is turned on. The bit line connected to the first unit to be written is connected to a high potential, the plate line connected to the first unit to be written is connected to a low potential, the ferroelectric capacitor in the first unit to be written is forward polarized, and the information is "1" is written into the first unit to be written. The bit lines connected to other memory cells sharing the word line with the first unit to be written can be connected to a low potential, and the plate lines connected to other memory cells can be connected to a low potential.
在本申请实施例中,字线所接的高电位可以理解为使得晶体管导通的电位。字线所接的低电位可以理解为使得晶体管关断的电位。在一种可能的实现方式中,位线和板线所接的高电位和低电位是相对概念,例如,位线上的电位高于板线上的电位,即可认为位线接高电位,板线接低电位。在另一种可能的实现方式中,各信号线上所接的高电位和低电位可以为设定值。例如,位线和板线所接的高电位可以为电源电压VDD,位线或板线所接的低电位可以为0V。In the embodiment of the present application, the high potential connected to the word line can be understood as the potential that causes the transistor to turn on. The low potential connected to the word line can be understood as the potential that turns off the transistor. In one possible implementation, the high potential and low potential connected to the bit line and the plate line are relative concepts. For example, if the potential on the bit line is higher than the potential on the plate line, it can be considered that the bit line is connected to a high potential. The board wire is connected to low potential. In another possible implementation, the high potential and low potential connected to each signal line can be set values. For example, the high potential connected to the bit line and the plate line can be the power supply voltage VDD, and the low potential connected to the bit line or the plate line can be 0V.
需要说明的是,本申请实施例中的第一待写入单元可以包括一个存储单元,也可以包括多个存储单元,本申请实施例对此不做限定。“第一待写入单元”中的“第一”仅用于限定该待写入单元当前需要被写入信息“1”,不具有其他限定作用。换言之,当前需要被写入信息“1”的存储单元即可称为“第一待写入单元”。It should be noted that the first unit to be written in the embodiment of the present application may include one storage unit or may include multiple storage units, which is not limited in the embodiment of the present application. The "first" in "the first unit to be written" is only used to limit that the unit to be written currently needs to be written with information "1", and has no other limiting effect. In other words, the storage unit that currently needs to be written with information “1” can be called the “first unit to be written”.
在需要对第二待写入单元写入信息“0”时,第二待写入单元所连接的字线接高电位,即第二待写入单元中的晶体管的栅端接高电位,第二待写入单元中的晶体管导通。第二待写入单元所连接的位线接低电位,第二待写入单元所连接的板线接高电位,第二待写入单元中的铁电电容反向极化,信息“0”被写入第二待写入单元中。此外,在第二待写入单元所连接的字线接高电位的情况下,与第二待写入单元共享同一字线的其他存储单元中的晶体管导通,其他存储单元的铁电电容承受各自对应的位线和板线上的电位。若第二待写入单元与共享同一字线的其他存储单元中的部分存储单元共享同一板线,共享同一板线的存储单元所连接的位线接高电位。这样可以避免已经存储信息“1”的存储单元的信息被改写为信息“0”。与第二待写入单元共享同一字线,且不共享同一板线的存储单元,所连接的位线可以接低电位,所连接的板线可以接低电位。 When it is necessary to write information "0" to the second unit to be written, the word line connected to the second unit to be written is connected to a high potential, that is, the gate terminal of the transistor in the second unit to be written is connected to a high potential. The transistor in the second unit to be written is turned on. The bit line connected to the second unit to be written is connected to a low potential, the plate line connected to the second unit to be written is connected to a high potential, the ferroelectric capacitor in the second unit to be written is reverse polarized, and the information is "0" is written into the second unit to be written. In addition, when the word line connected to the second cell to be written is connected to a high potential, the transistors in other memory cells sharing the same word line with the second cell to be written are turned on, and the ferroelectric capacitances of other memory cells bear the The potentials on the corresponding bit lines and plate lines. If the second cell to be written shares the same plate line with some of the other memory cells sharing the same word line, the bit lines connected to the memory cells sharing the same plate line are connected to a high potential. This can prevent the information of the storage unit that has stored information "1" from being overwritten with information "0". For memory cells that share the same word line and do not share the same plate line as the second cell to be written, the connected bit line can be connected to a low potential, and the connected plate line can be connected to a low potential.
需要说明的是,本申请实施例中的第二待写入单元可以包括一个存储单元,也可以包括多个存储单元,本申请实施例对此不做限定。“第二待写入单元”中的“第二”仅用于限定该待写入单元当前需要被写入信息“0”,不具有其他限定作用。换言之,当前需要被写入信息“0”的存储单元即可称为“第二待写入单元”。第二待写入单元与第一待写入单元可以相同,也可以不同。It should be noted that the second unit to be written in the embodiment of the present application may include one storage unit or may include multiple storage units, which is not limited in the embodiment of the present application. The "second" in the "second unit to be written" is only used to limit that the unit to be written currently needs to be written with information "0", and has no other limiting effect. In other words, the memory unit that currently needs to be written with information "0" can be called the "second unit to be written." The second unit to be written and the first unit to be written may be the same or different.
在本申请实施例中,将信息写入存储单元,即为将信息写入存储单元的铁电电容中。存储单元存储的信息即为存储单元的铁电电容中存储的信息。In the embodiment of the present application, writing information into a storage unit means writing information into the ferroelectric capacitor of the storage unit. The information stored in the memory unit is the information stored in the ferroelectric capacitor of the memory unit.
图8示出了一种写入操作的示意图。下面结合图8对本申请实施例中的存储阵列的写入操作进行说明。Figure 8 shows a schematic diagram of a write operation. The writing operation of the storage array in the embodiment of the present application will be described below with reference to FIG. 8 .
例如,如图8的(a)所示,需要对第二行第一个存储单元和第二个存储单元写入信息“1”。第二行第一个存储单元和第二个存储单元即为第一待写入单元。将第二行存储单元所连接的字线WL1连接VDD,第二行存储单元中的晶体管导通。第2行第1个存储单元所连接的位线BL0连接VDD,第二行第二个存储单元所连接的位线BL1接VDD。第二行第一个存储单元和第二个存储单元共享同一条板线PL0,PL0接0V。这两个存储单元中的铁电电容正向极化。信息“1”被写入第二行第一个存储单元和第二个存储单元中。第二行除了第一个存储单元和第二个存储单元以外的其他存储单元,所连接的位线,即BL2和BL3,接0V,所连接的板线即PL1,接0V。再如,如图8的(b)所示,对第二行第二个存储单元写入信息“0”。将第二行存储单元所连接的字线WL1连接VDD,第二行存储单元中的晶体管导通。第二行第二个存储单元所连接的位线BL1接0V。第二行第二个存储单元所连接的板线PL0接VDD,该存储单元中的铁电电容反向极化,信息“0”被写入第二行第二个存储单元中。第二行第一个存储单元和第二行第二个存储单元共享板线PL0。为了避免第二行第一个存储单元中存储的信息“1”被改写,第二行第一个存储单元所连接的位线BL0接VDD。第二行除了第一个存储单元和第二个存储单元以外的其他存储单元,所连接的位线,即BL2和BL3,接0V,所连接的板线即PL1,接0V。For example, as shown in (a) of FIG. 8 , information "1" needs to be written to the first memory unit and the second memory unit of the second row. The first storage unit and the second storage unit in the second row are the first units to be written. Connect the word line WL1 connected to the memory cells in the second row to VDD, and the transistors in the memory cells in the second row are turned on. The bit line BL0 connected to the first memory cell in the second row is connected to VDD, and the bit line BL1 connected to the second memory cell in the second row is connected to VDD. The first memory unit and the second memory unit in the second row share the same board line PL0, and PL0 is connected to 0V. The ferroelectric capacitors in these two memory cells are forward polarized. Information "1" is written into the first memory cell and the second memory cell in the second row. For the memory cells in the second row except the first memory cell and the second memory cell, the connected bit lines, namely BL2 and BL3, are connected to 0V, and the connected plate line, namely PL1, is connected to 0V. For another example, as shown in (b) of FIG. 8 , information "0" is written to the second memory cell in the second row. Connect the word line WL1 connected to the memory cells in the second row to VDD, and the transistors in the memory cells in the second row are turned on. The bit line BL1 connected to the second memory cell in the second row is connected to 0V. The plate line PL0 connected to the second memory cell in the second row is connected to VDD. The ferroelectric capacitor in this memory cell is reversely polarized, and information "0" is written into the second memory cell in the second row. The first memory cell in the second row and the second memory cell in the second row share plate line PL0. In order to prevent the information "1" stored in the first memory cell of the second row from being overwritten, the bit line BL0 connected to the first memory cell of the second row is connected to VDD. For the memory cells in the second row except the first memory cell and the second memory cell, the connected bit lines, namely BL2 and BL3, are connected to 0V, and the connected plate line, namely PL1, is connected to 0V.
应理解,图8的写入操作仅以图6所示的存储阵列为例进行说明,不对本申请实施例的方案构成限定。It should be understood that the write operation in FIG. 8 is only explained by taking the storage array shown in FIG. 6 as an example, and does not limit the solution of the embodiment of the present application.
存储阵列还包括至少一个灵敏放大器。该至少一个灵敏放大器用于在读取信息的过程中确定待读取单元中存储的信息。The storage array also includes at least one sense amplifier. The at least one sense amplifier is used to determine the information stored in the unit to be read during the process of reading information.
具体地,SA用于读取待读取单元所连接的位线上的电信号,并根据该电信号确定待读取单元中存储的信息。Specifically, SA is used to read the electrical signal on the bit line connected to the unit to be read, and determine the information stored in the unit to be read based on the electrical signal.
例如,该电信号可以为电压信号。For example, the electrical signal may be a voltage signal.
待读取单元可以包括一个存储单元,也可以包括多个存储单元,本申请实施例对此不做限定。The unit to be read may include one storage unit or multiple storage units, which is not limited in this embodiment of the present application.
可选地,多个灵敏放大器与该多条位线一一对应,该多个灵敏放大器分别与对应的位线相连。在该情况下,灵敏放大器的数量与位线的数量相同。Optionally, a plurality of sense amplifiers correspond to the plurality of bit lines one-to-one, and the plurality of sense amplifiers are respectively connected to the corresponding bit lines. In this case, the number of sense amplifiers is the same as the number of bit lines.
在实际的电路设计中,SA的宽度大于存储单元的宽度。每条BL分别对应一个SA的方式会影响存储阵列中的有效存储面积。在本申请实施例中,多条BL可以对应一个SA。In actual circuit design, the width of SA is larger than the width of the memory cell. The way each BL corresponds to an SA will affect the effective storage area in the storage array. In this embodiment of the present application, multiple BLs may correspond to one SA.
可选地,存储阵列还包括至少一个灵敏放大器,该多条位线通过多路选择器与该至少一个灵敏放大器相连接。 Optionally, the storage array further includes at least one sense amplifier, and the plurality of bit lines are connected to the at least one sense amplifier through a multiplexer.
具体地,该至少一个灵敏放大器分别连接至至少一个多路选择器的输出端,该多条位线分别连接至该至少一个多路选择器的输入端。至少一个灵敏放大器的数量大于或等于至少一条板线所连接的存储单元的列数。在读取过程中,由该至少一个多路选择器控制该至少一个灵敏放大器与该多条位线之间的连接关系。Specifically, the at least one sense amplifier is respectively connected to the output terminal of at least one multiplexer, and the plurality of bit lines are respectively connected to the input terminal of the at least one multiplexer. The number of at least one sense amplifier is greater than or equal to the number of columns of memory cells connected to at least one board line. During the reading process, the at least one multiplexer controls the connection relationship between the at least one sense amplifier and the plurality of bit lines.
多路选择器(multiplexer,MUX)可以称为数据选择器。A multiplexer (MUX) can be called a data selector.
示例性地,SA的数量可以等于读取过程中待读取单元所在的列的数量。待读取单元可以包括被施加高电位脉冲的板线所连接的存储单元与接高电位的字线所连接的存储单元的交集。For example, the number of SAs may be equal to the number of columns in which the units to be read are located during the reading process. The cells to be read may include the intersection of memory cells connected to plate lines to which high potential pulses are applied and memory cells connected to word lines to which high potential is applied.
这样,多列位线对应一个SA,减少了SA的数量,能够提高有效存储面积,即提高存储单元密度。In this way, multiple column bit lines correspond to one SA, which reduces the number of SAs and can increase the effective storage area, that is, increase the density of memory cells.
本申请实施例中的存储单元的读取过程与常规存储单元的读取过程类似。示例性地,在本申请实施例的存储阵列中的存储单元包括一个晶体管和一个铁电电容的情况下,信息读取过程与1T1C结构的存储单元的信息读取过程类似。为了便于理解和描述,下面以存储单元包括一个晶体管和一个铁电电容为例,对信息的读取过程进行示例性说明。The reading process of the memory unit in the embodiment of the present application is similar to the reading process of the conventional memory unit. For example, in the case where the memory unit in the memory array of the embodiment of the present application includes a transistor and a ferroelectric capacitor, the information reading process is similar to the information reading process of the memory unit with a 1T1C structure. In order to facilitate understanding and description, the following takes the memory unit including a transistor and a ferroelectric capacitor as an example to illustrate the information reading process.
在需要从待读取单元中读取信息时,将待读取单元所连接的位线接0V进行预放电,然后将待读取单元所连接的字线接高电位,即待读取单元中的晶体管的栅端接高电位,待读取单元中的晶体管导通。在待读取单元所连接的板线上施加高电位脉冲。灵敏放大器可以根据待读取单元所连接的位线上的电压确定待读取单元中存储的信息。When it is necessary to read information from the unit to be read, the bit line connected to the unit to be read is connected to 0V for pre-discharge, and then the word line connected to the unit to be read is connected to high potential, that is, the bit line connected to the unit to be read is connected to high potential. The gate terminal of the transistor is connected to a high potential, and the transistor in the unit to be read is turned on. A high potential pulse is applied to the board line to which the unit to be read is connected. The sense amplifier can determine the information stored in the unit to be read based on the voltage on the bit line to which the unit to be read is connected.
下面以待读取单元包括一个存储单元为例进行示例性说明。如果待读取单元中存储的信息为“0”,在读取信息时,待读取单元中的铁电电容的极化方向不会发生改变,释放电荷Q0。释放的电荷Q0被分配在待读取单元的铁电电容和待读取单元所连接的位线上,位线的电压升高。此时待读取单元所连接的位线的电压为V0。如果待读取单元中存储的信息为“1”,在读取信息时,待读取单元中的铁电电容的极化方向被外电场改变,由正向极化变为反向极化,释放电荷Q1,位线上的电压升高。此时待读取单元所连接的位线的电压为V1。释放的电荷Q1中包含极化翻转电荷,Q1>Q0,相应地,V1>V0。连接位线的SA检测到位线的电压,将位线的电压与参考电位Vref进行对比,根据对比结果即可确定待读取单元存储的信息为信息“0”或是信息“1”。例如,若待读取单元所连接的位线的电压超过Vref,则待读取单元存储的信息为信息“1”;若待读取单元所连接的位线的电压没有超过Vref,则待读取单元存储的信息为信息“0”。An exemplary description is given below, taking the unit to be read as including a storage unit as an example. If the information stored in the unit to be read is "0", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read will not change and the charge Q0 will be released. The released charge Q0 is distributed between the ferroelectric capacitor of the unit to be read and the bit line connected to the unit to be read, and the voltage of the bit line increases. At this time, the voltage of the bit line connected to the unit to be read is V0. If the information stored in the unit to be read is "1", when the information is read, the polarization direction of the ferroelectric capacitor in the unit to be read is changed by the external electric field, from forward polarization to reverse polarization. Charge Q1 is released and the voltage on the bit line increases. At this time, the voltage of the bit line connected to the unit to be read is V1. The released charge Q1 contains polarization flip charge, Q1>Q0, correspondingly, V1>V0. The SA connected to the bit line detects the voltage of the bit line, and compares the voltage of the bit line with the reference potential Vref. Based on the comparison result, it can be determined whether the information stored in the unit to be read is information "0" or information "1". For example, if the voltage of the bit line connected to the unit to be read exceeds Vref, the information stored in the unit to be read is information "1"; if the voltage of the bit line connected to the unit to be read does not exceed Vref, the information stored in the unit to be read is "1". Take the information stored in the unit as information "0".
待读取单元之外的其他存储单元所连接的位线可以接低电位,待读取单元之外的其他存储单元所连接的板线可以接低电位。在读取结束后,将原信息写回至待读取单元中。与待读取单元共享板线的其他存储单元,由于晶体管未导通,铁电电容上不需要承受板线上的高压。采用本申请实施例的方案,仅待读取单元中的铁电电容需要承受读取和回写过程的高压,其他存储单元中的铁电电容均不需要经历不必要的高压。The bit lines connected to other memory cells other than the unit to be read can be connected to a low potential, and the plate lines connected to other memory cells other than the unit to be read can be connected to a low potential. After the reading is completed, the original information is written back to the unit to be read. For other memory cells that share the board line with the unit to be read, since the transistors are not turned on, the ferroelectric capacitor does not need to withstand the high voltage on the board line. Using the solution of the embodiment of the present application, only the ferroelectric capacitor in the unit to be read needs to withstand the high voltage during the reading and writing back processes, and the ferroelectric capacitors in other memory units do not need to experience unnecessary high voltage.
下面结合图9对本申请实施例中的存储阵列的读取操作进行说明。The reading operation of the memory array in the embodiment of the present application will be described below with reference to FIG. 9 .
例如,如图9的(a)图所示,4条位线可以分别与4个SA相连,图9的(a)未示出全部SA。需要从读取第二行第一个存储单元和第二个存储单元中存储信息时,第二行第一个存储单元和第二个存储单元即为待读取单元。将第二行第一个存储单元所连接的位线BL0预充至0V,将第二行第二个存储单元所连接的位线BL1预充至0V。将第二行存 储单元所连接的字线WL1连接VDD,第二行存储单元中的晶体管导通。第二行第一个存储单元和第二个存储单元共享同一条板线PL0,PL0接高电位脉冲。与BL0相连的SA将检测到的BL0上的电压V1与参考电压进行对比,确定第二行第一个存储单元中存储的信息为信息“1”。与BL1相连的SA将检测到的BL1上的电压V0与参考电压进行对比,确定第二行第二个存储单元存储的信息为信息“0”。在读取过程中,对第二行第一个存储单元和第二个存储单元进行了读取,仅第二行第一个存储单元和第二个存储单元中的铁电电容需要承受读取过程中板线上的高压。其他存储单元中的铁电电容均不需要经历不必要的高压。For example, as shown in (a) of FIG. 9 , four bit lines can be connected to four SAs respectively, but (a) of FIG. 9 does not show all SAs. When it is necessary to store information from the first storage unit and the second storage unit in the second row, the first storage unit and the second storage unit in the second row are the units to be read. The bit line BL0 connected to the first memory cell in the second row is precharged to 0V, and the bit line BL1 connected to the second memory cell in the second row is precharged to 0V. Save the second line The word line WL1 connected to the memory cell is connected to VDD, and the transistor in the second row of memory cells is turned on. The first memory unit and the second memory unit in the second row share the same plate line PL0, and PL0 is connected to a high potential pulse. SA connected to BL0 compares the detected voltage V1 on BL0 with the reference voltage, and determines that the information stored in the first memory cell of the second row is information "1". SA connected to BL1 compares the detected voltage V0 on BL1 with the reference voltage and determines that the information stored in the second memory cell of the second row is information "0". During the read process, the first and second memory cells in the second row are read, and only the ferroelectric capacitors in the first and second memory cells in the second row need to withstand the read High voltage on the plate line during the process. The ferroelectric capacitors in other memory cells do not need to experience unnecessary high voltages.
再如,如图9的(b)所示,4条位线通过多路选择器与2个SA相连。在需要读取第二行第一个存储单元和第二个存储单元中存储的信息时,通过多路选择器将BL0与其中一个SA相连,将BL1与另一个SA相连。具体读取过程与图9的(a)相同,此处不再赘述。For another example, as shown in (b) of Figure 9, four bit lines are connected to two SAs through a multiplexer. When it is necessary to read the information stored in the first storage unit and the second storage unit of the second row, connect BL0 to one of the SAs through a multiplexer, and connect BL1 to the other SA. The specific reading process is the same as (a) in Figure 9 and will not be described again here.
应理解,以上仅以一个存储单元包括一个晶体管和一个铁电电容为例进行说明,不对本申请实施例的方案构成限定。例如,一个存储单元还可以包括两个晶体管和两个铁电电容。再如,一个存储单元可以包括两个晶体管和一个铁电电容。It should be understood that the above description only takes a memory unit including a transistor and a ferroelectric capacitor as an example, and does not limit the solution of the embodiment of the present application. For example, a memory cell may also include two transistors and two ferroelectric capacitors. As another example, a memory cell may include two transistors and a ferroelectric capacitor.
下面以一个存储单元包括两个晶体管和两个铁电电容为例进行示例性说明。The following is an example of a memory cell including two transistors and two ferroelectric capacitors.
一个存储单元包括第一晶体管、第二晶体管、第一铁电电容和第二铁电电容。A memory cell includes a first transistor, a second transistor, a first ferroelectric capacitor and a second ferroelectric capacitor.
第一部分存储单元中的每个存储单元的第二晶体管的栅端与多条字线中的一条字线相连,第一部分存储单元包括存储阵列中处于同一行的多个存储单元。The gate terminal of the second transistor of each memory cell in the first part of the memory cells is connected to one of the plurality of word lines. The first part of the memory cells includes a plurality of memory cells in the same row in the memory array.
第二部分存储单元中的每个存储单元的第二铁电电容的第一端与多条位线中的一条位线相连,第二部分存储单元包括存储阵列中处于同一列的多个存储单元。The first end of the second ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of bit lines. The second part of the memory cells includes a plurality of memory cells in the same column in the memory array. .
第二部分存储单元中的每个存储单元的第二铁电电容的第二端通过第二晶体管与多条板线中的一条板线相连。The second end of the second ferroelectric capacitor of each memory cell in the second part of the memory cells is connected to one of the plurality of plate lines through the second transistor.
一个存储单元至少与四条信号线,即至少一条字线、至少一条板线和两条位线相连接。第一晶体管的栅端和第二晶体管的栅端可以与同一条字线相连,也可以与不同字线相连。第一铁电电容的第一端与一条位线相连,第二铁电电容的第一端与另一条位线相连。第一铁电电容的第二端通过第一晶体管与一条板线相连,第二铁电电容的第二端通过第二晶体管与同一条板线相连,或者也可以与不同板线相连。One memory cell is connected to at least four signal lines, namely at least one word line, at least one plate line and two bit lines. The gate terminal of the first transistor and the gate terminal of the second transistor may be connected to the same word line, or may be connected to different word lines. A first terminal of the first ferroelectric capacitor is connected to a bit line, and a first terminal of the second ferroelectric capacitor is connected to another bit line. The second end of the first ferroelectric capacitor is connected to a plate line through the first transistor, and the second end of the second ferroelectric capacitor is connected to the same plate line through the second transistor, or may be connected to different plate lines.
示例性地,存储阵列中处于同一行的所有存储单元的第一晶体管的栅端所连接的字线可以是相同的。处于同一行的所有存储单元的第二晶体管的栅端所连接的字线可以是相同的。处于同一列的所有存储单元的第一铁电电容的第一端所连接的位线可以是相同的。处于同一列的所有存储单元的第二铁电电容的第一端所连接的位线可以是相同的。处于同一列的所有存储单元的第一铁电电容通过第一晶体管所连接的板线可以是相同的。处于同一列的所有存储单元的第二铁电电容通过第一晶体管所连接的板线可以是相同的。For example, the word lines connected to the gate terminals of the first transistors of all memory cells in the same row in the memory array may be the same. The word lines connected to the gate terminals of the second transistors of all memory cells in the same row may be the same. The bit lines connected to the first ends of the first ferroelectric capacitors of all memory cells in the same column may be the same. The bit lines connected to the first ends of the second ferroelectric capacitors of all memory cells in the same column may be the same. The plate lines to which the first ferroelectric capacitors of all memory cells in the same column are connected through the first transistors may be the same. The plate lines connected by the first transistors to the second ferroelectric capacitors of all memory cells in the same column may be the same.
在一种可能的实现方式中,第一部分存储单元中的各存储单元中的第一晶体管所连接的板线不同。第一部分存储单元中的各存储单元中的第二晶体管所连接的板线不同。In a possible implementation, the first transistors in each memory unit in the first part of the memory units are connected to different board lines. The second transistors in each memory cell in the first part of the memory cells are connected to different board lines.
也就是说,共享同一条字线的第一晶体管分别与不同板线连接。共享同一字线的第二晶体管分别与不同板线连接。That is to say, the first transistors sharing the same word line are respectively connected to different plate lines. The second transistors sharing the same word line are respectively connected to different plate lines.
示例性地,存储阵列中各行存储单元所连接的字线不同。各列存储单元所连接的位线 不同。各列存储单元所连接的板线不同。For example, the word lines connected to each row of memory cells in the memory array are different. The bit lines connected to each column of memory cells different. The memory cells in each column are connected to different board lines.
具体地,存储阵列中的各列存储单元中的第一铁电电容的第二端通过各列存储单元中的第一晶体管与各列存储单元中的第一铁电电容对应的板线相连。各列存储单元中的第一铁电电容对应的板线不同。存储阵列中的各列存储单元中的第二铁电电容的第二端通过各列存储单元中的第二晶体管与各列存储单元中的第二铁电电容对应的板线相连。各列存储单元中的第二铁电电容对应的板线不同。Specifically, the second end of the first ferroelectric capacitor in each column memory unit in the memory array is connected to the plate line corresponding to the first ferroelectric capacitor in each column memory unit through the first transistor in each column memory unit. The plate lines corresponding to the first ferroelectric capacitors in each column of memory cells are different. The second end of the second ferroelectric capacitor in each column memory unit in the memory array is connected to the plate line corresponding to the second ferroelectric capacitor in each column memory unit through the second transistor in each column memory unit. The plate lines corresponding to the second ferroelectric capacitors in each column of memory cells are different.
或者说,存储阵列中的各列存储单元中的第一晶体管所连接的板线不同。存储阵列中的各列存储单元中的第二晶体管所连接的板线不同。In other words, the first transistors in each column of memory cells in the memory array are connected to different board lines. The second transistors in each column of memory cells in the memory array are connected to different board lines.
图10示出了本申请实施例提供的一种存储阵列1000的示意性结构图。如图10所示,存储阵列1000包括4×4的16个存储单元、4条字线、8条位线和4条板线。4条字线分别为WL0、WL1、WL2和WL3。8条位线分别为BL0、BL0’、BL1、BL1’、BL2、BL2’、BL3和BL3’。4条板线分别为PL0、PL1、PL2和PL3。字线为横向走线,位线为纵向走线,板线为纵向走线。在图10所示的存储阵列中,一个存储单元包括两个晶体管(即第一晶体管和第二晶体管)和两个铁电电容(即第一铁电电容和第二铁电电容)。Figure 10 shows a schematic structural diagram of a storage array 1000 provided by an embodiment of the present application. As shown in FIG. 10 , the memory array 1000 includes 16 4×4 memory cells, 4 word lines, 8 bit lines, and 4 plate lines. The four word lines are WL0, WL1, WL2 and WL3 respectively. The eight bit lines are BL0, BL0’, BL1, BL1’, BL2, BL2’, BL3 and BL3’ respectively. The four plate lines are PL0, PL1, PL2 and PL3. The word line is a horizontal trace, the bit line is a vertical trace, and the board line is a vertical trace. In the memory array shown in FIG. 10, one memory cell includes two transistors (ie, a first transistor and a second transistor) and two ferroelectric capacitors (ie, a first ferroelectric capacitor and a second ferroelectric capacitor).
在图10所示的存储阵列中,同一行存储单元中的晶体管的栅端所连接的字线为同一条字线,即同一行存储单元与同一条字线相连。同一列存储单元中的晶体管的源端所连接的板线为同一条板线,即同一列存储单元与同一条板线相连。同一列存储单元中的第一铁电电容所连接的位线为同一条位线,同一列存储单元中的第二铁电电容所连接的位线为同一条位线。不同列的存储单元所连接的板线不同,不同列的存储单元所连接的位线不同,不同行的存储单元所连接的字线不同。In the memory array shown in FIG. 10 , the word lines connected to the gate terminals of the transistors in the same row of memory cells are the same word line, that is, the memory cells in the same row are connected to the same word line. The source ends of the transistors in the same column of memory cells are connected to the same plate line, that is, the memory cells of the same column are connected to the same plate line. The bit line connected to the first ferroelectric capacitor in the same column of memory cells is the same bit line, and the bit line connected to the second ferroelectric capacitor in the same column of memory cells is the same bit line. Memory cells in different columns are connected to different plate lines, memory cells in different columns are connected to different bit lines, and memory cells in different rows are connected to different word lines.
应理解,图10所示的存储阵列仅是本申请实施例提供的一种存储阵列的示意图,图中所示器件的数量不对本申请实施例的方案构成限定,例如,在图10中的存储阵列包括4×4的存储单元,在实际应用中,存储阵列可以包括其他规模的存储单元,字线、位线和板线的数量可以根据存储单元的规模进行调整,本申请实施例对此不做限定。It should be understood that the memory array shown in Figure 10 is only a schematic diagram of a memory array provided by an embodiment of the present application. The number of devices shown in the figure does not limit the solution of the embodiment of the present application. For example, the memory array in Figure 10 The array includes 4×4 memory cells. In practical applications, the memory array can include memory cells of other sizes. The number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. This is not the case in the embodiments of the present application. Make limitations.
在另一种可能的实现方式中,第一部分存储单元中的部分存储单元的第一晶体管所连接的板线相同。第一部分存储单元中的部分存储单元的第二晶体管所连接的板线相同。In another possible implementation, the first transistors of some of the first memory cells are connected to the same board lines. The second transistors of some of the first memory cells are connected to the same board lines.
也就是说,共享同一条字线的第一晶体管中的部分第一晶体管与同一板线连接。共享同一字线的第二晶体管中的部分第二晶体管与同一板线连接。That is to say, some of the first transistors sharing the same word line are connected to the same plate line. Some of the second transistors sharing the same word line are connected to the same plate line.
示例性地,存储阵列中各行存储单元所连接的字线不同。各列存储单元所连接的位线不同。不同列存储单元所连接的板线可以相同。For example, the word lines connected to each row of memory cells in the memory array are different. The bit lines connected to each column of memory cells are different. The board lines connected to memory cells in different columns can be the same.
具体地,存储阵列中的多列存储单元中的第一铁电电容的第二端分别通过该多列存储单元中的第一晶体管与一条板线相连。存储阵列中的多列存储单元中的第二铁电电容的第二端分别通过该多列存储单元中的第二晶体管与一条板线相连。Specifically, the second ends of the first ferroelectric capacitors in the multiple columns of memory cells in the memory array are respectively connected to a plate line through the first transistors in the multiple columns of memory cells. The second ends of the second ferroelectric capacitors in the multiple columns of memory cells in the memory array are respectively connected to a plate line through the second transistors in the multiple columns of memory cells.
或者说,该多列存储单元中的第一晶体管所连接的板线相同。该多列存储单元中的第二晶体管所连接的板线相同。该多列存储单元的列数少于存储阵列中的存储单元的列数。In other words, the first transistors in the multiple columns of memory cells are connected to the same board lines. The second transistors in the multi-column memory cells are connected to the same plate lines. The number of columns of the multi-column memory cells is less than the number of columns of memory cells in the memory array.
这样,能够减少板线的数量,有利于提高有效存储面积。In this way, the number of board lines can be reduced and the effective storage area can be increased.
如图11所示,存储阵列1100包括4×4的16个存储单元、4条字线、4条位线和2条板线。4条字线分别为WL0、WL1、WL2和WL3。8条位线分别为BL0、BL0’、BL1、BL1’、BL2、BL2’、BL3和BL3’。2条板线分别为PL0和PL1。字线为横向走线,位线为 纵向走线,板线为纵向走线。同一行存储单元与同一条字线相连,同一列存储单元中的第一铁电电容与同一条位线相连,同一列存储单元中的第二铁电电容与同一条位线相连,每两列存储单元与同一条板线相连。每两列存储单元所连接的板线相同,不同列的存储单元所连接的位线不同,不同行的存储单元所连接的字线不同。具体地,在图11中,第一行至第四行存储单元分别与WL0、WL1、WL2和WL3相连。第一列至第四列存储单元中的第一铁电电容分别与BL0、BL1、BL2和BL3相连,第一列至第四列存储单元中的第二铁电电容分别与BL0’、BL1’、BL2’和BL3’相连。第一列和第二列存储单元与板线PL0相连,第三列存储单元和第四列存储单元与板线PL1相连。第一列存储单元和第二列存储单元以PL0为轴线呈对称分布,第三列存储单元和第四列存储单元以PL1为轴线呈对称分布。As shown in FIG. 11 , the memory array 1100 includes 16 4×4 memory cells, 4 word lines, 4 bit lines, and 2 plate lines. The four word lines are WL0, WL1, WL2 and WL3 respectively. The eight bit lines are BL0, BL0', BL1, BL1', BL2, BL2', BL3 and BL3' respectively. The two plate lines are PL0 and PL1 respectively. The word lines are horizontal traces and the bit lines are Longitudinal wiring, board wiring is vertical wiring. The memory cells in the same row are connected to the same word line, the first ferroelectric capacitor in the memory cells in the same column is connected to the same bit line, the second ferroelectric capacitor in the memory cells in the same column is connected to the same bit line, every two columns The storage units are connected to the same board line. The memory cells in every two columns are connected to the same plate lines, the memory cells in different columns are connected to different bit lines, and the memory cells in different rows are connected to different word lines. Specifically, in Figure 11, the first to fourth rows of memory cells are connected to WL0, WL1, WL2 and WL3 respectively. The first ferroelectric capacitors in the memory cells in the first to fourth columns are connected to BL0, BL1, BL2 and BL3 respectively, and the second ferroelectric capacitors in the memory cells in the first to fourth columns are connected to BL0' and BL1' respectively. , BL2' and BL3' are connected. The memory cells in the first and second columns are connected to the plate line PL0, and the memory cells in the third and fourth columns are connected to the plate line PL1. The memory cells in the first column and the memory cells in the second column are symmetrically distributed with PL0 as the axis, and the memory cells in the third column and the memory cells in the fourth column are symmetrically distributed with PL1 as the axis.
图10和图11的区别主要在于,图11中每两列存储单元共享一条板线,图10中各列存储单元分别连接不同的板线,图11的其他描述可以参考图10的相关描述,为了避免重复,此处不再赘述。The main difference between Figure 10 and Figure 11 is that in Figure 11 every two columns of memory cells share a board line, while in Figure 10 each column of memory cells are connected to different board lines. For other descriptions of Figure 11, please refer to the relevant descriptions of Figure 10. To avoid duplication, they will not be described again here.
应理解,图11所示的存储阵列仅是本申请实施例提供的一种存储阵列的示意图,图中所示器件的数量不对本申请实施例的方案构成限定,例如,在图11中的存储阵列包括4×4的16个存储单元,在实际应用中,存储阵列可以包括其他规模的存储单元,字线、位线和板线的数量可以根据存储单元的规模进行调整,本申请实施例对此不做限定。在图11中每两列存储单元共享一条板线,在实际应用中,还可以为更多列存储单元共享一条板线,本申请实施例对此不做限定。It should be understood that the memory array shown in Figure 11 is only a schematic diagram of a memory array provided by the embodiment of the present application. The number of devices shown in the figure does not limit the solution of the embodiment of the present application. For example, the memory array in Figure 11 The array includes 16 4×4 memory cells. In practical applications, the memory array can include memory cells of other sizes. The number of word lines, bit lines and plate lines can be adjusted according to the size of the memory cells. The embodiments of this application This is not limited. In FIG. 11 , every two columns of memory cells share a board line. In practical applications, more columns of memory cells may share a board line. This is not limited in the embodiment of the present application.
在本申请实施例的存储阵列中的存储单元包括两个晶体管和两个铁电电容的情况下,信息写入和读取过程与2T2C结构的存储单元的信息写入和读取过程类似。为了避免重复,此处不再赘述。In the case where the memory unit in the memory array of the embodiment of the present application includes two transistors and two ferroelectric capacitors, the information writing and reading process is similar to the information writing and reading process of the memory unit with a 2T2C structure. To avoid duplication, they will not be described again here.
根据本申请实施例的方案,板线的延伸方向和字线的延伸方向相互垂直,共享板线的存储单元和共享字线的存储单元并不完全相同,该结构可以仅对需要读取信息的存储单元进行信息读取,而无需对整行存储单元进行读取,在信息读取过程中仅需要读取信息的存储单元的铁电电容的承受高压,其他存储单元的铁电电容不承受高压,避免了整行存储单元在读取过程中均需要承受高压的情况,降低了铁电电容承受高压的次数,有利于保证存储阵列的使用寿命。具体来说,需要读取信息的存储单元所连接的字线接高电位,需要读取信息的存储单元中的晶体管导通,需要读取信息的存储单元所连接的板线可以接高电压脉冲,与需要读取信息的存储单元共享板线的其他存储单元所连接的字线并未接高电位,即其他存储单元中的晶体管并未导通,其他存储单元中的铁电电容不会承受板线上的高压。这样,避免了整行存储单元在读取过程中均需要承受高压的情况,降低了铁电电容承受高压的次数,有利于保证存储阵列的使用寿命。According to the solution of the embodiment of the present application, the extending direction of the plate line and the extending direction of the word line are perpendicular to each other. The memory cells sharing the plate line and the memory cells sharing the word line are not exactly the same. This structure can only be used for those who need to read information. The memory cells read information without reading the entire row of memory cells. During the information reading process, only the ferroelectric capacitors of the memory cells that need to read information can withstand high voltages. The ferroelectric capacitors of other memory cells do not withstand high voltages. , avoids the situation where the entire row of memory cells needs to withstand high voltage during the reading process, reduces the number of times the ferroelectric capacitor withstands high voltage, and is beneficial to ensuring the service life of the storage array. Specifically, the word line connected to the memory unit that needs to read information is connected to a high potential, the transistor in the memory unit that needs to read information is turned on, and the board line connected to the memory unit that needs to read information can be connected to a high voltage pulse. , the word lines connected to other memory cells sharing the board line with the memory cell that needs to read information are not connected to high potential, that is, the transistors in other memory cells are not turned on, and the ferroelectric capacitors in other memory cells will not withstand High voltage on the board line. In this way, it is avoided that the entire row of memory cells needs to withstand high voltage during the reading process, and the number of times the ferroelectric capacitor is subjected to high voltage is reduced, which is beneficial to ensuring the service life of the memory array.
此外,一列存储单元可以共用一条板线,有利于减少板线的数量,同时减少板线与存储单元之间的连线所占用的面积,进而增加有效存储面积,提高存储密度。而且,板线所需要的高电位信号源可以部署于外围电路,避免将电源部署于存储单元之间,进而有利于增加有效存储面积,提高存储密度。In addition, a column of memory cells can share a board line, which is beneficial to reducing the number of board lines and reducing the area occupied by the connection between the board line and the memory unit, thereby increasing the effective storage area and improving storage density. Moreover, the high-potential signal sources required by the board lines can be deployed in peripheral circuits, avoiding the deployment of power supplies between memory cells, which in turn helps increase the effective storage area and improve storage density.
此外,在本申请实施例中,多列存储单元可以共享一条板线,进一步减少了板线的数量,能够进一步增加有效存储面积,提高存储密度。In addition, in the embodiment of the present application, multiple columns of memory cells can share a board line, further reducing the number of board lines, further increasing the effective storage area and improving storage density.
应注意,图5至图11中的存储阵列仅为示例,在具体实现过程中,本领域的技术人 员应当理解,图5至图11中的存储阵列还可以包括实现正常运行所必须的其他器件。同时,根据具体需要,本领域的技术人员应当理解,图5至图11中的存储阵列还可包括实现其他附加功能的硬件器件。It should be noted that the storage arrays in Figures 5 to 11 are only examples. During specific implementation, those skilled in the art It should be understood by the operator that the memory arrays in Figures 5 to 11 may also include other devices necessary for normal operation. At the same time, based on specific needs, those skilled in the art should understand that the storage arrays in Figures 5 to 11 may also include hardware devices that implement other additional functions.
图12示出了本申请实施例提供的一种存储阵列的工作方法,该方法1200可以应用于前文中的存储阵列,例如,图5至图11中的存储阵列,具体描述可以参考前文中的描述,为了避免重复,在描述方法1200时,适当省略部分描述。Figure 12 shows a working method of a storage array provided by an embodiment of the present application. The method 1200 can be applied to the previous storage arrays, for example, the storage arrays in Figures 5 to 11. For detailed description, please refer to the previous Description: In order to avoid duplication, when describing the method 1200, part of the description is appropriately omitted.
存储阵列包括多个存储单元、沿行方向延伸的多条字线、沿列方向延伸的多条位线、沿列方向延伸的多条板线,多个存储单元中的每个存储单元包括第一晶体管和第一铁电电容,第一晶体管的第一端与第一铁电电容的第二端相连,其中,多个存储单元中的第i行存储单元中每个存储单元的第一晶体管的栅端与多条字线中的第i条字线连接,i为正整数,多个存储单元中的第j列存储单元中每个存储单元的第一铁电电容的第一端与多条位线中的第j条位线连接,j为正整数,第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的一条板线连接,第一晶体管的第一端为源端,第一晶体管的第二端为漏端,或者,第一晶体管的第一端为漏端,第一晶体管的第二端为源端。The memory array includes a plurality of memory cells, a plurality of word lines extending in the row direction, a plurality of bit lines extending in the column direction, and a plurality of plate lines extending in the column direction. Each memory unit in the plurality of memory cells includes a third A transistor and a first ferroelectric capacitor, the first terminal of the first transistor is connected to the second terminal of the first ferroelectric capacitor, wherein the first transistor of each memory unit in the i-th row memory unit in the plurality of memory units The gate end of is connected to the i-th word line among the plurality of word lines, i is a positive integer, and the first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit among the plurality of memory cells is connected to the plurality of word lines. The jth bit line among the bit lines is connected, j is a positive integer, the second end of the first transistor of each memory cell in the jth column memory unit is connected to one of the plurality of plate lines, and the first transistor The first terminal of the first transistor is the source terminal and the second terminal of the first transistor is the drain terminal. Alternatively, the first terminal of the first transistor is the drain terminal and the second terminal of the first transistor is the source terminal.
方法1200包括步骤1210至步骤1220。Method 1200 includes steps 1210 to 1220.
1210,在第i条字线上施加第一电压信号以使第i行存储单元中每个存储单元的第一晶体管导通。1210. Apply a first voltage signal on the i-th word line to turn on the first transistor of each memory cell in the i-th row of memory cells.
1220,在多条板线中的一条板线上施加第二电压信号,目标存储单元所连接的位线上施加第三电压信号,以读取目标存储单元中存储的信息,第二电压信号的电位高于第三电压信号的电位,目标存储单元为与多条板线中的一条板线相连的存储单元和第i行存储单元的交集中的存储单元。1220. Apply a second voltage signal to one of the plurality of plate lines, and apply a third voltage signal to the bit line connected to the target storage unit to read the information stored in the target storage unit. The second voltage signal The potential is higher than the potential of the third voltage signal, and the target memory cell is a memory cell at the intersection of the memory cell connected to one of the plurality of plate lines and the i-th row memory cell.
示例性地,目标存储单元可以为前文中的待读取单元。For example, the target storage unit may be the unit to be read mentioned above.
第一电压信号可以理解为使得第一晶体管导通的电压信号。例如,该第一电压信号可以为前文中字线所连接的高电位信号。The first voltage signal can be understood as a voltage signal that causes the first transistor to turn on. For example, the first voltage signal may be the high potential signal connected to the word line mentioned above.
第二电压信号和第三电压信号为用于读取存储信息的电压信号。例如,第二电压信号可以为前文中板线所接的高电位脉冲信号。第三电压信号可以为前文中位线所接的低电位信号。The second voltage signal and the third voltage signal are voltage signals used for reading stored information. For example, the second voltage signal may be the high-potential pulse signal connected to the board line mentioned above. The third voltage signal may be the low-potential signal connected to the bit line mentioned above.
可选地,第j列存储单元中每个存储单元的第一晶体管的第二端与多条板线中的第j条板线连接,方法包括:在第j条板线上施加第二电压信号,以读取目标存储单元中存储的信息,目标存储单元为与第j列存储单元和第i行存储单元的交集中的存储单元。Optionally, the second end of the first transistor of each memory cell in the j-th column memory cell is connected to the j-th plate line among the plurality of plate lines, and the method includes: applying a second voltage to the j-th plate line signal to read the information stored in the target storage unit, which is the storage unit at the intersection with the j-th column storage unit and the i-th row storage unit.
可选地,多个存储单元中的第k列存储单元中每个存储单元的第一晶体管的第二端与第j列存储单元中每个存储单元的第一晶体管的第二端共享多条板线中的一条板线,k为正整数,j不等于k,方法包括:在共享的多条板线中的一条板线上施加第二电压信号,以读取目标存储单元中存储的信息,目标存储单元为与第j列存储单元、第k列存储单元和第i行存储单元的交集中的存储单元。Optionally, the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory units shares multiple lines with the second end of the first transistor of each memory unit in the j-th column memory unit. One of the plate lines, k is a positive integer, and j is not equal to k. The method includes: applying a second voltage signal to one of the shared multiple plate lines to read the information stored in the target storage unit. , the target storage unit is the storage unit in the intersection with the j-th column storage unit, the k-th column storage unit and the i-th row storage unit.
可选地,第j列存储单元和第k列存储单元以共享的多条板线中的一条板线为轴线呈对称分布。Optionally, the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the multiple shared plate lines as an axis.
可选地,多条位线分别与多个放大器相连接。Optionally, multiple bit lines are respectively connected to multiple amplifiers.
可选地,多条位线通过多路选择器与至少一个放大器相连接,至少一个放大器的数量 大于或等于多条板线中的至少一条板线所连接的存储单元的列数。Optionally, the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of at least one amplifier It is greater than or equal to the number of columns of memory cells connected to at least one of the plurality of plate lines.
方法1200的具体示例可以参考图9的相关描述,此处不再赘述。For specific examples of method 1200, reference can be made to the relevant description in Figure 9, which will not be described again here.
本申请实施例还提供一种存储器,包括前文中的存储阵列和存储控制器,存储控制器和存储阵列电连接。例如,存储阵列可以为图5至图11中任一存储阵列。An embodiment of the present application also provides a memory, including the aforementioned storage array and a storage controller, and the storage controller and the storage array are electrically connected. For example, the storage array may be any of the storage arrays in FIG. 5 to FIG. 11 .
本申请实施例还提供一种电子设备,包括前文中的存储器和电路板,存储器设置于电路板上且与电路板电连接。An embodiment of the present application also provides an electronic device, including the aforementioned memory and a circuit board. The memory is disposed on the circuit board and is electrically connected to the circuit board.
应理解,本文中术语“和/或”,仅仅是一种描述关联对象的关联关系,表示可以存在三种关系,例如,A和/或B,可以表示:单独存在A,同时存在A和B,单独存在B这三种情况,其中A,B可以是单数或者复数。另外,本文中字符“/”,一般表示前后关联对象是一种“或”的关系,但也可能表示的是一种“和/或”的关系,具体可参考前后文进行理解。It should be understood that the term "and/or" in this article is only an association relationship describing related objects, indicating that there can be three relationships, for example, A and/or B, which can mean: A alone exists, and A and B exist simultaneously. , there are three cases of B alone, where A and B can be singular or plural. In addition, the character "/" in this article generally indicates that the related objects are an "or" relationship, but it may also indicate an "and/or" relationship. For details, please refer to the previous and later contexts for understanding.
本申请中,“至少一个”是指一个或者多个,“多个”是指两个或两个以上。“以下至少一项(个)”或其类似表达,是指的这些项中的任意组合,包括单项(个)或复数项(个)的任意组合。例如,a,b,或c中的至少一项(个),可以表示:a,b,c,a-b,a-c,b-c,或a-b-c,其中a,b,c可以是单个,也可以是多个。In this application, "at least one" refers to one or more, and "plurality" refers to two or more. "At least one of the following" or similar expressions thereof refers to any combination of these items, including any combination of a single item (items) or a plurality of items (items). For example, at least one of a, b, or c can mean: a, b, c, a-b, a-c, b-c, or a-b-c, where a, b, c can be single or multiple .
本申请实施例中采用诸如“第一”、“第二”的前缀词,仅仅为了区分不同的描述对象,对被描述对象的位置、顺序、优先级、数量或内容等没有限定作用。Prefixes such as "first" and "second" are used in the embodiments of this application only to distinguish different description objects, and have no limiting effect on the position, order, priority, quantity or content of the described objects.
应理解,在本申请的各种实施例中,上述各过程的序号的大小并不意味着执行顺序的先后,各过程的执行顺序应以其功能和内在逻辑确定,而不应对本申请实施例的实施过程构成任何限定。It should be understood that in the various embodiments of the present application, the size of the sequence numbers of the above-mentioned processes does not mean the order of execution. The execution order of each process should be determined by its functions and internal logic, and should not be used in the embodiments of the present application. The implementation process constitutes any limitation.
本领域普通技术人员可以意识到,结合本文中所公开的实施例描述的各示例的单元及算法步骤,能够以电子硬件、或者计算机软件和电子硬件的结合来实现。这些功能究竟以硬件还是软件方式来执行,取决于技术方案的特定应用和设计约束条件。专业技术人员可以对每个特定的应用来使用不同方法来实现所描述的功能,但是这种实现不应认为超出本申请的范围。Those of ordinary skill in the art will appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented with electronic hardware, or a combination of computer software and electronic hardware. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Skilled artisans may implement the described functionality using different methods for each specific application, but such implementations should not be considered beyond the scope of this application.
所属领域的技术人员可以清楚地了解到,为描述的方便和简洁,上述描述的系统、装置和单元的具体工作过程,可以参考前述方法实施例中的对应过程,在此不再赘述。Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working processes of the systems, devices and units described above can be referred to the corresponding processes in the foregoing method embodiments, and will not be described again here.
在本申请所提供的几个实施例中,应该理解到,所揭露的系统、装置和方法,可以通过其它的方式实现。例如,以上所描述的装置实施例仅仅是示意性的,例如,所述单元的划分,仅仅为一种逻辑功能划分,实际实现时可以有另外的划分方式,例如多个单元或组件可以结合或者可以集成到另一个系统,或一些特征可以忽略,或不执行。另一点,所显示或讨论的相互之间的耦合或直接耦合或通信连接可以是通过一些接口,装置或单元的间接耦合或通信连接,可以是电性,机械或其它的形式。In the several embodiments provided in this application, it should be understood that the disclosed systems, devices and methods can be implemented in other ways. For example, the device embodiments described above are only illustrative. For example, the division of the units is only a logical function division. In actual implementation, there may be other division methods. For example, multiple units or components may be combined or can be integrated into another system, or some features can be ignored, or not implemented. On the other hand, the coupling or direct coupling or communication connection between each other shown or discussed may be through some interfaces, and the indirect coupling or communication connection of the devices or units may be in electrical, mechanical or other forms.
所述作为分离部件说明的单元可以是或者也可以不是物理上分开的,作为单元显示的部件可以是或者也可以不是物理单元,即可以位于一个地方,或者也可以分布到多个网络单元上。可以根据实际的需要选择其中的部分或者全部单元来实现本实施例方案的目的。The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place, or they may be distributed to multiple network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of this embodiment.
另外,在本申请各个实施例中的各功能单元可以集成在一个处理单元中,也可以是各个单元单独物理存在,也可以两个或两个以上单元集成在一个单元中。In addition, each functional unit in each embodiment of the present application can be integrated into one processing unit, each unit can exist physically alone, or two or more units can be integrated into one unit.
以上所述,仅为本申请的具体实施方式,但本申请的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖 在本申请的保护范围之内。因此,本申请的保护范围应以所述权利要求的保护范围为准。 The above are only specific embodiments of the present application, but the protection scope of the present application is not limited thereto. Any person familiar with the technical field can easily think of changes or substitutions within the technical scope disclosed in the present application. should cover within the protection scope of this application. Therefore, the protection scope of this application should be subject to the protection scope of the claims.

Claims (14)

  1. 一种存储阵列,其特征在于,包括:多个存储单元、沿行方向延伸的多条字线、沿列方向延伸的多条位线和沿列方向延伸的多条板线,所述多个存储单元中的每个存储单元包括第一晶体管和第一铁电电容,所述第一晶体管的第一端与所述第一铁电电容的第二端相连,其中,A memory array, characterized in that it includes: a plurality of memory cells, a plurality of word lines extending along a row direction, a plurality of bit lines extending along a column direction, and a plurality of plate lines extending along a column direction, the plurality of Each of the memory cells includes a first transistor and a first ferroelectric capacitor, a first terminal of the first transistor is connected to a second terminal of the first ferroelectric capacitor, wherein,
    所述多个存储单元中的第i行存储单元中每个存储单元的第一晶体管的栅端与所述多条字线中的第i条字线连接,i为正整数,The gate terminal of the first transistor of each memory cell in the i-th row of memory cells in the plurality of memory cells is connected to the i-th word line in the plurality of word lines, where i is a positive integer,
    所述多个存储单元中的第j列存储单元中每个存储单元的第一铁电电容的第一端与所述多条位线中的第j条位线连接,j为正整数,The first end of the first ferroelectric capacitor of each memory cell in the j-th column memory unit among the plurality of memory cells is connected to the j-th bit line among the plurality of bit lines, where j is a positive integer,
    所述第j列存储单元中每个存储单元的第一晶体管的第二端与所述多条板线中的一条板线连接,所述第一晶体管的第一端为源端,所述第一晶体管的第二端为漏端,或者,所述第一晶体管的第一端为漏端,所述第一晶体管的第二端为源端。The second end of the first transistor of each memory cell in the jth column of memory cells is connected to one of the plurality of plate lines, the first end of the first transistor is a source end, and the first end of the first transistor is a source end. The second terminal of a transistor is a drain terminal, or the first terminal of the first transistor is a drain terminal, and the second terminal of the first transistor is a source terminal.
  2. 根据权利要求1所述的存储阵列,其特征在于,所述第j列存储单元中每个存储单元的第一晶体管的第二端与所述多条板线中的第j条板线连接。The memory array according to claim 1, wherein the second end of the first transistor of each memory cell in the j-th column of memory cells is connected to the j-th plate line among the plurality of plate lines.
  3. 根据权利要求1所述的存储阵列,其特征在于,所述多个存储单元中的第k列存储单元中每个存储单元的第一晶体管的第二端与所述第j列存储单元中每个存储单元的第一晶体管的第二端共享所述多条板线中的一条板线,k为正整数,j不等于k。The memory array according to claim 1, wherein the second end of the first transistor of each memory unit in the k-th column memory unit among the plurality of memory cells is connected to the second end of the first transistor of each memory unit in the j-th column memory unit. The second terminals of the first transistors of the memory cells share one of the plurality of plate lines, k is a positive integer, and j is not equal to k.
  4. 根据权利要求3所述的存储阵列,其特征在于,所述第j列存储单元和所述第k列存储单元以所述共享的多条板线中的一条板线为轴线呈对称分布。The memory array according to claim 3, wherein the j-th column memory cells and the k-th column memory cells are symmetrically distributed with one of the shared multiple plate lines as an axis.
  5. 根据权利要求1至4中任一项所述的存储阵列,其特征在于,所述多条位线分别与多个放大器相连接。The memory array according to any one of claims 1 to 4, wherein the plurality of bit lines are respectively connected to a plurality of amplifiers.
  6. 根据权利要求1至4中任一项所述的存储阵列,其特征在于,所述多条位线通过多路选择器与至少一个放大器相连接,所述至少一个放大器的数量大于或等于所述多条板线中的至少一条板线所连接的存储单元的列数。The memory array according to any one of claims 1 to 4, characterized in that the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to the The number of columns of memory cells connected to at least one of the multiple board lines.
  7. 一种存储器,其特征在于,包括如权利要求1至6中任一项所述的存储阵列和存储控制器,所述存储控制器和所述存储阵列电连接。A memory, characterized in that it includes the storage array and a storage controller according to any one of claims 1 to 6, and the storage controller is electrically connected to the storage array.
  8. 一种电子设备,其特征在于,包括如权利要求7所述的存储器和电路板,所述存储器设置于所述电路板上且与所述电路板电连接。An electronic device, characterized by comprising the memory as claimed in claim 7 and a circuit board, the memory being disposed on the circuit board and electrically connected to the circuit board.
  9. 一种存储阵列的工作方法,其特征在于,所述存储阵列包括多个存储单元、沿行方向延伸的多条字线、沿列方向延伸的多条位线、沿列方向延伸的多条板线,所述多个存储单元中的每个存储单元包括第一晶体管和第一铁电电容,所述第一晶体管的第一端与所述第一铁电电容的第二端相连,其中,所述多个存储单元中的第i行存储单元中每个存储单元的第一晶体管的栅端与所述多条字线中的第i条字线连接,i为正整数,所述多个存储单元中的第j列存储单元中每个存储单元的第一铁电电容的第一端与所述多条位线中的第j条位线连接,j为正整数,所述第j列存储单元中每个存储单元的第一晶体管的第二端与所述多条板线中的一条板线连接,所述第一晶体管的第一端为源端,所述第一晶体管的第二端为漏端,或者,所述第一晶体管的第一端为漏端,所述第一晶体管的第二端为源端, 所述方法包括:A working method of a memory array, characterized in that the memory array includes a plurality of memory cells, a plurality of word lines extending in a row direction, a plurality of bit lines extending in a column direction, and a plurality of plates extending in a column direction. line, each memory cell in the plurality of memory cells includes a first transistor and a first ferroelectric capacitor, a first terminal of the first transistor is connected to a second terminal of the first ferroelectric capacitor, wherein, The gate terminal of the first transistor of each memory cell in the i-th row of memory cells in the plurality of memory cells is connected to the i-th word line in the plurality of word lines, i is a positive integer, and the plurality of The first end of the first ferroelectric capacitor of each memory cell in the j-th column of memory cells is connected to the j-th bit line among the plurality of bit lines, j is a positive integer, and the j-th column The second end of the first transistor of each memory unit in the memory unit is connected to one of the plurality of plate lines, the first end of the first transistor is a source end, and the second end of the first transistor The terminal is a drain terminal, or the first terminal of the first transistor is a drain terminal, and the second terminal of the first transistor is a source terminal, The methods include:
    在所述第i条字线上施加第一电压信号以使所述第i行存储单元中每个存储单元的第一晶体管导通;Applying a first voltage signal to the i-th word line to turn on the first transistor of each memory cell in the i-th row of memory cells;
    在所述多条板线中的一条板线上施加第二电压信号,在目标存储单元所连接的位线上施加第三电压信号,以读取所述目标存储单元中存储的信息,所述第二电压信号的电位高于所述第三电压信号的电位,所述目标存储单元为与多条板线中的一条板线相连的存储单元和第i行存储单元的交集中的存储单元。A second voltage signal is applied to one of the plurality of plate lines, and a third voltage signal is applied to the bit line connected to the target memory unit to read the information stored in the target memory unit, the The potential of the second voltage signal is higher than the potential of the third voltage signal, and the target memory cell is a memory cell at the intersection of a memory cell connected to one of the plurality of plate lines and the i-th row of memory cells.
  10. 根据权利要求9所述的方法,其特征在于,所述第j列存储单元中每个存储单元的第一晶体管的第二端与所述多条板线中的第j条板线连接,所述方法包括:The method of claim 9, wherein the second end of the first transistor of each memory unit in the j-th column memory unit is connected to the j-th plate line among the plurality of plate lines, so The methods include:
    在所述第j条板线上施加第二电压信号,以读取目标存储单元中存储的信息,所述目标存储单元为与第j列存储单元和所述第i行存储单元的交集中的存储单元。A second voltage signal is applied to the j-th plate line to read the information stored in the target storage unit, which is the intersection of the j-th column storage unit and the i-th row storage unit. storage unit.
  11. 根据权利要求9所述的方法,其特征在于,所述多个存储单元中的第k列存储单元中每个存储单元的第一晶体管的第二端与所述第j列存储单元中每个存储单元的第一晶体管的第二端共享所述多条板线中的一条板线,k为正整数,j不等于k,所述方法包括:The method of claim 9, wherein the second terminal of the first transistor of each memory unit in the k-th column of the plurality of memory cells is connected to each of the j-th column memory cells. The second end of the first transistor of the memory unit shares one of the plurality of plate lines, k is a positive integer, j is not equal to k, and the method includes:
    在所述共享的所述多条板线中的一条板线上施加第二电压信号,以读取目标存储单元中存储的信息,所述目标存储单元为与第j列存储单元、第k列存储单元和所述第i行存储单元的交集中的存储单元。A second voltage signal is applied to one of the shared plurality of plate lines to read the information stored in the target storage unit. The target storage unit is a storage unit of the jth column and the kth column. The storage unit in the intersection of the storage unit and the i-th row storage unit.
  12. 根据权利要求11所述的方法,其特征在于,所述第j列存储单元和所述第k列存储单元以所述共享的多条板线中的一条板线为轴线呈对称分布。The method of claim 11, wherein the j-th column memory unit and the k-th column memory unit are symmetrically distributed with one of the shared multiple plate lines as an axis.
  13. 根据权利要求9至12中任一项所述的方法,其特征在于,所述多条位线分别与多个放大器相连接。The method according to any one of claims 9 to 12, characterized in that the plurality of bit lines are respectively connected to a plurality of amplifiers.
  14. 根据权利要求9至12中任一项所述的方法,其特征在于,所述多条位线通过多路选择器与至少一个放大器相连接,所述至少一个放大器的数量大于或等于所述多条板线中的至少一条板线所连接的存储单元的列数。 The method according to any one of claims 9 to 12, characterized in that the plurality of bit lines are connected to at least one amplifier through a multiplexer, and the number of the at least one amplifier is greater than or equal to the plurality of amplifiers. The number of columns of memory cells connected to at least one of the strip lines.
PCT/CN2023/078656 2022-05-16 2023-02-28 Storage array and working method for storage array WO2023221597A1 (en)

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