CN104697882B - A kind of mass sensitivity device of surrounding air PM2.5 particulate matters based on ZnO nanowire array and preparation method thereof - Google Patents
A kind of mass sensitivity device of surrounding air PM2.5 particulate matters based on ZnO nanowire array and preparation method thereof Download PDFInfo
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Abstract
A kind of mass sensitivity device of surrounding air PM2.5 particulate matters based on ZnO nanowire array and preparation method thereof, it is related to nanometer technology and environmental monitoring.In the present invention, when environmental gas flows through ZnO nanowire array, PM2.5 particles are attached on nano wire, by the change for detecting ZnO nano-wire vibration frequency, quantitative relationship between ZnO nano-wire vibration frequency and PM2.5 granular mass, so as to detect the quality of PM2.5 particles.The present invention it is easy and effective, it is adaptable in daily life in various surrounding airs PM2.5 granular mass detection.
Description
Technical field
It is specifically a kind of by detecting that ZnO nano-wire vibrates the present invention relates to nanometer technology and environmental monitoring
The change of frequency and the Apparatus and method for for detecting surrounding air PM2.5 particulate matter qualities.
Background technology
" haze " is one of focus that people pay close attention in a hurry instantly, because haze weather not only reduces the visibility of air
The normal trip of people is influenceed, and very important injury is caused to the healthy of people.Wherein mist belongs to natural weather
Phenomenon, it is generally nontoxic.But haze is mainly suspended in the materials such as the cigarette and dust in air, can be entered by gas
And can stick in human body lower respiratory tract and the lobe of the lung, the health to human body is damaged, and especially diameter is micro- less than or equal to 2.5
The fine particle (i.e. PM2.5) of rice.Although PM2.5 is the seldom component of content in earth atmosphere composition, it is to air matter
Amount and visibility etc. have important influence, greatly affect health and atmosphere quality.Therefore, it is empty for environment
Gas PM2.5 monitoring is now very urgent with administering.
At present, the monitoring method for particle concentration in environmental gas mainly has：Weight method, β ray methods, micro vibration
Sedimentation balance method etc..
Weight method is, by there is the sampling environment air device of certain Cutting feature, a certain amount of volume to be extracted with constant rate of speed
Surrounding air, makes the PM2.5 in surrounding air stay on the filter membrane of known quality, according to the difference of the quality before and after filter membrane sampling and
Sampling volume, you can draw PM2.5 concentration.But the weight method sampling time is longer, it is necessary to step hand-manipulated is more, cost
Height, automaticity is very low and can not realize real-time on-line monitoring.
β ray methods are that, when surrounding air is through filter membrane, the particulate matter in air is stayed on filter membrane, and it is heavy to be passed through with β rays
The filter membrane of particulate matter is accumulated, determining the attenuation of β ray energies just can calculate the concentration of particulate matter.Although β ray methods are measured
Dynamic range it is relatively wide, and measurement result is only relevant with the quality of particulate matter, but spoke easily occurs for the storage of β ray radiation sources
Leakage problem is penetrated, this is significantly unfavorable for the health of human body safety of survey crew.
Trace oscillating balance method is to be based on conical component vibrate microbalance principle, is placed on vibration hollow conical pipe
Replaceable filter membrane, the particulate matter allowed in surrounding air is deposited on filter membrane, by determine filter membrane frequency of oscillation change so as to
The quality for being deposited on particulate matter on filter membrane is calculated, the concentration of particulate matter is calculated further according to sampling flow etc..Micro vibration day
Ping Fayin its can realize real-time continuous monitoring it is more and more in the instrument in terms of recent particle monitoring be used, for example
Thermo Scientific TEOM 1405.But such monitoring device volume is larger, and disturbed larger by temperature humidity, limit
The environmental condition and spatial dimension of equipment detection are made.And China is complete for various Conventional pollutions in independent research at present
The integrated system of face monitoring analysis integration does not occur also, so tool smaller volume, more convenient, more accurate microparticle measuring appliance
Part is each expert and scientific research personage pursuing a goal now in this respect at present.
Therefore, forwardly need at present a kind of collection small volume not by environmental influence, conveniently, accurately, in real time, warp
Ji, health are accurate to surrounding air to realize in the appearance to ambient air particulate matter (PM2.5) mass sensitivity device of one
Monitoring in real time.
The content of the invention
In order to overcome the problem of prior art is present there is provided a kind of mass sensitivity device, to realize to surrounding air PM2.5
Particulate matter quality carries out real-time, accurate, efficient, low cost, the monitoring of Low Damage.
To achieve the above object, the present invention proposes a kind of surrounding air PM2.5 particulate matters based on ZnO nanowire array
Mass sensitivity device, when environmental gas flows through nano-wire array, PM2.5 particulate matters are attached on nano wire, by detecting ZnO
The change of nano wire vibration frequency, the quantitative relationship between ZnO nano-wire vibration frequency and PM2.5 particulate matter qualities, so that
Detect the quality of PM2.5 particulate matters.
A kind of mass sensitivity device of the surrounding air PM2.5 particulate matters based on ZnO nanowire array, in the back of the body of silicon substrate
There is a groove in face, and the thickness between bottom portion of groove and silicon substrate front is between 20 microns~50 microns, silicon substrate front carves
There are the rectangular ventilation holes of two-stage step, electrode is set in the shoulder height face of one-level step above and step upper surface, right
Claim set two it is adjacent above one-level step shoulder height face on electric level between lateral growth have ZnO nano-wire, ZnO
Nano wire is suspended on above air vent, and the two ends of ZnO nano-wire are connected on two electrodes.
The rectangular ventilation holes of described two-stage step are 10 micro- with the length in ZnO nano-wire direction of growth vertical direction
Rice, it is adjacent and symmetrically arranged two above the distance between relative shoulder height face of one-level step be 4 μm, it is adjacent and
The distance between relative shoulder height face of one-level step is 3 μm below symmetrically arranged two.
The ZnO nanowire array is fixed between two electrodes using lateral growth method, and ZnO nano-wire is averaged
Diameter is about 150nm, and the length of ZnO nano-wire is consistent, therefore the resonant frequency bandwidth of ZnO nanowire array is narrower, improves
The accuracy of finely ground particles quality detection.
The metal component layer of described electrode is followed successively by TiAlNiAu from inside to outside, and the gross thickness of electrode is 200nm, each
Metal component layer is 50nm.
The surface wettability of described ZnO nano-wire by ultraviolet light realize hydrophilic-hydrophobic between reversible transformation, to it
Apply ultraviolet irradiation and increase adsorptivity of the ZnO nano-wire to particulate matter, and after the detection of PM2.5 granular mass terminates, remove
Except ultraviolet lighting, and clean gas is back and forth passed through, the microparticle adsorbed on nano wire is removed, the automatically cleaning of device is realized.
A kind of preparation of the mass sensitivity device of described surrounding air PM2.5 particulate matters based on ZnO nanowire array
Method, specific preparation process is as follows：
S1 prepares the groove of substrate back first, using laser boring, solution corrosion or ICP method by the silicon substrate back side
Carve one long and a width of 10 microns grooves；
The silicon substrate that back in S1 carves groove is cleaned up the back side after drying and protected with wax by S2；
S3 is by after the silicon substrate front baking in S2, positive spin coating positive photoetching rubber, through drying later, exposure, development, after post bake,
There is position above silicon substrate front, i.e. its rear channel of positive photoetching rubber to make long 10 μm, wide 4 μm groove by lithography in spin coating；
The silicon substrate that photoresist in S3 carves groove is put into KOH solution by S4, and glue is not photo-etched in silicon substrate front
The deep 1.5 μm rectangular recess for rule is corroded in the position of protection, then washes away photoresist with acetone；
Silicon substrate in S4 is passed through a photoetching and solution corrosion, the rectangle that silicon substrate front is carved in S4 by S5 again
The center of groove carves one long 10 μm, wide 3 μm of through hole, and now prepared by the air vent with two-stage step to complete；
The silicon substrate that rear channel and two-stage step air vent are carved with S5 is passed through a photoetching by S6 again, in air vent one
The electrode position of side makes the groove of electrode production site by lithography；
The silicon substrate that electrode position groove is carved with S6 is put into magnetron sputtering apparatus by S7, in the air vent side first order
The shoulder height face and step upper surface of step sputter Ti, Al, Ni, Au layers successively, and each metal layer thickness is 50nm, then is used
Acetone washes away photoresist, and now prepared by the electrode of air vent side to complete；
Silicon substrate after the completion of S8 prepares the electrode of air vent side in S7 passes through a photoetching again, by electrode sidewall
While making the groove of ZnO Seed Layers position by lithography close to the position of air vent；
Silicon substrate after photoetching in S8 is put into magnetron sputtering by S9, the thick ZnO of 200nm is sputtered on electrode sidewall surface thin
Film, now prepared by the ZnO Seed Layers on electrode to complete；
S10 is by the zinc nitrate hexahydrate (Zn (NO of equimolar ratio3)2·6H2O) it is dissolved in hexamethylenetetramine (HMTA)
In deionized water, stir, be configured to 25mmol/L solution as precursor solution；
S11 takes 15mL precursor solutions to be put into hydrothermal reaction kettle, then the silicon substrate that ZnO Seed Layers have been prepared in S9 is put into
In hydrothermal reaction kettle, growing ZnO nano-wire is reacted at 80 DEG C, continues 8h；
S12 will grow the substrate taking-up for having ZnO nano-wire, is rinsed, is dried in nitrogen repeatedly with deionized water；
The substrate with ZnO nano-wire rinsed well in S12 is passed through a photoetching by S13 again, in air vent other one
Side, i.e., not growing has ZnO nano-wire side, makes the groove at electrode position by lithography；
Substrate after photoetching in S13 is put into magnetic control sputtering device by S14, in the platform of air vent other side first order step
Rank height face and step upper surface sputter Ti, Al, Ni, Au layers successively, and each metal layer thickness is 50nm, then washed away with acetone
Photoresist, now prepared by the electrode of air vent other side to be completed, and now ZnO nanowire array is fixed between two electrodes,
The main part of PM2.5 particulate matter quality senser elements has just been made.
The present invention has the advantage that compared with prior art：
Present invention utilizes the skin effect of nano-material and small-size effect, it is not necessary to is asked by being passed through a large amount of gases
The method of quality integration, you can realize the highly sensitive detection to small mass particle and quick response, meanwhile, the present invention possesses
Self-cleaning function, increases its service life, and with small volume, the characteristics of light and handy portable, environmental suitability is strong, is adapted to a large amount of
The detection node for being distributed in sensor network is buried, the Monitoring and forecasting system in real-time of air quality is carried out.
Brief description of the drawings
The plan of Fig. 1 present invention
The profile of Fig. 2 present invention
The preparation flow of Fig. 3 devices of the present invention
The basic functional principle schematic diagram of Fig. 4 present invention；
The SEM image of Fig. 5 ZnO nanowire arrays；
In figure：1-silicon substrate, 2-environmental gas, 3-ventilation slot, 4-electrode, 5-ZnO nano-wire, 6-PM2.5 particles
Thing
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, following examples combination accompanying drawing, to this
Invention is further elaborated.
The present invention is a kind of mass sensitivity device of the ambient air particulate matter (PM2.5) based on ZnO nanowire array, tool
Say it is a kind of method by detecting the change of ZnO nano-wire vibration frequency and detecting PM2.5 granular mass body.
A kind of mass sensitivity device of surrounding air PM2.5 particulate matters based on ZnO nanowire array disclosed by the invention
Concrete structure it is as follows：
The back side of Si substrates 1 has one than larger groove, and the thickness between bottom portion of groove and the front of Si substrates 1 is micro- for 20
Rice, the rectangular ventilation holes 3 of two-stage step are carved with the front of Si substrates 1, for the circulation of environmental gas 2, adjacent and symmetrical set
The distance between relative shoulder height face of one-level steps is 4 μm to two put above, it is adjacent and symmetrically arranged two below
The distance between relative shoulder height face of one-level step is 3 μm, on the shoulder height face and step of one-level step above
Surface set electrode, it is adjacent at symmetrically arranged two above one-level step shoulder height face on electric level between laterally give birth to
With ZnO nano-wire 5, ZnO nano-wire 5 is suspended on above ventilation slot, and the two ends of ZnO nano-wire 5 are connected on two electrodes.
Described electrode component is followed successively by TiAlNiAu from inside to outside, and for 200nm, each component is 50nm to its thickness.
The preparation of described PM2.5 particulate matter quality senser elements, first of all for making substrate and electrode preferably contact, and
And it is adapted to high frequency electrical signal, Si is as the substrate of device of the present invention for selection, the air vent of two-stage step is made by lithography, by air vent
The shoulder height face of face one-level step and step upper surface are made after electrode, then lateral growth ZnO nano-wire.Its specific preparation side
Method is as follows：
(1) groove of substrate back is prepared first, can be served as a contrast Si using the method for laser boring, solution corrosion or ICP
Bottom back side carves one long and wide about 10 microns grooves.As shown in accompanying drawing 3 (a).
(2) the Si substrates that back in (1) is carved into groove clean up the back side after drying and protected with wax.
(3) after the Si substrate front bakings in (2), shown in positive spin coating positive photoetching rubber, such as accompanying drawing 3 (b), will be dried after,
After exposure, development, post bake, there is position above Si substrate faces, i.e. its rear channel of positive photoetching rubber to make long 10 μ by lithography in spin coating
Shown in m, wide 4 μm of groove, such as accompanying drawing 3 (c).
(4) the Si substrates that photoresist in (3) is carved into groove are put into KOH solution, are not photo-etched in Si substrate faces
The deep 1.5 μm rectangular recess for rule is corroded in the position of glue protection, then washes away photoresist with acetone, such as accompanying drawing 3 (d) institute
Show.
(5) the Si substrates in (4) are passed through into a photoetching and solution corrosion, the length that Si substrate faces are carved in (4) again
The center of square groove carves one long 10 μm, wide 3 μm of through hole, and now prepared by the air vent with two-stage step to complete, such as
Shown in accompanying drawing 3 (e), accompanying drawing 3 (f).
(6) the Si substrates that rear channel and two-stage step air vent are carved with (5) are passed through into a photoetching again, in air vent
The electrode position of side makes the groove of electrode production site by lithography, shown in such as accompanying drawing 3 (g).
(7) the Si substrates that electrode position groove is carved with (6) are put into magnetron sputtering apparatus, in air vent side first
The shoulder height face and step upper surface of level step sputter Ti, Al, Ni, Au layers successively, and each metal layer thickness is 50nm, then
Photoresist is washed away with acetone, now prepared by the electrode of air vent side to complete, shown in such as accompanying drawing 3 (h).
(8) the Si substrates after the completion of prepared by the electrode of air vent side in (7) pass through a photoetching again, in electrode sidewall
Side makes the groove of ZnO Seed Layers position by lithography close to the position of air vent, shown in such as accompanying drawing 3 (i).
(9) the Si substrates after photoetching in (8) are put into magnetron sputtering, the thick ZnO of 200nm are sputtered on electrode sidewall surface thin
Film, now prepared by the ZnO Seed Layers on electrode to complete, shown in such as accompanying drawing 3 (j).
(10) by the zinc nitrate hexahydrate (Zn (NO of equimolar ratio3)2·6H2O) it is dissolved in hexamethylenetetramine (HMTA)
In deionized water, stir, be configured to 25mmol/L solution as precursor solution.
(11) take 15mL precursor solutions to be put into hydrothermal reaction kettle, then the Si substrates that ZnO Seed Layers have been prepared in (9) are put
Enter in hydrothermal reaction kettle, growing ZnO nano-wire is reacted at 80 DEG C, continue 8h.
(12) the substrate taking-up for having ZnO nano-wire will be grown, is rinsed, dried in nitrogen repeatedly with deionized water, it is such as attached
Shown in Fig. 3 (k).
(13) substrate with ZnO nano-wire rinsed well in (12) is passed through into a photoetching again, in air vent in addition
Side (not growing has ZnO nano-wire side) makes the groove at electrode position by lithography, shown in such as accompanying drawing 3 (l).
(14) substrate after photoetching in (13) is put into magnetic control sputtering device, in air vent other side first order step
Shoulder height face and step upper surface sputter Ti, Al, Ni, Au layers successively, and each metal layer thickness is 50nm, then washed with acetone
Remove photoresist, now air vent other side electrode prepare complete, now ZnO nanowire array be fixed on two electrodes it
Between, the main part of PM2.5 particulate matter quality senser elements is just made, shown in such as accompanying drawing 3 (m).
Referring to accompanying drawing 4, basic functional principle schematic diagram of the invention.
The basic functional principle of device of the present invention is：
When environmental gas 2 flows through ZnO nanowire array 5, particulate matter 6 is attached on ZnO nano-wire 5, causes ZnO nano
The change of the local frequency of line 5, it is theoretical according to Euler-Bernoulli by measuring ZnO nano-wire local frequency changing value,
Draw the quality of particulate matter 6 in environmental gas 2.
Described Euler-Bernoulli theories are to obtain PM2.5 by measuring the method for nano-wire array resonant frequency
Particulate matter quality.Theoretical according to Euler-Bernoulli, the length that two ends are fixed is that L, quality are M0Nano wire (system A)
Intrinsic frequency expression formula is：
Wherein, M0It is the quality of nano wire, L is nanowire length, and E is a nanometer linear elastic modulus, and I is rotary inertia (work
Cheng Xue is defined), β0And β1For constant.
Placed on the nano wire that the quality that length is L is ignored after the particulate matter (system B) that a quality is M, inherently
The expression formula of frequency is：
Wherein, M is the quality of particulate matter, and L is nanowire length, and E is a nanometer linear elastic modulus, and I is rotary inertia (engineering
Learn definition), β1For constant.
Length is that L, quality are M0Nano wire on place the system (system C) of quality for M object, equivalent to body
It is the coupling of two systems of A and system B, according to Dunkerley equations, system C intrinsic frequency f is：
Wherein, M0It is the quality of nano wire, M is the quality of particulate matter, and L is nanowire length, and E is nano wire springform
Amount, I is rotary inertia (engineering science definition), with respectively two different constants.
(1) and (2) is substituted into (3) formula, the particulate matter quality that can derive placement is：
Wherein, M0It is the quality of nano wire, M is the quality of particulate matter, and L is nanowire length, and E is nano wire springform
Amount, I is rotary inertia (engineering science definition), β0And β1Respectively two different constants.
The specific workflow of the present invention is as follows：
(1) in the case where being passed through device of the present invention without environmental gas, to device plus high frequency electrical signal, nanometer linear array is measured
The local frequency of row；
(2) ultraviolet irradiation is added to device of the present invention；
(3) it is passed through environmental gas into device of the present invention；
(4) local frequency of nano-wire array after high frequency electrical signal, measurement adsorption particle thing is added；
(5) it is theoretical according to Euler-Bernoulli, draw the quality of particulate matter PM2.5 in environmental gas.
(6) ultraviolet lighting is removed to the sensitive detection parts；
(7) clean gas is back and forth blasted to device of the present invention, the particulate matter of absorption is removed.
Referring to accompanying drawing 4, the SEM image of ZnO nanowire array is grown.ZnO nano-wire grows on a planar substrate, average
A diameter of 150nm.
Described ZnO nanowire array, because nano-wire array is fixed between two electrodes using lateral growth method,
Therefore its length is consistent, and the resonant frequency bandwidth of array is narrow, improves the accuracy of finely ground particles quality detection.Due to nanometer
The small-size effect of line, device is high to the detectivity of Tiny Mass particle, without seeking matter to the particulate matter in a large amount of gases
Amount is average, accelerates detection efficient.
Because ZnO is a kind of light-sensitive material, under ultraviolet light, its surface wettability can be realized between hydrophilic-hydrophobic
Reversible transformation, therefore, in the course of work of device, add ultraviolet lighting, increase nano wire 5 to the adsorptivity of particulate matter 6,
After quality detection terminates, ultraviolet lighting is removed, and is divulged information, the automatically cleaning of device is realized.
Detection to quality is converted into the detection to electricity frequency by the present invention so that device volume is small, environmental suitability
Height, meanwhile, using the skin effect of ZnO nano-wire, device of the present invention is designed with self-cleaning function, is suitable for answering for environmental monitoring
Use occasion.
The present invention possesses self-cleaning function, increases its service life, and with small volume, the characteristics of light and handy portable, ring
Border strong adaptability, is adapted to a large amount of Monitoring and forecasting system in real-time for burying the detection node for being distributed in sensor network, carrying out air quality.
Claims (4)
1. a kind of mass sensitivity device of the surrounding air PM2.5 particulate matters based on ZnO nanowire array, it is characterised in that：Silicon
There is a groove at the back side of substrate, and the thickness between bottom portion of groove and silicon substrate front is between 20 microns~50 microns, silicon serves as a contrast
The rectangular ventilation holes of two-stage step are carved with bottom front, and electricity is set in the shoulder height face of one-level step above and step upper surface
Pole, it is adjacent at symmetrically arranged two above one-level step shoulder height face on electric level between lateral growth there is ZnO to receive
Rice noodles, ZnO nano-wire is suspended on above air vent, and the two ends of ZnO nano-wire are connected on two electrodes；Described electrode
Metal component layer is followed successively by Ti, Al, Ni, Au from inside to outside, and the gross thickness of electrode is 200nm, and each metal component layer is
50nm；The surface wettability of described ZnO nano-wire by ultraviolet light realize hydrophilic-hydrophobic between reversible transformation, it is applied
Plus ultraviolet irradiation increases adsorptivity of the ZnO nano-wire to particulate matter, and after the detection of PM2.5 granular mass terminates, remove
Ultraviolet lighting, and clean gas is back and forth passed through, the microparticle adsorbed on nano wire is removed, the automatically cleaning of device is realized.
2. a kind of mass sensitivity of surrounding air PM2.5 particulate matters based on ZnO nanowire array according to claim 1
Device, it is characterised in that the rectangular ventilation holes of described two-stage step are on the direction vertical with the ZnO nano-wire direction of growth
Length be 10 microns, it is adjacent and symmetrically arranged two above the distance between relative shoulder height face of one-level step be
4 μm, the distance between relative shoulder height face of adjacent and symmetrically arranged two following one-level step is 3 μm.
3. a kind of mass sensitivity of surrounding air PM2.5 particulate matters based on ZnO nanowire array according to claim 1
Device, it is characterised in that the ZnO nanowire array is fixed between two electrodes using lateral growth method, ZnO nano
The average diameter of line is 150nm, and the length of ZnO nano-wire is consistent, therefore the resonant frequency bandwidth of ZnO nanowire array is narrower,
Improve the accuracy of finely ground particles quality detection.
4. a kind of surrounding air PM2.5 based on ZnO nanowire array according to claims 1 to 3 any claim
The preparation method of the mass sensitivity device of particulate matter, it is characterised in that specific preparation process is as follows：
S1 prepares the groove of substrate back first, is carved the silicon substrate back side using laser boring, solution corrosion or ICP method
One long and a width of 10 microns of groove；
The silicon substrate that back in S1 carves groove is cleaned up the back side after drying and protected with wax by S2；
S3 is by after the silicon substrate front baking in S2, and positive spin coating positive photoetching rubber after baking later, exposure, development, post bake, is revolving
Scribble position above silicon substrate front, i.e. its rear channel of positive photoetching rubber and make long 10 μm, wide 4 μm of groove by lithography；
The silicon substrate that photoresist in S3 carves groove is put into KOH solution by S4, and glue protection is not photo-etched in silicon substrate front
Position corrode deep 1.5 μm of rectangular recess for rule, then wash away photoresist with acetone；
Silicon substrate in S4 is passed through a photoetching and solution corrosion, the rectangular recess that silicon substrate front is carved in S4 by S5 again
Center carve one long 10 μm, wide 3 μm of through hole, now prepared by air vent with two-stage step to complete；
The silicon substrate that rear channel and two-stage step air vent are carved with S5 is passed through a photoetching by S6 again, in air vent side
Electrode position makes the groove of electrode production site by lithography；
The silicon substrate that electrode position groove is carved with S6 is put into magnetron sputtering apparatus by S7, in air vent side first order step
Shoulder height face and step upper surface sputter Ti, Al, Ni, Au layers successively, each metal layer thickness is 50nm, then uses acetone
Photoresist is washed away, now prepared by the electrode of air vent side to complete；
Silicon substrate after the completion of S8 prepares the electrode of air vent side in S7 passes through a photoetching again, is leaned on beside electrode sidewall
The position of nearly air vent makes the groove of ZnO Seed Layers position by lithography；
Silicon substrate after photoetching in S8 is put into magnetron sputtering by S9, and the thick ZnO films of 200nm are sputtered on electrode sidewall surface, this
When electrode on ZnO Seed Layers prepare complete；
S10 is by the zinc nitrate hexahydrate (Zn (NO of equimolar ratio3)2·6H2O) and hexamethylenetetramine (HMTA) be dissolved in from
In sub- water, stir, be configured to 25mmol/L solution as precursor solution；
S11 takes 15mL precursor solutions to be put into hydrothermal reaction kettle, then the silicon substrate that ZnO Seed Layers have been prepared in S9 is put into hydro-thermal
In reactor, growing ZnO nano-wire is reacted at 80 DEG C, continues 8h；
S12 will grow the substrate taking-up for having ZnO nano-wire, is rinsed, is dried in nitrogen repeatedly with deionized water；
The substrate with ZnO nano-wire rinsed well in S12 is passed through a photoetching by S13 again, in air vent other side, i.e.,
Not growing has ZnO nano-wire side, makes the groove at electrode position by lithography；
Substrate after photoetching in S13 is put into magnetic control sputtering device by S14, high in the step of air vent other side first order step
Degree face and step upper surface sputter Ti, Al, Ni, Au layers successively, and each metal layer thickness is 50nm, then washes away photoetching with acetone
Glue, now prepared by the electrode of air vent other side to be completed, and now ZnO nanowire array is fixed between two electrodes, is just made
Into the main part of PM2.5 particulate matter quality senser elements.
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| CN108469407B (en) * | 2018-03-16 | 2021-01-12 | 中国石油大学(华东) | Device and method for detecting surface cleanliness |
| CN110231263B (en) * | 2019-05-23 | 2020-10-30 | 武汉大学 | PM2.5 mass sensor with self-cleaning function and preparation method thereof |
| CN110376256B (en) * | 2019-07-25 | 2022-03-29 | 天津大学 | Sensor based on nanowire array and suitable for colony cell particle detection and detection method using sensor |
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