CN104694900A - Eccentric compression type thin film sample holder - Google Patents
Eccentric compression type thin film sample holder Download PDFInfo
- Publication number
- CN104694900A CN104694900A CN201510138693.5A CN201510138693A CN104694900A CN 104694900 A CN104694900 A CN 104694900A CN 201510138693 A CN201510138693 A CN 201510138693A CN 104694900 A CN104694900 A CN 104694900A
- Authority
- CN
- China
- Prior art keywords
- bracket
- sample holder
- base
- eccentric compression
- film sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides an eccentric compression type thin film sample holder, by means of the sample holder, it is facilitated that positive and negative eccentric compression is loaded to a magnetron sputtering film plating machine sample holder, and a sample can be rotated. The eccentric compression type thin film sample holder comprises a bracket, a bracket base, a metal bearing, a connecting rod and a vacuum chamber base. By utilizing the characters of the bearing, an inner ring of the metal bearing is fixed on the connecting rod of the bracket, meanwhile, an outer ring extracts an electrode, and the vacuum chamber base and the bracket base are separated from each other through the connecting rod. Therefore, the difficult problems of rotating the bracket and connecting the electrode are solved, and the insulation of the electrode and a machine case is achieved. By means of the eccentric compression type thin film sample holder, the bracket can be rotated, and meanwhile continuous eccentric compression can be applied to the bracket, the structure is simple, and the use is convenient.
Description
Technical field
The invention belongs to the preparing technical field of thin-film material, being specifically related to one can biasing formula film sample frame, and magnetron sputtering coater specimen holder can be facilitated to load positive negative bias.
Background technology
In magnetron sputtering membrane process, in order to improve the homogeneity of film forming, can adopt and substrate is rotated, namely substrate is placed on the rotating pan, meanwhile, in order to improve the quality of film forming, improve the sticking power of film deposition rate and enhanced film and substrate, substrate biasing can be given.But directly DC electrode is connected with substrate according to electric wire, can be twisted at rotary course middle gear disconnected, thus cisco unity malfunction.In order to solve this difficult problem, we can improve original sample holder and can meet the needs of high quality film forming.
Summary of the invention
Can not the deficiency of simultaneously biasing and rotation in order to overcome specimen holder of the prior art, the invention provides one can biasing formula film sample frame, and magnetron sputtering coater specimen holder can be facilitated to load positive negative bias.
Of the present invention can biasing formula film sample frame, be characterized in, described specimen holder comprises bracket, bracket base, metal bearing, union lever and vacuum chamber base; Its annexation is, described bracket is fixedly connected on bracket base, and described union lever is arranged on the below of bracket base, and one end of union lever is fixedly connected with bracket, and the other end is fixedly connected with vacuum chamber base; Described metal bearing inner ring is fixed on union lever, and outer ring is connected with cable.
Described bracket, bracket base, metal bearing, union lever, vacuum chamber base are that concentric is arranged.
The present invention utilizes the characteristic of bearing, and the inner ring of metal bearing is fixed on bracket union lever, simultaneously outer ring extraction electrode, and union lever material is that tetrafluoroethylene can spaced apart by vacuum chamber base and bracket base.Like this, solve a difficult problem for rotary bracket and Electrode connection, also achieve the Insulation Problems of electrode and casing.
The invention has the beneficial effects as follows, can make carriage rotation, can apply to continue bias voltage to bracket again, structure is simple, easy to use simultaneously.
Accompanying drawing explanation
Fig. 1 be of the present invention can biasing formula film sample shelf structure schematic diagram;
In figure. 1. bracket 2. bracket base 3. metal bearing 4. union lever 5. vacuum chamber base.
Embodiment
Below in conjunction with drawings and Examples, the present invention is further described.
Embodiment 1
Fig. 1 be of the present invention can biasing formula film sample shelf structure schematic diagram.In FIG, specimen holder of the present invention comprises bracket 1, bracket base 2, metal bearing 3, union lever 4 and vacuum chamber base 5; Its annexation is, described bracket 1 is fixedly connected on bracket base 2, and described union lever 4 is arranged on the below of bracket base 2, and one end of union lever 4 is fixedly connected with bracket 1, and the other end is fixedly connected with vacuum chamber base 5; Described metal bearing 3 inner ring is fixed on union lever 4, and outer ring is connected with cable.The material of bracket 1 is tetrafluoroethylene.Like this, solve a difficult problem for rotary bracket 1 and Electrode connection, also achieve the Insulation Problems of electrode and casing.
Described bracket 1, bracket base 2, metal bearing 3, union lever 4, vacuum chamber base 5 are concentric setting.
Claims (2)
1. can biasing formula film sample frame, it is characterized in that, described specimen holder comprises bracket (1), bracket base (2), metal bearing (3), union lever (4) and vacuum chamber base (5); Its annexation is, described bracket (1) is fixedly connected on bracket base (2), described union lever (4) is arranged on the below of bracket base (2), and one end of union lever (4) is fixedly connected with bracket (1), and the other end is fixedly connected with vacuum chamber base (5); Described metal bearing (3) inner ring is fixed on union lever (4), outer ring is connected with cable.
2. according to claim 1 can biasing formula film sample frame, it is characterized in that, described bracket (1), bracket base (2), metal bearing (3), union lever (4), vacuum chamber base (5) are that concentric is arranged.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510138693.5A CN104694900A (en) | 2015-03-27 | 2015-03-27 | Eccentric compression type thin film sample holder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510138693.5A CN104694900A (en) | 2015-03-27 | 2015-03-27 | Eccentric compression type thin film sample holder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104694900A true CN104694900A (en) | 2015-06-10 |
Family
ID=53342437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510138693.5A Pending CN104694900A (en) | 2015-03-27 | 2015-03-27 | Eccentric compression type thin film sample holder |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104694900A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109837520A (en) * | 2018-12-20 | 2019-06-04 | 兰州空间技术物理研究所 | The shaft and installation method of the rotational workpieces of voltage and temperature measurement signal coaxial conductive |
| CN113237842A (en) * | 2021-04-25 | 2021-08-10 | 哈尔滨工业大学 | Fourier infrared spectrometer sample rack and using method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS619570A (en) * | 1984-06-22 | 1986-01-17 | Tanaka Kikinzoku Kogyo Kk | Manufacture of thin film |
| JPS61233957A (en) * | 1985-04-10 | 1986-10-18 | Nippon Shinku Kogaku Kk | High-frequency ion bombardment device |
| CN2903094Y (en) * | 2006-01-26 | 2007-05-23 | 大连理工大学 | Furnace body of substituted electroplating equipment by bidirectional ion plating magnetic controlling sputtering |
| US20100326815A1 (en) * | 2002-11-14 | 2010-12-30 | Zond, Inc. | High Power Pulse Ionized Physical Vapor Deposition |
| CN204529970U (en) * | 2015-03-27 | 2015-08-05 | 中国工程物理研究院激光聚变研究中心 | Can biasing formula film sample frame |
-
2015
- 2015-03-27 CN CN201510138693.5A patent/CN104694900A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS619570A (en) * | 1984-06-22 | 1986-01-17 | Tanaka Kikinzoku Kogyo Kk | Manufacture of thin film |
| JPS61233957A (en) * | 1985-04-10 | 1986-10-18 | Nippon Shinku Kogaku Kk | High-frequency ion bombardment device |
| US20100326815A1 (en) * | 2002-11-14 | 2010-12-30 | Zond, Inc. | High Power Pulse Ionized Physical Vapor Deposition |
| CN2903094Y (en) * | 2006-01-26 | 2007-05-23 | 大连理工大学 | Furnace body of substituted electroplating equipment by bidirectional ion plating magnetic controlling sputtering |
| CN204529970U (en) * | 2015-03-27 | 2015-08-05 | 中国工程物理研究院激光聚变研究中心 | Can biasing formula film sample frame |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109837520A (en) * | 2018-12-20 | 2019-06-04 | 兰州空间技术物理研究所 | The shaft and installation method of the rotational workpieces of voltage and temperature measurement signal coaxial conductive |
| CN113237842A (en) * | 2021-04-25 | 2021-08-10 | 哈尔滨工业大学 | Fourier infrared spectrometer sample rack and using method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150610 |