CN104674478A - Device utilizing nanometer silicon dioxide water solution to treat Teflon high-temperature cloth - Google Patents
Device utilizing nanometer silicon dioxide water solution to treat Teflon high-temperature cloth Download PDFInfo
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- CN104674478A CN104674478A CN201510095143.XA CN201510095143A CN104674478A CN 104674478 A CN104674478 A CN 104674478A CN 201510095143 A CN201510095143 A CN 201510095143A CN 104674478 A CN104674478 A CN 104674478A
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Abstract
The invention relates to a device utilizing a nanometer silicon dioxide water solution to treat a Teflon high-temperature cloth. The device comprises an uncoiling roll, a coating roll, a coiling roll, an oven, a material discharging cylinder and at least one transition roll, wherein each transition roll is arranged in the oven; a material discharging bucket is arranged between the uncoiling roll and the coating roll; the nanometer silicon dioxide water solution is contained in the material discharging bucket; a pipeline is arranged at the bottom part of the material discharging cylinder and is arranged above a guide coating roll, and the uncoiling roll, the coating roll, the coiling roll and the transition roll are arranged in parallel. The silicon dioxide water solution is uniformly coated on the surface of the Teflon high-temperature cloth by the coating roll; a coated material belt is sent into the oven; three temperature areas are arranged in the oven; the material belt enters the oven and sequentially passes through the three temperature areas to be dried, and then the material belt is reversed by the transition roll at the top part of the interior of the oven, passes through the three temperature areas to be dried again, and is coiled by the oven. The device has the advantages that the arrangement is reasonable, and the space is saved, and the efficiency is effectively improved.
Description
Technical field
The present invention relates to a kind of device processing Teflon high-temperature cloth, be specifically related to a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth.
Background technology
Polytetrafluoroethylfiberglass fiberglass adhesive tape, another name Teflon adhesive tape, Teflon adhesive tape, polytetrafluoroethylene (PTFE) adhesive tape etc., polytetrafluoroethylfiberglass fiberglass adhesive tape production process selects glass fabric to make polytetrafluoroethylene (PTFE) high temperature cloth through coating polytetrafluoroethylene (PTFE) (PTFE) resin, one deck high-temperature resistant silicone pressure sensitive adhesive is coated with again on tetrafluoroethylene high temperature cloth surface, produce polytetrafluoroethylfiberglass fiberglass adhesive tape, due to the extremely stability on polytetrafluoroethylene (PTFE) high temperature cloth surface, when producing adhesive tape, directly pressure sensitive adhesive can not be coated with.For many years, people are in order to improve the adhesive property on its surface, invent various surface treatment method, comprising naphthalene sodium facture, high-temperature melting method, radiation graft process, plasma method, electrolytic reduction, laser treatment method etc., four kinds of methods next under airtight environment, must cannot be used for industrial production.
The main stream approach of current employing is naphthalene sodium facture, and naphthalene sodium facture sees domestic literature the earliest, and this is a kind of chemical treatment method, mainly by corrosive liquid and PTFE surface, chemical reaction occurs, tears off the part fluorine atom on surface.At this moment carburization zone and some polar group is left from the teeth outwards.This be in the method for at present research effect better, more classical method, but also there are some distinct disadvantage, as: the adherend dimmed or blackening in surface, sheet resistance reduces in high temperature environments, under being chronically exposed to illumination, bonding property will descend degradation greatly, be exactly secondly in naphthalene sodium processing procedure, need to use sodium metal, organic matter naphthalene, and organic solvent tetrahydrofuran.It is inflammable and explosive that water met by sodium metal, and in industrial production, naphthalene and sodium stirred through 5-6 hour the mixed solution produced in organic solvent tetrahydrofuran, had very high activity, extremely inflammable, in production process in the past, had occurred a lot of security incident.Behind mixed solution process Teflon high-temperature cloth surface, remain in the residue on surface, wash away through superheated water and cold water, directly enter environment, cause serious pollution, irreversible pollution can be caused to environment.
Method common is in addition high-temperature melting method, and its general principle is: at high temperature, and the crystal habit that PTFE is shown changes, and embeds high, the easily glutinous material of some surface energy as SiO2.Will form in PTFE face after such cooling that one deck is embedded with can the modified layer of adhesive material.Because the molecule of easy sticky thing has entered in people PTFE surface molecules, change layer be just equivalent to intermolecular destruction so destroy this, adhesive strength is very high.The point of this method is that weatherability, humidity resistance are more remarkable than additive method, is suitable for long-term outdoor and uses.The people such as Guo Jinyan [4] propose one and improve one's methods, but this method, be applicable to sheet material, be not suitable for the online a large amount of of coiled strip and produce, and length consuming time, therefore can not be applied to the process of Teflon high-temperature cloth.
Summary of the invention
For overcoming deficiency of the prior art, the object of the present invention is to provide a kind of for the nano silicon aqueous solution, its application on polytetrafluoroethylfiberglass fiberglass adhesive tape and the device realized needed for this application.
For reaching above object, the technical scheme that the present invention takes is:
A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth, comprise let off roll, applicator roll, wind-up roll, baking oven, blowing cylinder and at least one transition roller be arranged in baking oven, described discharging barrel is arranged between let off roll and applicator roll, described discharging barrel is built with the nano silicon aqueous solution, be provided with the pipeline above guiding applicator roll bottom described blowing cylinder, described let off roll, applicator roll, wind-up roll and transition roller be arranged in parallel.
Further, described baking oven is vertically arranged, baking oven bottom opening, described transition roller is arranged at the top in baking oven, described applicator roll is arranged at immediately below baking oven, described let off roll and wind-up roll are distributed in the both sides of baking oven, are provided with dance roller between described let off roll and applicator roll, are respectively provided with dance roller between described wind-up roll and baking oven.
Further, the warm area of multiple different temperatures is provided with in described baking oven from bottom to top successively.
Further, described pipeline is provided with control valve.
Further, the bottom of described applicator roll is provided with collecting tank.
Again further, described baking oven top is provided with ventilating fan.
After taking above technical scheme, beneficial effect of the present invention is:
The nano silicon aqueous solution replaces naphthalene sodium facture not relate to sodium metal, organic matter naphthalene, organic solvent tetrahydrofuran, reduces the pollution of environment and damages workman's health; In nano silicon treatment fluid, add polytetrafluoroethylene (PTFE) dispersion emulsion, be convenient to nano silicon treatment fluid better can adhere on polytetrafluoroethylfiberglass fiberglass adhesive tape; Add fluorine surfactant to reduce the surface tension for the treatment of fluid drop, be convenient to the surface being paved with polytetrafluoroethylfiberglass fiberglass adhesive tape better of dispersion liquid.
With coating apparatus, the nano silicon aqueous solution is spread evenly across Teflon high-temperature cloth on the surface, can guarantee evenly, be coated with rear first through the low-temperature space of 70-90 DEG C, by the moisture removing in aqueous silica solution, make cloth cover dry, warm area in 220-280 DEG C again, the additive that in removing aqueous silica solution, boiling point is higher, finally the high-temperature region of 360-380 DEG C, the polytetrafluoroethylene (PTFE) and nanometer silicon dioxide particle that are attached to Teflon high-temperature cloth surface are together melted, such nano silicon is just embedded in Teflon cloth surface well, technique is simple, pollution-free, and it is effective.
The present invention utilizes applicator roll that aqueous silica solution is spread evenly across Teflon high-temperature cloth on the surface, material strip after coating enters into baking oven, three warm areas are provided with in baking oven, material strip is dried through three warm areas after entering baking oven successively, baking oven rolling after three warm areas are dried again after being commutated by the excessive roller of baking oven inner top again, device is arranged rationally, has saved space, has effectively improve efficiency.
Accompanying drawing explanation
Fig. 1 is the structural representation of the device utilizing nano silicon aqueous solution process Teflon high-temperature cloth.
In figure: let off roll 1, applicator roll 2, wind-up roll 3, dance roller 4, baking oven 5, transition roller 6, discharging barrel 7, collecting tank 8, control valve 9, ventilating fan 10.
Detailed description of the invention
Below embodiment is further described:
A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth, comprise let off roll 1, applicator roll 2, wind-up roll 3, dance roller 4, baking oven 5, transition roller 6, discharging barrel 7, collecting tank 8, control valve 9 and ventilating fan 10, described let off roll 1 and wind-up roll 3 are distributed in the both sides of baking oven 5 respectively, described applicator roll 2 is arranged at immediately below baking oven 5, described discharging barrel 7 is arranged at the top between let off roll 1 and applicator roll 2, discharging barrel 7 is built with the nano silicon aqueous solution, described discharging barrel 7 is provided with the pipeline of guiding applicator roll 2, pipeline is provided with the control valve 9 of adjust flux, the collecting tank 8 collecting surplus solution is provided with immediately below applicator roll 2, described baking oven 5 is vertical drying oven, baking oven 5 bottom opening, top in baking oven 5 is provided with transition roller 6, baking oven top is provided with ventilating fan 10, low temperature, middle temperature, high temperature three temperature provinces are provided with from bottom to top successively in described baking oven 5, the bottom opening of described baking oven 5, described baking oven 5 and and wind-up roll 3 between be provided with for transition, lead with the dance roller 4 of adjustment of tonicity, be provided with dance roller 4 between described let off roll 1 and applicator roll 2.
This device operation principle is: Teflon high-temperature cloth has let off roll 1 to unreel through applicator roll 2, the nano silicon aqueous solution in discharging barrel 7 is applied on the surface of Teflon high-temperature cloth by applicator roll 2, Teflon high-temperature cloth after coating enters baking oven bottom baking oven 5, successively through 70-90 DEG C low-temperature space, warm area in 220-280 DEG C, 360-380 DEG C high-temperature region, transition roller 6 through baking oven top is going out baking oven after commutating behind these three humidity provinces bottom baking oven 5, then to wind-up roll 3 rolling after being regulated by dance roller 4.
Claims (6)
1. one kind utilizes the device of nano silicon aqueous solution process Teflon high-temperature cloth, it is characterized in that, comprise let off roll, applicator roll, wind-up roll, baking oven, blowing cylinder and at least one transition roller be arranged in baking oven, described discharging barrel is arranged between let off roll and applicator roll, described discharging barrel is built with the nano silicon aqueous solution, be provided with the pipeline above guiding applicator roll bottom described blowing cylinder, described let off roll, applicator roll, wind-up roll and transition roller be arranged in parallel.
2. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 1, it is characterized in that, described baking oven is vertically arranged, baking oven bottom opening, described transition roller is arranged at the top in baking oven, and described applicator roll is arranged at immediately below baking oven, and described let off roll and wind-up roll are distributed in the both sides of baking oven, be provided with dance roller between described let off roll and applicator roll, between described wind-up roll and baking oven, be respectively provided with dance roller.
3. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 1 and 2, is characterized in that, be provided with the warm area of multiple different temperatures in described baking oven from bottom to top successively.
4. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 1, it is characterized in that, described pipeline is provided with control valve.
5. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 1, it is characterized in that, the bottom of described applicator roll is provided with collecting tank.
6. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 1, it is characterized in that, described baking oven top is provided with ventilating fan.
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1628041A (en) * | 2001-12-20 | 2005-06-15 | 宝洁公司 | Articles and methods for applying color on surfaces |
CN101939257A (en) * | 2007-12-19 | 2011-01-05 | 3M创新有限公司 | Precisely-shaped porous particles |
CN203683813U (en) * | 2013-12-10 | 2014-07-02 | 东华大学 | System for preparing prepreg yarn by powder coating method |
CN104884704A (en) * | 2012-08-23 | 2015-09-02 | 绿色主题科技有限责任公司 | Chemical stick finishing method and apparatus |
CN204644655U (en) * | 2015-03-04 | 2015-09-16 | 江苏东剑材料科技有限公司 | A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth |
-
2015
- 2015-03-04 CN CN201510095143.XA patent/CN104674478A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1628041A (en) * | 2001-12-20 | 2005-06-15 | 宝洁公司 | Articles and methods for applying color on surfaces |
CN101939257A (en) * | 2007-12-19 | 2011-01-05 | 3M创新有限公司 | Precisely-shaped porous particles |
CN104884704A (en) * | 2012-08-23 | 2015-09-02 | 绿色主题科技有限责任公司 | Chemical stick finishing method and apparatus |
CN203683813U (en) * | 2013-12-10 | 2014-07-02 | 东华大学 | System for preparing prepreg yarn by powder coating method |
CN204644655U (en) * | 2015-03-04 | 2015-09-16 | 江苏东剑材料科技有限公司 | A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth |
Non-Patent Citations (1)
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郭金彦等: "《熔融法处理聚四氟乙烯表面的改进》", 《中国胶黏剂》 * |
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Application publication date: 20150603 |