CN104693850A - Preparation method of nano-silicon dioxide aqueous solution - Google Patents
Preparation method of nano-silicon dioxide aqueous solution Download PDFInfo
- Publication number
- CN104693850A CN104693850A CN201510096052.8A CN201510096052A CN104693850A CN 104693850 A CN104693850 A CN 104693850A CN 201510096052 A CN201510096052 A CN 201510096052A CN 104693850 A CN104693850 A CN 104693850A
- Authority
- CN
- China
- Prior art keywords
- parts
- add
- preparation
- aqueous solution
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention relates to a preparation method of a nano-silicon dioxide aqueous solution. The preparation method of the nano-silicon dioxide aqueous solution comprises the following steps: (1) adding 1-3 parts of sodium hexametaphosphate into 60-80 parts of deionized water, adjusting the pH value of the solution to 3-5 by using acetic acid, and adding 14-17 parts of gas phase silicon powder at one time; (2) firstly dispersing the gas phase silicon powder for 15-25 minutes by using a high-speed stirrer, then emulsifying the gas phase silicon powder for 15-25 minutes by a high-speed emulsifying and shearing machine to prepare a silicon dioxide dispersion solution, and finally adjusting the pH value of the dispersion solution to be neutral by using ammonia water; and (3) adding 10 parts of deionized water into one part of the prepared dispersion solution, firstly adding 0.1-0.3 part of 50-70% polytetrafluoroethylene dispersion emulsion, fully stirring, then adding 0.02-0.06 part of a fluorinated surfactant and fully stirring to prepare a nano-silicon dioxide treatment solution.
Description
Technical field
The present invention relates to a kind of nano silicon aqueous solution, be specifically related to the preparation of the nano silicon aqueous solution.
Background technology
Polytetrafluoroethylfiberglass fiberglass adhesive tape, another name Teflon adhesive tape, Teflon adhesive tape, tetrafluoroethylene adhesive tape etc., polytetrafluoroethylfiberglass fiberglass adhesive tape production process selects glasscloth to make tetrafluoroethylene high temperature cloth through coating tetrafluoroethylene (PTFE) resin, one deck high-temperature resistant silicone pressure sensitive adhesive is coated with again on tetrafluoroethylene high temperature cloth surface, produce polytetrafluoroethylfiberglass fiberglass adhesive tape, due to the extremely stability on tetrafluoroethylene high temperature cloth surface, when producing adhesive tape, directly pressure sensitive adhesive can not be coated with.For many years, people are in order to improve the adhesiveproperties on its surface, invent various surface treatment method, comprising naphthalene sodium facture, high-temperature melting method, radiation graft process, plasma method, electrolytic reduction, laser treatment method etc., four kinds of methods next under airtight environment, must cannot be used for industrial production.
The main stream approach of current employing is naphthalene sodium facture, and naphthalene sodium facture sees domestic literature the earliest, and this is a kind of chemical treatment method, mainly by corrosive fluid and PTFE surface, chemical reaction occurs, tears off the part fluorine atom on surface.At this moment carburization zone and some polar group is left from the teeth outwards.This be in the method for at present research effect better, more classical method, but also there are some distinct disadvantage, as: the adherend dimmed or blackening in surface, surface resistivity reduces in high temperature environments, long-term exposure under light illumination bonding property will descend degradation greatly, be exactly secondly in naphthalene sodium treating processes, need to use sodium Metal 99.5, organism naphthalene, and organic solvent tetrahydrofuran.It is inflammable and explosive that water met by sodium Metal 99.5, and in industrial production, naphthalene and sodium stirred through 5-6 hour the mixing solutions produced in organic solvent tetrahydrofuran, had very high activity, extremely inflammable, in production process in the past, had occurred a lot of security incident.Behind mixing solutions process Teflon high-temperature cloth surface, remain in the residue on surface, wash away through superheated water and cold water, directly enter environment, cause serious pollution, irreversible pollution can be caused to environment.
Method common is in addition high-temperature melting method, and its ultimate principle is: at high temperature, and the crystal habit that PTFE is shown changes, and embeds high, the easily glutinous material of some surface energy as SiO2.Will form in PTFE face after such cooling that one deck is embedded with can the modified layer of adhesive material.Because the molecule of easy sticky thing has entered in people PTFE surface molecules, change layer be just equivalent to intermolecular destruction so destroy this, bonding strength is very high.The point of this method is that weathering resistance, humidity resistance are more remarkable than additive method, is suitable for long-term outdoor and uses.The people such as Guo Jinyan [4] propose one and improve one's methods, but this method, be applicable to sheet material, be not suitable for the online a large amount of of coiled strip and produce, and length consuming time, therefore can not be applied to the process of Teflon high-temperature cloth.
Summary of the invention
For overcoming deficiency of the prior art, the object of the present invention is to provide a kind of for the nano silicon aqueous solution, its application on polytetrafluoroethylfiberglass fiberglass adhesive tape and the device realized needed for this application.
For reaching above object, the technical scheme that the present invention takes is:
A kind of preparation method of the nano silicon aqueous solution, it is characterized in that, comprise the following steps: the Sodium hexametaphosphate 99 of 1-3 part is added in the deionized water of 60 ~ 80 parts by (1), disposablely after the pH value of this solution being adjusted to 3-5 with acetic acid add 14-17 part gas phase silica flour; (2) first disperse 15-25min with homogenizer, then with emulsify at a high speed shears emulsification 15-25min, obtained silica dispersions, is finally adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 50%-70% of 0.1-0.3 part, fully stir, then add the fluorine surfactant of 0.02-0.06 part, abundant stirring, prepares nano silicon treatment solution.
Further, the diameter of described gas phase silica flour is 10-20nm.
After taking above technical scheme, beneficial effect of the present invention is:
The nano silicon aqueous solution replaces naphthalene sodium facture not relate to sodium Metal 99.5, organism naphthalene, organic solvent tetrahydrofuran, reduces the pollution of environment and damages workman's health; In nano silicon treatment solution, add tetrafluoroethylene dispersion emulsion, be convenient to nano silicon treatment solution better can adhere on polytetrafluoroethylfiberglass fiberglass adhesive tape; Add fluorine surfactant to reduce the surface tension for the treatment of solution drop, be convenient to the surface being paved with polytetrafluoroethylfiberglass fiberglass adhesive tape better of dispersion liquid.
Embodiment
Below the embodiment of the preparation method of the nano silicon aqueous solution is further described:
Embodiment one
(1) be added into by the Sodium hexametaphosphate 99 of 1-3 part in the deionized water of 60 parts, disposable after the pH value of this solution being adjusted to 3 with acetic acid to add 14 parts of diameters be 10 gas phase silica flours; (2) first disperse 15min with homogenizer, then with emulsify at a high speed shears emulsification 15min, obtained silica dispersions, is adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 50% of 0.1 part, fully stir, then add the Capstone FS-31 fluorine surfactant of 0.02 part, abundant stirring, prepares nano silicon treatment solution.
Embodiment two
(1) Sodium hexametaphosphate 99 of 1-3 part is added in the deionized water of 80 parts, disposablely after the pH value of this solution being adjusted to 5 with acetic acid adds 17 parts of diameters for 20nm gas phase silica flour; (2) first disperse 25min with homogenizer, then with emulsify at a high speed shears emulsification 25min, obtained silica dispersions, is adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 50%-70% of 0.3 part, abundant stirring, add the Capstone FS-31 fluorine surfactant of 0.06 part again, abundant stirring, prepares nano silicon treatment solution.
Embodiment three
(1) be added into by the Sodium hexametaphosphate 99 of 1-3 part in the deionized water of 70 parts, after the pH value of this solution being adjusted to 4 with acetic acid, disposable 14-17 part diameter that adds is for 15nm gas phase silica flour; (2) first disperse 20min with homogenizer, then with emulsify at a high speed shears emulsification 20min, obtained silica dispersions, is adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 60% of 0.2 part, fully stir, then add the Capstone FS-31 fluorine surfactant of 0.04 part, abundant stirring, prepares nano silicon treatment solution.
The nano silicon aqueous solution of the preparation in above three embodiments is respectively used in the preparation of Teflon high-temperature cloth, preparation technology is: use coating apparatus that the nano silicon aqueous solution is spread evenly across Teflon high-temperature cloth surface, Teflon high-temperature cloth successively in the low temperature of 70-90 DEG C, 220-280 DEG C the high temperature of temperature, 360-380 DEG C toast 40s-60s respectively, finally by Teflon high-temperature cloth rolling.
Test the Teflon high-temperature cloth after rolling, the performance of Teflon high-temperature cloth is all up to standard.
Claims (2)
1. the preparation method of a nano silicon aqueous solution, it is characterized in that, comprise the following steps: the Sodium hexametaphosphate 99 of 1-3 part is added in the deionized water of 60 ~ 80 parts by (1), disposablely after the pH value of this solution being adjusted to 3-5 with acetic acid add 14-17 part gas phase silica flour; (2) first disperse 15-25min with homogenizer, then with emulsify at a high speed shears emulsification 15-25min, obtained silica dispersions, is finally adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 50%-70% of 0.1-0.3 part, fully stir, then add the fluorine surfactant of 0.02-0.06 part, abundant stirring, prepares nano silicon treatment solution.
2. the preparation method of a kind of nano silicon aqueous solution according to claim 1, is characterized in that, the diameter of described gas phase silica flour is 10-20nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510096052.8A CN104693850A (en) | 2015-03-04 | 2015-03-04 | Preparation method of nano-silicon dioxide aqueous solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510096052.8A CN104693850A (en) | 2015-03-04 | 2015-03-04 | Preparation method of nano-silicon dioxide aqueous solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104693850A true CN104693850A (en) | 2015-06-10 |
Family
ID=53341419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510096052.8A Pending CN104693850A (en) | 2015-03-04 | 2015-03-04 | Preparation method of nano-silicon dioxide aqueous solution |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104693850A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1536032A (en) * | 2003-04-07 | 2004-10-13 | 章浩龙 | Nano silicon dioxide emulsion, its preparation method and application |
| US20070036980A1 (en) * | 2004-03-31 | 2007-02-15 | Freudenberg-Nok General Partnership | Polytetrafluoroethylene composites |
| CN101074298A (en) * | 2007-05-28 | 2007-11-21 | 陈仕明 | Formulation of naphthalene-sodium treating fluid and treatment of polytetrafluoroethylene product |
| CN104693848A (en) * | 2015-03-04 | 2015-06-10 | 江苏东剑材料科技有限公司 | Preparation method and application of nano silicon dioxide water solution, and device for implementing application |
-
2015
- 2015-03-04 CN CN201510096052.8A patent/CN104693850A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1536032A (en) * | 2003-04-07 | 2004-10-13 | 章浩龙 | Nano silicon dioxide emulsion, its preparation method and application |
| US20070036980A1 (en) * | 2004-03-31 | 2007-02-15 | Freudenberg-Nok General Partnership | Polytetrafluoroethylene composites |
| CN101074298A (en) * | 2007-05-28 | 2007-11-21 | 陈仕明 | Formulation of naphthalene-sodium treating fluid and treatment of polytetrafluoroethylene product |
| CN104693848A (en) * | 2015-03-04 | 2015-06-10 | 江苏东剑材料科技有限公司 | Preparation method and application of nano silicon dioxide water solution, and device for implementing application |
Non-Patent Citations (3)
| Title |
|---|
| 丁虹: "《纳米粉体水悬浮液的制备及其在外墙涂料中的应用研究》", 《中国优秀博硕士学位论文全文数据库（硕士）工程科技Ⅱ辑》 * |
| 汪萍: "《聚四氟乙烯粘结技术的研究》", 《粘结》 * |
| 郭金彦等: "《熔融法处理聚四氟乙烯表面的改进》", 《中国胶粘剂》 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104371076A (en) | Method of synthesizing polycarboxylate superplasticizer at normal temperature | |
| CN105273471B (en) | Water-soluble nano silver conductive coating | |
| CN104475752A (en) | Graphene/bismuth composite material and modifying method of screen printed electrode | |
| CN109251636A (en) | The preparation process of high transparency waterborne conductive coating | |
| CN109100397B (en) | Flexible planar ammonia gas sensor based on nano sensitive material and application thereof | |
| CN105273186A (en) | Preparation method of graphene oxide-polyaniline composite electromagnetic shielding material | |
| CN104693848A (en) | Preparation method and application of nano silicon dioxide water solution, and device for implementing application | |
| CN104109493B (en) | Formula and preparation technology of methyl cellulose-casein mixed label adhesive | |
| CN104693850A (en) | Preparation method of nano-silicon dioxide aqueous solution | |
| CN107799204B (en) | A kind of touch screen graphene conductive film and preparation method thereof | |
| CN104693849A (en) | Preparation technique of nano silicon dioxide water solution | |
| CN103626228A (en) | Flaky Bi2S3 powder preparation method | |
| CN102432901A (en) | Method for treating surface of polytetrafluoroethylene product with sodium naphthalene solution | |
| CN103522560B (en) | The preparation method of a kind of uvioresistant, heat-resisting BOPET film | |
| Yanfei et al. | Temperature dependence of pattern transitions on water surface in contact with DC microplasmas | |
| Yu et al. | Thermochromic hydrogels with an adjustable critical response temperature for temperature monitoring and smart windows | |
| CN102942809B (en) | The preparation method of the ultra-fine Matrii Sulfas Exsiccatus containing organic alloy | |
| CN104674478A (en) | Device utilizing nanometer silicon dioxide water solution to treat Teflon high-temperature cloth | |
| WO2016078154A1 (en) | Styrene-acrylic emulsion intumescent fire retardant coating and preparation method | |
| CN103963307A (en) | Black bulking biaxially-oriented polyterafluoroethylene film for electronic industry and preparation method of black bulking biaxially-oriented polyterafluoroethylene film | |
| CN103539107A (en) | Preparation method of graphene conductive paper with controllable conductivity | |
| CN105293481A (en) | Method for ultrasonically cutting graphene oxide | |
| CN109837498A (en) | A kind of method in indirect dispersion-strengtherning platinum channel | |
| Ren et al. | Investigation of healing electronic pressure-sensitive soft switch based on liquid metal microfiber | |
| Dimitriev et al. | Quantum Yield of the Emission of Carbon Quantum Dots: Tricks Due to Solvent Polarity and Excitation Dynamics |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150610 |
|
| WD01 | Invention patent application deemed withdrawn after publication |