CN104693848A - Preparation method and application of nano silicon dioxide water solution, and device for implementing application - Google Patents
Preparation method and application of nano silicon dioxide water solution, and device for implementing application Download PDFInfo
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- CN104693848A CN104693848A CN201510095357.7A CN201510095357A CN104693848A CN 104693848 A CN104693848 A CN 104693848A CN 201510095357 A CN201510095357 A CN 201510095357A CN 104693848 A CN104693848 A CN 104693848A
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Abstract
The invention relates to a preparation method and application of a nano silicon dioxide water solution, and a device for implementing the application. The preparation method comprises the following steps: adding sodium hexametaphosphate into deionized water, regulating the pH value to 3-5, and adding vapor-phase silicon powder at one time; dispersing with a high-speed stirrer, and emulsifying with a high-speed emulsification shearing machine or grinding with a sand mill to obtain a silicon dioxide dispersion solution, and finally, regulating the pH value of the dispersion solution to neutrality with ammonia water; and adding deionized water into the dispersion solution for dilution, adding a polytetrafluoroethylene dispersion emulsion, sufficiently stirring, adding a fluorosurfactant, and sufficiently stirring to prepare the nano silicon dioxide treatment solution. The application method comprises the following steps: uniformly coating the nano silicon dioxide water solution onto a teflon high-temperature fabric surface by using a coating apparatus, baking the teflon high-temperature fabric sequentially at the low temperature of 70-90 DEG C, moderate temperature of 220-280 DEG C and high temperature of 360-380 DEG C respectively for 40-60 seconds, and finally, rolling the teflon high-temperature fabric.
Description
Technical field
The present invention relates to a kind of nano silicon aqueous solution, be specifically related to the preparation of the nano silicon aqueous solution, application and implement the device of this application.
Background technology
Polytetrafluoroethylfiberglass fiberglass adhesive tape, another name Teflon adhesive tape, Teflon adhesive tape, tetrafluoroethylene adhesive tape etc., polytetrafluoroethylfiberglass fiberglass adhesive tape production process selects glasscloth to make tetrafluoroethylene high temperature cloth through coating tetrafluoroethylene (PTFE) resin, one deck high-temperature resistant silicone pressure sensitive adhesive is coated with again on tetrafluoroethylene high temperature cloth surface, produce polytetrafluoroethylfiberglass fiberglass adhesive tape, due to the extremely stability on tetrafluoroethylene high temperature cloth surface, when producing adhesive tape, directly pressure sensitive adhesive can not be coated with.For many years, people are in order to improve the adhesiveproperties on its surface, invent various surface treatment method, comprising naphthalene sodium facture, high-temperature melting method, radiation graft process, plasma method, electrolytic reduction, laser treatment method etc., four kinds of methods next under airtight environment, must cannot be used for industrial production.
The main stream approach of current employing is naphthalene sodium facture, and naphthalene sodium facture sees domestic literature the earliest, and this is a kind of chemical treatment method, mainly by corrosive fluid and PTFE surface, chemical reaction occurs, tears off the part fluorine atom on surface.At this moment carburization zone and some polar group is left from the teeth outwards.This be in the method for at present research effect better, more classical method, but also there are some distinct disadvantage, as: the adherend dimmed or blackening in surface, surface resistivity reduces in high temperature environments, long-term exposure under light illumination bonding property will descend degradation greatly, be exactly secondly in naphthalene sodium treating processes, need to use sodium Metal 99.5, organism naphthalene, and organic solvent tetrahydrofuran.It is inflammable and explosive that water met by sodium Metal 99.5, and in industrial production, naphthalene and sodium stirred through 5-6 hour the mixing solutions produced in organic solvent tetrahydrofuran, had very high activity, extremely inflammable, in production process in the past, had occurred a lot of security incident.Behind mixing solutions process Teflon high-temperature cloth surface, remain in the residue on surface, wash away through superheated water and cold water, directly enter environment, cause serious pollution, irreversible pollution can be caused to environment.
Method common is in addition high-temperature melting method, and its ultimate principle is: at high temperature, and the crystal habit that PTFE is shown changes, and embeds high, the easily glutinous material of some surface energy as SiO2.Will form in PTFE face after such cooling that one deck is embedded with can the modified layer of adhesive material.Because the molecule of easy sticky thing has entered in people PTFE surface molecules, change layer be just equivalent to intermolecular destruction so destroy this, bonding strength is very high.The point of this method is that weathering resistance, humidity resistance are more remarkable than additive method, is suitable for long-term outdoor and uses.The people such as Guo Jinyan [4] propose one and improve one's methods, but this method, be applicable to sheet material, be not suitable for the online a large amount of of coiled strip and produce, and length consuming time, therefore can not be applied to the process of Teflon high-temperature cloth.
Summary of the invention
For overcoming deficiency of the prior art, the object of the present invention is to provide a kind of for the nano silicon aqueous solution, its application on polytetrafluoroethylfiberglass fiberglass adhesive tape and the device realized needed for this application.
For reaching above object, the technical scheme that the present invention takes is:
A kind of preparation method of the nano silicon aqueous solution, it is characterized in that, comprise the following steps: the Sodium hexametaphosphate 99 of 1-3 part is added in the deionized water of 60 ~ 80 parts by (1), disposablely after the pH value of this solution being adjusted to 3-5 with acetic acid add 14-17 part gas phase silica flour; (2) first disperse 15-25min with homogenizer, then with emulsify at a high speed shears emulsification 15-25min or with sand mill mill 15-25min, obtain silica dispersions, finally with ammoniacal liquor, the pH value of dispersion liquid is adjusted to neutrality; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, the concentration first adding 0.1-0.3 part is the tetrafluoroethylene dispersion emulsion of 50%-70%, fully stirs, then adds the fluorine surfactant of 0.02-0.06 part, abundant stirring, prepares nano silicon treatment solution.
Further, the diameter of described gas phase silica flour is 10-20nm.
The application of the nano silicon aqueous solution in Teflon high-temperature cloth, use coating apparatus that the nano silicon aqueous solution is spread evenly across Teflon high-temperature cloth surface, Teflon high-temperature cloth successively in the low temperature of 70-90 DEG C, 220-280 DEG C the high temperature of temperature, 360-380 DEG C toast 40s-60s respectively, finally by Teflon high-temperature cloth rolling.
A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth, comprise let off roll, coating roll, wind-up roll, baking oven, blowing cylinder and at least one transition roller be arranged in baking oven, described discharging barrel is arranged between let off roll and coating roll, described discharging barrel is built with the nano silicon aqueous solution, be provided with the pipeline above guiding coating roll bottom described blowing cylinder, described let off roll, coating roll, wind-up roll and transition roller be arranged in parallel.
Further, described baking oven is vertically arranged, baking oven bottom opening, described transition roller is arranged at the top in baking oven, described coating roll is arranged at immediately below baking oven, described let off roll and wind-up roll are distributed in the both sides of baking oven, are provided with dancer roll between described let off roll and coating roll, are respectively provided with dancer roll between described wind-up roll and baking oven.
Further, the warm area of multiple differing temps is provided with in described baking oven from bottom to top successively.
Further, described pipeline is provided with variable valve.
Further, the bottom of described coating roll is provided with intercepting basin.
Again further, described baking oven top is provided with exhaust fan.
After taking above technical scheme, beneficial effect of the present invention is:
The nano silicon aqueous solution replaces naphthalene sodium facture not relate to sodium Metal 99.5, organism naphthalene, organic solvent tetrahydrofuran, reduces the pollution of environment and damages workman's health; In nano silicon treatment solution, add tetrafluoroethylene dispersion emulsion, be convenient to nano silicon treatment solution better can adhere on polytetrafluoroethylfiberglass fiberglass adhesive tape; Add fluorine surfactant to reduce the surface tension for the treatment of solution drop, be convenient to the surface being paved with polytetrafluoroethylfiberglass fiberglass adhesive tape better of dispersion liquid.
With coating apparatus, the nano silicon aqueous solution is spread evenly across Teflon high-temperature cloth on the surface, can guarantee evenly, be coated with rear first through the cold zone of 70-90 DEG C, by the moisture removing in aqueous silica solution, make cloth cover dry, warm area in 220-280 DEG C again, the additive that in removing aqueous silica solution, boiling point is higher, finally the high-temperature zone of 360-380 DEG C, the tetrafluoroethylene and nanometer silicon dioxide particle that are attached to Teflon high-temperature cloth surface are together melted, such nano silicon is just embedded in Teflon cloth surface well, technique is simple, pollution-free, and it is effective.
A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth, utilize coating roll that aqueous silica solution is spread evenly across Teflon high-temperature cloth on the surface, material strip after coating enters into baking oven, three warm areas are provided with in baking oven, material strip is dried through three warm areas after entering baking oven successively, then baking oven rolling after three warm areas are dried again after being commutated by the excessive roller of baking oven inner top, and device arranges rationally, save space, effectively improve efficiency.
Accompanying drawing explanation
Fig. 1 is the structural representation of the device utilizing nano silicon aqueous solution process Teflon high-temperature cloth.
In figure: let off roll 1, coating roll 2, wind-up roll 3, dancer roll 4, baking oven 5, transition roller 6, discharging barrel 7, intercepting basin 8, variable valve 9, exhaust fan 10.
Embodiment
Below the embodiment of the preparation method of the nano silicon aqueous solution is further described:
Embodiment one
(1) be added into by the Sodium hexametaphosphate 99 of 1-3 part in the deionized water of 60 parts, disposable after the pH value of this solution being adjusted to 3 with acetic acid to add 14 parts of diameters be 10 gas phase silica flours; (2) first disperse 15min with homogenizer, then with emulsify at a high speed shears emulsification 15min, obtained silica dispersions, is adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 50% of 0.1 part, fully stir, then add the Capstone FS-31 fluorine surfactant of 0.02 part, abundant stirring, prepares nano silicon treatment solution.
Embodiment two
(1) Sodium hexametaphosphate 99 of 1-3 part is added in the deionized water of 80 parts, disposablely after the pH value of this solution being adjusted to 5 with acetic acid adds 17 parts of diameters for 20nm gas phase silica flour; (2) first disperse 25min with homogenizer, then with sand mill mill 25min, obtained silica dispersions, is adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 50%-70% of 0.3 part, abundant stirring, add the Capstone FS-31 fluorine surfactant of 0.06 part again, abundant stirring, prepares nano silicon treatment solution.
Embodiment three
(1) be added into by the Sodium hexametaphosphate 99 of 1-3 part in the deionized water of 70 parts, after the pH value of this solution being adjusted to 4 with acetic acid, disposable 14-17 part diameter that adds is for 15nm gas phase silica flour; (2) first disperse 20min with homogenizer, then with emulsify at a high speed shears emulsification 20min, obtained silica dispersions, is adjusted to neutrality with ammoniacal liquor by the pH value of dispersion liquid; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, first add the tetrafluoroethylene dispersion emulsion of the concentration tail 60% of 0.2 part, fully stir, then add the Capstone FS-31 fluorine surfactant of 0.04 part, abundant stirring, prepares nano silicon treatment solution.
The nano silicon aqueous solution of the preparation in above three embodiments is respectively used in the preparation of Teflon high-temperature cloth, preparation technology is: use coating apparatus that the nano silicon aqueous solution is spread evenly across Teflon high-temperature cloth surface, Teflon high-temperature cloth successively in the low temperature of 70-90 DEG C, 220-280 DEG C the high temperature of temperature, 360-380 DEG C toast 40s-60s respectively, finally by Teflon high-temperature cloth rolling.
Test the Teflon high-temperature cloth after rolling, the performance of Teflon high-temperature cloth is all up to standard.
Below a kind of embodiment of the device of nano silicon aqueous solution process Teflon high-temperature cloth that utilizes is further described:
A kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth, comprise let off roll 1, coating roll 2, wind-up roll 3, dancer roll 4, baking oven 5, transition roller 6, discharging barrel 7, intercepting basin 8, variable valve 9 and exhaust fan 10, described let off roll 1 and wind-up roll 3 are distributed in the both sides of baking oven 5 respectively, described coating roll 2 is arranged at immediately below baking oven 5, described discharging barrel 7 is arranged at the top between let off roll 1 and coating roll 2, discharging barrel 7 is built with the nano silicon aqueous solution, described discharging barrel 7 is provided with the pipeline of guiding coating roll 2, pipeline is provided with the variable valve 9 of adjust flux, the intercepting basin 8 collecting surplus solution is provided with immediately below coating roll 2, described baking oven 5 is vertical drying oven, baking oven 5 bottom opening, top in baking oven 5 is provided with transition roller 6, baking oven top is provided with exhaust fan 10, low temperature, middle temperature, high temperature three temperature provinces are provided with from bottom to top successively in described baking oven 5, the bottom opening of described baking oven 5, described baking oven 5 and and wind-up roll 3 between be provided with for transition, lead with the dancer roll 4 of adjustment of tonicity, be provided with dancer roll 4 between described let off roll 1 and coating roll 2.
This device principle of work is: Teflon high-temperature cloth has let off roll 1 to unreel through coating roll 2, the nano silicon aqueous solution in discharging barrel 7 is applied on the surface of Teflon high-temperature cloth by coating roll 2, Teflon high-temperature cloth after coating enters baking oven bottom baking oven 5, successively through 70-90 DEG C cold zone, warm area in 220-280 DEG C, 360-380 DEG C high-temperature zone, transition roller 6 through baking oven top is going out baking oven after commutating behind these three humidity provinces bottom baking oven 5, then to wind-up roll 3 rolling after being regulated by dancer roll 4.
Claims (9)
1. the preparation method of a nano silicon aqueous solution, it is characterized in that, comprise the following steps: the Sodium hexametaphosphate 99 of 1-3 part is added in the deionized water of 60 ~ 80 parts by (1), disposablely after the pH value of this solution being adjusted to 3-5 with acetic acid add 14-17 part gas phase silica flour; (2) first disperse 15-25min with homogenizer, then with emulsify at a high speed shears emulsification 15-25min or with sand mill mill 15-25min, obtain silica dispersions, finally with ammoniacal liquor, the pH value of dispersion liquid is adjusted to neutrality; (3) in the 1 part of dispersion liquid prepared, add 10 parts of deionized water dilutions, the concentration first adding 0.1-0.3 part is the tetrafluoroethylene dispersion emulsion of 50%-70%, fully stirs, then adds the fluorine surfactant of 0.02-0.06 part, abundant stirring, prepares nano silicon treatment solution.
2. the preparation method of a kind of nano silicon aqueous solution according to claim 1, is characterized in that, the diameter of described gas phase silica flour is 10-20nm.
3. the application of the nano silicon aqueous solution according to claim 1 in Teflon high-temperature cloth, it is characterized in that, use coating apparatus that the nano silicon aqueous solution is spread evenly across Teflon high-temperature cloth surface, Teflon high-temperature cloth successively in the low temperature of 70-90 DEG C, 220-280 DEG C the high temperature of temperature, 360-380 DEG C toast 40s-60s respectively, finally by Teflon high-temperature cloth rolling.
4. one kind utilizes the device of nano silicon aqueous solution process Teflon high-temperature cloth, it is characterized in that, comprise let off roll, coating roll, wind-up roll, baking oven, blowing cylinder and at least one transition roller be arranged in baking oven, described discharging barrel is arranged between let off roll and coating roll, described discharging barrel is built with the nano silicon aqueous solution, be provided with the pipeline above guiding coating roll bottom described blowing cylinder, described let off roll, coating roll, wind-up roll and transition roller be arranged in parallel.
5. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 4, it is characterized in that, described baking oven is vertically arranged, baking oven bottom opening, described transition roller is arranged at the top in baking oven, and described coating roll is arranged at immediately below baking oven, and described let off roll and wind-up roll are distributed in the both sides of baking oven, be provided with dancer roll between described let off roll and coating roll, between described wind-up roll and baking oven, be respectively provided with dancer roll.
6. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 4 or 5, is characterized in that, be provided with the warm area of multiple differing temps in described baking oven from bottom to top successively.
7. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 4, it is characterized in that, described pipeline is provided with variable valve.
8. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 4, it is characterized in that, the bottom of described coating roll is provided with intercepting basin.
9. a kind of device utilizing nano silicon aqueous solution process Teflon high-temperature cloth according to claim 4, it is characterized in that, described baking oven top is provided with exhaust fan.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510095357.7A CN104693848A (en) | 2015-03-04 | 2015-03-04 | Preparation method and application of nano silicon dioxide water solution, and device for implementing application |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104693850A (en) * | 2015-03-04 | 2015-06-10 | 江苏东剑材料科技有限公司 | Preparation method of nano-silicon dioxide aqueous solution |
| CN109337419A (en) * | 2018-09-04 | 2019-02-15 | 马鞍山钢铁股份有限公司 | A kind of new-energy automobile driving motor silicon steel environmental protection coatings and preparation method thereof |
-
2015
- 2015-03-04 CN CN201510095357.7A patent/CN104693848A/en active Pending
Non-Patent Citations (3)
| Title |
|---|
| 丁虹: "纳米粉体水悬浮液的制备及其在外墙涂料中的应用研究", 《中国优秀博硕士学位论文全文数据库（硕士） 工程科技Ⅱ辑》 * |
| 汪萍: "聚四氟乙烯粘接技术的研究", 《粘接》 * |
| 郭金彦等: "熔融法处理聚四氟乙烯表面的改进", 《中国胶粘剂》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104693850A (en) * | 2015-03-04 | 2015-06-10 | 江苏东剑材料科技有限公司 | Preparation method of nano-silicon dioxide aqueous solution |
| CN109337419A (en) * | 2018-09-04 | 2019-02-15 | 马鞍山钢铁股份有限公司 | A kind of new-energy automobile driving motor silicon steel environmental protection coatings and preparation method thereof |
| CN109337419B (en) * | 2018-09-04 | 2021-05-14 | 马鞍山钢铁股份有限公司 | Silicon steel environment-friendly insulating paint for new energy automobile driving motor and preparation method thereof |
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