CN104674183A - 氮化铝或氧化铍的陶瓷覆盖晶片 - Google Patents

氮化铝或氧化铍的陶瓷覆盖晶片 Download PDF

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Publication number
CN104674183A
CN104674183A CN201510086873.3A CN201510086873A CN104674183A CN 104674183 A CN104674183 A CN 104674183A CN 201510086873 A CN201510086873 A CN 201510086873A CN 104674183 A CN104674183 A CN 104674183A
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inches
aluminum nitride
nitride ceramic
substrate
oxide
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CN201510086873.3A
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Chinese (zh)
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穆罕默德·M·拉希德
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Applied Materials Inc
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Applied Materials Inc
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    • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/581—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Ceramic Products (AREA)
CN201510086873.3A 2007-09-05 2008-09-05 氮化铝或氧化铍的陶瓷覆盖晶片 Pending CN104674183A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US97025007P 2007-09-05 2007-09-05
US60/970250 2007-09-05
US97075707P 2007-09-07 2007-09-07
US60/970757 2007-09-07

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CNA2008101355994A Division CN101418436A (zh) 2007-09-05 2008-09-05 氮化铝或氧化铍的陶瓷覆盖晶片

Publications (1)

Publication Number Publication Date
CN104674183A true CN104674183A (zh) 2015-06-03

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CN201510086873.3A Pending CN104674183A (zh) 2007-09-05 2008-09-05 氮化铝或氧化铍的陶瓷覆盖晶片

Country Status (6)

Country Link
US (1) US8252410B2 (https=)
JP (1) JP5683063B2 (https=)
KR (1) KR101099892B1 (https=)
CN (1) CN104674183A (https=)
SG (1) SG150492A1 (https=)
TW (1) TWI447791B (https=)

Cited By (2)

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CN114401933A (zh) * 2019-08-15 2022-04-26 万腾荣公司 氧化铍基座
CN116555737A (zh) * 2023-05-17 2023-08-08 拓荆创益(沈阳)半导体设备有限公司 晶圆托盘的保护装置、薄膜沉积装置及反应腔的清洗方法

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CN102553867A (zh) * 2012-02-17 2012-07-11 上海先进半导体制造股份有限公司 等离子刻蚀设备反应腔室的干法清洗方法
US9850573B1 (en) 2016-06-23 2017-12-26 Applied Materials, Inc. Non-line of sight deposition of erbium based plasma resistant ceramic coating
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US10636628B2 (en) 2017-09-11 2020-04-28 Applied Materials, Inc. Method for cleaning a process chamber
US10600624B2 (en) 2017-03-10 2020-03-24 Applied Materials, Inc. System and method for substrate processing chambers
US10975469B2 (en) 2017-03-17 2021-04-13 Applied Materials, Inc. Plasma resistant coating of porous body by atomic layer deposition
JP6914170B2 (ja) * 2017-11-07 2021-08-04 日本特殊陶業株式会社 セラミックス基材の保護方法
US10766057B2 (en) * 2017-12-28 2020-09-08 Micron Technology, Inc. Components and systems for cleaning a tool for forming a semiconductor device, and related methods
CN113924387A (zh) * 2019-05-22 2022-01-11 应用材料公司 用于高温腐蚀环境的基板支承件盖

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