CN104668256B - Descaling method for etching machine - Google Patents
Descaling method for etching machine Download PDFInfo
- Publication number
- CN104668256B CN104668256B CN201510100043.1A CN201510100043A CN104668256B CN 104668256 B CN104668256 B CN 104668256B CN 201510100043 A CN201510100043 A CN 201510100043A CN 104668256 B CN104668256 B CN 104668256B
- Authority
- CN
- China
- Prior art keywords
- acid
- descaling
- immersion
- flushing
- liquor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005530 etching Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000002253 acid Substances 0.000 claims abstract description 29
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000011010 flushing procedure Methods 0.000 claims abstract description 11
- 239000008399 tap water Substances 0.000 claims abstract description 11
- 235000020679 tap water Nutrition 0.000 claims abstract description 11
- 239000003513 alkali Substances 0.000 claims abstract description 9
- 238000002791 soaking Methods 0.000 claims abstract description 8
- 238000007654 immersion Methods 0.000 claims description 11
- 239000002585 base Substances 0.000 claims description 3
- 238000007598 dipping method Methods 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- 239000011593 sulfur Substances 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 8
- 238000004140 cleaning Methods 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 13
- 239000000203 mixture Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910003638 H2SiF6 Inorganic materials 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 239000001117 sulphuric acid Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- ZEFWRWWINDLIIV-UHFFFAOYSA-N tetrafluorosilane;dihydrofluoride Chemical compound F.F.F[Si](F)(F)F ZEFWRWWINDLIIV-UHFFFAOYSA-N 0.000 description 2
- MPPQGYCZBNURDG-UHFFFAOYSA-N 2-propionyl-6-dimethylaminonaphthalene Chemical compound C1=C(N(C)C)C=CC2=CC(C(=O)CC)=CC=C21 MPPQGYCZBNURDG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention relates to a descaling method for an etching machine. The descaling method comprises the following steps: 1, soaking a descaling part into mixed acid liquor consisting of 9-26 percent hydrochloric acid and 10-38 percent sulfuric acid at the temperature 20-25 DEG C for 0.5 hour, flushing with tap water for the first time, and cleaning till the pH is 6-9; 2, soaking the descaling part into a 10-35 percent strong alkali solution at the temperature 25-30 DEG C for 2 hours, flushing with tap water for the second time, and cleaning till the pH is 6-9; 3, soaking the descaling part into the mixed acid liquor in the step I at the temperature 20-25 DEG C for 0.5 hour, flushing with tap water for the third time, and cleaning till the pH is 6-9. The descaling method has the advantages that the descaling time is as short as 3.5 hours, and the descaling efficiency from about 65 percent to over 95 percent. Damage to pipelines and equipment components in contact with the acid liquor is avoided in a descaling process, and the etching speed and etching quality of glass are well improved.
Description
Technical field
The present invention relates to electron trade glass thinning technical field, more particularly to a kind of etching machine descaling method.
Background technology
Etching machine is one of necessaries of current thinning glass substrate.With the recycling of etching solution, glass is etched
When the hexafluosilicic acid that generated（H2SiF6）Concentration is constantly raised, in etching solution dissolved with many kinds of metal ions（Na+、K
+、Ca2+）Corresponding fluosilicate will be formed with H2SiF6（Such as prodan, potassium fluosilicate, Calcium fluosilicate）Indissoluble thing,
Each part of appliance surface fouling that other acid non-soluble substances are contacted in the lump in etching machine with acid solution is confused, the white of hard and compact is formed
Color dirt layer.The off-white color dirt thing is often blocked in pipeline, the import and export of pump and nozzle exit, reduces pipeline effect
Rate, has a strong impact on spraying effect, causes etching machine production capacity to decline, and raises production cost.
At present, the fouling inside etching machine is dredged and method that scale removal is conventional is that to prepare certain density strong acid molten
Liquid routine cleaning, then with giant carries out clear water flushing again.But this descaling method is unsatisfactory, every time cleaning it is time-consuming compared with
Fouling is grown and can not thoroughly dispose, as the carrying out of production can also be more long-pending thicker.
The content of the invention
The purpose of the present invention is exactly time length, the difficult problem for effect difference in order to overcome existing etching machine scale removal to exist, there is provided
A kind of etching machine descaling method.
The technical scheme is that：
A kind of etching machine descaling method, it is characterised in that it is comprised the steps of：
1）, mix acid liquor immersion, mix acid liquor is by the hydrochloric acid that mass percent is 5 %-26 % and 10 %-38 % sulfur
Acid is pressed
Volume ratio 1:2 proportions, temperature control is sour using pump circulation during acid soak between 20-25 DEG C
Liquid；Acid soak carries out first time flushing after terminating with tap water, cleans between pH=6-9；
2）, alkali immersion, alkali liquor is the strong base solution that mass percent is 15 %-35 %, temperature control 25-30 DEG C it
Between, leaching
Bubble 2 hours, adopts pump circulation alkali liquor, dipping by lye to carry out second with tap water after terminating during dipping by lye
Secondary flushing, cleans between pH=6-9；
3）, again soaked with the mix acid liquor of step one, soaking temperature is controlled between 20-25 DEG C, in pump circulation mobilization
Lower leaching
Bubble 0.5 hour, acid soak carries out third time flushing after terminating with tap water, cleans between pH=6-9.
It is an advantage of the current invention that the scale removal time is short, total time typically needs 3.5 hours or so.Compared to other scale removal sides
Method, there is very big reduction on the time.Scale removal effect is lifted to 95 more than % by 65 % before or so.And soak
During bubble scale removal to pipeline and it with acid solution contact arrangement part not damaged, the etching speed and etching quality of glass are had
Improve well.
Specific embodiment
Embodiment 1
Step one：Prepare the mixing that mass percent concentration is respectively the hydrochloric acid solution of 18 % and the sulfuric acid solution of 25 %
Acid solution, hydrochloric acid solution and sulfuric acid solution by volume 1:2 mixing, scale removal part are soaked in mix acid liquor, soaking temperature control
Between 20-25 DEG C processed, soak 0.5 hour under pump circulation mobilization.Acid soak carries out first time punching after terminating with tap water
Wash, clean between pH=6-9.
Step 2：Then with the sodium hydroxide solution immersion scale removal part that mass percent concentration is 24 %, soaking temperature
Between 25-30 DEG C of control, soak 2 hours under pump circulation mobilization.Alkali immersion carries out second punching after terminating with tap water
Wash, clean between pH=6-9.
Step 3：The last mix acid liquor immersion scale removal part prepared with step one again, soaking temperature control 20-25 DEG C it
Between, soak 0.5 hour under pump circulation mobilization.Acid soak carries out third time flushing after terminating with tap water, cleans to pH
Between=6-9.Removal of deposit rate is up to 95%.
Embodiment 2：
Equally operate by embodiment 1, only change the mass percent concentration of mixed acid and the percent concentration of alkali：Percentage
Specific concentration is respectively the % of hydrochloric acid 9, the % of sulphuric acid 10；The % of sodium hydroxide percent concentration 10.Do same test, removal of deposit rate 70%
Left and right.
Embodiment 3：
Equally operate by embodiment 1, only change the mass percent concentration of mixed acid and the percent concentration of alkali：Percentage
Specific concentration is respectively the % of hydrochloric acid 26, the % of sulphuric acid 37；The % of sodium hydroxide percent concentration 33, does same test, removal of deposit rate 95
% or so.
Claims (1)
1. a kind of etching machine descaling method, it is characterised in that it is comprised the steps of：
1）, mix acid liquor immersion, mix acid liquor be by mass percent for 9 % -26 % hydrochloric acid and 10 %-38 % sulfur
Acid, by volume 1:2 ratio mixed preparing are constituted, and scale removal part is soaked in mix acid liquor, temperature control 20-25 DEG C it
Between, soak 0.5 hour, adopt pump circulation acid solution, acid soak to carry out first time flushing with tap water after terminating in immersion process,
Clean between pH=6-9；
2）, dipping by lye, alkali liquor is the strong base solution that mass percent is 10 %-35 %, and scale removal part is soaked in strong base solution
In, temperature control is soaked 2 hours between 25-30 DEG C, with originally after adopting pump circulation alkali liquor, immersion to terminate in immersion process
Water carries out second flushing, cleans between pH=6-9；
3）, again with the mix acid liquor of step one scale removal part is soaked, soaking temperature is controlled between 20-25 DEG C, in pump circulation stream
Action lower immersion 0.5 hour, immersion carries out third time flushing after terminating with tap water, cleans between pH=6-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510100043.1A CN104668256B (en) | 2015-03-07 | 2015-03-07 | Descaling method for etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510100043.1A CN104668256B (en) | 2015-03-07 | 2015-03-07 | Descaling method for etching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104668256A CN104668256A (en) | 2015-06-03 |
| CN104668256B true CN104668256B (en) | 2017-05-03 |
Family
ID=53304138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510100043.1A Expired - Fee Related CN104668256B (en) | 2015-03-07 | 2015-03-07 | Descaling method for etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104668256B (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0753271B2 (en) * | 1991-12-28 | 1995-06-07 | 政幸 上江田 | Cleaning method |
| CN102519301A (en) * | 2011-12-09 | 2012-06-27 | 贵州开磷（集团）有限责任公司 | Method for washing scales formed on tube of graphite heat exchanger |
| CN102519302B (en) * | 2011-12-14 | 2013-06-05 | 无锡中彩科技有限公司 | Cleaning method for heat exchanger |
| CN103042009B (en) * | 2012-12-31 | 2015-08-05 | 江西赛维Ldk光伏硅科技有限公司 | A kind of polycrystalline silicon material produces the cleaning method of reduction furnace electrode protective cover |
| CN103512421A (en) * | 2013-10-08 | 2014-01-15 | 中国铝业股份有限公司 | Method for cleaning scales of heat exchanger |
-
2015
- 2015-03-07 CN CN201510100043.1A patent/CN104668256B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN104668256A (en) | 2015-06-03 |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170503 |