CN104624430B - The device for preventing residual liquid from dripping - Google Patents
The device for preventing residual liquid from dripping Download PDFInfo
- Publication number
- CN104624430B CN104624430B CN201310566899.9A CN201310566899A CN104624430B CN 104624430 B CN104624430 B CN 104624430B CN 201310566899 A CN201310566899 A CN 201310566899A CN 104624430 B CN104624430 B CN 104624430B
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- CN
- China
- Prior art keywords
- plunger
- diaphragm
- chamber
- pipeline
- cylinder
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
- B05B9/04—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
- B05B9/047—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump supply being effected by follower in container, e.g. membrane or floating piston, or by deformation of container
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
Landscapes
- Devices For Dispensing Beverages (AREA)
- Coating Apparatus (AREA)
Abstract
Present invention discloses a kind of devices for preventing residual liquid from dripping, comprising: pipeline, chamber, diaphragm, plunger and cylinder.Pipeline has inlet and liquid outlet；Chamber is connected to pipeline；The junction of chamber and pipeline is arranged in diaphragm, and diaphragm separates chamber and pipeline；Plunger is arranged in chamber, and sealing space is formed between plunger and diaphragm；Cylinder is connect with plunger, and cylinder is able to drive plunger in chamber indoor sport, to change the volume of the sealing space formed between plunger and diaphragm.The present invention passes through setting chamber, diaphragm, plunger and cylinder, after feed flow, cylinder drives plunger motion, the air pressure of the sealing space formed between plunger and diaphragm is set to be less than atmospheric pressure, so that diaphragm is to chamber internal projection, make the liquid reflux in pipeline in turn, avoids the liquid drippage in pipeline.
Description
Technical field
The present invention relates to solution supply device more particularly to a kind of devices for preventing residual liquid from dripping.
Background technique
In fabrication of semiconductor device, it will usually use various solution (such as deionized water, various chemical liquids etc.)
Crystal column surface is handled.As shown in figure 4, being the structural schematic diagram of existing solution supply device, which includes solution
Supply line 101 and the pneumatic operated valve 102 being arranged on solution supply line 101.When supplying solution, pneumatic operated valve 102, solution are opened
Enter solution supply line 101 from the inlet of solution supply line 101, then from the liquid outlet of solution supply line 101
Outflow, can generally install spray head at the liquid outlet of solution supply line 101, and solution is sprayed at crystal column surface by spray head, with
Crystal column surface is handled.After wafer-process, stops solution and supply and close pneumatic operated valve 102.Although at this point, having stopped
Solution supply, however, still have remaining solution in solution supply line 101, remaining solution is from solution supply line 101
Liquid outlet is flowed out and is dripped, if wafer is removed not yet, remaining solution will be dropped in crystal column surface, to required precision
In higher technique, this phenomenon is undesirable.If wafer has been removed, remaining solution drips on board,
Board and other electronic devices can be caused to corrode, if maintenance personnel accidentally touches, can also be caused damages to maintenance personnel.
It is, therefore, desirable to provide new device is to solve the technical issues of residual liquid existing for above-mentioned apparatus drips.
Summary of the invention
The object of the present invention is to provide it is a kind of prevent residual liquid drip device, to avoid process after pipeline
Inside there is the problem of residual liquid drippage.
To achieve the above object, it is proposed by the present invention prevent residual liquid drip device, comprising: pipeline, chamber, every
Film, plunger and cylinder.Pipeline has inlet and liquid outlet；Chamber is connected to pipeline；The company of chamber and pipeline is arranged in diaphragm
Place is met, diaphragm separates chamber and pipeline；Plunger is arranged in chamber, and sealing space is formed between plunger and diaphragm；Cylinder with
Plunger connection, cylinder are able to drive plunger in chamber indoor sport, to change the body of the sealing space formed between plunger and diaphragm
Product.
In one embodiment, diaphragm is made of elastic material.
In one embodiment, the liquid outlet of chamber adjacent conduit.
In one embodiment, before feed flow, cylinder drives plunger motion, so that the wall of plunger is bonded with diaphragm.
In one embodiment, when feed flow stops, cylinder drive plunger moves up to the top of chamber, plunger and diaphragm
Between the volume of sealing space that is formed reach maximum, the air pressure in sealing space at this time is less than atmospheric pressure, goes out liquid in pipeline
Air void is formed at mouthful.
In conclusion the present invention, by setting chamber, diaphragm, plunger and cylinder, after feed flow, cylinder drives plunger
Movement makes the air pressure of the sealing space formed between plunger and diaphragm be less than atmospheric pressure, so that diaphragm is to chamber internal projection,
Make the liquid reflux in pipeline in turn, avoids the liquid drippage in pipeline.
Detailed description of the invention
Fig. 1 discloses the structural schematic diagram of an embodiment of the device that the present invention prevents residual liquid from dripping.
Fig. 2, which discloses the present invention, prevents structural schematic diagram of the device of residual liquid drippage in feed flow.
Fig. 3, which discloses the present invention, prevents structural schematic diagram of the device of residual liquid drippage when feed flow stops.
Fig. 4 is the structural schematic diagram of existing solution supply device.
Specific embodiment
By the technology contents that the present invention will be described in detail, construction feature, reached purpose and efficacy, below in conjunction with embodiment
And schema is cooperated to be described in detail.
Refering to fig. 1, the structural schematic diagram of an embodiment of the device that the present invention prevents residual liquid from dripping is disclosed.According to
The device for preventing residual liquid from dripping of the embodiment includes: pipeline 201, switch valve 202, chamber 203, diaphragm 204, plunger
205 and cylinder 206.Specifically, pipeline 201 has inlet and liquid outlet, and the caliber at the liquid outlet of pipeline 201 is smaller, leads to
It is often 4 millimeters.Switch valve 202 is arranged on pipeline 201, the inlet of 202 adjacent conduit 201 of switch valve, and switch valve 202 can be with
It is pneumatic operated valve.The side of pipeline 201, the liquid outlet of 203 adjacent conduit 201 of chamber, chamber 203 and pipeline is arranged in chamber 203
201 connections.The junction of chamber 203 Yu pipeline 201 is arranged in diaphragm 204, and diaphragm 204 separates chamber 203 and pipeline 201,
Prevent the liquid in pipeline 201 from entering in chamber 203, diaphragm 204 is made of elastic material, and the material is with good airtight
Property.Plunger 205 is arranged in chamber 203, forms sealing space between plunger 205 and diaphragm 204.Cylinder 206 and plunger 205 connect
It connects, cylinder 206 is able to drive plunger 205 and moves up and down in chamber 203, is formed between plunger 205 and diaphragm 204 with changing
The volume of sealing space.
Referring to Fig.2, disclosing structural schematic diagram of the device for preventing residual liquid from dripping of the invention in feed flow.Such as figure
Shown in 2, when feed flow, valve 202 is turned on the switch, liquid enters in pipeline 201 from the inlet of pipeline 201, then from pipeline 201
Liquid outlet outflow.When liquid flows through diaphragm 204 in order to prevent, diaphragm 204 is made to generate deformation, is fluctuated so as to cause fluid flow,
Before feed flow, cylinder 206 drives plunger 205 to move downward, and is bonded the wall of plunger 205 with diaphragm 204.
Refering to Fig. 3, structural schematic diagram of the device for preventing residual liquid from dripping of the invention when feed flow stops is disclosed.
As shown in figure 3, turning off the switch valve 202 after feed flow, at the same time, cylinder 206 drives plunger 205 to move up to chamber
203 top, the volume of the sealing space formed between plunger 205 and diaphragm 204 reaches maximum, and the air pressure in sealing space
It is hydraulic greater than sealing space in pipeline 201 since pipeline 201 is in communication with the outside by its liquid outlet less than atmospheric pressure
Interior air pressure, diaphragm 204 is since pressure difference is to 203 internal projection of chamber, liquid reflux in pipeline 201, thus in pipeline 201
Air void 207, the liquid since the caliber at the liquid outlet of pipeline 201 is smaller, at 201 liquid outlet of pipeline are formed at liquid outlet
By surface tension effect without dripping.
It can be seen from the above, the present invention at the liquid outlet close to pipeline 201 by being arranged chamber 203, diaphragm 204, plunger
205 and cylinder 206, after feed flow, cylinder 206 drives plunger 205 to move, and makes to be formed between plunger 205 and diaphragm 204
The air pressure of sealing space is less than atmospheric pressure, so that diaphragm 204 is to 203 internal projection of chamber, and then makes the liquid in pipeline 201
Reflux avoids the liquid drippage in pipeline 201.
In conclusion the present invention is illustrated by above embodiment and correlative type, oneself is specific, full and accurate to disclose correlation
Technology implements those skilled in the art accordingly.And embodiment described above is used only to illustrate the present invention, rather than
Interest field of the invention for limiting, of the invention should be defined by claim of the invention.As for member described herein
The change of number of packages purpose or the replacement of equivalence element etc. still all should belong to interest field of the invention.
Claims (6)
1. a kind of device for preventing residual liquid from dripping characterized by comprising
Pipeline, the pipeline have inlet and liquid outlet；
Chamber, the chamber are connected to pipeline；
The junction of chamber and pipeline is arranged in diaphragm, the diaphragm, and diaphragm separates chamber and pipeline, prevents in the pipeline
Liquid enter the chamber in；
Plunger, the plunger are arranged in chamber, and sealing space is formed between plunger and diaphragm；And
Cylinder, the cylinder are connect with plunger, and cylinder is able to drive plunger in chamber indoor sport, to change between plunger and diaphragm
The volume of the sealing space of formation.
2. the device according to claim 1 for preventing residual liquid from dripping, which is characterized in that the diaphragm is by elastic material
It is made.
3. the device according to claim 1 for preventing residual liquid from dripping, which is characterized in that the chamber adjacent conduit
Liquid outlet.
4. the device according to claim 1 for preventing residual liquid from dripping, which is characterized in that before feed flow, the cylinder band
Dynamic plunger motion, so that the wall of plunger is bonded with diaphragm.
5. the device according to claim 1 for preventing residual liquid from dripping, which is characterized in that when feed flow stops, cylinder band
Dynamic plunger moves up to the top of chamber, and the volume of the sealing space formed between plunger and diaphragm reaches maximum.
6. the device according to claim 5 for preventing residual liquid from dripping, which is characterized in that formed between plunger and diaphragm
Air pressure when reaching maximum in sealing space of the volume of sealing space be less than atmospheric pressure, air is formed at the liquid outlet of pipeline
Gap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310566899.9A CN104624430B (en) | 2013-11-14 | 2013-11-14 | The device for preventing residual liquid from dripping |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310566899.9A CN104624430B (en) | 2013-11-14 | 2013-11-14 | The device for preventing residual liquid from dripping |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104624430A CN104624430A (en) | 2015-05-20 |
| CN104624430B true CN104624430B (en) | 2019-05-17 |
Family
ID=53203946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310566899.9A Active CN104624430B (en) | 2013-11-14 | 2013-11-14 | The device for preventing residual liquid from dripping |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104624430B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110711655A (en) * | 2019-10-25 | 2020-01-21 | 文安县天华密度板有限公司 | Atomization nozzle drip-proof device and method |
| CN112558432B (en) * | 2020-12-18 | 2022-07-15 | 浙江启尔机电技术有限公司 | Immersion liquid supply system and immersion flow field removing method thereof |
| CN113028289A (en) * | 2021-02-01 | 2021-06-25 | 成青瑜 | High leakproofness cosmetics aqueous phase raw materials metering device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU7294394A (en) * | 1993-09-14 | 1995-03-30 | Sanprint Pty. Ltd. | An engraving hand piece |
| CN2401706Y (en) * | 1999-12-23 | 2000-10-18 | 雷泽民 | Hand pressed pump |
| CN2594771Y (en) * | 2003-01-18 | 2003-12-24 | 张长江 | Leakage proof device on watermeter |
| CN202031794U (en) * | 2011-03-15 | 2011-11-09 | 北京市电力公司 | Withdrawal device |
| CN202027426U (en) * | 2010-12-23 | 2011-11-09 | 泰州乐金电子冷机有限公司 | Leakproof water valve for water dispenser |
-
2013
- 2013-11-14 CN CN201310566899.9A patent/CN104624430B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU7294394A (en) * | 1993-09-14 | 1995-03-30 | Sanprint Pty. Ltd. | An engraving hand piece |
| CN2401706Y (en) * | 1999-12-23 | 2000-10-18 | 雷泽民 | Hand pressed pump |
| CN2594771Y (en) * | 2003-01-18 | 2003-12-24 | 张长江 | Leakage proof device on watermeter |
| CN202027426U (en) * | 2010-12-23 | 2011-11-09 | 泰州乐金电子冷机有限公司 | Leakproof water valve for water dispenser |
| CN202031794U (en) * | 2011-03-15 | 2011-11-09 | 北京市电力公司 | Withdrawal device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104624430A (en) | 2015-05-20 |
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Address after: 201203 building 4, No. 1690, Cailun Road, free trade zone, Pudong New Area, Shanghai Patentee after: Shengmei semiconductor equipment (Shanghai) Co., Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Cailun Road No. fourth 1690 Patentee before: ACM (SHANGHAI) Inc. |