CN104624430A - Device for preventing residual liquid from dripping - Google Patents
Device for preventing residual liquid from dripping Download PDFInfo
- Publication number
- CN104624430A CN104624430A CN201310566899.9A CN201310566899A CN104624430A CN 104624430 A CN104624430 A CN 104624430A CN 201310566899 A CN201310566899 A CN 201310566899A CN 104624430 A CN104624430 A CN 104624430A
- Authority
- CN
- China
- Prior art keywords
- plunger
- pipeline
- barrier film
- chamber
- dripping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 53
- 230000004888 barrier function Effects 0.000 claims description 34
- 238000004891 communication Methods 0.000 claims description 3
- 239000013536 elastomeric material Substances 0.000 claims description 3
- 239000011800 void material Substances 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 20
- 238000000034 method Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000012089 stop solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
- B05B9/04—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
- B05B9/047—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump supply being effected by follower in container, e.g. membrane or floating piston, or by deformation of container
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
Landscapes
- Coating Apparatus (AREA)
- Devices For Dispensing Beverages (AREA)
Abstract
The invention discloses a device for preventing residual liquid from dripping. The device comprises a pipeline, a cavity, a diaphragm, a plunger and a cylinder. The pipeline is provided with a liquid inlet and a liquid outlet. The cavity is communicated with the pipeline. The diaphragm is located at the joint of the cavity and the pipeline and separates the cavity from the pipeline. The plunger is arranged in the cavity. A sealed space is formed between the plunger and the diaphragm. The cylinder is connected with the plunger and can drive the plunger to move in the cavity so that the volume of the sealed space formed between the plunger and the diaphragm can be changed. By arranging the cavity, the diaphragm, the plunger and the cylinder, after liquid supply is ended, the cylinder drives the plunger to move, the gas pressure of the sealed space formed by the plunger and the diaphragm is smaller than the atmospheric pressure, and therefore the diaphragm protrudes out of the cavity, and liquid in the pipeline flows back and is prevented from dripping.
Description
Technical field
The present invention relates to solution supply device, particularly relate to a kind of device preventing residual liquid from dripping.
Background technology
In fabrication of semiconductor device, usually can use various solution (such as deionized water, various chemical liquids etc.) and crystal column surface is processed.As shown in Figure 4, be the structural representation of existing solution supply device, this device comprises solution supply line 101 and is arranged on the pneumatic operated valve 102 on solution supply line 101.During supply solution, open pneumatic operated valve 102, solution enters solution supply line 101 from the inlet of solution supply line 101, then flow out from the liquid outlet of solution supply line 101, general meeting is at the liquid outlet place mounting spray head of solution supply line 101, solution by sprinkler at crystal column surface, to process crystal column surface.After wafer-process terminates, stop solution supply and close pneumatic operated valve 102.Now, although stopped solution supply, but, residual solution is still had in solution supply line 101, residual solution flows out from the liquid outlet of solution supply line 101 and drips, if wafer does not also have removed, residual solution will be dropped in crystal column surface, in the technique higher to required precision, this phenomenon does not wish to occur.If wafer is removed, residual solution drips, on board, can cause corrosion to board and other electronic devices, if attendant touches because of carelessness, also can work the mischief to attendant.
Therefore, need to propose new device to solve the technical problem of the residual liquid drippage of said apparatus existence.
Summary of the invention
The object of this invention is to provide a kind of device preventing residual liquid from dripping, terminate the problem having residual liquid to drip in rear pipeline to avoid PROCESS FOR TREATMENT.
For achieving the above object, the device preventing residual liquid from dripping that the present invention proposes, comprising: pipeline, chamber, barrier film, plunger and cylinder.Pipeline has inlet and liquid outlet; Chamber and pipeline communication; Barrier film is arranged on the junction of chamber and pipeline, and chamber and pipeline separate by barrier film; Plunger is arranged in chamber, forms seal cavity between plunger and barrier film; Cylinder is connected with plunger, and cylinder can drive plunger in chamber indoor sport, to change the volume of the seal cavity formed between plunger and barrier film.
In one embodiment, barrier film is made up of elastomeric material.
In one embodiment, the liquid outlet of chamber adjacent conduit.
In one embodiment, before feed flow, cylinder drives plunger motion, fits with the wall and barrier film that make plunger.
In one embodiment, when feed flow stops, cylinder drives plunger to move up to the top of chamber, and the volume of the seal cavity formed between plunger and barrier film reaches maximum, air pressure now in seal cavity is less than atmospheric pressure, forms air void at the liquid outlet place of pipeline.
In sum, the present invention is by arranging chamber, barrier film, plunger and cylinder, after feed flow terminates, cylinder drives plunger motion, the air pressure of the seal cavity formed between plunger and barrier film is made to be less than atmospheric pressure, thus make barrier film to chamber internal projection, and then make the liquid backflow in pipeline, avoid the liquid drippage in pipeline.
Accompanying drawing explanation
Fig. 1 discloses the structural representation of an embodiment of the device that the present invention prevents residual liquid from dripping.
Fig. 2 discloses the structural representation of device when feed flow that the present invention prevents residual liquid from dripping.
Fig. 3 discloses the structural representation of device when feed flow stops that the present invention prevents residual liquid from dripping.
Fig. 4 is the structural representation of existing solution supply device.
Detailed description of the invention
By describing technology contents of the present invention, structural feature in detail, reached object and effect, coordinate graphic being described in detail below in conjunction with embodiment.
Consult Fig. 1, disclose the structural representation of an embodiment of the device that the present invention prevents residual liquid from dripping.The device preventing residual liquid from dripping according to this embodiment comprises: pipeline 201, switch valve 202, chamber 203, barrier film 204, plunger 205 and cylinder 206.Particularly, pipeline 201 has inlet and liquid outlet, and the caliber at the liquid outlet place of pipeline 201 is less, is generally 4 millimeters.Switch valve 202 is arranged on pipeline 201, the inlet of switch valve 202 adjacent conduit 201, and switch valve 202 can be pneumatic operated valve.Chamber 203 is arranged on the side of pipeline 201, and the liquid outlet of chamber 203 adjacent conduit 201, chamber 203 is communicated with pipeline 201.Barrier film 204 is arranged on the junction of chamber 203 and pipeline 201, and chamber 203 and pipeline 201 separate by barrier film 204, and prevent the liquid in pipeline 201 from entering in chamber 203, barrier film 204 is made up of elastomeric material, and this material has good air-tightness.Plunger 205 is arranged in chamber 203, forms seal cavity between plunger 205 and barrier film 204.Cylinder 206 is connected with plunger 205, and cylinder 206 can drive plunger 205 to move up and down in chamber 203, to change the volume of the seal cavity formed between plunger 205 and barrier film 204.
Consult Fig. 2, disclose the structural representation of the device preventing residual liquid from dripping of the present invention when feed flow.As shown in Figure 2, during feed flow, open switch valve 202, liquid enters in pipeline 201 from the inlet of pipeline 201, then flows out from the liquid outlet of pipeline 201.In order to prevent liquid stream through barrier film 204 time, make barrier film 204 produce deformation, thus cause fluid flow to fluctuate, before feed flow, cylinder 206 drives plunger 205 to move downward, and the wall of plunger 205 and barrier film 204 are fitted.
Consult Fig. 3, disclose the structural representation of the device preventing residual liquid from dripping of the present invention when feed flow stops.As shown in Figure 3, after feed flow terminates, closing switch valve 202, meanwhile, cylinder 206 drives plunger 205 to move up to the top of chamber 203, the volume of the seal cavity formed between plunger 205 and barrier film 204 reaches maximum, and the air pressure in seal cavity is less than atmospheric pressure, because pipeline 201 is in communication with the outside by its liquid outlet, therefore the hydraulic pressure in pipeline 201 is greater than the air pressure in seal cavity, barrier film 204 is because pressure differential is to chamber 203 internal projection, liquid backflow in pipeline 201, thus form air void 207 at the liquid outlet place of pipeline 201, because the caliber at the liquid outlet place of pipeline 201 is less, the liquid at pipeline 201 liquid outlet place can not drip by capillary effect.
From the above, the present invention is by arranging chamber 203, barrier film 204, plunger 205 and cylinder 206 at the liquid outlet place near pipeline 201, after feed flow terminates, cylinder 206 drives plunger 205 to move, the air pressure of the seal cavity formed between plunger 205 and barrier film 204 is made to be less than atmospheric pressure, thus make barrier film 204 to chamber 203 internal projection, and then make the liquid backflow in pipeline 201, avoid the liquid drippage in pipeline 201.
In sum, the present invention is illustrated by above-mentioned embodiment and correlative type, and what oneself was concrete, full and accurate discloses correlation technique, and those skilled in the art can be implemented according to this.And the above embodiment be only used to illustrate the present invention, instead of be used for restriction of the present invention, interest field of the present invention, should be defined by claim of the present invention.Still all interest field of the present invention should be belonged to as the change of described component number herein or the replacement etc. of equivalence element.
Claims (6)
1. the device preventing residual liquid from dripping, is characterized in that, comprising:
Pipeline, described pipeline has inlet and liquid outlet;
Chamber, described chamber and pipeline communication;
Barrier film, described barrier film is arranged on the junction of chamber and pipeline, and chamber and pipeline separate by barrier film;
Plunger, described plunger is arranged in chamber, forms seal cavity between plunger and barrier film; And
Cylinder, described cylinder is connected with plunger, and cylinder can drive plunger in chamber indoor sport, to change the volume of the seal cavity formed between plunger and barrier film.
2. the device preventing residual liquid from dripping according to claim 1, is characterized in that, described barrier film is made up of elastomeric material.
3. the device preventing residual liquid from dripping according to claim 1, is characterized in that, the liquid outlet of described chamber adjacent conduit.
4. the device preventing residual liquid from dripping according to claim 1, is characterized in that, before feed flow, described cylinder drives plunger motion, fits with the wall and barrier film that make plunger.
5. the device preventing residual liquid from dripping according to claim 1, is characterized in that, when feed flow stops, cylinder drives plunger to move up to the top of chamber, and the volume of the seal cavity formed between plunger and barrier film reaches maximum.
6. the device preventing residual liquid from dripping according to claim 5, is characterized in that, the air pressure when volume of the seal cavity formed between plunger and barrier film reaches maximum in seal cavity is less than atmospheric pressure, forms air void at the liquid outlet place of pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310566899.9A CN104624430B (en) | 2013-11-14 | 2013-11-14 | The device for preventing residual liquid from dripping |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310566899.9A CN104624430B (en) | 2013-11-14 | 2013-11-14 | The device for preventing residual liquid from dripping |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104624430A true CN104624430A (en) | 2015-05-20 |
| CN104624430B CN104624430B (en) | 2019-05-17 |
Family
ID=53203946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310566899.9A Active CN104624430B (en) | 2013-11-14 | 2013-11-14 | The device for preventing residual liquid from dripping |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104624430B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110711655A (en) * | 2019-10-25 | 2020-01-21 | 文安县天华密度板有限公司 | Atomization nozzle drip-proof device and method |
| CN113028289A (en) * | 2021-02-01 | 2021-06-25 | 成青瑜 | High leakproofness cosmetics aqueous phase raw materials metering device |
| WO2022126748A1 (en) * | 2020-12-18 | 2022-06-23 | 浙江启尔机电技术有限公司 | Immersion liquid supply system and immersion liquid flow field removal method therefor |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU7294394A (en) * | 1993-09-14 | 1995-03-30 | Sanprint Pty. Ltd. | An engraving hand piece |
| CN2401706Y (en) * | 1999-12-23 | 2000-10-18 | 雷泽民 | Hand pressed pump |
| CN2594771Y (en) * | 2003-01-18 | 2003-12-24 | 张长江 | Leakage proof device on watermeter |
| CN202027426U (en) * | 2010-12-23 | 2011-11-09 | 泰州乐金电子冷机有限公司 | Leakproof water valve for water dispenser |
| CN202031794U (en) * | 2011-03-15 | 2011-11-09 | 北京市电力公司 | Withdrawal device |
-
2013
- 2013-11-14 CN CN201310566899.9A patent/CN104624430B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU7294394A (en) * | 1993-09-14 | 1995-03-30 | Sanprint Pty. Ltd. | An engraving hand piece |
| CN2401706Y (en) * | 1999-12-23 | 2000-10-18 | 雷泽民 | Hand pressed pump |
| CN2594771Y (en) * | 2003-01-18 | 2003-12-24 | 张长江 | Leakage proof device on watermeter |
| CN202027426U (en) * | 2010-12-23 | 2011-11-09 | 泰州乐金电子冷机有限公司 | Leakproof water valve for water dispenser |
| CN202031794U (en) * | 2011-03-15 | 2011-11-09 | 北京市电力公司 | Withdrawal device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110711655A (en) * | 2019-10-25 | 2020-01-21 | 文安县天华密度板有限公司 | Atomization nozzle drip-proof device and method |
| WO2022126748A1 (en) * | 2020-12-18 | 2022-06-23 | 浙江启尔机电技术有限公司 | Immersion liquid supply system and immersion liquid flow field removal method therefor |
| CN113028289A (en) * | 2021-02-01 | 2021-06-25 | 成青瑜 | High leakproofness cosmetics aqueous phase raw materials metering device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104624430B (en) | 2019-05-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 201203 building 4, No. 1690, Cailun Road, free trade zone, Pudong New Area, Shanghai Patentee after: Shengmei semiconductor equipment (Shanghai) Co., Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Cailun Road No. fourth 1690 Patentee before: ACM (SHANGHAI) Inc. |
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| CP03 | Change of name, title or address |