CN104617175A - 一种石墨烯/非晶硅太阳能电池及其制备方法 - Google Patents
一种石墨烯/非晶硅太阳能电池及其制备方法 Download PDFInfo
- Publication number
- CN104617175A CN104617175A CN201510021261.6A CN201510021261A CN104617175A CN 104617175 A CN104617175 A CN 104617175A CN 201510021261 A CN201510021261 A CN 201510021261A CN 104617175 A CN104617175 A CN 104617175A
- Authority
- CN
- China
- Prior art keywords
- graphene
- layer
- electrode
- solar cell
- silicon solar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 48
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 46
- 238000002360 preparation method Methods 0.000 title claims abstract description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract description 12
- 229910052710 silicon Inorganic materials 0.000 title abstract description 12
- 239000010703 silicon Substances 0.000 title abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 239000010409 thin film Substances 0.000 claims description 24
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 20
- 239000010408 film Substances 0.000 claims description 18
- 238000007747 plating Methods 0.000 claims description 18
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 8
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229960001296 zinc oxide Drugs 0.000 claims description 4
- 239000011787 zinc oxide Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 6
- 230000009466 transformation Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 47
- 239000013078 crystal Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229920002472 Starch Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
本发明涉及一种石墨烯/非晶硅太阳电池及其制备方法,该电池自下而上依次有衬底、导电镀膜层、n型非晶硅薄膜层、i型非晶硅薄膜层及石墨烯层,所述的太阳电池还设有第一电极和第二电极,第一电极设置在导电镀膜层上,第二电极设置在石墨烯层上。其制备方法如下:先在衬底上沉积导电镀膜层,再沉积n型非晶硅薄膜层,再沉积i型非晶硅薄膜层;然后将石墨烯转移至非晶硅层上;最后在石墨烯层及导电镀膜层上分别制作电极,获得太阳电池。本发明在低成本及简单工艺的基础上可获得转化效率高的新型太阳电池。
Description
技术领域
本发明涉及一种太阳电池及其制备方法,尤其涉及石墨烯/非晶硅太阳电池及其制备方法,属于太阳能技术领域。
背景技术
现在能源危机和环境污染是人类面临的重大挑战,开发新能源和可再生能源至关重要,太阳能电池作为一种新型绿色能源,影响着人类的可持续发展。目前,晶体硅太阳能电池占据市场~90%的份额,因为硅是地球上存储的第二大元素。在硅系太阳电池中,单晶硅转换效率高,但电池发电成本较高,限制了其广泛应用,而非晶硅在可见光内有较高的吸收系数,可实现低成本大面积的薄膜沉积,非晶硅薄膜技术将是今后太阳能电池的市场主流。
自石墨烯材料发现以来,其在电学、光学、磁学以及力学方面表现出的优异性质如极高的载流子迁移率、高透光性、高的杨氏模量等引发了石墨烯在诸多领域应用的憧憬。其中石墨烯在太阳能电池领域的应用研究为石墨烯在能源领域的应用打开了大门。
发明内容
本发明的目的在于提供一种光电转化效率高,工艺简单成本低的石墨烯/非晶硅太阳电池及其制备方法。
本发明的石墨烯/非晶硅太阳电池,自下而上依次有衬底、导电镀膜层、n型非晶硅薄膜层、i型非晶硅薄膜层及石墨烯层,所述的太阳电池还设有第一电极和第二电极,第一电极设置在导电镀膜层上,第二电极设置在石墨烯层上。
上述技术方案中,所述的导电镀膜层可以为金属、ITO、FTO、n型掺杂氧化锌或p型掺杂氧化锌。
所述的石墨烯层中的石墨烯通常为1-10层。
所述的衬底可以为刚性衬底或柔性衬底。
所述的第一电极和第二电极均可为金、钯、银、钛、铬和镍中的一种或几种的复合电极。
所述的导电镀膜层厚度通常为1纳米至500纳米,n型非晶硅薄膜层厚度通常为5纳米至500纳米,i型非晶硅薄膜层厚度通常为10纳米至10微米。
制备上述的石墨烯/非晶硅太阳电池的方法,包括如下步骤:
1)在洁净的衬底上生长导电镀膜层;
2)在导电镀膜层上沉积n型非晶硅薄膜层,再沉积i型非晶硅薄膜层,并在导电镀膜层表面预留生长第一电极的面积;
3)将石墨烯转移至i型非晶硅薄膜层上获得石墨烯层;
4)在导电镀膜层上沉积第一电极,并在石墨烯层上沉积第二电极。
本发明与现有技术相比具有的有益效果是:与传统非晶硅太阳能电池制造工艺相比,本发明的太阳电池的制备工艺简单,成本较低,便于推广。
附图说明:
图1为石墨烯/非晶硅太阳电池的示意图。
具体实施方式
参照图1,本发明的石墨烯/非晶硅太阳电池自下而上依次有衬底1、导电镀膜层2、n型非晶硅薄膜层3、i型非晶硅薄膜层4及石墨烯层5,所述的太阳电池还设有第一电极6和第二电极7,第一电极6设置在导电镀膜层2上,第二电极7设置在石墨烯层5上。
实施例1:
1)将玻璃衬底在去离子水中清洗干净并吹干;
2)在玻璃衬底上利用磁控溅射沉积500纳米厚的掺铟氧化锡;
3)在掺铟氧化锡层上利用化学气相沉积技术沉积5纳米厚的n型非晶硅薄膜层,再在其上沉积10微米厚的i型非晶硅薄膜层,并在ITO层上预留生长第一电极的面积;
4)将单层石墨烯转移至i型非晶硅薄膜层上;
5)在石墨烯上以及ITO层预留面积处涂覆银浆并烘干,得到石墨烯/非晶硅太阳电池。
实施例2:
1)将柔性PET衬底在去离子水中清洗干净并吹干;
2)在PET衬底上利用磁控溅射沉积1纳米厚的金;
3)在金导电层上利用等离子增强化学气相沉积技术生长5纳米厚的n型非晶硅薄膜层,再利用同样技术在其上沉积10纳米厚的i型非晶硅薄膜层,并在金导电层上预留生长第一电极的面积;
4)将10层石墨烯转移至i型非晶硅薄膜层上;
5)在石墨烯上以及金导电层上预留面积处涂利用电子束蒸发沉积钛钯银复合电极,得到石墨烯/非晶硅太阳电池。
实施例3:
1)将柔性PI衬底在去离子水中清洗干净并吹干;
2)在PI衬底上利用磁控溅射沉积40纳米厚的AZO;
3)在AZO层上利用等离子增强化学气相沉积技术生长500纳米厚的n型非晶硅薄膜层,再利用同样技术在其上沉积0.8微米厚的i型非晶硅薄膜层,并在AZO层上预留生长第一电极的面积;
4)将5层石墨烯转移至i型非晶硅薄膜层上;
5)在石墨烯上以及AZO层上预留面积处涂利用热蒸发技术沉积镍电极,得到石墨烯/非晶硅太阳电池。
Claims (7)
1.一种石墨烯/非晶硅太阳电池,其特征在于自下而上依次有衬底(1)、导电镀膜层(2)、n型非晶硅薄膜层(3)、i型非晶硅薄膜层(4)及石墨烯层(5),所述的太阳电池还设有第一电极(6)和第二电极(7),第一电极(6)设置在导电镀膜层(2)上,第二电极(7)设置在石墨烯层(5)上。
2.根据权利要求1所述的石墨烯/非晶硅太阳电池,其特征在于所述的导电镀膜层(2)为金属、ITO、FTO、n型掺杂氧化锌或p型掺杂氧化锌。
3.根据权利要求1所述的石墨烯/非晶硅太阳电池,其特征在于所述的石墨烯层(5)中的石墨烯为1-10层。
4. 根据权利要求1所述的石墨烯/非晶硅太阳电池,其特征在于所述的衬底(1)为刚性衬底或柔性衬底。
5. 根据权利要求1所述的石墨烯/非晶硅太阳电池,其特征在于所述的第一电极(6)为金、钯、银、钛、铬和镍中的一种或几种的复合电极,所述的第二电极(7)为金、钯、银、钛、铬和镍中的一种或几种的复合电极。
6. 根据权利要求1所述的石墨烯/非晶硅太阳电池,其特征在于所述的导电镀膜层(2)厚度为1纳米至500纳米,n型非晶硅薄膜层(3)厚度为5纳米至500纳米,i型非晶硅薄膜层(4)厚度为10纳米至10微米。
7. 制备如权利要求1~6任一项所述的石墨烯/非晶硅太阳电池的方法,其特征在于包括如下步骤:
1)在洁净的衬底(1)上生长导电镀膜层(2);
2)在导电镀膜层(2)上沉积n型非晶硅薄膜层(3),再沉积i型非晶硅薄膜层(4),并在导电镀膜层(2)表面预留生长第一电极(6)的面积;
3)将石墨烯转移至i型非晶硅薄膜层(4)上,获得石墨烯层(5);
4)在导电镀膜层(2)上沉积第一电极(6),并在石墨烯层(5)上沉积第二电极(7)。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510021261.6A CN104617175A (zh) | 2015-01-16 | 2015-01-16 | 一种石墨烯/非晶硅太阳能电池及其制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510021261.6A CN104617175A (zh) | 2015-01-16 | 2015-01-16 | 一种石墨烯/非晶硅太阳能电池及其制备方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN104617175A true CN104617175A (zh) | 2015-05-13 |
Family
ID=53151531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510021261.6A Pending CN104617175A (zh) | 2015-01-16 | 2015-01-16 | 一种石墨烯/非晶硅太阳能电池及其制备方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104617175A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109037370A (zh) * | 2018-07-10 | 2018-12-18 | 浙江大学 | 一种硅基太阳能电池 |
CN109065647A (zh) * | 2018-10-18 | 2018-12-21 | 君泰创新(北京)科技有限公司 | 太阳能电池及其制备方法 |
-
2015
- 2015-01-16 CN CN201510021261.6A patent/CN104617175A/zh active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109037370A (zh) * | 2018-07-10 | 2018-12-18 | 浙江大学 | 一种硅基太阳能电池 |
CN109065647A (zh) * | 2018-10-18 | 2018-12-21 | 君泰创新(北京)科技有限公司 | 太阳能电池及其制备方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104576788A (zh) | 一种硒化镉增强的石墨烯/碲化镉太阳电池及其制备方法 | |
CN205863192U (zh) | 一种采用双tco膜层的硅基异质结太阳能电池 | |
CN102299206B (zh) | 一种异质结太阳电池及其制备方法 | |
CN104134720A (zh) | 单源闪蒸法生长有机无机杂化钙钛矿材料及其平面型太阳能电池的制备方法 | |
KR101172952B1 (ko) | 황화나트륨을 이용한 유연 cigss 박막태양전지 제조 및 제조방법 | |
KR20100097549A (ko) | 산화아연 나노와이어를 이용한 박막 실리콘 태양전지 및 그의 제조방법 | |
TW201140859A (en) | Coaxial nanowire solar cell structure | |
CN104241415A (zh) | 一种石墨烯/砷化镓太阳电池及其制造方法 | |
CN105140398A (zh) | 一种背接触钙钛矿太阳电池 | |
CN107681055A (zh) | 一种abo3型钙钛矿基薄膜太阳能电池 | |
CN103178156A (zh) | 一种薄膜太阳能电池陷光结构玻璃的制备及其应用 | |
CN105932075B (zh) | 一种背结晶硅异质结太阳电池及其制备方法 | |
CN104851935B (zh) | 一种电场调控的石墨烯/磷化铟太阳电池及其制备方法 | |
CN209963073U (zh) | 一种新型高效率双面入光CdTe钙钛矿叠层光伏电池 | |
CN107946382A (zh) | Mwt与hit结合的太阳能电池及其制备方法 | |
CN106449849A (zh) | 一种石墨烯/铜锌锡硫薄膜太阳电池及其制造方法 | |
CN104037324A (zh) | 一种基于硫化镉纳米阵列的钙钛矿杂化太阳电池 | |
CN104617175A (zh) | 一种石墨烯/非晶硅太阳能电池及其制备方法 | |
CN204230261U (zh) | 一种石墨烯/砷化镓太阳电池 | |
CN108389937A (zh) | 一种基于三维径向结纳米结构高功率质量比柔性太阳能电池的制备方法 | |
CN201638834U (zh) | 一种纳米线异质结阵列基紫外光探测器 | |
CN207409516U (zh) | 一种钙钛矿基薄膜太阳能电池 | |
CN104576787A (zh) | 一种电场调控的石墨烯/砷化镓太阳电池及其制备方法 | |
CN104600147A (zh) | 一种石墨烯/碲化镉太阳电池及其制备方法 | |
CN105845829A (zh) | 一种钙钛矿太阳能电池 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150513 |
|
RJ01 | Rejection of invention patent application after publication |