CN104611669A - Manufacturing method of masks - Google Patents
Manufacturing method of masks Download PDFInfo
- Publication number
- CN104611669A CN104611669A CN201510095739.XA CN201510095739A CN104611669A CN 104611669 A CN104611669 A CN 104611669A CN 201510095739 A CN201510095739 A CN 201510095739A CN 104611669 A CN104611669 A CN 104611669A
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- Prior art keywords
- mask plate
- blocking
- temperature
- deformation quantity
- framework
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The invention discloses a manufacturing method of masks. The manufacturing method comprises the following steps: (1) measuring an environment temperature T1; (2) tensioning the two ends of a shielding mask, and fixing the shielding mask on a mask frame and calculating the deformation of the shielding mask; (3) fixing masks in the left region and the right region of the mask frame, respectively, wherein the edges of the masks are as long as the overlapping part of the shielding mask; calculating the deformation of the masks; (4) putting the mask frame on which the shielding mask and the masks are fixed into a heating room and heating to a temperature T2 for thermal expansion; (5) welding and fixing the overlapping regions of the masks and the shielding masks in an environment at the temperature T2; and (6) taking out the mask frame from the heating room and cooling to the temperature T1. By the manufacturing method dislcosed by the invention, the shrinking deformation problem due to tension can be effectively reduced and the quality of the mask is improved, and the method is capable of meeting the requirements of manufacturing the masks of high PPI display screen products.
Description
Technical field
The invention belongs to organic light emitting display and make field, be specifically related to a kind of making method of mask plate.
Background technology
Organic Electricity laser diode is also known as Organic Electricity laser writer (Organic Light-Emitting Diodes, be called for short OLED) be selfluminous element, it does not need backlight, there is the advantages such as outward appearance is light, thin, and traditional liquid-crystal display (LCD) needs backlight to work, apparent size is thicker.Organic Electricity laser writer also has low in energy consumption simultaneously, and visual angle is wide, and screen response is fast, is to meet the following technology to display function requirement of people.Therefore, Organic Electricity laser writer is expected to replace liquid-crystal display in the near future, has very high market potential.
Organic Electricity laser writer is in making processes, comparatively proven technique adopts vacuum evaporation technology at present, in device fabrication process, organic materials can be deposited on the substrate that is positioned at above evaporation source, for forming distinctive pattern, below substrate, being glued with mask plate, mask plate leaving and designs typesetted opening in advance, final organic materials by the open area in mask, can be deposited to thereon.And the mask plate produced now easily causes mask plate generation deformation owing to first then mask plate tensioning being fixed on mask plate frame content when producing, cause the generation of defective products, affect the quality of mask plate.
Summary of the invention
In view of this, the technical problem to be solved in the present invention is to provide a kind of can reduction because tensioning causes mask plate to be out of shape the making method of the mask plate of problem of non-uniform.
In order to solve the problems of the technologies described above, the present invention adopts following scheme to realize: a kind of making method of mask plate, comprises the following steps:
Step 1, measures ambient temperature T1;
Step 2, under the environment of temperature T1, first will block the two ends tensioning of mask plate, and then the two ends of blocking mask plate will be fixed on the mid-way of mask plate framework, described in calculating, block the deformation quantity that mask plate is produced by tensile force;
Step 3, fix one piece of mask plate respectively in the left region of described mask plate framework and right areas, the two ends tensioning of mask plate is fixed on the left region that mask plate framework is positioned at the left side of blocking mask plate and is positioned at the right areas of blocking on the right side of mask plate, and the mask plate being positioned at mask plate framework left region is identical with the partial-length blocking mask plate overlap with the edge of the mask plate being positioned at mask plate framework right areas; Calculate the deformation quantity that mask plate is produced by tensile force;
Step 4, the described mask plate framework blocking mask plate and mask plate that is fixed with is put into heating room and is heated to temperature T2 and carries out thermal expansion, wherein, temperature T2 calculates according to the deformation quantity blocking mask plate and mask plate;
Step 5, under the environment of temperature T2, mask plate and the overlapping region of blocking between mask plate to be welded and fixed;
Step 6, by mask plate framework from heating room take out, be cooled to ambient temperature T1.
Wherein, describedly mask plate is blocked and mask plate adopts identical material to make.
Wherein, the described deformation quantity blocking mask plate and mask plate comprises the deformation quantity △ L of length direction and the deformation quantity △ B of width; The deformation quantity △ L of length is △ L=F × L/(E × A), △ B=△ L × U1/U2, wherein F for described in block mask plate or described mask plate reactive force along its length, L is the original length blocking mask plate or mask plate, and A is the section area blocking mask plate or mask plate, and E is Young's modulus, U2 is the deflection of unit length direction, U1 is the deflection of unit width, and be a constant for specific material U1, U2, U1, U2 ratio is called Poisson's ratio.
Wherein, the size of the temperature T2 described in step 4 controls as T2=△ L/(L × ξ)+T1, wherein △ L is expansion length, and L is the length of blocking mask plate or mask plate, and ξ is the thermal expansivity blocking mask plate or mask plate.
Wherein, the thermal expansion deformation amount of blocking mask plate and mask plate described in step 4 is more than or equal to the deformation quantity blocking mask plate and mask plate.
Compared with prior art, the present invention by tensioning block mask plate and mask plate is fixed on mask plate framework successively, then heat temperature raising is carried out to being fixed with the mask plate framework blocking mask plate and mask plate, be heated to certain temperature, after blocking mask plate and mask plate expanded by heating, size is elongated, make to block mask plate and mask plate is in relaxed state, the stress that release tensioning causes, reduce the shrinkage strain of mask plate, now by mask plate with block mask plate and to weld or together with additive method bonds, finally return to room temperature, mask plate returns original tensioning state, weld blocking under mask plate and mask plate are in relaxed state, effectively can reduce the shrinkage strain problem because tensile force causes, improve the quality of mask plate, be applicable to the mask plate requirement manufacturing high PPI display products.
Accompanying drawing explanation
Fig. 1 of the present inventionly blocks mask plate and mask plate tensioning and is fixed on structural representation on mask plate framework.
Fig. 2 be of the present invention block mask plate and mask plate heating after fixing structural representation.
Embodiment
In order to allow those skilled in the art understand technical scheme of the present invention better, below in conjunction with accompanying drawing, the present invention is further elaborated.
As depicted in figs. 1 and 2, a kind of making method of mask plate, comprises the following steps:
The envrionment temperature in step 1, measurement workshop, and record the envrionment temperature T1 in workshop;
Step 2, under the environment of temperature T1, the two ends of blocking mask plate 2, by blocking mask plate 2 two ends tensioning along its length, are then fixed on the mid-way of mask plate framework 1 by the pulling force that first uses size to be F1; Owing to blocking the two ends tensioning of mask plate 2, it is identical with pulling force that the two ends of therefore blocking mask plate 2 are subject to tensile force, the two ends of blocking mask plate 2 produce deformation because its length direction is subject to tensile force effect, now according to blocking the tensile force size F1 of mask plate 2 length direction and blocking length and the width of mask plate 2, calculate the deformation quantity △ B of deformation quantity △ L and the width blocking the length direction that mask plate 2 is produced by tensile force; Wherein the deformation quantity △ L1 of length is △ L=F1 × L/(E × A), the deformation quantity △ B of width is △ B1=△ L × U1/U2, wherein F1 for described in block mask plate tensile force along its length, L is the original length blocking mask plate, and A is the section area blocking mask plate, E is Young's modulus, U2 is the deflection of unit length direction, and U1 is the deflection of unit width, for specific material, U1, U2 are a constant, and U1, U2 ratio is called Poisson's ratio;
Step 3, will block mask plate 2 fixing after, fix one piece of mask plate 3 respectively in the left region of mask plate framework 1 and right areas, time fixing, two pieces of mask plates 3 use the tensile force f 2 of formed objects by mask plate 3 two ends tensioning along its length, then mask plate 3 be separately fixed at the left region that mask plate framework 1 is positioned at and blocks on the left of mask plate 2 and be positioned at the right areas of blocking on the right side of mask plate 2, and the mask plate 3 being positioned at mask plate framework 1 left region is all overlapping with blocking mask plate 2 with the edge of the mask plate 3 being positioned at mask plate framework 1 right areas, the mask plate 3 being wherein positioned at mask plate framework 1 left region is identical with the partial-length blocking mask plate overlap with the edge of the mask plate 3 being positioned at mask plate framework 1 right areas, as shown in Figure 1, due to the two ends tensioning of mask plate 3, therefore to be subject to tensile force identical with pulling force at the two ends of mask plate 3, the two ends of mask plate 3 produce deformation because its length direction is subject to tensile force effect, also be now length and the width of F2 and mask plate 3 according to the tensile force size of mask plate 3 length direction, calculate the deformation quantity △ L2 of the length direction that mask plate 3 is produced by tensile force and the deformation quantity △ B2 of width, wherein the deformation quantity △ L2 of length direction is △ L=F2 × L/(E × A), the deformation quantity △ B2 of width is △ B=△ L × U1/U2, wherein F2 is described mask plate tensile force along its length, and L is the original length of mask plate, and A is the section area of mask plate, E is Young's modulus, U2 is the deflection of unit length direction, and U1 is the deflection of unit width, for specific material, U1, U2 are a constant, and P=U1/ U2 is called Poisson's ratio,
Step 4, owing to blocking mask plate 2 and mask plate 3 adopts identical material to make, therefore mask plate 2 is blocked identical with Poisson's ratio with the Young's modulus of mask plate 3, according to calculating the deformation quantity blocking mask plate 2 and mask plate 3 in step 2 and step 3, select to block the larger conduct of the deformation quantity of mask plate and mask plate with reference to deformation quantity, then by be fixed with the mask plate framework blocking mask plate and mask plate put into heating room heat, temperature in heating room is controlled for T2, now block mask plate and mask plate Yin Wendu to raise and expand distortion, when heating room heating simultaneously, the thermal expansion deformation amount of blocking mask plate and mask plate is made to be more than or equal to the deformation quantity blocking mask plate and mask plate, now block mask plate and mask plate release tensile force, the size of the Heating temperature T2 in wherein said heating room controls as T2=△ L/(L × ξ)+T1, wherein △ L is the expansion length of blocking mask plate 2 or mask plate 3, L is the length of blocking mask plate 2 or mask plate 3, and ξ is the thermal expansivity blocking mask plate 2 or mask plate 3.
Step 5, under the environment of temperature T2, owing to blocking mask plate and mask plate process relaxed state under this temperature environment, now mask plate and the overlapping region of blocking between mask plate are welded and fixed, can deformation be reduced, as shown in Figure 2; Make to block mask plate and mask plate mortise, improve mask plate quality; Be applicable to the mask plate requirement manufacturing high PPI display products; Described PPI is the abbreviation of pixels per inch, is the unit of image resolution ratio, secondary represented be pixel (pixel) number that per inch has.Therefore PPI numerical value is higher, and namely representing display screen can with higher density display image.Certainly, the density of display is higher, and degree of verisimilitude is higher.
Step 6, by mask plate framework from heating room take out, be cooled to ambient temperature T1.
Embodiment 1
Select the special low bulk iron-nickel alloy Invar36 material of super-low expansion coefficient to make and block mask plate and mask plate, the size of blocking mask plate and mask plate is: thickness is 30um, and wide is 60mm, and long is 1000mm.Be in the environment of 25 DEG C in workshop temperature, adopt the pulling force of 20N will block mask plate and mask plate respectively tensioning be fixed on mask plate framework, and the Young's modulus of iron-nickel alloy Invar36 is E=1.48 × 10
11n/ ㎡, thermal expansivity is
ξ=1.2 × 10
-6m/ DEG C, then block the length deformation amount △ L=F × L/(E × A of mask plate and mask plate)=20N × 1m/ (1.48 × 10
11n/ ㎡ × 6 × 10
-2m × 3 × 10
-5m)=0.75 × 10
-4m=75um; △ B=△ L × U1/U2=△ L × P=0.75 × 10
-4m × 0.3=22.5 × 10
-6m=22.5um; Now the temperature in workshop should control be: T2=△ L/(L × ξ)+T1=0.75 × 10
-4m/(1m × 1.2 × 10
-6m/ DEG C)+25 DEG C=62.5 DEG C+25 DEG C=87.5 DEG C, be placed in the environment of 87.5 DEG C by being fixed with the mask plate framework blocking mask plate and mask plate, then expansion deformation quantity is with to block mask plate identical with the deformation quantity of mask plate.In order to complete the deformation quantity eliminated and block mask plate and mask plate, then temperature should be increased, make the thermal expansion deformation amount of blocking mask plate and mask plate be more than or equal to the deformation quantity blocking mask plate and mask plate, be about to be fixed with the mask plate framework blocking mask plate and mask plate and be placed in the heating room of more than 87.5 DEG C and carry out being welded and fixed and could eliminate deformation quantity.
Embodiment 2
Select the special low bulk iron-nickel alloy Invar36 material of super-low expansion coefficient to make and block mask plate and mask plate, the size of blocking mask plate and mask plate is: thickness is 30um, and wide is 60mm, and long is 1000mm.Be in the environment of 25 DEG C in workshop temperature, adopt the pulling force of 50N will block mask plate and mask plate respectively tensioning be fixed on mask plate framework, and the Young's modulus of iron-nickel alloy Invar36 is E=1.48 × 10
11n/ ㎡, thermal expansion is absorbed as
ξ=1.2 × 10
-6m/ DEG C, then block the length deformation amount △ L=F × L/(E × A of mask plate and mask plate)=50N × 1m/ (1.48 × 10
11n/ ㎡ × 6 × 10
-2m × 3 × 10
-5m)=1.877 × 10
-4m=187.7um; △ B=△ L × U1/U2=△ L × P=1.877 × 10
-4m × 0.3=56.31 × 10
-6m=56.31um; Now the temperature in workshop should control be: T2=△ L/(L × ξ)+T1=1.877 × 10
-4m/(1m × 1.2 × 10
-6m/ DEG C)+25 DEG C=156.4 DEG C+25 DEG C=181.4 DEG C, be placed in the environment of 181.4 DEG C by being fixed with the mask plate framework blocking mask plate and mask plate, then expansion deformation quantity is with to block mask plate identical with the deformation quantity of mask plate.In order to complete the deformation quantity eliminated and block mask plate and mask plate, then temperature should be increased, make the thermal expansion deformation amount of blocking mask plate and mask plate be more than or equal to the deformation quantity blocking mask plate and mask plate, be about to be fixed with the mask plate framework blocking mask plate and mask plate and be placed in the heating room of more than 181.4 DEG C and carry out being welded and fixed and could eliminate deformation quantity.
Above-described embodiment is only wherein specific implementation of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these apparent replacement forms all belong to protection scope of the present invention.
Claims (5)
1. a making method for mask plate, is characterized in that, comprises the following steps:
Step 1, measures ambient temperature T1;
Step 2, under the environment of temperature T1, first the two ends tensioning of mask plate (2) will be blocked, then the two ends of blocking mask plate (2) are fixed on the mid-way of mask plate framework (1), described in calculating, block the deformation quantity that mask plate (2) is produced by tensile force;
Step 3, fix one piece of mask plate (3) respectively in the left region of described mask plate framework (1) and right areas, the two ends tensioning of mask plate (3) is fixed on the left region that mask plate framework (1) is positioned at the left side of blocking mask plate (2) and is positioned at the right areas of blocking mask plate (2) right side, and the mask plate (3) being positioned at mask plate framework (1) left region is identical with the partial-length blocking mask plate overlap with the edge of the mask plate (3) being positioned at mask plate framework (1) right areas; Calculate the deformation quantity that mask plate (3) is produced by tensile force;
Step 4, the described mask plate framework (1) blocking mask plate (2) and mask plate (3) that is fixed with is put into heating room and is heated to temperature T2 and carries out thermal expansion, wherein, temperature T2 calculates according to the deformation quantity blocking mask plate (2) and mask plate (3);
Step 5, under the environment of temperature T2, mask plate (3) and the overlapping region of blocking between mask plate (2) to be welded and fixed;
Step 6, by mask plate framework (1) from heating room take out, be cooled to ambient temperature T1.
2. the making method of mask plate according to claim 1, is characterized in that, described blocks mask plate (2) and mask plate (3) adopts identical material to make.
3. the making method of mask plate according to claim 2, is characterized in that, the described deformation quantity blocking mask plate (2) and mask plate (3) comprises the deformation quantity △ L of length direction and the deformation quantity △ B of width; The deformation quantity △ L of length is △ L=F × L/(E × A), △ B=△ L × U1/U2, wherein F for described in block mask plate or described mask plate reactive force along its length, L is the original length blocking mask plate or mask plate, and A is the section area blocking mask plate or mask plate, and E is Young's modulus, U2 is the deflection of unit length direction, U1 is the deflection of unit width, and be a constant for specific material U1, U2, U1, U2 ratio is called Poisson's ratio.
4. the making method of mask plate according to claim 3, it is characterized in that, the size of the temperature T2 described in step 4 controls as T2=△ L/(L × ξ)+T1, wherein △ L is expansion length, L is for blocking the length of mask plate (2) or mask plate (3), and ξ is for blocking the thermal expansivity of mask plate (2) or mask plate (3).
5. the making method of mask plate according to claim 4, is characterized in that, the thermal expansion deformation amount of blocking mask plate (2) and mask plate (3) described in step 4 is more than or equal to the deformation quantity blocking mask plate and mask plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510095739.XA CN104611669B (en) | 2015-03-04 | 2015-03-04 | Manufacturing method of masks |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510095739.XA CN104611669B (en) | 2015-03-04 | 2015-03-04 | Manufacturing method of masks |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104611669A true CN104611669A (en) | 2015-05-13 |
| CN104611669B CN104611669B (en) | 2017-05-10 |
Family
ID=53146307
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510095739.XA Active CN104611669B (en) | 2015-03-04 | 2015-03-04 | Manufacturing method of masks |
Country Status (1)
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|---|---|
| CN (1) | CN104611669B (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106200275A (en) * | 2016-07-11 | 2016-12-07 | 武汉华星光电技术有限公司 | Exposure method |
| CN107227438A (en) * | 2017-06-15 | 2017-10-03 | 京东方科技集团股份有限公司 | The design method of metal mask plate, the preparation method of metal mask plate |
| CN107732012A (en) * | 2017-10-09 | 2018-02-23 | 深圳市华星光电半导体显示技术有限公司 | Throw the net equipment |
| CN107949810A (en) * | 2015-07-14 | 2018-04-20 | Asml荷兰有限公司 | Patterning device cooling system in lithographic equipment |
| CN109072423A (en) * | 2016-04-28 | 2018-12-21 | 株式会社爱发科 | Film forming mask and film formation device |
| CN109097728A (en) * | 2018-09-26 | 2018-12-28 | 京东方科技集团股份有限公司 | A kind of mask plate and its method of throwing the net, device of throwing the net |
| CN109468588A (en) * | 2019-01-04 | 2019-03-15 | 京东方科技集团股份有限公司 | A kind of preparation method of mask plate, mask plate |
| CN112662993A (en) * | 2020-12-03 | 2021-04-16 | 武汉华星光电半导体显示技术有限公司 | Mask plate, evaporation device and evaporation method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010182942A (en) * | 2009-02-06 | 2010-08-19 | Nikon Corp | Mask, stage device, aligner, exposure method, and device manufacturing method |
| JP2012033921A (en) * | 2010-07-29 | 2012-02-16 | Nikon Corp | Exposure apparatus, and method for manufacturing device |
| CN103205693A (en) * | 2012-01-16 | 2013-07-17 | 昆山允升吉光电科技有限公司 | A mask assembly |
| CN103695840A (en) * | 2013-11-25 | 2014-04-02 | 昆山允升吉光电科技有限公司 | Mask assembly assembling method |
| CN104152847A (en) * | 2014-07-16 | 2014-11-19 | 上海和辉光电有限公司 | Method for improving temperature stability of metal mask in OLED evaporation process |
-
2015
- 2015-03-04 CN CN201510095739.XA patent/CN104611669B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010182942A (en) * | 2009-02-06 | 2010-08-19 | Nikon Corp | Mask, stage device, aligner, exposure method, and device manufacturing method |
| JP2012033921A (en) * | 2010-07-29 | 2012-02-16 | Nikon Corp | Exposure apparatus, and method for manufacturing device |
| CN103205693A (en) * | 2012-01-16 | 2013-07-17 | 昆山允升吉光电科技有限公司 | A mask assembly |
| CN103695840A (en) * | 2013-11-25 | 2014-04-02 | 昆山允升吉光电科技有限公司 | Mask assembly assembling method |
| CN104152847A (en) * | 2014-07-16 | 2014-11-19 | 上海和辉光电有限公司 | Method for improving temperature stability of metal mask in OLED evaporation process |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107949810A (en) * | 2015-07-14 | 2018-04-20 | Asml荷兰有限公司 | Patterning device cooling system in lithographic equipment |
| CN107949810B (en) * | 2015-07-14 | 2020-12-11 | Asml荷兰有限公司 | Patterning device cooling system in lithographic apparatus |
| CN109072423B (en) * | 2016-04-28 | 2020-07-14 | 株式会社爱发科 | Mask for film formation and film formation apparatus |
| CN109072423A (en) * | 2016-04-28 | 2018-12-21 | 株式会社爱发科 | Film forming mask and film formation device |
| CN106200275A (en) * | 2016-07-11 | 2016-12-07 | 武汉华星光电技术有限公司 | Exposure method |
| CN106200275B (en) * | 2016-07-11 | 2017-12-01 | 武汉华星光电技术有限公司 | Exposure method |
| US11709420B2 (en) | 2017-06-15 | 2023-07-25 | Boe Technology Group Co., Ltd. | Method of metal mask and manufacturing method of metal mask |
| CN107227438B (en) * | 2017-06-15 | 2019-05-03 | 京东方科技集团股份有限公司 | Design method, the preparation method of metal mask plate of metal mask plate |
| WO2018227961A1 (en) * | 2017-06-15 | 2018-12-20 | 京东方科技集团股份有限公司 | Method for designing metal mask plate and method for preparing metal mask plate |
| CN107227438A (en) * | 2017-06-15 | 2017-10-03 | 京东方科技集团股份有限公司 | The design method of metal mask plate, the preparation method of metal mask plate |
| CN107732012B (en) * | 2017-10-09 | 2019-06-25 | 深圳市华星光电半导体显示技术有限公司 | It throws the net equipment |
| CN107732012A (en) * | 2017-10-09 | 2018-02-23 | 深圳市华星光电半导体显示技术有限公司 | Throw the net equipment |
| CN109097728B (en) * | 2018-09-26 | 2021-11-02 | 京东方科技集团股份有限公司 | Mask plate, screen stretching method thereof and screen stretching device |
| CN109097728A (en) * | 2018-09-26 | 2018-12-28 | 京东方科技集团股份有限公司 | A kind of mask plate and its method of throwing the net, device of throwing the net |
| WO2020140776A1 (en) * | 2019-01-04 | 2020-07-09 | 京东方科技集团股份有限公司 | Method for preparing mask, mask, and evaporation method using mask |
| CN109468588B (en) * | 2019-01-04 | 2021-01-26 | 京东方科技集团股份有限公司 | Mask plate preparation method and mask plate |
| CN109468588A (en) * | 2019-01-04 | 2019-03-15 | 京东方科技集团股份有限公司 | A kind of preparation method of mask plate, mask plate |
| CN112662993A (en) * | 2020-12-03 | 2021-04-16 | 武汉华星光电半导体显示技术有限公司 | Mask plate, evaporation device and evaporation method |
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