CN104599927A - Preparation method for porous diaphragm - Google Patents
Preparation method for porous diaphragm Download PDFInfo
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- CN104599927A CN104599927A CN201410817305.1A CN201410817305A CN104599927A CN 104599927 A CN104599927 A CN 104599927A CN 201410817305 A CN201410817305 A CN 201410817305A CN 104599927 A CN104599927 A CN 104599927A
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- metal molybdenum
- molybdenum sheet
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
Abstract
The invention discloses a preparation method for a porous diaphragm. The preparation method for the porous diaphragm includes steps that using ammonia water, acetone, alcohol and de-ionized water to carry out ultrasonic cleaning on a round metal molybdenum plate in sequence, and using N2 for blow drying; then drying the round metal molybdenum plate; using a spin coater to coat the round metal molybdenum plate with positive photoresist, and pre-drying, exposing, developing and hardening in sequence to obtain a photoetching round metal molybdenum plate; placing the photoetching round metal molybdenum plate in corrosive liquid and stirring, wherein the corrosive liquid is composed of phosphoric acid, nitric acid, acetic acid and de-ionized water; using de-ionized water to wash the corroded round metal molybdenum plate, and etching; evaporating gold on double surfaces of the etched round metal molybdenum plate to obtain the porous diaphragm. The preparation method for the porous diaphragm solves the technical problems of low diaphragm processing efficiency and high cost of the prior art.
Description
Technical field
The invention belongs to scanning electron microscopy field of material technology, relate to a kind of preparation method of porous diaphragm.
Background technology
Be used as the diaphragm of the logical electron beam of scanning electron microscopy, need to process on the thin slice of refractory metal molybdenum from several microns to the micropore of the multiple pore sizes in 300 micrometer ranges and aperture.Adopt the mode of machining to carry out Drilling operation to thin molybdenum sheet, this mode not only needs to consume expensive diamond bit, and is difficult to process the aperture being less than 300 microns; Other process technologies, as spark machined, need to make corresponding electrode for different apertures, and the difficulty of machined electrode even exceedes and makes the difficulty of diaphragm, and electrode is also very easy to damage simultaneously, and this scheme also exists that efficiency is low, high in cost of production is not enough.
Along with technological progress and the application extension of electron beam and ion beam apparatus, the diaphragm of dozens of micropore becomes one of its core component.Due to the size wide coverage of such diaphragm, need several millimeters of micropores to a few micron-scale, and China in association area also without applicable electron beam diaphragm, as the conventional running stores in scanning electron microscopy system, the long-term dependence on import of the parts such as diaphragm, makes research and development cost high.
Summary of the invention
The object of this invention is to provide a kind of preparation method of porous diaphragm, solve the technical problem that diaphragm working (machining) efficiency is low, cost is high existed in prior art.
The technical solution adopted in the present invention is, a kind of preparation method of porous diaphragm, comprises the following steps:
Step 1, uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning to circular metal molybdenum sheet successively, and use traffic is the N of 1-2L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 8-15min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Step 2, by step 1 through N
2the circular metal molybdenum sheet dried up is dried;
Step 3, uses sol evenning machine to coat the positive photoresist of 1.2-2um the circular metal molybdenum sheet after drying in step 2, and carries out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching;
Step 4, circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 60-70min, obtain the circular metal molybdenum sheet after corroding, described corrosive liquid is composed of the following components: the phosphoric acid of 10-15%, the nitric acid of 20-30%, the acetic acid of 10-15%, the deionized water of 50%-60%, the mass percent sum of above each component is 100%;
Step 5, by the circular metal molybdenum sheet deionized water rinsing after corrosion, then carries out etching processing, obtains the circular metal molybdenum sheet after etching;
Step 6, carries out the process of two-sided steaming gold, obtains loose structure diaphragm by the circular metal molybdenum sheet after etching.
Feature of the present invention is also,
Adopt heating plate to dry in step 2, drying time is 2-3min, and bake out temperature is 120-130 DEG C.
Sol evenning machine gluing 2 times in step 3, sol evenning machine rotating speed is respectively 490-510 rev/min, 1900-2100 rev/min, and the time is respectively 4-6s and 84-86s; The front baking time is 1-2min, and pre-bake temperature is 120-130 DEG C; Time for exposure is 8-12s; The post bake time is 30-60min;
Use RIE reactive ion etching machine to carry out etching processing in step 5, etch period is 45-60min.
SF is adopted in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 110W-130W, and the reaction time is 40-80min.
Use evaporator to carry out the process of surface evaporation gold in step 6, evaporation time is 20-30min, and evaporation thickness is 0.5-2um.
The invention has the beneficial effects as follows that the method by adopting wet etching, reactive ion etching, surperficial evaporation to combine prepares loose structure diaphragm, by controlling the constituent content of etchant solution, suitable constituent content is selected to obtain flush edge, the good diaphragm of quality, and production cost is low, with short production cycle, precision is high.
Accompanying drawing explanation
Fig. 1 is the schematic flow sheet of the preparation method of the present invention's one one kinds of hole optical door screens;
Fig. 2 is the micrograph of the metal molybdenum sheet in the present invention after photoetching;
Fig. 3 (a) is the figure after metal molybdenum sheet corrosion when water is 30ml in corrosive liquid in the present invention;
Fig. 3 (b) is the figure after metal molybdenum sheet corrosion when water is 40ml in corrosive liquid in the present invention;
Fig. 3 (c) is the figure after metal molybdenum sheet corrosion when water is 45ml in corrosive liquid in the present invention;
Fig. 4 is the micrograph by the metal molybdenum sheet after reactive ion etching in the present invention;
Fig. 5 is the surperficial micrograph by the metal molybdenum sheet after corrosion in the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in detail.
The preparation method of a kind of porous diaphragm of the present invention, as shown in Figure 1, comprises the following steps:
Step 1, uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning to circular metal molybdenum sheet successively, be placed on clean dust-free paper by the molybdenum sheet after cleaning, and use traffic is the N of 1-2L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 8-15min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Step 2, by step 1 through N
2the circular metal molybdenum sheet dried up is dried; Adopt heating plate to dry, drying time is 2-3min, and bake out temperature is 120-130 DEG C;
Step 3, uses sol evenning machine to coat the positive photoresist of 1.2-2um the circular metal molybdenum sheet after drying in step 2, and carries out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching; Sol evenning machine gluing 2 times, rotating speed is respectively 490-510 rev/min, 1900-2100 rev/min, and the time is respectively 4-6s and 64-76s, and glue thickness is 1.2-2um; The front baking time is 1-2min, and pre-bake temperature is 120-130 DEG C; Time for exposure is 8-12s; The post bake time is 30-60min; Metal molybdenum chip architecture after photoetching as shown in Figure 2;
Step 4, circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 60-70min, obtain the circular metal molybdenum sheet after corroding, described corrosive liquid is composed of the following components: the phosphoric acid of 10-15%, the nitric acid of 20-30%, the acetic acid of 10-15%, the deionized water of 50%-60%, the mass percent sum of above each component is 100%; After corrosion, its pattern as shown in Figure 5;
Step 5, by the circular metal molybdenum sheet deionized water rinsing after corrosion, then carries out etching processing, obtains the circular metal molybdenum sheet after etching; Use RIE reactive ion etching machine to carry out etching processing, etch period is 45-60min; SF is adopted in etching process
6as reacting gas, unthreaded hole burrs on edges is processed; Reaction power is 110W-130W, and the reaction time is 40-80min; Its pattern of metal molybdenum sheet after etching as shown in Figure 4;
Step 6, carries out the process of two-sided steaming gold, obtains loose structure diaphragm by the circular metal molybdenum sheet after etching; Use evaporator to carry out the process of surface evaporation gold, evaporation time is 20-30min, and evaporation thickness is 0.5-2um.
Embodiment 1
Be that 50um circular metal molybdenum sheet uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning successively to thickness, and use traffic is the N of 1L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 8min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Will through N
2the circular metal molybdenum sheet dried up is dried; Adopt heating plate to dry, drying time is 2min, and bake out temperature is 120 DEG C;
Use sol evenning machine to coat the positive photoresist of 1.5um the circular metal molybdenum sheet after drying, and carry out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching; Sol evenning machine rotating speed is respectively 490 revs/min, 2100 revs/min, and the time is respectively 6s and 84s; The front baking time is 1.5min, and pre-bake temperature is 125 DEG C; Time for exposure is 8s; The post bake time is 45min;
Circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 60min, corrosive liquid is made up of phosphoric acid, nitric acid, acetic acid and deionized water, obtains the circular metal molybdenum sheet after corroding; The ratio of each component of corrosive liquid is 10:20:10:60;
By the circular metal molybdenum sheet deionized water rinsing after corrosion, then carry out etching processing, obtain the circular metal molybdenum sheet after etching; Use RIE reactive ion etching machine to carry out etching processing, etch period is 60min; SF is adopted in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 110W, and the reaction time is 60min;
Circular metal molybdenum sheet after etching is carried out the process of two-sided steaming gold, obtain loose structure diaphragm; Use evaporator to carry out the process of surface evaporation gold, evaporation time is 25min, and evaporation thickness is 1.5um.
Embodiment 2
Be that 50um circular metal molybdenum sheet uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning successively to thickness, and use traffic is the N of 2L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 15min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Will through N
2the circular metal molybdenum sheet dried up is dried; Adopt heating plate to dry, drying time is 3min, and bake out temperature is 130 DEG C;
Use sol evenning machine to coat the positive photoresist of 1.2um the circular metal molybdenum sheet after drying, and carry out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching; Sol evenning machine rotating speed is respectively 500 revs/min, 2000 revs/min, and the time is respectively 5s and 85s; The front baking time is 1min, and pre-bake temperature is 120 DEG C; Time for exposure is 12s; The post bake time is 30min;
Circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 70min, corrosive liquid is made up of phosphoric acid, nitric acid, acetic acid and deionized water, obtains the circular metal molybdenum sheet after corroding; The ratio of each component of corrosive liquid is 15:20:15:50;
By the circular metal molybdenum sheet deionized water rinsing after corrosion, then carry out etching processing, obtain the circular metal molybdenum sheet after etching;
Use RIE reactive ion etching machine to carry out etching processing, etch period is 45min; SF is adopted in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 30W, and the reaction time is 40min;
Circular metal molybdenum sheet after etching is carried out the process of two-sided steaming gold, obtain loose structure diaphragm; Use evaporator to carry out the process of surface evaporation gold, evaporation time is 30min, and evaporation thickness is 2um.
Embodiment 3
Use ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning successively to the circular metal molybdenum sheet that thickness is 50um, and use traffic is the N of 1.5L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 10min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Will through N
2the circular metal molybdenum sheet dried up is dried; Adopt heating plate to dry, drying time is 2.5min, and bake out temperature is 125 DEG C;
Use sol evenning machine to coat the positive photoresist of 2um the circular metal molybdenum sheet after drying, and carry out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching; Sol evenning machine rotating speed is respectively 510 revs/min, 1900 revs/min, and the time is respectively 4s and 86s; The front baking time is 2min, and pre-bake temperature is 130 DEG C; Time for exposure is 10s; The post bake time is 60min;
Circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 65min, corrosive liquid is made up of phosphoric acid, nitric acid, acetic acid and deionized water, obtains the circular metal molybdenum sheet after corroding; The ratio of each component of corrosive liquid is 12:20:13:55;
By the circular metal molybdenum sheet deionized water rinsing after corrosion, then carry out etching processing, obtain the circular metal molybdenum sheet after etching; Use RIE reactive ion etching machine to carry out etching processing, etch period is 50min; SF is adopted in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 120W, and the reaction time is 45min;
Circular metal molybdenum sheet after etching is carried out the process of two-sided steaming gold, obtain loose structure diaphragm; Use evaporator to carry out the process of surface evaporation gold, evaporation time is 20min, and evaporation thickness is 0.5um.
Embodiment 4
Be that 50um circular metal molybdenum sheet uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning successively to thickness, and use traffic is the N of 1.2L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 11min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Will through N
2the circular metal molybdenum sheet dried up is dried; Adopt heating plate to dry, drying time is 2.2min, and bake out temperature is 122 DEG C;
Use sol evenning machine to coat the positive photoresist of 1.3um the circular metal molybdenum sheet after drying, and carry out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching; Sol evenning machine rotating speed is respectively 500 revs/min, 2000 revs/min, and the time is respectively 5s and 85s; The front baking time is 1.2min, and pre-bake temperature is 122 DEG C; Time for exposure is 9s; The post bake time is 55min;
Circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 62min, corrosive liquid is made up of phosphoric acid, nitric acid, acetic acid and deionized water, obtains the circular metal molybdenum sheet after corroding; The ratio of each component of corrosive liquid is 10:25:10:55;
By the circular metal molybdenum sheet deionized water rinsing after corrosion, then carry out etching processing, obtain the circular metal molybdenum sheet after etching;
Use RIE reactive ion etching machine to carry out etching processing, etch period is 55min; SF is adopted in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 50W, and the reaction time is 50min;
Circular metal molybdenum sheet after etching is carried out the process of two-sided steaming gold, obtain loose structure diaphragm; Use evaporator to carry out the process of surface evaporation gold, evaporation time is 22min, and evaporation thickness is 0.8um.
Embodiment 5
Be that 50um circular metal molybdenum sheet uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning successively to thickness, and use traffic is the N of 1.7L/min
2dry up; Ammoniacal liquor, acetone, alcohol and deionized water is used to be 13min to the time that circular metal molybdenum sheet carries out ultrasonic cleaning successively;
Will through N
2the circular metal molybdenum sheet dried up is dried; Adopt heating plate to dry, drying time is 2.8min, and bake out temperature is 128 DEG C;
Use sol evenning machine to coat the positive photoresist of 1.8um the circular metal molybdenum sheet after drying, and carry out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching; Sol evenning machine rotating speed is respectively 500 revs/min, 2000 revs/min, and the time is respectively 5s and 85s; The front baking time is 1.8min, and pre-bake temperature is 128 DEG C; Time for exposure is 11s; The post bake time is 50min;
Circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 68min, corrosive liquid is made up of phosphoric acid, nitric acid, acetic acid and deionized water, obtains the circular metal molybdenum sheet after corroding; The ratio of each component of corrosive liquid is 10:30:10:50.
By the circular metal molybdenum sheet deionized water rinsing after corrosion, then carry out etching processing, obtain the circular metal molybdenum sheet after etching;
Use RIE reactive ion etching machine to carry out etching processing, etch period is 50min; SF is adopted in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 80W, and the reaction time is 45min;
Circular metal molybdenum sheet after etching is carried out the process of two-sided steaming gold, obtain loose structure diaphragm; Use evaporator to carry out the process of surface evaporation gold, evaporation time is 27min, and evaporation thickness is 1.8um.
Adopt in the present invention sol evenning machine make photoresist can uniform application on whole metal molybdenum sheet surface, reach the effect of sheltering, photoresist, both as Graphic transitions layer, is also corrosion masking layer simultaneously;
After corrosion, figure uses laser co-focusing microexamination, and its pattern is as Fig. 5.In figure, after visible corrosion, rear figure is complete, edge is without obvious burr, found through experiments, the preferentially ratio of each component of corrosive liquid is, the phosphoric acid of 10-15%, the nitric acid of 20-30%, the acetic acid of 10-15%, the deionized water of 50%-60%, the mass percent sum of above each component is 100%, etching time is 60-70min, and corrosive effect is best.Be described below by experiment, first, in corrosive liquid, the ratio of component of water has very large impact for corrosion rate, as shown in table 1:
Table 1 water is on the impact (unit: ml) of corrosion rate
As can be seen from the table, the ratio of independent change water, corrosion rate declines, etching time increases, along with corrosion rate reduces, etch pit edge occurs that burr phenomena reduces gradually, pattern edge is more neat, but sample surfaces presents multiple etch pit, be stripped mainly due to the oversize photoresist that causes of etching time, therefore, it is best that the constituent content of water is chosen as 50%-60% corrosive effect, as shown in Figure 3, Fig. 3 (a) be when in the present invention, in corrosive liquid, water is 30ml metal molybdenum sheet corrosion after figure; Fig. 3 (b) is the figure after metal molybdenum sheet corrosion when water is 40ml in corrosive liquid in the present invention; Fig. 3 (c) is the figure after metal molybdenum sheet corrosion when water is 45ml in corrosive liquid in the present invention; Metal molybdenum sheet burrs on edges after visible corrosion is fewer, and etching time to be chosen as 60-70min be best, water ratio is greater than 60% and causes corrosion rate to decline obviously, and photoresist is stripped, and corrosion cross section is too mild, and effective dimensions is less; Water ratio causes corrosion rate too fast lower than 50%, and burr phenomena is obvious.It is best that etching time is chosen as 60-70min corrosive effect.Nitric acid is main corrosive agent, and concentration of nitric acid determines reaction rate, and too fast reaction rate causes its lateral encroaching aggravation while longitudinally corroding; Because the thickness of metal molybdenum sheet specimen only has 50um, if concentration of nitric acid is greater than 30%, reaction rate is increased, cause its lateral encroaching aggravation while longitudinally corroding, cause unthreaded hole burrs on edges to increase, cannot technical requirement be reached; Concentration of nitric acid is less than 20%, and corrosion rate reduces, and excessively slow corrosion rate, makes photoresist peel off from sample surfaces and come off, cause final etching aperture size to be greater than technical requirement size, cannot reach technical requirement;
Acetic acid is as corrosion buffer, and the ratio of independent change acetic acid, can control corrosion rate back edge pattern;
The effect of phosphoric acid is used to the product after removing nitric acid corroding metal molybdenum, and after corroding metal molybdenum, get rid of the reactant on molybdenum sheet immediately, contributing to reaction can proceed.Tested by the phosphoric acid of multiple proportioning, find that the consumption of phosphoric acid is no less than 10%, general product can both well be removed.
Claims (6)
1. a preparation method for porous diaphragm, is characterized in that, comprises the following steps:
Step 1, uses ammoniacal liquor, acetone, alcohol and deionized water to carry out ultrasonic cleaning to circular metal molybdenum sheet successively, and use traffic is the N of 1-2L/min
2dry up;
Step 2, by step 1 through N
2the circular metal molybdenum sheet dried up is dried;
Step 3, uses sol evenning machine to coat the positive photoresist of 1.2-2um the circular metal molybdenum sheet after drying in step 2, and carries out front baking, exposure, development and firmly treatment successively, obtain the circular metal molybdenum sheet after photoetching;
Step 4, circular metal molybdenum sheet after photoetching is placed in corrosive liquid and stirs 60-70min, obtain the circular metal molybdenum sheet after corroding, described corrosive liquid is composed of the following components: the phosphoric acid of 10-15%, the nitric acid of 20-30%, the acetic acid of 10-15%, the deionized water of 50%-60%, the mass percent sum of above each component is 100%;
Step 5, by the circular metal molybdenum sheet deionized water rinsing after corrosion, then carries out etching processing, obtains the circular metal molybdenum sheet after etching;
Step 6, carries out the process of two-sided steaming gold, obtains loose structure diaphragm by the circular metal molybdenum sheet after etching.
2. the preparation method of a kind of porous diaphragm according to claim 1, is characterized in that, adopt heating plate to dry in step 2, and drying time is 2-3min, and bake out temperature is 120-130 DEG C.
3. the preparation method of a kind of porous diaphragm according to claim 1, is characterized in that, sol evenning machine gluing 2 times in step 3, and rotating speed is respectively 490-510 rev/min, 1900-2100 rev/min, and the time is respectively 4-6s and 80-90s;
The described front baking time is 1-2min, and pre-bake temperature is 120-130 DEG C; The described time for exposure is 8-12s; The described post bake time is 30-60min.
4. the preparation method of a kind of porous diaphragm according to claim 1, is characterized in that, uses RIE reactive ion etching machine to carry out etching processing in step 5, and etch period is 45-60min.
5. the preparation method of a kind of porous diaphragm according to claim 4, is characterized in that, adopt SF in etching process
6process unthreaded hole burrs on edges as reacting gas, reaction power is 110W-130W, and the reaction time is 40-60min.
6. the preparation method of a kind of porous diaphragm as claimed in any of claims 1 to 5, is characterized in that, use evaporator to carry out the process of surface evaporation gold in step 6, evaporation time is 20-30min, and evaporation thickness is 0.5-2um.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108445709A (en) * | 2018-03-19 | 2018-08-24 | 合肥芯碁微电子装备有限公司 | A kind of dust-proof MEMS diaphragms and preparation method thereof in direct-write photoetching equipment |
| CN112355488A (en) * | 2020-11-05 | 2021-02-12 | 中国工程物理研究院激光聚变研究中心 | Preparation method of laser damage resistant soft-edge diaphragm |
| WO2021109159A1 (en) * | 2019-12-03 | 2021-06-10 | 苏州优波光电科技有限公司 | Method for preparing electron microscope diaphragm by using laser additive manufacturing |
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| US3988153A (en) * | 1974-05-27 | 1976-10-26 | Siemens Aktiengesellschaft | Method of forming a thin film iris diaphragm for a corpuscular beam apparatus |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108445709A (en) * | 2018-03-19 | 2018-08-24 | 合肥芯碁微电子装备有限公司 | A kind of dust-proof MEMS diaphragms and preparation method thereof in direct-write photoetching equipment |
| WO2021109159A1 (en) * | 2019-12-03 | 2021-06-10 | 苏州优波光电科技有限公司 | Method for preparing electron microscope diaphragm by using laser additive manufacturing |
| CN112355488A (en) * | 2020-11-05 | 2021-02-12 | 中国工程物理研究院激光聚变研究中心 | Preparation method of laser damage resistant soft-edge diaphragm |
| CN112355488B (en) * | 2020-11-05 | 2021-12-03 | 中国工程物理研究院激光聚变研究中心 | Preparation method of laser damage resistant soft-edge diaphragm |
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| CN104599927B (en) | 2016-11-30 |
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