CN105334696A - Nanometer mask method for manufacturing integrated multi-channel optical filter - Google Patents
Nanometer mask method for manufacturing integrated multi-channel optical filter Download PDFInfo
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- CN105334696A CN105334696A CN201510932865.6A CN201510932865A CN105334696A CN 105334696 A CN105334696 A CN 105334696A CN 201510932865 A CN201510932865 A CN 201510932865A CN 105334696 A CN105334696 A CN 105334696A
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- optical filter
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Abstract
The invention discloses a nanometer mask method for manufacturing an integrated multi-channel optical filter. The method includes the following steps of a, conducting preprocessing, wherein whirl coating and prebaking are conducted, and a clean optical filter substrate is coated with photoetching glue in a spinning mode and is then baked for 10 minutes or longer at a temperature of 90-100 DEG C; b, conducting exposure, wherein the preprocessed optical filter substrate is put under a mask plate to be subjected to ultraviolet exposure; c, conducting developing and postbaking; d, plating the substrate with a nanometer thin film, wherein the optical filter substrate obtained in the step c is plated with the nanometer thin film 0.1-10 micrometers thick, and then the nanometer mask film layer is formed; e, removing photoetching glue through a NaOH solution or acetone with concentration of 5%, and reserving channels which need to be plated with films; f, plating the channels with the corresponding optical filter film layers; g, removing the nanometer thin films on the optical fiber substrate, and reserving the optical filter film layers on the channels; h, executing the step a to g repeatedly till the integrated multi-channel optical filter is manufactured. By means of the method, the yield of the integrated multi-channel optical filter can be increased.
Description
Technical field
The present invention relates to a kind of new plated film masking process, particularly relate to a kind of nanometer mask method of applicable making integrated multi-channel optical filter.
Background technology
Along with optical film filter reduces and Highgrade integration development towards size, the passage of hyperchannel integrated filtering chip arrays is more, volume is less, integrated level is higher, and its manufacture difficulty is more and more higher.For the much higher passage integrated optical filter of integrated level, usually adopt photoresist as mask at present.
Photoresist is utilized as the method for mask to be, first on substrate, whirl coating is carried out, then by exposure, development, substrate reserves the passage needing plated film, be coated with optical filter rete again, remove the making that photoresist completes respective channel, and so forth, until complete the making of integrated multi-channel optical filter.
Photoresist mask is loose rete, usually thicker (thickness is generally several micron), may form shadow region, thus cause passage theca interna uneven when plated film.Need higher base reservoir temperature when being coated with some rete, easily cause photoresist sex change, flow or difficulty of removing photoresist, the serious pollution that may cause plated film chamber; In addition, photoresist easily and acetone equal solvent react, poor with substrate associativity, in subsequent treatment, easily there is degumming phenomenon, can product yield be reduced.
Summary of the invention
For overcoming the deficiencies in the prior art, the object of the present invention is to provide a high product yield, making the nanometer mask method of integrated multi-channel optical filter efficiently.
For achieving the above object, the present invention is achieved through the following technical solutions:
Make a nanometer mask method for integrated multi-channel optical filter, comprise the following steps:
A. pre-service: whirl coating and front baking, spin coating photoresist on clean optical filter substrate, 90 DEG C-100 DEG C baking more than 10min;
B. expose: under optical filter substrate good for pre-service is placed in mask plate, carry out uv-exposure;
C. development and rear baking: use developer solution to develop the optical filter substrate after exposure, on the passage needing plated film, photoresist is stayed after development, do not needing the region of plated film to remove photoresist, 90 DEG C of-100 DEG C of oven dry remain in the moisture of optical filter substrate surface in an oven;
D. be coated with nano thin-film: the nano thin-film optical filter substrate after step c being coated with thickness 0.1 micron-10 microns, form nanometer mask rete;
E. working concentration is NaOH solution or the acetone removal photoresist of 5%, reserves the passage needing plated film;
F. on passage, be coated with corresponding optical filter rete;
G. remove the on-chip nano thin-film of optical filter, leave the optical filter rete on passage;
H. step a-g is repeated, until complete the making of integrated multi-channel optical filter.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, described negative photoresist is different from the mask plate corresponding to positive photo glue, the photic zone of two kinds of mask plates and shading region complementation.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, the port number of described multi-channel filter is more than or equal to two.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, the port number of described multi-channel filter is 2-200.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, the port number of described multi-channel filter is 2-64.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, described nanometer mask film material is the one in metal, metallic compound or metal oxide materials.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, described nanometer mask rete adopts the one in evaporation, sputtering or mode of printing to be coated on described optical filter substrate.
Preferably, the nanometer mask method of described making integrated multi-channel optical filter, wherein, described nanometer mask rete is selected from Ag, Cu, Al, CaCO
3, one in CaO, NaCl, ZnS or ZnSe.
Beneficial effect of the present invention: nanometer mask is combined with substrate firmly, can bear higher temperature, on basal surface, thickness is even, and the phenomenon such as sex change, demoulding is less likely to occur, and can significantly improve the yield of integrated multi-channel optical filter; Reduce cost simultaneously; Nanometer mask can be realized by the method such as plated film or printing; Nanometer mask is combined well with integrated optical filter substrate, removes convenient and swift, and when contacting with removal liquid, whole mask layer can react with removal liquid simultaneously rapidly; Mask layer (as metal, metallic compound, the metal oxide) material settling out selected, when plating optical filter rete, can play a very good protection; The adhesion of this mask material and substrate is better than photoresist, water-fast and alcohol, acetone and other organic solvent.
Accompanying drawing explanation
Fig. 1 is the schematic flow sheet of the nanometer mask method of the making integrated multi-channel optical filter described in one embodiment of the invention.
Wherein, 1-photoresist, 2-optical filter substrate, 3-ultraviolet light, 4-mask plate, 5-nanometer mask rete, 6-optical filter passage, 7-optical filter rete, 8-integrated multi-channel optical filter.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail, can implement according to this with reference to instructions word to make those skilled in the art.
Make a nanometer mask method for integrated multi-channel optical filter, refer to accompanying drawing 1, comprise the following steps:
A. pre-service: whirl coating and front baking, spin coating photoresist 1,90 DEG C-100 DEG C baking more than 10min on clean optical filter substrate;
B. expose: optical filter substrate 2 good for pre-service is placed in mask plate and adopts for 4 times ultraviolet light 3 to carry out uv-exposure;
C. development and rear baking: use developer solution to develop the optical filter substrate after exposure, on the passage needing plated film, photoresist is stayed after development, do not needing the region of plated film to remove photoresist, 90 DEG C of-100 DEG C of oven dry remain in the moisture of optical filter substrate surface in an oven;
D. be coated with nano thin-film: the nano thin-film optical filter substrate after step c being coated with thickness 0.1 micron-10 microns, form nanometer mask rete 5;
E. working concentration is NaOH solution or the acetone removal photoresist of 5%, reserves the optical filter passage 6 needing plated film;
F. on passage, be coated with corresponding optical filter rete 7;
G. remove the on-chip nano thin-film of optical filter, leave the optical filter rete on passage;
H. step a-g is repeated, until complete the making of integrated multi-channel optical filter 8.
Further, described negative photoresist is different from the mask plate corresponding to positive photo glue, the photic zone of two kinds of mask plates and shading region complementation.
Further, the port number of described multi-channel filter is more than or equal to two.
Further, the port number of described multi-channel filter is 2-200.
Further, the port number of described multi-channel filter is 2-64.
Further, described nanometer mask film material is the one in metal, metallic compound or metal oxide materials.
Further, described nanometer mask rete adopts the one in evaporation, sputtering, mode of printing to be coated on described optical filter substrate.
Further, described nano thin-film is for being selected from Ag, Cu, Al, CaCO
3, a kind of film in CaO, NaCl, ZnS or ZnSe.
Although embodiment of the present invention are open as above, but it is not restricted to listed in instructions and embodiment utilization, it can be applied to various applicable the field of the invention completely, for those skilled in the art, can easily realize other amendment, therefore do not deviating under the universal that claim and equivalency range limit, the present invention is not limited to specific details and illustrates here and the legend described.
Claims (8)
1. make a nanometer mask method for integrated multi-channel optical filter, it is characterized in that, comprise the following steps:
Pre-service: whirl coating and front baking, spin coating photoresist on clean optical filter substrate, 90 DEG C-100 DEG C baking more than 10min;
Exposure: carry out uv-exposure under optical filter substrate good for pre-service is placed in mask plate;
Development and rear baking: use developer solution to develop the optical filter substrate after exposure, on the passage needing plated film, photoresist is stayed after development, do not needing the region of plated film to remove photoresist, 90 DEG C of-100 DEG C of oven dry remain in the moisture of optical filter substrate surface in an oven;
Be coated with nano thin-film: the nano thin-film optical filter substrate after step c being coated with thickness 0.1 micron-10 microns, form nanometer mask rete;
Working concentration is NaOH solution or the acetone removal photoresist of 5%, reserves the passage needing plated film;
Passage is coated with corresponding optical filter rete;
Remove the on-chip nano thin-film of optical filter, leave the optical filter rete on passage;
Repeat step a-g, until complete the making of integrated multi-channel optical filter.
2. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 1, it is characterized in that, described negative photoresist is different from the mask plate corresponding to positive photo glue, the photic zone of two kinds of mask plates and shading region complementation.
3. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 2, it is characterized in that, the port number of described multi-channel filter is more than or equal to two.
4. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 2, is characterized in that, the port number of described multi-channel filter is 2-200.
5. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 2, is characterized in that, the port number of described multi-channel filter is 2-64.
6. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 2, it is characterized in that, described nanometer mask film material is the one in metal, metallic compound or metal oxide.
7. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 2, is characterized in that, described nanometer mask rete adopts the one in evaporation, sputtering or mode of printing to be coated on described optical filter substrate.
8. the nanometer mask method making integrated multi-channel optical filter as claimed in claim 2, it is characterized in that, described nanometer mask layer material is selected from Ag, Cu, Al, CaCO
3, CaO, NaCl, ZnS or ZnSe be easily dissolved in the one of acid, alkali.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510932865.6A CN105334696A (en) | 2015-12-15 | 2015-12-15 | Nanometer mask method for manufacturing integrated multi-channel optical filter |
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| CN201510932865.6A CN105334696A (en) | 2015-12-15 | 2015-12-15 | Nanometer mask method for manufacturing integrated multi-channel optical filter |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107703574A (en) * | 2017-11-29 | 2018-02-16 | 苏州晶鼎鑫光电科技有限公司 | A kind of manufacture method of multichannel integrated optical filter |
| CN107703575A (en) * | 2017-11-29 | 2018-02-16 | 苏州晶鼎鑫光电科技有限公司 | A kind of multichannel integrated optical filter and its manufacture method |
| CN112859225A (en) * | 2021-01-11 | 2021-05-28 | 西安工业大学 | Preparation method of intermediate infrared integrated dual-channel optical filter |
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| CN112859225A (en) * | 2021-01-11 | 2021-05-28 | 西安工业大学 | Preparation method of intermediate infrared integrated dual-channel optical filter |
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