CN104593743A - Flexible substrate double-sided magnetron sputtering wound coating machine - Google Patents
Flexible substrate double-sided magnetron sputtering wound coating machine Download PDFInfo
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- CN104593743A CN104593743A CN201510038217.6A CN201510038217A CN104593743A CN 104593743 A CN104593743 A CN 104593743A CN 201510038217 A CN201510038217 A CN 201510038217A CN 104593743 A CN104593743 A CN 104593743A
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Abstract
The invention discloses a flexible substrate double-sided magnetron sputtering wound coating machine which comprises a vacuum chamber, and a winding system, a sputtering system and a pretreatment system which are arranged inside the vacuum chamber, wherein the vacuum system is used for vacuumizing the interior of the vacuum chamber to a vacuum environment needed by magnetron sputtering; the winding system is used for unwinding and winding the substrate and comprises an unwinding mechanism, a first coating drum, a second coating drum and a winding mechanism; the substrate released by the unwinding mechanism passes through the first coating drum and the second coating drum and is wound by the winding mechanism; the sputtering system is used for coating the substrate passing through the first coating drum and the second coating drum so as to obtain a coated product; and the pretreatment system is used for simultaneously treating the two surfaces of the base material and activating the surface of the base material. With the adoption of the coating machine with the two coating drums, double-side coating of the flexible substrate can be finished once. Compared with the traditional coating mode with two production cycles, the production time can be shortened, and the production efficiency is improved.
Description
Technical field
The invention belongs to technical field of vacuum plating, particularly the two-sided magnetic-control sputtering coiling film coating machine of a kind of flexible parent metal.
Background technology
Magnetron sputtering is one of important method of vacuum plating, the advantages such as it is high that it has thicknesses of layers control accuracy, plated film good uniformity.In recent years, along with the market requirement of flexible optoelectronic product constantly expands, especially to complicated film structure product, the demand of double-sided coating product becomes constantly to expand trend.For the two-sided magnetron sputtering plating product of flexible parent metal, its production technique can adopt and first complete coiled material coating single side within a plated film cycle, within the next plated film cycle, complete another side film forming.The shortcoming of this production technique has: production efficiency is low, and production cost is high; And due to through two production cycles, there is vacuum chamber and expose air during the course, first time film forming rolling unreels the mass defects such as base material heated distortion, wrinkling, pin hole easily occur in coating process again, affects the yield rate of product.For complicated technology product, another side product, due to the shortcoming of above-mentioned technique, cannot form final qualified product.Therefore within a production cycle, completing two-sided magnetron sputtering is best solution.Two-sided magnetic-control sputtering coiling film coating machine is more complicated relative to one side magnetic-control sputtering coiling film coating machine structure, need that there is the structure such as sputtering system, reel system meeting double-sided coating, for special process requirement, also need two-sided preprocessing system, if structure design is unreasonable, product quality defect can be aggravated, as problems such as pin hole, base material wrinkling deformation.The generation of base material pin hole mass defect mainly due to substrate surface speckles with or fall to having the pollutent such as dust, grease that rete is at this point put can not film forming, form point-like blank.Double-sided coating machine controlled sputtering source location arrangements is unreasonable, makes plated film fragment easily fall substrate surface, very easily causes needle pore defect.Make complex structure simultaneously, increase device fabrication cost.
Summary of the invention
The object of the invention is to overcome the deficiencies in the prior art, a kind of employing is provided to have the coating equipment of two plated film drums, disposablely can complete the double-sided coating of flexible parent metal, than the plated film mode of traditional two production cycles of employing, production time can be shortened, the two-sided magnetic-control sputtering coiling film coating machine of the flexible parent metal of enhancing productivity.
The object of the invention is to be achieved through the following technical solutions: the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal, comprises vacuum system, reel system, sputtering system and preprocessing system, and vacuum system comprises vacuum chamber and vacuum pump; Reel system, sputtering system and preprocessing system are all arranged in vacuum chamber;
Described vacuum system is used for the vacuum environment by being evacuated to magnetron sputtering needs in vacuum chamber;
Described reel system is for realizing unreeling and rolling of base material, and reel system comprises unreeling structure, the first filming drum, the second plated film drum and rolling-up mechanism; The base material discharged by unreeling structure through the first filming drum and the second plated film drum, then carries out rolling by rolling-up mechanism; The direction that the first filming drum is adjacent with the second plated film drum is respectively the approach axis of the base material of twice plated film;
Described sputtering system is used for carrying out plated film to the base material through the first filming drum and the second plated film drum and obtains coated product;
Described preprocessing system is used for processing two surfaces of base material simultaneously, effectively removes greasy dirt and the water vapour of substrate surface, activated substrate surface.
Further, described vacuum chamber adopts polygonized structure; Internal vacuum chamber is provided with multiple dividing plate, vacuum chamber is isolated into the coiling chamber for installing reel system by dividing plate, for installing the first filming room and second coating chamber of sputtering system, and for installing the pre-treatment room of preprocessing system, pre-treatment room is between the first filming room and the second coating chamber; Described the first filming room and the second coating chamber inside are divided into multiple plated film interval respectively by dividing plate; Described coiling chamber, pre-treatment room are connected vacuum pump with the pump-line in each plated film interval respectively by valve.
Further, described unreeling structure and rolling-up mechanism lay respectively at both sides relative in coiling chamber, wherein, formed between the first tensile region between unreeling structure and the first filming drum, formed between the second tensile region between the first filming drum and the second plated film drum, formed between the 3rd tensile region between the second plated film drum and rolling-up mechanism;
Tonometry roller A, nip rolls A is provided with and at least one crosses roller between the first tensile region, between the 3rd tensile region, be provided with nip rolls B, tonometry roller B and at least one crosses roller, described nip rolls A and nip rolls B lays respectively on the first filming drum and the bulging base material approach axis of the second plated film;
Be provided with roller A between the first tensile region, crossed roller B, crossed roller C, crossed roller D, crossed roller E, cross roller F and cross roller G, wherein, crossing roller A, crossing roller B and crossing roller C is arranged on the base material approach axis of the first filming drum, crosses roller D, crosses roller E, crosses roller F and cross roller G and be arranged on the base material direction of recession of the first filming drum;
Be provided with roller H between the second tensile region and crossed roller I;
Be provided with roller J between the 3rd tensile region, crossed roller K, cross roller L and cross roller M, and wherein, crossed roller J and cross roller K and be arranged on the base material approach axis of the second plated film drum, and crossed roller L and cross roller M and be arranged on the base material direction of recession of the second plated film drum;
Described roller of crossing is crossed roller G and is crossed the top that roller H is positioned at unreeling structure, bloats the base material come walk around after above unreeling structure and enter the second plated film drum from the first filming;
Follower is provided with between tonometry roller B and mistake roller M.
Further, described the first filming drum and the second plated film drum are arranged in the below of vacuum chamber with identical level attitude, and the first filming drum is identical with the diameter of the second plated film drum.
Particularly, described sputtering system comprises multiple controlled sputtering source, each controlled sputtering source is a corresponding plated film interval respectively, and extend into the first filming room and the second coating chamber from the direction relative with reel system, plated film is carried out to the base material through the first filming drum and the second plated film drum, described controlled sputtering source circumferentially distributes relative to the axle center of the first filming drum and the second plated film drum respectively, and controlled sputtering source adopts the twin Style Columu Talget structure of intermediate frequency.
Further, deep cooling coil pipe is all furnished with in described coiling chamber, pre-treatment room and each plated film interval.
Particularly, described preprocessing system is made up of two hall ion sources, and two hall ion sources are arranged in the both sides of the deep cooling coil pipe of pre-treatment indoor, process respectively to the base material entering the first filming room and the second coating chamber.
Further, described reel system is arranged on and drives on car, drive on car and be also provided with motor and controller, described unreeling structure, the first filming drum, the second plated film drum are connected with motor respectively with rolling-up mechanism, and motor, tonometry roller A are connected with controller respectively with tonometry roller B.
The invention has the beneficial effects as follows:
1, the coating equipment with two plated film drums is adopted, disposablely can complete the double-sided coating of flexible parent metal, than the plated film mode of traditional two production cycles of employing, production time can be shortened, enhancing productivity, can also ensureing that whole process is in vacuum environment when carrying out two sides plated film, avoid in coating process because base material is exposed to the mass defects such as the temperature distortion caused in air, wrinkling, pin hole, improve the yield rate of product, reduce costs;
2, multiple roller be excessively set and nip rolls is set before base material enters plated film drum, effectively can reduce the mass defect such as pin hole, wrinkling deformation of base material;
3, between anti-roll and rolling two tensile regions, tonometry roller is arranged respectively with surveying range tension force, speed is roused for datum velocity with plated film during reel system running, measure tension signal by tonometry roller and feed back to controller, control rolling and unreel the rotating speed of motor, the object of constant speed and identical tension can be reached;
4, preprocessing system is arranged in the common interval that vacuum chamber dividing plate becomes with two plated film cydariforms, can process greasy dirt and the water vapour of effectively removing substrate surface, activated substrate surface to two surfaces of base material simultaneously simultaneously; Adopt same pre-treatment room, can effectively save vacuum chamber arrangement space, make its structure compacter;
5, controlled sputtering source adopts the twin Style Columu Talget structure of intermediate frequency, and relative to rectangle plane target, target utilization can be enhanced about more than once, and the problem of electric discharge sparking arcing can be solved, extend target duration of service, reduce and change target frequency, improve equipment operating efficiency;
6, each vacuum pump is connected respectively by the interval that valve is corresponding with in vacuum chamber, different interval working vacuum degree environment can be formed according to process requirements, do not have to adopt conventional diffusion pump, avoid diffusion pump due to the pollution of anti-oil to substrate surface, effectively avoid the generation of needle pore defect.
Accompanying drawing explanation
Fig. 1 is coating equipment vacuum system structural representation of the present invention;
Fig. 2 is vacuum chamber cross-sectional structure schematic diagram of the present invention;
Description of reference numerals: 1-vacuum chamber, 101-dividing plate, 102-coiling chamber, 103-the first filming room, 104-second coating chamber, 105-pre-treatment room;
2-reel system, 201-unreeling structure, 202-crosses roller A, 203-tonometry roller A, 204-crosses roller B, and 205-crosses roller C, 206-nip rolls A, 207-the first filming drum, 208-crosses roller D, and 209-crosses roller E, and 210-crosses roller F, and 211-crosses roller G, 212-crosses roller H, and 213-crosses roller I, and 214-crosses roller J, and 215-crosses roller K, 216-nip rolls B, 217-second plated film drum, 218-crosses roller L, 219-tonometry roller B, 220-follower, 221-crosses roller M, 222-rolling-up mechanism;
3-sputtering system, 201-controlled sputtering source;
4-preprocessing system, 401-hall ion source;
5-deep cooling coil pipe, 6-valve, 7-vacuum pump, 8-base material, 9-pump-line.
Embodiment
Further illustrate technical scheme of the present invention below in conjunction with accompanying drawing, but the content that the present invention protects is not limited to the following stated.
As depicted in figs. 1 and 2, the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal, comprise vacuum system, reel system 2, sputtering system 3 and preprocessing system 4, vacuum system comprises vacuum chamber 1 and vacuum pump; Reel system 2, sputtering system 3 and preprocessing system 4 are all arranged in vacuum chamber 1;
Described vacuum system is used for the vacuum environment by being evacuated to magnetron sputtering needs in vacuum chamber 1;
Described reel system 2 is for realizing unreeling and rolling of base material 8, and reel system 2 comprises unreeling structure 201, the first filming drum 207, second plated film drum 217 and rolling-up mechanism 222; The base material 8 discharged by unreeling structure 201 through the first filming drum 207 and the second plated film drum 217, then carries out rolling by rolling-up mechanism 222; The direction that the first filming drum 207 is adjacent with the second plated film drum 217 is respectively the approach axis of the base material 8 of twice plated film;
Described sputtering system 3 obtains coated product for carrying out plated film to the base material 8 through the first filming drum 207 and the second plated film drum 217;
Described preprocessing system 4, for processing two surfaces of base material 8 simultaneously, effectively removes greasy dirt and the water vapour on base material 8 surface, activated substrate 8 surface.
Further as shown in Figure 1, vacuum chamber 1 adopts polygonized structure, effectively can increase the bearing capacity of vacuum chamber 1, and polygonal vacuum chamber structure effectively can reduce the volume of vacuum chamber 1 simultaneously, thus reduce the pumpdown time of vacuum pump 7 pairs of vacuum chambers 1, improve the throughput of equipment; Vacuum chamber 1 fixedly mounts, vacuum chamber 1 inside is provided with multiple dividing plate 101 (gas separator plate), vacuum chamber 1 is isolated into the coiling chamber 102 for installing reel system 2 by dividing plate 101, for installing the first filming room 103 and second coating chamber 104 of sputtering system 3, and for installing the pre-treatment room 105 of preprocessing system, pre-treatment room 105 is between the first filming room 103 and the second coating chamber 104; Described coiling chamber 102, pre-treatment room 105 are connected vacuum pump 7 with the pump-line 9 in each plated film interval respectively by valve 6, division board 101 is divided into multiple interval by vacuum chamber 1, ensure that the difference of each district working vacuum degree, meet the requirement of different coating process; Described coiling chamber 102, pre-treatment room 105 are connected vacuum pump 7 with each plated film interval respectively by valve 6, vacuum pump 7 is molecular pump, do not have to adopt conventional diffusion pump, avoid diffusion pump due to the pollution of anti-oil to base material 8 surface, effectively avoid the generation of needle pore defect, each molecular pump group is connected in interval corresponding in vacuum chamber respectively by valve 6, forms different interval working vacuum degree environment according to process requirements.
Further as shown in Figure 2, reel system is in order to meet the process requirements of double-sided coating, unreeling structure 201 lays respectively at both sides relative in coiling chamber 102 with rolling-up mechanism 222, wherein, formed between the first tensile region between unreeling structure 201 and the first filming drum 207, formed between the second tensile region between the first filming drum 207 and the second plated film drum 217, formed between the 3rd tensile region between the second plated film drum 217 and rolling-up mechanism 222;
Tonometry roller A203, nip rolls A206 is provided with and at least one crosses roller between the first tensile region, between the 3rd tensile region, be provided with nip rolls B216, tonometry roller B219 and at least one crosses roller, described nip rolls A206 and nip rolls B216 lays respectively on base material 8 approach axis of the first filming drum 207 and the second plated film drum 217; Tonometry roller A203 and tonometry roller B219 is for measuring the tension signal of base material 8, and the tension signal measured is sent to controller, controlled the motor travelling speed of unreeling structure 201 and rolling-up mechanism 222 by controller, reach the effect that base material 8 running tension is constant;
Be provided with roller A202 between the first tensile region, crossed roller B204, crossed roller C205, crossed roller D208, crossed roller E209, cross roller F210 and cross roller G211, wherein, crossing roller A202, crossing roller B204 and crossing roller C205 is arranged on base material 8 approach axis of the first filming drum 207, crosses roller D208, crosses roller E209, crosses roller F210 and cross roller G211 to be arranged on base material 8 direction of recession of the first filming drum 207;
Be provided with roller H212 between the second tensile region and crossed roller I213;
Be provided with roller J214 between the 3rd tensile region, crossed roller K215, cross roller L218 and cross roller M221, wherein, crossing roller J214 and crossing roller K215 is arranged on base material 8 approach axis of the second plated film drum 217, crosses roller L218 and cross roller M221 to be arranged on base material 8 direction of recession of the second plated film drum 217;
Described roller of crossing is crossed roller G211 and is crossed the top that roller H212 is positioned at unreeling structure 201, walks around after above unreeling structure 201 enter the second plated film drum 217 from the first filming drum 207 base material 8 out;
Follower 220 is provided with between tonometry roller B219 and mistake roller M221, follower 220 follows the trail of mechanism for swinging, make the external diameter of rolling-up mechanism 222 enter rolling last root before 222 of beating a drum relative to base material 8 to cross roller B19 distance and keep fixing, base material 8 surfacing that rolling-up mechanism 222 is reclaimed, not easily forms wrinkle folding.
Further, described the first filming drum 207 and the second plated film drum 217 are arranged in the below of vacuum chamber with identical level attitude, the first filming drum 207 is identical with the diameter of the second plated film drum 217.But in the actual course of processing, always have inevitable tolerance of dimension, cause the actual diameter of the first filming drum 207 and the second plated film drum 217 can not completely the same time, select actual diameter size micro-large person as the rear end (i.e. the second plated film drum 217) being arranged on base material 8 plated film trend.Using the running speed of two plated film drums as datum velocity, and adopt identical rotating speed, second plated film drum 217 is relative to the velocity contrast of the first filming drum 207, base material 8 can be strained, formed between the second fixing tensile region, avoid the use of tonometry roller between the second tensile region, make structure compacter.Foundation between three tensile regions, ensures that base material 8 effectively can be adjacent to plated film drum surface, reduces the distortion that base material 8 produces owing to being heated in coating process.The anterior locations that reel system 2 enters two film coating rollers at base material 8 is furnished with nip rolls, ensure that smooth the contacting with plated film drum surface of base material 8, two plated film drums are arranged in the below of vacuum chamber with identical level attitude, the plated film fragment that effective minimizing a variety of causes is formed and dust fall within base 8 surface, reduce and eliminate the needle pore defect because the ash that falls is formed.
Particularly as shown in Figure 2, described sputtering system 3 comprises multiple controlled sputtering source 301, each controlled sputtering source 301 is a corresponding plated film interval respectively, and the first filming room 103 and the second coating chamber 104 is extend into from the direction relative with reel system, plated film is carried out to the base material 8 through the first filming drum 207 and the second plated film drum 217, described controlled sputtering source 301 circumferentially distributes relative to the axle center of the first filming drum 207 and the second plated film drum 217 respectively, controlled sputtering source 301 adopts the twin Style Columu Talget structure of intermediate frequency, the generation of effective minimizing plated film secondary deposition fragment, improve target utilization, decrease target to change and maintenance time.
Further, in described coiling chamber 102, pre-treatment room 105 and each plated film interval, be all furnished with deep cooling coil pipe 5, each interval water vapour produced effectively is extracted.
Particularly as shown in Figure 2, described preprocessing system 4 is arranged in the common interval that vacuum chamber 1 dividing plate 101 becomes with two plated film cydariforms, preprocessing system 4 is made up of two hall ion sources 401, two hall ion sources 401 are arranged in the both sides of the deep cooling coil pipe 5 in pre-treatment room 105, respectively the base material 8 entering the first filming room 207 and the second coating chamber 217 is processed, greasy dirt and the water vapour of effectively removing substrate surface can be processed to two surfaces of base material, activated substrate surface simultaneously simultaneously; Common pre-treatment interval efficiency saves vacuum chamber arrangement space, makes its structure compacter, is furnished with deep cooling coil pipe in pre-treatment district simultaneously, effectively extracts greasy dirt and water vapour that ion source pounds.
Further, described reel system 2 is arranged on and drives on car, drive on car and be also provided with motor and controller, described unreeling structure 201, the first filming drum 207, second plated film drum 217 are connected with motor respectively with rolling-up mechanism 222, and motor, tonometry roller A203 are connected with controller respectively with tonometry roller B219.
Base material 8 of the present invention from unreeling structure 201 out after through guarantee base material 8 pairs of tonometry roller A203 cornerite angles cross roller A202 after enter tonometry roller A203, after crossing roller B204, crossing roller C205 and nip rolls A206 and pressure roller 206, enter the first filming drum 207 successively from tonometry roller A203 base material 8 out, coating operation is carried out to the one side of base material 8; Enter between the 3rd tensile region through crossing roller D208, crossing roller E209, cross roller F210 and being positioned at crossing roller G211 and passing through roller I213 after crossing roller H212 above unreeling structure 201 successively from the first filming drum 207 base material 8 out, base material 8 enters the second plated film drum 217 after entering and passing through roller J214, excessively roller K215 and nip rolls B216 successively after between the 3rd tensile region, carries out coating operation to the another side of base material 8; Pass through roller L218, tonometry roller B219 successively from the second plated film drum 217 base material 8 out and crossed roller M221 and enter rolling-up mechanism 222.
Those of ordinary skill in the art will appreciate that, embodiment described here is to help reader understanding's principle of the present invention, should be understood to that protection scope of the present invention is not limited to so special statement and embodiment.Those of ordinary skill in the art can make various other various concrete distortion and combination of not departing from essence of the present invention according to these technology enlightenment disclosed by the invention, and these distortion and combination are still in protection scope of the present invention.
Claims (10)
1. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal, it is characterized in that, comprise vacuum system, reel system (2), sputtering system (3) and preprocessing system (4), vacuum system comprises vacuum chamber (1) and vacuum pump; Reel system (2), sputtering system (3) and preprocessing system (4) are all arranged in vacuum chamber (1);
Described vacuum system is used for the vacuum environment by being evacuated to magnetron sputtering needs in vacuum chamber (1);
Described reel system (2) is for realizing unreeling and rolling of base material (8), and reel system (2) comprises unreeling structure (201), the first filming drum (207), the second plated film drum (217) and rolling-up mechanism (222); The base material (8) discharged by unreeling structure (201) through the first filming drum (207) and the second plated film drum (217), then carries out rolling by rolling-up mechanism (222); The direction that the first filming drum (207) is adjacent with the second plated film drum (217) is respectively the approach axis of the base material (8) of twice plated film;
Described sputtering system (3) obtains coated product for carrying out plated film to the base material (8) through the first filming drum (207) and the second plated film drum (217);
Described preprocessing system (4), for processing two surfaces of base material (8) simultaneously, effectively removes greasy dirt and the water vapour on base material (8) surface, activated substrate surface.
2. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 1, it is characterized in that, described vacuum chamber (1) inside is provided with multiple dividing plate (101), vacuum chamber (1) is isolated into the coiling chamber (102) for installing reel system (2) by dividing plate (101), for installing the first filming room (103) and second coating chamber (104) of sputtering system (3), and for installing the pre-treatment room (105) of preprocessing system, pre-treatment room (105) is positioned between the first filming room (103) and the second coating chamber (104),
Described the first filming room (103) and the second coating chamber (104) inside are divided into multiple plated film interval respectively by dividing plate (101); Described coiling chamber (102), pre-treatment room (105) are connected vacuum pump (7) with the pump-line (9) in each plated film interval respectively by valve (6).
3. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 2, is characterized in that, described vacuum pump (7) is molecular pump.
4. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 1, it is characterized in that, described unreeling structure (201) and rolling-up mechanism (222) lay respectively at both sides relative in coiling chamber (102), wherein, formed between the first tensile region between unreeling structure (201) and the first filming drum (207), formed between the second tensile region between the first filming drum (207) and the second plated film drum (217), formed between the second plated film drum (217) and rolling-up mechanism (222) between the 3rd tensile region;
Tonometry roller A (203), nip rolls A (206) is provided with and at least one crosses roller between the first tensile region, between the 3rd tensile region, be provided with nip rolls B (216), tonometry roller B (219) and at least one crosses roller, described nip rolls A (206) and nip rolls B (216) lays respectively on base material (8) approach axis of the first filming drum (207) and the second plated film bulging (217).
5. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 4, it is characterized in that, roller A (202) was provided with between the first described tensile region, cross roller B (204), cross roller C (205), cross roller D (208), cross roller E (209), cross roller F (210) and cross roller G (211), wherein, cross roller A (202), crossing roller B (204) and crossing roller C (205) is arranged on base material (8) approach axis of the first filming drum (207), cross roller D (208), cross roller E (209), crossing roller F (210) and crossing roller G (211) is arranged on base material (8) direction of recession of the first filming drum (207),
Be provided with roller H (212) between the second described tensile region and crossed roller I (213);
Be provided with roller J (214) between the 3rd described tensile region, crossed roller K (215), cross roller L (218) and cross roller M (221), wherein, cross roller J (214) and cross roller K (215) be arranged on second plated film drum (217) base material (8) approach axis on, cross roller L (218) and cross roller M (221) be arranged on second plated film rouse (217) base material (8) direction of recession on;
Described roller of crossing is crossed roller G (211) and is crossed the top that roller H (212) is positioned at unreeling structure (201), after the first filming drum (207) base material out (8) walks around unreeling structure (201) top, enter the second plated film drum (217);
Follower (220) is provided with between described tonometry roller B (219) and mistake roller M (221).
6. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 1, it is characterized in that, described the first filming drum (207) and the second plated film drum (217) are arranged in the below of vacuum chamber with identical level attitude, the first filming drum (207) is identical with the diameter of the second plated film drum (217).
7. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 1, it is characterized in that, described sputtering system (3) comprises multiple controlled sputtering source (301), each controlled sputtering source (301) is a corresponding plated film interval respectively, and the first filming room (103) and the second coating chamber (104) is extend into from the direction relative with reel system, plated film is carried out to the base material (8) through the first filming drum (207) and the second plated film drum (217), described controlled sputtering source (301) circumferentially distributes relative to the axle center of the first filming drum (207) and the second plated film drum (217) respectively, described controlled sputtering source (301) adopts the twin Style Columu Talget structure of intermediate frequency.
8. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 2, is characterized in that, is all furnished with deep cooling coil pipe (5) in described coiling chamber (102), pre-treatment room (105) and each plated film interval.
9. the two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal according to claim 8, it is characterized in that, described preprocessing system (4) is made up of two hall ion sources (401), two hall ion sources (401) are arranged in the both sides of the deep cooling coil pipe (5) in pre-treatment room (105), process respectively to the base material (8) entering the first filming room (207) and the second coating chamber (217).
10. flexible parent metal magnetic-control sputtering coiling film coating machine according to claim 1, it is characterized in that, described reel system (2) is arranged on and drives on car, drive on car and be also provided with motor and controller, described unreeling structure (201), the first filming drum (207), the second plated film drum (217) are connected with motor respectively with rolling-up mechanism (222), and motor, tonometry roller A (203) are connected with controller respectively with tonometry roller B (219).
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| CN201510038217.6A CN104593743B (en) | 2015-01-26 | 2015-01-26 | Flexible substrate double-sided magnetron sputtering wound coating machine |
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| CN201510038217.6A CN104593743B (en) | 2015-01-26 | 2015-01-26 | Flexible substrate double-sided magnetron sputtering wound coating machine |
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| CN115928032A (en) * | 2022-12-15 | 2023-04-07 | 昆山东威科技股份有限公司 | Double-sided magnetron sputtering winding coating equipment |
| US11677511B2 (en) | 2021-11-10 | 2023-06-13 | Qualcomm Incorporated | Mechanism to recover receiver radio link control after multiple unsuccessful automatic repeat query attempts |
| CN115928032B (en) * | 2022-12-15 | 2024-05-10 | 昆山东威科技股份有限公司 | Double-sided magnetron sputtering winding coating equipment |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101348896A (en) * | 2008-08-27 | 2009-01-21 | 浙江大学 | Winding type two-sided coating equipment |
| CN202187062U (en) * | 2011-07-15 | 2012-04-11 | 迎辉科技股份有限公司 | Double-side roll-to-roll vacuum coating equipment |
| CN204509447U (en) * | 2015-01-26 | 2015-07-29 | 四川亚力超膜科技有限公司 | The two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal |
-
2015
- 2015-01-26 CN CN201510038217.6A patent/CN104593743B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101348896A (en) * | 2008-08-27 | 2009-01-21 | 浙江大学 | Winding type two-sided coating equipment |
| CN202187062U (en) * | 2011-07-15 | 2012-04-11 | 迎辉科技股份有限公司 | Double-side roll-to-roll vacuum coating equipment |
| CN204509447U (en) * | 2015-01-26 | 2015-07-29 | 四川亚力超膜科技有限公司 | The two-sided magnetic-control sputtering coiling film coating machine of flexible parent metal |
Non-Patent Citations (1)
| Title |
|---|
| 钱苗根: "《现代表面工程》", 30 September 2012, 上海交通大学出版社 * |
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