CN104532495A - Improved and non-sparse embroidery product without light reflection and method - Google Patents
Improved and non-sparse embroidery product without light reflection and method Download PDFInfo
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- CN104532495A CN104532495A CN201510016992.1A CN201510016992A CN104532495A CN 104532495 A CN104532495 A CN 104532495A CN 201510016992 A CN201510016992 A CN 201510016992A CN 104532495 A CN104532495 A CN 104532495A
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- D—TEXTILES; PAPER
- D05—SEWING; EMBROIDERING; TUFTING
- D05C—EMBROIDERING; TUFTING
- D05C17/00—Embroidered or tufted products; Base fabrics specially adapted for embroidered work; Inserts for producing surface irregularities in embroidered products
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Abstract
Provided is an improved and non-sparse embroidery product without light reflection and a method. The method comprises the following steps: (1) choosing appropriate base fabric used for the embroidery, the base fabric can be plain white cloth or ink ejecting cloth or preliminary embroidered cloth by a machine; (2) carrying out the non-sparse and primary embroidery without the light reflection; (3) carrying out the refining embroidery without the light reflection. The purpose is to solve the technical problems, caused by carrying embroidery on the fabric through the direct stitch without the light reflection, of sparse embroidery product, thin embroidery product, non-abundant color and poor layering and third dimension during the embroidery without the light reflection.
Description
Technical field
The present invention relates to embroidery product and embroidering method, embroider in particular to personal portrait, be a kind of improve after, not bottom drain exempt from polished bard embroidery method and product, exempting from polished bard embroidery method is that a kind of being beneficial to shows the three-dimensional degree of embroidery pattern, the embroidering method of reflectance, utilizes this skill of handling needles more easily to show the three-dimensional degree at character facial or each position of limbs.
Background technology
Embroidery, embroidery is the most ancient traditional technology of China, and the anglicanum of China has had more than 2000 year history.Suzhou embroidery, China's embroidery history occupies critical role, is collectively referred to as China's " the four famous embroideries " with Guangdong embroidery, Hunan embroidery, Sichuan embroidery.
Traditional Suzhou embroidery embroidery stitching method roughly can be summarized as nine large classes: plain embroidery, bar sewing, some embroidery, volume embroidery, net embroidery, yarn embroidery, random stitch embroidery, variant are embroidered, and comprise again the various skill of handling needles in above-mentioned every class, nine classes amount to 48 kinds of skill of handling needles.Conventional plain embroidery, bar sewing, compile embroider, net is embroidered, yarn is embroidered, the skill of handling needles of these kinds of random stitch embroidery be all with the stitch of longer line strip by parallel, connect, the aligned transfer such as to intersect.And point to embroider the class skill of handling needles be that the mode of tiing a knot forms protruding point-like stitch, this type of skill of handling needles is only interspersed as relief for the local of picture, such as pistil.It is the special embroidery method changing in routine embroidery by means of other instrument, materials and process method and come that variant is embroidered, such as dye is embroidered.
Application number is 201110114003.4, patent of invention that what denomination of invention was " a kind of exempt from the light T-shaped skill of handling needles and embroidering method for what embroider " authorize is my earlier application, overcome in personal portrait embroidery, the particularly reflective problem of personage's face and limbs.
In prior art, what also disclose other graphic elements many exempts from laser accunputure method, and if application number is " 201210128432.1 ", denomination of invention is the patent of invention of " a kind of rice for embroidering is like the shape skill of handling needles and embroidering method ".
Existing polished bard embroidery method of exempting from is all directly in white embroidered cloth, colored embroidered cloth, ink-jet embroidered cloth, adopts to exempt from laser accunputure method and embroider, and successively embroiders from bottom to top in embroidered cloth front, and every layer all adopts and exempts from laser accunputure method and embroider.
And owing to exempting from the graphic element of laser accunputure method, as T-shaped, 7 shapes, rice shape, there is larger gap between its stitch, even if be layering, final image still can become a fixed gap by tool, causing exempting from polished bard embroidery has at the bottom of leakiness, and the comparatively thin and color of embroidery is abundant not, stereovision and the not strong technical problem of third dimension.
Of the prior artly exempt from polished bard embroidery method, although retained the distinctive linear light characteristic of embroidery, and solve the reflective phenomenon of embroidery, but owing to exempting from the graphic element of laser accunputure method, as T-shaped, 7 shapes,, there is larger gap between its stitch, even if be layering in rice shape, final image still can become a fixed gap by tool, cause exempting from that polished bard embroidery has at the bottom of leakiness, embroidery is comparatively thin, color is abundant not, stereovision and the not strong technical problem of third dimension.On this basis, of the present invention a kind of improvement after, not bottom drain exempt from light embroidery product and embroidering method overcomes above-mentioned technical problem, be a kind of new technical scheme.
Summary of the invention
The invention provides a kind of improve after, not bottom drain exempt from polished bard embroidery method, its objective is to solve exempts from polished bard embroidery, embroidered cloth directly adopts and exempts from laser accunputure method and embroider, at the bottom of the embroidery leakiness caused, comparatively thin, color is abundant not, stereovision and the not strong technical problem of third dimension.
In Suzhou embroidery field, relevant improvement done in prior art, essence is important breakthrough for Suzhou embroidery method and product and innovation, can change the overall technology level in embroidery field.
For achieving the above object, after a modification of the present invention, not bottom drain exempt from polished bard embroidery method, according to following steps actualizing technology scheme:
Improve after, not bottom drain exempt from a polished bard embroidery method, especially for personal portrait embroider, realize according to following steps:
(1), select the suitable base fabric for embroidering, base fabric can be calico, ink-jet cloth, preliminary machine embroidered after cloth; The cloth that will stretch tight sews up with base fabric two respectively, is then evenly laid in inner lane hoop, and the son that jumped outer ring overlaps with inner lane, and the cloth footpath latitude that makes to stretch tight is all smooth; Hook manuscript paper is covered and embroiders on original text, tick bright and dark light line or block; The pattern profile duplication hooked on original text at embroidery on the ground, will hook original text fine rule nail at the reverse side embroidering ground, nail tailor's tack is in pattern;
(2), the light bottoming of exempting from of bottom drain is not embroidered:
Base fabric is selected one or more skill of handling needles in this several traditional embroidery stitching method in flat pin, straight line pin, tiltedly pin, muscle pin, random pin, light bottoming embroidery is exempted to the targeted graphical that will embroider, above-mentionedly exempt from light bottoming and embroider and do not adopt and exempt from laser accunputure method, avoid exempting from the large problem in the general stitch gap of laser accunputure method unit; Adopt the light bottoming embroidery of exempting from of not bottom drain that target stitching graphic is roughly shaped, make stitching graphic have certain thickness, color, level and third dimension, exempting from light bottoming embroidery can carry out individual layer embroidery, also can multiple-level stack embroidery form;
(3) light refinement embroidery, is exempted from:
Exempting from the basis that light bottoming embroidered, adopting and exempt from laser accunputure method light refinement embroidery is exempted from further to the targeted graphical of preliminarily forming, exempt from light refinement embroidery and be made up of multiple similar figure skill of handling needles unit, and take successively to embroider, the embroidering method of multiple-level stack; Exempt from the skill of handling needles that laser accunputure method is the reflective problem that can change embroidery, be made up of multiple similar light figure skill of handling needles unit of exempting from.
Related content in technique scheme is explained as follows:
1. so-called embroidery is punctured in embroidered cloth with certain floral designs and color by embroidery line with pin, to embroider the general name that mark is formed various pattern.In embroidery field, the skill of handling needles refers to the method for handling the needle in embroidery, is also the organizational form of stitch lines in embroidery, and each skill of handling needles has certain organization rule and unique expression effect.
2. in such scheme, exempt from the skill of handling needles that laser accunputure method is the reflective problem that can change embroidery, be made up of multiple similar light figure skill of handling needles unit (e.g., T-shaped exempts from laser accunputure method unit, 7 shapes exempt from laser accunputure method unit, L shape exempts from laser accunputure method unit, " " " exempts from laser accunputure method unit, " " " exempt from laser accunputure method of the exempting from unit of laser accunputure method unit, other analogous shapes) of exempting from.Exempt from laser accunputure method change embroidery under light reflection angle, solve embroidery under different light rays angle, flickering, the problem that chromatic aberration is large.Thus adopt the embroidery of exempting from laser accunputure method when multi-angle is viewed and admired, the deviation of look and the deviation of shape can not be produced.The T-shaped of multiple repetition exempts from the embroidery that laser accunputure method unit forms makes embroidery present more regular, more neat technique effect, and 7 shape skill of handling needles unit, L hand-manipulating of needle method unit, " " " skill of handling needles unit, " " " skill of handling needles unit or other analogous shape unit be all by T-shaped skill of handling needles unit extend develop, but the rule degree of embroidery, regularity be not so good as T-shaped exempt from laser accunputure method unit.The T-shaped skill of handling needles is not only random but also have certain rule, and disorderly in order, stitch intersects few, feels very fine and smooth, colored sense, stereovision, the details of applicable performance character facial.
3., in such scheme, non-ly exempt from the skill of handling needles that laser accunputure method is the reflective problem that can not change embroidery.
4. when adopting the embroidered works of embroidering method of the present invention with line look can individual layer, also can multilayer superpose, and be layering very regularly, chromatography layer by layer, line look is appeared with superposing of line by line, beneath line look is combined together very naturally with colo(u)r streak above, make embroidery rich color, there is stronger expressive force.
5. such scheme is applicable to hand embroidering, is also applicable to machine embroidery.
Because technique scheme is used, the present invention compared with prior art has following advantages and effect:
Accompanying drawing explanation
Accompanying drawing 1 is in prior art, directly in white embroidered cloth, adopts the embroidery schematic diagram of exempting from laser accunputure method and carrying out embroidering;
Accompanying drawing 2 is the embroidery figure after the bottoming of exempting from polished bard embroidery of not bottom drain of the present invention is embroidered;
Accompanying drawing 3 be of the present invention exempt from light refinement embroidery after embroidery figure.
In figure: 1-exempts from light bottoming embroidery layer, 2-exempts from light refinement embroidery layer
Detailed description of the invention
Below in conjunction with drawings and Examples, the invention will be further described:
Embodiment 1: a kind of improve after, not bottom drain exempt from light embroidery product.
As shown in Figure 3, a kind of improve after, not bottom drain exempt from light embroidery product, this embroidery product has exempting from light bottoming embroidery layer 1 and exempting from light refinement embroidery layer 2 of not bottom drain;
Exempt from light bottoming embroidery layer 1 to be embroidered by one or more skill of handling needles in this several traditional embroidery stitching method in flat pin, straight line pin, tiltedly pin, muscle pin, random pin and form, but not exempt from the embroidery of laser accunputure method and form, avoid and exempt from the large problem in the general stitch gap of laser accunputure method unit; Above-mentioned light bottoming embroidery layer of exempting from makes target stitching graphic roughly be shaped, and makes stitching graphic have certain thickness, color, level and third dimension, exempts from light bottoming embroidery layer 1 for multiple-level stack embroidery;
Exempt from light refinement embroidery layer 2 to be made up of multiple similar T-shaped skill of handling needles unit, above-mentionedly exempt from that light refinement embroidery layer is taked successively to embroider, the embroidering method of multiple-level stack.
Exempt from light bottoming embroidery layer 1 in the present embodiment and exempt from light refinement embroidery layer 2 all to adopt the three stacked forms added, but under the present invention's enlightenment, easily obtain employing two superimposed, four stackedly to add, five stackedly to add, the technical scheme of even more multi-layered superposition.
Embodiment 2: a kind of improve after, not bottom drain exempt from polished bard embroidery method
The embroidering method of the present embodiment personal portrait is:
Improve after, not bottom drain exempt from a polished bard embroidery method, it is characterized in that realizing according to following steps:
(1), select the suitable base fabric for embroidering, base fabric can be calico, ink-jet cloth, preliminary machine embroidered after cloth; The cloth that will stretch tight sews up with base fabric two respectively, is then evenly laid in inner lane hoop, and the son that jumped outer ring overlaps with inner lane, and the cloth footpath latitude that makes to stretch tight is all smooth; Hook manuscript paper is covered and embroiders on original text, tick bright and dark light line or block; The pattern profile duplication hooked on original text at embroidery on the ground, will hook original text fine rule nail at the reverse side embroidering ground, nail tailor's tack is in pattern;
(2), the light bottoming of exempting from of bottom drain is not embroidered:
Base fabric is selected one or more skill of handling needles in this several traditional embroidery stitching method in flat pin, straight line pin, tiltedly pin, muscle pin, random pin, light bottoming embroidery is exempted to the targeted graphical that will embroider, above-mentionedly exempt from light bottoming and embroider and do not adopt and exempt from laser accunputure method, avoid exempting from the large problem in the general stitch gap of laser accunputure method unit; Adopt the light bottoming embroidery of exempting from of not bottom drain that target stitching graphic is roughly shaped, make stitching graphic have certain thickness, color, level and third dimension, exempting from light bottoming embroidery can carry out individual layer embroidery, also successively can embroider and form by multiple-level stack;
(3) light refinement embroidery, is exempted from:
Exempting from the basis that light bottoming embroidered, adopting and exempt from laser accunputure method light refinement embroidery is exempted from further to the targeted graphical of preliminarily forming, exempt from light refinement embroidery and be made up of multiple similar figure skill of handling needles unit, and take successively to embroider, the embroidering method of multiple-level stack.
As can be seen from Figure 3, the invention solves and exempt from that polished bard embroidery has at the bottom of leakiness, embroidery is comparatively thin, color is abundant not, stereovision and the not strong technical problem of third dimension, make Suzhou embroidery embroider skill and technique obtains at personal portrait and break through and innovation.
Embroidering method of the present invention is applicable to hand embroidering, is also applicable to machine embroidery.Machine embroidery is easier to cause damage to base fabric, causes the problems such as bottom drain.
Above-described embodiment, only for technical conceive of the present invention and feature are described, its object is to person skilled in the art can be understood content of the present invention and implement according to this, can not limit the scope of the invention with this.All equivalences done according to Spirit Essence of the present invention change or modify, and all should be encompassed within protection scope of the present invention.
Claims (10)
1. after improving, not show-through exempts from a polished bard embroidery method, embroiders, it is characterized in that, realize according to following steps for personal portrait:
(1), preparatory process
Select the suitable above-mentioned base fabric for embroidering, base fabric be calico, have painting cloth, air brushing cloth or preliminary machine embroidered after cloth;
(2), the bottoming of exempting from polished bard embroidery of bottom drain is not embroidered:
Base fabric is selected one or more skill of handling needles in this several traditional embroidery stitching method in flat pin, straight line pin, tiltedly pin, muscle pin, random pin, the targeted graphical that will embroider is carried out to the bottoming embroidery of exempting from polished bard embroidery of not bottom drain, unwanted light sensation is produced in bottoming embroidery, this bottoming embroidery does not adopt exempts from laser accunputure method, avoids and exempts from the large problem in laser accunputure method unit ubiquitous stitch gap; The light bottoming embroidery of exempting from of above-mentioned not bottom drain makes target stitching graphic roughly be shaped, and has certain thickness, color, level and third dimension, also allows bed material color all be capped; Exempting from light bottoming embroidery and can carrying out individual layer embroidery of above-mentioned not bottom drain, also can adopt multilayer to embroider and stackingly to form;
(3) light refinement embroidery, is exempted from:
Exempt from after light bottoming embroidered in above-mentioned not bottom drain, employing is exempted from laser accunputure method and is exempted from light refinement embroidery further to the targeted graphical of preliminarily forming, exempt from light refinement embroidery to be made up of multiple similar figure skill of handling needles unit, and take successively to embroider, the embroidering method of multiple-level stack; Exempt from the skill of handling needles that laser accunputure method is the reflective problem that can change embroidery, be made up of multiple similar light figure skill of handling needles unit of exempting from.
2. after a kind of improvement according to claim 1, not show-through exempts from polished bard embroidery method, it is characterized in that: in above-mentioned preparatory process, after selecting the suitable base fabric for embroidering, base fabric and a kind of being beneficial to are rolled up the cloth two of stretching tight of stretching tight and sewed up, then, rolls the cloth that stretches tight stretching tight on axle, roll from both sides equably, plug intervention of stretching tight, then strain bed material at both sides line, make material all in one piece footpath latitude smooth wrinkle resistant.The line drawing original text ticking outline line and light and shade block face is lain in below bed material, retouches again on bed material by light color.
3. after a kind of improvement according to claim 1 and 2, not show-through exempts from polished bard embroidery method, it is characterized in that: above-mentionedly exempt from light refinement stitching step, embroider on the basis that completes in the bottoming that polished bard embroiders of exempting from of not bottom drain, utilize to embroider pin and embroider line and successively to embroider from bottom to top in embroidered cloth front at least three layers and the embroidery mark be layering, wherein, embroider mark by roughly the same T-shaped stitch unit adjacent the layouts formation in embroidered cloth front of one group of stitch lengths for every layer, in every layer of embroidery mark centered by any one T-shaped stitch unit, around T-shaped stitch unit T-shaped stitch unit of relative centre on embroidery face of next-door neighbour is in tilted layout, in each layer embroidery mark, the stitch lengths of T-shaped stitch unit is successively decreased gradually from bottom to top, it is embroidered that the light T-shaped skill of handling needles is exempted from described T-shaped stitch unit employing, this skill of handling needles is made up of the first stitch and the second stitch, wherein, first stitch and the second stitch are "T"-shaped layout in embroidered cloth front, the angle angle of relative second stitch of the first stitch in "T"-shaped is 60 ° ~ 90 ° scopes, the ratio of the first stitch lengths and the second stitch lengths is in 1:0.7 to 1:1.3 scope.
4. after a kind of improvement according to claim 3, not show-through exempts from polished bard embroidery method, it is characterized in that: the stitch lengths that described each layer from bottom to top embroiders T-shaped stitch unit in mark is decremented to gradually evenly successively decreases.
5. after a kind of improvement according to claim 4, not show-through exempts from polished bard embroidery method, it is characterized in that: the stitch lengths of T-shaped stitch unit in mark is embroidered 1 ~ 8 millimeter of scope by the superiors.
6. after a kind of improvement according to claim 5, not show-through exempts from polished bard embroidery method, it is characterized in that: described each layer is from bottom to top embroidered in mark, and the T-shaped stitch unit on upper strata is filled in the gap formed between lower floor's each T-shaped stitch unit.
7. after a kind of improvement according to claim 6, not show-through exempts from polished bard embroidery method, it is characterized in that: described each layer is from bottom to top embroidered in mark, embroiders the thickness transition gradually from coarse to fine of line.
8. according to claim 1 and 2 a kind of improve after, not show-through exempt from polished bard embroidery method, it is characterized in that: above-mentionedly exempt from that laser accunputure method is that 7 shapes exempt from laser accunputure method unit, L shape exempts from laser accunputure method unit, one that " " " shape exempts from laser accunputure method unit, " " " shape is exempted from laser accunputure method unit.
9. improve after, not bottom drain exempt from a light embroidery product, for personal portrait embroider, it is characterized in that: this embroidery product have the not bottom drain of not bottom drain exempt from polished bard embroider bottoming embroidery layer and exempt from light refinement embroidery layer.
10. after a kind of improvement according to claim 9, not show-through exempts from light embroidery product, it is characterized in that: the bottoming embroidery layer of exempting from polished bard embroidery of bottom drain is not embroidered by one or more skill of handling needles in this several traditional embroidery stitching method in flat pin, straight line pin, tiltedly pin, muscle pin, random pin and formed, but not exempt from laser accunputure method embroidery form, avoid and exempt from the large problem in the general stitch gap of laser accunputure method unit; The bottoming embroidery layer of exempting from polished bard embroidery of above-mentioned not bottom drain makes target stitching graphic roughly be shaped, and makes stitching graphic have certain thickness, color, level and third dimension, exempts from light bottoming embroidery layer and can be individual layer embroidery, also can be multiple-level stack embroidery; Exempt from light refinement embroidery layer to be made up of multiple similar figure skill of handling needles unit, above-mentionedly exempt from that light refinement embroidery layer is taked successively to embroider, the embroidering method of multiple-level stack.
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| CN104727040A (en) * | 2015-04-08 | 2015-06-24 | 内江市市中区汉安夏布绣专业合作社 | Method for preparing grass cloth embroidery |
| CN105040299A (en) * | 2015-06-08 | 2015-11-11 | 浙江工贸职业技术学院 | Three-dimensional ou embroidery processing technology |
| CN105401357A (en) * | 2015-10-21 | 2016-03-16 | 马继芳 | Novel improved embroidering stitch and embroidering method thereof |
| CN105544113A (en) * | 2016-02-19 | 2016-05-04 | 太仓市鑫泰针织有限公司 | Crewel embroidery method |
| CN105603650A (en) * | 2016-03-15 | 2016-05-25 | 太仓市鑫泰针织有限公司 | Light-free Z-shaped stitch for embroidery and embroidery method |
| CN106498639A (en) * | 2016-08-31 | 2017-03-15 | 纪慧娟 | A kind of pure hand embroidering method |
| CN112411045A (en) * | 2020-10-28 | 2021-02-26 | 江苏堂皇集团有限公司 | Crease-resistant embroidery process for cloth |
| CN115029873A (en) * | 2022-06-28 | 2022-09-09 | 苏州市高新区诺艺琴韵文化产业有限公司 | Needle embroidery process for rice grains |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112411045A (en) * | 2020-10-28 | 2021-02-26 | 江苏堂皇集团有限公司 | Crease-resistant embroidery process for cloth |
| CN115029873A (en) * | 2022-06-28 | 2022-09-09 | 苏州市高新区诺艺琴韵文化产业有限公司 | Needle embroidery process for rice grains |
| CN115029873B (en) * | 2022-06-28 | 2024-01-09 | 苏州市高新区诺艺琴韵文化产业有限公司 | Rice grain needle embroidery process |
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