CN104480505A - Supercritical fluid-based 3D electro-deposition processing device and method - Google Patents
Supercritical fluid-based 3D electro-deposition processing device and method Download PDFInfo
- Publication number
- CN104480505A CN104480505A CN201410762856.2A CN201410762856A CN104480505A CN 104480505 A CN104480505 A CN 104480505A CN 201410762856 A CN201410762856 A CN 201410762856A CN 104480505 A CN104480505 A CN 104480505A
- Authority
- CN
- China
- Prior art keywords
- anode
- galvanic deposit
- cathode
- movable block
- electric motors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 46
- 238000012545 processing Methods 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 20
- 239000011159 matrix material Substances 0.000 claims abstract description 37
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 230000008021 deposition Effects 0.000 claims abstract description 10
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 9
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 9
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 238000007747 plating Methods 0.000 claims abstract description 4
- 239000000654 additive Substances 0.000 claims description 15
- 230000000996 additive effect Effects 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 10
- 229920006351 engineering plastic Polymers 0.000 claims description 9
- 238000009413 insulation Methods 0.000 claims description 9
- 239000000243 solution Substances 0.000 claims description 9
- 239000010935 stainless steel Substances 0.000 claims description 9
- 229910001220 stainless steel Inorganic materials 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- -1 ether compound Chemical class 0.000 claims description 8
- 239000012266 salt solution Substances 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 6
- 239000004327 boric acid Substances 0.000 claims description 6
- 150000002815 nickel Chemical class 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 229910002056 binary alloy Inorganic materials 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 150000001879 copper Chemical class 0.000 claims description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- 238000013268 sustained release Methods 0.000 claims description 3
- 239000012730 sustained-release form Substances 0.000 claims description 3
- 239000000839 emulsion Substances 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 4
- 238000003672 processing method Methods 0.000 abstract description 2
- 238000009434 installation Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000005323 electroforming Methods 0.000 description 9
- 230000005684 electric field Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- 239000004141 Sodium laurylsulphate Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 238000010907 mechanical stirring Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000013475 authorization Methods 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical group 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002114 nanocomposite Substances 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 235000015598 salt intake Nutrition 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/003—3D structures, e.g. superposed patterned layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/003—Electroplating using gases, e.g. pressure influence
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Automation & Control Theory (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The invention provides a 3D electro-deposition processing device and method based on supercritical fluid, the device comprises a carbon dioxide gas cylinder, a high-pressure pump, a numerical control controller, a reactor, a mobile anode component, a mobile cathode component, a direct-current power supply and a cathode substrate used as a processed part; a mechanical stirrer is arranged in the reactor; the movable anode assembly comprises a Z-direction linear motor, a driving screw rod, an anode connecting rod and a movable anode; the movable cathode assembly comprises linear motors in the X direction and the Y direction, a guide rail, a movable block and a clamp; when the device is used, the movable anode and the cathode base body are respectively electrically connected with the anode and the cathode of the direct current power supply. The processing method mainly comprises the steps of cathode matrix chemical plating treatment in advance, cathode matrix installation, supercritical fluid preparation, electrodeposition processing, post-treatment and the like. The invention can effectively improve the electrodeposition speed and the deposition quality, prepares complex and precise metal parts in a three-dimensional space by electrodeposition and widens the application field of the electrodeposition technology.
Description
Technical field
The present invention relates to electrochemical deposition processing technique field, be specifically related to a kind of three-dimensional based on supercutical fluid 3D() device and method of galvanic deposit processing parts.
Background technology
Under supercritical environment, electro-deposition techniques is the focus that Present Domestic is studied outward.When supercutical fluid (Supercritical Fluid) refers to that pure material is in more than stagnation point (emergent pressure and critical temperature), what show is a kind of between fluid that is liquid and gaseous state.At Near The Critical Point, there is phenomenon jumpy in the physical property of all fluids such as density, viscosity, solubleness, thermal capacity, specific inductivity of supercutical fluid.CO
2gas has environmental protection, does not fire, nontoxic, inertia, deposit abundant and emergent pressure (7.39MPa) and temperature (31.1 DEG C) not too advantages of higher, therefore supercritical CO
2fluid is widely used.Due to supercritical CO
2there is lower viscosity (0.03-0.1 MPas) and higher spread coefficient (10
-4cm
2s
-1), good condition can be provided for mass transfer in galvanic deposit system.Processing method and the device of preparing metal-base nanometer composite material and micro-workpiece under current supercritical fluid environment have finding.The Chinese patent literature being CN 101092716B as Authorization Notice No. discloses the trickle electroforming technique of a kind of supercutical fluid and device thereof, and it is with SCF-CO
2for plating environment carries out the shaping of micro-structure part, by the electrodeposition of metals surface deposition of the method gained evenly, without buildup, and cast layer is organized fine and closely woven smooth, but gained cast layer part is the part of photoetching in advance (internal mold) shape, flexiblely cannot prepare dissimilar 3D component; And for example publication No. is a kind of method that the Chinese patent literature of CN 102146573A proposes preparing nano composite material by supercritical fluid electroforming, its mainly under mechanical stirring subsidiary conditions galvanic deposit prepare metal-base nanometer composite material, electric field distribution is fixing, arrange from its optimum configurations regulating YIN and YANG pole, can not effectively carry out carrying out processing preparation at three-dimensional space by galvanic deposit to component.Thus, three-dimensionally shaped in current very popular 3D printing technique and motion principle are applied to overcritical galvanic deposit and adds in technique, design a kind of in three-dimensional space, device and working method that galvanic deposit processing preparation can be carried out component, seem very necessary.
Summary of the invention
The object of the invention is: for the deficiencies in the prior art, there is provided one can effectively improve electrodeposition rate, improve deposition quality, precision metallic component complicated by galvanic deposit preparation at three-dimensional space, and can widen electro-deposition techniques Application Areas based on supercutical fluid 3D galvanic deposit processing unit (plant) and method.
Technical scheme of the present invention is: of the present invention based on supercutical fluid 3D galvanic deposit processing unit (plant), comprises dioxide bottle, high-pressure pump, CNC controller, reactor, direct supply and the cathode base as processed component; Above-mentioned reactor comprises body and mechanical stirrer; Body is provided with inlet mouth, leakage fluid dram and heater coil; Carbon dioxide is provided to reactor when above-mentioned dioxide bottle and high-pressure pump are for using; It is characterized in that: also comprise moving anode assembly and swap cathode assembly;
Above-mentioned moving anode assembly comprises Z-direction linear electric motors, drives leading screw, anode union lever and moving anode; Z-direction linear electric motors are fixedly mounted on the top of the body of reactor; Leading screw and Z-direction linear electric motors are driven to be in transmission connection; Anode union lever is fixedly connected with driving leading screw; Leading screw is driven to be built-in with the elastic conduction coil insulated with it; Mobile sun is fixedly connected with pole anode union lever; The positive pole of the elastic conduction coil external direct current power supply that moving anode passes through anode union lever and drives leading screw built-in; The moving anode of moving anode assembly, can be pumped by driving the transmission of leading screw and anode union lever by Z-direction linear electric motors in the body of reactor;
Above-mentioned swap cathode assembly comprises X to linear electric motors, X direction guiding rail, X to movable block, Y-direction linear electric motors, Y-direction guide rail, Y-direction movable block and fixture; X is fixedly mounted on the body of reactor to linear electric motors; 2 are provided with before and after X direction guiding rail divides; X direction guiding rail is fixedly mounted on the intrinsic lower surface of reactor; X to be arranged on X direction guiding rail and to linear slide can rely on X direction guiding rail under the driving of X to linear electric motors about to movable block;
Y-direction linear electric motors are fixedly mounted on X on the upper surface of movable block; Y-direction guide rail divides left and right to be provided with 2; Y-direction guide rail is fixedly mounted on X on the upper surface of movable block and Y-direction guide rail is vertical with X direction guiding rail arranges; The upper surface of Y-direction movable block 66 is coated with insulation engineering plastics; Y-direction movable block to be arranged on Y-direction guide rail and can to rely on before and after Y-direction guide rail to linear slide under the driving of Y-direction linear electric motors;
The material of fixture is acidproof, high pressure resistant and the insulation engineering plastics of high rigidity; Fixture is arranged on the upper surface of Y-direction movable block, clamps cathode base during for using; During use, cathode base is connected with the negative electricity of direct supply.
The X of swap cathode assembly controls to the operation of the Z-direction linear electric motors of linear electric motors and Y-direction linear electric motors and moving anode assembly by CNC controller.
Further scheme is: the material of above-mentioned driving leading screw is stainless steel, inner hollow; Anode union lever is built-in copper framework and carries out the body of rod part of insulation, acidproof, high voltage bearing engineering plastics outward; The junction of above-mentioned driving leading screw and the junction of anode union lever and anode union lever and moving anode all seals with high-pressure seal ring.
Further scheme is: above-mentioned moving anode comprises matrix and electrode; The material of matrix is glass, and matrix is integrally made up of upper cylinder part and lower cylinder part, and the diameter of the upper cylinder part of matrix is less than the diameter of lower cylinder part, and the upper cylinder part of matrix is fixedly connected with anode union lever; Electrode to be arranged in matrix and to be positioned on the axial line of matrix.
Further scheme is: the diameter of the lower cylinder part of above-mentioned matrix is 5mm; The lower end of the lower cylinder part of matrix is provided with the arc concave shape breach of periphery apart from the periphery 1mm of the lower cylinder part of matrix that angle of inclination controls in the inclined-plane upwards of 60 ° concane gap or is provided with bottom indent; Above-mentioned electrode is the insoluble Pt silk of diameter 1-2mm.
Further scheme also has: above-mentioned X is the square body part of the hollow of stainless steel to movable block and Y-direction movable block; And the size of Y-direction movable block is less than the size of X to movable block.
The above-mentioned method being used for process components and parts based on supercutical fluid 3D galvanic deposit processing unit (plant), comprises the following steps:
1. cathode base electroless plating process in advance: be easy to the metal carrying out galvanic deposit at the plated surface last layer of the cathode base as processed component;
2. cathode base is installed: be fixed on by the fixture of swap cathode assembly on the upper surface of Y-direction movable block by cathode base; Regulate the upward and downward position of moving anode, make it not interference with swap cathode assembly;
3. supercutical fluid is prepared: add the binary system electroplate liquid containing surface additive or composite plating solution that configure in the reactor; After airtight, in reactor, pass into carbon dioxide, control temperature in reactor 35 ~ 70 DEG C, pressure in the scope of 8 ~ 20MPa, the ternary galvanic deposit system that to be formed with supercritical co emulsion be carrier;
4. galvanic deposit processing: switch on power, the position of setting galvanic deposit parameter and moving anode opposing cathode matrix; Galvanic deposit is carried out to obtain required deposition layer at the outside surface of cathode base under the control of CNC controller and the stirring of mechanical stirrer are assisted;
5. galvanic deposit completion of processing aftertreatment: after galvanic deposit completion of processing, by aftertreatment, namely obtains the component of desired properties and shape.
Further scheme is: above-mentioned step 1. in, about 10 μm of thick uniform copper layers on the plated surface of cathode base; Above-mentioned step 3. in, the binary system electroplate liquid containing surface additive is nickel salt solution or copper salt solution; Surface additive is the additive be made up of dodecyl compounds and ether compound; Above-mentioned nickel salt or the concentration of copper salt solution are 300 ~ 500g/L; The concentration of surface additive is 0.1 ~ 2g/L; Surface additive is the boric acid as galvanic deposit sustained release dosage of concentration 30g/L ~ 60g/L, and electroplate liquid PH controls at 2-6.
Further scheme is: above-mentioned step 4. in, CNC controller controls moving anode and the swap cathode assembly orbiting motion by setting; Moving anode is 5cm relative to the maximum single direction stroke that moves up and down of the cathode base as cathode body; The galvanic deposit course of processing is in series by multiple processing interval, and each processing interval is divided between sedimentary province and cutter lifting interval; Electrodeposition time is 2 ~ 5 hours, and between each sedimentary province, duration controls as 30min, and the interval duration of cutter lifting controls as 2min; In cutter lifting interval, swap cathode assembly is static.
Further scheme is: when above-mentioned galvanic deposit is interval, and the bottom of moving anode and the spacing of cathode base control as 1cm.
Further scheme also have: above-mentioned step 4. in, to horizontal intermittent stirring about mechanical stirrer; The stir speed (S.S.) of mechanical stirrer is 200 ~ 500rpm; The current density that direct supply exports is 1 ~ 13 A/dm
2, preferred current density is 7A/dm
2.
The present invention has positive effect: (1) is of the present invention based on supercutical fluid 3D galvanic deposit processing unit (plant), it in use, can effectively improve electrodeposition rate, improve deposition quality, prepare complicated, precision metallic component at three-dimensional space by galvanic deposit, and electro-deposition techniques Application Areas can be widened.(2), in overcritical galvanic deposit system of the present invention, the mass transfer performances of metal ion is than tens times of even hundreds of times large in conventional electrodeposition system.This high rate of mass transfer can supplement rapidly the metal ion of cathode surface, significantly reduce concentration polarization, so galvanic deposit can be carried out by the current density higher than conventional electrodeposition, thus overcome the problem of the long processing time that traditional electrical deposition method exists.Supercutical fluid has fabulous compatibility simultaneously, effectively can absorb the hydrogen that cathode surface produces, and avoids deposition cell surface and inside to occur defect.(3) the present invention can carry out 3D galvanic deposit incessantly on non-smooth matrix piece surface.(4) the present invention can according to deposited part shape requirement, by digitizing programming setting moving anode and the motion track of swap cathode assembly and the duration of processing interval, the accuracy of form and position of effective control deposition layer and settled layer quality, do not need the negative electrode master mold of traditional electroforming complexity.(5) electrode of galvanic deposit moving anode of the present invention is equivalent to a point, under the constraint of the glass basis of moving anode, during different positions, strength of electric field and the current density of corresponding cathode base surf zone are all intimate equal, thus improve the electric field distribution on cathode base surface, improve deposition layer quality.
Accompanying drawing explanation
Fig. 1 is the structural representation based on supercutical fluid 3D galvanic deposit processing unit (plant) of the present invention;
Fig. 2 is the two dimensional structure schematic diagram of the swap cathode assembly in Fig. 1;
Fig. 3 is a kind of structural representation of the moving anode in Fig. 1, and it is the sectional view of the axis upward and downward along moving anode;
Fig. 4 is the another kind of structural representation of the moving anode in Fig. 1, and it is the sectional view of the axis upward and downward along moving anode.
Reference numeral in above-mentioned accompanying drawing is as follows:
Dioxide bottle 1;
High-pressure pump 2;
CNC controller 3;
Reactor 4, body 41, inlet mouth 41-1, leakage fluid dram 41-2, heater coil 41-3, mechanical stirrer 42;
Moving anode assembly 5, Z-direction linear electric motors 51, driving leading screw 52, anode union lever 53, moving anode 54, matrix 54-1, electrode 54-2, concane gap 54-3 in inclined-plane, arc concave shape breach 54-4;
Swap cathode assembly 6, X to linear electric motors 61, X direction guiding rail 62, X to movable block 63, Y-direction linear electric motors 64, Y-direction guide rail 65, Y-direction movable block 66, fixture 67;
Cathode base 7;
Direct supply 8.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is further detailed explanation.
(embodiment 1)
The present embodiment when direction of travel describes, with Fig. 1 left and right directions for X to, with Fig. 1 towards the back side in direction for Y-direction, with the upward and downward of Fig. 1 for Z-direction.
See Fig. 1 to Fig. 4, the present embodiment based on supercutical fluid 3D galvanic deposit processing unit (plant), form primarily of dioxide bottle 1, high-pressure pump 2, CNC controller 3, reactor 4, moving anode assembly 5, swap cathode assembly 6, direct supply 8 and cathode base 7.
The CO of supercutical fluid prepared by dioxide bottle 1 for storing
2gas; High-pressure pump 2 for taking out pressure CO in reactor 4 during needs
2gas.
CNC controller 3 is the control controller of existing Numeric Control Technology, and digital control implement 3 adds man-hour for galvanic deposit, and control moving anode assembly 5 and swap cathode assembly 6 move according to the track preset.
Reactor 4 forms primarily of body 41 and mechanical stirrer 42.Body 41 is provided with inlet mouth 41-1, leakage fluid dram 41-2 and heater coil 41-3.Inlet mouth 41-1 is used for inputting CO by high-pressure pump 2
2gas; Leakage fluid dram 41-2 is used for the supercutical fluid electroforming solution after finishing using to import in gas-liquid separator, and the carbon dioxide of separation and electroforming solution are recovered to recycle in retrieving arrangement respectively; Heater coil 41-3 is for controlling the temperature of supercutical fluid electroforming solution in reactor 4.Mechanical stirrer 42 is arranged in body 41; Mechanical stirrer 42 adopts level to work to intermittent stirring mode, and stir speed (S.S.) is 200 ~ 500rpm, to improve homogeneity in electroforming process and consistence.
Moving anode assembly 5 is primarily of Z-direction linear electric motors 51, driving leading screw 52, and anode union lever 53 and moving anode 54 form.
Z-direction linear electric motors 51 are fixedly mounted on the top of the body 41 of reactor 4; Leading screw 52 and Z-direction linear electric motors 51 are driven to be in transmission connection; Anode union lever 53 is fixedly connected with driving leading screw 52.The material driving leading screw 52 is stainless steel, inner hollow, drives leading screw 52 to be built-in with the elastic conduction coil insulated with it, for moving anode 54 is connected power supply.Anode union lever 53 is built-in copper framework and carries out the body of rod part of insulation, acidproof, high voltage bearing engineering plastics outward; One end of the built-in elastic conduction coil of leading screw 52 is driven to be electrically connected with moving anode 54 by the built-in copper framework of anode union lever 53; The other end of the built-in elastic conduction coil of leading screw 52 is driven to be electrically connected with the positive pole of direct supply 8.All junctions all seal with high-pressure seal ring.
See Fig. 3 and Fig. 4, moving anode 54 is made up of matrix 54-1 and electrode 54-2.The material of matrix 54-1 is glass, and matrix 54-1 is integrally made up of upper cylinder part and lower cylinder part, and the diameter of the upper cylinder part of matrix 54-1 is less than the diameter of lower cylinder part, and the upper cylinder part of matrix 54-1 is connected with anode union lever 53; The diameter of the lower cylinder part of matrix 54-1 is about 5mm; The lower cylinder part of matrix 54-1 has 2 kinds of structures, and a kind of is concane gap 54-3 in the inclined-plane that the lower end of the lower cylinder part of matrix 54-1 is provided with upwards; Angle of inclination controls at about 60 °; Another kind is provided with arc concave shape breach 54-4, and the circumference of bottom indent is apart from insulating glass outer edge about 1mm.Electrode 54-2 is insoluble Pt silk, and diameter is 1-2mm, and electrode 54-2 to be arranged in matrix 54-1 and to be positioned on the axial line of matrix 54-1.The object arranging concane gap 54-3 or arc concave shape breach 54-4 in inclined-plane is to contribute to concentrating of electric field line, can well control deposition region, improve current efficiency and cast layer quality in electrodeposition process.
The moving anode 54 of moving anode assembly 5, can be pumped by driving the transmission of leading screw 52 and anode union lever 53 by Z-direction linear electric motors 51 in the body 41 of reactor 4.
Still see Fig. 2, swap cathode assembly 6 forms to movable block 63, Y-direction linear electric motors 64, Y-direction guide rail 65, Y-direction movable block 66 and fixture 67 to linear electric motors 61, X direction guiding rail 62, X primarily of X.
X is fixedly mounted on the body 41 of reactor 4 to linear electric motors 61; X direction guiding rail 62 points of front and back are provided with 2; X direction guiding rail 62 is fixedly mounted on the lower surface in the body 41 of reactor 4; X is the square body part of the hollow of stainless steel to movable block 63.X to be arranged on X direction guiding rail 62 to movable block 63 and X direction guiding rail about 62 can be relied on to linear slide under the driving of X to linear electric motors 61.
Y-direction linear electric motors 64 are fixedly mounted on X on the upper surface of movable block 63; About 65 points, Y-direction guide rail is provided with 2; Y-direction guide rail 65 is fixedly mounted on X on the upper surface of movable block 63 and Y-direction guide rail 65 is vertical with X direction guiding rail 62 arranges; But not in same plane.The size of Y-direction movable block 66 is less than X to movable block 63; Y-direction movable block 66 is the square body part of the hollow of stainless steel; The upper surface of Y-direction movable block 66 is coated with the insulation engineering plastics of acidproof, the high pressure resistant and high rigidity of one deck.Y-direction movable block 66 to be arranged on Y-direction guide rail 65 and can to rely on before and after Y-direction guide rail 65 to linear slide under the driving of Y-direction linear electric motors 64.
The material of fixture 67 is acidproof, high pressure resistant and the insulation engineering plastics of high rigidity.Fixture 67 is arranged on the upper surface of Y-direction movable block 66.When fixture 67 is for using, clamping is as the cathode base 7 of part to be processed.During work, cathode base 7 is connected with the negative electricity of direct supply 8.
All gap locations of swap cathode assembly 6 all seal with high-pressure seal ring.
The X of swap cathode assembly 6 controls to the operation of the Z-direction linear electric motors 51 of linear electric motors 61 and Y-direction linear electric motors 64 and moving anode assembly 5 by CNC controller 3.
The present embodiment based on supercutical fluid 3D galvanic deposit processing unit (plant), it is for working method that is accurate, complex three-dimensional parts machining, and be described for Ni-based electroplate liquid and stainless steel cathode matrix 7, its working method mainly comprises the following steps:
1. cathode base 7 electroless plating process in advance: be easy at the plated surface last layer of cathode base 7 metal carrying out galvanic deposit, this metal can select fine copper or pure nickel, in the present embodiment, preferably adopts about 10 μm of thick uniform copper layers on the plated surface of cathode base 7;
2. cathode base is installed: be fixed on the upper surface of Y-direction movable block 66 by cathode base 7 by the fixture 67 of swap cathode assembly 6; Regulate the upward and downward position of moving anode 54, make it not interference with swap cathode assembly 6.
3. prepare supercutical fluid: add nickel salt solution, boric acid and additive in the reactor 4, stir 60 minutes under ultrasound environments, make it fully mix; Boric acid, as galvanic deposit sustained release dosage, optionally adds, and the concentration of boric acid is 30g/L ~ 60g/L.Nickel salt solution is the solution of sulfur acid nickel and nickelous chloride; Wherein single nickel salt consumption is 300 ~ 400g/L, and nickelous chloride consumption is 30 ~ 50g/L; Additive is made up of dodecyl compounds and ether compound, and wherein dodecyl compounds consumption is 0.1 ~ 2g/L, and ether compound consumption is 0.1 ~ 1g/L.In the present embodiment, additive preferably adopts sodium lauryl sulphate and polyoxyethylene glycol trimethylammonium nonyl ethers.The concentration of each material is preferably: single nickel salt 300g/L, nickelous chloride 35g/L, boric acid 40g/L, sodium lauryl sulphate 0.2g/L, polyoxyethylene glycol trimethylammonium nonyl ethers 0.8g/L.
Start high-pressure pump 2, carbon dioxide to be taken out by the inlet mouth 41-1 of the body 41 of reactor 4 from dioxide bottle 1 and is pressed onto in the body 41 of reactor 4; Control pressure is 8 ~ 20MPa; Make exchange current be heated under the effect of electromagnetic induction by heater coil 41-3 simultaneously, temperature is controlled at 35 ~ 70 DEG C by the control of the size of the strength of current to exchange current, in the present embodiment preferably 50 DEG C, under above-mentioned pressure and temperature, undertaken stirring by mechanical stirrer 42 and form supercutical fluid ternary galvanic deposit system.
In the present embodiment, the pressure of carbon dioxide in the body 41 of airtight reactor 4 is 13MPa; The stir speed (S.S.) of mechanical stirrer 42 is 200 ~ 500rpm; Preferably mechanical stirring speed is adopted to be 400rmp in the present embodiment.Mechanical stirrer 42 adopts left and right to work to horizontal intermittent stirring mode.
4. galvanic deposit processing: switch on power, adopt the control of existing Numeric Control Technology at CNC controller 3 under, projected path motion pressed by moving anode 54 and swap cathode assembly 6; Moving anode 54 is 5cm relative to the maximum single direction stroke that moves up and down of the cathode base 7 as cathode body; Adopt timing galvanic deposit mode to control cathode and anode to move; The galvanic deposit course of processing is in series by multiple processing interval, and each processing interval is divided between sedimentary province and cutter lifting interval; Moving anode 54 and cathode base 7 discharge simultaneously, form the electric field of relative constancy; Nickel ion in solution deposits to the surface of cathode base 7 under electric field action; Electrodeposition time is 2 ~ 5 hours, and between sedimentary province, duration is about 30min, and cutter lifting interval is 2min; In cutter lifting interval, swap cathode assembly 6 is static.In the present embodiment, preferred electrodeposition time is 3 hours, the interval 28min of deposition process, the interval duration 2min of cutter lifting.
The current density that direct supply 8 exports is 1 ~ 13 A/dm
2; Preferably current density is adopted to be 7A/dm in the present embodiment
2.
5. galvanic deposit completion of processing aftertreatment: after galvanic deposit completion of processing, imported in gas-liquid separator by supercutical fluid electroforming solution by the leakage fluid dram 41-2 on the body 41 of reactor 4, the carbon dioxide of separation and electroforming solution are recovered to recycle in retrieving arrangement respectively.
6. cathode base aftertreatment: cathode base 7 is taken out from reactor 4, air-dry clean by pickling again by washing, the dense structure namely obtaining combining closely with the stainless steel of cathode base 7, crystal grain are tiny, surfacing, excellent performance and desirable precision metal, the fine component of shape.
Above embodiment is the explanation to the specific embodiment of the present invention; but not limitation of the present invention; person skilled in the relevant technique without departing from the spirit and scope of the present invention; can also make various conversion and change and obtain corresponding equivalent technical scheme, therefore all equivalent technical schemes all should be included into scope of patent protection of the present invention.
Claims (10)
1., based on a supercutical fluid 3D galvanic deposit processing unit (plant), comprise dioxide bottle (1), high-pressure pump (2), CNC controller (3), reactor (4), direct supply (8) and the cathode base (7) as processed component; Described reactor (4) comprises body (41) and mechanical stirrer (42); Body (41) is provided with inlet mouth (41-1), leakage fluid dram (41-2) and heater coil (41-3); Carbon dioxide is provided to reactor (4) when described dioxide bottle (1) and high-pressure pump (2) are for using; It is characterized in that: also comprise moving anode assembly (5) and swap cathode assembly (6);
Described moving anode assembly (5) comprises Z-direction linear electric motors (51), drives leading screw (52), anode union lever (53) and moving anode (54); Z-direction linear electric motors (51) are fixedly mounted on the top of the body (41) of reactor (4); Leading screw (52) and Z-direction linear electric motors (51) are driven to be in transmission connection; Anode union lever (53) is fixedly connected with driving leading screw (52); Leading screw (52) is driven to be built-in with the elastic conduction coil insulated with it; Moving anode (54) is fixedly connected with anode union lever (53); Moving anode (54) is by anode union lever (53) and the positive pole driving leading screw (52) built-in elastic conduction coil external direct current power supply (8); The moving anode (54) of moving anode assembly (5), can be pumped by driving the transmission of leading screw (52) and anode union lever (53) by Z-direction linear electric motors (51) in the body of reactor (4) (41);
Described swap cathode assembly (6) comprises X to linear electric motors (61), X direction guiding rail (62), X to movable block (63), Y-direction linear electric motors (64), Y-direction guide rail (65), Y-direction movable block (66) and fixture (67); X is fixedly mounted on the body (41) of reactor (4) to linear electric motors (61); X direction guiding rail (62) point front and back are provided with 2; X direction guiding rail (62) is fixedly mounted on the lower surface in the body (41) of reactor (4); X is arranged on X direction guiding rail (62) to movable block (63) and goes up and X direction guiding rail (62) left and right can be relied under the driving of X to linear electric motors (61) to linear slide;
Y-direction linear electric motors (64) are fixedly mounted on X on the upper surface of movable block (63); Y-direction guide rail (65) point left and right is provided with 2; Y-direction guide rail (65) is fixedly mounted on X on the upper surface of movable block (63) and Y-direction guide rail (65) is vertical with X direction guiding rail (62) arranges; The upper surface of Y-direction movable block 66 is coated with insulation engineering plastics; Y-direction movable block (66) is arranged on Y-direction guide rail (65) and goes up and can rely under the driving of Y-direction linear electric motors (64) before and after Y-direction guide rail (65) to linear slide;
The material of fixture (67) is acidproof, high pressure resistant and the insulation engineering plastics of high rigidity; Fixture (67) is arranged on the upper surface of Y-direction movable block (66), clamps cathode base (7) during for using; During use, cathode base (7) is connected with the negative electricity of direct supply (8);
The X of swap cathode assembly (6) controls to the operation of the Z-direction linear electric motors (51) of linear electric motors (61) and Y-direction linear electric motors (64) and moving anode assembly (5) by CNC controller (3).
2. according to claim 1 based on supercutical fluid 3D galvanic deposit processing unit (plant), it is characterized in that: the material of described driving leading screw (52) is stainless steel, inner hollow; Anode union lever (53) is for built-in copper framework and carry out the body of rod part of insulation, acidproof, high voltage bearing engineering plastics outward; Described driving leading screw (52) all seals with high-pressure seal ring with the junction of anode union lever (53) and the junction of anode union lever (53) and moving anode (54).
3. according to claim 1 based on supercutical fluid 3D galvanic deposit processing unit (plant), it is characterized in that: described moving anode (54) comprises matrix (54-1) and electrode (54-2); The material of matrix (54-1) is glass, matrix (54-1) is integrally made up of upper cylinder part and lower cylinder part, the diameter of the upper cylinder part of matrix (54-1) is less than the diameter of lower cylinder part, and the upper cylinder part of matrix (54-1) is fixedly connected with anode union lever (53); Electrode (54-2) to be arranged in matrix (54-1) and to be positioned on the axial line of matrix (54-1).
4. according to claim 3 based on supercutical fluid 3D galvanic deposit processing unit (plant), it is characterized in that: the diameter of the lower cylinder part of described matrix (54-1) is 5mm; The lower end of the lower cylinder part of matrix (54-1) is provided with the arc concave shape breach (54-4) of periphery apart from the periphery 1mm of the lower cylinder part of matrix (54-1) that angle of inclination controls in the inclined-plane upwards of 60 ° concane gap (54-3) or is provided with bottom indent; The insoluble Pt silk that described electrode (54-2) is diameter 1-2mm.
5. according to claim 1 based on supercutical fluid 3D galvanic deposit processing unit (plant), it is characterized in that: described X is the square body part of the hollow of stainless steel to movable block (63) and Y-direction movable block (66); And the size of Y-direction movable block (66) is less than the size of X to movable block (63).
6. the method being used for process components and parts based on supercutical fluid 3D galvanic deposit processing unit (plant) according to claim 1, is characterized in that: comprise the following steps:
1. cathode base electroless plating process in advance: be easy to the metal carrying out galvanic deposit at the plated surface last layer of the cathode base (7) as processed component;
2. cathode base is installed: be fixed on the upper surface of Y-direction movable block (66) by cathode base (7) by the fixture (67) of swap cathode assembly (6); Regulate the upward and downward position of moving anode (54), make it not interference with swap cathode assembly (6);
3. supercutical fluid is prepared: in reactor (4), add the binary system electroplate liquid containing surface additive or composite plating solution that configure; After airtight, in reactor (4), pass into carbon dioxide, control temperature in reactor (4) 35 ~ 70 DEG C, pressure in the scope of 8 ~ 20MPa, the ternary galvanic deposit system that to be formed with supercritical co emulsion be carrier;
4. galvanic deposit processing: switch on power, the position of setting galvanic deposit parameter and moving anode (54) opposing cathode matrix (7); Galvanic deposit is carried out to obtain required deposition layer at the outside surface of cathode base (7) under the control of CNC controller (3) and the stirring of mechanical stirrer (42) are assisted;
5. galvanic deposit completion of processing aftertreatment: after galvanic deposit completion of processing, by aftertreatment, namely obtains the component of desired properties and shape.
7. be according to claim 6ly used for the method for process components and parts based on supercutical fluid 3D galvanic deposit processing unit (plant), it is characterized in that: described step 1. in, about 10 μm of thick uniform copper layers on the plated surface of cathode base (7); Described step 3. in, the binary system electroplate liquid containing surface additive is nickel salt solution or copper salt solution; Surface additive is the additive be made up of dodecyl compounds and ether compound; Described nickel salt or the concentration of copper salt solution are 300 ~ 500g/L; The concentration of surface additive is 0.1 ~ 2g/L; Surface additive is the boric acid as galvanic deposit sustained release dosage of concentration 30g/L ~ 60g/L, and electroplate liquid PH controls at 2-6.
8. the method being used for process components and parts based on supercutical fluid 3D galvanic deposit processing unit (plant) according to claim 6, it is characterized in that: described step 4. in, CNC controller (3) control moving anode (54) and swap cathode assembly (6) by set orbiting motion; Moving anode (54) is 5cm relative to the maximum single direction stroke that moves up and down of the cathode base (7) as cathode body; The galvanic deposit course of processing is in series by multiple processing interval, and each processing interval is divided between sedimentary province and cutter lifting interval; Electrodeposition time is 2 ~ 5 hours, and between each sedimentary province, duration controls as 30min, and the interval duration of cutter lifting controls as 2min; In cutter lifting interval, swap cathode assembly (6) is static.
9. the method being used for process components and parts based on supercutical fluid 3D galvanic deposit processing unit (plant) according to claim 8, is characterized in that: when described galvanic deposit is interval, the bottom of moving anode (54) and the spacing of cathode base (7) control as 1cm.
10. be according to claim 6ly used for the method for process components and parts based on supercutical fluid 3D galvanic deposit processing unit (plant), it is characterized in that: described step 4. in, mechanical stirrer (42) left and right is to horizontal intermittent stirring; The stir speed (S.S.) of mechanical stirrer (42) is 200 ~ 500rpm; The current density that direct supply (8) exports is 1 ~ 13 A/dm
2.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610592720.0A CN106222707B (en) | 2014-12-11 | 2014-12-11 | 3D electro-deposition processing device based on supercritical fluid |
| CN201610590545.1A CN106191933B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201610592776.6A CN106086961B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201410762856.2A CN104480505B (en) | 2014-12-11 | 2014-12-11 | Supercritical fluid-based 3D electro-deposition processing device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410762856.2A CN104480505B (en) | 2014-12-11 | 2014-12-11 | Supercritical fluid-based 3D electro-deposition processing device and method |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610592720.0A Division CN106222707B (en) | 2014-12-11 | 2014-12-11 | 3D electro-deposition processing device based on supercritical fluid |
| CN201610590545.1A Division CN106191933B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201610592776.6A Division CN106086961B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104480505A true CN104480505A (en) | 2015-04-01 |
| CN104480505B CN104480505B (en) | 2016-11-02 |
Family
ID=52755104
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410762856.2A Active CN104480505B (en) | 2014-12-11 | 2014-12-11 | Supercritical fluid-based 3D electro-deposition processing device and method |
| CN201610592776.6A Active CN106086961B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201610590545.1A Active CN106191933B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201610592720.0A Active CN106222707B (en) | 2014-12-11 | 2014-12-11 | 3D electro-deposition processing device based on supercritical fluid |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610592776.6A Active CN106086961B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201610590545.1A Active CN106191933B (en) | 2014-12-11 | 2014-12-11 | Method for processing parts based on supercritical fluid 3D electrodeposition |
| CN201610592720.0A Active CN106222707B (en) | 2014-12-11 | 2014-12-11 | 3D electro-deposition processing device based on supercritical fluid |
Country Status (1)
| Country | Link |
|---|---|
| CN (4) | CN104480505B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104746117A (en) * | 2015-04-21 | 2015-07-01 | 江苏理工学院 | Cathode and anode synchronous frequency vibration type strong magnetic auxiliary electro-deposition processing device and method |
| CN105780095A (en) * | 2016-04-28 | 2016-07-20 | 江苏理工学院 | Reaction kettle |
| CN106191943A (en) * | 2016-07-19 | 2016-12-07 | 佛山市零碳节能光电科技有限公司 | The supercritical electroplating preparation method of a kind of cobalt-nickel alloy light protective coating and preparation system thereof |
| CN108588808A (en) * | 2018-07-10 | 2018-09-28 | 喻天晨 | A kind of electroplating device improving plated film and workpiece surface adhesion strength |
| CN110257882A (en) * | 2019-06-26 | 2019-09-20 | 高国有 | Overcritical composite plating drill bit for machining and application method based on swap cathode |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107053653B (en) | 2017-03-30 | 2019-04-09 | 大连理工大学 | Based on the compound electrojet 3D printing device and method of electric field-thermal field |
| CN108103541B (en) * | 2017-11-09 | 2019-11-22 | 河南理工大学 | A kind of metal three-dimensional increasing material manufacturing apparatus and method |
| CN109228305B (en) * | 2018-09-28 | 2020-04-28 | 大连理工大学 | Three-dimensional printing method for electric field induced auxiliary electrospray |
| CN109228304B (en) * | 2018-09-28 | 2020-05-19 | 大连理工大学 | Three-dimensional printing device for electric field induced auxiliary electrospray |
| TWI674976B (en) * | 2018-11-12 | 2019-10-21 | 三緯國際立體列印科技股份有限公司 | Three-dimensional printing device having stirring mechanism |
| CN109809534A (en) * | 2019-04-04 | 2019-05-28 | 杭州海拓环境工程有限公司 | A kind of Novel electro-Fenton reactor |
| CN110093641A (en) * | 2019-04-23 | 2019-08-06 | 河南理工大学 | A kind of micro-structure is without magnetic property method and system |
| CN111254479A (en) * | 2020-03-27 | 2020-06-09 | 京东方科技集团股份有限公司 | Electrochemical deposition device |
| FR3112972B1 (en) * | 2020-07-30 | 2022-11-04 | Safran | DEVICE AND METHOD FOR DEPOSITING THICK COATINGS OF METAL NITRIDES BY THE SUPERCRITICAL FLUID WAY |
| CN112680752B (en) * | 2021-03-11 | 2021-08-20 | 卓外（上海）医疗电子科技有限公司 | Chemically strengthened bonding method suitable for endoscope structure |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101092716A (en) * | 2007-04-27 | 2007-12-26 | 江苏技术师范学院 | Superfine electroform technique of supercutical fluid, and equipment |
| CN201232091Y (en) * | 2008-07-22 | 2009-05-06 | 浙江理工大学 | Quick-speed forming device for electrochemical deposition at numerical control selected area |
| JP2009203517A (en) * | 2008-02-27 | 2009-09-10 | Ses Co Ltd | Surface treatment method and surface treatment apparatus for material to be treated |
| JP2009249653A (en) * | 2008-04-01 | 2009-10-29 | Ses Co Ltd | Electroplating method |
| CN102146573A (en) * | 2011-03-14 | 2011-08-10 | 江苏技术师范学院 | Method for preparing nano composite material by supercritical fluid electroforming |
| CN104141161A (en) * | 2014-08-20 | 2014-11-12 | 江苏理工学院 | Method for processing drill bit by supercritical composite electroplating based on mobile anode |
| CN204325517U (en) * | 2014-12-11 | 2015-05-13 | 江苏理工学院 | 3D electro-deposition processing device based on supercritical fluid |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4989541B2 (en) * | 2008-03-31 | 2012-08-01 | ルネサスエレクトロニクス株式会社 | Plating method, semiconductor device manufacturing method, and plating processing system |
-
2014
- 2014-12-11 CN CN201410762856.2A patent/CN104480505B/en active Active
- 2014-12-11 CN CN201610592776.6A patent/CN106086961B/en active Active
- 2014-12-11 CN CN201610590545.1A patent/CN106191933B/en active Active
- 2014-12-11 CN CN201610592720.0A patent/CN106222707B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101092716A (en) * | 2007-04-27 | 2007-12-26 | 江苏技术师范学院 | Superfine electroform technique of supercutical fluid, and equipment |
| JP2009203517A (en) * | 2008-02-27 | 2009-09-10 | Ses Co Ltd | Surface treatment method and surface treatment apparatus for material to be treated |
| JP2009249653A (en) * | 2008-04-01 | 2009-10-29 | Ses Co Ltd | Electroplating method |
| CN201232091Y (en) * | 2008-07-22 | 2009-05-06 | 浙江理工大学 | Quick-speed forming device for electrochemical deposition at numerical control selected area |
| CN102146573A (en) * | 2011-03-14 | 2011-08-10 | 江苏技术师范学院 | Method for preparing nano composite material by supercritical fluid electroforming |
| CN104141161A (en) * | 2014-08-20 | 2014-11-12 | 江苏理工学院 | Method for processing drill bit by supercritical composite electroplating based on mobile anode |
| CN204325517U (en) * | 2014-12-11 | 2015-05-13 | 江苏理工学院 | 3D electro-deposition processing device based on supercritical fluid |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104746117A (en) * | 2015-04-21 | 2015-07-01 | 江苏理工学院 | Cathode and anode synchronous frequency vibration type strong magnetic auxiliary electro-deposition processing device and method |
| CN105780095A (en) * | 2016-04-28 | 2016-07-20 | 江苏理工学院 | Reaction kettle |
| CN106191943A (en) * | 2016-07-19 | 2016-12-07 | 佛山市零碳节能光电科技有限公司 | The supercritical electroplating preparation method of a kind of cobalt-nickel alloy light protective coating and preparation system thereof |
| CN108588808A (en) * | 2018-07-10 | 2018-09-28 | 喻天晨 | A kind of electroplating device improving plated film and workpiece surface adhesion strength |
| CN110257882A (en) * | 2019-06-26 | 2019-09-20 | 高国有 | Overcritical composite plating drill bit for machining and application method based on swap cathode |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106086961B (en) | 2017-11-21 |
| CN104480505B (en) | 2016-11-02 |
| CN106191933A (en) | 2016-12-07 |
| CN106222707B (en) | 2018-02-06 |
| CN106222707A (en) | 2016-12-14 |
| CN106086961A (en) | 2016-11-09 |
| CN106191933B (en) | 2017-11-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104480505B (en) | Supercritical fluid-based 3D electro-deposition processing device and method | |
| CN104141161B (en) | Method for processing drill bit by supercritical composite electroplating based on mobile anode | |
| CN204325517U (en) | 3D electro-deposition processing device based on supercritical fluid | |
| CN102146573B (en) | Method for preparing nano composite material by supercritical fluid electroforming | |
| CN110306210B (en) | Electrochemical 3D printing device and method for metal-based composite material part | |
| CN110359065B (en) | Jet electrodeposition nozzle and method for manufacturing seamless metal pipe by using same | |
| CN110359069B (en) | Liquid-phase multi-metal mixed additive manufacturing device and method | |
| CN109778244A (en) | A kind of jet-electrodeposited method 3D fine metal increasing material manufacturing device | |
| CN105386099A (en) | 3D printing micro-arc oxidation film device and method | |
| CN102162118B (en) | Manufacturing method of nickel-based diamond slice | |
| CN107513750A (en) | A kind of batch (-type) electro-deposition core-shell type powder electroplanting device and its processing method | |
| CN112981471B (en) | High-localization three-dimensional electrodeposition device and method | |
| CN208829786U (en) | A kind of electroplanting device | |
| CN104746117A (en) | Cathode and anode synchronous frequency vibration type strong magnetic auxiliary electro-deposition processing device and method | |
| CN112779567A (en) | Micro machining tool preparation device and method and in-situ material increase and reduction manufacturing method | |
| CN102002743B (en) | Preparation method for electroplating thick tungsten coating on pure copper or copper alloy substrate with molten salt | |
| CN107695467B (en) | Preparation method and device for pressure type circulating jet flow electrolytic machining micro array electrode | |
| CN110842308A (en) | In-situ liquid-sharing electrochemical composite processing device and method | |
| CN103255445A (en) | Method for molding hot isostatic pressure whole sheath with complicated surface | |
| CN105420797A (en) | Novel electroplating bath | |
| CN109706492B (en) | Preparation device of spiral composite catalytic electrode based on flow field effect | |
| CN107876756A (en) | A kind of device and method of electrodeposition process synchronous production variety classes Coated powder | |
| CN108866582A (en) | A kind of technique of electrodeposition process preparation roughening nickel foil | |
| CN211135823U (en) | In-situ co-liquid electrochemical composite processing device | |
| CN110257882A (en) | Overcritical composite plating drill bit for machining and application method based on swap cathode |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |