CN104423146A - Apparatus for amending tilt of mask and method for processing substrate - Google Patents
Apparatus for amending tilt of mask and method for processing substrate Download PDFInfo
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- CN104423146A CN104423146A CN201410412432.3A CN201410412432A CN104423146A CN 104423146 A CN104423146 A CN 104423146A CN 201410412432 A CN201410412432 A CN 201410412432A CN 104423146 A CN104423146 A CN 104423146A
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- mask
- summit
- laser beam
- main body
- matrix
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
Abstract
The invention provides an apparatus for amending tilt of a mask. The apparatus comprises a mask holding body, configured to support a mask formed thereon with a pattern; a mask support body mobile unit, configured to change the tilt of an XY plane of the mask support body; a camera unit, which photographs a laser beam of a substrate disposed in a penetrating manner on a substrate support member to generate a laser beam penetrating image; and a control unit, configured to control the mask support body mobile unit, thereby changing the tilt of the XY plane of the mask so that the laser beam penetrating image can match a reference focus image when the laser beam penetrating image is departed from the reference focus image.
Description
Technical field
The present invention relates to a kind of equipment of the inclination angle for mask correction, described mask is used for by using laser beam to make matrix patterns, and the equipment at the described inclination angle for mask correction is applied to matrix treatments equipment.
Background technology
According to the materials and process of Organnic electroluminescent device, organic electroluminescence display device and method of manufacturing same can be divided into the macromolecule device using wet processing and the low molecule device using depositing operation.When ink jet printing method among the method making polymeric luminescence layer or low molecule luminescent layer patterning, the organic layer except luminescent layer is restricted on material, and is not easy in matrix, form the structure for ink jet printing.And, when luminescent layer obtains patterning by depositing operation, be difficult to due to the use of metal mask manufacture large-scale plant.
As the substitute technology of patterning method, use laser induced thermal imaging (laser induced thermalimaging, LITI) method.LITI method is defined as a kind of so method, and the laser beam wherein produced from light source is converted into heat energy, and is delivered in matrix to form pattern in matrix due to heat energy for the formation of the material of pattern subsequently.For this reason, donor film has so a kind of structure, wherein as the matrix of acceptor completely by donor plastic film covering, and donor film and matrix are fixed on objective table.Donor film and matrix are attached to one another further by laminating technology, and subsequently by using laser beam to be delivered in matrix to make matrix complete graph patterning.That is, when laser is irradiated in luminescent layer donor film previously formed thereon or donor matrix, luminescent layer is separated with donor film or donor matrix and is passed to subsequently on receiver substrate to form pixel.
Fig. 1 is the view of the matrix treatments equipment using laser beam.
Use the matrix treatments equipment 10 of laser beam to comprise lasing light emitter 300, described lasing light emitter 300 is for generation of laser beam; Projecting lens 400, described projecting lens 400 is arranged on the below of lasing light emitter 300; And mask M, described mask M to be arranged between lasing light emitter 300 and projecting lens 400 and by using laser beam L to transmit pattern.But, when mask M is replaced by new mask, change to some extent in the focus of laser beam in matrix and position.When replacing mask, mask can change to some extent in height, inclination angle, position etc., and therefore laser beam also can change in focus in matrix and position to some extent.Because the focus of laser beam and position change because of the replacement of mask, therefore matrix treatments process possibly cannot successfully perform matrix treatments process.
[prior art document]
[patent documentation]
2012-0042144 Korean Patent publication
Summary of the invention
The invention provides a kind of equipment for revising inclination angle, even if also can prevent the focus of laser beam and position from changing when replacing mask.
The present invention also provides a kind of matrix treatments equipment, even if also stably can process matrix when replacing mask.
According to an exemplary embodiment, the equipment for the inclination angle of mask correction comprises: mask support main body, and described mask support main body is configured to support on it and forms figuratum mask; Mask support main body mobile unit, described mask support main body mobile unit is configured to the inclination angle of the XY plane changing mask support main body; Camera unit, described camera unit is take pictures through the laser beam of the matrix be arranged on matrix support part, to produce laser beam transmitted image; And control module, described control module is configured to control mask support main body mobile unit, change the inclination angle of the XY plane of mask thus, with make when laser beam transmitted image depart from reference to focus chart as time, described laser beam transmitted image and described reference focus images match.
Described mask support main body can comprise: mask holder, described mask holder has the frame shape that core penetrates, described mask holder has first, second, third and fourth summit, wherein mask is placed on mask holder, and the XY plane of mask holder changes to some extent in inclination angle; Mask state, described mask state is configured to the mask holder supported on its top surface; And change of pitch angle module, described change of pitch angle module is configured to the Z axis height on the summit regulating mask holder individually, thus changes the inclination angle of XY plane.
Described change of pitch angle module can comprise: height adjusting part divides, and described height adjusting part divides and is configured to enable the Z axis height on first, second and the 3rd summit of mask holder raise individually or reduce; And supportive body, described supportive body is configured to the 4th summit of mask holder to be connected on mask objective table.
Described height adjusting part divides and can comprise: the first height adjusting part divides, and described first height adjusting part divides and is configured to enable the Z axis height on the first summit of mask holder raise or reduce; Second height adjusting part divides, and described second height adjusting part divides and is configured to enable the Z axis height on the second summit of mask holder raise or reduce; And third high degree adjustment portion, described third high degree adjustment portion is configured to enable the Z axis height on the 3rd summit of mask holder raise or reduce.
According to another exemplary embodiment, matrix treatments equipment comprises: chamber, and described chamber has the inner space of matrix patterning wherein; Matrix support part, described matrix support part is arranged in described inner space with support matrix; Lasing light emitter, described lasing light emitter is configured to produce laser beam; Mask support main body, described mask support main body is arranged between lasing light emitter and matrix support part, forms figuratum mask to support on it; Mask support main body mobile unit, described mask support main body mobile unit is configured to the inclination angle of the XY plane changing mask support main body; Camera unit, described camera unit is configured to as taking pictures through the laser beam of the matrix be arranged on matrix support part, to produce laser beam transmitted image; And control module, described control module is configured to control mask support main body mobile unit, change the inclination angle of the XY plane of mask thus, with make when laser beam transmitted image depart from reference to focus chart as time, described laser beam transmitted image and described reference focus images match.
Accompanying drawing explanation
Exemplary embodiment can be understood in more detail from following description done by reference to the accompanying drawings, wherein:
Fig. 1 is the view of the matrix treatments equipment using laser beam.
Fig. 2 is the view of the formation of the matrix treatments equipment illustrated according to an exemplary embodiment.
Fig. 3 is the coupling figure of the mask support main body according to an exemplary embodiment.
Fig. 4 is the exploded view of the mask support main body according to an exemplary embodiment.
Fig. 5 be according to the explanation of an exemplary embodiment wherein mask objective table movable part be implemented as the view of the example of linear motor (linear motor, LM) guiding piece.
Fig. 6 (a), (b) illustrate that wherein height adjusting part divides to regulate in Z axis length, the view of the state that can raise in the Z-axis direction to make the first summit of mask holder.
Fig. 7 (a), (b) illustrate that wherein height adjusting part divides to regulate in Z axis length, the view of the state that can raise in the Z-axis direction to make the 3rd summit of mask holder.
Main element label declaration:
1: guide rail
2: platform
10: matrix treatments equipment
100: chamber
200: matrix support part
300: lasing light emitter
350: catoptron
400: projecting lens
500: mask support main body
510: mask holder
510a: edge
520: change of pitch angle module
521: supportive body
522,522a, 522b, 522c: height adjusting part divides
530: mask objective table
600: control module
700: mask support main body mobile unit
800: camera unit
M: mask
L laser beam
W: matrix
Embodiment
Hereinafter describe specific embodiment in detail with reference to accompanying drawing.But the present invention can embody in different forms, and should not be construed as the embodiment being limited to and stating herein.On the contrary, provide these embodiments to be to make the present invention thorough and complete, and scope of the present invention is intactly conveyed to those skilled in the art.In full, identical Ref. No. refers to identical element.
Fig. 2 is the view of the formation of the matrix treatments equipment illustrated according to an exemplary embodiment.
In matrix treatments equipment 10, the laser beam produced from lasing light emitter 300 is passed mask M and is irradiated on matrix W.Herein, the luminescent layer being formed at the donor film on matrix W is separated and matrix W is patterned to form pixel subsequently.For this reason, matrix treatments equipment 10 comprises chamber 100, matrix support part 200, lasing light emitter 300, mask support main body 500, mask support main body mobile unit 700, camera unit 800 and control module 600.
Although chamber 100 has the rectangular box shape with inner space, the present invention is not limited thereto.For example, chamber can have multiple container shapes.That is, chamber 100 can have cylindrical shape or Polygonal box shape.The matrix be arranged in inner space is patterned to form pixel.Entrance for load/unload matrix is defined in a side surface of chamber and each on opposite side surface.Herein, at least one entrance is connected in matrix transmission module.
Projecting lens 400 is arranged on the top surface of chamber 100, with catch from lasing light emitter 300 irradiate laser beam, thus by radiating laser beams in the matrix on matrix support part.Although projecting lens 400 is arranged on the top surface of chamber 100, the present invention is not limited thereto.For example, projecting lens 400 can be arranged in laser beam irradiation passage, and described laser beam irradiation passage has the upper part of the outside or inside penetrating chamber 100.
Matrix support part 200 is arranged on support matrix W in the inner space of chamber 100, to make the pixel region of matrix W towards upside.And matrix support part 200 flatly moves and raises matrix W.Matrix support part 200 can be connected to the right cylinder as the unit for providing lifting force.Matrix W is placed on matrix support part 200.Herein, donor film is laminated on top surface (that is, surface to be patterned) (hereinafter referred to as " patterned surface ") of matrix.
Lasing light emitter 300 by the opening of pattern mask M by laser beam irradiation on the patterned surfaces of matrix W.Matrix treatments equipment can comprise catoptron 350 further.The laser beam of launching from lasing light emitter 300 is reflected by catoptron 350 and is irradiated to subsequently on mask M.Laser beam partly can add little region, the open area of ratio of specific heat mask M.Gas laser, such as argon laser, Kr laser, excimer laser etc., that is, use the laser instrument of medium, at least one wherein in neodymium, ytterbium, chromium, titanium, holmium, erbium, thulium and tantalum is added to single crystal YAG, Yttrium Orthovanadate, silicic acid magnesite (Mg
2siO
4), YAlO3, GdVO4 or polycrystalline (pottery) yttrium aluminum garnet, yttria, Yttrium Orthovanadate, in YAlO3, GdVO4 as adulterant, or at least one in amorphous laser, ruby laser, alexandrite laser instrument, titanium sapphire laser device, copper vapor laser and gold vapor laser can be used as lasing light emitter 300.Laser beam may be provided in linear bundle, and described linear bundle can easily be collected and be irradiated to immediately on the whole surface of matrix compared with the plane pencil of forms with relative wide region.
Mask M can be the light control unit for optionally stopping or reflect the laser beam of irradiating from lasing light emitter 300.Mask M has pattern, and described pattern has laser beam through opening wherein; And for stopping or the stop portions of reflection lasering beam.Because deposition materials is not through the opening of mask M, therefore different from deposition mas, mask M can have relatively thick thickness.Therefore, because mask M has relatively thick thickness, therefore described mask can prevent laser-beam diffraction when being subject to heat effects easily.And mask M can be formed by the material of the irradiation that can stand laser beam, such as, materials with high melting point, such as tungsten, tantalum, chromium, nickel or molybdenum, above every alloy; Or there is the metal material of low thermal coefficient of expansion, described metal material can not be out of shape easily due to heat, such as, stainless steel, inconel, Hastelloy etc.And mask M can be formed by the material with the thermal expansivity identical with the material for being attached to the donor film on matrix W.This is to prevent mask M and donor film by making mask M and donor film expansion with same coefficient of thermal expansion and not lining up each other, even if mask M is heated.
Matrix treatments equipment 10 comprises mask inclination correction device, for when replacing mask M by the focus of mask M and position correction to reference value.For the focus of mask M and position correction are comprised mask support main body 500, mask support main body mobile unit 700, camera unit 800 and control module 600 to the mask inclination correction device of reference value.
Mask support main body 500 is arranged between lasing light emitter 300 and matrix support part 200, to support pattern mask M.Mask support main body 500 can move and comprises the mask support main body mobile unit 700 of change of pitch angle module 520 and mask objective table movable part by use and rotate in X-axis, Y-axis and Z-direction.With reference to Fig. 3, Fig. 4 and Fig. 5, mask support main body 500 and mask objective table movable part are described.
Fig. 3 is the coupling figure of the mask support main body according to an exemplary embodiment, Fig. 4 is the exploded view of the mask support main body according to an exemplary embodiment, and Fig. 5 be according to the explanation of an exemplary embodiment wherein mask objective table movable part be implemented as the view of the example of linear motor (liner motor, LM) guiding piece.
Mask support main body 500 comprises the mask holder 510 supporting mask M; For supporting the mask objective table 530 of mask holder 510; And change of pitch angle module 520, described change of pitch angle module 520 regulates the Z axis height of each in the summit of mask holder to change the inclination angle of XY plane individually.
Mask objective table 530 is moved and is rotated by use mask objective table movable part in X-axis and Y direction.For example, mask objective table movable part can realize the movement of mask objective table 530 in X-axis and Y direction and the rotation of mask objective table 530.For example, linear motor (linermotor, LM) guiding piece may be implemented as mask objective table movable part.Illustrate in Fig. 5 that wherein LM guiding piece is implemented as an example of mask objective table movable part.In LM guiding piece, Y-axis delivery platform 2 moves along LM guide rail 1, and mask objective table 530 moves in the X-axis direction along Y-axis delivery platform 2.Therefore, when implementation, mask objective table 530 is arranged on appropriate location by the movement in X-axis and Y direction.Herein, X-axis and Y-axis are the axles forming two dimensional surface.And mask objective table 530 can comprise independent turning motor, flatly to rotate except the movement except X-axis and Y-axis.
Fig. 3 and mask holder 510 illustrated in fig. 4 have frame shape, and the core of described frame shape penetrates.Herein, the edge of mask M be positioned at mask holder 510 edge 510a on and supported by described edge 510a.Laser beam through mask M can through the region of mask holder, and the core of described mask holder penetrates.Certainly, in some cases, can be provided in further in mask holder 510 with the independent fixed cell of permanent mask M for supporting.Mask holder 510 may be implemented as the rectangular frame shape with four summits, and described four summits are the first summit, the second summit, the 3rd summit and the 4th summit.Or mask holder 510 may be implemented as the frame shape with three summits, five summits or six summits.Hereinafter, the frame shape with four summits will be described as an example.But, the mask holder with the number be less than or more than the summit on four summits can be provided.
In the exemplary embodiment, the inclination angle of the XY plane of mask holder 510 can change.The Z axis height on the summit of mask holder can individually through regulating with the inclination angle changing XY plane.Therefore, provide change of pitch angle module 520 to regulate the Z axis height of each in summit individually, thus change XY plane.Change of pitch angle module 520 comprises that height adjusting part divides 522,522a, 522b and 522c, and for enabling the first summit of mask holder 510, the Z axis height on the second summit and the 3rd summit raises individually or reduce; And supportive body 521, the 4th summit of mask holder 510 is connected on mask objective table 530 by described supportive body 521.Height adjusting part divides each in 522 to be motor, and the height of this motor obtains variable adjustment according to the stretching, extension operation of motor in a longitudinal direction along Z axis.The summit of mask objective table 530 and mask holder 510 is connected to the two ends that height adjusting part divides respectively in a longitudinal direction.The height adjusting part of adjustable in length divides 522 can be realized by various length adjusting unit (such as, linear motor).
Height adjusting part divides 522 to comprise the first height adjusting part and divides 522a, and the height on the first summit of mask holder 510 divides rising in the Z-axis direction by described first height adjusting part or reduces; Second height adjusting part divides 522b, and the height on the second summit of mask holder 510 divides 522b raise in the Z-axis direction or reduce by described second height adjusting part; And third high degree adjustment portion 522c, the Z axis height on the 3rd summit of mask holder 510 is raised by described third high degree adjustment portion or reduces.Height adjusting part divide each in 522 be in a longitudinal direction variable-length ground adjustable motor.Height adjusting part divides each in 522 to have so a kind of structure, and each in the summit of wherein mask objective table 530 and mask holder 510 is connected to height adjusting part in a longitudinal direction and divides on the two ends of each in 522.
Supportive body 521 is arranged on the 4th summit, to be supported on mask objective table 530 on the 4th summit of mask holder 510.Supportive body 521 can by tool spring springy or not tool metal bar springy realize.
Therefore, when the height on a certain summit raises or reduces on Z axis, the inclination angle of the XY plane of mask holder 510 can change.For example, as shown in Fig. 6 (a), (b), 522a is divided to extend in Z axis length when being arranged on the first height adjusting part on the first summit, during to promote the first summit of mask holder 510 in the Z-axis direction, the XY plane of mask holder 510 has a certain inclination angle, and described first summit is arranged on the At The Height being relatively higher than other summits with this inclination angle.Herein, the supportive body 521 (such as, spring) be arranged on the 4th summit extends, and the second height adjusting part be therefore arranged on the second summit divides 522b also can to extend on the height corresponding with the height on the 4th summit.And, as shown in Fig. 7 (a), (b), extend in Z axis length when being arranged on the third high degree adjustment portion 522a on the 3rd summit, during to promote the 3rd summit of mask holder 510 in the Z-axis direction, the XY plane of mask holder 510 has a certain inclination angle, and described 3rd summit is arranged on the At The Height being relatively higher than other summits with this inclination angle.Herein, the spring as the supportive body 521 be arranged on the 4th summit can extend, and the second height adjusting part be therefore arranged on the second summit divides 522b also can to extend on the height corresponding with the height on the 4th summit.
Therefore, after replacing mask M during the focal variation of laser beam, the height adjusting part be arranged on first, second, and third summit divides 522 through controlling the inclination angle of the XY plane to regulate mask holder 510, thus the focus of laser beam can be returned to its virgin state.Change of pitch angle due to the XY plane of mask holder 510 means the change of the XY plane of mask M, and the focus therefore through the laser beam of mask M can be revised by the change at the inclination angle of mask M.Therefore, even if replace mask, mask also can be loaded on farthest close position, the position previously set with mask.
As shown in Figure 2, camera unit 800 is provided in exemplary embodiment, to replace the change of focus of detection laser beam after mask.Camera unit 800 is take pictures through the laser beam of the matrix be arranged on matrix support part, to produce laser beam transmitted image.Camera unit 800 is arranged in the matrix support part 200 in a certain region, and in this region, laser beam is through irradiating with the image by using camera imaging sensor to catch the laser beam through matrix.Therefore, camera unit 800 can catch the image of the laser beam through irradiating through matrix W, to produce laser beam transmitted image.Infrared ray (infrared, IR) camera, near infrared ray (Near-infrared, NIR) camera may be implemented as camera unit 800.Herein, 10 times of lens, optical filtering etc. can be applied to camera unit 800.
When laser beam transmitted image depart from reference to focus chart as time, control module 600 controls mask support main body mobile unit 700 to change the inclination angle of the XY plane of mask holder 510, to make laser beam transmitted image and reference focus images match.Before replacement mask, control module 600 stores the reference focus chart picture concentrated in memory.Because laser beam is with line-shaped illumination, the state that therefore wherein the profile of laser beam has a good contrast can be determined by reference to focus chart picture.When after replacing mask holder 510 by the laser beam transmitted image of catching the Image Acquisition of the laser beam through matrix depart from reference to focus chart as time, the inclination angle of the XY plane of mask holder 510 changes focus is mated with reference focus.Contrast with reference to focus chart picture can be compared by multiple method, such as, and the method for the thickness of alternative line and compare the method for contrast.The method of the thickness of alternative line is the thickness of the line of the laser beam transmitted image being specified to picture and whether exceedes the method for critical value with reference to the thickness of the line of focus chart picture.And the method comparing contrast is the method whether contrast of the line of the laser beam transmitted image being specified to picture exceedes the critical value with reference to focus chart picture.
When determining to depart from critical value, control module 600 can relative to the inclination angle of mask holder modified chi Y plane.For example, in laser beam transmitted image with reference to (wherein each has linear) in focus chart picture, when laser beam transmitted image has the thickness be greater than with reference to focus chart picture, control module 600 promotes at least one in first, second, and third summit of mask holder 510, to change the inclination of the XY plane of mask holder 510.Similarly, when laser beam transmitted image has the thickness be less than with reference to focus chart picture, control module 600 enables at least one in first, second, and third summit of mask holder 510 reduce, and changes the inclination angle of the XY plane of mask holder 510 thus.
When the laser beam transmitted image of imaging in camera unit 800 departs from reference position, control module 600 can in X-axis and Y direction the mask objective table 530 of movable support mask holder, and mask objective table 530 is rotated.That is, when laser beam transmitted image departs from previously stored reference position, control module 600 controls mask objective table movable part, mask objective table 530 is rotated with mask objective table 530 mobile in X-axis and Y direction, mates to make laser beam transmitted image with reference position.Reference position represents the positional information of the reference focus chart picture of the planimetric coordinates based on matrix support part.When focused, the positional information with linear laser beam be irradiated in matrix is registered as reference position.Subsequently, when the critical value of reference position is departed from due to the replacement of mask holder in the position of laser beam, control module mobile mask objective table 530 and mask objective table 530 is rotated, with the position of adjusting laser beam in X-axis and Y direction.
In the exemplary embodiment, can regulate the inclination angle of mask support main body, even if also can prevent the focus of laser beam and position from changing when replacing mask.
Although describe equipment for revising inclination angle and matrix treatments equipment with reference to specific embodiment, they are not limited thereto.Therefore, those skilled in the art will readily appreciate that, when not departing from the spirit and scope of the present invention defined by appended claims, can make various amendment and change to it.
Claims (13)
1. for the equipment at the inclination angle of mask correction, it is characterized in that, described equipment comprises:
Mask support main body, described mask support main body is configured to support on it and forms figuratum mask;
Mask support main body mobile unit, described mask support main body mobile unit is configured to the inclination angle of the XY plane changing described mask support main body;
Camera unit, described camera unit is take pictures through the laser beam of the matrix be arranged on matrix support part, to produce laser beam transmitted image; And
Control module, described control module is configured to control described mask support main body mobile unit, change the described inclination angle of the described XY plane of described mask thus, with make when described laser beam transmitted image depart from reference to focus chart as time, described laser beam transmitted image and described reference focus images match.
2. equipment according to claim 1, is characterized in that, described camera unit is arranged in described matrix support part.
3. equipment according to claim 2, is characterized in that, described camera unit comprises the one in infrared camera and near infrared camera.
4. equipment according to claim 1, is characterized in that, described mask support main body comprises:
Mask holder, described mask holder has the frame shape that core penetrates, described mask holder has the first summit, the second summit, the 3rd summit and the 4th summit, wherein said mask is placed on described mask holder, and the inclination angle of the described XY plane of described mask holder is change;
Mask state, described mask state is configured to the described mask holder supported on its top surface; And
Change of pitch angle module, described change of pitch angle module is configured to the Z axis height on the described summit regulating described mask holder individually, to change the described inclination angle of described XY plane.
5. equipment according to claim 4, is characterized in that, described change of pitch angle module comprises:
Height adjusting part divides, described height adjusting part divide be configured to enable described first summit of described mask holder, the described Z axis height on described second summit and described 3rd summit raises individually or reduces; And
Supportive body, described supportive body is configured to described 4th summit of described mask holder to be connected on mask objective table.
6. equipment according to claim 5, it is characterized in that, it is the motor regulated in their longitudinal direction that described height adjusting part divides variable-length, and the two ends on its longitudinal direction are connected respectively on the described summit of described mask objective table and described mask holder.
7. equipment according to claim 5, is characterized in that, described height adjusting part divides and comprises:
First height adjusting part divides, and described first height adjusting part divides and is configured to enable the described Z axis height on described first summit of described mask holder raise or reduce;
Second height adjusting part divides, and described second height adjusting part divides and is configured to enable the described Z axis height on described second summit of described mask holder raise or reduce; And
Third high degree adjustment portion, described third high degree adjustment portion is configured to enable the described Z axis height on described 3rd summit of described mask holder raise or reduce.
8. equipment according to claim 5, it is characterized in that, described mask support main body mobile unit comprises mask objective table movable part further, and described mask objective table movable part is configured to mobile described mask objective table in X-axis and Y direction and described mask objective table is rotated.
9. equipment according to claim 8, it is characterized in that, when described laser beam transmitted image departs from reference position, described mask objective table movable part, through controlling with described mask objective table mobile in X-axis and Y direction and making described mask objective table rotate, mates with described reference position to make described laser beam transmitted image.
10. equipment according to claim 5, it is characterized in that, described laser beam transmitted image and describedly have linear with reference to each in focus chart picture, and when described laser beam transmitted image has the thickness being greater than described reference focus chart picture, described control module enables at least one in described first summit of described mask holder, described second summit and described 3rd summit raise.
11. equipment according to claim 5, it is characterized in that, described laser beam transmitted image and describedly have linear with reference to each in focus chart picture, and when described laser beam transmitted image has the thickness being less than described reference focus chart picture, described control module enables at least one in described first summit of described mask holder, described second summit and described 3rd summit reduce.
12. 1 kinds of matrix treatments equipment, is characterized in that, comprising:
Chamber, described chamber has the inner space of matrix patterning wherein;
Matrix support part, described matrix support part is arranged in described inner space to support described matrix;
Lasing light emitter, described lasing light emitter is configured to produce laser beam;
Mask support main body, described mask support main body is arranged between described lasing light emitter and described matrix support part, forms figuratum mask to support on it;
Mask support main body mobile unit, described mask support main body mobile unit is configured to the inclination angle of the XY plane changing described mask support main body;
Camera unit, described camera unit is configured to as taking pictures through the described laser beam of the described matrix be arranged on described matrix support part, to produce laser beam transmitted image; And
Control module, described control module is configured to control described mask support main body mobile unit, change the described inclination angle of the described XY plane of described mask thus, with make when described laser beam transmitted image depart from reference to focus chart as time, described laser beam transmitted image and described reference focus images match.
13. matrix treatments equipment according to claim 12, is characterized in that, described mask support main body mobile unit moves described mask support main body and mask support part is rotated in X-axis and Y direction.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2013-0102478 | 2013-08-28 | ||
| KR1020130102478A KR101825091B1 (en) | 2013-08-28 | 2013-08-28 | Apparatus for amending tilt and method for processing substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104423146A true CN104423146A (en) | 2015-03-18 |
| CN104423146B CN104423146B (en) | 2019-10-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410412432.3A Expired - Fee Related CN104423146B (en) | 2013-08-28 | 2014-08-20 | For correcting the equipment and matrix treatments equipment at the inclination angle of mask |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101825091B1 (en) |
| CN (1) | CN104423146B (en) |
| TW (1) | TWI544293B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105159037A (en) * | 2015-09-30 | 2015-12-16 | 合肥芯碁微电子装备有限公司 | Direct-write lithography pattern generator included angle calibration method |
| CN108994450A (en) * | 2017-06-07 | 2018-12-14 | 株式会社迪思科 | Laser processing and laser processing device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000232061A (en) * | 1999-02-12 | 2000-08-22 | Nikon Corp | Aligner and exposure method |
| CN101750714A (en) * | 2008-12-19 | 2010-06-23 | Ap系统股份有限公司 | Vision system for substrate alignment apparatus and method for focusing the same |
| WO2012173692A1 (en) * | 2011-06-17 | 2012-12-20 | Applied Materials, Inc. | Cvd mask alignment for oled processing |
-
2013
- 2013-08-28 KR KR1020130102478A patent/KR101825091B1/en active IP Right Grant
-
2014
- 2014-08-20 CN CN201410412432.3A patent/CN104423146B/en not_active Expired - Fee Related
- 2014-08-26 TW TW103129254A patent/TWI544293B/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000232061A (en) * | 1999-02-12 | 2000-08-22 | Nikon Corp | Aligner and exposure method |
| CN101750714A (en) * | 2008-12-19 | 2010-06-23 | Ap系统股份有限公司 | Vision system for substrate alignment apparatus and method for focusing the same |
| WO2012173692A1 (en) * | 2011-06-17 | 2012-12-20 | Applied Materials, Inc. | Cvd mask alignment for oled processing |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105159037A (en) * | 2015-09-30 | 2015-12-16 | 合肥芯碁微电子装备有限公司 | Direct-write lithography pattern generator included angle calibration method |
| CN108994450A (en) * | 2017-06-07 | 2018-12-14 | 株式会社迪思科 | Laser processing and laser processing device |
| CN108994450B (en) * | 2017-06-07 | 2021-10-22 | 株式会社迪思科 | Laser processing method and laser processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201508424A (en) | 2015-03-01 |
| CN104423146B (en) | 2019-10-01 |
| KR101825091B1 (en) | 2018-02-02 |
| TWI544293B (en) | 2016-08-01 |
| KR20150025170A (en) | 2015-03-10 |
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