CN104375290A - Shock insulator detection method and device - Google Patents
Shock insulator detection method and device Download PDFInfo
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- CN104375290A CN104375290A CN201410562621.9A CN201410562621A CN104375290A CN 104375290 A CN104375290 A CN 104375290A CN 201410562621 A CN201410562621 A CN 201410562621A CN 104375290 A CN104375290 A CN 104375290A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
Abstract
The invention provides a shock insulator detection method and device and belongs to the technical field of display substrate detection. The shock insulator detection method and device can solve the problems that existing shock insulator overall deficiency depends on manual detection and is low in efficiency and reliability. The shock insulator detection method comprises the steps that images in a detection region of a display substrate are collected, wherein the detection region is located in a display region of the display substrate, and multiple shock insulator positions used for arrangement of shock insulators are arranged in the detection region; the detection region is divided into multiple identical comparison units, wherein display structures, except the shock insulators, of all the comparison units are the same, and the shock insulator positions in at least a part of the comparison units are different in distribution; the image of each comparison unit is compared with the images of the adjacent comparison units in sequence, and if comparison results are different, a defect is recorded; the total number of the defects in the detection region is compared with a preset critical value, and if the total number of the defects is smaller than the critical value, it is determined that the display substrate has shock insulator overall deficiency.
Description
Technical field
The invention belongs to display base plate detection technique field, be specifically related to a kind of chock insulator matter detection method and equipment.
Background technology
Chock insulator matter (PS) is located between two pieces of display base plates (array base palte and color membrane substrates) of display panels, the effect play and maintain display base plate spacing, keeping thickness of liquid crystal box.On display base plate, chock insulator matter with " chock insulator matter cycling element " for unit loop distribution, each chock insulator matter cycling element comprises N number of (N is more than or equal to 2) and comes pixel cell (namely each chock insulator matter cycling element comprises a piece " region " of display base plate) together, and be wherein provided with multiple chock insulator matter, chock insulator matter distribution situation in each chock insulator matter cycling element is identical, and the viewing area (for carrying out the region shown) of multiple chock insulator matter cycling element cycle arrangement composition display base plate.Wherein, each pixel cell is used for independently showing one " point ", and it is made up of the sub-pixel (as red, green, blue three sub-pixels) of multiple different colours.
Fig. 1 shows the situation that a kind of chock insulator matter cycling element G comprises 6 pixel cells 1 lining up the matrix that 3 row × 2 arrange, in this chock insulator matter cycling element G, have 14 chock insulator matters 11; The viewing area (for carrying out the region shown) of multiple identical chock insulator matter cycling element G cycle arrangement composition display base plate.Visible, chock insulator matter 11 skewness in each pixel cell 1 in a chock insulator matter cycling element G, this is by many-sided comprehensive decision such as support effect, space hold, display effect.Certainly, the concrete mode of actual chock insulator matter cycling element G is various, all alterable such as number of pixels wherein, pixel arrangement mode (as being not matrix but oblique array), chock insulator matter 11 number, chock insulator matter 11 position, chock insulator matter 11 shape (size as different chock insulator matter 11 can be different).
In display base plate manufacturing process, need to detect it whether have the defect such as light leak, dust, the available exhaustive test machine of this detection carries out, specifically comprise: as shown in Figure 1, gather the image of the viewing area of display base plate, and being divided into multiple contrast unit J (being namely divided in " region " that multiple shape and size are identical), each contrast unit J comprises multiple pixel cell 1 (matrix as multiple pixel cell 1) come together; Afterwards, carried out contrasting (as contrasted gray scale) by the image of each contrast unit J and adjacent contrast's unit J successively, the contrast unit J of existing defects (if any dust) is inevitable different from the image of adjacent contrast's unit J, therefore can be contrasted out.Obviously, the condition of above detection is that the display structure (chock insulator matter 11, electrode, lead-in wire, color filter film etc.) in each contrast unit J under normal circumstances must be identical, otherwise flawless contrast unit J also can contrast difference; For this reason, the division contrasting unit J necessary must be identical with chock insulator matter cycling element G (or multiple chock insulator matter cycling element G), each contrast unit J is exactly a chock insulator matter cycling element G in other words, identical to ensure the distribution of chock insulator matter 11 in each contrast unit J.
Wherein, can gap be there is no between each pixel cell, chock insulator matter cycling element, contrast unit in practical situations both, but in accompanying drawing of the present invention, be each interstructural relation of clear sign, therefore add gap between adjacent structure.
But, in some cases, overall disappearance may be there is (as light source during chock insulator matter material exposure damages in the chock insulator matter on display base plate, cause chock insulator matter material all unexposed and all washed off), now in all contrast unit all without chock insulator matter, therefore its equal zero defect when being detected by above control methods.Therefore, the problem of present chock insulator matter entirety disappearance can only lean on artificial visual inspection (though the little quantity of chock insulator matter is many, therefore during overall disappearance, naked eyes still can be found out), but manual detection efficiency is low, and there is the human factors such as fatigue, paralysis, and reliability is low.
Summary of the invention
The present invention is directed to existing chock insulator matter entirety disappearance by manual detection, efficiency and the low problem of reliability, a kind of efficiency and the high chock insulator matter detection method of reliability and equipment are provided.
The technical scheme that solution the technology of the present invention problem adopts is a kind of chock insulator matter detection method, and it comprises:
Gather the image of the detection zone of display base plate, described detection zone is arranged in the viewing area of display base plate, has multiple chock insulator matter position for arranging chock insulator matter in described detection zone;
Described detection zone is divided into multiple identical contrast unit, in each contrast unit, except chock insulator matter, other display structure is all identical, and the distribution of chock insulator matter position described in contrast unit is different at least partly;
Contrast the image of each contrast unit and adjacent contrast's unit successively, if comparing result difference, be designated as a defect;
The relatively total critical value with presetting of the defect of detection zone, if described defect sum is less than critical value, judges that display base plate exists chock insulator matter entirety disappearance.
Preferably, described viewing area is divided into multiple identical chock insulator matter cycling element, each chock insulator matter cycling element comprise multiple pixel cell and in have multiple described chock insulator matter position, in each chock insulator matter cycling element, the distribution of chock insulator matter position is identical; Wherein, each pixel cell is made up of the sub-pixel of multiple different colours; Each contrast unit comprises at least one pixel cell.
Further preferably, in described contrast unit, the number of pixel cell is fewer than the number of pixel cell in chock insulator matter cycling element.
Further preferably, described contrast unit is a pixel cell.
Preferably, the number of the contrast unit in each described detection zone is between 10 to 5000.
Preferably, the span of described critical value is between 5 to 50.
Preferably, the described image contrasting each contrast unit and adjacent contrast's unit successively, if comparing result difference, be designated as a defect and comprise: the gray-scale value contrasting the image of each contrast unit and adjacent contrast's unit successively, if the difference of gray-scale value exceedes threshold value, be designated as a defect
Preferably, described display base plate comprises multiple exposure region, has at least one detection zone in each exposure region, and the chock insulator matter in described display base plate is formed by exposure technology.
Preferably, described display base plate is color membrane substrates.
The technical scheme that solution the technology of the present invention problem adopts is a kind of chock insulator matter checkout equipment, and it comprises:
Image acquisition units, for gathering the image of the detection zone of display base plate, described detection zone is arranged in the viewing area of display base plate, has multiple chock insulator matter position for arranging chock insulator matter in described detection zone;
Zoning unit, for described detection zone being divided into multiple identical contrast unit, in each contrast unit, except chock insulator matter, other display structure is all identical, and the distribution of chock insulator matter position described in contrast unit is different at least partly;
Contrast unit, for contrasting the image of each contrast unit and adjacent contrast's unit successively, if comparing result difference, is designated as a defect;
Judging unit, for comparing the defect sum of detection zone and the critical value preset, if described defect sum is less than critical value, judges that display base plate exists chock insulator matter entirety disappearance.
According to detection method of the present invention, chock insulator matter position (chock insulator matter) distribution in part contrast unit is different, therefore when there being chock insulator matter, the distribution of the chock insulator matter in many contrast unit all different (certainly do not get rid of have part identical), contrast unit afterwards in a large number in contrast like this and all can be considered to there is " defect ", " defect " number can be a lot; Relative, if chock insulator matter entirety disappearance, all without chock insulator matter in each contrast unit, then only have the contrast unit that there is individually other defect (as dust) just can be detected defect, and usual other defect number seldom (generally only having several in a viewing area), therefore judge whether chock insulator matter entirety disappearance occurs by the magnitude of defects count.Thus, the present invention can realize the automatic detection to chock insulator matter entirety disappearance, and avoid the impact of human factor, efficiency and reliability are all high; Meanwhile, the main process of this detection realizes (as long as carrying out one-time detection with it) by existing exhaustive test machine more, therefore it both can not cause the increase of cost, also can not make complex process.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of existing display base plate detection method;
Fig. 2 is the process flow diagram of the chock insulator matter detection method of embodiments of the invention 1;
Fig. 3 is the schematic diagram of a kind of chock insulator matter detection method of embodiments of the invention 1;
Fig. 4 is the schematic diagram of the another kind of chock insulator matter detection method of embodiments of the invention 1;
Wherein, Reference numeral is: 1, pixel cell; 11, chock insulator matter; G, chock insulator matter cycling element; J, contrast unit.
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Embodiment 1:
As shown in Figures 2 to 4, the present embodiment provides a kind of chock insulator matter detection method, and whether its chock insulator matter 11 on detection display substrate overall disappearance occurs.
Wherein, display base plate is preferably color membrane substrates, this is because chock insulator matter more than 11 is located in color membrane substrates.Certainly, if display base plate is array base palte etc. is also feasible.Meanwhile, this display base plate can be used for liquid crystal indicator, Organic Light Emitting Diode (OLED) display device etc.
The chock insulator matter detection method of the present embodiment specifically comprises the following steps:
The image of the detection zone of S101, collection display base plate, detection zone is arranged in the viewing area of display base plate, has multiple chock insulator matter position for arranging chock insulator matter 11 in detection zone.
That is, in the viewing area of display base plate, delimit the region of a part as detection zone, and gather the image of this detection zone, this collection is undertaken by high resolution CCD (charge coupled cell) etc.
Why like this, that the method that should be the present embodiment lacks mainly for detection of chock insulator matter 11 entirety, as long as therefore determine whether there is chock insulator matter 11 in a part (detection zone) for viewing area, can determine whether have chock insulator matter in whole array base palte, therefore all can detect whole substrate, thus testing amount can be reduced.Certainly, to using whole viewing area as detection zone, be also feasible.
Wherein, " chock insulator matter position " refers to according to normal technological process, the position of chock insulator matter 11 can be formed thereon, why itself and " chock insulator matter 11 " are made a distinction herein, because chock insulator matter 11 entirety disappearance may occur the display base plate of the present embodiment, therefore wherein may there is no actual chock insulator matter 11, and only have the predetermined position for arranging chock insulator matter 11.
Preferably, detection zone is made up of multiple pixel cell 1 come together.Wherein, each pixel cell 1 is made up of the sub-pixel of multiple different colours, " point " that can independently control when namely each pixel cell 1 is display.
That is, detection zone can " pixel cell 1 " divide for base unit, to choose contrast unit J in step afterwards.More specifically, detection zone can be the multiple pixel cells 1 lining up matrix form.
Preferably, if display base plate comprises multiple exposure region, then will select at least one detection zone in each exposure region when detecting, and the chock insulator matter 11 in display base plate is formed by exposure technology.
That is, if display base plate is the form (forming multiple display panel after cutting) of " motherboard ", comprising multiple viewing area, then its area can be very large, therefore it will be divided into multiple exposure region (exposure shot) usually, and each exposure region forms display structure wherein respectively by different step of exposure.And formed by exposure region due to chock insulator matter 11, therefore it may appear at and does not lack in an exposure region and situation about lacking in another exposure region, therefore a detection zone should at least be selected in each exposure region in this case, to ensure the comprehensive and accuracy detected.Certainly, for the chock insulator matter 11 formed by additive method, then detection zone can not take exposure region as foundation.
S102, detection zone is divided into multiple identical contrast unit J, in each contrast unit J, except chock insulator matter 11 except, other display structure is all identical, and the distribution difference of chock insulator matter position (in other words " chock insulator matter 11 ") in contrast unit J at least partly.
That is, as shown in Figure 3, similarly to the prior art, detection zone is evenly divided into all identical region of multiple shape, size (contrast unit J), and its dividing mode will ensure in each contrast unit J, except chock insulator matter 11, the distribution of other display structure (electrode, lead-in wire, color filter film etc.) is all identical.
Preferably, each contrast unit J comprises at least one pixel cell 1, and wherein each pixel cell 1 more preferably lines up matrix form.
That is, contrast unit J preferably also with " pixel cell 1 " for base unit divides.Why like this, be because in each pixel cell 1 except chock insulator matter 11, other display structure is general all identical, therefore in units of it, carry out dividing the condition the most easily realizing " in each contrast unit J, other display structure is identical except chock insulator matter 11 ".Otherwise, if according to other modes, such as, be contrast unit J with sub-pixel, then because color filter film (for the color membrane substrates) color in different subpixel is different, therefore more difficultly meet above-mentioned condition.Certainly, above scheme is not limitation of the invention, as long as can ensure that in each contrast unit J, other display structure is identical except chock insulator matter 11, then also can sub-pixel etc. as minimum division unit.
Unlike the prior art, in each contrast unit J of the present embodiment, have at least the distribution of chock insulator matter position in the contrast unit J of a part different.That is, the dividing mode contrasting unit J should meet: in all contrast unit J, the distribution of chock insulator matter position is not identical.
Preferably, viewing area is divided into multiple identical chock insulator matter cycling element G, have multiple chock insulator matter position in each chock insulator matter cycling element G, in each chock insulator matter cycling element G, the distribution of chock insulator matter position is identical, and each chock insulator matter cycling element G also comprises multiple pixel cell 1.
That is, in display base plate, chock insulator matter 11 is preferred is unit loop distribution with above " chock insulator matter cycling element G ".Obviously, because now chock insulator matter 11 is loop distribution, therefore different to the distribution realizing chock insulator matter position in each contrast unit J, then this contrast unit J can not be just in time chock insulator matter cycling element G, neither the chock insulator matter cycling element G of multiple arranged adjacent; In other words, part incomplete chock insulator matter cycling element G must be comprised in contrast unit J.
Wherein, preferably, the number contrasting pixel cell 1 in unit J is fewer than the number of pixel cell 1 in chock insulator matter cycling element G; Preferred, contrast unit J is a pixel cell 1.
That is, contrast unit J is preferably than chock insulator matter cycling element G " little ", and more preferably contrasting unit J is exactly single pixel cell 1.This is because when the difference of chock insulator matter 11 is identical, the relative difference of the less then image of different contrast unit J of contrast unit J is larger.Such as, if contrast unit J is a pixel cell 1, then, when in two contrast unit J, the quantity of chock insulator matter 11 differs from one, difference is obvious; If have 100 pixel cells 1 in contrast unit J, then, when in two contrast unit J, the quantity of chock insulator matter 11 differs from one equally, this difference is just difficult to be observed.
Certainly, above scheme neither limitation of the invention.Such as, as shown in Figure 4, contrast unit J also can comprise multiple pixel cell 1, and a contrast unit J can cross over different chock insulator matter cycling element G; But in a word, if contrast unit J be not chock insulator matter cycling element G neither multiple chock insulator matter cycling element G, and in each contrast unit J except chock insulator matter 11 other display structure identical.
Wherein, preferably, detection zone and contrast the choosing and should meet of unit J: the number of the contrast unit J in each detection zone is between 10 to 5000.
As previously mentioned, the present invention there is no need to detect whole viewing area, but in order to ensure the reliability of testing result, avoid the impact of accidentalia, therefore detection zone should be too not little yet, usually comprising 10 to 5000 contrast unit J can meet the demands (if each contrast unit J is a pixel cell 1, then now the size of detection zone between several millimeters to several centimetres).
S103, contrast the image of each contrast unit J and adjacent contrast's unit J successively, if comparing result difference, be designated as a defect.
That is, similarly to the prior art, successively the image of the image of each contrast unit J and adjacent contrast unit J is contrasted, if different both finding, then think and contrast existing defects in unit J, number of defects is added one.
Wherein, preferably, above contrast comprises: the gray-scale value contrasting the image of each contrast unit J and adjacent contrast's unit J successively, if the difference of gray-scale value exceedes threshold value, is designated as a defect.
That is, the overall intensity object as a comparison of the image of available each contrast unit J, if the difference of the overall intensity of the image of two adjacent contrast's unit J exceedes predetermined threshold value, then thinks that the two is different, is designated as a defect.Wherein, threshold value can set as the case may be, and such as threshold value can be 20 gray shade scales (for 256 gray shade scales altogether), or threshold value also can be specific number percent (namely with the gray scale of certain contrast unit J for 100%).Why preferably adopting gray scale for contrast object, is that to should be this concrete comparison process be existing, and fairly simple, easily realizes.
Certainly, above contrast also can take other diverse ways, such as, contrast the color, detailed structure etc. of image.
Simultaneously, above " contrasting successively " also can adopt diverse ways, and such as, it can be contrasted successively by contrast unit J adjacent in the row direction, also can be that the contrast unit J adjacent along column direction is contrasted successively, also can be expert at, column direction all contrasts.For another example, for the pixel that ABCD tetra-is adjacent successively, can be that A, B are contrasted, then C, D are contrasted; Also can be first contrast A, B, then contrast B, C, finally contrast C, D again.
Concrete, above each step realizes by existing exhaustive test.
S104, the defect sum comparing detection zone and the critical value preset, if defect sum is less than critical value, judge that display base plate exists chock insulator matter 11 entirety disappearance.
That is, after a detection zone has been detected, total number of defect wherein can be obtained, afterwards this total number is compared with a predetermined critical value, if defect sum is less than this critical value, then think the situation exposure region of this place, detection zone (be at least there is chock insulator matter 11 entirety disappearance) that there is chock insulator matter 11 entirety disappearance in display base plate, if defect sum is more than or equal to critical value, then think that display base plate (being at least the exposure region at this place, detection zone) does not exist chock insulator matter 11 entirety disappearance.
Obviously, when display base plate there being chock insulator matter 11 (namely chock insulator matter 11 entirety disappearance does not occur), then contrast on the chock insulator matter position in unit J and all have chock insulator matter 11, and the situation of the distribution of chock insulator matter 11 is different (because the distribution situation of chock insulator matter position is different) in different contrast unit J, like this, when contrasting, the image of many contrast unit J all different from the image of adjacent contrast's unit J (certainly also may have part identical), therefore its defect sum detected is inevitable a lot.
And when display base plate there is no chock insulator matter 11 (namely there occurs chock insulator matter 11 entirety disappearance), all without chock insulator matter 11 (only have chock insulator matter position, but chock insulator matter position there is no practical structures) in all contrast unit J.Because other structures in each contrast unit J are all identical, therefore when contrasting, except really existing except the contrast unit J of other defect (as dust) individually, in other most contrast unit J, all defect can not be detected.And in most cases, the other defect in display base plate is little, have at most several in each detection zone.
As can be seen here, when there is and not occurring chock insulator matter 11 entirety disappearance, detect the defect number obtained and can have very big difference in magnitude, therefore by number of defects quantitative analysis, judge whether display base plate (being at least an exposure region of display base plate) the entirety disappearance of chock insulator matter 11 occurs.
Preferably, the span of above critical value is between 5 to 50.
That is, according to the difference of detection zone, contrast unit J, chock insulator matter cycling element G etc., whether above differentiation the critical value of the defects count of chock insulator matter 11 entirety disappearance occurs can be different, but it is generally selected between 5 to 50.
Like this, the detection method of the present embodiment can realize the automatic detection to chock insulator matter 11 entirety disappearance, and efficiency and reliability are all high.
Obviously, whether the method for the present embodiment there is overall disappearance for detecting chock insulator matter.Therefore, if needed, also can before it or afterwards, by existing method, display base plate be detected, to determine the situation of wherein other defect.
The present embodiment also provides a kind of chock insulator matter checkout equipment, and it comprises:
Image acquisition units, for gathering the image of the detection zone of display base plate, detection zone is arranged in the viewing area of display base plate, has multiple chock insulator matter position for arranging chock insulator matter in detection zone;
Zoning unit, for detection zone being divided into multiple identical contrast unit, in each contrast unit, except chock insulator matter, other display structure is all identical, and the distribution contrasting chock insulator matter position in unit is at least partly different;
Contrast unit, for contrasting the image of each contrast unit and adjacent contrast's unit successively, if comparing result difference, is designated as a defect;
Judging unit, for comparing the defect sum of detection zone and the critical value preset, if defect sum is less than critical value, judges that display base plate exists chock insulator matter entirety disappearance.
The chock insulator matter checkout equipment of the present embodiment can carry out above-mentioned detection method, thus realizes the automatic detection to chock insulator matter entirety disappearance.Meanwhile, the main body of this chock insulator matter checkout equipment can adopt " exhaustive test machine " (as long as increasing judging unit again), therefore its cost is lower, easily realizes.
Be understandable that, the illustrative embodiments that above embodiment is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (10)
1. a chock insulator matter detection method, is characterized in that, comprising:
Gather the image of the detection zone of display base plate, described detection zone is arranged in the viewing area of display base plate, has multiple chock insulator matter position for arranging chock insulator matter in described detection zone;
Described detection zone is divided into multiple identical contrast unit, in each contrast unit, except chock insulator matter, other display structure is all identical, and the distribution of chock insulator matter position described in contrast unit is different at least partly;
Contrast the image of each contrast unit and adjacent contrast's unit successively, if comparing result difference, be designated as a defect;
The relatively total critical value with presetting of the defect of detection zone, if described defect sum is less than critical value, judges that display base plate exists chock insulator matter entirety disappearance.
2. chock insulator matter detection method according to claim 1, is characterized in that,
Described viewing area is divided into multiple identical chock insulator matter cycling element, each chock insulator matter cycling element comprise multiple pixel cell and in have multiple described chock insulator matter position, in each chock insulator matter cycling element, the distribution of chock insulator matter position is identical; Wherein, each pixel cell is made up of the sub-pixel of multiple different colours;
Each contrast unit comprises at least one pixel cell.
3. chock insulator matter detection method according to claim 2, is characterized in that,
In described contrast unit, the number of pixel cell is fewer than the number of pixel cell in chock insulator matter cycling element.
4. chock insulator matter detection method according to claim 3, is characterized in that,
Described contrast unit is a pixel cell.
5. chock insulator matter detection method according to claim 1, is characterized in that,
The number of the contrast unit in each described detection zone is between 10 to 5000.
6. chock insulator matter detection method according to claim 1, is characterized in that,
The span of described critical value is between 5 to 50.
7. chock insulator matter detection method as claimed in any of claims 1 to 6, is characterized in that, the described image contrasting each contrast unit and adjacent contrast's unit successively, if comparing result difference, is designated as a defect and comprises:
Contrast the gray-scale value of the image of each contrast unit and adjacent contrast's unit successively, if the difference of gray-scale value exceedes threshold value, be designated as a defect.
8. chock insulator matter detection method as claimed in any of claims 1 to 6, is characterized in that,
Described display base plate comprises multiple exposure region, has at least one detection zone in each exposure region, and the chock insulator matter in described display base plate is formed by exposure technology.
9. chock insulator matter detection method as claimed in any of claims 1 to 6, is characterized in that,
Described display base plate is color membrane substrates.
10. a chock insulator matter checkout equipment, is characterized in that, comprising:
Image acquisition units, for gathering the image of the detection zone of display base plate, described detection zone is arranged in the viewing area of display base plate, has multiple chock insulator matter position for arranging chock insulator matter in described detection zone;
Zoning unit, for described detection zone being divided into multiple identical contrast unit, in each contrast unit, except chock insulator matter, other display structure is all identical, and the distribution of chock insulator matter position described in contrast unit is different at least partly;
Contrast unit, for contrasting the image of each contrast unit and adjacent contrast's unit successively, if comparing result difference, is designated as a defect;
Judging unit, for comparing the defect sum of detection zone and the critical value preset, if described defect sum is less than critical value, judges that display base plate exists chock insulator matter entirety disappearance.
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| CN201410562621.9A CN104375290B (en) | 2014-10-21 | 2014-10-21 | Dottle pin object detecting method and equipment |
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| CN106290036A (en) * | 2016-08-26 | 2017-01-04 | 深圳市华星光电技术有限公司 | The quality detection apparatus of display panels inner support post |
| CN106646935A (en) * | 2016-09-26 | 2017-05-10 | 合肥京东方光电科技有限公司 | Display device and method for displaying heterogeneous defects and detection equipment |
| CN114296278A (en) * | 2021-11-30 | 2022-04-08 | 滁州惠科光电科技有限公司 | Array substrate, display panel and display device |
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| JPH11194349A (en) * | 1998-01-07 | 1999-07-21 | Alps Electric Co Ltd | Spacer distribution device |
| KR20030085734A (en) * | 2002-05-01 | 2003-11-07 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display device |
| JP2006003725A (en) * | 2004-06-18 | 2006-01-05 | Integrated Solutions:Kk | Spacer ejecting apparatus |
| CN103885217A (en) * | 2014-03-10 | 2014-06-25 | 京东方科技集团股份有限公司 | Method and device for detecting liquid crystal display panel column-shaped shock insulator defects |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106290036A (en) * | 2016-08-26 | 2017-01-04 | 深圳市华星光电技术有限公司 | The quality detection apparatus of display panels inner support post |
| CN106290036B (en) * | 2016-08-26 | 2019-03-15 | 深圳市华星光电技术有限公司 | The quality detection apparatus of liquid crystal display panel inner support column |
| CN106646935A (en) * | 2016-09-26 | 2017-05-10 | 合肥京东方光电科技有限公司 | Display device and method for displaying heterogeneous defects and detection equipment |
| CN106646935B (en) * | 2016-09-26 | 2023-10-27 | 合肥京东方光电科技有限公司 | Display non-uniformity defect display device, method and detection equipment |
| CN114296278A (en) * | 2021-11-30 | 2022-04-08 | 滁州惠科光电科技有限公司 | Array substrate, display panel and display device |
| CN114296278B (en) * | 2021-11-30 | 2023-04-25 | 滁州惠科光电科技有限公司 | Array substrate, display panel and display device |
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|---|---|
| CN104375290B (en) | 2017-03-29 |
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