CN104359419B - The wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure and method - Google Patents
The wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure and method Download PDFInfo
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- CN104359419B CN104359419B CN201410617213.9A CN201410617213A CN104359419B CN 104359419 B CN104359419 B CN 104359419B CN 201410617213 A CN201410617213 A CN 201410617213A CN 104359419 B CN104359419 B CN 104359419B
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- 238000005259 measurement Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title abstract description 13
- 238000003384 imaging method Methods 0.000 claims abstract description 26
- 238000005057 refrigeration Methods 0.000 claims abstract description 24
- 230000003287 optical effect Effects 0.000 claims abstract description 23
- 238000012876 topography Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 11
- 241001269238 Data Species 0.000 claims description 6
- 230000005284 excitation Effects 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 239000012528 membrane Substances 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000002310 reflectometry Methods 0.000 claims description 3
- 230000021615 conjugation Effects 0.000 claims description 2
- 235000013399 edible fruits Nutrition 0.000 claims 1
- 230000004936 stimulating effect Effects 0.000 claims 1
- 238000000879 optical micrograph Methods 0.000 abstract description 2
- 230000010363 phase shift Effects 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005395 radioluminescence Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Abstract
The wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure and method belong to optical microphotograph imaging field；The device includes：LASER Light Source, collimating mirror, sinusoidal grating, lens, the first pipe mirror, the first dichroscope, object lens, sample, the second dichroscope, the first optical filter, the second pipe mirror, the first refrigeration CCD, the second optical filter, the 3rd pipe mirror, the second refrigeration CCD, objective table.Each tested plane grating is done at three phase shifts, each phase, makes the signal of sample surfaces outgoing by optical filter, takes the refrigeration of the first refrigeration CCD and second CCD to collect the difference of signal.Demodulation computing can obtain fluorescent film upper surface and sample surfaces double-layer structure information, remove the surface topography information that one layer of face information measures microcosmic smooth curvature sample.
Description
Technical field
The wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure and method belong to optical microphotograph imaging neck
Domain.
Background technology
For smooth deep camber sample, because the light illuminated to sample surfaces can not be collected completely because of mirror-reflection,
Or can not almost be collected, so its surface topography can not high-acruracy survey, or even can not measure.At present, it is badly in need of a kind of optics
The high-acruracy survey of such sample is realized in terms of measurement.Regrettably this target can be realized currently without technology.
The content of the invention
In order to solve the above problems, the invention discloses a kind of wide curvature sample microscopic appearance measurement thickness of difference structure
Means for correcting and method, solve the problems, such as the high-acruracy survey of the surface topography of microcosmic smooth curvature sample.
The object of the present invention is achieved like this：
The wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, including：
Lighting device, the first imaging device and the second imaging device；
Described lighting device is followed successively by according to the light direction of propagation：Match with sample surfaces plated film fluorescent material wavelength
LASER Light Source, collimating mirror, sinusoidal grating, lens, the first pipe mirror, the first dichroscope, object lens and the objective table for being loaded with sample；
The first described imaging device is followed successively by according to the light direction of propagation：Object lens, the first dichroscope, the second dichroic
Mirror, the first optical filter, the second pipe mirror and the first refrigeration CCD；
The second described imaging device is followed successively by according to the light direction of propagation：Object lens, the first dichroscope, the second dichroic
Mirror, the second optical filter, the 3rd pipe mirror and the second refrigeration CCD；
Described lighting device, the first imaging device and the second imaging device shares object lens and the first dichroscope；It is described
The first imaging device and the second imaging device share the second dichroscope；
Sinusoidal grating and sample conjugation, the first refrigeration CCD and the second refrigeration CCD are respectively at and sample Symmetrical defocus
Two positions on；The thickness of described plated film fluorescent material is more than 2 μm, and excitation wavelength range 200-1200nm, luminous power is small
In 1W, plating membrane substance is dissolved in water or organic solvent.
The above-mentioned wide curvature sample microscopic appearance of difference structure measures thickness means for correcting, and the scope in sinusoidal grating cycle is
20μm-100μm。
The above-mentioned wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, the first dichroscope and the two or two
50% is all higher than to the reflectivity of laser source wavelength to Look mirror, the transmissivity to fluorescent material radiation wavelength is all higher than 50%,
Transmissivity to laser source wavelength is respectively less than 50%.
The above-mentioned wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, the first optical filter, second are filtered
Piece is less than a ten thousandth to the transmissivity of laser source wavelength, and the transmissivity to fluorescent material radiation wavelength is more than 50%, optics
Density is more than 4.
The difference structure light realized on the wide curvature sample microscopic appearance measurement thickness means for correcting of above-mentioned difference structure
Deep camber sample microscopic appearance measures thickness bearing calibration, comprises the following steps：
Sample surfaces are plated fluorescent film by the first step, and film thickness is more than 2 μm, and it is b to set the total running orbit length of objective table,
Variable k is made to be equal to 0；
Second step, makes objective table moveable part move a small step-length a along optical axis, makes variable r be equal to 1；
3rd step, the first refrigeration CCD and the second refrigeration CCD gather image respectively, obtain the image that two width sizes are p × q,
The image that two width are gathered makes the difference, and obtains Iir；
4th step, moved for 1/3 cycle by sinusoidal grating along perpendicular to the direction of optical axis；
5th step, makes variable r plus 1, judges whether r is less than 4, and the 3rd step is entered if "Yes", is entered if "No"
Next step；
6th step, is calculated
7th step, plus 1 by k, judges whether k × a is more than or equal to b, and the 3rd step is repeated if "No" to the 6th
Step, enters the 8th step if "Yes"；
8th step, makes N=k, then obtain N layer datas I1p,I2p…INp, by all obtained I1p,I2p…INpAccording to axle
To position grouping into three-dimensional matrice, the row and column of the row and column correspondence image of order matrix, the number of pages of matrix corresponds to the step of objective table
Enter number；
9th step, by the m rows of gained three-dimensional matrice, all page datas of n row are extracted, and obtain 1 × N row
Vector, records the number of plies k1, k2 corresponding to the positive and negative peak point of this row vector；
Tenth step, the corresponding number of plies k1, k2 and step-length a obtained using p × q pixel obtains all p × q
The corresponding sample surfaces plated film Rotating fields A and sample surface morphology structure B of point, data A is removed, sample surface morphology knot is obtained
Structure B.
The above-mentioned wide curvature sample microscopic appearance measurement thickness bearing calibration of difference structure, in addition to the 11st step, cleaning
Fall the fluorescent film of sample surfaces.
Beneficial effect：
Due to the present invention compared with micrometering technology compare, first in sample surfaces plated film fluorescent material, make its by
Swash radioluminescence, then on this basis, disclose a kind of wide curvature sample microscopic appearance measurement thickness correction of difference structure
Method method, this technological improvement so that the present invention can measure microcosmic smooth deep camber sample surface morphology, its thickness is more than
2 μm, measurement accuracy can be effectively improved, its excitation wavelength range 200-1200nm, luminous power is less than 1W, can avoid fluorescence
Film photobleaching.Plating membrane substance has soluble in water or organic solvent characteristic, is cleaned out film, recovers sample copy
Pattern, while coating process not lesioned sample surface.
Brief description of the drawings
The structural representation of the wide curvature sample microscopic appearance measurement thickness means for correcting of Fig. 1 difference structures and method.
Fig. 2 is the wide curvature sample microscopic appearance measurement thickness bearing calibration schematic diagram of difference structure.
In figure：1 LASER Light Source, 2 collimating mirrors, 3 sinusoidal gratings, 4 lens, 5 first pipe mirrors, 6 first dichroscopes, 7 object lens,
8 samples, 9 second dichroscopes, 10 first optical filters, 11 second pipe mirrors, 12 first refrigeration CCD, 13 second optical filterings, 14 the 3rd pipes
Mirror, 15 second refrigeration, the objective tables of CCD 16.
Embodiment
The specific embodiment of the invention is described in further detail below in conjunction with the accompanying drawings.
Specific embodiment one
The present embodiment is device embodiment.
The microcosmic smooth free form surface sample measuring device based on method of structured light of the present embodiment, structural representation is as schemed
Shown in 1.The device includes：
Lighting device, the first imaging device and the second imaging device；
Described lighting device is followed successively by according to the light direction of propagation：With the surface coating fluorescent material wavelength phase of sample 8
The LASER Light Source 1 matched somebody with somebody, collimating mirror 2, sinusoidal grating 3, lens 4, the first pipe mirror 5, the first dichroscope 6, object lens 7 and it is loaded with sample
8 objective table 16；
The first described imaging device is followed successively by according to the light direction of propagation：Object lens 7, the first dichroscope the 6, the 2nd 2 to
Look mirror 9, the first optical filter 10, the second pipe mirror 11 and the first refrigeration CCD12；
The second described imaging device is followed successively by according to the light direction of propagation：Object lens 7, the first dichroscope the 6, the 2nd 2 to
Look mirror 9, the second optical filter 13, the 3rd pipe mirror 14 and the second refrigeration CCD15；
Described lighting device, the first imaging device and the second imaging device shares the dichroscope 6 of object lens 7 and first；Institute
The first imaging device and the second imaging device stated share the second dichroscope 9；
Sinusoidal grating 3 and sample 8 are conjugated, first refrigeration CCD12 and second refrigeration CCD15 be respectively at it is positive and negative with sample 8
On two positions of symmetrical defocus；The thickness of described plated film fluorescent material is more than 2 μm, excitation wavelength range 200-1200nm,
Luminous power is less than 1W, and plating membrane substance is dissolved in water or organic solvent.
The above-mentioned wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, the scope in the cycle of sinusoidal grating 3
It is 20 μm -100 μm.In typical measuring arrangements, the periodic regime of sinusoidal grating 3 is bigger, is 20 μm -100 μm, however, through reality
Checking is real, after sample surfaces generation fluorescent media film, has tightened up requirement to the cycle of sinusoidal grating 3, sinusoidal grating 3
Cycle can only obtain higher axially measured resolving power when between 50 μm -70 μm, and in other scopes, axially differentiate
Power can all be reduced.
The above-mentioned wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, the first dichroscope 6 and second
Dichroscope 9 is all higher than 50% to the reflectivity of the wavelength of LASER Light Source 1, and the transmissivity to fluorescent material radiation wavelength is all higher than
50%, the transmissivity to the wavelength of LASER Light Source 1 is respectively less than 50%.This parameter designing, can not only make more excitation lights
To sample surfaces, it is to avoid energy loss, and more natively relatively faint flashlights can be collected into, increased simultaneously
Signal to noise ratio.
The above-mentioned wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, the filter of the first optical filter 10, second
Mating plate 13 is less than a ten thousandth to the transmissivity of the wavelength of LASER Light Source 1, and the transmissivity to fluorescent material radiation wavelength is more than 50%,
Optical density (OD) is more than 4.This parameter designing, can not only make more excitation lights to sample surfaces, it is to avoid energy loss,
And more natively relatively faint flashlights can be collected into, while increasing signal to noise ratio.
Specific embodiment two
The present embodiment is the embodiment of the method realized in the described device of specific embodiment one.
The wide curvature sample microscopic appearance measurement thickness calibration method of difference structure of the present embodiment, comprises the following steps：
The first step, fluorescent film is plated by the surface of sample 8, and film thickness is more than 2 μm, and the setting total running orbit length of objective table 16 is
B, makes variable k be equal to 0；
Second step, makes the moveable part of objective table 16 move a small step-length a along optical axis, makes variable r be equal to 1；
3rd step, the first refrigeration CCD12 and the second refrigeration CCD15 gather image respectively, and it is p × q's to obtain two width sizes
Image, the image that two width are gathered makes the difference, and obtains Iir；
4th step, moved for 1/3 cycle by sinusoidal grating 3 along the direction perpendicular to optical axis；
5th step, makes variable r plus 1, judges whether r is less than 4, and the 3rd step is entered if "Yes", is entered if "No"
Next step；
6th step, is calculated
7th step, plus 1 by k, judges whether k × a is more than or equal to b, and the 3rd step is repeated if "No" to the 6th
Step, enters the 8th step if "Yes"；
8th step, makes N=k, then obtain N layer datas I1p,I2p…INp, by all obtained I1p,I2p…INpAccording to axle
To position grouping into three-dimensional matrice, the row and column of the row and column correspondence image of order matrix, the number of pages of matrix corresponds to objective table 16
Number of steps；
9th step, by the m rows of gained three-dimensional matrice, all page datas of n row are extracted, and obtain 1 × N row
Vector, records the number of plies k1, k2 corresponding to the positive and negative peak point of this row vector；
Tenth step, the corresponding number of plies k1, k2 and step-length a obtained using p × q pixel obtains all p × q
The corresponding surface coating Rotating fields A of the sample 8 and surface topography B of sample 8 of point, data A is removed, the surface shape of sample 8 is obtained
Looks structure B.
Specific embodiment three
The present embodiment is embodiment of the method.
The present embodiment is on the basis of specific embodiment two, to increase by the 11st step, wash the fluorescent film of sample surfaces.
The step, it is possible to achieve the recovery to sample surface morphology.
The present invention is not limited to above-mentioned preferred forms, and anyone should learn that the knot made under the enlightenment of the present invention
Structure changes or method is improved, and the technical schemes that are same or similar to the present invention each fall within protection scope of the present invention
Within.
Claims (3)
1. the wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure, it is characterised in that including：
Lighting device, the first imaging device and the second imaging device；
Described lighting device is followed successively by according to the light direction of propagation：Match with sample (8) surface coating fluorescent material wavelength
LASER Light Source (1), collimating mirror (2), sinusoidal grating (3), lens (4), the first pipe mirror (5), the first dichroscope (6), object lens
(7) and it is loaded with the objective tables (16) of sample (8)；
The first described imaging device is followed successively by according to the light direction of propagation：Object lens (7), the first dichroscope (6), the two or two to
Look mirror (9), the first optical filter (10), the second pipe mirror (11) and the first refrigeration CCD (12)；
The second described imaging device is followed successively by according to the light direction of propagation：Object lens (7), the first dichroscope (6), the two or two to
Look mirror (9), the second optical filter (13), the 3rd pipe mirror (14) and the second refrigeration CCD (15)；
Described lighting device, the first imaging device and the second imaging device shares object lens (7) and the first dichroscope (6)；Institute
The first imaging device and the second imaging device stated share the second dichroscope (9)；
Sinusoidal grating (3) and sample (8) conjugation, the first refrigeration CCD (12) and the second refrigeration CCD (15) are respectively at and sample
(8) on two positions of Symmetrical defocus；The thickness of described plated film fluorescent material is more than 2 μm, excitation wavelength range 200-
1200nm, luminous power is less than 1W, and plating membrane substance is dissolved in water or organic solvent；
First dichroscope (6) and the second dichroscope (9) are all higher than 50% to the reflectivity of LASER Light Source (1) wavelength, to glimmering
The transmissivity of stimulative substance radiation wavelength is all higher than 50%, and the transmissivity to LASER Light Source (1) wavelength is respectively less than 50%；
First optical filter (10), the second optical filter (13) are less than a ten thousandth to the transmissivity of LASER Light Source (1) wavelength, to fluorescence
The transmissivity of matter-radiation wavelength is more than 50%, and optical density (OD) is more than 4；
The scope in sinusoidal grating (3) cycle is 20 μm -100 μm.
2. the difference realized on the wide curvature sample microscopic appearance measurement thickness means for correcting of difference structure described in claim 1
Dynamic structure light deep camber sample microscopic appearance measurement thickness bearing calibration, it is characterised in that：Comprise the following steps：
The first step, fluorescent film is plated by sample (8) surface, and film thickness is more than 2 μm, and setting objective table (16), always running orbit length is
B, makes variable k be equal to 0；
Second step, makes objective table (16) moveable part move a small step-length a along optical axis, makes variable r be equal to 1；
3rd step, the first refrigeration CCD (12) and the second refrigeration CCD (15) gather image respectively, and it is p × q's to obtain two width sizes
Image, the image that two width are gathered makes the difference, and obtains Iir；
4th step, moved for 1/3 cycle by sinusoidal grating (3) along perpendicular to the direction of optical axis；
5th step, makes variable r plus 1, judges whether r is less than 4, and the 3rd step is entered if "Yes", enters next if "No"
Step；
6th step, is calculated
7th step, plus 1 by k, judges whether k × a is more than or equal to b, the 3rd step to the 6th step is repeated if "No", such as
Fruit "Yes" then enters the 8th step；
8th step, makes N=k, then obtain N layer datas I1p,I2p…INp, by all obtained I1p,I2p…INpAccording to axial position
Put and be combined into three-dimensional matrice, the row and column of the row and column correspondence image of order matrix, the step of the number of pages correspondence objective table (16) of matrix
Enter number；
9th step, by the m rows of gained three-dimensional matrice, all page datas of n row are extracted, obtain 1 × N row to
Amount, records the number of plies k1, k2 corresponding to the positive and negative peak point of this row vector；
Tenth step, the corresponding number of plies k1, k2 and step-length a obtained using p × q pixel, obtains all p × q points pair
Sample (8) the surface coating Rotating fields A and sample (8) surface topography B answered, data A is removed, sample (8) surface is obtained
Appearance structure B.
3. the wide curvature sample microscopic appearance measurement thickness bearing calibration of difference structure according to claim 2, its feature
It is, in addition to the 11st step, wash the fluorescent film on sample (8) surface.
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| CN115930787A (en) * | 2022-10-06 | 2023-04-07 | 山东申华光学科技有限公司 | Method and system for detecting coating quality of coating machine based on machine vision |
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| WO2010088418A1 (en) * | 2009-01-29 | 2010-08-05 | The Regents Of The University Of California | High resolution structured illumination microscopy |
| CN103105143B (en) * | 2013-01-29 | 2015-07-29 | 哈尔滨工业大学 | Based on the differential confocal micro-measurement apparatus of measured surface fluorescence excitation |
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