CN104345510B - The manufacture method of liquid crystal panel and liquid crystal panel - Google Patents
The manufacture method of liquid crystal panel and liquid crystal panel Download PDFInfo
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- CN104345510B CN104345510B CN201410505323.6A CN201410505323A CN104345510B CN 104345510 B CN104345510 B CN 104345510B CN 201410505323 A CN201410505323 A CN 201410505323A CN 104345510 B CN104345510 B CN 104345510B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
- G02F1/136295—Materials; Compositions; Manufacture processes
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The liquid crystal panel of the present invention and the manufacture method of liquid crystal panel, wherein, liquid crystal panel includes array base palte and to box substrate, include multiple TFT on array base palte, region shared by least one TFT includes the interior light tight region containing channel region, and the distance between the border of channel region and the border of light tight region on the direction parallel to liquid crystal panel is more than or equal to setpoint distance d.The manufacture method of the liquid crystal panel of the present invention, including calculate the minimum range d ' between the border of channel region and the border of light tight region on the direction parallel to liquid crystal panel.Technical scheme effectively prevents TFT rapid degradations in use, thus lifts design, the production efficiency of liquid crystal panel.The Related product manufactured using the manufacture method of the liquid crystal panel of the present invention, its structure is more reasonable, and product performance is more excellent.
Description
Technical field
The present invention relates to the manufacture method of field of liquid crystal display, more particularly to liquid crystal panel and liquid crystal panel.
Background technology
In FPD (FPD, Flat Panel Display) technology, due to liquid crystal display (LCD, Liquid
Crystal Display) possess it is compact, significantly save placing space the advantages of, gradually substitution cathode-ray tube show
Show device, the display as main flow.In various types of LCD, TFT liquid crystal display (TFT-LCD,
Thin Film Transistor-Liquid Crystal Display) be active matrix type liquid crystal display one kind,
TFT-LCD function admirables, are adapted to large-scale automated production, and the cost of raw material is cheap, therefore occupy in an lcd importantly
Position.
In TFT-LCD processing procedure, product design is related to the properties after product is ultimately produced, wherein to liquid
The TFT of crystal panel design is the most important thing in whole design again, and various pieces are already allowed in traditional TFT designs
Critical size and specification, would generally confirm after the completion of product design to some parts of key parameter, but with product work(
Few increase of energy, the constantly improve of evaluation method, designer has found that part has previously been thought that unimportant dimensional parameters
Conclusive effect can be played to the performance of product.For example, the display effect of certain display panel declines quickly, test indicate that
Reason is TFT rapid degradations in use.
The content of the invention
The liquid crystal panel and liquid crystal panel of TFT rapid degradations in use are prevented it is an object of the invention to provide a kind of
Manufacture method.
The liquid crystal panel that embodiment of the present invention is provided, including array base palte and with pair of the array base palte to box
A plurality of data lines and a plurality of grid line, a plurality of data lines and a plurality of grid line are provided with box substrate, the array base palte
Intersect and limit multiple pixel regions；Also include on the array base palte in multiple TFT, the region shared by least one described TFT
Including the interior light tight region containing channel region, between the border of the channel region and the border of the light tight region
It is more than or equal to setpoint distance d parallel to the distance on the direction of the liquid crystal panel.
The liquid crystal panel that embodiment of the present invention is provided, wherein, the channel region is U-shaped region, the ditch of the TFT
The projection of the pattern of road region and the TFT source electrode is in the region of a grid line, the border of the light tight region
Include the border of the grid line.
The liquid crystal panel that embodiment of the present invention is provided, wherein, the TFT includes the grid being connected with the grid line
Pole, the projection of the channel region of the TFT is located in the grid region, the source electrode, drain electrode and channel region three
The width in the region of composition is more than the width of the grid, and the border of the light tight region includes the remote described of the source electrode
The border of channel region side, and the remote channel region side of the drain electrode border.
The liquid crystal panel that embodiment of the present invention is provided, wherein, the setpoint distance d is：
Wherein, nairFor the refractive index of air, ncellMean refractive index or the array base palte for the liquid crystal panel
The refractive index of first underlay substrate；
H is the first underlay substrate inner surface of the array base palte and the interior table of second underlay substrate to box substrate
Grid on the thickness value g of the distance between face or the array base palte and the liquid crystal layer between box substrate, array base palte
Layer height k, the source/drain electrode of insulating protect the sum of layer height h three；
I is in each pixel region, the adjacent impermeable photo structure of the channel region towards described to box substrate
Vertical range between surface and the second underlay substrate inner surface to box substrate；
α values be 0 ° or θ, θ to be that light is incident upon by the array base palte described to box substrate and the array base palte phase
To surface when angle of reflection diffusing reflection increment.
The liquid crystal panel that embodiment of the present invention is provided, wherein, the setpoint distance d is：
Wherein, nairFor the refractive index of air, ncellMean refractive index or the array base palte for the liquid crystal panel
The refractive index of first underlay substrate；
H is the first underlay substrate inner surface of the array base palte and the interior table of second underlay substrate to box substrate
Grid on the thickness value g of the distance between face or the array base palte and the liquid crystal layer between box substrate, array base palte
Layer height k, the source/drain electrode of insulating protect the sum of layer height h three；
α values be 0 ° or θ, θ to be that light is incident upon by the array base palte described to box substrate and the array base palte phase
To surface when angle of reflection diffusing reflection increment；
I=H-t, t are the height of the TFT on array base palte, and the height of the TFT is light tight for the top of the TFT
The distance between the top surface of layer and the first underlay substrate inner surface of the array base palte.
The liquid crystal panel that embodiment of the present invention is provided, wherein, the setpoint distance d is：
Wherein, nairFor the refractive index of air, ncellMean refractive index or the array base palte for the liquid crystal panel
The refractive index of first underlay substrate；
H is the first underlay substrate inner surface of the array base palte and the interior table of second underlay substrate to box substrate
Grid on the thickness value g of the distance between face or the array base palte and the liquid crystal layer between box substrate, array base palte
Layer height k, the source/drain electrode of insulating protect the sum of layer height h three；
I is in each pixel region, the adjacent impermeable photo structure of the channel region towards described to box substrate
Vertical range between surface and the second underlay substrate inner surface to box substrate；
α values are 0 ° or θ, and the θ is incident upon described to box substrate and the array base for light by the array base palte
The diffusing reflection increment of angle of reflection during black matrix on the relative surface of plate.
The manufacture method for the liquid crystal panel that embodiment of the present invention is provided, the liquid crystal panel include array base palte and
With the array base palte to box to box substrate, a plurality of data lines and a plurality of grid line are provided with the array base palte, it is described many
Data line intersects the multiple pixel regions of restriction with a plurality of grid line；Also include multiple TFT, at least one on the array base palte
Region shared by the individual TFT includes the interior light tight region containing channel region, and the manufacture method includes：Calculate described
Most narrow spacing between the border of channel region and the border of the light tight region on the direction parallel to the liquid crystal panel
From d '.
The manufacture method for the liquid crystal panel that embodiment of the present invention is provided, wherein, calculate the border of the channel region
Minimum range d ' between the border of the light tight region on the direction parallel to the liquid crystal panel includes：
UtilizeCalculate
Between the border of the channel region and the border of the light tight region on the direction parallel to the liquid crystal panel most
Small distance d ', wherein, nairFor the refractive index of air, ncellMean refractive index or the array base palte for the liquid crystal panel
The first underlay substrate refractive index；
H ' is in the first underlay substrate inner surface and second underlay substrate to box substrate of the array base palte
On the thickness value g of the distance between surface or the array base palte and the liquid crystal layer between box substrate, array base palte
Gate insulation layer height k, source/drain electrode protect the sum of layer height h three；
I ' is in each pixel region, the adjacent impermeable photo structure of the channel region towards described to box substrate
Vertical range between surface and the second underlay substrate inner surface to box substrate；
α ' values are 0 ° or θ ', θ ' to be that light is incident upon by the array base palte described to box substrate and the array base palte
The diffusing reflection increment of angle of reflection during relative surface.
The technical scheme of embodiment of the present invention effectively prevents TFT rapid degradations in use, thus lifts liquid crystal panel
Design, production efficiency.The Related product manufactured using the manufacture method of the liquid crystal panel of the present invention, its structure more adduction
Reason, product performance is more excellent.
Brief description of the drawings
Fig. 1 is the overlooking structure figure of the TFT on the array base palte of the embodiment one of the liquid crystal panel of embodiment of the present invention；
Fig. 2 is the sectional view of the embodiment one of the liquid crystal panel of embodiment of the present invention；
Fig. 3 is the overlooking structure figure of the TFT on the array base palte of the embodiment two of the liquid crystal panel of embodiment of the present invention；
Fig. 4 is the sectional view of the array base palte of the embodiment two of the liquid crystal panel of embodiment of the present invention.
1st, array base palte
2nd, data wire
3rd, grid line
4th, channel region
5th, source electrode
6th, grid
7th, drain
8th, the first underlay substrate
9th, to box substrate
11st, gate insulation layer
12nd, source/drain electrode protective layer
Embodiment
The invention will be further described with specific embodiment below in conjunction with the accompanying drawings, so that those skilled in the art can be with
It is better understood from the present invention and can be practiced, but illustrated embodiment is not as a limitation of the invention.
Embodiment one
As shown in Figure 1 and Figure 2, the embodiment of liquid crystal panel of the invention, including array base palte 1 and with 1 pair of array base palte
Box to box substrate 9, be provided with a plurality of data lines (not shown) and a plurality of grid line 3 on array base palte 1, a plurality of data lines with
A plurality of grid line 3, which intersects, limits multiple pixel regions；On array base palte 1 also include multiple TFT, TFT include source electrode 5, drain electrode 7 and
Grid 6, the region shared by least one TFT includes the interior light tight region containing channel region 4, the border of channel region 4
It is more than or equal to setpoint distance d apart from D on the direction parallel to liquid crystal panel between the border of light tight region.
The embodiment of the liquid crystal panel of the present invention, wherein, the light tight region can be because of opaque grid line
It is being formed or being formed by other any lighttight structures in TFT.
Setpoint distance d both can rule of thumb be obtained or according to public affairs hereafter by technical staff with experiment
Formula is calculated.
The embodiment of the liquid crystal panel of the present invention, wherein, channel region 4 is U-shaped region, TFT channel region 4 and TFT
Source electrode 5 pattern projection positioned at a grid line 3 region in, the border of light tight region includes the border of grid line 3.
The embodiment of the liquid crystal panel of the present invention, wherein, setpoint distance d is：
First underlay substrate 8 inner surfaces of the H for array base palte 1 and the inner surface to the second underlay substrate of box substrate 9 it
Between distance, or H is array base palte 1 and thickness value g to the liquid crystal layer between box substrate 9, gate insulation on array base palte 1
11 height k of layer, the sum of the height h three of source/drain electrode protective layer 12, i.e. H=g+k+h；
Or H is array base palte 1 and thickness value g to the liquid crystal layer between box substrate 9, gate insulation on array base palte 1
11 height k of layer, the sum of the height h three of source/drain electrode protective layer 12, i.e. H=g+k+h；
I be each pixel region in, the adjacent impermeable photo structure of channel region 4 towards the surface to box substrate 9 with
To the vertical range between the second underlay substrate inner surface of box substrate 9；
α values are 0 ° or when θ, θ are that light is incident upon the surface relative with array base palte 1 to box substrate 9 by array base palte 1
Angle of reflection diffusing reflection increment.
The present invention liquid crystal panel embodiment, wherein, the inner surface of the first underlay substrate 8 of array base palte 1 with to box base
The inner surface of second underlay substrate of plate 9 is the surface for being inclined to liquid crystal side.
The embodiment of the liquid crystal panel of the present invention, wherein, setpoint distance d can also be：
First underlay substrate 8 inner surfaces of the H for array base palte 1 and the inner surface to the second underlay substrate of box substrate 9 it
Between distance, or H is array base palte 1 and thickness value g to the liquid crystal layer between box substrate 9, gate insulation on array base palte 1
11 height k of layer, the sum of the height h three of source/drain electrode protective layer 12, i.e. H=g+k+h；
Or H is array base palte 1 and thickness value g to the liquid crystal layer between box substrate 9, gate insulation on array base palte 1
11 height k of layer, the sum of the height h three of source/drain electrode protective layer 12, i.e. H=g+k+h；
α values are 0 ° or when θ, θ are that light is incident upon the surface relative with array base palte 1 to box substrate 9 by array base palte 1
Angle of reflection diffusing reflection increment.
I=H-t, t are the height of the TFT on array base palte, and TFT height is the top table of TFT top light non-transmittable layers
The distance between inner surface of the first underlay substrate 8 of face and array base palte 1.
If being made on TFT has other impermeable photo structures, at this moment I is not equal to H-t.
The embodiment of the liquid crystal panel of the present invention, wherein, setpoint distance d can also be：
Wherein, nairFor the refractive index of air, ncellFirst lining of mean refractive index or array base palte 1 for liquid crystal panel
The refractive index of substrate 8；
First underlay substrate 8 inner surfaces of the H for array base palte 1 and the inner surface to the second underlay substrate of box substrate 9 it
Between distance, or H is array base palte 1 and thickness value g to the liquid crystal layer between box substrate 9, gate insulation on array base palte 1
11 height k of layer, the sum of the height h three of source/drain electrode protective layer 12, i.e. H=g+k+h；
I be each pixel region in, the adjacent impermeable photo structure of channel region 4 towards the surface to box substrate 9 with
To the vertical range between the second underlay substrate inner surface of box substrate 9；
α values are 0 ° or θ, θ are that light is incident upon on the surface to relative with array base palte the 1 of box substrate 9 by array base palte 1
Black matrix when angle of reflection diffusing reflection increment.
In the embodiment of the liquid crystal panel of the present invention, the thickness of the first underlay substrate 8 of array base palte 1 can be ignored,
Equivalent to light from air is directly incident on liquid crystal cell by a thin interface, the mean refractive index of liquid crystal panel now is
ncell,
If necessary to more accurately numerical value, ncellCan value for array base palte 1 the first underlay substrate 8 refractive index.
When light is incident upon the surface relative with array base palte 1 to box substrate 9 by array base palte 1, when not considering diffusing reflection
When, α values are 0 °；When considering diffusing reflection, α values are θ.
Above-mentioned diffusing reflection increment refers to：When diffusing reflection causes angle of reflection to be more than specular angle, in specular angle base
Increase on plinth, this increase can be according to the material and knot of the second underlay substrate inner surface to box substrate by technical staff
Structure situation is obtained, generally in the range of 1-2 degree.
Embodiment two
As shown in Figure 3, Figure 4, in the embodiment of liquid crystal panel of the invention, a plurality of data lines is provided with array base palte 1
2, the TFT grids 6 including being connected with grid line 3, the projection of TFT channel region is located in the region of grid 6, light tight area
The border in domain includes the border of the border of the side of remote channel region 4 of source electrode 5 and the side of remote channel region 4 of drain electrode 7.
The width in the region of source electrode 5, drain electrode 7 and the three of channel region 4 composition is more than the width of grid 6, and channel region 4 is
Strip region (is, for example, the strip area for being illustratively shown as above-below direction in figure 3 formed between finger source electrode and drain electrode
Domain).
The embodiment of the manufacture method of the liquid crystal panel of the present invention, above-mentioned liquid crystal panel includes array base palte and and array
Substrate to box substrate, is provided with a plurality of data lines and a plurality of grid line, a plurality of data lines and a plurality of grid line to box on array base palte
Intersect and limit multiple pixel regions；Also include multiple TFT on array base palte, the region shared by least one TFT includes including
There is a light tight region of channel region, the embodiment of the manufacture method of liquid crystal panel of the invention includes：Calculate channel region
Minimum range d ' between border and the border of light tight region on the direction parallel to liquid crystal panel.
The embodiment of the manufacture method of the liquid crystal panel of the present invention, wherein, calculate the border and light tight area of channel region
Minimum range d ' between the border in domain on the direction parallel to liquid crystal panel includes：
UtilizeCalculate
Minimum range d ' between the border of channel region and the border of light tight region on the direction parallel to liquid crystal panel, its
In, nairFor the refractive index of air, ncellThe refraction of first underlay substrate of mean refractive index or array base palte for liquid crystal panel
Rate；
First underlay substrate 8 inner surfaces of the H ' for array base palte 1 and the inner surface to the second underlay substrate of box substrate 9 it
Between distance, or H ' is array base palte 1 and thickness value g to the liquid crystal layer between box substrate 9, grid are exhausted on array base palte 1
The height k of edge layer 11, the sum of the height h three of source/drain electrode protective layer 12, i.e. H '=g+k+h；
I ' be each pixel region in, the adjacent impermeable photo structure of channel region towards the surface to box substrate with it is right
Vertical range between second underlay substrate inner surface of box substrate, or, I '=H-t, t is the height of the TFT on array base palte
Degree, TFT height is between the TFT top surface of top light non-transmittable layers and the inner surface of the first underlay substrate 8 of array base palte 1
Distance；
α ' values are 0 ° or θ ', θ ' when being that light is incident upon the surface relative with array base palte to box substrate by array base palte
Angle of reflection diffusing reflection increment, or θ ' is that light is incident upon to relative with array base palte the 1 of box substrate 9 by array base palte 1
The diffusing reflection increment of angle of reflection during black matrix on surface.
The embodiment of the manufacture method of the liquid crystal panel of the present invention, wherein, the first underlay substrate inner surface of array base palte
Inner surface with the second underlay substrate to box substrate is the surface for being inclined to liquid crystal side.
, can be by the thickness of the first underlay substrate of array base in the embodiment of the manufacture method of the liquid crystal panel of the present invention
Ignore, equivalent to light from air is directly incident on liquid crystal cell by a thin interface, the average folding of liquid crystal panel now
Rate is penetrated for ncell,
If necessary to more accurately numerical value, ncellCan value for array base palte the first underlay substrate refractive index.
When light is incident upon the surface relative with array base palte to box substrate by array base palte, when not considering diffusing reflection, α
Value is 0 °；When considering diffusing reflection, α values are θ.
Above-mentioned diffusing reflection increment refers to：When diffusing reflection causes angle of reflection to be more than specular angle, in specular angle base
Increase on plinth, this increase can be according to the material and knot of the second underlay substrate inner surface to box substrate by technical staff
Structure situation is obtained, generally in the range of 1-2 degree.
Technical scheme is according to the propagation law and trigonometric function of light, and the size for TFT ad-hoc location is carried
Rational span is supplied.The manufacture method of the liquid crystal panel of the present invention is applied to the various sizes of liquid crystal panel of different model
TFT design.
Technical scheme effectively prevents TFT rapid degradations in use, thus lifts designing, giving birth to for liquid crystal panel
Produce efficiency.The Related product manufactured using the manufacture method of the liquid crystal panel of the present invention, its structure is more reasonable, and product is special
Property is more excellent.
In an experiment, the ditch that the TFT in the region of the vertical striped of black occur in many places on the liquid crystal panel of certain model is measured
Between the border in road region 4 and the border of light tight region on the direction parallel to liquid crystal panel apart from D, it is found that D's is flat
Average is about 6.44 μm, and parallel between the TFT of the normal region border of channel region 4 and the border of light tight region
In the average value apart from D on the direction of liquid crystal panel be about 6.94 μm, and the channel region 4 calculated according to above-mentioned formula
The minimum value apart from D between border and the border of light tight region on the direction parallel to liquid crystal panel is 6.57 μm, i.e.,
Show that result of calculation is coincide with actual test result.
Further, it will put down between the border of channel region 4 and the border of light tight region of the TFT on array base palte
Row carries out senile experiment after the distance on the direction of liquid crystal panel is reduced, it is found that sample has 80% generation bad, will
In the direction parallel to liquid crystal panel between the border of channel region 4 and the border of light tight region of TFT on array base palte
On distance increased after, carry out senile experiment, find sample do not produce it is bad.
Described above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications also should
It is considered as protection scope of the present invention.
Claims (5)
1. a kind of liquid crystal panel, including array base palte and with the array base palte to box to box substrate, the array base palte
On be provided with a plurality of data lines and a plurality of grid line, a plurality of data lines intersects the multiple pixel regions of restriction with a plurality of grid line
Domain；Also include multiple TFT on the array base palte, it is characterised in that the region shared by least one described TFT includes including
There is the light tight region of channel region, parallel to institute between the border of the channel region and the border of the light tight region
The distance stated on the direction of liquid crystal panel is more than or equal to setpoint distance d；
The setpoint distance d is：
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<mi>e</mi>
<mi>l</mi>
<mi>l</mi>
</mrow>
</msub>
</mfrac>
<mo>)</mo>
</mrow>
<mo>+</mo>
<mi>&alpha;</mi>
<mo>}</mo>
</mrow>
Wherein, nairFor the refractive index of air, ncellFirst of mean refractive index or the array base palte for the liquid crystal panel
The refractive index of underlay substrate；
H for the first underlay substrate inner surface and second underlay substrate to box substrate of the array base palte inner surface it
Between distance or the thickness value g of the array base palte and the liquid crystal layer between box substrate, array base palte on gate insulation
Layer height k, source/drain electrode protect the sum of layer height h three；
I is in each pixel region, the adjacent impermeable photo structure of the channel region towards the surface to box substrate
With the vertical range between the second underlay substrate inner surface to box substrate；
α values be 0 ° or θ, θ to be that light is incident upon by the array base palte described relative with the array base palte to box substrate
The diffusing reflection increment of angle of reflection during surface；
Or, the setpoint distance d is：
<mrow>
<mi>d</mi>
<mo>=</mo>
<mi>H</mi>
<mo>&times;</mo>
<mi>t</mi>
<mi>a</mi>
<mi>n</mi>
<mo>{</mo>
<mi>arcsin</mi>
<mrow>
<mo>(</mo>
<mfrac>
<msub>
<mi>n</mi>
<mrow>
<mi>a</mi>
<mi>i</mi>
<mi>r</mi>
</mrow>
</msub>
<msub>
<mi>n</mi>
<mrow>
<mi>c</mi>
<mi>e</mi>
<mi>l</mi>
<mi>l</mi>
</mrow>
</msub>
</mfrac>
<mo>)</mo>
</mrow>
<mo>}</mo>
<mo>+</mo>
<mrow>
<mo>(</mo>
<mi>I</mi>
<mo>)</mo>
</mrow>
<mo>&times;</mo>
<mi>t</mi>
<mi>a</mi>
<mi>n</mi>
<mo>{</mo>
<mi>arcsin</mi>
<mrow>
<mo>(</mo>
<mfrac>
<msub>
<mi>n</mi>
<mrow>
<mi>a</mi>
<mi>i</mi>
<mi>r</mi>
</mrow>
</msub>
<msub>
<mi>n</mi>
<mrow>
<mi>c</mi>
<mi>e</mi>
<mi>l</mi>
<mi>l</mi>
</mrow>
</msub>
</mfrac>
<mo>)</mo>
</mrow>
<mo>+</mo>
<mi>&alpha;</mi>
<mo>}</mo>
</mrow>
Wherein, nairFor the refractive index of air, ncellFirst of mean refractive index or the array base palte for the liquid crystal panel
The refractive index of underlay substrate；
H for the first underlay substrate inner surface and second underlay substrate to box substrate of the array base palte inner surface it
Between distance or the thickness value g of the array base palte and the liquid crystal layer between box substrate, array base palte on gate insulation
Layer height k, source/drain electrode protect the sum of layer height h three；
α values be 0 ° or θ, θ to be that light is incident upon by the array base palte described relative with the array base palte to box substrate
The diffusing reflection increment of angle of reflection during surface；
I=H-t, t are the height of the TFT on array base palte, and the height of the TFT is the top light non-transmittable layers of the TFT
The distance between first underlay substrate inner surface of top surface and the array base palte；
Or, the setpoint distance d is：
<mrow>
<mi>d</mi>
<mo>=</mo>
<mi>H</mi>
<mo>&times;</mo>
<mi>t</mi>
<mi>a</mi>
<mi>n</mi>
<mo>{</mo>
<mi>arcsin</mi>
<mrow>
<mo>(</mo>
<mfrac>
<msub>
<mi>n</mi>
<mrow>
<mi>a</mi>
<mi>i</mi>
<mi>r</mi>
</mrow>
</msub>
<msub>
<mi>n</mi>
<mrow>
<mi>c</mi>
<mi>e</mi>
<mi>l</mi>
<mi>l</mi>
</mrow>
</msub>
</mfrac>
<mo>)</mo>
</mrow>
<mo>}</mo>
<mo>+</mo>
<mrow>
<mo>(</mo>
<mi>I</mi>
<mo>)</mo>
</mrow>
<mo>&times;</mo>
<mi>t</mi>
<mi>a</mi>
<mi>n</mi>
<mo>{</mo>
<mi>arcsin</mi>
<mrow>
<mo>(</mo>
<mfrac>
<msub>
<mi>n</mi>
<mrow>
<mi>a</mi>
<mi>i</mi>
<mi>r</mi>
</mrow>
</msub>
<msub>
<mi>n</mi>
<mrow>
<mi>c</mi>
<mi>e</mi>
<mi>l</mi>
<mi>l</mi>
</mrow>
</msub>
</mfrac>
<mo>)</mo>
</mrow>
<mo>+</mo>
<mi>&alpha;</mi>
<mo>}</mo>
</mrow>
Wherein, nairFor the refractive index of air, ncellFirst of mean refractive index or the array base palte for the liquid crystal panel
The refractive index of underlay substrate；
H for the first underlay substrate inner surface and second underlay substrate to box substrate of the array base palte inner surface it
Between distance or the thickness value g of the array base palte and the liquid crystal layer between box substrate, array base palte on gate insulation
Layer height k, source/drain electrode protect the sum of layer height h three；
I is in each pixel region, the adjacent impermeable photo structure of the channel region towards the surface to box substrate
With the vertical range between the second underlay substrate inner surface to box substrate；
α values are 0 ° or θ, and the θ is incident upon described to box substrate and the array base palte phase for light by the array base palte
To surface on black matrix when angle of reflection diffusing reflection increment.
2. liquid crystal panel according to claim 1, it is characterised in that the channel region is U-shaped region, the TFT's
The projection of the pattern of channel region and the TFT source electrode is in the region of a grid line, the side of the light tight region
Boundary includes the border of the grid line.
3. liquid crystal panel according to claim 1, it is characterised in that the TFT includes the grid being connected with the grid line
Pole, the projection of the channel region of the TFT is located in the grid region, and the TFT also includes source electrode and drain electrode, described
The width in the region of source electrode, drain electrode and channel region three composition is more than the width of the grid, the side of the light tight region
The border of the remote channel region side on boundary including the source electrode, and the drain electrode the remote channel region side
Border.
4. a kind of manufacture method of liquid crystal panel, the liquid crystal panel includes array base palte and with the array base palte to box
To box substrate, a plurality of data lines and a plurality of grid line, a plurality of data lines and a plurality of grid are provided with the array base palte
Line, which intersects, limits multiple pixel regions；Also include multiple TFT, the region shared by least one described TFT on the array base palte
Light tight region containing channel region in including, it is characterised in that methods described is used to manufacture as claimed in claim 1
Liquid crystal panel；The manufacture method includes：Calculate between the border of the channel region and the border of the light tight region
Parallel to the minimum range d ' on the direction of the liquid crystal panel.
5. the manufacture method of liquid crystal panel according to claim 4, it is characterised in that calculate the border of the channel region
Minimum range d ' between the border of the light tight region on the direction parallel to the liquid crystal panel includes：
UtilizeCalculate described
Most narrow spacing between the border of channel region and the border of the light tight region on the direction parallel to the liquid crystal panel
From d ', wherein, nairFor the refractive index of air, ncellOf mean refractive index or the array base palte for the liquid crystal panel
The refractive index of one underlay substrate；
H ' is the first underlay substrate inner surface of the array base palte and the inner surface of second underlay substrate to box substrate
The distance between or the thickness value g of the array base palte and the liquid crystal layer between box substrate, array base palte on grid it is exhausted
Edge layer height k, source/drain electrode protect the sum of layer height h three；
I ' is in each pixel region, the adjacent impermeable photo structure of the channel region towards the surface to box substrate
With the vertical range between the second underlay substrate inner surface to box substrate；
α ' values are 0 ° or θ ', θ ' to be that light is incident upon by the array base palte described relative with the array base palte to box substrate
Surface when angle of reflection diffusing reflection increment.
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| CN104345510B true CN104345510B (en) | 2017-10-03 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5969778A (en) * | 1996-08-30 | 1999-10-19 | Lg Electronics Inc. | Active matrix liquid crystal display having a contact hole |
| CN102197490A (en) * | 2008-10-24 | 2011-09-21 | 株式会社半导体能源研究所 | Semiconductor device and method for manufacturing the same |
| CN102236227A (en) * | 2010-05-05 | 2011-11-09 | 乐金显示有限公司 | Liquid crystal display device and method of fabricating the same |
| CN102799033A (en) * | 2012-07-26 | 2012-11-28 | 京东方科技集团股份有限公司 | Display panel, production method thereof and display device |
| CN103472647A (en) * | 2013-09-22 | 2013-12-25 | 合肥京东方光电科技有限公司 | Array substrate, liquid crystal display panel and display device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE428253T1 (en) * | 2006-01-27 | 2009-04-15 | Siemens Ag | METHOD FOR ASSIGNING AT LEAST ONE USER DATA CONNECTION TO AT LEAST ONE MULTIPLEX CONNECTION |
-
2014
- 2014-09-26 CN CN201410505323.6A patent/CN104345510B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5969778A (en) * | 1996-08-30 | 1999-10-19 | Lg Electronics Inc. | Active matrix liquid crystal display having a contact hole |
| CN102197490A (en) * | 2008-10-24 | 2011-09-21 | 株式会社半导体能源研究所 | Semiconductor device and method for manufacturing the same |
| CN102236227A (en) * | 2010-05-05 | 2011-11-09 | 乐金显示有限公司 | Liquid crystal display device and method of fabricating the same |
| CN102799033A (en) * | 2012-07-26 | 2012-11-28 | 京东方科技集团股份有限公司 | Display panel, production method thereof and display device |
| CN103472647A (en) * | 2013-09-22 | 2013-12-25 | 合肥京东方光电科技有限公司 | Array substrate, liquid crystal display panel and display device |
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| CN104345510A (en) | 2015-02-11 |
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Inventor after: Feng Bin Inventor after: Hong Yongtai Inventor before: Feng Bin Inventor before: Li Shengxuan |
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